Cleaning assembly and base station of sweeping robot

Abstract

The utility model discloses a cleaning assembly and a base station of a sweeping robot, the cleaning assembly comprises a gas dissolving structure and a flushing structure, the gas dissolving structure comprises a first shell and a baffle, the first shell is internally provided with a containing cavity used for containing gas, the containing cavity is provided with a first liquid inlet and a first liquid outlet, the baffle is located in the containing cavity and is opposite to the first liquid inlet, and the first liquid inlet is communicated with the first liquid outlet; the flushing structure comprises a second shell, the second shell is provided with a liquid channel, a second liquid inlet and a second liquid outlet, the second liquid inlet and the second liquid outlet are located in the two ends of the liquid channel, the second liquid inlet communicates with the first liquid outlet, the second liquid outlet is used for being opposite to the structure to be flushed, and the liquid channel is used for inducing hydrodynamic cavitation. According to the flushing structure disclosed by the invention, a large number of micro-nano bubbles can be generated in the liquid, so that the cleaning effect on the to-be-flushed structure is improved.

Description

Technical Field

[0001] This disclosure relates to the technical field, and in particular to a cleaning component and a base station for a sweeping robot. Background Technology

[0002] With the development of technology, robotic vacuum cleaners have been widely used in floor cleaning. When robotic vacuum cleaners use cleaning components such as mops to clean, dust will adhere to these components. In order to maintain the cleaning effect of the robotic vacuum cleaner, the cleaning components need to be cleaned.

[0003] In related technologies, water spray nozzles are often installed on the base of the robot vacuum cleaner's base station. After the robot vacuum cleaner returns to the base station, the water spray nozzles on the base station spray water directly onto the cleaning components to rinse them.

[0004] However, the cleaning ability of the above-mentioned cleaning methods is relatively limited, especially for stains with strong adhesion such as oil stains, the cleaning effect is poor. Utility Model Content

[0005] This disclosure provides a cleaning component and a base station for a sweeping robot, which can solve the aforementioned technical problems existing in related technologies. The technical solution is as follows:

[0006] In a first aspect, a cleaning assembly is provided, the cleaning assembly comprising a dissolved gas structure and a rinsing structure;

[0007] The dissolved gas structure includes a first shell and a baffle. The first shell has a receiving cavity for containing gas. The receiving cavity has a first liquid inlet and a first liquid outlet. The baffle is located in the receiving cavity and is opposite to the first liquid inlet.

[0008] The flushing structure includes a second housing, which has a liquid channel, a second inlet and a second outlet located at both ends of the liquid channel. The second inlet is connected to the first outlet, and the second outlet is used to face the structure to be flushed. The liquid channel is used to induce hydraulic cavitation.

[0009] In one possible implementation, the dissolved gas structure further includes a liquid spraying structure, at least a portion of which is fixed within the first liquid inlet. The liquid spraying structure has a plurality of spray holes to allow liquid to enter the receiving cavity through the plurality of spray holes.

[0010] In one possible implementation, the orifice diameter of the plurality of spray holes is r, where 0.5 mm ≤ r ≤ 1 mm.

[0011] In one possible implementation, the dissolved gas structure includes a liquid outlet pipe comprising a first pipe segment and a second pipe segment, the first pipe segment being located within the receiving cavity and extending partially downward, and the first liquid outlet being located at the bottom of the first pipe segment.

[0012] In one possible implementation, the constricted section is frustum-shaped, with a maximum diameter of R1 and a minimum diameter of R2, where 10 ≤ R1 / R2 ≤ 15.

[0013] In one possible implementation, the liquid channel includes a constricted section and a resonant cavity connected together. Along the direction from the second inlet to the second outlet, the cross-sectional area of ​​the constricted section gradually decreases. The resonant cavity is located between the constricted section and the second outlet, and the cross-sectional area of ​​the resonant cavity is greater than the minimum cross-sectional area of ​​the constricted section.

[0014] In one possible implementation, the constricted section is frustum-shaped, and the angle between the generatrix of the constricted section and the central axis of the constricted section is α, where 10°≤α≤40°.

[0015] In one possible implementation, the resonant cavity protrudes gradually from the edge to the center of the inner wall near the second liquid outlet, and the center is opposite to the first communication port of the resonant cavity, which is the communication port between the resonant cavity and the narrowing section.

[0016] In one possible implementation, the angle between the protruding portion of the resonant cavity and the central axis of the resonant cavity is β, where 45°≤β≤75°.

