Isolation assembly for isolating intercommunication of chambers of chemical vapor deposition equipment

Abstract

The utility model discloses an isolation assembly for isolating intercommunication of chambers of chemical vapor deposition equipment. The isolation assembly comprises a valve port, a valve plate, a transmission part, an air cylinder and a mounting support, the mounting support is arranged on a cavity body of the load locking cavity, the air cylinder is fixed on the mounting support, the air cylinder is obliquely arranged on the cavity body of the load locking cavity, the transmission part is fixed on a piston rod of the air cylinder, the valve plate is arranged at one end, far away from the air cylinder, of the transmission part, and the valve plate is arranged opposite to a valve port formed in a cavity body of the reaction cavity; a sealing ring is arranged on one side of the valve plate close to the valve port; the air cylinder can drive the valve plate to be vertically close to or far away from the valve port in the stroke direction of the air cylinder so as to close or open the valve port, and when the valve plate is far away from the valve port, the valve plate can avoid the motion path of a manipulator for transferring wafers; the valve plate can rotate and be locked relative to the transmission piece, and the rotation center line of the valve plate is perpendicular to the stroke direction of the air cylinder. The problems existing in an existing slit valve assembly are solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor manufacturing, especially to a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication. BACKGROUND

[0002] In semiconductor manufacturing process, when gas deposition device executes wafer coating process, the intercommunication of process chamber and load lock chamber must be isolated, so that process chamber constitutes an independent closed space, then process gas is introduced into process chamber to carry out coating. To ensure that wafer can be smoothly sent into chamber interior by robot and execute vacuum operation, slit-shaped valve port is usually opened on the wall between chambers for wafer transmission, and slit valve assembly is equipped to realize effective isolation between chambers.

[0003] When existing slit valve assembly performs opening operation, valve plate leaves valve port by overturning, and the upper part of valve plate sealing ring will first separate from valve port, and when closing operation is performed, valve plate resets and contacts valve port by overturning, and the lower part of valve plate sealing ring will first contact valve port, which easily leads to uneven stress distribution of sealing ring as a whole, causes significant deformation of local area of sealing ring, and then directly affects its sealing effect, and greatly shortens the service life of sealing ring. SUMMARY

[0004] The utility model provides a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication to overcome the problems existing in existing slit valve assembly.

[0005] To achieve the above-mentioned purpose, the technical scheme of the utility model is as follows:

[0006] A kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication, comprising: valve port, valve plate, transmission part, cylinder and mounting support;

[0007] The mounting support is arranged on the load lock chamber cavity, the cylinder is fixed on the mounting support, the cylinder is obliquely arranged on the load lock chamber cavity, the transmission part is fixed on the piston rod of the cylinder, the valve plate is arranged at the end of the transmission part away from the cylinder, the valve plate is arranged opposite to the valve port opened on the reaction chamber cavity, and the side of the valve plate close to the valve port is provided with sealing ring;

[0008] The cylinder can drive the valve plate to vertically approach or away from the valve port along the stroke direction of the cylinder to realize the closing or opening of the valve port, and when the valve plate is away from the valve port, the valve plate can avoid the movement path of the robot for transferring wafer;

[0009] The valve plate can rotate and lock relative to the transmission part, and the rotation center line of the valve plate is perpendicular to the stroke direction of the cylinder.

[0010] Further, it includes: a connecting shaft and a shaft fixing block;

[0011] The connecting shaft is vertically arranged on the transmission member, and the shaft fixing block is fixed to the side of the valve plate away from the sealing ring. The two shaft fixing blocks are respectively located at both ends of the connecting shaft. Two clamping blocks are oppositely arranged on the shaft fixing block, and a clamping hole is provided between the two clamping blocks.

[0012] Under the action of the fastener, the two clamping blocks can move closer to each other, deform and shrink to clamp the connecting shaft located in the clamping hole.

