Air conditioning device and refrigeration equipment with same

Abstract

The utility model discloses an air conditioning device and refrigeration equipment with the air conditioning device, and the air conditioning device comprises an air conditioning module which is used for preparing oxygen conditioning gas and is provided with a gas collecting cavity; the water tank is provided with a filtering area; the oxygen adjusting gas path is communicated with the gas collecting cavity and the water tank, a tail end pipe of the oxygen adjusting gas path is inserted below the liquid level of the filtering area, and the oxygen adjusting gas path is provided with a suck-back buffering cavity. According to the controlled atmosphere device and the refrigeration equipment with the controlled atmosphere device, the controlled atmosphere gas can be washed with water to wash away electrolyte particles carried in the controlled atmosphere gas, and therefore the situation that food materials are polluted due to the fact that the electrolyte particles are brought into the chamber by the controlled atmosphere gas can be prevented; when the air adjusting module stops working, the air pressure in the air adjusting module can be reduced along with the reduction of the temperature, and the problem that the solution in the water box is sucked back into the air adjusting module due to the reduction of the air pressure in the air adjusting module can be prevented by the suck-back buffer cavity in the oxygen adjusting air path.

Description

Technical Field

[0001] The present application relates to a fresh-keeping technology, and in particular to an atmosphere-controlled device and a refrigeration device having the same. Background Art

[0002] Controlled atmosphere (CA) technology, an advanced technique that effectively extends the shelf life of food by adjusting the ambient gas composition, is becoming increasingly popular. Consequently, refrigeration and freezing equipment equipped with this function are gaining popularity in the market. Different types of food require different CA environments. For example, high-oxygen environments accelerate the respiration of ingredients like fruits and vegetables, leading to a decrease in organic matter content and nutrient loss. Therefore, they are more suited to storage in low-oxygen environments. Conversely, low-oxygen environments can affect the color and taste of ingredients like meat, requiring high-oxygen storage to maintain optimal quality.

[0003] Existing gas conditioning devices usually consist of a cathode, an anode, and an electrolyte filled between them. These devices contact the air in the space through the cathode, prompting the oxygen to undergo a reduction reaction at the cathode. The specific reaction formula is: O2 + 2H2O + 4e - →4OH - At the same time, an oxidation reaction occurs at the anode to generate oxygen. The reaction formula is: 4OH - →O2+2H2O+4e - .

[0004] However, the oxygen generated by the gas-controlled device forms bubbles in the electrolyte. During the floating process, the oxygen will carry part of the electrolyte and enter the storage chamber, causing contamination to the food stored therein, posing a safety hazard. Summary of the Invention

[0005] The purpose of the present application is to provide an atmosphere-controlled device and a refrigeration device having the same, so as to solve the problem that the oxygen generated by the atmosphere-controlled device carries electrolyte into the storage compartment and easily causes contamination to the food.

[0006] To achieve one of the above-mentioned purposes, an embodiment of the present application provides an atmosphere-controlled device, comprising:

[0007] A gas-controlled module, used for preparing oxygen-controlled gas and having a gas collecting cavity;

[0008] a water tank having a filtration area;

[0009] The oxygen regulating circuit is connected with the gas collecting chamber and the water tank. The terminal pipe of the oxygen regulating circuit is inserted below the liquid level of the water tank. The oxygen regulating circuit has a back suction buffer chamber.

[0010] As a further improvement of an embodiment of the present application, the water tank has a filtering area, and the terminal pipe of the oxygen adjustment circuit is inserted below the liquid level of the filtering area.

[0011] As a further improvement of an embodiment of the present application, the effective depth of the terminal tube inserted below the liquid level in the filtration area is h, the liquid surface area of ​​the filtration area is s, and the volume of the back suction buffer chamber is v>h×s.

[0012] As a further improvement of an embodiment of the present application, the terminal tube surrounds the back-suction buffer cavity.

[0013] As a further improvement of an embodiment of the present application, the gas conditioning device further includes an exhaust pipe provided in the water tank, and the air inlet of the exhaust pipe is located below the liquid level of the filtration area.

[0014] As a further improvement of an embodiment of the present application, the exhaust pipe has an exhaust channel, and the terminal pipe includes a first tube wall and a second tube wall arranged opposite to each other, the first tube wall separates the exhaust channel from the backdraft buffer chamber, and the second tube wall is located on the side of the first tube wall away from the exhaust pipe, the depth of the first tube wall inserted below the liquid surface of the filter area is less than the depth of the second tube wall inserted below the liquid surface of the filter area, and h is the depth of the first tube wall inserted below the liquid surface of the filter area.

[0015] As a further improvement of one embodiment of the present application, the terminal tube also includes a third tube wall and a fourth tube wall, the third tube wall and the fourth tube wall are respectively connected to the first tube wall and the second tube wall, and the first tube wall, the third tube wall and the fourth tube wall are inserted into the depth below the liquid surface of the filtration area h.

