Silicon wafer cleaning device with flow guide hopper arranged on one side of cleaning pool

Abstract

The utility model discloses a silicon wafer cleaning device with a flow guide hopper on one side of a cleaning pool, which relates to the technical field of silicon wafer cleaning and comprises the cleaning pool, a communicated liquid discharge pipe is arranged at the bottom end of the right side wall of the cleaning pool, a valve is mounted on the liquid discharge pipe, and the communicated flow guide hopper is mounted at the top end of the left side wall of the cleaning pool. A support plate is connected to the rear side wall of the cleaning pool, an air cylinder is arranged at the top of the support plate, a cross beam is connected to the telescopic end of the air cylinder through a piston rod, a U-shaped moving frame is transversely and slidably connected to the bottom wall of the cross beam, and a silicon wafer fixing frame is installed at the bottom of the U-shaped moving frame. According to the silicon wafer cleaning device, silicon wafers in the silicon wafer fixing frame can be moved to the filter screen through stretching and retracting of the air cylinder and transverse sliding of the U-shaped moving frame at the bottom of the cross beam, water control treatment can be conducted on the cleaned silicon wafers, cleaning liquid can flow back into a cleaning pool, waste of the cleaning liquid is avoided, and the silicon wafer cleaning cost is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of silicon wafer cleaning, in particular to a silicon wafer cleaning device with a flow guide hopper on one side of the cleaning pool. BACKGROUND

[0002] The silicon wafer cleaning device is used for cleaning the surface of a silicon wafer in semiconductor production and usually comprises a cleaning tank, a spraying system, an ultrasonic or megasonic generator, and a control system, etc. It can effectively remove contaminants on the surface of a silicon wafer and ensure the cleanliness of the silicon wafer, and is an important device indispensable to semiconductor manufacturing. The existing silicon wafer cleaning device usually immerses the silicon wafer in the cleaning liquid in the cleaning pool for cleaning. However, most of the existing cleaning pools do not have a flow guide hopper on one side, which is inconvenient for water control treatment of the cleaned silicon wafer. The cleaning liquid on the silicon wafer cannot be returned to the cleaning pool, resulting in waste of the cleaning liquid. Therefore, we propose a silicon wafer cleaning device with a flow guide hopper on one side of the cleaning pool. SUMMARY

[0003] The utility model aims at providing a silicon wafer cleaning device with a flow guide hopper on one side of the cleaning pool to solve the problems raised in the background.

[0004] To achieve the above-mentioned purpose, the utility model provides the following technical scheme:

[0005] A silicon wafer cleaning device with a flow guide hopper on one side of the cleaning pool comprises a cleaning pool. A drain pipe is arranged at the bottom end of the right side wall of the cleaning pool. A valve is installed on the drain pipe. A flow guide hopper is installed at the top end of the left side wall of the cleaning pool. A filter screen is arranged at the top of the flow guide hopper.

[0006] A support plate is connected to the rear side wall of the cleaning pool. A pneumatic cylinder is arranged at the top of the support plate. A piston rod is connected between the extension end of the pneumatic cylinder and a crossbeam. A U-shaped moving frame is horizontally and slidingly connected to the bottom wall of the crossbeam. A silicon wafer fixing frame is installed at the bottom of the U-shaped moving frame.

[0007] Further, the open end of the U-shaped moving frame is opposite to the bottom wall of the crossbeam. A reduction motor is installed at the front end face of the U-shaped moving frame. A drive shaft is connected to the output end of the reduction motor. A gear is connected to the drive shaft. A plurality of meshing grooves are arranged in the bottom wall of the crossbeam and are meshingly connected to the gear.

[0008] Further, two T-shaped guide grooves are arranged in the bottom wall of the crossbeam. Two T-shaped sliding blocks are installed on the outer wall of the open end of the U-shaped moving frame and are slidingly connected to the T-shaped guide grooves.

[0009] Further, a plurality of filter holes are arranged in the front and rear side walls of the silicon wafer fixing frame. A plurality of U-shaped clamps for fixing silicon wafers are installed in the inner cavity top wall and bottom wall of the silicon wafer fixing frame.

[0010] Further, the filter screen is connected with the guide hopper through clamping.

[0011] Further, the inner wall of each group of U-shaped clamps is bonded with rubber pads.

