Calibration system and calibration device for mass flow controller

Abstract

The utility model relates to the technical field of mass flow controller detection, and discloses a mass flow controller calibration system and device, and the system comprises a gas source and a detection flow path. The detection flow path is communicated with the air source, the detection flow path comprises a detection station, the detection station comprises at least one MFC interface, and the MFC interface is used for being correspondingly connected with a to-be-detected MFC; the calibration branch is located at the downstream of the detection flow path, and the calibration branch comprises at least one flow detection piece used for detecting the flow of fluid flowing through the detection branch; the simulation branch is located at the downstream of the calibration branch and comprises a simulation piece, and the simulation piece is used for controlling the state in the detection flow path; the technical problem that the control of the mass flow controller on the gas flow is deviated is solved, and the technical effects of eliminating the control deviation of the mass flow controller on the gas flow and improving the quality of photovoltaic or semiconductor products are achieved.

Description

Technical Field

[0001] The present application relates to the technical field of mass flow controller detection, and in particular to a mass flow controller calibration system and calibration device. Background Art

[0002] A mass flow controller (Mass Flow Controller) is a device used to accurately measure and control gas flow. It is one of the core components of the Gas box / GAS panel and is widely used in diffusion / oxidation / CVD / ALD and other epitaxial manufacturing processes of photovoltaics or semiconductors. It is used to accurately control the flow of dozens or even dozens of special gases. Since the photovoltaic and semiconductor fields have extremely high requirements for the precision of processed products, the stability and accuracy of the mass flow controller used in the Gas box / GAS panel equipment are extremely important.

[0003] In the existing technology, the calibration of gas flow meters is basically completed by suppliers before leaving the factory. These calibration contents are generally various gas flow tests conducted in a laboratory environment. These tests do not take into account the various situations that may exist in the actual production process, and the types of gases used in the tests are relatively small. As a result, in actual use, when faced with a variety of special gases and various different environments, the stability and accuracy of the mass flow controller cannot meet the requirements, resulting in deviations in the control of the gas flow by the mass flow controller, which reduces the quality of photovoltaic or semiconductor products.

[0004] Therefore, the problem in the prior art is that the mass flow controller may have deviations in controlling the gas flow rate. Utility Model Content

[0005] The present application provides a mass flow controller calibration system and calibration device, which solves the technical problem that the mass flow controller may have deviations in controlling the gas flow, thereby achieving the technical effect of eliminating the deviations in the mass flow controller's control of the gas flow and improving the quality of photovoltaic or semiconductor products.

[0006] The present application provides a mass flow controller calibration system, which adopts the following technical solution, including: a gas source and a detection flow path, the detection flow path is connected to the gas source, the detection flow path includes: a detection station, the detection station includes at least one MFC interface, the MFC interface is used to connect to the corresponding MFC to be detected; a calibration branch is located downstream of the detection flow path, the calibration branch includes at least one flow detection component, which is used to detect the flow rate of the fluid after flowing through the detection branch; and a simulation branch is located downstream of the calibration branch, the simulation branch includes a simulation component, and the simulation component is used to control the pressure in the detection flow path.

[0007] Preferably, a temperature control device is further included, which is arranged upstream of the detection flow path and is used to control the gas in the detection flow path to be at a specified temperature.

[0008] Preferably, the temperature control device includes: a first container and a heating element, the first container is connected to the gas source, the first container has a accommodating cavity for accommodating the gas output by the gas source, and the heating element is arranged around the outside of the first container for heating the gas in the first container.

[0009] Preferably, the detection branch includes: a first calibration branch and a second calibration branch, the first calibration branch includes a first control valve and a first flow detection component; the second calibration branch is connected in parallel with the first calibration branch, the second calibration branch includes a second control valve and a second flow detection component; wherein, the calibration branch has a first state and a second state, in the first state, the first control valve is open and the second control valve is closed; in the second state, the second control valve is open and the first control valve is closed.