[0016] As a further improvement of one embodiment of the present application, the exhaust pipe also includes a limiting wall, which is located on the side of the first tube wall away from the second tube wall, and the exhaust channel is formed between the limiting wall and the first tube wall, and the depth of the limiting wall inserted below the liquid surface of the filter area is greater than h.

[0017] As a further improvement of one embodiment of the present application, the exhaust pipe also includes a first connecting plate and a second connecting plate arranged opposite to each other, the first connecting plate and the second connecting plate respectively connecting the limiting wall and the second pipe wall, and the first connecting plate and the second connecting plate are respectively located on opposite sides of the terminal pipe.

[0018] As a further improvement of an embodiment of the present application, the terminal tube is configured as a flared tube.

[0019] As a further improvement of one embodiment of the present application, the oxygen adjustment circuit includes a connecting pipe connecting the terminal pipe and the gas adjustment module, the expanded pipe includes a first pipe section and a second pipe section, the second pipe section connects the first pipe section and the connecting pipe, and the cross-sectional area of ​​the first pipe section is greater than the cross-sectional area of ​​the second pipe section.

[0020] As a further improvement of one embodiment of the present application, the water tank also includes a liquid replenishment area and a liquid level limiting mechanism. The liquid replenishment area is connected to the gas regulation module and replenishes the gas regulation module. The liquid level limiting mechanism limits the liquid level height of the filtration area; when the liquid level of the filtration area exceeds a preset height, the solution in the filtration area that exceeds the preset height enters the liquid replenishment area.

[0021] As a further improvement of one embodiment of the present application, the water tank includes a box body and a top cover, the fluid replenishment area and the filtration area are both located in the box body, the top cover covers the box body, and the liquid level limiting mechanism is a partition provided between the fluid replenishment area and the filtration area, a fluid replenishment channel is formed between the partition and the top cover, and the fluid replenishment channel connects the fluid replenishment area and the filtration area.

[0022] As a further improvement of one embodiment of the present application, the air conditioning device further includes an exhaust pipe provided in the water tank, and the upper end of the partition is higher than the air inlet of the exhaust pipe.

[0023] As a further improvement of an embodiment of the present application, the exhaust pipe is arranged on a side of the terminal pipe away from the fluid infusion area.

[0024] As a further improvement of an embodiment of the present application, the water tank includes a water supply box and a filter box, and the terminal tube of the oxygen adjustment circuit is inserted below the liquid level of the filter box.

[0025] As a further improvement of an embodiment of the present application, the effective depth of the terminal tube inserted below the liquid level of the filter box is h', the liquid surface area of ​​the filter box is s', and the volume v of the back suction buffer chamber is greater than h'×s'.

[0026] In order to achieve one of the above-mentioned application purposes, an embodiment of the present application further provides a refrigeration device, which includes the above-mentioned gas conditioning device.

[0027] Compared with the prior art, the gas-conditioning device of the present application and the refrigeration equipment having the same, by setting the water tank, the oxygen-conditioning gas prepared by the gas-conditioning module is transported to the water tank through the oxygen-conditioning circuit. Since the terminal tube of the oxygen-conditioning circuit is inserted below the liquid level of the water tank, the oxygen-conditioning gas enters the solution in the water tank, so that the oxygen-conditioning gas can be washed with water to wash away the electrolyte particles carried in the oxygen-conditioning gas, thereby preventing the oxygen-conditioning gas from bringing the electrolyte particles into the compartment when it is sent into the compartment, so as to avoid contamination of the food in the compartment; when the electrochemical reaction occurs in the gas-conditioning module, the internal temperature of the gas-conditioning module will rise, and when the gas-conditioning module stops working, the internal air pressure will decrease as the temperature decreases, and the back-suction buffer chamber in the oxygen-conditioning circuit can prevent the solution in the water box from being back-sucked into the gas-conditioning module due to the decrease in air pressure in the gas-conditioning module. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are merely embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on the provided drawings without any creative work.

[0029] Figure 1 This is a schematic diagram of the three-dimensional structure of a refrigeration device according to an embodiment of the present application;

[0030] Figure 2 This is a schematic diagram of the three-dimensional structure of an atmosphere-controlled device according to an embodiment of the present application;

[0031] Figure 3 This is a schematic diagram of the three-dimensional structure of the gas conditioning device of the present application from another angle;

[0032] Figure 4 This is a schematic diagram of the three-dimensional structure of the gas conditioning device of the present application from another angle;

[0033] Figure 5 for Figure 4 Explosion diagram of

[0034] Figure 6 This is an exploded schematic diagram of a water tank according to an embodiment of the present application;

[0035] Figure 7 A partial cross-sectional schematic diagram of an embodiment of the present application;

[0036] Figure 8 for Figure 7 A magnified schematic diagram of part A in the middle;

[0037] Figure 9 for Figure 8A schematic plan view of the cross-sectional side of the structure shown;

[0038] Figure 10 This is a side view of a gas conditioning device according to an embodiment of the present application;

[0039] Figure 11 for Figure 10 Schematic diagram of the cross section along line BB;

[0040] Figure 12 for Figure 11 Enlarged schematic diagram of part C in the middle.

