Exposure device

Abstract

The utility model provides an exposure device and belongs to the technical field of exposure. The exposure device comprises a workbench, a plurality of marker lamp assemblies, a plurality of auxiliary lamp assemblies, a visual assembly and an exposure assembly. Wherein the workbench comprises a preset area for placing a workpiece to be exposed; the plurality of marker lamp assemblies are arranged in a preset area, and mark points are formed on the reverse side of the to-be-exposed workpiece when the front side of the to-be-exposed workpiece is exposed; the auxiliary lamp assemblies are all arranged outside the preset area, each auxiliary lamp assembly corresponds to the corresponding marking lamp assembly, and the visual assembly is used for identifying the marking lamps, the auxiliary lamps and the marking points and speculating the correction positions of the marking points according to the relation among the marking lamps, the auxiliary lamps and the marking points. And finally, exposing the reverse side of the to-be-exposed workpiece according to the corrected mark point through the exposure assembly. The exposure device disclosed by the utility model can ensure that the relative position relation of the exposure patterns on the front and back surfaces of the workpiece to be exposed is a determined value on the premise of not stopping the exposure work, so that the production efficiency is improved.

Description

Technical Field

[0001] The utility model relates to the technical field of exposure, in particular to an exposure device. Background Art

[0002] When exposing the front and back sides of a workpiece to be exposed, according to the characteristics of the product, the relative position requirements between the front and back exposure patterns are relatively strict, and the relative position relationship between the front and back exposure patterns must be relatively accurate.

[0003] In order to achieve the above product requirements, existing exposure devices such as Figure 1 As shown, the apparatus comprises a workbench 1 for placing a workpiece 7 to be exposed, at least three marker light assemblies 2 mounted on the workbench 1, an exposure assembly 4 mounted and movable on a gantry support 3, and a vision assembly 5. After the exposure apparatus is powered on, the vision assembly 5 first determines the specific position of the marker light assembly 2 relative to the workbench 1. When the workpiece 7 coated with a photosensitive material is placed on the workbench 1 for exposure, the workpiece 7 covers the marker light assembly 2. While the exposure assembly 4 exposes the front side of the workpiece 7 according to pre-set positions and produces an exposure pattern, the marker light assembly 2 generates marking points on the back side of the workpiece 7 due to a photosensitive reaction. When the back side of the workpiece 7 is exposed, the vision assembly 5 determines the specific positions of the marking points on the workpiece 7 and, using the marking points as a reference, exposes the back side of the workpiece 7 and produces an exposure pattern. This arrangement and steps ensure that, when the front and back sides of multiple workpieces 7 are exposed sequentially, the relative positions of the exposure patterns on the front and back sides of the workpiece 7 remain constant.

[0004] However, due to the influence of factors such as the environment and table vibration, the position of the marking light assembly 2 on the workbench 1 will change, resulting in the relative positions of the exposure patterns on the front and back sides of the workpiece 7 to be exposed changing when the workpiece 7 to be exposed is exposed.

[0005] To address this issue, the prior art involves stopping the exposure process after a specific period of time. The vision component 5 then reacquires the position of the marker light assembly 2 relative to the worktable 1. The vision component 5 analyzes the reacquired position information of the marker light assembly 2 and the initial position information of the marker light assembly 2 to adjust the exposure position of the reverse exposure pattern, ensuring that the relative positions of the exposure patterns on the front and back sides of the workpiece 7 remain constant. This prior art exposure process requires stopping the exposure process and reacquiring the position information of the marker light assembly 2 relative to the worktable 1 at regular intervals, significantly impacting production efficiency. Utility Model Content

[0006] One purpose of the utility model is to solve the problem that the existing exposure device seriously affects the production efficiency in order to ensure the registration of the front and back patterns.

