Two-stage lifting and rotating device for wafer carrying

Abstract

The utility model provides a two-stage lifting and rotating device for wafer carrying, and the device comprises a pedestal which is internally provided with a Z1-axis driving unit, a Z1-axis transmission unit, and a Z1-axis guiding unit; the Z1 lifting seat is arranged in the base in a sleeved mode, and a Z2-axis driving unit, a Z2-axis transmission unit and a Z2-axis guiding unit are arranged in the Z1 lifting seat. The rotary motion seat is of a cylindrical hollow structure and is arranged in the Z1 lifting seat in a sleeved mode. According to the device, the Z1 lifting base is arranged in the base in a sleeved mode, the rotary movement base is arranged in the Z1 lifting base in a sleeved mode, a two-stage lifting mode is achieved, large-stroke lifting can be achieved in a limited height space, and rotary movement is achieved by arranging the rotary movement base; through the optimized arrangement of the Z1-axis linear guide rail and the Z2-axis linear guide rail and the mode that the Z1-axis driving unit, the Z1-axis transmission unit, the Z1-axis guiding unit, the Z2-axis driving unit, the Z2-axis transmission unit, the Z2-axis guiding unit and other component parts are integrated, the rigidity and stability of the whole structure of the two-stage lifting device are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of semiconductor processing equipment, and in particular to a two-stage lifting and rotating device for wafer transportation. Background Art

[0002] With the development of society and advancements in technology, robots have become widely used in production, replacing or assisting humans in various tasks. In the semiconductor processing industry, robots are widely used for wafer handling and transportation. Because semiconductor processing equipment often has limited internal space, the industry demands robots that are as small as possible while maintaining functionality.

[0003] Currently, conventional wafer handling robots typically utilize a single-stage lift mechanism. Combined with the space occupied by the rotating and telescopic axes required for wafer handling, the robot's lift height rarely exceeds the robot's main body height. Increasing the robot's lift range often requires increasing the robot's main body height by the same amount, or even more. This is unacceptable for semiconductor equipment, which demands maximum compactness. Furthermore, the existing two-stage lift mechanism suffers from poor structural rigidity, limiting the load capacity of the wafer handling robot and, consequently, the performance of the other axes mounted on it.

[0004] In addition, the small operating space and low flexibility of single-stage lifting limit the robot's ability to cope with different working conditions. Increasing the stroke of single-stage lifting can only be achieved by continuously increasing the corresponding components. On the one hand, this will definitely increase the cost of the equipment. On the other hand, this will often introduce many unexpected problems, making it difficult to guarantee the reliability of the product.

[0005] Even though the existing wafer handling robot equipment adopts a two-stage lifting form, the various components are installed separately, and the guide rail layout of the wafer handling equipment has not been optimized and upgraded, resulting in poor structural rigidity of the existing wafer handling robot equipment and a certain impact on stability.

[0006] Moreover, the existing wafer handling robot equipment has poor load bearing capacity in non-movement directions. In addition, when performing rotational motion, the cables have a greater impact on the rotational motion. In some high-speed situations, the cables are easily damaged due to rapid torsion and friction. Summary of the Invention

[0007] The purpose of the present invention is to propose a two-stage lifting and rotating device for wafer transportation that can achieve large-stroke lifting in a limited height space, and by optimizing the guide rail layout, improve the rigidity and stability of the overall structure, and adopt an independent drive source to improve the applicability of the equipment under different working conditions.

[0008] To achieve the above objectives, the present invention proposes a two-stage lifting and rotating device for wafer transport, the device comprising:

[0009] A base, wherein the base includes a Z1-axis drive unit, a Z1-axis transmission unit, and a Z1-axis guide unit;

[0010] The Z1 lifting seat is mounted inside the base and performs linear lifting motion on the base. The Z1 lifting seat is equipped with a Z2-axis drive unit, a Z2-axis transmission unit, and a Z2-axis guide unit;

[0011] The rotary motion seat is a cylindrical hollow structure, which is sleeved in the Z1 lifting seat and performs lifting and rotating motion on the Z1 lifting seat.

[0012] In this specific embodiment, the height of the Z1 lifting seat is greater than or equal to the base, and the height of the rotating motion seat is greater than or equal to the Z1 lifting seat. The Z1 lifting seat and the rotating motion seat can be lifted separately or simultaneously.

[0013] In this specific embodiment, the Z1-axis driving unit is a servo motor, which provides power as a power source to drive the Z1-axis transmission unit to move; the Z2-axis driving unit is a servo motor, which provides power as a power source to drive the Z2-axis transmission unit to move.

[0014] In this specific embodiment, the base includes a first base, which is provided with a plurality of first grooves for clamping the Z1-axis drive unit, the Z1-axis transmission unit and the Z1-axis guide unit. A base top plate is provided on the top of the base, and a first entrance and exit hole is provided on the upper surface of the base top plate for the Z1 lifting base to perform linear lifting motion in the base. Base baffles are provided around the base.