[0041] 100. Refrigeration equipment; 1. Box body; 2. Gas-conditioning device; 21. Gas-conditioning module; 211. Shell; 212. Liquid inlet; 213. Cathode; 22. Water tank; 221. Filtration area; 222. Liquid replenishment area; 2221. Liquid outlet; 223. Box body; 224. Top cover; 23. Oxygen-conditioning circuit; 231. Terminal pipe; 2311. First pipe section; 23111. First pipe wall; 23112. Second pipe wall; 23113. Third pipe wall; 23114. Fourth pipe wall; 2312. Second pipe section; 232. Backdraft buffer chamber; 233. Connecting pipe; 24. Exhaust pipe; 241. Exhaust channel; 242. Air inlet; 243. Limiting wall; 244. First connecting plate; 245. Second connecting plate; 25. Partition; 251. Liquid replenishment channel; 26. Liquid replenishment port. DETAILED DESCRIPTION

[0042] In the various figures of the present application, for the sake of convenience, some dimensions of structures or parts are exaggerated relative to other structures or parts, and therefore, are only used to illustrate the basic structure of the subject matter of the present application.

[0043] It should be understood that although the terms "first", "second", "third", etc. may be used in this article to describe various elements, structures or parameters, these described objects should not be limited by these terms. These terms are only used to distinguish these described objects from each other.

[0044] Ginseng Figure 1 As shown, an embodiment of the present application provides a refrigeration device 100, including a box body 1, wherein the box body 1 has a compartment.

[0045] The compartment can be either a low-oxygen compartment or a high-oxygen compartment. A low-oxygen compartment has an oxygen concentration lower than that of air, while a high-oxygen compartment has an oxygen concentration higher than that of air. Both high-oxygen and low-oxygen environments can improve food preservation.

[0046] Among them, the low-oxygen environment can inhibit the aerobic respiration of fruits and vegetables, reduce the consumption of organic matter such as sugar, and minimize their anaerobic respiration to prevent anaerobic respiration from producing substances such as alcohol and affecting the quality of fruits and vegetables.

[0047] In a high-oxygen environment, not only can the growth and reproduction of anaerobic bacteria be inhibited, but the higher concentration of oxygen can also combine with the deoxymyoglobin on the surface of the muscle to form a thicker oxymyoglobin layer, thereby maintaining the bright red color of the meat ingredients, improving the color stability of the meat ingredients, and thus improving the preservation effect of the meat ingredients.

[0048] Ginseng Figures 2 to 12 As shown, the refrigeration equipment 100 further includes an air conditioning device 2 .

[0049] When the gas-conditioning device 2 is used in a hypoxic compartment, the gas-conditioning device 2 is configured to consume oxygen in the hypoxic compartment.

[0050] When the atmosphere-control device 2 is used in a high-oxygen compartment, the atmosphere-control device 2 is configured to supply oxygen to the high-oxygen compartment.

[0051] In this way, when the refrigeration equipment 100 has both a high-oxygen compartment and a low-oxygen compartment, the gas conditioning device 2 can increase the oxygen concentration in the high-oxygen compartment while reducing the oxygen concentration in the low-oxygen compartment.

[0052] refer to Figures 2 to 5 As shown, the gas conditioning device 2 includes a gas conditioning module 21 , a water tank 22 and an oxygen conditioning circuit 23 .

[0053] The gas-adjusting module 21 is used to prepare oxygen-adjusting gas, and the gas-adjusting module 21 has a gas collecting cavity, and the oxygen-adjusting gas prepared by the gas-adjusting module 21 is collected in the gas collecting cavity.

[0054] Ginseng Figures 6 to 9 As shown, the oxygen regulating circuit 23 connects the gas collecting cavity and the water tank 22 , the terminal tube 231 of the oxygen regulating circuit 23 is inserted below the liquid level of the water tank 22 , and the oxygen regulating circuit 23 has a back suction buffer cavity 232 .

[0055] By setting the water tank 22 and the filtering area 221, the oxygen-regulated gas prepared by the gas-regulated module 21 is transported to the water tank 22 through the oxygen-regulated circuit 23. Since the terminal tube 231 of the oxygen-regulated circuit 23 is inserted below the liquid level of the water tank 22, the oxygen-regulated gas enters the solution in the water tank 22. In this way, the oxygen-regulated gas can be washed with water to wash away the electrolyte particles carried in the oxygen-regulated gas, thereby preventing the oxygen-regulated gas from bringing the electrolyte particles into the compartment when it is sent into the compartment, so as to avoid contamination of the food in the compartment; when the electrochemical reaction occurs in the gas-regulated module 21, the internal temperature thereof will rise. When the gas-regulated module 21 stops working, the internal air pressure thereof will decrease as the temperature decreases. The back-inhalation buffer chamber 232 in the oxygen-regulated circuit 23 can prevent the solution in the water tank 22 from being back-inhaled into the gas-regulated module 21 due to the decrease in air pressure in the gas-regulated module 21.