[0017] In one possible implementation, the liquid channel further includes a jet section located between the radial constriction section and the resonant cavity. The diameter of the jet section is R3, extending along the direction from the second inlet to the second outlet. The length of the jet section is L, where 3 ≤ L / R3 ≤ 5.

[0018] In a second aspect, a base station for a robotic vacuum cleaner is provided, the base station including the cleaning component described in any one of the first aspects.

[0019] The beneficial effects of the technical solution provided in this disclosure include at least the following:

[0020] After the liquid enters the gas-dissolving structure's containment cavity, it collides with and disperses against the baffles within the cavity, thereby increasing the contact area between the liquid and the gas. This allows more gas to dissolve into the liquid, increasing the amount of gas dissolved in the liquid. Next, the liquid enters the liquid channel of the rinsing structure. Due to the large amount of gas dissolved in the liquid, a strong hydraulic cavitation phenomenon is induced through this liquid channel, generating a large number of micro-nano bubbles. Subsequently, the liquid flows from the first outlet to the structure to be rinsed. The micro-nano bubbles in the liquid collide with the structure to be rinsed and collapse. The impact force generated by the collapse can detach the stains from the structure to be rinsed, thus achieving the removal of stains with strong adhesion and greatly improving the cleaning effect.

[0021] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit this disclosure. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of this disclosure, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0023] Figure 1 This is a schematic diagram of the structure of a cleaning assembly provided in an embodiment of this disclosure;

[0024] Figure 2 This is a schematic diagram of the dissolved gas structure in a cleaning assembly provided in this embodiment of the present disclosure;

[0025] Figure 3 This is a schematic diagram of the spray structure in a cleaning assembly provided in this embodiment;

[0026] Figure 4 This is a schematic diagram of the rinsing structure in a cleaning assembly provided in this embodiment;

[0027] Figure 5 This is a schematic diagram of the structure of a base station for a robotic vacuum cleaner provided in an embodiment of this disclosure;

[0028] Figure 6 This is a partial structural diagram of a base station for a sweeping robot provided in an embodiment of this disclosure.

[0029] Figure label:

[0030] 1. Dissolved gas structure; 11. First shell; 111. First liquid inlet; 112. First liquid outlet; 12. Baffle; 13. Spray structure; 131. Spray hole; 14. Liquid outlet pipe; 141. First pipe section; 142. Second pipe section;

[0031] 2. Flushing structure; 21. Second shell; 21a. First shell section; 21b. Second shell section; 211. Second liquid inlet; 212. Second liquid outlet; 213. Reduction section; 214. Resonant cavity; 214a. First connecting port; 215. Spray section; 216. Flushing section;

[0032] 3. Pipelines; 4. Diversion structure; 5. Water pump; 6. Cleaning dock; 7. Water tank. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of this disclosure clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.

[0034] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0035] This disclosure provides a cleaning assembly, such as... Figure 1 As shown, the cleaning assembly includes a dissolved gas structure 1 and a rinsing structure 2. Figure 2 As shown, the dissolved gas structure 1 includes a first housing 11 and a baffle 12. The first housing 11 has a receiving cavity for containing gas, and the receiving cavity has a first liquid inlet 111 and a first liquid outlet 112. The baffle 12 is located inside the receiving cavity and is disposed opposite to the first liquid inlet 111. Figure 4 As shown, the flushing structure 2 includes a second housing 21, which has a liquid channel, a second inlet 211 and a second outlet 212 located at both ends of the liquid channel. The second inlet 211 is connected to the first outlet 112, and the second outlet 212 is disposed opposite to the structure 2 to be flushed. The liquid channel is used to induce hydraulic cavitation.

[0036] When the liquid enters the receiving cavity, it collides with and disperses against the baffle 12 inside the cavity, thereby increasing the contact area between the liquid and the gas, allowing more gas to dissolve into the liquid and thus increasing the dissolved gas volume. Then, the liquid enters the liquid channel of the rinsing structure 2. Due to the large amount of gas dissolved in the liquid, a strong hydraulic cavitation phenomenon can be induced through the liquid channel, generating a large number of micro-nano bubbles. Subsequently, the liquid flows from the first liquid outlet 112 to the structure to be rinsed 2. The micro-nano bubbles in the liquid collide with the structure to be rinsed 2 and collapse. The impact force generated by the collapse can remove the stains from the structure to be rinsed 2, thereby achieving the removal of stains with strong adhesion and greatly improving the cleaning effect.

