Weighing device and weighing system

Abstract

The utility model provides a weighing device and a weighing system.The weighing device is arranged in a gluing and developing machine table and comprises a groove body, the top end of the groove body is provided with an opening, the groove body is provided with a containing cavity, the opening is communicated with the containing cavity, and a photoresist sprayed out of a photoresist sprayer of the gluing and developing machine table can enter the containing cavity through the opening; the weighing part is connected with the bottom of the groove body and used for measuring the weight of the light resistor in the containing cavity, and / or the groove body is a transparent groove body, and scales are arranged on the side wall of the groove body and used for measuring the size of the light resistor in the containing cavity. The device is arranged in the gluing developing machine table, the groove body is arranged, and the bottom of the groove body is connected with the weighing part, so that the weight of the photoresist in the accommodating cavity can be directly read, manual operation is reduced, the labor and time cost is saved, and the pollution possibility caused by manual operation is reduced; and the damage to parts of the gluing and developing machine and the risk of personal safety are reduced.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and more specifically to a weighing device and weighing system. Background Technology

[0002] In the etching process of semiconductor manufacturing, in order to ensure that the actual amount of photoresist sprayed onto the wafer is consistent with the set amount, it is necessary to weigh the photoresist to calibrate the photoresist flow meter.

[0003] In related technologies, weighing photoresist usually requires a lot of repetitive manual operations, which is costly in terms of manpower and time. Moreover, it is easy to cause the coating and developing machine to be contaminated, damaged or even endanger personal safety due to human error. Utility Model Content

[0004] The utility model description section introduces a series of simplified concepts, which will be further explained in detail in the detailed description section. This utility model description section is not intended to limit the key features and essential technical features of the claimed technical solution, nor is it intended to determine the scope of protection of the claimed technical solution.

[0005] To address the existing problems, this application provides a weighing device, which is installed inside a coating and developing machine and includes:

[0006] The tank has an opening at the top and a receiving cavity. The opening is connected to the receiving cavity, and the photoresist sprayed from the photoresist nozzle of the coating and developing machine can enter the receiving cavity through the opening.

[0007] A weighing component is connected to the bottom of the tank and is used to measure the weight of the photoresist inside the cavity. Alternatively, the tank is a transparent tank with graduations on its sidewalls for measuring the volume of the photoresist inside the cavity.

[0008] For example, the weighing device further includes:

[0009] The drain pipe is connected at one end to the bottom of the side wall of the tank and is used to drain the fluid in the containment cavity.

[0010] For example, a valve is provided at the connection between the drain pipe and the tank body. The valve is used to control whether the drain pipe is connected to or blocked from the receiving cavity.

[0011] For example, the weighing device further includes:

[0012] A tank cleaning pipe, one end of which is connected to the side wall of the tank, is used to spray cleaning fluid into the accommodating cavity; and / or

[0013] The drying tube, with one end connected to the side wall of the tank, is used to supply drying gas to the accommodating cavity after cleaning.

[0014] For example, a drying pipe, a tank cleaning pipe, and a drain pipe are arranged sequentially along the opening toward the bottom of the tank.

[0015] For example, a tank cover is rotatably connected to the top of the tank, and the tank cover can be rotated to open or close the opening.

[0016] For example, the drying gas is an inert gas.

[0017] For example, the weighing component includes an electronic scale.

[0018] This application also provides a weighing system, comprising:

[0019] The aforementioned weighing device and optical resist calibration component;

[0020] The weighing device is located above the nozzle cleaning tank of the coating and developing machine.

[0021] The photoresist calibration component is electrically connected to the weighing device to calibrate the photoresist flowmeter based on the comparison between the measured value of the weighing device and the measured value of the photoresist flowmeter.

[0022] For example, the weighing system also includes an image acquisition device for acquiring an image of a scale containing the volume of photoresist within the accommodating cavity.