[0013] Furthermore, a sealing ring groove is provided on a surface of the valve plate opposite to the valve port, the sealing ring is arranged in the sealing ring groove, and the cross section of the sealing ring groove is an inverted trapezoid.

[0014] Furthermore, the transmission member includes a connecting rod, a flange and a welded bellows, and the flange is fixed on the mounting support;

[0015] One end of the connecting rod is provided with a connecting seat, and the connecting seat is fixedly connected to the connecting shaft by a bolt. The other end of the connecting rod passes through the flange, is fixedly connected to the piston rod of the cylinder, and is slidably connected to the mounting support;

[0016] The welding bellows is sleeved on the connecting rod, and is located between the flange and the connecting seat, with both ends of the welding bellows being sealed and welded to the flange and the connecting seat respectively.

[0017] Furthermore, a guide groove is provided on the mounting support, and the guide groove extends along the stroke direction of the cylinder;

[0018] A roller mounting plate is provided at one end of the connecting rod away from the connecting seat, and rollers are provided at both ends of the roller mounting plate. The rollers are located in the guide grooves and can slide along the guide grooves.

[0019] Furthermore, it also includes a hollow bolt and a locking bolt;

[0020] The connecting rod is provided with a step at one end away from the connecting seat, the locking bolt is threadedly connected to the connecting rod, the hollow bolt is sleeved on the connecting rod and is located between the head of the locking bolt and the step, and the hollow bolt is threadedly connected to the piston rod of the cylinder;

[0021] Tighten the locking bolt, and the locking bolt can press the hollow bolt onto the step.

[0022] Beneficial effects:

[0023] The utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication, by the cylinder of inclination setting on load locking chamber cavity drives valve plate vertical close or far from valve port, when opening and closing of valve port, so that the sealing ring on valve plate can simultaneously far from reaction chamber cavity, ensure that sealing ring stress is uniform, avoid that sealing ring local area significantly changes, ensure sealing effect, and extend the service life of sealing ring;

[0024] By making valve plate far from valve port can avoid the movement path of the mechanical hand of wafer transfer, so that valve plate does not cause obstruction to mechanical hand, so that mechanical hand can smoothly transfer wafer;

[0025] By making valve plate rotate and lock relative to transmission part, to adjust the relative position of valve plate and valve port, so that the sealing ring on valve plate can better fit valve port, further ensure that sealing ring stress is uniform, ensure sealing effect. BRIEF DESCRIPTION OF DRAWINGS

[0026] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or prior art, the following will be a brief introduction to the drawings needed to be used in embodiment or prior art description, obviously, the drawings in the following description are some embodiments of the utility model, and for those skilled in the art, without creative labor, other drawings can also be obtained according to these drawings.

[0027] Figure 1 The utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication and the structure schematic diagram after reaction chamber cavity and load locking chamber cavity are assembled with the utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication;

[0028] Figure 2 The utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication and the top view after reaction chamber cavity and load locking chamber cavity are assembled with the utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication;

[0029] Figure 3 For Figure 2 C-C sectional view of

[0030] Figure 4 The utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication and the structure schematic diagram of the utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication;

[0031] Figure 5 The utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication and the top view of the utility model discloses a kind of isolation components of chemical vapor deposition equipment isolated chamber intercommunication;

[0032] Figure 6 For Figure 5 D-D sectional view of

[0033] Figure 7 For Figure 6Enlarged view of point E;

[0034] Figure 8 for Figure 6 Enlarged view of point F;

[0035] Figure 9 This is a schematic structural diagram of a transmission component of an isolation assembly for isolating chambers from each other in a chemical vapor deposition device disclosed in the present utility model;

[0036] Figure 10 This is a structural schematic diagram of a connecting rod of an isolation assembly for isolating chambers from each other in a chemical vapor deposition device disclosed in the present utility model;

[0037] Figure 11 This is a structural schematic diagram of an axis fixing block of an isolation assembly for isolating chambers from each other in a chemical vapor deposition device disclosed in the present utility model;

[0038] Figure 12 This is a structural schematic diagram of a mounting support for an isolation component that isolates chambers from each other in a chemical vapor deposition device disclosed in the present invention.

