Cleaning device and etching machine

Abstract

The utility model discloses a cleaning device and an etching machine, comprising a collecting box connected with the etching machine, a connecting pipe extending towards the direction of an etching cavity of the etching machine along the collecting box, a cleaning piece connected with one side, far away from the collecting box, of the connecting pipe, and a sucking pump at least partially embedded in the collecting box, the cleaning part comprises a driving box communicated with the connecting pipe, a cleaning head arranged on one side, far away from the connecting pipe, of the driving box, and a handle extending outwards along the outer surface of the driving box, the cleaning head is driven by the driving box to rotate axially, and the cleaning part is matched with the sucking pump, so that polymers on the inner wall surface of the etching cavity of the etching machine can be cleaned, and the cleaning efficiency is improved. And the brushed polymer can be collected, concentrated cleaning is facilitated, and cleaning dead corners can be effectively avoided in a manual cleaning mode.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor equipment cleaning, in particular to a cleaning device and an etching machine. Background Art

[0002] Etcher, also known as plasma etcher, plasma etching is the most common form of dry etching. Its principle is that the gas exposed to the electron area forms plasma, and the resulting ionized gas and the gas composed of released high-energy electrons form plasma or ions. When the ionized gas atoms are accelerated by the electric field, they release enough force to tightly bond the material with the surface expulsion force or etch the surface.

[0003] Existing dry plasma etching still has certain defects. The gas polymers generated during the etching process are easily adsorbed on the inner wall of the etching chamber and accumulated. Currently, a vacuum pump is usually used for cleaning. While using a vacuum pump to accelerate the flow of gas inside the etching chamber, it is easy to cause the polymer to block the filter, thereby affecting the etching rate and accuracy. Utility Model Content

[0004] Based on this, the purpose of the present invention is to provide a cleaning device and an etching machine, aiming to solve the problem that the cleaning of the etching machine in the prior art uses a vacuum pump for cleaning, which accelerates the gas flow inside the etching chamber and easily causes the polymer to block the filter.

[0005] The cleaning device proposed in an embodiment of the present invention includes a collection box connected to an etcher, a connecting pipe extending from the collection box toward an etching chamber of the etcher, a cleaning member connected to a side of the connecting pipe away from the collection box, and an air pump at least partially embedded in the collection box;

[0006] The cleaning member includes a drive box connected to the connecting pipe, a cleaning head arranged on a side of the drive box away from the connecting pipe, and a handle extending outward from an outer surface of the drive box, and the cleaning head is driven to rotate axially by the drive box.

[0007] As mentioned above, the present application sends the cleaning head into the interior of the etching chamber by holding the handle, and starts the motor to drive the gear box and the cleaning head to rotate, so that the cleaning head brushes off the polymer on the inner wall of the etching chamber, and at the same time turns on the vacuum pump. The vacuum pump can make the collection box and the installation box connected to each other through the connecting pipe in a negative pressure state, and generate negative pressure suction. The polymer brushed off by the cleaning head can be sucked into the collection box through the through hole and the connecting pipe, avoiding the accumulation of the brushed polymer inside the etching chamber, which solves the current problem of using a vacuum pump to clean the etcher, which easily causes the polymer to block the filter while accelerating the gas flow inside the etching chamber.

[0008] In addition, the cleaning device according to the embodiment of the present invention may also have the following additional technical features:

[0009] Furthermore, the drive box includes a motor embedded inside and away from the axial direction of the cleaning head, and a gear box close to one side of the motor and located in the coaxial direction of the cleaning head and connected to the cleaning head.

[0010] Furthermore, the gear box is axially provided with a connecting hole for accommodating at least a portion of the cleaning head and the connecting pipe, and the cleaning head is connected to the connecting pipe through the connecting hole.

[0011] Furthermore, the cleaning head includes a mounting box connected to the connecting pipe, a cleaning block sleeved on a side of the mounting box away from the connecting pipe, and a plurality of inserting tubes extending from the mounting box toward the cleaning block.

[0012] Furthermore, an adapter hole for accommodating the insert tube is relatively opened on the cleaning block, and a plurality of through holes are opened at the axial edge of the installation box, and the through holes are connected to the internal space of the installation box, wherein, by starting the vacuum pump, negative pressure is generated in the collection box, and the negative pressure suction force is sequentially introduced into the drive box and the cleaning head to the through holes through the connecting pipe to suck the polymer brushed off.

[0013] Furthermore, the collection box includes a filter basket disposed internally near the vacuum pump, and a dust box located below the filter basket, and the dust box is communicated with the connecting pipe.

[0014] Furthermore, a placement groove for accommodating the cleaning head is embedded on the outside of the collection box near the air pump.