[0015] In this specific embodiment, the Z1-axis transmission unit includes a Z1-axis synchronous pulley assembly and a Z1-axis ball screw. The Z1-axis synchronous pulley assembly includes a Z1-axis synchronous output wheel, a Z1-axis synchronous input wheel and a Z1-axis synchronous belt. The Z1-axis synchronous output wheel and the Z1-axis ball screw are located at the same end. The Z1-axis synchronous output wheel and the Z1-axis synchronous belt are located in the first groove at the same time. The Z1-axis synchronous input wheel and the Z1-axis drive unit are located at the same end.

[0016] In this specific embodiment, a Z1-axis ball screw is provided at the center of the Z1-axis synchronous output wheel, and a support seat is provided between the Z1-axis ball screw and the Z1-axis synchronous output wheel. The Z1-axis synchronous output wheel is fixedly connected to the Z1-axis ball screw, which can drive the Z1-axis ball screw to rotate relative to the support seat. The screw nut of the Z1-axis ball screw is fixedly connected to the Z1 lifting seat through a first connecting piece, and the Z1 lifting seat is driven to perform lifting motion through the rotation of the Z1-axis ball screw.

[0017] In this specific embodiment, the Z1-axis guide unit includes at least 4 Z1-axis linear guides, the bottom end of the Z1-axis linear guide is fixed in the first groove of the first base, and the side of the Z1-axis linear guide is also fixed on the Z1-axis guide rail mounting support. There are at least 2 Z1-axis guide rail mounting supports, and the Z1-axis guide rail mounting supports are located on the inner side of the base baffle at the same time. The Z1-axis linear guides are distributed at any two adjacent edges of the first base, and each adjacent edge is provided with at least 2 Z1-axis linear guides. The Z1-axis linear guide is provided with at least one Z1-axis guide slider, and the Z1-axis guide slider is fixed on the Z1 lifting seat to guide the lifting movement of the Z1 lifting seat.

[0018] In this specific embodiment, the Z1 lifting seat includes a second base, on which a plurality of second grooves are provided for clamping the Z2-axis drive unit, the Z2-axis transmission unit and the Z2-axis guide unit. A Z1 seat top plate is provided on the top of the Z1 lifting seat, and a second access hole is provided on the upper surface of the Z1 seat top plate for the rotating motion seat to perform lifting and rotating motion in the Z1 lifting seat. A Z2-axis guide rail mounting support is also provided on the lower surface of the Z1 seat top plate, and a Z1 seat baffle is provided around the Z1 lifting seat.

[0019] In this specific embodiment, the Z2-axis transmission unit includes a Z2-axis synchronous pulley assembly and a Z2-axis ball screw. The Z2-axis synchronous pulley assembly includes a Z2-axis synchronous output wheel, a Z2-axis synchronous input wheel and a Z2-axis synchronous belt. The Z2-axis synchronous output wheel and the Z2-axis ball screw are located at the same end. The Z2-axis synchronous output wheel and the Z2-axis synchronous belt are simultaneously located in the second groove. The Z2-axis synchronous input wheel and the Z2-axis drive unit are located at the same end. The Z2-axis ball screw is simultaneously fixed to the lower surface of the Z1 seat top plate, and the rotation of the Z2-axis ball screw drives the rotating motion seat to perform lifting and lowering movements.

[0020] In this specific embodiment, the Z2-axis guide unit includes at least two Z2-axis linear guides, the bottom end of the Z2-axis linear guide is fixed in the second groove of the second base, and the side of the Z2-axis linear guide is also fixed on the Z2-axis guide rail mounting support. There is at least one Z2-axis guide rail mounting support, and the Z2-axis guide rail mounting support is located on the inner side of the Z1 seat baffle at the same time. The Z2-axis linear guides are distributed at any two adjacent edges of the second base, and each adjacent edge is provided with at least one Z2-axis linear guide. The Z2-axis linear guide is provided with at least one Z2-axis guide slider, and the Z2-axis guide slider is fixed on the rotating motion seat to guide the lifting and lowering movement of the rotating motion seat.

[0021] In this specific embodiment, the rotary motion seat includes a rotary shaft driving component, a rotary shaft transmission component, a rotary shaft deceleration component and a rotary shaft output component.

[0022] In this specific embodiment, the rotating shaft driving component is a servo motor, which provides power as a power source to drive the rotating shaft transmission component to move, thereby driving the rotating shaft deceleration component to move. The rotating shaft deceleration component is a hollow harmonic reducer, which outputs rotational motion through the rotating shaft output component. The rotating shaft driving component is offset from the rotating motion seat.

[0023] The two-stage lifting and rotating device for wafer transport of the present invention has at least the following beneficial effects:

[0024] 1. This device realizes a two-stage lifting mode by installing the Z1 lifting seat sleeve in the base and the rotary motion seat sleeve in the Z1 lifting seat. It can achieve a large lifting stroke in a limited height space. The rotary motion seat is provided to achieve rotary motion, which ensures a compact structure and saves production costs.