[0010] Preferably, it also includes: a pressure regulating valve and a pressure control branch, the pressure regulating valve is located upstream of the detection branch, and the pressure regulating valve is used to adjust and stably output a specified pressure fluid; the pressure control branch is located downstream of the simulation branch, and the pressure control branch is used to regulate the air pressure intensity in the simulation branch.

[0011] Preferably, the pressure control branch includes: a first pressure control component and a second pressure control component, wherein the first pressure control component and the second pressure control component are connected in parallel; wherein the pressure control branch includes a third state and a fourth state.

[0012] Preferably, the detection branch further comprises a plurality of sensors, which are respectively arranged upstream and downstream of the detection station for acquiring the state of the fluid at various locations in the detection branch.

[0013] Preferably, the measurement accuracy of the flow detection element is greater than the measurement accuracy of the mass flow controller to be measured.

[0014] Preferably, the detection branch further includes a filter element, and the filter element is located upstream of the detection station.

[0015] The present application also provides a mass flow controller calibration device, comprising: a cabinet, the aforementioned mass flow controller calibration system and a processing module, wherein the mass flow controller calibration system is installed in the cabinet, and the processing module is used to receive information from multiple sensors and flow detection components in the mass flow controller calibration system, and control the flow of fluid in the detection flow path of the mass flow controller calibration system through the above information.

[0016] In summary, the beneficial technical effects of this application are:

[0017] 1. A mass flow controller calibration system is provided, wherein a simulation component is provided on a simulation branch. By setting up the simulation branch, it can be used to simulate actual production conditions, thereby avoiding the accuracy deviation of the control of the mass flow controller to be tested due to differences from the actual working conditions; at the same time, a calibration branch is provided between the detection branch and the simulation branch, which is used to detect the fluid after flowing through the detection branch and calibrate the mass flow controller to be tested based on the detection results, so as to achieve the technical effect of eliminating the deviation of the mass flow controller in controlling the gas flow. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a simplified structural diagram of a mass flow controller calibration system in one embodiment of the present application;

[0019] Figure 2 This is a schematic diagram of the structure of a mass flow controller calibration system in one embodiment of the present application;

[0020] Figure 3 This is a simplified structural diagram of a mass flow controller calibration device in one embodiment of the present application.

[0021] Explanation of the accompanying drawings: 100, gas source; 200, detection flow path; 210, detection branch; 211, detection station; 212, sensor; 213, filter element; 220, calibration branch; 221, flow detection element; 222, first calibration branch; 2221, first flow detection element; 223, second calibration branch; 2231, second flow detection element; 230, simulation branch; 231, simulation element; 240, input end; 300, temperature control device; 310, first container; 320, heating element; 400, pressure regulating valve; 500, pressure control branch; 510, first pressure control element; 520, second pressure control element; 600, cabinet; 3, first control valve; 4, second control valve. DETAILED DESCRIPTION

[0022] The serial numbers assigned to the components herein, such as "first," "second," etc., are used solely to distinguish the objects being described and do not convey any order or technical meaning. The terms "connection" and "coupling" used in this application, unless otherwise specified, include both direct and indirect connections (couplings). In the description of this application, it should be understood that the terms "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inside," "outside," "clockwise," "counterclockwise," and the like, indicating orientations or positional relationships, are based on the orientations or positional relationships in the accompanying drawings and are intended solely to facilitate the description of this application and simplify the description. They are not intended to indicate or imply that the device or component referred to must have a specific orientation, be constructed, or operate in a specific orientation. Therefore, they should not be construed as limitations on this application.

[0023] In this application, unless otherwise expressly specified or limited, when a first feature is "above" or "below" a second feature, it may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Furthermore, when a first feature is "above," "above," or "above" a second feature, it may mean that the first feature is directly above or diagonally above the second feature, or simply means that the first feature is at a higher level than the second feature. When a first feature is "below," "below," or "below" a second feature, it may mean that the first feature is directly below or diagonally below the second feature, or simply means that the first feature is at a lower level than the second feature.