[0007] In particular, the present invention provides an exposure device comprising:

[0008] A workbench including a pre-set area for placing a workpiece to be exposed;

[0009] A plurality of marking light assemblies are arranged in the preset area, each of the marking light assemblies includes at least one marking light, and the marking light is used to form a marking point on the back surface of the workpiece to be exposed when the front surface of the workpiece to be exposed is exposed;

[0010] a plurality of auxiliary light assemblies, each of which is arranged outside the preset area, each of the auxiliary light assemblies corresponding to each of the marker light assemblies, each of which is arranged adjacent to the corresponding marker light assembly, and each of which includes an auxiliary light corresponding to each of the marker lights of the corresponding marker light assembly;

[0011] A motion component capable of moving relative to the workbench;

[0012] a visual component, disposed on the motion component, for identifying the positions of the marker light and the auxiliary light; and

[0013] The exposure assembly is arranged on the motion assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

[0014] Furthermore, at least three of the multiple marker light assemblies are not on the same straight line; and at least three of the multiple auxiliary light assemblies are not on the same straight line.

[0015] Furthermore, each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

[0016] Furthermore, the plurality of auxiliary lamps in each auxiliary lamp assembly are not located on the same straight line.

[0017] Furthermore, when the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

[0018] Furthermore, a barrier is provided on a side of the auxiliary light assembly close to the marker light assembly.

[0019] The utility model provides an exposure device, comprising:

[0020] A workbench, including a pre-set area for placing a workpiece to be exposed;

[0021] a plurality of lamp assemblies, each of the lamp assemblies including a marking lamp assembly and an auxiliary lamp assembly, the marking lamp assembly being arranged within the preset area, the auxiliary lamp assembly being arranged outside the preset area, each of the marking lamp assemblies including at least one marking lamp, the marking lamp being used to form a marking point on the reverse side of the workpiece to be exposed when the front side of the workpiece to be exposed is exposed, each of the auxiliary lamp assemblies including at least one auxiliary lamp, the auxiliary lamp assembly in each lamp assembly being arranged adjacent to the marking lamp assembly in the lamp assembly, such that the auxiliary lamp assembly corresponds to the marking lamp assembly;

[0022] A motion component capable of moving relative to the workbench;

[0023] a visual component, disposed on the motion component, for identifying the positions of the marker light and the auxiliary light; and

[0024] The exposure assembly is arranged on the motion assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

[0025] Furthermore, the plurality of lamp assemblies are not located on the same straight line.

[0026] Furthermore, each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

[0027] Furthermore, the multiple auxiliary lamps in each auxiliary lamp assembly are not on the same straight line.

[0028] Furthermore, when the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

[0029] Furthermore, a barrier is provided on a side of the auxiliary light assembly close to the marker light assembly.

[0030] The beneficial effects of the utility model are:

[0031] 1. The exposure device of the present invention calculates the position change (i.e., correction value) of each marker light in the marker light assembly by identifying the position change of each auxiliary light in the auxiliary light assembly, and then uses the correction value to correct the actual position of the identified marking point to obtain the corrected position of the marking point, thereby achieving registration of the front and back patterns of the workpiece to be exposed. Since the workpiece to be exposed is never covered by the auxiliary light assembly, the position change of the auxiliary light assembly can always be captured by the visual component. Therefore, the correction value can be obtained when the front side of the same workpiece to be exposed is exposed, and the correction value is used to correct the position of the marking point when the back side is exposed, ensuring that the relative position of the front and back exposure patterns is more accurate without stopping the exposure process, thereby improving production efficiency.

[0032] 2. By setting each group of marker lights to multiple, more data support is provided for the calculation of the corrected position of the marker point, making the measurement more accurate.

[0033] 3. By setting the auxiliary lights and the corresponding marker lights to be on different lines at the same time, when the auxiliary lights undergo lateral offset, vertical offset, arc offset, expansion, contraction, etc., the position change of the marker light can be calculated based on the position change of multiple auxiliary lights that are not on the same line, thereby ensuring the measurement of the corrected position of the marker point in more position change situations.

[0034] 4. A partition is set between the auxiliary light assembly and the marker light assembly to form a barrier between the auxiliary light assembly and the marker light assembly to prevent the workpiece to be exposed from blocking the auxiliary light assembly after it is turned over due to a failure of the exposure system itself or an operator's flipping error, thereby causing the visual component to be unable to capture the position change information of the auxiliary light assembly, affecting the measurement of the correction position of the mark point. BRIEF DESCRIPTION OF THE DRAWINGS

[0035] Figure 1 It is a structural schematic diagram of an existing exposure device;

[0036] Figure 2 Schematic diagram of the structure of an exposure device according to one embodiment of the present invention;

[0037] Figure 3 Schematic diagram of the structure of an exposure device according to another embodiment of the present invention;

