Crystal dissolving device and tail gas treatment device

By using a heating element in the exhaust gas treatment device to generate water vapor to soften phosphoric acid crystals, the problem of phosphoric acid crystal accumulation in the exhaust pipe and liquid collection bottle is solved, extending equipment life and simplifying the cleaning process.

CN223530237UActive Publication Date: 2025-11-11TONGWEI SOLAR ENERGY (CHENGDU) CO LID
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202422973369.2
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-12-03
Publication Date
2025-11-11
Estimated Expiration
2034-12-03

AI Technical Summary

Technical Problem

In solar cell manufacturing, the accumulation of phosphate crystals in the tail gas pipe, condenser pipe, and liquid collection bottle during tubular gettering affects service life and cleaning efficiency, making maintenance difficult.

Method used

Water vapor is introduced into the exhaust pipe, condenser, and liquid collection bottle through a heating element. The water vapor softens the phosphoric acid crystals, forming a flowable phosphoric acid solution, which increases the service life of the exhaust pipe and makes it easier to clean.

Benefits of technology

It effectively softens phosphate crystals in exhaust pipes, condenser pipes, and liquid collection bottles, extending equipment lifespan, simplifying maintenance, and improving cleaning efficiency.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN223530237U_ABST
    Figure CN223530237U_ABST
Patent Text Reader

Abstract

The utility model relates to the field of solar cell manufacturing, in particular to a crystal dissolving device and a tail gas treatment device. A crystal dissolving device is used for a tail gas treatment device, the tail gas treatment device comprises a tail gas pipe, the crystal dissolving device comprises a water storage part, a heating part, a gas outlet pipe and a gas supply assembly, the heating part is connected to the water storage part and can heat water in the water storage part to form water vapor, one end of the gas outlet pipe communicates with the water storage part, and the other end of the gas outlet pipe communicates with the tail gas pipe; the air supply assembly communicates with the water storage part and applies pressure to water vapor in the water storage part, so that the water vapor flows to the tail gas pipe through the air outlet pipe. Water is heated into water vapor, the water vapor enters the tail gas pipe through the gas outlet pipe and then enters the condensation pipe and the liquid accumulation bottle, the water vapor can soften phosphoric acid crystals in the tail gas pipe, the condensation pipe and the liquid accumulation bottle into a flowable phosphoric acid solution, the service life of the tail gas pipe is prolonged, and maintenance personnel can maintain and clean the liquid accumulation bottle conveniently.
Need to check novelty before this filing date? Find Prior Art

Description

Technical Field

[0001] This application relates to the field of solar cell manufacturing, and more particularly to a crystallization dissolution apparatus and an exhaust gas treatment apparatus. Background Technology

[0002] In the field of solar cell manufacturing, especially in the production of high-efficiency heterojunction (HJT) cells, tubular getter technology is a crucial step. The main purpose of this technology is to improve the quality of the silicon wafer by forming a doped layer on its surface, thereby increasing the photoelectric conversion efficiency of the cell. In the HJT cell production process, tubular gettering typically occurs after silicon wafer texturing and cleaning. During tubular gettering, the silicon wafer is first placed in a tubular diffusion furnace, using liquid phosphorus oxychloride (POCl3) as the diffusion source. At high temperatures, POCl3 decomposes to produce phosphorus and oxygen, which then enter the silicon wafer surface to form an N-type doped layer.

[0003] Phosphorus oxychloride, nitrogen, and oxygen are introduced into the high-temperature furnace tube for gettering treatment to ensure uniform phosphorus gettering on the silicon wafer surface. This process generates exhaust gas emissions, which are collected in a collection bottle to collect the phosphoric acid waste liquid generated in the exhaust pipe. As the process time increases, phosphoric acid crystals will form in the exhaust pipe, condenser, and collection bottle, affecting the service life of the exhaust pipe. It is also difficult for maintenance personnel to clean the collection bottle, resulting in low cleaning efficiency. Utility Model Content

[0004] This application discloses a crystallization dissolution device and an exhaust gas treatment device. Water vapor is introduced into the exhaust gas pipe and then into the condenser and the liquid collection bottle to soften the phosphoric acid crystals into a flowable phosphoric acid solution, thereby increasing the service life of the exhaust gas pipe.