[0037] Hydrodynamic cavitation is a phenomenon that utilizes the local pressure changes caused by liquid flow to generate cavitation bubbles. When a liquid flows through a confined region (such as a Venturi tube), the flow velocity increases and the pressure decreases. If the local pressure drops below the liquid's saturated vapor pressure, cavitation bubbles will form.

[0038] This disclosure does not limit the type of liquid within the rinsing structure 2. For example, the liquid can be water. Or, for example, the liquid can be a cleaning solution.

[0039] This disclosure does not limit the connection method between the dissolved gas structure 1 and the flushing structure 2. For example: Figure 1 As shown, the cleaning assembly includes a pipe 3, a dissolved air structure 1, and a flushing structure 2 connected by the pipe 3.

[0040] The present disclosure does not limit the connection method between the first housing 11 and the baffle 12. For example, the first housing 11 and the baffle 12 are integrally formed.

[0041] The present disclosure does not limit the specific structure of the flushing structure 2. For example, the flushing structure 2 can be a venturi tube structure.

[0042] In some examples, such as Figure 2 As shown, the distance between the second liquid inlet 211 and the baffle 12 is 15mm to ensure the impact strength between the liquid and the baffle 12, thereby ensuring the effect of liquid spreading.

[0043] In some examples, such as Figure 2 , Figure 3 As shown, the dissolved gas structure 1 also includes a liquid spraying structure 13, at least a portion of which is fixed inside the first liquid inlet 111. The liquid spraying structure 13 has a plurality of liquid spraying holes 131 so that liquid enters the receiving cavity through the plurality of liquid spraying holes 131.

[0044] Before the liquid enters the containment cavity, the multiple spray holes 131 on the spray structure 13 can disperse the liquid entering the containment cavity, thereby further increasing the contact area between the liquid and the gas in the containment cavity, increasing the dissolved gas volume of the liquid, and thus generating more micro-nano bubbles in the rinsing structure 2 to improve the cleaning effect of the cleaning component.

[0045] The present disclosure does not limit the specific form of the liquid spraying structure 13.

[0046] For example, the liquid spraying structure 13 can be a cover plate that covers the second liquid inlet 211.

[0047] For example, the liquid spraying structure 13 can be a nozzle from which liquid enters the receiving cavity.

[0048] In some examples, the diameter of multiple spray holes 131 is r, 0.5 mm ≤ r ≤ 1 mm.

[0049] If r is too large, the liquid spraying structure 13 may not effectively disperse the liquid, thus hindering the contact between the liquid and the gas in the containment cavity; if r is too small, the spray nozzle 131 may become blocked. Setting r within this range ensures the effective dispersion of liquid by the liquid spraying structure 13 while preventing the spray nozzle from becoming blocked.

[0050] In some examples, such as Figure 2 As shown, the dissolved gas structure 1 includes a liquid outlet pipe 14, which includes a first pipe section 141 and a second pipe section 142. The first pipe section 141 is located in the receiving cavity and extends downward in part. The first liquid outlet 112 is located at the bottom of the first pipe section 141.

[0051] After the liquid enters the containment cavity and submerges the first outlet 112, the liquid level in the containment cavity will continue to rise. The liquid will compress the gas in the containment cavity, thereby increasing the gas pressure in the containment cavity. According to the principle of physics, the solubility of gas in liquid is directly proportional to the pressure, which can promote the dissolution of gas into liquid and further increase the amount of gas dissolved in the liquid.

[0052] If the height of the second pipe section 142 is relatively high, the liquid level in the containment cavity will be lower than the height of the second pipe section 142 for a period of time after the start of operation. As the gas in the containment cavity dissolves, the liquid level in the containment cavity will gradually rise, further compressing the gas inside to ensure the pressure balance in the containment cavity.

[0053] For example, the height of the first outlet 112 relative to the bottom of the receiving cavity can be set between 20mm and 30mm.

[0054] In some instances, such as Figure 4 As shown, the liquid channel includes a constricted section 213 and a resonant cavity 214 that are connected. Along the direction from the second inlet 211 to the second outlet 212, the cross-sectional area of ​​the constricted section 213 gradually decreases. The resonant cavity 214 is located between the constricted section 213 and the second outlet 212, and the cross-sectional area of ​​the resonant cavity 214 is greater than the minimum cross-sectional area of ​​the constricted section 213.