[0038] Figure 4 is a schematic diagram of a lamp assembly according to one embodiment of the present utility model;

[0039] Figure 5 1 is a flow chart of a control method for an exposure device according to one embodiment of the present invention;

[0040] Figure 6 A flow chart of determining the relative position of a reverse pattern relative to an actual position of a marking point based on an offset of an auxiliary light assembly according to one embodiment of the present invention;

[0041] Figure 7 A flowchart of determining the relative position of a reverse pattern relative to an actual position of a marking point based on an offset of an auxiliary light assembly according to another embodiment of the present invention;

[0042] In the picture:

[0043] 100-exposure device; 1-workbench; 2-marking light assembly; 21-marking light; 3-motion assembly; 4-exposure assembly; 5-vision assembly; 6-auxiliary light assembly; 61-auxiliary light; 7-workpiece to be exposed; 8-light assembly. DETAILED DESCRIPTION

[0044] In order to make the above-mentioned objects, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. It will be understood that the specific embodiments described herein are only used to explain the present application, rather than to limit the present application. It should also be noted that, for ease of description, only some, rather than all, structures related to the present application are shown in the accompanying drawings. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without making creative work are within the scope of protection of this application.

[0045] As used herein, the terms "comprise," "comprising," and "having," and any variations thereof, are intended to cover non-exclusive inclusions. For example, a process, method, system, product, or apparatus comprising a series of steps or elements is not limited to the listed steps or elements but may optionally include steps or elements not listed, or may optionally include other steps or elements inherent to the process, method, product, or apparatus.

[0046] References herein to "embodiments" mean that a particular feature, structure, or characteristic described in connection with the embodiments may be included in at least one embodiment of the present application. The appearance of this phrase in various places in the specification does not necessarily refer to the same embodiment, nor does it constitute an independent or alternative embodiment that is mutually exclusive of other embodiments. It is understood, both explicitly and implicitly, by those skilled in the art that the embodiments described herein may be combined with other embodiments.

[0047] like Figure 2 As shown, the exposure device 100 of the present invention includes: a workbench 1, a plurality of marking light assemblies 2, a plurality of auxiliary light assemblies 6, a motion assembly 3, an exposure assembly 4 and a visual assembly 5. The workbench 1 includes a preset area for placing the workpiece 7 to be exposed. A plurality of marking light assemblies 2 are arranged in the preset area, and a plurality of auxiliary light assemblies 6 are arranged outside the preset area. When the workpiece 7 to be exposed is placed on the preset area, the workpiece 7 to be exposed will cover the marking light assembly 2, leaving the auxiliary light assembly 6 exposed. Each auxiliary light assembly 6 is arranged adjacent to the corresponding marking light assembly 2. Each marking light assembly 2 includes at least one marking light 21. When the workpiece 7 to be exposed is exposed from the front, the marking light assembly 2 covered by the workpiece 7 to be exposed forms a marking point on the back of the workpiece 7 to be exposed. In one embodiment, the workpiece 7 to be exposed is coated with a photosensitive material. After the marking light 21 is irradiated on the workpiece 7 to be exposed, the photosensitive material reacts with the light emitted by the marking light 21, leaving a marking point on the workpiece 7 to be exposed. Each auxiliary light assembly 6 corresponds to each marker light assembly 2 , and each auxiliary light assembly 6 includes an auxiliary light 61 corresponding to each marker light 21 of the corresponding marker light assembly 2 .

[0048] The motion component 3 can move relative to the workbench 1. The visual component 5 and the exposure component 4 are arranged on the motion component 3 and can move relative to the motion component 3. The visual component 5 is used to identify the positions of the marking light 21 and the auxiliary light 61 relative to the workbench 1. The exposure component 4 is used to expose the front and back sides of the workpiece 7 to be exposed. Specifically, the exposure component 4 is driven by the motion component 3 and itself according to the position information to move to the corresponding position and expose a pattern corresponding to the position information on the workpiece 7 to be exposed. Therefore, in order to accurately align the front and back patterns of the workpiece to be exposed, after exposing the front pattern, it is necessary to accurately calculate the position information of the back pattern exposure, especially after the operator manually turns over the workpiece 7 to be exposed, the placement position cannot be accurately controlled.