[0024] The embodiment of the present application provides a polishing liquid storage and output device, which solves the technical problem that the existing polishing liquid storage and output device cannot control the specific flow direction of the polishing liquid, thereby achieving the technical effect of improving the polishing quality of the finished product and enhancing the working efficiency of the polishing equipment.

[0025] In order to better understand the above technical solution, the following will be described in detail with reference to the accompanying drawings and specific implementation methods. It should be understood that the specific embodiments described herein are only used to explain the present application and are not intended to limit the present application.

[0026] In the actual production process, the calibration of gas flow meters is basically completed by suppliers before leaving the factory. These calibration contents are generally various gas flow tests conducted in a laboratory environment. These tests do not take into account the various situations that may exist in the actual production process, and the types of gases used in the tests are relatively small. As a result, in the actual use process, when faced with a variety of special gases and various different environments, the stability and accuracy of the mass flow controller cannot meet the requirements, causing the mass flow controller to deviate from the control of gas flow, which will further lead to a reduction in the quality of photovoltaic or semiconductor products.

[0027] To solve the above problems, this application provides a mass flow controller calibration system. By setting up a simulated flow path to detect the mass flow controller, the system can eliminate the deviation of the mass flow controller in gas flow control and improve the quality of photovoltaic or semiconductor products.

[0028] Please refer to Figure 1A mass flow controller calibration system includes: a gas source 100 and a detection flow path 200, the gas source 100 is used to output a variety of special gases; the detection flow path 200 is connected to the gas source 100, the detection flow path 200 includes: a detection branch 210, a calibration branch 220 and a simulation branch 230, the detection branch 210 includes at least one detection station 211, the detection station 211 includes at least one MFC interface, and the MFC interface is used to connect to the MFC to be detected; the calibration branch 220 is located downstream of the detection flow path 200, the calibration branch 220 includes at least one flow detection component 221, which is used to detect the flow rate of the fluid after flowing through the detection branch 210; the simulation branch 230 is located downstream of the calibration branch 220, the simulation branch 230 includes a simulation component 231, and the simulation component 231 is in a negative pressure state, which is used to simulate the negative pressure in the furnace during actual production.

[0029] Specifically, in the present application, the gas source 100 has at least one output end for outputting a variety of special gases, and the output end can be provided with an interface such as a gas nozzle for connecting to the flow path; the gas source 100 can imitate the gas supply equipment in the actual production process to control the flow rate, flow velocity, type, etc. of the input gas; the detection flow path 200 has a total input end 240, and the input end 240 of the detection flow path 200 is connected to the output end of the aforementioned gas source 100 for inputting gas; it can be imagined that in order to better control the inflow of the fluid, the input end and the output end can be connected. A control valve can be set between the ends to control the flow of gas. The control valve is preferably a diaphragm valve. The diaphragm valve can be a pneumatic valve or a manual valve, or both. In the present application, the input end 240 of the detection flow path 200 is also provided with a needle valve and a filter element 213. The needle valve is used to preliminarily control the flow of the gas, and the roughly controlled flow is consistent with the actual inlet flow in the actual production process. The filter element 213 is used to filter particles of the gas flowing through the inlet end to protect the back-end components. Preferably, the needle valve is closer to the device to be tested than the filter element 213.

[0030] The detection flow path 200 further comprises a detection branch 210, which is in communication with the input end 240 and is located downstream of the input end 240. When all the valves in the front path are opened, the special gas can flow into the detection branch 210. The detection branch 210 comprises at least one detection station 211, and the MFC interface is arranged on the detection station 211. The MFC interface is used for corresponding connection of the mass flow controller to be detected. The MFC interface comprises a mounting inlet and a mounting outlet. In use, the valves in the front path are closed, and then the MFC is directly mounted corresponding to the mounting inlet and the mounting outlet. Different MFC interfaces can be selected for different MFCs, thereby improving the universal performance of the device. The calibration branch 220 is located downstream of the detection branch 210. The detection branch 210 comprises at least one flow detection piece 221, which is in communication with the MFC to be detected. When calibration is performed, the special gas flows through the flow detection piece 221 and the MFC to be detected at the same time. The value displayed by the flow detection piece 221 can be used to calibrate the MFC to be detected. It is conceivable that, in order to ensure better calibration effect, the detection accuracy of the flow detection piece 221 should be greater than that of the MFC to be detected. Preferably, the flow detection piece 221 is a high-precision MFM element.