[0039] In the figure: 1. Valve port;

[0040] 2. Valve plate; 201. Sealing ring groove;

[0041] 3. Transmission parts; 301. Connecting rod; 302. Flange; 303. Welded bellows; 304. Connecting seat; 305. Roller mounting plate; 306. Roller; 307. Step;

[0042] 4. Connecting shaft;

[0043] 5. Shaft fixing block; 501. Clamping block; 502. Clamping hole;

[0044] 6. Sealing ring;

[0045] 7. Lock the bolts;

[0046] 8. Cylinder;

[0047] 9. Hollow bolts;

[0048] 10. Install the support; 1001. Guide groove;

[0049] A. Reaction chamber body; B. Load lock chamber body. DETAILED DESCRIPTION

[0050] To make the purpose, technical solutions, and advantages of the embodiments of the present invention more clear, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts shall fall within the scope of protection of the present invention.

[0051] This embodiment provides an isolation component for isolating chambers of a chemical vapor deposition device from each other, such as Figures 1 to 5 As shown, it includes: a valve port 1, a valve plate 2, a transmission member 3, a cylinder 8 and a mounting support 10;

[0052] The mounting bracket 10 is fixed to the load lock chamber body B by bolts, the cylinder 8 is fixed to the mounting bracket 10 by bolts, the cylinder 8 is tiltedly arranged on the load lock chamber body B, the transmission member 3 is fixed to the piston rod of the cylinder 8, and the valve plate 2 is arranged at the end of the transmission member 3 away from the cylinder 8, as shown in FIG. Figure 3 As shown, the valve plate 2 is arranged opposite to the valve port 1 opened on the reaction chamber body A, and a sealing ring 6 is provided on the side of the valve plate 2 close to the valve port 1;

[0053] The cylinder 8 can drive the valve plate 2 to move vertically toward or away from the valve port 1 along the stroke direction of the cylinder 8 to close or open the valve port 1. When the valve plate 2 moves away from the valve port 1, the valve plate 2 can avoid the movement path of the robot that transfers the wafer.

[0054] The valve plate 2 can be rotated and locked relative to the transmission member 3 , and the rotation centerline of the valve plate 2 is perpendicular to the stroke direction of the cylinder 8 .

[0055] This embodiment provides an isolation assembly for isolating chambers in a chemical vapor deposition apparatus. A cylinder 8 tilted on a load lock chamber body B drives a valve plate 2 vertically toward or away from a valve port 1. When the valve port 1 is opened or closed, a sealing ring 6 on the valve plate 2 simultaneously moves away from the reaction chamber body A. This ensures uniform force on the sealing ring 6, prevents significant deformation of a localized area of ​​the sealing ring 6, ensures a good seal, and extends the service life of the sealing ring.

[0056] By making the valve plate 2 away from the valve port 1 avoid the movement path of the robot that transfers the wafer, the valve plate does not block the robot, so that the robot can smoothly transfer the wafer;

[0057] By rotating and locking the valve plate 2 relative to the transmission member 3 to adjust the relative position of the valve plate 2 and the valve port 1, the requirements for processing and assembly accuracy are effectively reduced, so that the sealing ring 6 on the valve plate 2 can better fit the valve port 1, further ensuring that the sealing ring 6 is evenly stressed and the sealing effect is ensured.