[0015] In addition, the utility model also provides an etching machine, including a cleaning device arranged on the etching machine. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 This is a schematic structural diagram of a cleaning device and an etching machine proposed in Example 1 of the present utility model;

[0017] Figure 2 This is a partial structural diagram of a cleaning device in an embodiment of the present utility model;

[0018] Figure 3 This is a schematic diagram of a portion of the internal structure of a collection box in a cleaning device proposed in an embodiment of the present utility model;

[0019] Figure 4 This is a schematic diagram of a partially exploded structure of a cleaning head in a cleaning device proposed in an embodiment of the present utility model;

[0020] Figure 5 This is a schematic diagram of part of the internal structure of a driving box in a cleaning device proposed in an embodiment of the present utility model.

[0021] Description of main component symbols:

[0022]

[0023] The following specific embodiments will further illustrate the present invention in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0024] To facilitate understanding of the present invention, a more comprehensive description of the present invention will be provided below with reference to the accompanying drawings. The drawings illustrate several embodiments of the present invention. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a more thorough and comprehensive understanding of the present invention.

[0025] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be an intermediate element. When an element is referred to as being "connected to" another element, it may be directly connected to the other element or there may be an intermediate element. The terms "vertical," "horizontal," "left," "right," and similar expressions used herein are for illustrative purposes only.

[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meanings as those commonly understood by those skilled in the art to which this invention pertains. The terms used herein in the specification of this invention are for the purpose of describing specific embodiments only and are not intended to limit this invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0027] See also Figures 1 to 5 , shown is a cleaning device in an embodiment of the present invention, including a collecting box 1 connected to the etcher 10, a connecting pipe 4 extending along the collecting box 1 toward the etching chamber of the etcher 10, a cleaning member connected to the connecting pipe 4 on a side away from the collecting box 1, and an air pump 2 at least partially embedded in the collecting box 1, the cleaning member includes a driving box 6 connected to the connecting pipe 4, a cleaning head 7 arranged on a side of the driving box 6 away from the connecting pipe 4, and a handle 5 extending outward from the outer surface of the driving box 6, and the cleaning head 7 is driven axially by the driving box 6.

[0028] Furthermore, the drive box 6 includes a motor 11 embedded in the interior and away from the axial side of the cleaning head 7, and a gear box 16 close to the side of the motor 11 and located in the coaxial direction of the cleaning head 7 and connected to the cleaning head 7. The gear box 16 is axially opened with a connecting hole for accommodating at least part of the cleaning head 7 and the connecting pipe 4, and the cleaning head 7 is connected to the connecting pipe 4 through the connecting hole. The cleaning head 7 includes a mounting box 13 connected to the connecting pipe 4, a cleaning block 15 sleeved on the side of the mounting box 13 away from the connecting pipe 4, and a plurality of inserts 14 extending from the mounting box 13 toward the cleaning block 15. The cleaning block 15 An adapter hole for accommodating the insert tube 14 is relatively opened on the upper side, and a plurality of through holes 12 are opened at the axial edge of the installation box 13, and the through holes 12 are connected to the internal space of the installation box 13, wherein, by starting the vacuum pump 2, a negative pressure is generated in the collection box 1, and the negative pressure suction force is sequentially introduced into the drive box 16 and the cleaning head 7 through the connecting pipe 4 to the through hole to suck the polymer brushed off. The collection box 1 includes a filter basket 8 arranged inside near the vacuum pump 2, and a dust box 9 located below the filter basket 8. The dust box 9 is connected to the connecting pipe 4, and a placement groove 3 for accommodating the cleaning head 7 is embedded on the outside of the collection box 1 near the vacuum pump 2.

[0029] In a specific implementation, when it is necessary to clean the inner wall surface of the etching chamber of the etcher 10, the staff can hold the handle 5 to control the cleaning head 7 to be sent into the interior of the etching chamber. In some optional embodiments, the connecting pipe 4 connecting the cleaning head 7 can be a conduit with a certain plasticity or flexibility such as a bellows or a rubber tube to ensure the flexible adjustment of the subsequent cleaning head 7. After that, the operator can start the motor 11 through the controller to drive the cleaning head 7 to rotate. In some optional embodiments, the controller can be set at any position on the cleaning device that is convenient for the operator to operate. In addition, the controller can be an MCU (Microcontroller Unit; microcontroller unit) chip, to realize the control of the heating table 13, the injection part 16 and the cylinder 17 through the MCU chip, wherein the controller and the cleaning device are electrically connected, and the electrical connection includes a wired connection and a wireless connection, and the wireless connection method includes but is not limited to Bluetooth connection, WiFi, IF radio frequency, zigbee, and the wired connection method includes but is not limited to a USB line connecting the cleaning device to the controller, and then the started motor 11 drives the gear box 16 on its side, and the gear box 16 drives the cleaning head 7 connected to its gear to rotate along its own axis, and during the process, the cleaning head 7 brushes off the polymer on the wall of the etching chamber.