[0031] The simulation branch 230 is located downstream of the calibration branch 220 and is in communication with the simulation branch 230. The simulation branch 230 comprises at least one simulation piece 231, which is in a negative pressure or high pressure state. The simulation piece 231 is selected according to the actual situation and is used to simulate the negative pressure in the furnace in actual production. Specifically, the simulation branch 230 is located downstream of the calibration branch 220. The installation mode of the simulation branch 230 is the same as that in actual production, so as to simulate the processing condition in actual production as much as possible. The simulation piece 231 is preferably a tank. The simulation piece 231 in a negative pressure or high pressure state can be used to simulate the furnace chamber in the actual production process. In the present application, the simulation piece 231 is arranged downstream of the detection flow path 200 to simulate the negative pressure furnace, so that the detection flow path 200 can better simulate the actual production condition and avoid the deviation of the control precision of the mass flow controller to be detected due to the difference from the actual working condition.

[0032] Please refer to Figure 1-2 The mass flow controller calibration system further comprises a temperature control device 300, which is arranged upstream of the detection flow path 200 and is used to control the gas in the detection flow path 200 to be at a specified temperature. The temperature control device 300 arranged upstream of the detection flow path 200 is used to control the temperature of the special gas in the detection flow path 200, so that the gas in the detection flow path 200 is at a specified temperature. In this way, various processing conditions can be simulated, the accuracy of the simulation calibration of the system is improved, and the real processing condition can be better simulated compared with the detection method in the prior art.

[0033] Further, the temperature control device 300 comprises a first container 310 and a heating element 320. The first container 310 is in communication with the gas source 100 and is used to contain the gas output by the gas source 100. The heating element 320 is arranged around the first container 310 and is used to heat the gas in the first container 310. In this application, the first container 310 is a tank and is used to contain the gas output by the gas source 100, thereby playing a role in pressure stabilization and facilitating heating. In some embodiments, the heating element 320 is a device that does not need to be in actual contact with the first container 310 and can directly heat the special gas in the detection flow path 200 in space, such as a heating coil, a hot field, etc. In other embodiments, the heating element 320 is connected with the first container 310 and is in actual contact with the first container 310. The heating element 320 comprises a heater that needs to be in direct contact with the flow path. In one embodiment, the temperature control device 300 comprises the first container 310 and the heating element 320 located outside the first container 310. The first container 310 is located downstream of the filter 213. The special gas filtered by the filter 213 enters the first container 310, is heated or cooled to a specified temperature in the first container 310, and then flows into the subsequent flow path, thereby simulating the temperature change that may exist in the actual processing process.

[0034] Please refer to Figure 2 The detection branch 210 comprises a first calibration branch 222 and a second calibration branch 223. The first calibration branch 222 comprises a first control valve 3 and a first flow detection element 2221. The second calibration branch 223 is parallel to the first calibration branch 222 and comprises a second control valve 4 and a second flow detection element 2231. The calibration branch 220 has a first state and a second state. In the first state, the first control valve 3 is open and the second control valve 4 is closed. In the second state, the second control valve 3 is open and the first control valve 3 is closed. In one embodiment, the first calibration branch 222 is parallel to the second calibration branch 223. The first calibration branch 222 and the second calibration branch 223 are respectively provided with the first flow detection element 2221 and the second flow detection element 2231. The first flow detection element 2221 and the second flow detection element 2231 are detection elements suitable for different environments and can be selected according to actual conditions to more conveniently measure the value of the MFC. The first state and the second state correspond to different temperatures, and the working temperatures of the flow detection elements 221 on the branches corresponding thereto are also different. It can be envisaged that, according to actual conditions, more branches can be connected in parallel to the first calibration branch 222 and the second calibration branch 223. Different flow detection elements 221 are arranged on the branches to facilitate better calibration of the mass flow controller.