[0025] 2. By optimizing the layout of the Z1-axis linear guide and the Z2-axis linear guide, and setting up the first base and the second base, some parts of the assembly are integrated, and the Z2-axis guide rail mounting bracket is added, the rigidity and stability of the overall structure of the two-stage lifting device are further improved;

[0026] 3. By setting up the Z1-axis drive unit, the Z2-axis drive unit and the rotary axis drive components, the Z1 lifting seat and the rotary motion seat each use an independent drive source, which improves the flexibility and versatility of the design. The motion axis and motion speed can be adjusted according to specific needs, thereby improving the applicability of the device under different working conditions. The Z1 lifting seat and the rotary motion seat can also be raised and lowered separately or together.

[0027] 4. By offsetting the rotating shaft drive components and adopting a hollow harmonic reducer, the cables in the rotating motion seat can pass through the inside of the rotating motion seat, reducing the risk of cable damage caused by rapid torsion and friction. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying any creative work.

[0029] Figure 1 This is a schematic diagram of the overall appearance of the two-stage lifting and rotating device of the present invention;

[0030] Figure 2 This is a schematic diagram of the motion state of the two-stage lifting and rotating device of the present invention after it has risen to its position;

[0031] Figure 3This is a schematic diagram of the overall structure of the two-stage lifting and rotating device of the present invention;

[0032] Figure 4 This is an exploded schematic diagram of the base structure of the present invention;

[0033] Figure 5 A partial perspective view of the Z1 lifting seat of the present invention;

[0034] Figure 6 This is a cross-sectional view of the two-stage lifting and rotating device of the present invention;

[0035] Figure 7 This is an exploded schematic diagram of the Z1 lift seat structure of the present invention;

[0036] Figure 8 This is a schematic diagram of the overall structure of the second mounting base of the present invention;

[0037] Figure 9 This is a schematic diagram of the structure of the Z1 lifting seat of the present invention;

[0038] Figure 10 This is a schematic structural diagram of the Z1 lifting seat portion of the present invention from another angle;

[0039] Figure 11 This is a top view of the internal layout of the two-stage lifting and rotating device of the present invention;

[0040] Figure 12 It is a schematic diagram of the overall structure of the rotary motion seat of the present invention.

[0041] In the accompanying drawings: 100, base; 101, first base; 102, base top plate; 103, base baffle; 104, first groove; 110, Z1-axis drive component; 120, Z1-axis transmission component; 121, Z1-axis synchronous pulley assembly; 1211, Z1-axis synchronous output pulley; 1212, Z1-axis synchronous belt; 1213, support seat; 1214, first connecting member; 122, Z1-axis ball screw; 130, Z1-axis guide component; 131, Z1-axis linear guide; 1311, Z1-axis guide rail mounting bracket; 132, Z1-axis guide rail slider; 200, Z1 lift seat; 201, second base; 202, Z1 seat top plate; 2021, Z2 axis guide rail mounting support; 203, Z1 seat baffle; 204, second groove; 210, Z2 axis drive component; 220, Z2 axis transmission component; 221, Z2 axis synchronous pulley assembly; 2211, Z2 axis synchronous output pulley; 2212, Z2 axis synchronous belt; 222, Z2 axis ball screw; 230, Z2 axis guide component; 231, Z2 axis linear guide; 232, Z2 axis guide rail slider; 300, rotary motion seat; 310, rotary axis drive component; 320, rotary axis transmission component; 330, rotary axis deceleration component; 340, rotary axis output component.

[0042] The purpose, features and advantages of the present invention will be further described with reference to the accompanying drawings and in conjunction with the embodiments. DETAILED DESCRIPTION

[0043] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. All other embodiments obtained by ordinary technicians in this field based on the embodiments of the present invention without making any creative efforts shall fall within the scope of protection of the present invention.

[0044] In the foregoing description of this specification, unless otherwise expressly specified or limited, terms such as "fixed," "mounted," "connected," or "connected" should be understood broadly. For example, the term "connected" can refer to a fixed connection, a removable connection, or an integral connection; a mechanical connection or an electrical connection; a direct connection or an indirect connection through an intermediary; or the internal connection between two components or the interaction between two components. Therefore, unless otherwise expressly defined in this specification, those skilled in the art will understand the specific meanings of the above terms in the present invention based on the specific circumstances.

[0045] According to the above description of this specification, those skilled in the art may also understand that the terms used below, such as "up", "down", "front", "back", "left", "right", "length", "width", "thickness", "vertical", "horizontal", "top", "bottom", "inside", etc., which indicate the orientation or position relationship, are based on the orientation or position relationship shown in the drawings of this specification. They are only for the purpose of facilitating the explanation of the scheme of the present invention and simplifying the description, rather than explicitly or implicitly indicating that the device or element involved must have the specific orientation, be constructed and operate in a specific orientation. Therefore, the above-mentioned orientation or position relationship terms cannot be understood or interpreted as limitations on the scheme of the present invention.

