Cleaning equipment for hemispherical harmonic oscillator

Abstract

The utility model discloses cleaning equipment for a hemispherical harmonic oscillator. The cleaning equipment comprises a frame, a three-axis lead screw sliding rail mechanism and a hanging basket. An inner cavity of the frame is provided with a cleaning area, a drying area and a discharging area, the cleaning area is provided with a plurality of cleaning agent grooves arranged in an array mode, the rack is arranged at the upper end of the frame, the three-axis lead screw sliding rail mechanism is arranged at the upper end of the frame, and the hanging basket is hung on the three-axis lead screw sliding rail mechanism and used for containing a hemispherical harmonic oscillator to be cleaned. The three-axis lead screw sliding rail mechanism is used for driving the hanging basket to move up and down, front and back and left and right till the hemispherical harmonic oscillators in the hanging basket are immersed in different cleaning agent grooves, or the hanging basket is moved to the drying area to be dried, or the hanging basket is moved to be unloaded in the unloading area. According to the cleaning device, the full-process operation of cleaning the hemispherical harmonic oscillator can be completed on single equipment, and the cleaning efficiency is multiplied.

Description

Technical Field

[0001] The utility model relates to the technical field of inertial device preparation, in particular to a cleaning device for a hemispherical resonator. Background Art

[0002] Ultrasonic cleaning is a technique that uses high-frequency sound waves (typically above 20kHz) to clean objects. This technique is widely used across various industries for its ability to effectively remove contaminants from surfaces and complex geometries. Ultrasonic cleaners use piezoelectric or magnetostrictive transducers to convert electrical energy into ultrasonic waves. When the ultrasonic waves propagate through the cleaning fluid (typically pure water or a specialized solvent), they produce alternating high- and low-pressure cycles. During the low-pressure cycles, small vacuum bubbles or voids form in the liquid due to the rapid expansion of microbubbles. These bubbles grow during the low-pressure phase and violently rupture during the high-pressure phase. This rupture locally releases a large amount of energy, generating microjets and shock waves that effectively remove contaminants from the surface.

[0003] For the traditional hemispherical resonator cleaning process, a single-tank commercial cleaning machine is usually used, but its disadvantages are also prominent. During ultrasonic cleaning, professional cleaning process personnel are required to promptly remove the device, replace the cleaning agent, put it back into the cleaning, recycle the waste liquid, and blow it dry after the stage cleaning process is completed. At the same time, when organic solvents or acid and alkali liquids are used, if appropriate safety measures are not taken, the steam generated will cause damage to the respiratory tract or skin of the cleaning process personnel. Long-term exposure can also cause chronic health problems such as nervous system damage, liver and kidney dysfunction, and respiratory diseases. Secondly, the current ultrasonic cleaning machine relies entirely on the operation of the process personnel, which is inefficient and has the risk of process failure due to misoperation. The efficient operation and accuracy of the cleaning process must be achieved through automation. Utility Model Content

[0004] In view of the problems in the background technology, the utility model proposes a cleaning device for a hemispherical resonator which realizes the cleaning process of the hemispherical resonator in an automated and batch manner.

[0005] The utility model adopts the following technical solutions:

[0006] A hemispherical resonator cleaning device comprises a frame, a three-axis lead screw slide mechanism, and a hanging basket; the inner cavity of the frame has a cleaning area, a drying area, and a unloading area; the cleaning area is equipped with a plurality of cleaning agent tanks arranged in an array; the three-axis lead screw slide mechanism is installed at the upper end of the frame; the hanging basket is suspended on the three-axis lead screw slide mechanism and is used to hold the hemispherical resonator to be cleaned; the three-axis lead screw slide mechanism is used to drive the hanging basket to move up and down, forward and backward, and left and right, until the hemispherical resonator in the hanging basket is immersed in different cleaning agent tanks, or moved to the drying area to dry the hemispherical resonator, or moved to the unloading area to unload the hanging basket.

[0007] As a further improvement of the above technical solution:

[0008] The inner cavity of the frame is divided into an upper layer and a lower layer. The cleaning area, drying area and unloading area are located in the upper layer, and the lower layer has a cleaning agent storage area and a waste liquid storage area.

[0009] The waste liquid storage area is equipped with multiple waste liquid tanks made of fluoroplastics. The waste liquid tanks are connected to the cleaning agent tank through fluoroplastic tubes, and electromagnetic valves are installed on the fluoroplastic tubes.

