Plasma reaction chamber, microwave plasma generating device and system

Abstract

The utility model relates to the technical field of microwave detection, in particular to a plasma reaction cavity, a microwave plasma generating device and a microwave plasma generating system. The plasma reaction cavity comprises a cavity body, a cuboid-shaped cavity is formed in the cavity body, at least one microwave inlet used for being connected to a microwave source is formed in the cavity wall of the cavity body, and a plurality of observation windows are further formed in the cavity wall of the cavity body. The observation window is used for connecting a light intensity detection device for detecting the light intensity of plasma in the chamber; a plurality of annular areas are sequentially formed on the cavity wall of the cavity from inside to outside with the center point of the cavity wall as the circle center, and the observation windows in the annular areas are distributed around the center point in a central symmetry mode in the annular areas. According to the plasma reaction chamber, the position of the observation window is designed on the chamber body according to the characteristics of the plasma, so that the uniformity of the microwave plasma in the chamber can be evaluated more scientifically subsequently.

Description

TECHNICAL FIELD

[0001] The utility model relates to microwave detection technical field, concretely is a kind of plasma reaction cavity, generating device and generating system. BACKGROUND

[0002] In microwave engineering, the design of the feed system has an important influence on the performance of the equipment. Single-port feed and multi-port feed are two common feed methods, each with different technical backgrounds and application scenarios.

[0003] Single-port feed introduces microwave signals into the cavity through one feed point, commonly used in microwave ovens and some basic heating applications. Its design is simple and low in cost, but it can lead to uneven distribution of microwave field in the cavity, affecting the heating effect. Although this method is suitable for applications with low requirements, its performance limitations make it unsuitable for high-precision and high-uniformity applications. Multi-port feed involves multiple feed points, which introduces microwave signals into the cavity through distributors or couplers and other components, enabling more complex signal distribution and control. It is commonly used in microwave etching devices and high-performance cleaning equipment to improve the uniformity of the microwave field and processing effect. This method can provide more uniform microwave field distribution, suitable for high-precision and high-performance applications, but the design and manufacturing are complex and costly.

[0004] Due to the involvement of various complex physical and chemical processes in microwave plasma technology, its excitation process is difficult to predict and control. In view of the limitations of existing microwave plasma technology to improve uniformity, the utility model aims to develop a feedback regulation device combining plasma light intensity diagnosis and multi-source feed. SUMMARY

[0005] In order to avoid and overcome the technical problems existing in the prior art, the utility model provides a kind of plasma reaction cavity, generating device and generating system. The utility model can improve the uniformity of plasma distribution in the plasma chamber.

[0006] To achieve the above purpose, the utility model provides the following technical scheme:

[0007] The first aspect of the utility model provides a kind of plasma reaction cavity, including the cavity that the cuboid-shaped chamber is formed in inside, at least one microwave inlet for connecting to microwave source is set on the cavity wall of cavity, multiple observation windows are also set on the cavity wall of cavity, the observation window is used to connect the light intensity detection device of detecting the plasma light intensity inside the chamber;The cavity wall is sequentially formed with multiple annular regions with the center point of the cavity wall as the center and from inside to outside, the observation windows in each annular region are distributed around the center point in the annular region in central symmetry.

[0008] As a further scheme of the utility model: the cavity includes adjacent or opposite first cavity wall and second cavity wall, the microwave entrance is arranged in the first cavity wall, the observation window is arranged in the second cavity wall.

[0009] As a further scheme of the utility model: each observation window on the second cavity wall is evenly distributed along two diagonal lines of the cavity wall, or each observation window on the second cavity wall is evenly distributed along the cross symmetry line of the cavity wall.

[0010] As a further scheme of the utility model: the cavity includes at least two first cavity walls adjacent to each other, and / or at least two microwave entrances are arranged on each first cavity wall, and the microwave entrances on each first cavity wall are symmetrically distributed around the center point of the first cavity wall.

[0011] As a further scheme of the utility model: the cavity includes three first cavity walls adjacent to each other, two microwave entrances are arranged on each first cavity wall, and / or the cavity includes at least two second cavity walls.

[0012] As a further scheme of the utility model: the cavity further includes a cavity door that can be opened and closed, and the observation window is arranged on the cavity door.