[0049] When the exposure device 100 begins exposure, the operator typically provides the exposure device with position information of the front and back patterns relative to the worktable. Since the position of the pattern on the workpiece 7 to be exposed does not need to be very precise, exposure of the front pattern begins immediately after the workpiece 7 to be exposed is placed. Simultaneously with the completion of the front exposure, the marking light assembly 2 illuminates a marking point on the back surface. At this point, the positional relationship of the front pattern relative to the back marking point is determined, and this relationship remains unchanged even if the workpiece 7 to be exposed is flipped over. At this point, the positional information of the back pattern relative to the worktable 1 is converted into the positional information of the back pattern relative to the marking point. After obtaining the position of the marking point, the back pattern can be accurately exposed, aligned with the front pattern.

[0050] One feasible method is to transform the reference frame. That is, after obtaining the position of the marker light 21, the position information of the reverse pattern relative to the worktable 1 is converted into the position information of the reverse pattern relative to the marker light 21. Since the positions of the marker light 21 and the marking point correspond to each other, the position information can be further converted into the position information of the reverse pattern relative to the marking point after the workpiece 7 to be exposed is turned over. As can be seen from this, if the position of the marker light 21 shifts after the position of the marker light 21 is obtained, and the position information of the reverse pattern relative to the marker light 21 is not updated, the relative positions of the front and back patterns will shift.

[0051] In this solution, an auxiliary light 61 is provided, corresponding to the marker light 21. Because the auxiliary light assembly 6 is positioned outside the pre-set area, when the workpiece 7 to be exposed is placed within the pre-set area for exposure, it will never obstruct the auxiliary light assembly 6, and the position of the auxiliary light assembly 6 relative to the workbench 1 can always be identified by the visual component 5. Furthermore, each auxiliary light assembly 6 is positioned adjacent to its corresponding marker light assembly 2. Therefore, each auxiliary light assembly 6 and its corresponding marker light assembly 2 can be roughly considered to have the same motion state and produce the same offset. Therefore, the offset of the corresponding marker light assembly 2 can be inferred based on the offset of the auxiliary light assembly 6.

[0052] Structurally, the auxiliary light assembly 6 and the marker light assembly 2 can be two separately assembled components. In order to make the offset of the auxiliary light assembly 6 and the marker light assembly 2 more similar, the auxiliary light assembly 6 and the marker light assembly can be two light sources assembled into one, or two beams of the same light source.

[0053] Specifically, the exposure process of the exposure device 100 of the present invention is as follows: First, after the exposure device 100 of the present invention is turned on and before the workpiece 7 to be exposed is placed, the vision component 5 identifies the initial position of each marker light assembly 2 and auxiliary light assembly 6 relative to the worktable 1. Next, the workpiece 7 to be exposed is placed within a predetermined area. The exposure component 4 is driven by the motion component 3 to expose the front pattern based on the position of the front pattern relative to the worktable 1. Simultaneously, since the vision component 5 is also driven by the motion component 3, when it moves near the auxiliary light assembly 6, it identifies the current position of the auxiliary light assembly 6. Because the marker light 21 is covered by the workpiece 7 to be exposed, it forms a marking point on the back surface of the workpiece 7 to be exposed. Finally, after the workpiece 7 to be exposed is turned over, the vision component 5 identifies the actual position of the marking point. Based on the initial position and the current position of the auxiliary light assembly 6, the offset of the auxiliary light assembly 6 is determined. This offset is approximately regarded as the offset of the marker light assembly 2, and the relative position of the back pattern relative to the actual position of the marking point is then determined.

[0054] Through the above-mentioned setting, when the workpiece 7 to be exposed is exposed, there is no need to stop the exposure process and re-identify the position of the marking light assembly 2 relative to the workbench 1. Instead, the actual position of the marking point is directly corrected according to the offset of the auxiliary light assembly 6, thereby ensuring the registration of the front and back patterns of the workpiece 7 to be exposed, thereby improving production efficiency.

[0055] In one embodiment, at least three of the multiple marker light assemblies 2 are not aligned in a straight line. At least three of the multiple auxiliary light assemblies 6 are not aligned in a straight line. Because the auxiliary light assemblies 6 and the marker light assemblies 2 are not aligned in a straight line, a complete two-dimensional coordinate system can be established, enabling the relative position of the reverse exposure pattern to be more accurately determined using this two-dimensional coordinate system as a reference system.