[0030] Furthermore, while the cleaning head 7 is brushing off the polymer in the etching chamber, the vacuum pump 2 can be turned on by the controller. The vacuum pump 2 can put the interior of the collecting box 1 and the installation box 13 connected to each other through the connecting pipe 4 into a negative pressure state, and generate negative pressure suction. The polymer brushed off by the cleaning head 7 can be sucked into the collecting box 1 through the through hole 12 and the connecting pipe 4, avoiding the accumulation of the brushed polymer inside the etching chamber, thereby completing the cleaning of the etching chamber.

[0031] In addition, a placement slot 3 is fixedly installed on the front side of the top of the collection box 1, and the placement slot 3 is adapted to the cleaning head 7. After cleaning is completed, the cleaning head 7 can be placed inside the placement slot 3 for storage. In some optional embodiments, the cleaning block 15 can be adhered to the side of the installation box 13 where the insert tube 14 is provided by Velcro, which is convenient for replacing or cleaning the cleaning block 15, and the cleaning block 15 is limited by the insert tube 14 to ensure the stability of the cleaning block 15 after installation.

[0032] At the same time, a dust box 9 is provided at the lower inner side of the collecting box 1. The top of the dust box 9 is an open structure. The rear end of the connecting tube 4 extends to one side of the top of the dust box 9. The polymer sucked into the collecting box 1 will fall into the dust box 9 for subsequent centralized processing. In some optional embodiments, a sealed door is movably installed on one side of the collecting box 1, and the collecting box 1 can be opened to clean the dust box 9 and the filter basket 8.

[0033] In summary, the present application sends the cleaning head 7 into the interior of the etching chamber by holding the handle 5, and starts the motor 11 to drive the gear box 16 and the cleaning head 7 to rotate, so that the cleaning head 7 brushes off the polymer on the inner wall of the etching chamber, and at the same time turns on the vacuum pump 2. The vacuum pump 2 can make the collection box 1 and the installation box 13 connected to each other through the connecting pipe 4 be in a negative pressure state, and generate negative pressure suction. The polymer brushed off by the cleaning head 7 can be sucked into the collection box 1 through the through hole 12 and the connecting pipe 4, avoiding the accumulation of the brushed polymer inside the etching chamber, solving the problem that the etcher is currently cleaned by a vacuum pump, which easily causes the polymer to block the filter while accelerating the gas flow inside the etching chamber.

[0034] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0035] The above-described embodiments merely represent several implementation methods of the present invention. While the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the present invention. It should be noted that a person skilled in the art would be able to make various modifications and improvements without departing from the concept of the present invention, and these modifications and improvements fall within the scope of protection of the present invention. Therefore, the scope of protection of the present invention shall be determined by the appended claims.

Claims

1. A cleaning device, characterized in that: It includes a collection box connected to the etcher, a connecting pipe extending from the collection box toward the etching chamber of the etcher, a cleaning member connected to a side of the connecting pipe away from the collection box, and an air pump at least partially embedded in the collection box; The cleaning member includes a drive box connected to the connecting pipe, a cleaning head arranged on a side of the drive box away from the connecting pipe, and a handle extending outward from an outer surface of the drive box, and the cleaning head is driven to rotate axially by the drive box.

2. The cleaning device according to claim 1, characterized in that The driving box includes a motor embedded inside and away from the axial direction of the cleaning head, and a gear box close to one side of the motor, located in the coaxial direction of the cleaning head and connected to the cleaning head.

3. The cleaning device according to claim 2, characterized in that The gear box is axially provided with a connecting hole for accommodating at least a portion of the cleaning head and the connecting pipe, and the cleaning head is connected to the connecting pipe through the connecting hole.

4. The cleaning device according to claim 3, characterized in that The cleaning head includes a mounting box connected to the connecting pipe, a cleaning block sleeved on a side of the mounting box away from the connecting pipe, and a plurality of inserting tubes extending from the mounting box toward the cleaning block.

5. The cleaning device according to claim 4, characterized in that The cleaning block is provided with adapter holes for accommodating the insert tube, and the installation box is provided with a plurality of through holes at the axial edge thereof, and the through holes are connected with the internal space of the installation box. The vacuum pump is started to generate negative pressure in the collection box, and the negative pressure suction force is sequentially introduced into the drive box and the cleaning head through the connecting pipe to the through holes to suck the polymer dropped by the brush.

6. The cleaning device according to claim 5, characterized in that The collecting box includes a filter basket disposed inside the box near the vacuum pump, and a dust box located below the filter basket, wherein the dust box is communicated with the connecting pipe.

7. The cleaning device according to claim 6, characterized in that A placement groove for accommodating the cleaning head is embedded on the outside of the collection box near the air pump.

8. An etching machine, characterized in that: A cleaning device comprising the cleaning device according to any one of claims 1 to 7.

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