[0013] The second aspect of the utility model further provides a microwave plasma generating device, the microwave plasma generating device includes the plasma reaction cavity according to the first aspect of the utility model and the microwave source connected to the microwave entrance to emit microwave into the plasma chamber, and at least two microwave sources are installed on the same first side wall.

[0014] The third aspect of the utility model further provides a microwave plasma generating system, the microwave plasma generating system includes the microwave plasma generating device according to the second aspect of the utility model, the light intensity detection device for being connected to each observation window to detect the light intensity in the plasma chamber, and the analysis end for analyzing the detection data of each light intensity detection device.

[0015] As a further scheme of the utility model: the light intensity detection device is a light intensity sensor.

[0016] As a further scheme of the utility model: the analysis end includes a computer for receiving and analyzing detection data, and the output end of the computer is connected with a tuner that can adjust each microwave source according to the analysis result.

[0017] Compared with the prior art, the utility model has the beneficial effects including:

[0018] 1. The utility model discloses a plurality of annular regions are divided from inside to outside on the installation cavity wall of observation window with the center point as the center, and the observation window in each annular region is centrally symmetrically distributed around the center point. This design of the position of the observation window on the plasma reaction cavity according to the characteristics of the plasma can obtain the real distribution of the plasma in the chamber of the plasma reaction cavity, so as to more scientifically evaluate the uniformity of the microwave plasma in the chamber.

[0019] 2. The observation windows of the second cavity wall are uniformly distributed along the diagonal lines, and a special observation window is arranged at the intersection of the two diagonal lines as the center point, and the remaining observation windows are symmetrically arranged around the axis of the center point. This layout not only improves the detection efficiency, but also enhances the reliability and accuracy of the detection data, because the diagonal layout can maximize the coverage of the corners and edges of the chamber.

[0020] 3. By arranging observation windows on at least two second cavity walls, comprehensive monitoring of the light intensity in the plasma chamber is ensured. There is no missed area, and the light intensity change of the plasma can be captured in real time and accurately.

[0021] 4. Real-time monitoring of the light intensity emitted by the microwave plasma is realized through the light intensity detection device, and the distribution state of the plasma can be obtained through the light intensity data of the plasma, providing a reliable basis for subsequent accurate control of the microwave source. The design of the control end enables the system to intelligently analyze the data provided by the light intensity detection device and adjust the output of each microwave source accordingly, thereby realizing dynamic adjustment of the plasma and improving the uniformity of the plasma distribution.

[0022] 5. The utility model combines real-time monitoring and intelligent control, and the device can ensure uniform distribution of the plasma in the plasma chamber. This feature is crucial for many application fields, such as material processing, surface modification, and waste gas treatment, as it directly affects the uniformity of the processing effect and product quality.

[0023] Other features and advantages of the utility model will be described in the subsequent specification, and some will become apparent from the specification, or will be understood by implementing the utility model. The purpose and other advantages of the utility model can be realized and obtained through the structure indicated in the specification and the drawings. BRIEF DESCRIPTION OF DRAWINGS

[0024] Figure 1 It is the overall structure schematic diagram of a preferred embodiment of the utility model.

[0025] Figure 2 It is the exploded structure schematic diagram of the embodiment shown. Figure 1

[0026] ​Figure 3 For Figure 1 One distribution structure diagram of the observation window in the embodiment is shown, wherein the observation window is distributed along the diagonal line.

[0027] Figure 4 One distribution structure diagram of the observation window in the embodiment is shown, wherein the observation window is distributed along the diagonal line.

[0028] Figure 5 One distribution structure diagram of the observation window in the embodiment is shown, wherein the observation window is distributed along the diagonal line.

[0029] In the figure: 1, cavity; 1a, first cavity wall; 1b, second cavity wall; 11, plasma cavity; 12, observation window; 13, microwave inlet; 2, microwave source; 3, light intensity detection device. DETAILED DESCRIPTION

[0030] In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, it will be apparent to one skilled in the art that the present application can be practiced without one or more of these specific details. In other instances, well-known features have not been described in detail to avoid obscuring aspects of the present application.

[0031] In order to thoroughly understand the embodiments of the present application, detailed structures will be presented in the following description. Obviously, the implementation of the embodiments of the present application is not limited to the special details familiar to those skilled in the art. The preferred embodiments of the present application are described in detail as follows, however, in addition to these detailed descriptions, the present application can have other embodiments, and should not be interpreted as limited to the embodiments presented here.