[0056] In one embodiment, each auxiliary lamp assembly 6 includes at least three auxiliary lamps 61. By providing three auxiliary lamps 61, more data support can be provided when determining the offset of the auxiliary lamp assembly 6, ensuring that the offset of the auxiliary lamp assembly 6 is determined more accurately.

[0057] In one embodiment, the auxiliary lights 61 in the same auxiliary light assembly 6 are not located on the same straight line. Since the auxiliary lights 61 are not located on the same straight line, it is convenient to identify the position changes of the auxiliary lights 61 and determine whether the auxiliary lights 61 have undergone various types of displacement, such as lateral displacement, vertical displacement, arc displacement, expansion, and contraction.

[0058] For example, in Figure 3 In the illustrated embodiment, each auxiliary light assembly 6 includes five auxiliary lights 61, with four auxiliary lights 61 arranged around a central auxiliary light 61. The surrounding auxiliary lights 61 can be positioned at the same distance from the central auxiliary light 61. Of course, in other embodiments not shown, the number of surrounding auxiliary lights 61 can be greater or lesser, and this is not a limitation. With this arrangement, the visual component 5 can clearly detect any deviation or expansion of each auxiliary light group 61.

[0059] To ensure that the marking point can always mark the workpiece 7 to be exposed and the auxiliary light 61 can always be recognized by the visual component 5, when the workpiece 7 to be exposed is placed on the workbench 1, the workpiece 7 to be exposed covers the marking light 21 and exposes the auxiliary light 61.

[0060] In one embodiment, a barrier (not shown) is provided on the side of the auxiliary light assembly 6 that is adjacent to the opposing marker light assembly 2. This barrier prevents the workpiece 7 to be exposed from blocking the auxiliary light 61 due to system failure or operator error. In another embodiment, the predetermined area for placing the workpiece 7 to be exposed can be configured as a recess, with the workpiece 7 placed within the recess and multiple auxiliary light assemblies 6 positioned around the outer edge of the recess.

[0061] Regarding the installation of the visual component 5 and the exposure component 4, in one embodiment, Figure 2As shown, the motion component 3 is a gantry bracket mounted on the workbench 1, which can move along a second direction (direction b in the figure) on the workbench 1. The vision component 5 and the exposure component 4 are mounted on the gantry bracket and can move along a first direction (direction a in the figure) perpendicular to the second direction.

[0062] In another embodiment, Figure 4 As shown, the exposure device 100 includes: a workbench 1, a plurality of lamp assemblies 8, a motion assembly 3, a vision assembly 5 and an exposure assembly 4.

[0063] The workbench 1 includes a preset area for placing the workpiece 7 to be exposed. Each of the multiple lamp assemblies 8 includes a marking lamp assembly 2 and an auxiliary lamp assembly 6. The marking lamp assembly 2 is arranged in the preset area, and the auxiliary lamp assembly 6 is arranged outside the preset area. Each marking lamp assembly 2 includes at least one marking lamp 21. The marking lamp 21 is used to form a marking point on the back side of the workpiece 7 to be exposed when the front side of the workpiece 7 to be exposed is exposed. Each auxiliary lamp assembly 6 includes at least one auxiliary lamp 61. The auxiliary lamp assembly 6 is arranged adjacent to the marking lamp assembly 2 so that the auxiliary lamp assembly 6 corresponds to the marking lamp assembly 2. The motion assembly 3 can move relative to the workbench 1. The visual assembly 5 and the exposure assembly 4 are arranged on the motion assembly 3 and can move relative to the motion assembly 3. Among them, the visual assembly 5 is used to identify the positions of the marking lamp 21 and the auxiliary lamp 61 relative to the workbench 1, and the exposure assembly 4 is used to expose the front and back sides of the workpiece 7 to be exposed.

[0064] In the exposure device 100 of the present invention, since the auxiliary lamp assembly 6 and the marker lamp assembly 2 in each lamp assembly 8 are arranged adjacent to each other, the offset of the auxiliary lamp assembly 6 is substantially consistent with the offset of the marker lamp assembly 2 in the same lamp assembly 8 .