[0055] As the liquid flows through the constriction section 213, the pressure of the liquid gradually increases as the cross-sectional area of ​​the constriction section 213 gradually decreases. After the liquid with higher pressure flows into the resonant cavity 214, the pressure of the liquid suddenly decreases and violent vibrations are generated in the resonant cavity 214. Since a large amount of gas is dissolved in the liquid, a strong hydrodynamic cavitation phenomenon can be induced, generating a large number of micro-nano bubbles.

[0056] In some examples, such as Figure 4 As shown, the radially contracted section 213 in the flushing structure 2 is truncated cone-shaped, with a maximum diameter of R1 and a minimum diameter of R2, where 10 ≤ R1 / R2 ≤ 15.

[0057] The constriction section 213 is designed as a frustum structure, which can reduce the resistance to the flow of liquid in the constriction section 213.

[0058] If R1 / R2 is too large, the pressure change of the liquid will be too large, thus affecting the smoothness of the liquid flow in the constriction section 213. If R1 / R2 is too small, the pressure of the liquid at the minimum diameter of the constriction section 213 will be too small, which will result in a small pressure change when the liquid enters the resonant cavity 214 from the constriction section, thus hindering the achievement of liquid cavitation. Setting R1 / R2 within this range can ensure the smoothness of liquid flow while guaranteeing the cavitation effect.

[0059] In some examples, 1mm ≤ R2 ≤ 2mm.

[0060] The larger R2 is, the greater the inlet pressure requirement for the second inlet 211; the smaller R2 is, the more likely the constriction section 213 will become blocked. Setting R2 within this range can reduce the inlet pressure requirement while preventing the constriction section 213 from becoming blocked.

[0061] In some examples, the angle between the generatrix of the radially contracted segment 213 and the central axis of the radially contracted segment 213 is α, where 10°≤α≤40°.

[0062] If α is too small, it will be difficult to process the flushing structure 2, and it will also increase the axial dimension of the radial contraction section 213, resulting in an excessively large size for the flushing structure 2. If α is too large, it will cause the liquid pressure to change too quickly, thus affecting the stability of the liquid flow in the radial contraction section 213. Setting α within this range can reduce the processing difficulty and size of the flushing structure 2 while ensuring the stability of the liquid flow in the radial contraction section 213.

[0063] In some examples, such as Figure 4 As shown, the resonant cavity 214 is close to the inner wall of the second liquid outlet 212, and gradually protrudes towards the radially narrowed section 213 from the edge to the middle. The middle part is opposite to the first connecting port 214a of the resonant cavity 214. The first connecting port 214a is the connecting port between the resonant cavity 214 and the radially narrowed section 213.

[0064] When fluid flows towards the protruding part of the resonant cavity 214, it generates self-excited pressure vibration. This self-excited pressure vibration is fed back into the resonant cavity 214 to form feedback pressure vibration. If the frequency of the self-excited pressure vibration matches the natural frequency of the nozzle resonant cavity 214, the feedback pressure vibration can be amplified, thereby generating fluid resonance within the resonant cavity 214 and forming a standing wave. This transforms the jet shear layer vortex into a large-structure separated annular vortex. This large-structure discontinuous vortex annular flow can enhance liquid cavitation, improve the hydraulic cavitation effect, and thus generate more micro- and nano-bubbles, improving the cleaning effect of the cleaning component.

[0065] In some examples, such as Figure 4 As shown, the angle between the protruding part of the resonant cavity 214 and the central axis of the resonant cavity 214 is β, where 45°≤β≤75°.

[0066] If β is too large or too small, the liquid will lose a lot of energy in the resonant cavity 214, which is not conducive to the vibration of the liquid in the cavity. Setting β within this range can reduce the energy loss of the liquid and ensure the effect of generating micro-nano bubbles by the vibration of the liquid.

[0067] In some examples, such as Figure 4 As shown, the liquid channel also includes a jet section 215, which is located between the radial contraction section 213 and the resonant cavity 214. The diameter of the jet section 215 is R3, and the length of the jet section 215 is L along the direction from the second liquid inlet 211 to the second liquid outlet 212, where 3≤L / R3≤5.

[0068] If L / R3 is too large, it will increase the axial dimension of the spray section 215, resulting in an excessively large size for the flushing structure 2; if L / R3 is too small, the energy conversion efficiency of the spray section 215 will be low, which is not conducive to liquid cavitation. Setting L / R3 within this range ensures the energy conversion efficiency of the spray section 215 while keeping its size relatively small.

[0069] Optional, R3 = R2, L / R3 = 4.