[0035] Please refer to Figure 1-2The calibration system in the present application further includes a pressure regulating valve 400 and a pressure control branch 500. The pressure regulating valve 400 is located upstream of the detection branch 210 and is used to regulate and stably output a fluid at a specified pressure. The pressure control branch 500 is located downstream of the simulation branch 230 and is used to control the air pressure intensity within the simulation branch 230. Specifically, the pressure regulating valve 400 is preferably an RGV pressure regulating valve 400. The pressure regulating valve 400 is located upstream of the detection station 211 and is used to regulate and stabilize the pressure at the front end of the flowmeter. The pressure control branch 500 is located downstream of the simulation branch 230 and is used to control the pressure of the entire flow path so that the pressure of the entire flow path simulates the actual production situation.

[0036] Furthermore, the pressure control branch 500 includes: a first pressure control component 510 and a second pressure control component 520. The first pressure control component 510 and the second pressure control component 520 are connected in parallel. The first pressure control component 510 is used to initially pump the pressure in the simulation branch 230 to a specified value, and the second pressure control component 520 is used to further pump the pressure in the simulation branch 230 to a specified value. Specifically, in some embodiments, the air pump includes a first pressure control component 510 and a second pressure control component 520 connected in parallel. The pressure control accuracy of the first pressure control component 510 and the second pressure control component 520 is different. The first pressure control component 510 can perform a short-time high-speed rough pumping process, which can make the negative pressure in the entire flow path reach a preliminary specified pressure. After reaching the specified pressure, the first pressure control component 510 is closed and the second air pump is turned on. The second pressure control component 520 is used to finely control the negative pressure in the entire flow path. On the basis of the control of the first air pump, the flow path is further finely pumped to pump the negative pressure to a value close to the actual operating value and the second pressure control valve is kept open to keep the negative pressure state in the entire flow path stable.

[0037] In some embodiments, the mass flow controller calibration system further comprises a plurality of control valves (1, 2, 5, 6, 7, 8, 9), wherein control valves 1 and 2 are arranged on the detection branch (210) for controlling the flow of gas on the detection branch (210); control valves 5 and 6 are arranged on the calibration branch (220) for controlling the flow of gas on the calibration branch (220); control valves 8 and 9 are arranged on the simulation branch (230) for controlling the flow of gas on the simulation branch (230); and the control valves (1, 2, 5, 6, 7, 8, 9) are preferably diaphragm valves, which are controlled automatically or manually.

[0038] Please refer to Figure 2The detection branch 210 further includes a plurality of sensors 212, which are respectively disposed upstream and downstream of the detection station 211 and are used to obtain the state of the fluid at various locations in the detection branch 210. In one embodiment, the detection flow path 200 is provided with a temperature sensor 212 and a pressure sensor 212, which are respectively disposed upstream and downstream of the detection station 211 and are used to detect the gas flowing through the detection station 211 and transmit the detection results to the control element to control the state of the gas in the entire flow path so that the gas state is maintained at the actual working condition.

[0039] In one embodiment, the temperature control device 300 can heat any specified position in the flow path. Multiple temperature sensors 212 arranged at different positions in the flow path cooperate with the temperature control device 300. The gas information at different positions in the flow path can be transmitted to the temperature sensor 212 through the temperature sensor 212 to accurately control the temperature at different positions.

[0040] Please refer to Figure 3 The present application also provides a mass flow controller calibration device, including: a cabinet 600, the aforementioned mass flow controller calibration system and a processing module, the mass flow controller calibration system is installed in the cabinet 600; the processing module is used to receive information from multiple sensors 212 and flow detection components 221 in the mass flow controller calibration system, and control the flow of fluid in the detection flow path 200 in the mass flow controller calibration system through the above information.