[0065] The exposure process of the present invention is as follows: After the exposure device 100 is turned on and before the workpiece 100 is placed, the vision component 5 identifies the initial positions of the auxiliary light component 6 and the marker light component 2 relative to the worktable 1. The workpiece 7 to be exposed is then placed within a predetermined area for exposure of the front pattern. The marker light component 2 marks a marking point on the back of the workpiece 7, while the vision component 5 identifies the current position of the auxiliary light component 6. The workpiece 7 to be exposed is then turned over, and the vision component 5 identifies the actual position of the marking point. Using the initial and current positions of the auxiliary light component 6, the offset of the auxiliary light component 6 is determined, thereby determining the relative position of the back pattern relative to the actual position of the marking point.

[0066] During the exposure process, the exposure device 100 of the present invention does not need to stop the exposure process. The relative position of the reverse pattern relative to the actual position of the marking point can be directly calculated based on the offset of the auxiliary lamp assembly 6, thereby improving the production efficiency of the product.

[0067] In one embodiment, the plurality of lamp assemblies 8 are not located on the same straight line. By arranging the plurality of lamp assemblies 8 to be not located on the same straight line, a complete two-dimensional coordinate system can be established, and the relative position of the reverse pattern can be determined more accurately using the two-dimensional coordinate system as a reference system.

[0068] In one embodiment, each auxiliary light assembly 6 includes at least three auxiliary lights 61. By providing three auxiliary lights 61, more data support can be provided when determining the offset of the auxiliary light assembly 6, ensuring that the offset of the auxiliary light 61 is determined more accurately.

[0069] In one embodiment, the auxiliary lights 61 are not located on the same straight line. Therefore, the position change of the auxiliary lights 61 can be used to easily identify the type of displacement of the auxiliary lights 61, such as lateral displacement, vertical displacement, arc displacement, expansion, or contraction.

[0070] For example, in Figure 3 In the illustrated embodiment, each auxiliary light assembly 6 includes five auxiliary lights 61, four of which are arranged around a central auxiliary light 61. The surrounding auxiliary lights 61 are positioned at the same distance from the central auxiliary light 61. Of course, in other embodiments not shown, the number of surrounding auxiliary lights 61 can be greater or lesser, and this is not a limitation. With this arrangement, the visual component 5 can clearly detect any displacement or expansion of the auxiliary lights 61 in each auxiliary light assembly 6.

[0071] To ensure that the marking point can always mark the workpiece 7 to be exposed and the auxiliary light 61 can always be recognized by the visual component 5, when the workpiece 7 to be exposed is placed on the workbench 1, the workpiece 7 to be exposed covers the marking light 21 and exposes the auxiliary light 61.

[0072] In one embodiment, a barrier (not shown) is provided on the side of the auxiliary light assembly 6 that is adjacent to the marker light assembly 2. This barrier prevents the workpiece 7 to be exposed from blocking the auxiliary light 61 due to system failure or operator error. In another embodiment, the predetermined area for placing the workpiece 7 to be exposed can be configured as a recess, with the workpiece 7 placed within the recess and multiple auxiliary light assemblies 6 positioned around the outer edges of the recess.

[0073] Regarding the installation of the visual component 5 and the exposure component 4, in one embodiment, Figure 2As shown, the motion assembly 3 is a gantry mounted on the workbench 1, capable of moving along the workbench 1 in a second direction (direction b in the figure). The vision assembly 5 and exposure assembly 4 are mounted on the gantry and capable of moving along a first direction (direction a in the figure) perpendicular to the second direction. In other embodiments, the vision assembly 5 and exposure assembly 4 may be secured in other manners, which will not be further described here.

[0074] The present invention further provides a control method for the exposure device 100, the control method comprising:

[0075] Step S100 : When no workpiece 7 to be exposed is placed, the visual component 5 is controlled to identify the initial position of each marking light component 2 relative to the workbench 1 and the initial position of each auxiliary light component 6 relative to the workbench 1 .

[0076] In S100, the visual component 5 is located on the side of the marker light component 2 on the motion component 3. The motion component 3 drives the visual component 5 to move relative to the workbench 1, and stops when it is close to the marker light component 2 and the auxiliary light component 6. The visual component 5 moves along the motion component 3, and stops when it moves to the marker light component 2 to identify the position of the marker light component 2. It stops when it moves to the auxiliary light component 6 to identify the position of the auxiliary light component 6.