[0046] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only for descriptive purposes and cannot be understood as indicating or implying their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features specified as "first" and "second" may explicitly or implicitly include at least one of such features. In addition, the technical solutions between the various embodiments can be combined with each other, but this must be based on the fact that ordinary technicians in this field can implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0047] Example 1:

[0048] See also Figures 1 and 2 A two-stage lifting and rotating device for wafer handling includes a base 100 at the bottom, including a first base 101 with a plurality of first grooves 104 formed therein. A base top plate 102 is provided on the top surface of the base 100, and a first access hole (not shown) is provided on the upper surface of the base top plate 102 for linear lifting motion of the Z1 lift 200 within the base 100. Base baffles 103 are provided around the base 100. The base baffles 103 provide a sealing effect on the base 100, preventing powder and dust from entering the base 100 and preventing the base 100 from causing adverse effects on the components within the base 100 due to collisions.

[0049] See also Figures 3 to 5 Furthermore, a Z1-axis drive unit 110, a Z1-axis transmission unit 120, and a Z1-axis guide unit 130 are provided in the base 100. The Z1-axis drive unit 110, the Z1-axis transmission unit 120, and the Z1-axis guide unit 130 are clamped in the first groove 104 on the first base 101. The provision of the first base 101 improves the stability of the base 100, preventing the Z1-axis drive unit 110, the Z1-axis transmission unit 120, and the Z1-axis guide unit 130 from moving within the base 100 and causing shaking of the base 100, thereby affecting the overall operation of the device. The provision of the first groove 104 allows the Z1-axis drive unit 110, the Z1-axis transmission unit 120, and the Z1-axis guide unit 130 to sink, reducing the height, further saving space in the device, and making its structure more compact. Specifically, the Z1-axis drive unit 110 is a servo motor, which provides power as a power source to drive the Z1-axis transmission unit 120 to move. The Z1-axis transmission unit 120 transmits the power generated by the Z1-axis drive unit 110 and converts it into a force of appropriate size and direction to drive the Z1 lifting seat 200 to perform a reciprocating linear lifting motion up and down.

[0050] Furthermore, the Z1-axis transmission unit 120 includes a Z1-axis synchronous pulley assembly 121 and a Z1-axis ball screw 122. Specifically, the Z1-axis synchronous pulley assembly 121 includes a Z1-axis synchronous output pulley 1211, a Z1-axis synchronous input pulley, and a Z1-axis synchronous belt 1212. The Z1-axis synchronous output pulley and the Z1-axis ball screw are located at the same end. The Z1-axis synchronous output pulley 1211 and the Z1-axis synchronous belt 1212 are both located in the first groove 104 on the first base 101. The Z1-axis synchronous input pulley is located at the same end as the Z1-axis drive unit 110 and is mounted on the output shaft of the Z1-axis drive unit 110.

[0051] Furthermore, a Z1-axis ball screw 122 is provided at the center of the Z1-axis synchronous output wheel 1211. A support seat 1213 is provided between the Z1-axis ball screw 122 and the Z1-axis synchronous output wheel 1211. The Z1-axis synchronous output wheel 1211 is fixedly connected to the Z1-axis ball screw 122, and can drive the Z1-axis ball screw 122 to rotate relative to the support seat 1213. The screw nut of the Z1-axis ball screw 122 is fixedly connected to the Z1 lifting seat 200 via a first connecting member 1214, and the rotation of the Z1-axis ball screw 122 drives the Z1 lifting seat 200 to move up and down. Specifically, by providing the support seat 1213 at the bottom end of the Z1-axis ball screw 122, the stability of the Z1-axis ball screw 122 can be enhanced, preventing the Z1-axis ball screw 122 from shaking due to the operation of various components. The screw nut of the Z1-axis ball screw 122 is fixedly connected to the Z1 lift base 200 via a first connector 1214. Rotation of the Z1-axis ball screw 122 drives the Z1 lift base 200 to move up and down. The first connector 1214 is also fixedly connected to the Z1 base baffles 203 surrounding the Z1 lift base 200. The first connector 1214 moves up and down on the Z1-axis ball screw 122, thereby driving the Z1 lift base 200 to move up and down within the base 100.

[0052] At the same time, to ensure the accuracy of the linear motion of the Z1 lift 200 and the stability of the entire device, the Z1-axis guide unit 130 includes at least four Z1-axis linear guide rails 131. Of course, the number of Z1-axis linear guide rails 131 can be increased or decreased according to actual needs. Specifically, the bottom end of the Z1-axis linear guide rail 131 is fixed within the first groove 104 of the first base 101, and the side of the Z1-axis linear guide rail 131 is also fixed to the Z1-axis guide rail mounting support 1311. There are at least two Z1-axis guide rail mounting supports 1311, which are both located on the inner side of the base baffle 103. The Z1-axis linear guide rails 131 are distributed along any two adjacent sides of the first base 101, with at least two Z1-axis linear guide rails 131 being provided on each adjacent side. Each Z1-axis linear guide 131 is equipped with at least one Z1-axis guide slider 132. These Z1-axis guide sliders 132 are fixed to the second base 201, guiding the linear lifting motion of the Z1 lift 200. They also provide support for the entire Z1 lift 200, ensuring the accuracy of linear motion and withstanding loads in non-movement directions. The arrangement of two sets of Z1-axis linear guides 131 effectively increases the structural rigidity of the device, thereby enhancing its load capacity and balance stability. Of course, multiple sets of Z1-axis linear guides 131, including but not limited to two, can be added as needed.