[0010] The hanging basket includes a basket, a lifting hook and a positioning structure. The positioning structure is located in the basket and is used to position multiple hemispherical resonators in the basket. The lower end of the lifting hook is hooked with the basket, and the upper end thereof is slidably arranged on the three-axis screw slide rail mechanism.

[0011] The lifting hook includes two hook plates arranged in parallel along a first horizontal direction, and a slider connected to the upper ends of the two hook plates. The slider is slidably connected to the three-axis screw slide mechanism. The lower part of the hook plate is bent upward to form a hook portion. The basket is respectively installed with connecting plates at both ends along the second horizontal direction. Two hook rods are fixed between the upper ends of the two connecting plates. The two hook rods correspond one-to-one to the hook portions of the two hook plates. The lifting hook can move up and down until the corresponding hook rod enters the hook portion or escapes from the hook portion.

[0012] The positioning structure includes two positioning plates arranged at intervals along the horizontal first direction, the two ends of the two positioning plates along the horizontal second direction are connected by side plates, and the resonator is clamped between the two positioning plates; there are multiple positioning structures, and the multiple positioning mechanisms are arranged in parallel along the horizontal first direction.

[0013] Each cleaning agent tank is provided with a nitrogen pipe connected to a nitrogen source. The nitrogen pipe is provided with nitrogen holes. Nitrogen in the nitrogen source enters the cleaning liquid in the cleaning agent tank through the nitrogen holes to generate nitrogen bubbles.

[0014] The cleaning area is equipped with a plurality of ultrasonic cleaning tanks arranged side by side, and a plurality of cleaning agent tanks are evenly divided into the plurality of ultrasonic cleaning tanks.

[0015] The drying area is equipped with a nitrogen blowing mechanism, which includes a bellows, a nitrogen purge pipe inside the bellows, and a plurality of pneumatic nozzles installed on the nitrogen purge pipe.

[0016] There are two rows of nitrogen purge pipes, which are located at both ends of the wind box in the width direction. Each row of nitrogen purge pipes has two nitrogen purge pipes arranged up and down. The pneumatic nozzles on the upper nitrogen purge pipes are arranged obliquely downward, and the pneumatic nozzles on the lower nitrogen purge pipes are arranged obliquely upward. One end of the nitrogen purge pipe is sealed and passes through the wind box and is connected to the nitrogen source through a connecting pipe.

[0017] Also include the rack, three-axis screw slide rail mechanism is packaged in the rack, the rack is installed with host computer, exhaust fan and buzzer.

[0018] Compared with the prior art, the advantages of the utility model lie in:

[0019] The cleaning equipment for the hemispherical resonator of the utility model, through the design of the frame of the partition and the three-axis screw slide rail mechanism of driving the basket movement, multiple array arranged cleaning agent tanks, drying zones and unloading zones are distributed in the frame, the basket is driven up and down, forward and backward and left and right by the three-axis screw slide rail mechanism, the hemispherical resonator in the basket is immersed in different cleaning agent tanks, or is moved to the drying zone to dry the hemispherical resonator, or is moved to unload the basket in the unloading zone, so that the whole process operation of the hemispherical resonator cleaning is completed on a single equipment, and the cleaning efficiency is multiplied.

[0020] In addition, since the utility model can realize the intermittent cleaning process of the hemispherical resonator, different cleaning time and cleaning method can be personalized set according to different process requirements, the cleaning mode of different materials and different pollution conditions can be adapted, and the utility model has the advantages of convenient operation and strong adaptability, and is especially suitable for small batch and multi-specification cleaning requirements. BRIEF DESCRIPTION OF DRAWINGS

[0021] In order to make the utility model easier to understand, the utility model will be described in more detail by referring to the specific embodiments shown in the drawings. These drawings only depict typical embodiments of the utility model and should not be considered as limiting the scope of protection of the utility model.

[0022] Figure 1 It is a three-dimensional front view structural schematic diagram of the cleaning equipment for the hemispherical resonator of the utility model embodiment.

[0023] Figure 2 It is a three-dimensional rear view structural schematic diagram of the cleaning equipment for the hemispherical resonator of the utility model embodiment. Figure 3 It is a three-dimensional structural schematic diagram of the cleaning equipment for the hemispherical resonator of the utility model embodiment (the rack is not shown).