[0023] The weighing device and weighing system of this application embodiment are provided with a tank having a accommodating cavity. The top of the tank has an opening, through which the photoresist can enter the accommodating cavity of the tank. A weighing component is connected to the bottom of the tank, so that the weight of the photoresist in the accommodating cavity can be read directly. At the same time, a transparent tank with graduations can be used, so that the volume of the photoresist in the accommodating cavity can be read directly through the graduations. This reduces manual operation, saves manpower and time costs, reduces the possibility of contamination caused by manual operation, and reduces the risk of damage to the coating and developing machine parts and personal safety. Attached Figure Description

[0024] The following drawings, which are incorporated herein by reference and are used to understand this application, illustrate embodiments of the invention and their descriptions to explain the principles of the invention.

[0025] In the attached image:

[0026] Figure 1 A schematic diagram of the structure of a weighing device according to a specific embodiment of this application is shown;

[0027] Figure 2 A schematic diagram of the structure of a weighing system according to a specific embodiment of this application is shown.

[0028] In the accompanying drawings:

[0029] 10 tank body;

[0030] 101 scale;

[0031] 102 accommodation cavity;

[0032] 20 weighing component;

[0033] 30 drain pipe;

[0034] 301 valve;

[0035] 40 tank cleaning pipe;

[0036] 50 drying pipe;

[0037] 200 weighing system;

[0038] 201 weighing device;

[0039] 202 photoresist calibration component. Detailed implementation manners

[0040] Next, the present application will be described more completely with reference to the accompanying drawings, in which embodiments of the present application are shown. However, the present application can be implemented in different forms and should not be construed as limited to the embodiments set forth herein. On the contrary, providing these embodiments will make the disclosure thorough and complete, and will fully convey the scope of the present application to those skilled in the art. In the drawings, for clarity, the dimensions and relative dimensions of layers and regions may be exaggerated. Like reference numerals denote like elements throughout.

[0041] It should be understood that when an element or layer is referred to as being "on", "adjacent to", "connected to" or "coupled to" another element or layer, it can be directly on, adjacent to, connected or coupled to the other element or layer, or intervening elements or layers may be present. In contrast, when an element is referred to as being "directly on", "directly adjacent to", "directly connected to" or "directly coupled to" another element or layer, there are no intervening elements or layers. It should be understood that although the terms first, second, third, etc. may be used to describe various elements, components, regions, layers and / or sections, these elements, components, regions, layers and / or sections should not be limited by these terms. These terms are only used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, the first element, component, region, layer or section discussed below may be denoted as the second element, component, region, layer or section without departing from the teachings of the present application.

[0042] Spatial relation terms such as “below,” “under,” “below,” “under,” “above,” “above,” etc., are used herein for convenience of description to describe the relationship between one element or feature shown in the figure and other elements or features. It should be understood that, in addition to the orientation shown in the figure, spatial relation terms are intended to also include different orientations of the device in use and operation. For example, if the device in the figure is flipped, then the element or feature described as “below” or “under” the other element or feature will be oriented “above” the other element or feature. Therefore, the exemplary terms “below” and “under” can include both upper and lower orientations. The device may be otherwise oriented (rotated 90 degrees or otherwise) and the spatial descriptive terms used herein will be interpreted accordingly.

[0043] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of this application. When used herein, the singular forms “a,” “an,” and “ / the” are also intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the terms “comprising” and / or “including,” when used in this specification, identify the presence of features, integers, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or groups. When used herein, the term “and / or” includes any and all combinations of the associated listed items.

[0044] Embodiments of the application are described herein with reference to cross-sectional views illustrating ideal embodiments (and intermediate structures). Thus, variations from the shapes shown can be anticipated due to, for example, manufacturing techniques and / or tolerances. Therefore, embodiments of the application should not be limited to the specific shapes of the regions shown herein, but include shape deviations due to, for example, manufacturing processes. For example, implantation regions shown as rectangular typically have rounded or curved features at their edges and / or implantation concentration gradients, rather than a binary change from implantation regions to non-implantation regions. Similarly, buried regions formed by implantation can result in some implantation in the region between the buried region and the surface traversed during implantation. Therefore, the regions shown in the figures are substantially schematic, and their shapes are not intended to show the actual shapes of the regions of the device and are not intended to limit the scope of the application.