[0041] Although the preferred embodiments of the present application have been described, those skilled in the art may make additional changes and modifications to these embodiments once they have learned the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications that fall within the scope of the present application.

[0042] Obviously, those skilled in the art may make various changes and modifications to this application without departing from the spirit and scope of this application. Thus, if these modifications and variations of this application fall within the scope of the claims of this application and their equivalents, this application is intended to include these modifications and variations.

Claims

1. A mass flow controller calibration system, characterized in that: include: Gas Source (100); A detection flow path (200), the detection flow path (200) being in communication with the gas source (100), the detection flow path (200) comprising: A detection branch (210), the detection branch (210) comprising a detection station (211), the detection station (211) comprising at least one MFC interface, the MFC interface being used for corresponding connection with an MFC to be detected; a calibration branch (220), the calibration branch (220) being located downstream of the detection branch (210), the calibration branch (220) being in communication with the detection branch (210), the calibration branch (220) comprising at least one flow detection element (221) for detecting the flow of a fluid after flowing through the detection branch (210); as well as A simulation branch (230), the simulation branch (230) is located downstream of the calibration branch (220), the simulation branch (230) is connected to the calibration branch (220), the simulation branch (230) includes at least one simulation component (231), and the simulation component (231) is used to simulate the actual processing state of the detection flow path (200).

2. The mass flow controller calibration system according to claim 1, characterized in that: It also includes a temperature control device (300), which is arranged upstream of the detection flow path (200) and is used to control the gas temperature in the detection flow path (200).

3. The mass flow controller calibration system according to claim 2, characterized in that: The temperature control device (300) comprises: a first container (310), the first container (310) being in communication with the gas source (100) and the detection flow path (200), the first container (310) having a receiving cavity for receiving gas outputted from the gas source (100); A heating element (320) is disposed around the outside of the first container (310) and is used to heat the gas in the first container (310).

4. The mass flow controller calibration system according to claim 1, characterized in that: The calibration branch (220) comprises: A first calibration branch (222), the first calibration branch (222) comprising a first control valve (3); a second calibration branch (223), the second calibration branch (223) being connected in parallel with the first calibration branch (222), the second calibration branch (223) comprising a second control valve (4); The calibration branch (220) has a first state and a second state. In the first state, the first control valve (3) is open and the second control valve (4) is closed; in the second state, the second control valve (4) is open and the first control valve (3) is closed.

5. The mass flow controller calibration system according to claim 1, characterized in that: Also includes: a pressure regulating valve (400), the pressure regulating valve (400) being located upstream of the detection branch (210); A pressure control branch (500), the pressure control branch (500) is located downstream of the simulation branch (230).

6. The mass flow controller calibration system according to claim 5, characterized in that: The pressure control branch (500) comprises: A first pressure-controlling member (510); a second pressure-controlling component (520), wherein the first pressure-controlling component (510) and the second pressure-controlling component (520) are connected in parallel; Wherein, the pressure control branch (500) includes a third state and a fourth state. In the third state, the first pressure control component (510) is open and the second pressure control component (520) is closed; in the fourth state, the first pressure control component (510) is open and the second pressure control component (520) is also open.

7. The mass flow controller calibration system according to claim 1, characterized in that: The detection branch (210) further comprises a plurality of sensors (212), which are respectively arranged upstream and downstream of the detection station (211) and are used to obtain the state of the fluid at various locations in the detection branch (210).

8. The mass flow controller calibration system according to claim 1, wherein: The measurement accuracy of the flow detection element (221) is greater than the measurement accuracy of the mass flow controller to be measured.

9. The mass flow controller calibration system according to claim 1, wherein: The detection branch (210) further comprises a filter element (213), and the filter element (213) is located upstream of the detection station (211).

10. A mass flow controller calibration device, characterized in that: include: Cabinet (600); The mass flow controller calibration system according to any one of claims 1 to 9, wherein the mass flow controller calibration system is installed in the cabinet (600).

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