[0056] In this embodiment, the solution is water, and the oxygen-adjusting gas is washed with water to remove the electrolyte particles carried in the oxygen-adjusting gas, so that the electrolyte particles are dissolved in the water.

[0057] Ginseng Figures 6 to 9 As shown, in one embodiment, the water tank 22 has a filter area 221, and the terminal tube 231 of the oxygen adjustment circuit 23 is inserted below the liquid level of the filter area 221. That is, the filter area 221 is integrated into the water tank 22. In this way, the liquid level of the filter area 221 can be adjusted using the water in the water tank 22. In addition, the oxygen-adjusting gas prepared by the gas adjustment module 21 is transported to the filter area 221 through the oxygen adjustment circuit 23 and enters the solution in the filter area 221 to achieve water washing of the oxygen-adjusting gas to wash away the electrolyte particles carried in the oxygen-adjusting gas, thereby preventing the oxygen-adjusting gas from bringing electrolyte particles into the compartment when it is delivered to the compartment, so as to avoid contamination of the food in the compartment.

[0058] The effective depth of the terminal tube 231 inserted below the liquid level in the filtration zone 221 is h, the liquid surface area of ​​the filtration zone 221 is s, and the volume v of the back-suction buffer chamber 232 is greater than h×s. The effective depth of the terminal tube 231 inserted below the liquid level in the filtration zone 221 refers to the distance from the closest point of the terminal tube wall of the terminal tube 231 to the liquid level.

[0059] By limiting the relationship between the volume v of the back-suction buffer chamber 232, the effective depth h of the terminal tube 231 inserted below the liquid level of the filter area 221, and the liquid surface area s of the filter area 221, v>h×s, even if the water in the filter area 221 is back-suctioned, the volume of the back-suctioned water is smaller than the volume of the back-suction buffer chamber 232, and the back-suctioned water will be stored in the back-suction buffer chamber 232. In this way, the back-suctioned water can be prevented from being back-suctioned into the gas-conditioning module 21; when the gas-conditioning module 21 starts to work, the temperature inside it rises, and the air pressure rises accordingly, the water in the back-suction buffer chamber 232 will flow back into the filter area 221 under the action of the air pressure.

[0060] In another embodiment, the water tank 22 includes a water supply box and a filter box, and the terminal tube 231 of the oxygen control circuit 23 is inserted below the liquid level of the filter box. In this way, the water supply box and the filter box can be provided separately and not connected to each other. Of course, the water supply box and the filter box can also be connected together, but the two are isolated from each other. This facilitates processing.

[0061] The effective depth of the terminal tube 231 inserted below the liquid level of the filter cartridge is h', the liquid surface area of ​​the filter cartridge is s', and the volume v of the back-suction buffer chamber 232 is greater than h'×s'. The effective depth of the terminal tube 231 inserted below the liquid level of the filter cartridge refers to the distance from the closest point of the terminal tube wall of the terminal tube 231 to the liquid surface.

[0062] By limiting the volume v of the back-suction buffer chamber 232, the effective depth h' of the terminal tube 231 inserted below the liquid surface of the filter box, and the liquid surface area s' of the filter box, the relationship between v>h'×s' is satisfied. In this way, even if the water in the filter box is back-suctioned, the volume of the back-suction buffer chamber 232 is smaller than the volume of the back-suction buffer chamber 232, and the back-suctioned water will be stored in the back-suction buffer chamber 232. In this way, the back-suctioned water can be prevented from being back-suctioned into the gas-regulating module 21. When the gas-regulating module 21 starts to work, the temperature inside it rises, and the air pressure rises accordingly. The water in the back-suction buffer chamber 232 will flow back into the filter box under the action of the air pressure.

[0063] The terminal pipe 231 is located in the water tank 22 , that is, the terminal pipe 231 is the pipe section of the oxygen adjustment circuit 23 located in the water tank 22 , so that the oxygen adjustment gas is easily sent into the water in the filter area 221 for washing and filtration.

[0064] Ginseng Figure 2 As shown, the oxygen regulating circuit 23 further includes a connecting pipe 233 connecting the terminal pipe 231 and the gas regulating module 21 , and the connecting pipe 233 is located outside the water tank 22 .

[0065] Ginseng Figures 6 to 9 As shown, in one embodiment, the terminal tube 231 encloses the back-suction buffer chamber 232. That is, the back-suction buffer chamber 232 is located within the terminal tube 231. As a result, when the temperature and pressure within the controlled atmosphere module 21 rise, the water in the back-suction buffer chamber 232 flows smoothly back into the filtration area 221 under the influence of the pressure, significantly reducing the risk of water being back-suctioned into the controlled atmosphere module 21.