[0032] It should be understood that the terms used herein are only for the purpose of describing specific embodiments and not as limitations of the present application, and the singular forms "a", "an" and "the" are also intended to include plural forms, unless the context clearly indicates otherwise. When the terms "comprise" and / or "include" are used in the specification, it means that the described features, integers, steps, operations, elements, and / or components exist, but do not exclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or combinations thereof. The terms "upper", "lower", "front", "back", "left", "right" and similar expressions used in the present application are only for the purpose of illustration, not limitation.

[0033] The ordinal numbers such as "first" and "second" cited in the present utility model are merely identifiers and do not have any other meanings, such as a specific order. Moreover, for example, the term "first component" does not imply the existence of a "second component" by itself, and the term "second component" does not imply the existence of a "first component" by itself.

[0034] In this document, "equal", "same", and the like are not strictly mathematical and / or geometric restrictions, but also include errors allowed by manufacturing or use that can be understood by those skilled in the art.

[0035] Unless otherwise stated, numerical ranges herein include the entire range between the two endpoints, as well as any sub-ranges contained therein.

[0036] The technical solutions in the embodiments of the present utility model will be described clearly and completely below in conjunction with the drawings in the embodiments of the present utility model. Obviously, the described embodiments are only a part of the embodiments of the present utility model, rather than all the embodiments. Based on the embodiments in the present utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the present utility model.

[0037] According to the plasma reaction cavity of the embodiment of the present utility model, the cavity 1 is internally formed with a cuboid-shaped chamber. The regular chamber shape facilitates production and manufacturing, and facilitates the installation of other structures (such as the microwave source 2 and the light intensity detection device 3 described below).

[0038] At least one microwave inlet 13 for connecting to the microwave source 2 is formed on the cavity wall of the cavity 1. The microwave inlet 13 is used to connect to the microwave source 2. A plurality of observation windows 12 for connecting the light intensity detection device 3 for detecting the light intensity of the plasma inside the chamber are also formed on the cavity wall of the cavity 1. The cavity wall of the cavity 1 is formed with a plurality of annular regions with the center point of the cavity wall as the center and sequentially from the inside to the outside, and the observation windows 12 in each annular region are distributed in a central symmetric manner around the center point in the annular region.

[0039] Considering the characteristics of the plasma after excitation, the plasma intensity is high in the center and low at the edge in the chamber of the plasma reaction cavity. The plasma intensity is highest and the uniformity is best in the center region of the chamber, while the intensity is weaker in the surrounding region. The plasma reaction cavity of the present utility model designs the positions of the observation windows 12 on the cavity 1 according to the characteristics of the plasma, which can better observe and evaluate the uniformity of the microwave plasma in the chamber.

[0040] Specifically, the microwave inlet 13 and the observation window 12 can be arranged on the same cavity wall, or can be arranged on different cavity walls. For example, the microwave inlet 13 and the observation window 12 are arranged on different cavity walls: the cavity 1 comprises a first cavity wall 1a and a second cavity wall 1b, the microwave inlet 13 is arranged on the first cavity wall 1a, and the observation window 12 is arranged on the second cavity wall 1b; wherein the first cavity wall 1a and the second cavity wall 1b can be in an adjacent or opposite relationship.

[0041] In an embodiment of the present application, the observation windows 12 on the second cavity wall 1b are evenly distributed along two diagonal lines of the cavity wall (see the following Figure 3 Compared with the conventional and easily thought rectangular array distribution, the diagonal arrangement method can detect the plasma light intensity of the entire area from the center to the edge, the position of the opening meets the characteristics of the plasma, and the detection result can better evaluate the uniformity of the microwave plasma. In addition, the diagonal design is also more convenient for opening.

[0042] Reference Figure 4 The observation windows 12 on the second cavity wall 1b can also be evenly distributed along the cross-symmetry line of the cavity wall.

[0043] In an embodiment of the present application (not shown), the plasma reaction cavity comprises one second cavity wall 1b and one first cavity wall 1a.

[0044] It can be understood that the number of the first cavity wall 1a can be 1, 2 or 3. The second cavity wall 1b can also be provided with two or more.

[0045] Preferably, a plurality of microwave sources 2 can be arranged on the plasma reaction cavity, so as to adjust the output of the microwave source 2 at different positions according to the detected light intensity. The plurality of microwave sources 2 can be arrayed on the same first cavity wall 1a, or can be dispersed on different first cavity walls 1a of the cavity 1.