[0070] For example, such as Figure 4 As shown, the first housing 11 includes a first housing segment 21a and a second housing segment 21b that are connected to each other. The first housing segment 21a and the second housing segment 21b form a resonant cavity 214, and the protruding part of the resonant cavity 214 is located in the second housing segment 21b.

[0071] The first shell section 21a and the second shell section 21b are two separate structures. The protruding part of the resonant cavity 214 is placed on the second shell section 21b, which can greatly reduce the processing difficulty of the flushing structure 2 and thus improve the production efficiency of the flushing structure 2.

[0072] In some examples, the liquid channel also includes a flushing section 216 located between the resonant cavity 214 and the second outlet 212, with a portion of the flushing section 216 located in the middle of the protruding portion of the resonant cavity 214.

[0073] The liquid in the resonant cavity 214 enters the rinsing section 216 and is then directed towards the structure to be rinsed, thereby improving the cleaning effect of the structure to be rinsed.

[0074] For example, the flushing section 216 is cylindrical and its diameter is slightly larger than R3.

[0075] In some examples, such as Figure 1 As shown, the cleaning assembly includes multiple flushing structures 2 and a diversion structure 4. The liquid inlet of the diversion structure 4 is connected to the first liquid outlet 112 via a pipe 3. The diversion structure 4 has multiple liquid outlets, which are connected to the second liquid inlets 211 of the multiple flushing structures 2 via pipes 3 respectively.

[0076] The cleaning component can clean multiple parts of the structure to be cleaned simultaneously, thereby improving the cleaning efficiency and effectiveness.

[0077] In some examples, such as Figure 1 As shown, the cleaning assembly includes a water pump 5.

[0078] The water pump 5 has its inlet connected to the outside via pipe 3, and its outlet connected to the first liquid inlet 111 via pipe 3, enabling it to pump external liquid into the dissolved air structure 1. Furthermore, the water pump 5 provides power for the flow of liquid within the cleaning assembly, ensuring the liquid has sufficient pressure to guarantee the cleaning effect of the cleaning assembly.

[0079] The present invention does not limit the type of water pump 5.

[0080] For example, pump 5 can be an electromagnetic pump, diaphragm pump, peristaltic pump or air pump.

[0081] Based on the same concept, this disclosure also provides a base station for a robotic vacuum cleaner, such as... Figure 5 and Figure 6 As shown, the base station includes the cleaning components mentioned above.

[0082] The base station includes a cleaning dock 6, with the second outlet 212 of the flushing structure 2 facing into the cleaning dock 6.

[0083] For example, after the robot vacuum cleaner has finished cleaning the area specified by the user, it will return to the cleaning dock 6. The second liquid outlet 212 of the rinsing structure 2 will face the cleaning components such as mop or floor brush on the bottom of the robot vacuum cleaner. At this time, the cleaning component can clean the cleaning components on the bottom of the robot vacuum cleaner.

[0084] For example, when the robot vacuum cleaner leaves the cleaning dock 6, the cleaning components can clean the dirt inside the cleaning dock 6.

[0085] In some examples, the base station also includes a water tank 7, which is connected to a water pump 5 via a pipe 3 to supply liquid to the cleaning components.

[0086] It should be noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the exemplary embodiments according to this application. As used herein, the singular form is intended to include the plural form as well, unless the context clearly indicates otherwise. Furthermore, it should be understood that when the terms "comprising" and / or "including" are used in this specification, they indicate the presence of features, steps, operations, devices, components, and / or combinations thereof.

[0087] Unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps described in these embodiments do not limit the scope of this application. It should also be understood that, for ease of description, the dimensions of the various parts shown in the drawings are not drawn to actual scale. Techniques, methods, and devices known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and devices should be considered part of the specification. In all examples shown and discussed herein, any specific values ​​should be interpreted as merely exemplary and not as limitations. Therefore, other examples of exemplary embodiments may have different values. It should be noted that similar reference numerals and letters in the following drawings denote similar items; therefore, once an item is defined in one drawing, it need not be further discussed in subsequent drawings.

[0088] In the description of this application, it should be understood that the orientation or positional relationship indicated by directional terms such as "front, back, up, down, left, right", "horizontal, vertical, horizontal" and "top, bottom" is usually based on the orientation or positional relationship shown in the accompanying drawings, and is only for the convenience of describing this application and simplifying the description. Unless otherwise stated, these directional terms do not indicate or imply that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the scope of protection of this application; the directional terms "inner" and "outer" refer to the inner and outer contours relative to the outline of each component itself.