[0058] In a specific embodiment, Figures 4 to 6 As shown, it includes: a connecting shaft 4 and a shaft fixing block 5;

[0059] The connecting shaft 4 is vertically arranged on the transmission member 3, and the rotation center line of the valve plate 2 is the axis of the connecting shaft 4. The shaft fixing block 5 is fixed to the side of the valve plate 2 away from the sealing ring 6 by bolts. The two shaft fixing blocks 5 are respectively located at both ends of the connecting shaft 4. Figure 11 As shown, two clamping blocks 501 are arranged opposite to each other on the shaft fixing block 5, and a clamping hole 502 is provided between the two clamping blocks 501;

[0060] Under the action of the fastener, the two clamping blocks 501 can move closer to each other, deform and shrink to clamp the connecting shaft 4 located in the clamping hole 502, so that the shaft fixing block 5 can be quickly locked with the connecting shaft 4 to facilitate the adjustment of the valve plate 2;

[0061] In this embodiment, the two clamping blocks 501 on the shaft fixing block 5 have one clamping block 501 with a through hole and the other clamping block 501 with a threaded hole. Bolts are inserted into the threaded holes from the through holes. By tightening the bolts, the two clamping blocks 501 can be brought closer to each other.

[0062] In a specific embodiment, Figure 9 As shown, the transmission member 3 includes a connecting rod 301, a flange 302 and a welded bellows 303, and the flange 302 is fixed to the mounting support 10 by bolts;

[0063] like Figure 10 As shown, one end of the connecting rod 301 is provided with a connecting seat 304, and the connecting seat 304 is fixedly connected to the connecting shaft 4 by bolts. The other end of the connecting rod 301 passes through the flange 302, is fixedly connected to the piston rod of the cylinder 8, and is slidably connected to the mounting support 10;

[0064] The welding bellows 303 is sleeved on the connecting rod 301. The welding bellows 303 is located between the flange 302 and the connecting seat 304, and the two ends are respectively sealed and welded to the flange 302 and the connecting seat 304. The welding bellows 303 can play a sealing role, so that the isolation component of the chemical vapor deposition equipment provided in this embodiment can isolate the chambers from each other, and the part located outside the load lock chamber cavity B can be isolated and connected with the vacuum environment inside the load lock chamber cavity B. In actual application, a sealing ring for fitting the bottom of the load lock chamber cavity B is provided on the mounting support 10 to ensure the sealing effect.

[0065] In a specific embodiment, Figure 8 As shown, a sealing ring groove 201 is provided on the side of the valve plate 2 opposite to the valve port 1 , and the sealing ring 6 is arranged in the sealing ring groove 201 . The cross-section of the sealing ring groove 201 is an inverted trapezoid, which can ensure that the sealing ring 6 is firmly installed on the valve plate 2 .

[0066] In a specific embodiment, Figure 12 As shown, a guide groove 1001 is provided on the mounting support 10, and the guide groove 1001 extends along the stroke direction of the cylinder 8;

[0067] like Figure 7 As shown, a roller mounting plate 305 is provided at one end of the connecting rod 301 away from the connecting seat 304, and rollers 306 are provided at both ends of the roller mounting plate 305. The rollers 306 are located in the guide groove 1001. The rollers 306 can slide along the guide groove 1001 to provide a guide for the reciprocating movement of the connecting rod 301 to improve the movement accuracy.

[0068] In a specific embodiment, Figure 7 As shown, it also includes a hollow bolt 9 and a locking bolt 7;

[0069] like Figure 9 and Figure 10 As shown, a step 307 is provided at one end of the connecting rod 301 away from the connecting seat 304, the locking bolt 7 is threadedly connected to the threaded hole provided at the end of the connecting rod 301, the hollow bolt 9 is sleeved on the connecting rod 301 and located between the head of the locking bolt 7 and the step 307, and the hollow bolt 9 is threadedly connected to the threaded hole at the end of the piston rod of the cylinder 8;

[0070] Tighten the locking bolt 7 , and the locking bolt 7 can press the hollow bolt 9 onto the step 307 , so that the hollow bolt 9 enables the connecting rod 301 to be threadedly connected to the piston rod of the cylinder 8 .