[0045] Unless otherwise defined, all terms used herein (including technical and scientific terms) shall have the same meaning as commonly understood by one of ordinary skill in the art. It will also be understood that terms as defined in commonly used dictionaries shall be interpreted as having a meaning consistent with their meaning in the relevant field and / or the context of this specification, and not as in an ideal or overly formal sense, unless expressly defined herein.

[0046] To fully understand this application, detailed steps and structures will be presented in the following description to illustrate the technical solutions proposed in this application. Preferred embodiments of this application are described in detail below; however, in addition to these detailed descriptions, this application may have other implementation methods.

[0047] In the etching process of semiconductor manufacturing, in order to ensure that the actual amount of photoresist sprayed onto the wafer by the coating and developing machine is consistent with the set amount of the coating and developing machine, it is necessary to weigh the photoresist to calibrate the photoresist flow meter.

[0048] In related technologies, the methods for weighing photoresist sprayed onto wafers by a coating and developing machine are divided into graduated cylinder type and electronic scale weighing type. The main steps for weighing photoresist using the graduated cylinder type include: 1. Moving the photoresist arm above the wafer clamp and positioning it at the height required for maintenance of the coating and developing machine; 2. Holding the graduated cylinder to catch the sprayed photoresist; 3. Reading the graduated cylinder reading. If the read photoresist value does not match the value measured by the photoresist flow meter, calibrate the flow meter and adjust the pressure at which the photoresist is sprayed from the coating and developing machine; 4. Wiping the graduated cylinder clean with a lint-free cloth. Repeat the steps of spraying the photoresist, measuring with the graduated cylinder, and cleaning the graduated cylinder until the measured photoresist value matches the value measured by the flow meter.

[0049] The main steps for measuring photoresist using an electronic scale include: 1. Moving the photoresist arm above the wafer clamp, ensuring its height is at the maintenance height of the coating and developing machine; 2. Zeroing the electronic scale and placing a small beaker in the center of the wafer clamp to catch the ejected photoresist; 3. After the photoresist ejection is complete, removing the small beaker and weighing it on the electronic scale. If the measured photoresist value differs from the value measured by the photoresist flow meter, the flow meter is calibrated, and the pressure of the photoresist ejected from the coating and developing machine is adjusted accordingly; 4. Cleaning the small beaker with a lint-free cloth, repeating the steps of ejecting the photoresist, measuring the photoresist with the electronic scale, and cleaning the small beaker until the measured photoresist value matches the value measured by the flow meter. Both of these related technologies require significant manpower and time for photoresist weighing, and are prone to risks of human error leading to contamination of the coating and developing machine, damage to machine components, or even personal safety hazards.

[0050] Therefore, in view of the aforementioned technical problems, this application proposes a weighing device and a weighing system. The weighing device is installed inside a coating and developing machine, and the weighing device includes:

[0051] The tank has an opening at the top and a receiving cavity that is connected to the opening. The photoresist ejected from the photoresist nozzle of the coating and developing machine can enter the receiving cavity through the opening.

[0052] A weighing component is connected to the bottom of the tank and is used to measure the weight of the photoresist inside the cavity. Alternatively, the tank is a transparent tank with graduations on its sidewalls for measuring the volume of the photoresist inside the cavity.

[0053] The weighing device of this application embodiment is provided with a tank having a accommodating cavity. The top of the tank has an opening that communicates with the accommodating cavity. The photoresist can enter the accommodating cavity of the tank through the opening. A weighing component is connected to the bottom of the tank, so that the weight of the photoresist in the accommodating cavity can be read directly. At the same time, a transparent tank with graduations can be used, so that the volume of the photoresist in the accommodating cavity can be read directly through the graduations. This reduces manual operation, saves labor and time costs, reduces the possibility of contamination caused by manual operation, and reduces the risk of damage to the coating and developing machine parts and personal safety.

[0054] To fully understand this application, detailed steps and structures will be presented in the following description to illustrate the technical solutions proposed in this application. Preferred embodiments of this application are described in detail below; however, in addition to these detailed descriptions, this application may have other implementation methods.