[0053] See also Figure 6 and Figure 7 Furthermore, the Z1 lift base is mounted within the base 100 and moves linearly upward and downward on the base 100 through a first access hole on the base 100. Specifically, the height of the Z1 lift base 200 can be freely extended and retracted, extending beyond the base top plate 102 of the base 100 or retracting to the same height as the base top plate 102.

[0054] Furthermore, the Z1 lift base 200 includes a second base 201 having a plurality of second grooves 204 defined therein. A Z1 base top plate 202 is provided on the top of the Z1 lift base 200. A second access hole is defined on the upper surface of the Z1 base top plate 202 for the rotary motion base 300 to perform lifting and rotating motion within the Z1 lift base 200. A Z2-axis guide rail mounting support 2021 is also provided on the lower surface of the Z1 base top plate 202. Z1 base baffles 203 are provided around the Z1 lift base 200. The Z1 base baffles 203 provide a sealing function for the Z1 lift base 200. Firstly, the Z1 lift base 200 is protected from powder and dust, and secondly, it is protected from collisions that could adversely affect components within the Z1 lift base 200. Thirdly, the Z1-axis guide rail slider 132 is fixed to the outer surface of the Z1 base baffle 203, driving the Z1 lift base 200 to perform lifting and rotating motion.

[0055] See also Figure 8 Furthermore, the Z1 lift 200 is equipped with a Z2-axis drive unit 210, a Z2-axis transmission unit 220, and a Z2-axis guide unit 230. Specifically, the Z2-axis drive unit 210, Z2-axis transmission unit 220, and Z2-axis guide unit 230 are retained within a second groove 204 on the second base 201. The provision of the second base 201 improves the stability of the connection between the Z1 lift 200 and the base 100, preventing the Z2-axis drive unit 210, Z2-axis transmission unit 220, and Z2-axis guide unit 230 from moving within the Z1 lift 200, thereby improving the overall load capacity and stability of the device. The provision of the second groove 204 allows the Z2-axis drive unit 210, Z2-axis transmission unit 220, and Z2-axis guide unit 230 to sink, reducing their height, further saving space, and making the device more compact. Specifically, the Z2-axis drive unit 210 is a servo motor, which serves as a power source to drive the Z2-axis transmission unit 220. The Z2-axis transmission unit 220 transmits the power generated by the Z2-axis driving unit 210 and converts it into a force with appropriate magnitude and direction to drive the rotary motion base 300 to perform up and down reciprocating lifting motion.

[0056] See also Figures 9 to 11Furthermore, the Z2-axis transmission unit 220 includes a Z2-axis synchronous pulley assembly 221 and a Z2-axis ball screw 222. The Z2-axis synchronous pulley assembly 221 includes a Z2-axis synchronous output wheel 2211, a Z2-axis synchronous input wheel and a Z2-axis synchronous belt 2212. The Z2-axis synchronous output wheel 2211 and the Z2-axis ball screw 222 are located at the same end. The Z2-axis synchronous output wheel 2211 and the Z2-axis synchronous belt 2212 are simultaneously located in the second groove 204 of the second base 201. The Z2-axis synchronous input wheel and the Z2-axis drive unit 210 are located at the same end, which plays a certain limiting role on the Z2-axis synchronous output wheel 2211 and the Z2-axis synchronous belt 2212. The Z2-axis ball screw 222 is also fixed to the lower surface of the Z1 seat top plate 202. The Z2-axis ball screw 222 is fixedly connected to the rotary motion seat 300 through a second connecting piece (not shown), and the rotation of the Z2-axis ball screw 222 drives the rotary motion seat 300 to perform lifting and lowering movements.

[0057] See also Figure 8 Furthermore, in order to ensure the accuracy of the linear motion of the rotary motion base 300 and the stability of the entire device, the Z2-axis guide unit 230 includes at least two Z2-axis linear guide rails 231. Of course, the number of Z2-axis linear guide rails 231 can also be increased or decreased according to actual needs. Specifically, the bottom end of the Z2-axis linear guide rail 231 is fixed in the second groove 204 of the second base 201, and the Z2-axis linear guide rails 231 are distributed at any two adjacent sides of the second base 201. Each adjacent side is provided with at least one Z2-axis linear guide rail 231. The Z2-axis linear guide rail 131 is provided with at least one Z2-axis guide slider 232. The Z2-axis guide slider 232 is fixed on the rotary motion base 300, guiding the lifting and lowering motion of the rotary motion base 300 and providing a certain support for the rotary motion base 300, thereby ensuring the accuracy of the linear motion and being able to withstand the load brought by the non-movement direction. By arranging two sets of Z2-axis linear guide rails 231, the rigidity of the device structure can be effectively increased, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z2-axis linear guide rails 231 can be added according to actual needs, including but not limited to two sets of Z1-axis linear guide rails 231.