[0046] Preferably, considering that the heating efficiency of multi-source orthogonal feeding is better than that of single-source feeding under the same input power, the plurality of microwave sources 2 can be dispersedly arranged on two adjacent first cavity walls 1a. The conversion efficiency of the plasma is improved by multi-source feeding.

[0047] The second aspect of the present application also provides a microwave plasma generating device, comprising the above-mentioned plasma reaction cavity and a microwave source 2 connected to the microwave inlet 13 to emit microwaves into the plasma chamber 11. In the embodiment of the present application, at least two microwave sources 2 are arranged on the same first side wall 1a of the microwave plasma generating device. That is, the microwave plasma generating device is a multi-source microwave plasma generating device.

[0048] The third aspect of the utility model discloses a microwave plasma generation system, and the microwave plasma generation system comprises the preceding microwave plasma generation device, light intensity detection device 3 for being connected to each observation window 12 to detect the light intensity in the plasma chamber 11 and an analysis end for analyzing the detection data of each light intensity detection device 3.

[0049] Exemplarily, the light intensity detection device 3 can be a light intensity sensor. Precise optical devices can also be used more, for example, the emission spectrum of the microwave plasma in the chamber is acquired through the precise optical devices, the spectroscopy characteristics of the microwave plasma are further diagnosed, and the uniformity of the plasma is better evaluated.

[0050] It can be understood that the light intensity detection device 3 can be arranged at the position of each observation window 12 respectively to quickly acquire the light intensity data at the position of each observation window 12. One light intensity detection device 3 can also be used to detect different observation windows 12 respectively to acquire the light intensity data at different observation windows 12.

[0051] Exemplarily, the analysis end comprises a computer for receiving and analyzing the detection data, and a tuner for adjusting each microwave source 2 according to the analysis result is connected to the output end of the computer.

[0052] The following will be described in detail in combination with the embodiment shown in the drawings. Figures 1 to 5

[0053] Please refer to Figures 1 to 5 In one specific embodiment of the utility model, the plasma reaction chamber comprises a cuboid cavity 1, and a cuboid plasma chamber 11 is formed in the cavity 1, so that the cavity 1 constitutes a structure with equal thickness of ring wall. The cavity wall in the cavity 1 is divided into adjacent or opposite first cavity wall 1a and second cavity wall 1b. The first cavity wall 1a is used for arranging a microwave inlet 13, and the second cavity wall 1b is used for arranging an observation window 12.

[0054] Referring to Figure 1 and Figure 2 Three first cavity walls 1a adjacent to each other are arranged in the cavity 1. Among the remaining three cavity walls, at least two second cavity walls 1b adjacent to each other.

[0055] One cavity wall of the cavity 1 can be constructed as a cavity door that can be opened and closed, or a cavity door that can be opened and closed is arranged on one cavity wall. The opening and closing of the cavity door realizes the putting of the to-be-processed articles into the cavity 11 or the taking out of the to-be-processed articles from the cavity 11. The cavity door can be rotatably installed on the cavity 1 in a hinged manner, which is similar to the cavity door of a microwave oven. The cavity door and the cavity 1 are in sealed connection.

[0056] ​A corresponding observation window 12 or microwave inlet 13 can also be provided on the cavity gate. That is, among the three first cavity walls 1a, one of the first cavity walls 1a may be the cavity wall where the cavity gate is located. Similarly, among the two or three second cavity walls 1b, one of the second cavity walls 1b may be the cavity wall where the cavity gate is located.

[0057] like Figure 1 As shown, the top surface of cavity 1 and its two adjacent sides constitute the first cavity wall 1a. Multiple microwave sources 2 can be installed on each of the three first cavity walls 1a. The microwave sources 2 on the same first cavity wall 1a are symmetrically distributed about the center point of that wall, and the microwave sources 2 emit plasma into the plasma chamber 11. In practical use, it is preferable to symmetrically arrange two microwave sources 2 on each first cavity wall 1a, so that the plasma chamber 11 can be filled with plasma under the action of six microwave sources 2.

[0058] like Figure 2 As shown, the other two sides and the bottom of the cavity 1 constitute the second cavity wall 1b. Multiple annular regions are formed on the second cavity wall 1b of the cavity 1, centered on its center point and extending outwards. The observation windows 12 within each annular region are centrally symmetrically distributed around the center point within that region. Figure 3 The detection areas are II and III. The light intensity detection device 3 at the center of the ring forms a coaxially extending cylindrical detection area within the plasma chamber 11, such as... Figure 3 Detection area I in the middle.