[0055] Below, for reference Figure 1 and Figure 2 The weighing device and weighing system of this application are described in detail.

[0056] like Figure 1 As shown, the weighing device is installed inside the coating and developing machine (not shown). The weighing device includes a tank 10 and a weighing component 20. The top of the tank 10 has an opening, and the tank is provided with a receiving cavity 102, which communicates with the opening. The photoresist ejected from the photoresist nozzle of the coating and developing machine can enter the receiving cavity 102 of the tank 10 through the opening. The weighing component 20 is connected to the bottom of the tank 10 and is used to measure the weight of the photoresist in the receiving cavity 102.

[0057] It is worth mentioning that the weighing device is a dedicated photoresist weighing slot inside the coating and developing machine. The slot 10 can be a transparent slot with a scale 101 on its side wall. This scale 101 is used to measure the volume of the photoresist in the accommodating cavity 102. The operator can directly obtain the volume of the photoresist in the accommodating cavity 102 from the outside of the slot 10 through the scale 101. Depending on the measurement requirements, either volume measurement or weight measurement can be used to measure the photoresist.

[0058] In one example, the zero mark of the scale 101 on the side wall of the tank 10 is located at the connection between the tank 10 and the weighing component 20, which allows for more accurate measurement of the volume of photoresist within the accommodating cavity 102. In some embodiments, a tank cover (not shown) is rotatably connected to the top of the tank. The tank cover can be rotated to open or close the opening. During cleaning, the tank cover can cover the opening of the tank 10 to prevent the cleaning fluid from overflowing from the tank when cleaning the accommodating cavity 102.

[0059] In some examples, the weighing component includes an electronic scale with a display screen that directly shows the weighing reading. This application integrates the weighing tool, i.e., the weighing component and the tank, inside the coating and developing machine. It uses a graduated tank, with the weighing component connected to the bottom of the tank. This eliminates the need for manual measurement of the photoresist's weight or volume; instead, measurement is performed directly inside the coating and developing machine. Operators can obtain the photoresist's weight or volume simply by reading the scale reading or the tank's graduations. This reduces manual operation, saves labor and time costs, lowers the possibility of contamination from human error, and reduces the risk of damage to coating and developing machine components and personal safety.

[0060] In some embodiments, continue as follows Figure 1 As shown, the weighing device also includes: a drain pipe 30, a tank cleaning pipe 40, and a drying pipe 50, wherein the drying pipe 50, the tank cleaning pipe 40, and the drain pipe 30 are arranged sequentially along the opening of the tank 10 towards the bottom of the tank 10. One end of the drain pipe 30 is connected to the bottom of the side wall of the tank 10 and is used to drain the fluid in the accommodating cavity 102, such as waste liquid after cleaning; one end of the tank cleaning pipe 40 is connected to the side wall of the tank 10, for example, to the upper middle part of the side wall of the tank 10, and the tank cleaning pipe 40 is used to spray cleaning liquid into the accommodating cavity 102; one end of the drying pipe 50 is connected to the side wall of the tank 10, for example, to the top of the side wall of the tank 10, and the drying pipe 50 is used to provide drying gas into the accommodating cavity 102 after cleaning is completed. In some examples, the drying gas includes an inert gas, such as nitrogen.

[0061] In some examples, the tank cleaning pipe is selected as a cleaning pipe with nozzles. The water flow through the nozzles maintains a high flow rate and a stable jet, which is more conducive to cleaning the tank. Furthermore, while ensuring a certain jetting effect, the nozzles can minimize water consumption. By optimizing the nozzle design, water conservation can be achieved without sacrificing performance. In one example, the tank, drain pipe, and drying pipe are all cylindrical, and the transparent tank is made of materials including, but not limited to, transparent plastic or glass. In another example, to ensure the durability and chemical stability of the drain pipe, it is typically made of corrosion-resistant and high-temperature-resistant materials, such as fluoropolymer materials.