[0024] Figure 4 It is a three-dimensional structural schematic diagram of the basket in the utility model embodiment.

[0025] Figure 5 It is a three-dimensional structural schematic diagram of the cleaning agent tank in the utility model embodiment.

[0026] Figure 6 It is a three-dimensional structural schematic diagram of the cleaning agent tank installed in the ultrasonic cleaning tank in the utility model embodiment.

[0027] Figure 7The utility model discloses a three -dimensional structure schematic diagram of nitrogen blowing dry mechanism among the embodiment of the utility model.

[0028] Reference signs:

[0029] 1, three -axis screw rod slide rail mechanism, 2, nitrogen blowing dry mechanism, 21, air bellow, 22, connecting pipe, 23, nitrogen blowing -sweeping pipe, 24, pneumatic nozzle, 3, hanging basket, 31, basket, 32, positioning piece, 33, connecting plate, 34, sliding block, 35, hook plate, 36, hook rod, 37, hook part, 38, side plate, 4, cleaning agent tank, 41, nitrogen pipe, 42, nitrogen hole, 5, frame, 6, waste liquid tank, 7, ultrasonic cleaning tank, 8, unloading area, 9, infrared diffuse reflection inductor, 10, rack, 11, host computer, 12, buzzer, 13, exhaust fan. Specific implementation

[0030] The embodiment of the utility model is described below with reference to the drawings, so that the person skilled in the art can better understand the utility model and can be implemented, but the enumerated embodiment is not as the limitation of the utility model, and the following embodiment and the technical features in the embodiment can be combined mutually under the condition of not conflicting, wherein the same component is indicated with the same reference sign.

[0031] As Figures 1-7 Shown, the cleaning equipment of the hemispherical resonator of this embodiment, including frame 5, three -axis screw rod slide rail mechanism 1 and hanging basket 3, the inner chamber of frame 5 has cleaning area, drying area and unloading area, and a plurality of array arrangement cleaning agent tank 4 is installed in cleaning area, three -axis screw rod slide rail mechanism 1 is installed on the upper end of frame 5, and hanging basket 3 is hung on three -axis screw rod slide rail mechanism 1, for containing the hemispherical resonator to be cleaned, three -axis screw rod slide rail mechanism 1 is used to drive hanging basket 3 to move up and down, front and back, left and right, to the hemispherical resonator in hanging basket 3 is immersed in different cleaning agent tank 4, or moves to drying area to carry out the drying of hemispherical resonator, or moves to unload hanging basket 3 in unloading area.

[0032] Therefore, the utility model can complete the whole process operation of hemispherical resonator cleaning on single equipment, and cleaning efficiency is improved by several times.

[0033] In addition, since the utility model can realize the intermittent cleaning process of hemispherical resonator, different cleaning time and cleaning method can be personalized set according to different process requirements, and the cleaning mode of different materials and different pollution conditions can be adapted, which has the advantages of convenient operation, strong adaptability, etc., and is especially suitable for small batch, multi-specification cleaning requirements.

[0034] In the embodiment, the inner chamber of frame 5 is divided into upper layer and lower layer, the cleaning area, drying area and unloading area are located in the upper layer, and the lower layer has cleaning agent storage area and waste liquid storage area.

[0035] The device integrates cleaning and waste liquid recovery functions, greatly reducing the device usage area.

[0036] In this embodiment, the cleaning station adopts a 3x3 arrangement, which greatly reduces the floor space compared to traditional single-column or "L"-type nine-slot cleaning machines.

[0037] The three-axis screw slide rail mechanism 1 controls the hook to hook the basket 31, and then sequentially enters the nine cleaning agent tanks 4. The time the cleaning basket stays in each cleaning agent tank 4 can be individually set, so different cleaning times can be set according to different cleaning liquids and cleaning needs, making the cleaning process more flexible.

[0038] In this embodiment, the waste liquid storage area is equipped with multiple waste liquid tanks 6 made of fluoroplastic. The waste liquid tanks 6 are connected to the cleaning agent tanks 4 through fluoroplastic pipes, and electromagnetic valves are installed on the fluoroplastic pipes.