[0059] In the illustrated embodiment, the second cavity wall 1b is divided into three detection areas. Detection area I is the area where the center point of the second cavity wall 1b is located, and an observation window 12 is set at the center point. Detection areas II and III are set outside detection area I. It can be understood that in practice, more annular detection areas can be set outside detection area I according to the size of the cavity 1 to achieve better observation and detection of the internal light intensity.

[0060] Figures 3 to 5 In the illustrated embodiment, three annular regions are formed sequentially from the inside out, with the center point of the second cavity wall 1b as the center. These are detection region I, detection region II, and detection region III. Detection region I is located close to the center point of the second cavity wall 1b, and an observation window 12 is provided at the center point of the second cavity wall 1b to detect the light intensity in the central region of the chamber corresponding to detection region I. Detection regions II and III are each provided with four observation windows 12.

[0061] In this embodiment, the detection area II is a regular circular annular area, and the four observation windows 12 within the detection area II are evenly distributed around the center point of the second cavity wall 1b. Of course, three, five, or more observation windows 12 can also be provided within the detection area II (and the detection area III).

[0062] like Figure 1 As shown, observation window groups (referring to multiple observation windows 12 distributed according to a predetermined pattern) are provided on each of the three second cavity walls 1b, and each observation window 12 in the observation window group is connected to a light intensity detection device 3 for detecting light intensity. Figure 3 As shown, the observation windows 12 on the second cavity wall 1b are evenly distributed and spaced apart along the two diagonals of the cavity wall. Figure 4 As shown, the observation windows 12 on the second cavity wall 1b are evenly distributed at intervals along the cross-shaped symmetry line of the cavity wall.

[0063] like Figure 5 As shown, two annular regions (detection region II and detection region III) are formed on the second cavity wall 1b with the center point of the cavity wall as the center and from the inside out. An observation window 12 is provided on the second cavity wall 1b with the center point of the cavity wall. The observation windows 12 in detection region II and detection region III are centrally symmetrically distributed around the center point in the annular regions.

[0064] Each cylindrical detection area on the same surface is coaxially fitted and nested outward from the cylindrical detection area to form a cylindrical detection area of ​​the light intensity detection device group on the current surface, and the current surface is located within the cross-section of the detection area on the current surface. This arrangement enables the light intensity sensor to comprehensively detect the light intensity emitted by the plasma at various locations within the plasma chamber 11, thereby improving the comprehensiveness of the detection.

[0065] It is understandable that the light intensity data detected by the light intensity detection device 3 located within the same annular area can more objectively characterize the distribution of microwave plasma in the corresponding region (consisting of the coaxially extended cylindrical detection region) within the plasma chamber. This design is more scientific and objective, and can simplify the data processing process to a certain extent, making it easier to integrate and analyze the light intensity data collected from each observation window 12, thereby providing strong support for plasma uniformity assessment and subsequent tuning.

[0066] By arranging the observation window 12 and the light intensity detection device 3 in such a precise and efficient manner within the limited space of the plasma chamber 11, this design not only ensures comprehensive monitoring but also achieves structural compactness. This helps reduce the overall size and weight of the equipment, improves space utilization, and may reduce manufacturing costs.

[0067] Since the observation windows 12 and the light intensity detection devices 3 can be designed in a modular manner, the design has good scalability and maintainability. When it is necessary to increase the detection points or replace the damaged light intensity detection devices 3, the operation can be conveniently performed without the need to make large-scale modification to the entire chamber.

[0068] Referring to the embodiments shown in Figure 1 and Figure 2 , three light intensity detection devices 3 are arranged on three mutually adjacent surfaces respectively, and the light intensity detection devices 3 can be photoelectric sensors, which can realize three-dimensional detection of the light intensity in the plasma chamber 11, improve the comprehensiveness of detection, and effectively improve the accuracy of detection.

[0069] In addition, the utility model also adopts the existing control end to control. The control end includes a computer for receiving and analyzing the data collected by the light intensity sensor, and the output end of the computer is connected with a tuner which can adjust the power, phase, frequency, etc. of the microwave source 2 near the uneven point to adjust the local field intensity distribution and optimize the plasma uniformity.