[0071] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. An isolation assembly for isolating chambers of a chemical vapor deposition apparatus from each other, characterized in that: include: Valve port (1), valve plate (2), transmission member (3), cylinder (8) and mounting support (10); The mounting support (10) is arranged on the load lock chamber body (B), the cylinder (8) is fixed on the mounting support (10), the cylinder (8) is arranged obliquely on the load lock chamber body (B), the transmission member (3) is fixed on the piston rod of the cylinder (8), the valve plate (2) is arranged at one end of the transmission member (3) away from the cylinder (8), the valve plate (2) is arranged opposite to the valve port (1) provided on the reaction chamber body (A), and a sealing ring (6) is provided on the side of the valve plate (2) close to the valve port (1); The cylinder (8) can drive the valve plate (2) to move vertically toward or away from the valve port (1) along the stroke direction of the cylinder (8) to achieve the closing or opening of the valve port (1); when the valve plate (2) moves away from the valve port (1), the valve plate (2) can avoid the movement path of the robot that transfers the wafer; The valve plate (2) can be rotated and locked relative to the transmission member (3), and the rotation center line of the valve plate (2) is perpendicular to the stroke direction of the cylinder (8).

2. The isolation assembly for isolating chambers of a chemical vapor deposition device according to claim 1, wherein: include: Connecting the shaft (4) and the shaft fixing block (5); The connecting shaft (4) is vertically arranged on the transmission member (3), and the shaft fixing block (5) is fixed on a side of the valve plate (2) away from the sealing ring (6). The two shaft fixing blocks (5) are respectively located at two ends of the connecting shaft (4). Two clamping blocks (501) are arranged on the shaft fixing block (5) in a relative manner, and a clamping hole (502) is provided between the two clamping blocks (501); Under the action of the fastener, the two clamping blocks (501) can move closer to each other, deform and shrink to clamp the connecting shaft (4) located in the clamping hole (502).

3. The isolation assembly for isolating chambers of a chemical vapor deposition device according to claim 1, wherein: A sealing ring groove (201) is provided on the side of the valve plate (2) opposite to the valve port (1), the sealing ring (6) is arranged in the sealing ring groove (201), and the cross section of the sealing ring groove (201) is an inverted trapezoid.

4. The isolation assembly for isolating chambers of a chemical vapor deposition device according to claim 2, wherein: The transmission member (3) includes a connecting rod (301), a flange (302) and a welded bellows (303), wherein the flange (302) is fixed on the mounting support (10); One end of the connecting rod (301) is provided with a connecting seat (304), and the connecting seat (304) is fixedly connected to the connecting shaft (4) by means of bolts. The other end of the connecting rod (301) passes through the flange (302), is fixedly connected to the piston rod of the cylinder (8), and is slidably connected to the mounting support (10); The welding bellows (303) is sleeved on the connecting rod (301), and the welding bellows (303) is located between the flange (302) and the connecting seat (304), and the two ends are respectively sealed and welded to the flange (302) and the connecting seat (304).

5. The isolation assembly for isolating chambers of a chemical vapor deposition device according to claim 4, characterized in that: A guide groove (1001) is provided on the mounting support (10), and the guide groove (1001) extends along the stroke direction of the cylinder (8); A roller mounting plate (305) is provided at one end of the connecting rod (301) away from the connecting seat (304), and rollers (306) are provided at both ends of the roller mounting plate (305). The rollers (306) are located in the guide groove (1001), and the rollers (306) can slide along the guide groove (1001).

6. The isolation assembly for isolating chambers of a chemical vapor deposition device according to claim 4, wherein: It also includes a hollow bolt (9) and a locking bolt (7); The connecting rod (301) is provided with a step (307) at one end away from the connecting seat (304), the locking bolt (7) is threadedly connected to the connecting rod (301), the hollow bolt (9) is sleeved on the connecting rod (301) and is located between the head of the locking bolt (7) and the step (307), and the hollow bolt (9) is threadedly connected to the piston rod of the cylinder (8); By tightening the locking bolt (7), the locking bolt (7) can press the hollow bolt (9) onto the step (307).

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