[0066] In other embodiments, the back-suction buffer chamber 232 may also be formed in the connecting pipe 233 .

[0067] Ginseng Figures 6 to 9 As shown, the gas conditioning device 2 further includes an exhaust pipe 24 provided in the water tank 22. The exhaust pipe 24 has an exhaust passage 241. The air inlet 242 of the exhaust pipe 24 is located below the liquid level of the filter area 221. In this way, the oxygen-controlled air flow after washing through the filter area 221 can be delivered to the chamber through the exhaust pipe 24.

[0068] Ginseng Figures 7 to 12 As shown, the terminal tube 231 includes a first tube section 2311, and the first tube section 2311 includes a first tube wall 23111 and a second tube wall 23112 arranged opposite to each other. The first tube wall 23111 separates the exhaust channel 241 from the back suction buffer chamber 232, and the second tube wall 23112 is located on the side of the first tube wall 23111 away from the exhaust pipe 24. The depth of the first tube wall 23111 inserted below the liquid level of the filter area 221 is less than the depth of the second tube wall 23112 inserted below the liquid level of the filter area 221. The effective depth h of the terminal tube 231 inserted below the liquid level of the filter area 221 is the depth of the first tube wall 23111 inserted below the liquid level of the filter area 221.

[0069] That is, the exhaust channel 241 and the back-inhalation buffer chamber 232 are arranged adjacent to each other and are separated by the first tube wall 23111. In other words, the terminal tube 231 and the exhaust pipe 24 share the first tube wall 23111. Thus, the air inlet 242 of the exhaust pipe 24 is located at the first tube wall 23111.

[0070] In this way, through the structural design of the exhaust pipe 24 and the terminal pipe 231, the oxygen-adjusted air flow in the water entering the filter area 221 can be washed to remove electrolyte particles and then float into the exhaust channel 241, and then be sent into the chamber through the exhaust pipe 24.

[0071] Ginseng Figures 6 to 9As shown, the first pipe section 2311 also includes a third pipe wall 23113 and a fourth pipe wall 23114, and the third pipe wall 23113 and the fourth pipe wall 23114 are respectively connected to the first pipe wall 23111 and the second pipe wall 23112, and the first pipe wall 23111, the third pipe wall 23113 and the fourth pipe wall 23114 are inserted into the depth below the liquid level of the filter area 221 is h.

[0072] In this way, it can be ensured that the oxygen-adjusted airflow after water washing can float up from the first tube wall 23111, the third tube wall 23113 and the fourth tube wall 23114 into the exhaust channel 241, and the oxygen-adjusted airflow after water washing is prevented from floating up to the side of the second tube wall 23112, thereby increasing the air flow rate of the oxygen-adjusted airflow entering the chamber.

[0073] Ginseng Figures 6 to 9 As shown, the exhaust pipe 24 further includes a limiting wall 243 located on the side of the first tube wall 23111 facing away from the second tube wall 23112. The limiting wall 243 and the first tube wall 23111 form the exhaust channel 241, and the depth of the limiting wall 243 inserted below the liquid level in the filter area 221 is greater than the depth h of the first tube wall 23111 inserted below the liquid level in the filter area 221. In this way, the limiting wall 243 can restrict the flow direction of the conditioning airflow after water washing, facilitating the smooth entry of the conditioning airflow from the first tube wall 23111 into the exhaust channel 241.

[0074] In this embodiment, the depth of the limiting wall 243 inserted below the liquid level in the filtering area 221 is consistent with the depth of the second tube wall 23112 inserted below the liquid level in the filtering area 221 .

[0075] Ginseng Figures 6 to 9 As shown, the exhaust pipe 24 further includes a first connecting plate 244 and a second connecting plate 245 disposed opposite each other. The first connecting plate 244 and the second connecting plate 245 respectively connect the limiting wall 243 and the second pipe wall 23112. The first connecting plate 244 and the second connecting plate 245 are located on opposite sides of the terminal pipe 231. In this way, the space between the outside of the terminal pipe 231 and the exhaust pipe 24 can form an exhaust channel 241, allowing the conditioned airflow after water washing to enter the exhaust channel 241 from the first pipe wall 23111, the third pipe wall 23113, or the fourth pipe wall 23114, thereby improving exhaust efficiency.

[0076] In this embodiment, the cross-sectional area of ​​the terminal tube 231 remains constant as the liquid level in the filtration zone 221 decreases. This allows the diameter of the terminal tube 231 to be smaller, thereby minimizing the space it occupies and the volume of the gas conditioning device 2, and facilitating manufacturing.

[0077] The first tube wall 23111 , the second tube wall 23112 , the third tube wall 23113 , and the fourth tube wall 23114 together form the back-suction buffer chamber 232 .