[0039] In this embodiment, the hanging basket 3 is made of fluoroplastic, which is resistant to strong acids, strong bases, and organic solvents, ensuring safety during use. It includes a basket 31, a hook, and a positioning structure. The positioning structure is located inside the basket 31 and is used to position multiple hemispherical resonators inside the basket 31. The lower end of the hook is hooked to the basket 31, and the upper end is slidably connected to the three-axis screw slide rail mechanism 1.

[0040] In this embodiment, the hook includes two hook plates 35 arranged in parallel along a horizontal first direction, and a sliding block 34 connected to the upper ends of the two hook plates 35. The sliding block 34 is slidably connected to the three-axis screw slide rail mechanism 1. The lower part of the hook plate 35 is bent upward to form a hook portion 37. The basket 31 is equipped with two connecting plates 33 at both ends along a horizontal second direction. Two hook rods 36 are fixed between the upper ends of the two connecting plates 33. The two hook rods 36 correspond to the hook portions 37 of the two hook plates 35. The hook can move up and down to enter or exit the hook portion 37.

[0041] In this embodiment, the positioning structure includes two positioning sheets 32 arranged in a horizontal first direction. The two positioning sheets 32 are connected by a side plate 38 along a horizontal second direction. The resonators are clamped between the two positioning sheets 32. The positioning structure is provided with multiple positioning mechanisms arranged in parallel along the horizontal first direction. The positioning structure can clamp 6-12 hemispherical resonators at the same time by using different sizes of cover plates. The basket 31 can accommodate two positioning structures at the same time, so it can clean up to 12-24 hemispherical resonators at the same time, achieving high-efficiency automatic cleaning.

[0042] In this embodiment, each cleaning agent tank 4 is provided with a nitrogen pipe 41 connected to a nitrogen source, and the nitrogen pipe 41 is provided with a nitrogen hole 42, and the nitrogen in the nitrogen source enters the cleaning liquid in the cleaning agent tank 4 through the nitrogen hole 42 to generate nitrogen bubbles to achieve the cavitation bubble cleaning function, which can improve the cleaning efficiency of the ultrasonic fragile workpiece (at this time the equipment does not open the ultrasonic function). Due to the particularity of the cleaning process, the cleaning agent tank 4 container is made of PP or fluoroplastic acid-resistant material. The cleaning agent tank 4 is provided with a quick connector on both sides for connecting with the corresponding cleaning agent storage tank and waste liquid tank 6 in the lower layer of the frame 5 to realize the injection and discharge control of the cleaning agent.

[0043] Cavitation bubble cleaning is a physical cleaning technology, which is usually used to clean the dirt and residues on the surface of the fragile hemispherical resonator manufactured by different processing parameters. The basic principle is to use the movement of bubbles in the liquid to produce mechanical impact and agitation to effectively remove the dirt attached to the surface. As shown in Figure Three When cleaning the fragile device, the system controls the nitrogen to enter the cleaning solution from the nitrogen hole 42 to form tiny bubbles, and continuously forms and increases in the liquid, and then rapidly breaks to produce instantaneous high pressure and shock wave. The energy released by the bubble when it breaks and the shock wave will form a local high pressure area in the liquid, which will exert force on the dirt attached to the surface to destroy its combination with the surface and make it fall off from the surface; at the same time, the local liquid movement and convection generated by the bubble when it breaks can also help to carry away the dirt from the surface of the hemisphere, so as to achieve thorough cleaning of the workpiece without damaging the surface.

[0044] In this embodiment, a plurality of ultrasonic cleaning tanks 7 are arranged side by side in the cleaning area, and a plurality of cleaning agent tanks 4 are divided in the plurality of ultrasonic cleaning tanks 7.

[0045] During the cleaning process of the hemispherical resonator, according to different needs, in addition to the ultrasonic fragile workpiece, most of them need to be cleaned with ultrasonic waves, and ultrasonic cleaning tanks 7 as shown in Figure 6 are needed. The inside is filled with pure water as ultrasonic medium. The hemispherical resonator to be cleaned is placed in the cleaning agent tank 4, and every 3 PP or fluoroplastic cleaning agent tanks 4 are placed in 1 ultrasonic cleaning tank 7.