[0012] Compared with the prior art, the utility model has the advantages of:

[0013] The utility model discloses a silicon wafer fixing frame and a filter screen are connected through a guide hopper, and the filter screen is connected with the guide hopper through clamping. BRIEF DESCRIPTION OF DRAWINGS

[0014] Fig. 1 It is the structural schematic diagram of the utility model;

[0015] Fig. 2 It is the structural schematic diagram of the silicon wafer fixing frame of the utility model;

[0016] Fig. 3 It is the cross section schematic diagram of the lateral surface connection structure of the crossbeam and U-shaped moving frame of the utility model.

[0017] In the drawing: 1, cleaning pool;2, liquid discharge pipe;3, valve;4, support plate;5, cylinder;6, crossbeam;7, U-shaped moving frame;8, silicon wafer fixing frame;9, guide hopper;10, filter screen;11, filter hole;12, U-shaped clamp;13, speed reducer motor;14, drive shaft;15, gear;16, meshing groove;17, T-shaped guide groove;18, T-shaped sliding block. DETAILED DESCRIPTION

[0018] The technical scheme in the embodiments of the utility model will be described clearly and completely below in combination with the drawings in the embodiments of the utility model, and obviously, the described embodiments are only part of the embodiments of the utility model, not all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by the person skilled in the art without creative labor are within the protection scope of the utility model.

[0019] Embodiment 1:

[0020] Please refer to Figs. 1-3The utility model provides a technical scheme: a kind of silicon wafer cleaning device with flow guide hopper being arranged at one side of cleaning pool, including cleaning pool 1, the right side wall bottom end of cleaning pool 1 is equipped with the drain pipe 2 of intercommunication arrangement, and valve 3 is installed on drain pipe 2, the top end of the left side wall of cleaning pool 1 is installed with the flow guide hopper 9 of intercommunication, and the top of flow guide hopper 9 is equipped with filter screen 10;Before use, the electrical end of each electrical equipment is electrically connected with the electrical end of external power supply and controller by wire, before cleaning silicon wafer, valve 3 on drain pipe 2 is closed, cleaning solution is poured into cleaning pool 1, after using cleaning solution for a period of time, valve 3 is opened, and cleaning solution is discharged through drain pipe 2;

[0021] The rear side wall of cleaning pool 1 is connected with support plate 4, the top of support plate 4 is equipped with cylinder 5, the telescopic end of cylinder 5 is connected with crossbeam 6 through piston rod, and the bottom wall of crossbeam 6 is transversely slidably connected with U-shaped moving frame 7, and the bottom of U-shaped moving frame 7 is installed with silicon wafer fixing frame 8;Before cleaning silicon wafer, silicon wafer is fixed on silicon wafer fixing frame 8 (at this time, silicon wafer fixing frame 8 is directly above cleaning pool 1), then, cylinder 5 works and drives crossbeam 6, U-shaped moving frame 7 and silicon wafer fixing frame 8 to move down into cleaning pool 1, so that silicon wafer is completely immersed in cleaning solution in cleaning pool 1, and cleaning pool 1 uses ultrasonic wave to clean silicon wafer, after cleaning is completed, cylinder 5 works and drives crossbeam 6 and silicon wafer fixing frame 8 to move up, and silicon wafer fixing frame 8 is moved to filter screen 10 by the transverse sliding of U-shaped moving frame 7 at the bottom of crossbeam 6, so that filter screen 10 carries out water control treatment to silicon wafer after cleaning, cleaning solution is returned to cleaning pool 1 through flow guide hopper 9, waste of cleaning solution is avoided, and the cost of silicon wafer cleaning is reduced.

[0022] Preferably, the opening end of U-shaped moving frame 7 is opposite to the bottom wall of crossbeam 6, a reduction motor 13 is installed on the front end face of U-shaped moving frame 7, a driving shaft 14 is connected to the output end of reduction motor 13, a gear 15 is connected to the driving shaft 14, a plurality of meshing grooves 16 are formed in the bottom wall of crossbeam 6, and the meshing grooves 16 are meshingly connected with the gear 15;The reduction motor 13 works to drive the gear 15 on the driving shaft 14 to rotate, and since the gear 15 is meshingly connected with the plurality of meshing grooves 16 and U-shaped moving frame 7 is limited in sliding by T-shaped sliding block 18 and T-shaped guide groove 17, U-shaped moving frame 7 can slide transversely on the bottom wall of crossbeam 6, that is, drive the silicon wafer fixing frame 8 fixedly connected to move transversely.