[0062] In some embodiments, continue as follows Figure 1 As shown, a valve 301 is provided at the connection between the drain pipe 30 and the tank 10. The valve 301 is used to control the connection or blockage between the drain pipe 30 and the accommodating cavity 102. In some embodiments, the valve 301 can also be used to control the flow rate of the fluid.

[0063] In one embodiment, such as Figure 1 As shown, when weighing the actual amount of photoresist, close valve 301 of drain pipe 30, move the photoresist arm above the opening of tank 10, select the corresponding photoresist spraying step in the coating and developing machine, confirm the spraying pressure of the coating and developing machine, and then start the photoresist spraying. The photoresist is sprayed into the receiving cavity 102. After the photoresist spraying is completed, read the weight displayed on the scale 101 on the side wall of tank 10 or on the weighing component 20, which is the measured value of the weighing device. Compare the measured value of the weighing device with the measured value of the photoresist flow meter. If the comparison result is unqualified, that is, there is a deviation between the two measured values, the operator calibrates the photoresist flow meter and applies the coating. The developing machine adjusts the spray pressure according to the calibrated value of the photoresist flow meter; then the valve 301 of the drain pipe 30 is opened, and the cleaning fluid is sprayed from the tank cleaning pipe 40 into the accommodating cavity 102 of the tank 10 to clean the inner wall of the tank 10. During the cleaning process, the tank cover at the top of the tank 10 is closed to prevent the cleaning fluid from overflowing when it is sprayed into the tank 10. The cleaned photoresist waste liquid is discharged from the drain pipe 30; then, a drying gas, such as nitrogen, is introduced into the accommodating cavity 102 through the drying pipe 50 to dry the residual cleaning fluid in the tank 10. Finally, the valve 301 of the drain pipe 30 is closed, and the machine is ready to perform the next photoresist actual measurement.

[0064] This application also provides a weighing system, such as Figure 2 As shown, the weighing system 200 includes: the weighing device 201 mentioned above and the photoresist calibration component 202; the weighing device 201 is disposed above the nozzle cleaning tank of the coating and developing machine; the photoresist calibration component 202 is electrically connected to the weighing device 201 to calibrate the photoresist flow meter based on the comparison result between the measured value of the weighing device 201 and the measured value of the photoresist flow meter.

[0065] For example, the weighing system also includes an image acquisition device disposed inside the coating and developing machine and located on one side of the tank and corresponding to the side wall of the tank. The image acquisition device is used to acquire an image of the scale containing the volume of photoresist in the accommodating cavity, so that the scale on the tank does not need to be read manually. The image acquisition device includes, but is not limited to, a camera.

[0066] In some embodiments, such as Figure 1 and 2As shown, when weighing the actual amount of photoresist, open the tank cover of the weighing device 201, close the valve 301 of the drain pipe 30, move the photoresist arm above the opening of the tank 10, select the corresponding photoresist spraying step in the coating and developing machine, confirm the spraying pressure of the coating and developing machine, and then start the photoresist spraying. The photoresist is sprayed into the tank 10. The image acquisition device (not shown) acquires an image showing the volume of the photoresist in the accommodating cavity 102. The control component (not shown) in the coating and developing machine reads the image to obtain the measured value of the photoresist in the accommodating cavity 102, i.e., the volume value. Then the control component reads the measured value of the photoresist flow meter and compares the measured value of the photoresist flow meter with the measured value acquired by the image acquisition device. If the comparison result is not qualified, i.e., the two measurements are not qualified, the photoresist flow meter is not qualified. If there is a deviation between the values, the photoresist calibration component 202 calibrates the photoresist flowmeter. The control component adjusts the spray pressure according to the calibrated photoresist flowmeter value. The operator opens the valve 301 of the drain pipe 30, and the cleaning fluid is sprayed from the tank cleaning pipe 40 into the receiving cavity 102 to clean the inner wall of the receiving cavity 102 of the tank 10. During the cleaning process, the tank cover at the top of the tank 10 is closed to prevent the cleaning fluid from overflowing when it is sprayed into the receiving cavity 102. The cleaned photoresist waste liquid is discharged from the drain pipe 30. Then, a drying gas, such as nitrogen, is introduced into the receiving cavity 102 through the drying pipe 50 to dry the residual cleaning fluid in the receiving cavity 102. Finally, the valve 301 of the drain pipe 30 is closed to prepare for the next photoresist actual measurement.