[0046] In this embodiment, the drying area is provided with a nitrogen blowing drying mechanism 2, which includes a bellows 21, a nitrogen blowing pipe 23 arranged in the bellows 21, and a plurality of pneumatic nozzles 24 arranged on the nitrogen blowing pipe 23,

[0047] The nitrogen blowing pipe 23 is provided with two rows, and the two rows of nitrogen blowing pipes 23 are arranged at two ends in the width direction of the air bellow 21. Each row of nitrogen blowing pipes 23 has two nitrogen blowing pipes 23 arranged in upper and lower positions. The pneumatic nozzle 24 arranged on the upper nitrogen blowing pipe 23 is arranged obliquely downward, and the pneumatic nozzle 24 arranged on the lower nitrogen blowing pipe 23 is arranged obliquely upward. One end of the nitrogen blowing pipe 23 is sealed and penetrates through the air bellow 21, and then is connected with the nitrogen source through the connecting pipe 22.

[0048] In the embodiment, the rack 10 is also included, and the three-axis screw slide rail mechanism 1 is encapsulated in the rack 10. The rack 10 is provided with the upper computer 11, the exhaust fan 13 and the buzzer 12.

[0049] The electrical automation control is adopted. The operator only needs to input the cleaning program into the upper computer 11 to realize the full-automatic cleaning. At the same time, the cleaning parameters can be viewed in real time through the sensor components such as the temperature sensor and the liquid level sensor installed in the cleaning agent tank 4 and the ultrasonic cleaning tank 7 and the like, and the expected external conditions can be intervened in time.

[0050] Specifically, the device of the embodiment can realize the multi-station automatic intermittent ultrasonic cleaning of the hemispherical harmonic oscillator, as shown in Figure 1 and Figure 2 The device is mainly composed of two parts. The upper part is the rack 10, which is mainly encapsulated with the three-axis screw slide rail mechanism 1 for realizing the transfer function between different cleaning tanks. The main body of the rack 10 is constructed by a transparent glass plate or an acrylic panel and an aluminum profile. The frame 5 of the lower part is a two-layer structure. The first layer is the main cleaning area (see Figure 3 ), which is composed of three ultrasonic cleaning tanks 7 arranged side by side. Three sets of cleaning agent tanks 4 are installed in each cleaning tank. The pneumatic tee joint and the fluoroplastic joint are respectively arranged on the left and right sides of each cleaning agent tank 4, which are used for nitrogen delivery and cleaning agent injection and discharge. The right side of the cleaning area is the nitrogen blowing drying mechanism 2 and the unloading area 8. The infrared diffuse reflection sensor 9 is arranged in the unloading area 8, which is used for sensing whether the hanging basket 3 has been transferred to the unloading area. That is, the buzzer 12 is started through the program to remind the process personnel to take away the cleaned device. The second layer is mainly three fluoroplastic waste liquid tanks 6 for storing acid, alkali, organic solvent and waste pure water. Each waste liquid tank 6 is connected with the corresponding cleaning agent tank 4 or ultrasonic cleaning tank 7 (containing pure water) through the pipeline made of fluoroplastic. The pipeline is provided with a control unit such as an acid discharge pump, an organic pump and an electromagnetic valve. The recovery is started by the program setting or manually, so as to improve the operation efficiency as much as possible, and also reduce the risk of potential harm of the waste liquid to the human body. In addition, the exhaust gas generated in the cleaning process is discharged by the exhaust fan 13 arranged on the upper end of the rack 10.

[0051] The whole cleaning process is divided into the following steps according to the device function:

[0052] I. Ultrasonic cleaning area

[0053] 1) First organic solvent cleaning: The three-axis screw slide rail mechanism 1 is driven by a motor, and the hanging basket 3 containing the hemispherical resonator to be cleaned is transferred to the acetone cleaning agent tank and the twice-distilled purified alcohol cleaning agent tank according to the instructions input by the upper computer 11, and then ultrasonic cleaning is performed for 10-30 min and 5-20 min, respectively, to preliminarily remove the organic dirt on the surface of the hemispherical resonator, and then ultrasonic cleaning is performed in the pure water IV cleaning agent tank for 5-20 min to remove the organic solvent;

[0054] 2) Acid cleaning: The three-axis screw slide rail mechanism 1 is driven by a motor, and the hanging basket 3 containing the hemispherical resonator that has been preliminarily cleaned is transferred to the concentrated sulfuric acid cleaning agent tank and the concentrated hydrochloric acid cleaning agent tank according to the instructions input by the upper computer 11, and then ultrasonic cleaning is performed for 45-90 min, respectively, and then ultrasonic cleaning is performed using the pure water cleaning agent tank 4 to remove residual acid. This step is to further remove organic residues, inorganic salts, metal contaminants, and surface oxides;