[0078] In this embodiment, the cross section of the terminal tube 231 is square, which is convenient for processing.

[0079] Ginseng Figures 7 to 12 As shown, in another embodiment, the terminal tube 231 is configured as a flared tube, which is conducive to forming a back-suction buffer.

[0080] In a specific embodiment, the cross-sectional area of ​​the terminal tube 231 gradually increases along the direction in which the liquid level in the filtration area 221 decreases.

[0081] Specifically, along the direction in which the liquid level in the filtration area 221 decreases, the first tube wall 23111 and the second tube wall 23112 gradually move away from each other, and / or the third tube wall 23113 and the fourth tube wall 23114 gradually move away from each other.

[0082] Ginseng Figures 6 to 9 As shown, in another specific embodiment, the flared pipe further includes a second pipe segment 2312, which connects the first pipe segment 2311 and the connecting pipe 233. The cross-sectional area of ​​the first pipe segment 2311 is larger than the cross-sectional area of ​​the second pipe segment 2312. The first pipe segment 2311 and the second pipe segment 2312 together enclose the backdraft buffer chamber 232.

[0083] Specifically, along the direction in which the liquid level in the filtration area 221 decreases, that is, along the direction approaching the first pipe section 2311 , the cross-sectional area of ​​the second pipe section 2312 gradually increases.

[0084] Along the direction in which the liquid level in the filtering area 221 decreases, the cross-sectional area of ​​the first pipe section 2311 can be set to remain unchanged or to gradually increase.

[0085] Ginseng Figures 7 to 12As shown, the water tank 22 also includes a liquid replenishing area 222 and a liquid level limiting mechanism. The liquid replenishing area 222 is connected to the gas regulating module 21 and replenishes the gas regulating module 21. The liquid level limiting mechanism limits the liquid level height of the filtering area 221; when the liquid level of the filtering area 221 exceeds a preset height, the solution exceeding the preset height in the filtering area 221 enters the liquid replenishing area 222.

[0086] This can prevent the liquid level in the filter area 221 from being too high, thereby preventing too much solution from entering the back-sucking buffer chamber 232 from the filter area 221 during back-sucking, thereby preventing the solution from entering the gas-controlled module 21.

[0087] Combine Figures 1 to 12 As shown, specifically, the water tank 22 includes a box body 223 and a top cover 224, the fluid replenishment area 222 and the filtration area 221 are both located in the box body 223, the top cover 224 covers the box body 223, and the liquid level limiting mechanism is a partition 25 provided between the fluid replenishment area 222 and the filtration area 221, a fluid replenishment channel 251 is formed between the partition 25 and the top cover 224, and the fluid replenishment channel 251 connects the fluid replenishment area 222 and the filtration area 221.

[0088] In this way, the height of the partition 25 limits the preset height of the liquid level in the filtration area 221; when the liquid level in the filtration area 221 is higher than the upper end of the partition 25, the solution in the filtration area 221 that exceeds the partition 25 will enter the filtration area 222 from the filtration channel 251 formed between the partition 25 and the top cover 224, thereby preventing the liquid level in the filtration area 221 from being too high.

[0089] The upper end of the partition 25 is higher than the air inlet 242 of the exhaust pipe 24 , so as to prevent the water-washed conditioning airflow from entering the rehydration area 222 from the rehydration channel 251 formed between the partition 25 and the top cover 224 .

[0090] The exhaust pipe 24 is arranged on the side of the terminal pipe 231 away from the fluid replenishment area 222. In this way, the water-washed conditioning air flow can be prevented from entering the fluid replenishment area 222 and affecting the air pressure of the fluid replenishment area 222, thereby affecting the fluid replenishment in the fluid replenishment area 222.

[0091] See Figures 2 to 3 The water tank 22 is further provided with a liquid replenishing port 26 , and the liquid replenishing port 26 is provided in the liquid replenishing area 222 .

[0092] Specifically, the liquid inlet 26 is provided on the top cover 224 , and a user can add water into the liquid inlet area 222 through the liquid inlet 26 so that the liquid inlet area 222 has an appropriate amount of water.

[0093] See Figures 2 to 5 As shown in the figure, the gas-controlled module 21 includes a shell 211, an electrolyte holding chamber is formed inside the shell 211, and the electrolyte holding chamber is filled with electrolyte. A liquid inlet 212 is provided on the shell 211, and the liquid outlet 2221 of the replenishing area 222 can be connected to the liquid inlet 212 through a pipeline, thereby realizing the electrolyte replenishing operation of the gas-controlled module 21.

[0094] The atmosphere-control device 2 further includes a power supply and a controller, and the controller is connected to the atmosphere-control module 21 .

[0095] Combine Figures 2 to 5 As shown in , the gas-controlled module 21 further includes at least one anode and at least one cathode 213 , wherein the anode is controllably connected to the positive pole of the power supply, and the cathode 213 is controllably connected to the negative pole of the power supply.