[0067] This concludes the introduction to the weighing device and weighing system of this application. A complete weighing device and weighing system may also include other components, which will not be described in detail here.

[0068] In summary, according to the weighing device and weighing system of this application, by setting the weighing device inside the coating and developing machine, a tank with a accommodating cavity is provided. The top of the tank has an opening that communicates with the accommodating cavity, allowing the photoresist to enter the accommodating cavity through the opening. A weighing component is connected to the bottom of the tank, thus allowing direct reading of the photoresist weight within the accommodating cavity. Furthermore, a transparent tank can be used, and scales can be set on the side walls of the tank, allowing direct reading of the photoresist volume within the accommodating cavity. An image acquisition device can also automatically obtain the scale readings of the photoresist volume within the accommodating cavity, thereby achieving automatic weighing within the coating and developing machine. Moreover, the weighing system integrates the weighing device and the photoresist calibration component, thereby achieving automatic weighing of the photoresist and automatic calibration when the photoresist flow meter deviates. This reduces manual operation, saves labor and time costs, reduces the possibility of contamination caused by manual operation, and lowers the risk of damage to coating and developing machine components and personal safety.

[0069] Although several embodiments have been described herein, it should be understood that many other modifications and embodiments will arise in the mind of those skilled in the art, all of which will fall within the spirit and scope of the concept disclosed herein. More specifically, various modifications and changes may be made in terms of the arrangement and / or components of the subject matter within the scope of this disclosure, the drawings, and the appended claims. In addition to modifications and changes in the components and / or arrangement, the use of alternative methods will also be obvious to those skilled in the art.

Claims

1. A weighing device, characterized in that, The weighing device is located inside the coating and developing machine and includes: The tank has an opening at its top and a receiving cavity. The opening is connected to the receiving cavity, and the photoresist ejected from the photoresist nozzle of the coating and developing machine can enter the receiving cavity through the opening. A weighing component is connected to the bottom of the tank and is used to measure the weight of the photoresist in the cavity. Alternatively, the tank is a transparent tank with graduations on its sidewalls, the graduations being used to measure the volume of the photoresist in the cavity.

2. The weighing device as described in claim 1, characterized in that, Also includes: A drain pipe, one end of which is connected to the bottom of the side wall of the tank, is used to drain the fluid in the accommodating cavity.

3. The weighing device as described in claim 2, characterized in that, A valve is provided at the connection point between the drain pipe and the tank body. The valve is used to control whether the drain pipe is connected to or blocked from the accommodating cavity.

4. The weighing device as described in claim 2, characterized in that, Also includes: A tank cleaning pipe, one end of which is connected to the side wall of the tank, is used to inject cleaning fluid into the accommodating cavity; And / or, A drying tube, one end of which is connected to the side wall of the tank, is used to supply drying gas to the accommodating cavity.

5. The weighing device as described in claim 4, characterized in that, Along the opening toward the bottom of the tank, the drying pipe, the tank cleaning pipe, and the drain pipe are arranged in sequence.

6. The weighing device as described in claim 1, characterized in that, The top of the tank is rotatably connected to a tank cover, which can be rotated to open or close the opening.

7. The weighing device as described in claim 4, characterized in that, The drying gas is an inert gas.

8. The weighing device as described in claim 1, characterized in that, The weighing component includes an electronic scale.

9. A weighing system, characterized in that, include: The weighing device and the optical resist calibration component as described in any one of claims 1 to 8; The weighing device is located above the nozzle cleaning tank of the coating and developing machine. The optical resist calibration component is electrically connected to the weighing device to calibrate the optical resist flow meter based on the comparison between the measured value of the weighing device and the measured value of the optical resist flow meter.

10. The weighing system as described in claim 9, characterized in that, It also includes an image acquisition device for acquiring images of a scale containing the volume of photoresist within the cavity.

Images