[0055] 3) Second organic solvent cleaning: The three-axis screw slide rail mechanism 1 is driven by a motor, and the hanging basket 3 containing the hemispherical resonator that has been acid washed is transferred to the acetone cleaning agent tank and the twice-distilled purified alcohol cleaning agent tank according to the instructions input by the upper computer 21, and then ultrasonic cleaning is performed for 10-30 min and 5-20 min, respectively, to remove the organic dirt on the surface of the hemispherical resonator, and then ultrasonic cleaning is performed in the three pure water cleaning agent tanks in sequence for three times of 5-20 min to completely remove the organic solvent on the hemispherical resonator;

[0056] II. Cavitation bubble assisted cleaning

[0057] The cleaning agent tank 4 is equipped with two nitrogen gas pipes 41 for cavitation bubble assisted cleaning. For hemispherical resonators that are more prone to damage under ultrasonic conditions (such as different wall thicknesses), nitrogen gas can be introduced into the cleaning agent tank 4 through the nitrogen gas holes 42 to generate a large number of dense nitrogen bubbles, and the energy released by the bubble rupture can be used to clean the surface of the resonator. In addition, for difficult-to-handle surface stains, bubbling can be performed simultaneously with ultrasonic cleaning to enhance the cleaning effect.

[0058] III. Drying and unloading

[0059] 1) Cleaning and drying: The three-axis screw slide rail mechanism 1 is driven by a motor, and the hanging basket 3 containing the hemispherical resonator that has been cleaned is transferred to the isopropyl alcohol cleaning agent tank according to the instructions input by the upper computer 11, and ultrasonic cleaning is performed for 5-20 min to remove all impurities such as water and organic matter remaining on the resonator, and then the hanging basket 3 is transferred to the nitrogen drying mechanism 2 through the screw slide rail system for final nitrogen drying treatment.

[0060] 2) Drying

[0061] The nitrogen blowing mechanism 2 is as shown in the figure Figure 7 The inside of the wind box 21 is divided into two layers, and 8 pneumatic nozzles 24 are symmetrically placed in each layer. During the blowing process, the up-and-down swinging of the nozzles is controlled by a rudder, so that the high-pressure dry and purified nitrogen gas can be blown on the hemisphere, and the moisture can be discharged through the bottom water outlet and the side air outlet. The nitrogen blowing mechanism 2 is equipped with two electromagnetic valves and a set of pressure regulating valves, which are used for nitrogen switching and blowing pressure adjustment, respectively.

[0062] 3) Unloading

[0063] After the nitrogen blowing process is completed, the three-axis screw slide rail mechanism 1 is controlled by the preset instructions of the upper computer 11 to take the hanging basket 3 out of the wind box 21 and transfer it to the unloading area 8 (see Figure 3 ), which is equipped with a red diffuse reflection sensor 9 for reminding the unloading when the automatic cleaning of the cleaning machine is completed. When the hanging basket 3 is transferred to the unloading area 8, it will be sensed by the infrared diffuse reflection sensor 9, and the buzzer 12 will flash and alarm through the system program, reminding the process personnel to take it in time.

[0064] The above-described embodiments are only the preferred specific embodiments of the present application, and the phrase "in an embodiment", "in another embodiment", "in still another embodiment" or "in other embodiments" in this specification can refer to one or more of the same or different embodiments according to the present disclosure. The usual changes and replacements made by those skilled in the art within the scope of the technical scheme of the present application should be included in the protection scope of the present application.

Claims

1. A cleaning apparatus for hemispherical resonator, characterized in that, The frame (5) is provided with a cleaning area, a drying area and a discharging area in the inner cavity, a plurality of cleaning agent tanks (4) are arranged in the cleaning area, the three-axis screw rail mechanism (1) is arranged on the upper end of the frame (5), the hanging basket (3) is hung on the three-axis screw rail mechanism (1) and used for containing the hemispherical resonator to be cleaned, the three-axis screw rail mechanism (1) is used for driving the hanging basket (3) to move up and down, forward and backward and left and right, so that the hemispherical resonator in the hanging basket (3) is immersed in different cleaning agent tanks (4), or the hemispherical resonator is dried in the drying area, or the hanging basket (3) is unloaded in the discharging area.