[0096] In this way, when the gas-conditioning module 21 is running, under the control of the controller, the positive pole of the power supply is connected to the anode and the negative pole of the power supply is connected to the cathode 213, that is, the power supply supplies power to the gas-conditioning module 21; and when the controller controls the gas-conditioning module 21 to stop running, under the control of the controller, the positive pole of the power supply is cut off from the connection with the anode, and the negative pole of the power supply is cut off from the connection with the cathode 213, that is, the power supply stops supplying power to the gas-conditioning module 21.

[0097] The cathode 213 and the anode are spaced apart, the anode is arranged in the electrolyte holding cavity, and the shell 211 is provided with an opening area for exposing the surface of the cathode 213 to the outside. The first side of the cathode 213 is exposed to the inner cavity, and the second side is exposed to the external air of the gas conditioning module 21 from the opening area.

[0098] When the gas conditioning module 21 is in operation, that is, when powered on, the cathode 213 is used to consume oxygen in the external air of the gas conditioning module 21 through an electrochemical reaction. Specifically, the oxygen in the air undergoes a reduction reaction at the cathode 213, and the reaction formula is O2+2H2O+4e - →4OH - , so that the oxygen content outside the shell 211 can be reduced, so that the oxygen-poor fresh-keeping atmosphere is formed outside the gas-controlled module 21; one or both sides of the anode are exposed to the electrolyte holding chamber, and the anode is used to generate oxygen in the electrolyte holding chamber through electrochemical reaction to form an oxygen-rich fresh-keeping atmosphere. Specifically, the OH generated by the cathode 213 - An oxidation reaction may occur at the anode to generate oxygen, with the reaction formula being 4OH - →O2+2H2O+4e -The generated oxygen is collected to form an oxygen-rich preservation atmosphere.

[0099] The oxygen generated by the anode of the gas-conditioning module 21 is collected in the gas collecting cavity and then passed into the filter area 221 of the water tank 22 through the oxygen-conditioning path 23 to wash the oxygen with water and remove electrolyte particles carried in the oxygen.

[0100] The cathode 213 and the anode can both be configured as plate-shaped, wherein the anode plate disposed inside the shell 211 can be further provided with a plurality of through holes to increase the surface area of ​​the anode and allow the electrolyte or bubbles in the electrolyte holding chamber to pass through.

[0101] In summary, the gas-conditioning device 2 of the present application and the refrigeration equipment 100 having the same are provided with the water tank 22 and the filtering area 221. The oxygen-conditioning gas prepared by the gas-conditioning module 21 is transported to the water tank 22 via the oxygen-conditioning circuit 23. Since the terminal tube 231 of the oxygen-conditioning circuit 23 is inserted below the liquid level of the water tank 22, the oxygen-conditioning gas enters the solution of the water tank 22. In this way, the oxygen-conditioning gas can be washed with water to remove the electrolyte particles carried in the oxygen-conditioning gas, thereby It can prevent the oxygen-adjusting gas from bringing electrolyte particles into the compartment when it is sent into the compartment, so as to avoid contamination of the food in the compartment; when the gas-adjusting module 21 undergoes an electrochemical reaction, the internal temperature thereof will rise. When the gas-adjusting module 21 stops working, the internal air pressure thereof will decrease as the temperature decreases. The back-inhalation buffer chamber 232 in the oxygen-adjusting circuit 23 can prevent the solution in the water tank 22 from being back-inhaled into the gas-adjusting module 21 due to the decrease in air pressure in the gas-adjusting module 21.

[0102] It should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each implementation method can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.

[0103] The series of detailed descriptions listed above are only specific descriptions of feasible implementation methods of this application. They are not intended to limit the scope of protection of this application. Any equivalent implementation methods or changes that do not deviate from the technical spirit of this application should be included in the scope of protection of this application.

Claims

1. A gas conditioning device (2), characterized in that: include: A gas-conditioning module (21) is used for preparing oxygen-conditioning gas and has a gas collecting cavity; water tank (22); The oxygen regulating circuit (23) is connected to the gas collecting chamber and the water tank (22). The terminal pipe (231) of the oxygen regulating circuit (23) is inserted below the liquid level of the water tank (22). The oxygen regulating circuit (23) has a back suction buffer chamber (232).

2. The gas conditioning device (2) according to claim 1, characterized in that The water tank (22) has a filter area (221), and the terminal pipe (231) of the oxygen regulating circuit (23) is inserted below the liquid level of the filter area (221).

3. The gas conditioning device (2) according to claim 2, characterized in that: The effective depth of the terminal tube (231) inserted below the liquid level of the filter area (221) is h, the liquid surface area of ​​the filter area (221) is s, and the volume v of the back-suction buffer chamber (232) is greater than h×s.