[0089] For ease of description, spatial relative terms such as "above," "on top of," "on the upper surface of," "above," etc., are used herein to describe the spatial positional relationship of a device or feature as shown in the figures to other devices or features. It should be understood that spatial relative terms are intended to encompass different orientations in use or operation beyond the orientation of the device as described in the figures. For example, if the device in the figures were inverted, a device described as "above" or "on top of" other devices or structures would subsequently be positioned as "below" or "under" other devices or structures. Thus, the exemplary term "above" can include both "above" and "below." The device may also be positioned in other different ways (rotated 90 degrees or in other orientations), and the spatial relative descriptions used herein will be interpreted accordingly.

[0090] Furthermore, it should be noted that the use of terms such as "first" and "second" to define components is merely for the purpose of distinguishing the corresponding components. Unless otherwise stated, the above terms have no special meaning and therefore cannot be construed as limiting the scope of protection of this application.

[0091] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A cleaning assembly, characterized in that, The cleaning assembly includes a dissolved gas structure (1) and a rinsing structure (2); The dissolved gas structure (1) includes a first shell (11) and a baffle (12). The first shell (11) has a cavity for containing gas. The cavity has a first inlet (111) and a first outlet (112). The baffle (12) is located in the cavity and is opposite to the first inlet (111). The flushing structure (2) includes a second housing (21), which has a liquid channel, a second inlet (211) and a second outlet (212) located at both ends of the liquid channel. The second inlet (211) is connected to the first outlet (112), and the second outlet (212) is used to be opposite to the structure to be flushed. The liquid channel is used to induce hydraulic cavitation.

2. The cleaning assembly according to claim 1, characterized in that, The dissolved gas structure (1) further includes a liquid spraying structure (13), at least a portion of which is fixed inside the first liquid inlet (111). The liquid spraying structure (13) has a plurality of liquid spraying holes (131) so that liquid enters the receiving cavity through the plurality of liquid spraying holes (131).

3. The cleaning assembly according to claim 2, characterized in that, The aperture of the plurality of spray holes (131) is r, 0.5mm≤r≤1mm.

4. The cleaning assembly according to claim 1, characterized in that, The dissolved gas structure (1) includes a liquid outlet pipe (14), which includes a first pipe section (141) and a second pipe section (142). The first pipe section (141) is located in the receiving cavity and extends downward in part. The first liquid outlet (112) is located at the bottom of the first pipe section (141).

5. The cleaning assembly according to claim 1, characterized in that, The liquid channel includes a constricted section (213) and a resonant cavity (214) that are connected. Along the direction from the second inlet (211) to the second outlet (212), the cross-sectional area of ​​the constricted section (213) gradually decreases. The resonant cavity (214) is located between the constricted section (213) and the second outlet (212), and the cross-sectional area of ​​the resonant cavity (214) is greater than the minimum cross-sectional area of ​​the constricted section (213).

6. The cleaning assembly according to claim 5, characterized in that, The constricted section (213) is frustum shaped, with a maximum diameter of R1 and a minimum diameter of R2, where 10 ≤ R1 / R2 ≤ 15.

7. The cleaning assembly according to claim 6, characterized in that, The constricted section (213) is frustum-shaped, and the angle between the generatrix of the constricted section (213) and the central axis of the constricted section (213) is α, where 10°≤α≤40°.

8. The cleaning assembly according to claim 6, characterized in that, The resonant cavity (214) is close to the inner wall of the second liquid outlet (212), and gradually protrudes towards the radially narrowed section (213) from the edge to the middle. The middle part is opposite to the first communication port (214a) of the resonant cavity (214), which is the communication port between the resonant cavity (214) and the radially narrowed section (213).

9. The cleaning assembly according to claim 8, characterized in that, The angle between the protruding part of the resonant cavity (214) and the central axis of the resonant cavity (214) is β, where 45°≤β≤75°.

10. The cleaning assembly according to claim 6, characterized in that, The liquid channel further includes a jet section (215), which is located between the radial narrowing section (213) and the resonant cavity (214). The diameter of the jet section (215) is R3, which runs along the direction from the second liquid inlet (211) to the second liquid outlet (212). The length of the jet section (215) is L, where 3≤L / R3≤5.

11. A base station for a robotic vacuum cleaner, characterized in that, The base station includes the cleaning component as described in any one of claims 1-10.

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