[0058] See also Figure 12 Furthermore, the present device also includes a rotary motion base 300. The rotary motion base 300 is a hollow cylindrical structure that fits within the Z1 lift base 200 and performs a lifting and rotating motion on the Z1 lift base 200. Specifically, the rotary motion base 300 performs a linear lifting and lowering motion on the Z1 lift base 200 through a second access hole in the Z1 lift base 200. The height of the rotary motion base 300 is adjustable, allowing it to extend beyond the height of the Z1 lift base 200 or to retract to a height equal to the height of the Z1 lift base 200.

[0059] Furthermore, the rotary motion base 300 includes a rotary shaft drive component 310, a rotary shaft transmission component 320, a rotary shaft reduction component 330, and a rotary shaft output component 340. Specifically, the rotary shaft drive component 310 is a servo motor that provides power as a power source to drive the rotary shaft transmission component 320, thereby driving the rotary shaft reduction component 330. The rotary shaft reduction component 330 is a hollow harmonic reducer that outputs the rotary motion through the rotary shaft output component 340.

[0060] Furthermore, the rotary shaft driving component 310 is offset from the rotary motion seat 300 , so that the cables in the rotary motion seat can pass through the interior of the rotary motion seat, reducing the risk of damage to the cables due to rapid torsion and friction.

[0061] Please refer to Figure 2 Specifically, since the Z1 lifting seat 200 is set in the base 100, it can do lifting motion relative to the base 100, and the rotating motion seat 300 is set in the Z1 lifting seat 200, it can do lifting motion relative to the Z1 lifting seat 200, thereby realizing a two-stage lifting mode, rising to the highest point such as Figure 2 As shown; at the same time, the rotary motion seat 300 is mainly a rotary motion related component, which can assist the device to achieve rotary motion.

[0062] Example 2:

[0063] In this embodiment, based on Example 1, a Z1-axis drive unit 110 and a Z1-axis guide unit 130 are provided within the base 100. These units are secured within the first recess 104 of the first base 101, enhancing the stability of the base 100 and preventing movement within the base 100, which could cause vibration and affect the overall operation of the device. Specifically, the Z1-axis drive unit 110 is a linear motor, providing power as a source. This eliminates some transmission components, reducing the overall structural volume and converting the power into a force of appropriate magnitude and direction to drive the Z1 lift base 200 in a reciprocating linear lift motion. Furthermore, the Z1-axis guide component 130 utilizes a linear bearing and guide rod configuration, suitable for bearing axial loads and torque, thereby improving the axial load-bearing capacity of the device and ensuring stable motion and precise torque transmission. Of course, in actual production, the Z1-axis driving unit 110 includes but is not limited to a linear motor.

[0064] To ensure the accuracy of the linear motion of the Z1 lift 200 and the stability of the entire device, the Z1-axis guide unit 130 includes at least four Z1-axis linear guides 131. The number of Z1-axis linear guides 131 can be increased or decreased depending on actual needs. Specifically, the bottom ends of the Z1-axis linear guides 131 are fixed within the first grooves 104 of the first base 101. The Z1-axis linear guides 131 are located along any two adjacent sides of the first base 101, with at least two Z1-axis linear guides 131 located on each adjacent side. Each Z1-axis linear guide 131 is equipped with at least one Z1-axis guide slider 132. The Z1-axis guide slider 132 is fixed to the second base 201, guiding the linear motion of the Z1 lift 200 and providing support for the entire Z1 lift 200, ensuring the accuracy of the linear motion and withstanding loads in non-movement directions. By arranging two sets of Z1-axis linear guide rails 131, the rigidity of the device structure can be effectively increased, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z1-axis linear guide rails 131 can be added according to actual needs, including but not limited to two sets of Z1-axis linear guide rails 131.

[0065] The Z1 lift base 200 is equipped with a Z2-axis drive unit 210 and a Z2-axis guide unit 230. Specifically, the Z2-axis drive unit 210 and the Z2-axis guide unit 230 are retained within the second groove 204 of the second base 201, enhancing the stability of the connection between the Z1 lift base 200 and the base 100 and preventing the Z2-axis drive unit 210 and the Z2-axis guide unit 230 from moving within the Z1 lift base 200, thereby improving the overall load capacity and stability of the device. Specifically, the Z2-axis drive unit 210 is a linear motor, providing power as a power source. This eliminates some transmission components, reducing the overall structural volume, and converts the power into a force of appropriate magnitude and direction to drive the rotary motion base 300 in a reciprocating linear lifting motion. Furthermore, the Z2-axis guide component 230 utilizes a linear bearing and guide rod design, suitable for bearing axial loads and torque, thereby improving the axial load-bearing capacity of the device, thereby ensuring stable motion and precise torque transmission. Of course, in actual production, the Z2-axis driving unit 210 includes but is not limited to a linear motor, and the Z2-axis guide component 230 is not limited to a linear bearing plus a guide rod.