[0077] Step S200: When the workpiece 7 to be exposed is subjected to front pattern exposure, the visual component 5 is controlled to identify the current position of each auxiliary light component 6 relative to the workbench 1, and a marking point is formed on the back side of the workpiece 7 to be exposed.

[0078] In S200, the motion component 3 drives the exposure component 4 and the vision component 5 to perform stepping motion, and the exposure component 4 performs scanning motion to expose the front of the workpiece 7 to be exposed. When the vision component 5 moves to the auxiliary light component 6, it pauses to identify the position of the auxiliary light component 6.

[0079] Step S300: determining the offset of the auxiliary light assembly 6 according to the current position of the auxiliary light assembly 6 and the initial position of the auxiliary light 61;

[0080] Step S400: After the workpiece 7 to be exposed is turned over, the visual component 5 is controlled to identify the actual position of each marking point on the back side;

[0081] In S400 , the workpiece 7 to be exposed is turned over, and the motion component 3 drives the visual component 5 to move relative to the workbench 1 . The visual component 5 moves along the motion component 3 , and stops when the visual component 5 moves to the marking point to identify the position of the marking point.

[0082] As shown in the figure, since part of the marking light assembly 2 is set on the left side, after the workpiece 7 to be exposed is turned over, the marking point position will be in the middle or on the right side of the workbench 1. Therefore, when the moving assembly 3 moves, the initial position of the visual assembly 5 can be in the middle right position, which is convenient for quick identification of the marking point.

[0083] Step S500: determining the relative position of the reverse pattern relative to the actual position of each marking point based on the offset of the auxiliary light assembly 6;

[0084] Step S600: the exposure component 4 exposes the back surface according to the relative positions of the back surface patterns.

[0085] In S600 , the motion component 3 drives the exposure component 4 to perform stepping motion, and the exposure component 4 performs scanning motion along the motion component 3 to expose the reverse side pattern of the workpiece 7 to be exposed.

[0086] Furthermore, step S200 includes the following steps:

[0087] Step S210: When performing front pattern exposure, the exposure component 4 and the visual component 5 move relative to the workbench 1 along the first direction ( Figure 2 The visual component 5 is located on the side of the motion component 3 close to the auxiliary light component 6, and the motion component 3 drives the exposure component 4 and the visual component 5 to move along the second direction ( Figure 2 b) movement, the first direction and the second direction are perpendicular;

[0088] Step S220: When the motion component 3 moves to a position close to the auxiliary light component 6, the visual component 5 identifies the current position of the auxiliary light component 6;

[0089] Step S230: When the front pattern exposure is completed, the motion component 3 stops moving, and the visual component 5 moves along the first direction until the auxiliary light component 6 is recognized.

[0090] Since the auxiliary light assembly 6 is not on the same straight line, Figure 2 As shown in Figure 1, two auxiliary light assemblies 6 are located on the left side of the workbench. Therefore, at least one auxiliary light assembly 6 is located in the middle or to the right of workbench 1. As motion assembly 3 moves downward from top to bottom in direction b, vision assembly 5 will be positioned to the left of motion assembly 3 in order to identify auxiliary light assembly 6. Therefore, after exposure is complete, motion assembly 3 must stop, allowing vision assembly 5 to move rightward in direction a until it identifies the remaining auxiliary light assembly 6.

[0091] Step S300 includes:

[0092] Step S310: determining the offset mode and offset amount of the auxiliary light assembly 6, wherein the offset mode includes one or more of lateral offset, vertical offset, arc offset, expansion and contraction.

[0093] Step S500 includes:

[0094] Step S510: determining the actual position of the marker light assembly 2 based on the offset of the auxiliary light assembly 6;

[0095] Step S520: determining the relative position of the reverse pattern relative to the actual position of the marker light assembly 2 based on the actual position of the marker light assembly 2;

[0096] Step S530 : determining the relative position of the reverse pattern relative to the actual position of each marking point according to the relative position of the reverse pattern relative to the actual position of the marking light assembly 2 .

[0097] In another embodiment, step S500 includes:

[0098] Step S502: Correct the actual position of each marking point on the back according to the offset of the auxiliary light assembly 6, determine the corrected position of each marking point, and determine the relative position of the back pattern relative to the corrected position of each marking point according to the corrected position.