4. The gas conditioning device (2) according to claim 2, characterized in that The terminal tube (231) surrounds the back-suction buffer chamber (232).

5. The gas conditioning device (2) according to claim 4, characterized in that: It also includes an exhaust pipe (24) provided on the water tank (22), wherein the air inlet (242) of the exhaust pipe (24) is located below the liquid level of the filtering area (221).

6. The gas conditioning device (2) according to claim 5, characterized in that The exhaust pipe (24) has an exhaust channel (241), and the terminal pipe (231) includes a first tube wall (23111) and a second tube wall (23112) arranged opposite to each other. The first tube wall (23111) separates the exhaust channel (241) from the back-suction buffer chamber (232). The second tube wall (23112) is located on the side of the first tube wall (23111) facing away from the exhaust pipe (24). The depth of the first tube wall (23111) inserted below the liquid level of the filter area (221) is less than the depth of the second tube wall (23112) inserted below the liquid level of the filter area (221). h is the depth of the first tube wall (23111) inserted below the liquid level of the filter area (221).

7. The gas conditioning device (2) according to claim 6, characterized in that The terminal tube (231) further comprises a third tube wall (23113) and a fourth tube wall (23114), wherein the third tube wall (23113) and the fourth tube wall (23114) are respectively connected to the first tube wall (23111) and the second tube wall (23112), and the first tube wall (23111), the third tube wall (23113) and the fourth tube wall (23114) are inserted into the filtration area (221) to a depth of h below the liquid level.

8. The gas conditioning device (2) according to claim 6, characterized in that The exhaust pipe (24) further comprises a limiting wall (243), the limiting wall (243) being located on a side of the first pipe wall (23111) facing away from the second pipe wall (23112), the exhaust channel (241) being formed between the limiting wall (243) and the first pipe wall (23111), and the limiting wall (243) being inserted below the liquid level of the filter area (221) to a depth greater than h.

9. The gas conditioning device (2) according to claim 8, characterized in that The exhaust pipe (24) further comprises a first connecting plate (244) and a second connecting plate (245) arranged opposite to each other, wherein the first connecting plate (244) and the second connecting plate (245) respectively connect the limiting wall (243) and the second pipe wall (23112), and the first connecting plate (244) and the second connecting plate (245) are respectively located on opposite sides of the terminal pipe (231).

10. The gas conditioning device (2) according to claim 2, characterized in that: The terminal tube (231) is configured as a flared tube.

11. The gas conditioning device (2) according to claim 10, characterized in that: The oxygen regulating circuit (23) comprises a connecting pipe (233) connecting the terminal pipe (231) and the gas regulating module (21); the flared pipe comprises a first pipe section (2311) and a second pipe section (2312); the second pipe section (2312) connects the first pipe section (2311) and the connecting pipe (233); the cross-sectional area of ​​the first pipe section (2311) is greater than the cross-sectional area of ​​the second pipe section (2312).

12. The gas conditioning device (2) according to claim 2, characterized in that: The water tank (22) further comprises a liquid replenishing area (222) and a liquid level limiting mechanism. The liquid replenishing area (222) is connected to the gas regulating module (21) and replenishes the gas regulating module (21). The liquid level limiting mechanism limits the liquid level of the filtration area (221). When the liquid level of the filtration area (221) exceeds a preset height, the solution in the filtration area (221) that exceeds the preset height enters the liquid replenishing area (222).

13. The gas conditioning device (2) according to claim 12, characterized in that: The water tank (22) comprises a box body (223) and a top cover (224); the fluid replenishment area (222) and the filtration area (221) are both located in the box body (223); the top cover (224) covers the box body (223); the liquid level limiting mechanism is a partition (25) provided between the fluid replenishment area (222) and the filtration area (221); a fluid replenishment channel (251) is formed between the partition (25) and the top cover (224); and the fluid replenishment channel (251) connects the fluid replenishment area (222) and the filtration area (221).

14. The gas conditioning device (2) according to claim 13, characterized in that It also includes an exhaust pipe (24) arranged on the water tank (22), and the upper end of the partition (25) is higher than the air inlet (242) of the exhaust pipe (24).

15. The gas conditioning device (2) according to claim 14, characterized in that The exhaust pipe (24) is arranged on a side of the terminal pipe (231) away from the fluid replenishment area (222).

16. The gas conditioning device (2) according to claim 1, characterized in that The water tank (22) includes a water supply box and a filter box, and the terminal pipe (231) of the oxygen regulating circuit (23) is inserted below the liquid level of the filter box.

17. The gas conditioning device (2) according to claim 16, characterized in that The effective depth of the terminal tube (231) inserted below the liquid level of the filter box is h', the liquid surface area of ​​the filter box is s', and the volume v of the back-suction buffer chamber (232) is greater than h'×s'.

18. A refrigeration device (100), characterized in that: It comprises the gas conditioning device (2) as claimed in any one of claims 1 to 17.

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