[0066] Furthermore, in order to ensure the accuracy of the linear motion of the rotating motion seat 300 and the stability of the entire device, the Z2-axis guide unit 230 includes at least 2 Z2-axis linear guide rails 231. Of course, the number of Z2-axis linear guide rails 231 can be increased or decreased according to actual needs. Specifically, the bottom end of the Z2-axis linear guide 231 is fixed in the second groove 204 of the second base 201, and the side of the Z2-axis linear guide 231 is also fixed on the Z2-axis guide rail mounting support 2021. The Z2-axis guide rail mounting support 2021 is provided with at least one, and the Z2-axis guide rail mounting support 2021 is also located on the inner side of the Z1 seat baffle 203, and the Z2-axis linear guide 231 is distributed at any two adjacent edges of the second base 201, and each adjacent edge is provided with at least one Z2-axis linear guide 231, and the Z2-axis linear guide 131 is provided with at least one Z2-axis guide slider 232, and the Z2-axis guide slider 232 is fixed on the rotary motion seat 300, guiding the lifting and lowering movement of the rotary motion seat 300 and playing a certain supporting role on the rotary motion seat 300, ensuring the accuracy of the linear motion, and being able to withstand the load brought by the non-movement direction. By arranging two sets of Z2-axis linear guide rails 231, the rigidity of the device structure can be effectively increased, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z2-axis linear guide rails 231 can be added according to actual needs, including but not limited to two sets of Z1-axis linear guide rails 231.

[0067] Of course, the first embodiment and the second embodiment can be combined according to actual needs. For example, the Z1-axis drive unit 110 and the Z2-axis drive unit 210 still use the servo motor of the first embodiment as the power source, while the Z1-axis guide unit 130 and the Z2-axis guide unit 230 use linear bearings and guide rods. Alternatively, the Z1-axis drive unit 110 and the Z2-axis drive unit 210 can use the linear motor of the second embodiment as the power source, while the Z1-axis guide unit 130 and the Z2-axis guide unit 230 still use linear guides.

[0068] The above description is only a preferred embodiment of the present invention and does not limit the patent scope of the present invention. All equivalent structural transformations made by using the contents of the present invention description and drawings under the inventive concept of the present invention, or direct / indirect application in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A two-stage lifting and rotating device for wafer transportation, characterized in that: The device comprises: A base (100), wherein the base includes a Z1-axis driving unit (110), a Z1-axis transmission unit (120), and a Z1-axis guide unit (130); A Z1 lifting seat (200), the Z1 lifting seat (200) is sleeved in the base (100) and performs linear lifting motion on the base (100), and a Z2 axis driving unit (210), a Z2 axis transmission unit (220) and a Z2 axis guide unit (230) are provided in the Z1 lifting seat (200); The rotary motion seat (300) is a cylindrical hollow structure, which is sleeved in the Z1 lifting seat (200) and performs lifting and rotating motion on the Z1 lifting seat (200).

2. The two-stage lifting and rotating device for wafer transportation according to claim 1, characterized in that: The height of the Z1 lifting seat (200) is greater than or equal to the base (100), and the height of the rotating motion seat (300) is greater than or equal to the Z1 lifting seat (200). The Z1 lifting seat (200) and the rotating motion seat (300) can be lifted and lowered separately or simultaneously.

3. The two-stage lifting and rotating device for wafer transportation according to claim 1, characterized in that: The Z1-axis driving unit (110) is a servo motor, which serves as a power source to provide power and drive the Z1-axis transmission unit (120) to move; the Z2-axis driving unit (210) is a servo motor, which serves as a power source to provide power and drive the Z2-axis transmission unit (220) to move.

4. The two-stage lifting and rotating device for wafer transportation according to claim 1, characterized in that: The base (100) comprises a first base (101), the first base (101) is provided with a plurality of first grooves (104) for clamping the Z1-axis driving unit (110), the Z1-axis transmission unit (120) and the Z1-axis guide unit (130), a base top plate (102) is provided on the top of the base (100), a first access hole is provided on the upper surface of the base top plate (102), and the Z1 lifting base (200) is used for performing linear lifting motion in the base (100), and base baffles (103) are provided around the base (100).

5. The two-stage lifting and rotating device for wafer transportation according to claim 4, characterized in that: The Z1-axis transmission unit (120) comprises a Z1-axis synchronous pulley assembly (121) and a Z1-axis ball screw (122); the Z1-axis synchronous pulley assembly (121) comprises a Z1-axis synchronous output wheel (1211), a Z1-axis synchronous input wheel and a Z1-axis synchronous belt (1212); the Z1-axis synchronous output wheel (1211) and the Z1-axis ball screw (122) are located at the same end; the Z1-axis synchronous output wheel (1211) and the Z1-axis synchronous belt (1212) are simultaneously located in the first groove (104); and the Z1-axis synchronous input wheel and the Z1-axis driving unit (110) are located at the same end.