[0099] Use Figure 5 The control method shown can ensure that the relative position relationship between the exposure patterns on the front and back sides is always at a certain value when exposing the front and back sides of the exposure workpiece 7, without interrupting the test process, and meeting the product requirements. At the same time, there is no need to stop the exposure process, thereby improving the production efficiency of the product.

[0100] like Figure 6 The control method shown, after obtaining the offset of the auxiliary light assembly 6, determines the actual position of the marking light assembly 2 according to the offset of the auxiliary light assembly 6, and then determines the relative position of the reverse pattern relative to the actual position of the marking light assembly 2 according to the actual position of the marking light assembly 2, and finally determines the relative position of the reverse pattern relative to the actual position of each marking point.

[0101] like Figure 7 The control method shown corrects the actual position of the reverse marking point according to the offset of the auxiliary light assembly 6. After determining the corrected position of the marking point, the relative position of the reverse pattern relative to the corrected position of each marking point is determined based on the corrected position.

[0102] like Figure 6 and Figure 7 Both methods can determine the relative position of the reverse pattern relative to the actual position of the marking point, but the data obtained by the two are different, and can be freely selected according to actual conditions.

Claims

1. An exposure device, characterized in that: include: A workbench, including a pre-set area for placing a workpiece to be exposed; A plurality of marking light assemblies are arranged in the preset area, each of the marking light assemblies includes at least one marking light, and the marking light is used to form a marking point on the back surface of the workpiece to be exposed when the front surface of the workpiece to be exposed is exposed; a plurality of auxiliary light assemblies, each of which is arranged outside the preset area, each of the auxiliary light assemblies corresponding to each of the marker light assemblies, each of which is arranged adjacent to the corresponding marker light assembly, and each of which includes an auxiliary light corresponding to each of the marker lights of the corresponding marker light assembly; A motion component capable of moving relative to the workbench; a visual component, disposed on the motion component, for identifying positions of the marker light and the auxiliary light; and The exposure assembly is arranged on the motion assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

2. The exposure device according to claim 1, wherein Among the multiple marking light assemblies, at least three are not on the same straight line; among the multiple auxiliary light assemblies, at least three are not on the same straight line.

3. The exposure device according to claim 1, wherein Each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

4. The exposure device according to claim 3, wherein The plurality of auxiliary lamps in each auxiliary lamp assembly are not located on the same straight line.

5. The exposure device according to claim 1, wherein When the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

6. The exposure device according to claim 1, wherein A barrier piece is provided on one side of the auxiliary light assembly close to the marker light assembly.

7. An exposure device, characterized in that: include: A workbench, including a pre-set area for placing a workpiece to be exposed; a plurality of lamp assemblies, each of the lamp assemblies including a marking lamp assembly and an auxiliary lamp assembly, the marking lamp assembly being arranged within the preset area, the auxiliary lamp assembly being arranged outside the preset area, each of the marking lamp assemblies including at least one marking lamp, the marking lamp being used to form a marking point on the reverse side of the workpiece to be exposed when the front side of the workpiece to be exposed is exposed, each of the auxiliary lamp assemblies including at least one auxiliary lamp, the auxiliary lamp assembly in each lamp assembly being arranged adjacent to the marking lamp assembly in the lamp assembly, such that the auxiliary lamp assembly corresponds to the marking lamp assembly; A motion component capable of moving relative to the workbench; a visual component, disposed on the motion component, for identifying positions of the marker light and the auxiliary light; and The exposure assembly is arranged on the motion assembly and is used to expose the front and back surfaces of the workpiece to be exposed.

8. The exposure device according to claim 7, wherein The plurality of lamp assemblies are not located on the same straight line.

9. The exposure device according to claim 7, wherein Each of the auxiliary lamp assemblies includes at least three auxiliary lamps.

10. The exposure device according to claim 9, wherein The plurality of auxiliary lamps in each auxiliary lamp assembly are not arranged in the same straight line.

11. The exposure device according to claim 7, wherein When the workpiece to be exposed is placed on the workbench, the workpiece to be exposed covers the marking light and exposes the auxiliary light.

12. The exposure device according to claim 7, wherein A barrier piece is provided on one side of the auxiliary light assembly close to the marker light assembly.

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