[0023] Preferably, two T-shaped guide grooves 17 are formed in the bottom wall of crossbeam 6, two T-shaped sliding blocks 18 are installed on the opening end outer wall of U-shaped moving frame 7, and the T-shaped sliding blocks 18 are slidably connected with the T-shaped guide grooves 17;The T-shaped sliding blocks 18 are fixedly connected with the opening end outer wall of U-shaped moving frame 7, and after being limited in sliding by the T-shaped sliding blocks 18 and the T-shaped guide grooves 17, U-shaped moving frame 7 can be prevented from being separated from crossbeam 6 when moving transversely, and the smoothness of U-shaped moving frame 7 when moving transversely is improved.

[0024] Preferably, the front and rear sidewalls of the silicon wafer fixing frame 8 are provided with multiple groups of filter holes 11, and the inner cavity top wall and bottom wall of the silicon wafer fixing frame 8 are provided with multiple groups of U-shaped clamps 12 for fixing the silicon wafer; the filter holes 11 filter the cleaning liquid to ensure that the cleaning liquid can fully contact the silicon wafer, and the U-shaped clamps 12 fix the position of the silicon wafer.

[0025] Preferably, the filter screen 10 is connected with the flow guide hopper 9 through clamping; the clamping installation of the filter screen 10 facilitates disassembly and reassembly and facilitates later cleaning of impurities on the filter screen 10.

[0026] Embodiment 2:

[0027] With reference to Fig. 2 The difference between this embodiment and the first embodiment is that the inner wall of each group of U-shaped clamps 12 is bonded with a rubber pad; the rubber pad plays a protective role to avoid abrasion of the silicon wafer fixing frame.

[0028] Although the embodiments of the present application have been shown and described, it can be understood by those skilled in the art that various changes, modifications, replacements and modifications can be made to these embodiments without departing from the principles and spirits of the present application, and the scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A silicon wafer cleaning device having a guide hopper provided on one side of a cleaning tank, comprising a cleaning tank (1), characterized in that: A drain pipe (2) is provided at the bottom end of the right side wall of the cleaning tank (1), and a valve (3) is installed on the drain pipe (2). A diversion hopper (9) is provided at the top end of the left side wall of the cleaning tank (1), and a filter screen (10) is provided on the top of the diversion hopper (9). The rear side wall of the cleaning tank (1) is connected to a support plate (4), a cylinder (5) is provided on the top of the support plate (4), the telescopic end of the cylinder (5) is connected to a crossbeam (6) via a piston rod, and the bottom wall of the crossbeam (6) is laterally slidably connected to a U-shaped moving frame (7), and a silicon wafer fixing frame (8) is installed at the bottom of the U-shaped moving frame (7).

2. A silicon wafer cleaning device with a guide hopper provided on one side of a cleaning tank according to claim 1, characterized in that: The open end of the U-shaped moving frame (7) faces the bottom wall of the crossbeam (6), and a reduction motor (13) is installed on the front end surface of the U-shaped moving frame (7). The output end of the reduction motor (13) is connected to a drive shaft (14).

3. The silicon wafer cleaning device according to claim 2, wherein a guide hopper is provided on one side of the cleaning tank, characterized in that: The driving shaft (14) is connected to a gear (15), and the bottom wall of the crossbeam (6) is provided with a plurality of meshing grooves (16), and the meshing grooves (16) are meshed and connected with the gear (15).

4. The silicon wafer cleaning device according to claim 1, wherein a guide hopper is provided on one side of the cleaning tank, characterized in that: The bottom wall of the crossbeam (6) is provided with two groups of T-shaped guide grooves (17), and the outer wall of the open end of the U-shaped movable frame (7) is provided with two groups of T-shaped sliding blocks (18), and the T-shaped sliding blocks (18) are slidably connected to the T-shaped guide grooves (17).

5. The silicon wafer cleaning device according to claim 1, wherein a guide hopper is provided on one side of the cleaning tank, characterized in that: The front and rear side walls of the silicon wafer fixing frame (8) are provided with a plurality of filter holes (11), and the top and bottom walls of the inner cavity of the silicon wafer fixing frame (8) are provided with a plurality of U-shaped clips (12) for fixing the silicon wafers.

6. The silicon wafer cleaning device according to claim 1, wherein a guide hopper is provided on one side of the cleaning tank, characterized in that: The filter screen (10) is connected to the diversion hopper (9) by means of a snap connection.

7. The silicon wafer cleaning device according to claim 5, wherein a guide hopper is provided on one side of the cleaning tank, characterized in that: The inner wall of each set of U-shaped clips (12) is bonded with a rubber pad.

Images