6. The two-stage lifting and rotating device for wafer transportation according to claim 5, characterized in that: The Z1-axis synchronous output wheel (1211) is provided with the Z1-axis ball screw (122) at the center thereof, and a support seat (1213) is provided between the Z1-axis ball screw (122) and the Z1-axis synchronous output wheel (1211). The Z1-axis synchronous output wheel (1211) is fixedly connected to the Z1-axis ball screw (122) and can drive the Z1-axis ball screw (122) to rotate relative to the support seat (1213). The screw nut of the Z1-axis ball screw (122) is fixedly connected to the Z1 lifting seat (200) via a first connecting member (1214), and the Z1 lifting seat (200) is driven to perform a lifting motion by the rotation of the Z1-axis ball screw (122).

7. The two-stage lifting and rotating device for wafer transport according to claim 4, characterized in that: The Z1-axis guide unit (130) includes at least four Z1-axis linear guide rails (131), the bottom ends of the Z1-axis linear guide rails (131) are fixed in the first groove (104) of the first base (101), and the side surfaces of the Z1-axis linear guide rails (131) are simultaneously fixed on the Z1-axis guide rail mounting support (1311), and the Z1-axis guide rail mounting support (1311) is provided with at least two. The Z1-axis guide rail mounting support (1311) is simultaneously located On the inner side of the base baffle (103), the Z1-axis linear guide rails (131) are distributed at any two adjacent sides of the first base (101), and at least two Z1-axis linear guide rails (131) are provided on each adjacent side. At least one Z1-axis guide rail slider (132) is provided on the Z1-axis linear guide rail (131), and the Z1-axis guide rail slider (132) is fixed on the Z1 lifting seat (200) to guide the lifting movement of the Z1 lifting seat (200).

8. The two-stage lifting and rotating device for wafer transport according to claim 1, characterized in that: The Z1 lifting seat (200) comprises a second base (201), the second base (201) is provided with a plurality of second grooves (204) for clamping the Z2-axis driving unit (210), the Z2-axis transmission unit (220) and the Z2-axis guide unit (230), the top of the Z1 lifting seat (200) is provided with a Z1 seat top plate (202), the upper surface of the Z1 seat top plate (202) is provided with a second access hole for the rotary motion seat (300) to perform lifting and rotating motion in the Z1 lifting seat (200), the lower surface of the Z1 seat top plate (202) is further provided with a Z2-axis guide rail mounting support (2021), and the Z1 lifting seat (200) is provided with Z1 seat baffles (203) around it.

9. The two-stage lifting and rotating device for wafer transportation according to claim 8, characterized in that: The Z2-axis transmission unit (220) comprises a Z2-axis synchronous pulley assembly (221) and a Z2-axis ball screw (222); the Z2-axis synchronous pulley assembly (221) comprises a Z2-axis synchronous output wheel (2211), a Z2-axis synchronous input wheel and a Z2-axis synchronous belt (2212); the Z2-axis synchronous output wheel (2211) and the Z2-axis ball screw (222) are located at the same end; the Z2-axis synchronous output wheel (2211) and the Z2-axis synchronous belt (2212) are simultaneously located in the second groove (204); the Z2-axis synchronous input wheel and the Z2-axis driving unit (210) are simultaneously located at the same end; the Z2-axis ball screw (222) is simultaneously fixed to the lower surface of the Z1 seat top plate (202); and the rotation of the Z2-axis ball screw (222) drives the rotary motion seat (300) to perform lifting motion.

10. The two-stage lifting and rotating device for wafer transportation according to claim 8, characterized in that: The Z2-axis guide unit (230) comprises at least two Z2-axis linear guide rails (231), the bottom ends of the Z2-axis linear guide rails (231) are fixed in the second groove (204) of the second base (201), and the side surfaces of the Z2-axis linear guide rails (231) are simultaneously fixed on the Z2-axis guide rail mounting support (2021), and the Z2-axis guide rail mounting support (2021) is provided with at least one Z2-axis guide rail mounting support (2021). On the inner side of the Z1 seat baffle (203), the Z2 axis linear guide rail (231) is distributed at any two adjacent sides of the second base (201), and at least one Z2 axis linear guide rail (231) is provided on each adjacent side. At least one Z2 axis guide rail slider (232) is provided on the Z2 axis linear guide rail (231), and the Z2 axis guide rail slider (232) is fixed on the rotary motion seat (300) to guide the lifting movement of the rotary motion seat (300).

11. The two-stage lifting and rotating device for wafer transport according to claim 1, characterized in that: The rotary motion seat (300) comprises a rotary shaft driving component (310), a rotary shaft transmission component (320), a rotary shaft deceleration component (330), and a rotary shaft output component (340).

12. The two-stage lifting and rotating device for wafer transport according to claim 11, characterized in that: The rotating shaft driving component (310) is a servo motor, which provides power as a power source to drive the rotating shaft transmission component (320) to move, thereby driving the rotating shaft deceleration component (330) to move. The rotating shaft deceleration component (330) is a hollow harmonic reducer, which outputs the rotating motion through the rotating shaft output component (340). The rotating shaft driving component (310) is offset from the rotating motion seat (300).

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