2. The cleaning apparatus of the hemispherical resonator according to claim 1, wherein The inner cavity of the frame (5) is divided into an upper layer and a lower layer, the cleaning area, the drying area and the discharging area are located in the upper layer, and the lower layer is provided with a cleaning agent storage area and a waste liquid storage area.

3. The cleaning apparatus of the hemispherical resonator according to claim 2, wherein The waste liquid storage area is provided with a plurality of waste liquid tanks (6) made of fluoroplastic, the waste liquid tanks (6) are connected with the cleaning agent tanks (4) through fluoroplastic pipes, and electromagnetic valves are arranged on the fluoroplastic pipes.

4. The cleaning apparatus of the hemispherical resonator according to any one of claims 1 to 3, characterized in that, The hanging basket (3) comprises a basket (31), a lifting hook and a positioning structure, the positioning structure is arranged in the basket (31) and used for positioning a plurality of hemispherical resonators in the basket (31), the lower end of the lifting hook is hooked with the basket (31), and the upper end of the lifting hook is slidably arranged on the three-axis screw rail mechanism (1).

5. The cleaning apparatus of the hemispherical resonator according to claim 4, wherein The lifting hook comprises two hook plates (35) arranged in parallel along a horizontal first direction, and a sliding block (34) connected to the upper ends of the two hook plates (35), the sliding block (34) is slidably connected with the three-axis screw rail mechanism (1), the lower part of the hook plate (35) is bent upwards to form a hook part (37), the basket (31) is provided with a connecting plate (33) at each end along a horizontal second direction, two hook rods (36) are fixed between the upper ends of the two connecting plates (33), the two hook rods (36) correspond to the hook parts (37) of the two hook plates (35) one by one, and the lifting hook can move up and down to be inserted into or separated from the hook parts (37) of the corresponding hook rods (36).

6. The cleaning apparatus of the hemispherical resonator according to claim 5, wherein The positioning structure comprises two positioning sheets (32) arranged at intervals along the horizontal first direction, the two positioning sheets (32) are connected through a side plate (38) at two ends along the horizontal second direction, and the resonator is clamped between the two positioning sheets (32); a plurality of positioning structures are arranged, and the plurality of positioning structures are arranged side by side along the horizontal first direction.

7. The cleaning apparatus of the hemispherical resonator according to any one of claims 1 to 3, wherein A nitrogen pipe (41) in communication with a nitrogen source is arranged in each cleaning agent tank (4), a nitrogen hole (42) is formed in the nitrogen pipe (41), and nitrogen in the nitrogen source enters the cleaning liquid in the cleaning agent tank (4) through the nitrogen hole (42) to generate nitrogen bubbles.

8. The cleaning apparatus of the hemispherical resonator according to claim 7, wherein A plurality of ultrasonic cleaning tanks (7) are arranged in the cleaning area, and the plurality of cleaning agent tanks (4) are arranged in the plurality of ultrasonic cleaning tanks (7).

9. The cleaning apparatus of the hemispherical resonator according to any one of claims 1 to 3, wherein The drying area is provided with a nitrogen blowing drying mechanism (2), the nitrogen blowing drying mechanism (2) comprises a wind box (21), a nitrogen blowing pipe (23) arranged in the wind box (21), and a plurality of pneumatic nozzles (24) arranged on the nitrogen blowing pipe (23), The nitrogen blowing pipe (23) is provided with two rows, the two rows of nitrogen blowing pipes (23) are arranged at two ends in the width direction of the air bellow (21), each row of nitrogen blowing pipes (23) has two nitrogen blowing pipes (23) arranged in upper and lower directions, the pneumatic nozzle (24) on the upper nitrogen blowing pipe (23) is arranged obliquely downward, the pneumatic nozzle (24) on the lower nitrogen blowing pipe (23) is arranged obliquely upward, one end of the nitrogen blowing pipe (23) is sealed and penetrates through the air bellow (21) and is communicated with the nitrogen source through the connecting pipe (22).

10. The cleaning apparatus of the hemispherical resonator according to any one of claims 1 to 3, wherein The three-axis screw slide rail mechanism (1) is packaged in the rack (10), and the rack (10) is provided with an upper computer (11), an exhaust fan (13) and a buzzer (12).

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