[0070] The use process of the utility model is as follows:

[0071] 1. Data acquisition:

[0072] The TSL256x light intensity sensor is used as the light intensity detection device 3, and is installed at each observation window 12 on the cavity 1 in the manner described above to form a cylindrical detection area on the corresponding three second cavity walls 1b.

[0073] Each TSL256x light intensity sensor collects the light intensity data of the plasma in the plasma cavity 1 at regular intervals and transmits the light intensity data to a processing unit such as a microcontroller or a computer.

[0074] 2. Data preprocessing:

[0075] The collected light intensity data is subjected to conventional filtering processing to remove noise and interference.

[0076] The deviation between the sensors is corrected to ensure the accuracy and consistency of the data.

[0077] 3. Uniformity analysis:

[0078] In the multi-physical field simulation software comsol in the computer, the corresponding structure is established according to the above process, and the process of real reduction of microwave emission and microwave detection is one to one in the multi-physical field simulation software comsol. Then, combined with the above pre-processed data, the adjustment scheme of each microwave source 2 is accurately analyzed in the physical field simulation software comsol. Then the adjustment scheme is output to the tuner, and the tuner is used to adjust each microwave source 2 to realize the uniform distribution of the plasma in the plasma chamber 11.

[0079] The above is only a preferred specific embodiment of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art within the technical range disclosed by the present application, according to the technical scheme and the inventive concept of the present application, can be replaced or changed equivalently, which should be covered within the protection scope of the present application.

Claims

1. A plasma reaction chamber, characterized by, The cavity (1) comprises a cuboid-shaped plasma chamber (11) formed inside, at least one microwave inlet (13) for connecting to a microwave source (2) is arranged on the cavity wall of the cavity (1), and a plurality of observation windows (12) for connecting light intensity detection devices (3) for detecting the light intensity of the plasma inside the chamber are also arranged on the cavity wall of the cavity (1); the cavity wall of the cavity (1) is formed with a plurality of annular regions with the center point of the cavity wall as the center and from inside to outside, and the observation windows (12) in each annular region are distributed in a central symmetric manner around the center point.

2. The plasma reaction chamber of claim 1, wherein, The cavity (1) comprises adjacent or opposite first cavity walls (1a) and second cavity walls (1b), and the microwave inlet (13) is arranged on the first cavity wall (1a); and the observation window (12) is arranged on the second cavity wall (1b).

3. The plasma reaction chamber of claim 2, wherein, The observation windows (12) on the second cavity wall (1b) are uniformly distributed along the two diagonal lines of the cavity wall; or the observation windows (12) on the second cavity wall (1b) are uniformly distributed along the cross-symmetry lines of the cavity wall.

4. The plasma reaction chamber of claim 2, wherein, The cavity (1) comprises at least two first cavity walls (1a) adjacent to each other; and / or at least two microwave inlets (13) are arranged on each first cavity wall (1a), and the microwave inlets (13) on each first cavity wall (1a) are symmetrically distributed around the center point of the first cavity wall (1a).

5. The plasma reaction chamber of claim 2, wherein, The cavity (1) comprises three first cavity walls (1a) adjacent to each other, and two microwave inlets (13) are arranged on each first cavity wall (1a); and / or the cavity (1) comprises at least two second cavity walls (1b).

6. The plasma reaction chamber of claim 5, wherein, The cavity further comprises a cavity door which can be opened and closed, and the observation window (12) is arranged on the cavity door.

7. A microwave plasma generating apparatus characterized by comprising: The microwave plasma generating device comprises a plasma reaction cavity as claimed in any one of claims 1-6, and a microwave source (2) connected to the microwave inlet (13) to emit microwaves into the plasma chamber (11), and at least two microwave sources (2) are arranged on the same first side wall.

8. A microwave plasma generation system characterized by, The microwave plasma generating system comprises a microwave plasma generating device as claimed in claim 7, light intensity detection devices (3) for connecting to each observation window (12) to detect the light intensity in the plasma chamber (11), and an analysis end for analyzing the detection data of each light intensity detection device (3).

9. The microwave plasma generation system of claim 8, wherein, The light intensity detection device (3) is a light intensity sensor.

10. The microwave plasma generation system of claim 9, wherein, The analysis end comprises a computer for receiving and analyzing the detection data, and a tuner connected to the output end of the computer for adjusting each microwave source (2) according to the analysis result.

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