[0005] To achieve the above objectives, in a first aspect, embodiments of this application disclose a crystallization dissolution device for use in an exhaust gas treatment device, the exhaust gas treatment device including an exhaust gas pipe, the crystallization dissolution device comprising:

[0006] Water storage components;

[0007] A heating element connected to the water storage container, the heating element being capable of heating the water in the water storage container to form water vapor;

[0008] An exhaust pipe, one end of which is connected to the water storage device and the other end of which is connected to the exhaust pipe;

[0009] An air supply assembly is connected to the water storage device and applies pressure to the water vapor in the water storage device, causing the water vapor to flow through the air outlet pipe to the exhaust pipe.

[0010] As an optional implementation, the crystallization dissolution device further includes an air inlet pipe connected to the water storage unit to introduce pressurized gas, which enters the heating element from the air inlet pipe and drives the water vapor in the heating element into the air outlet pipe.

[0011] As an optional implementation, the pressurized gas is nitrogen.

[0012] As an optional implementation, the crystallization dissolution device further includes a first valve disposed on the air inlet pipe to control the opening and closing of the air inlet pipe.

[0013] As an optional implementation, the crystallization dissolution apparatus further includes a first driving member connected to the first valve to control the opening and closing of the first valve.

[0014] As an optional implementation, the crystallization dissolution device further includes a water inlet pipe connected to the water storage device to inject water into the water storage device.

[0015] As an optional implementation, the water inlet pipe is connected to the top of the water storage device, and the air outlet pipe is connected to the top of the water storage device.

[0016] As an optional implementation, the crystallization dissolution device further includes a second valve disposed on the water inlet pipe to control the opening and closing of the water inlet pipe.

[0017] As an optional implementation, the crystallization dissolution apparatus further includes a second driving member connected to the second valve to control the opening and closing of the second valve.

[0018] As an optional implementation, the crystallization dissolution device further includes a liquid level sensor disposed on the heating element. The liquid level sensor is electrically connected to the first driving element and the second driving element to sense the water level in the heating element. When the water level in the water storage element reaches 2 cm, the second driving element controls the second valve to open. When the water level in the water storage element reaches two-thirds of the total depth of the water storage element, the second driving element controls the second valve to close, and the first driving element controls the first valve to open.

[0019] As an optional implementation, the connection between the air inlet pipe and the water storage device is located at a point two-thirds higher than the total depth of the water storage device.

[0020] As an optional implementation, the intake pipe is equipped with a flow meter to display the flow rate of the pressurized gas.

[0021] Secondly, this application discloses an exhaust gas treatment device, the exhaust gas treatment device comprising:

[0022] The crystallization dissolution apparatus according to any one of the first aspects;

[0023] Exhaust pipe;

[0024] A condenser tube, the first end of which is connected to the exhaust pipe;

[0025] A liquid collection bottle is provided, with the second end of the condenser tube connected to the liquid collection bottle. The top of the liquid collection bottle is provided with an exhaust port, and the bottom of the liquid collection bottle is provided with a drain port.

[0026] Compared with the prior art, the beneficial effects of this application are:

[0027] The crystallization and dissolving device provided in this application embodiment has a heating element connected to a water storage container. The heating element heats the water in the water storage container to form water vapor. One end of the gas outlet pipe is connected to the water storage container, and the other end is connected to the exhaust pipe. The gas supply component is connected to the water storage container and applies pressure to the water vapor in the water storage container, causing the water vapor to flow through the gas outlet pipe to the exhaust pipe. The water is heated into water vapor, which enters the exhaust pipe through the gas outlet pipe, and then enters the condenser and the liquid collection bottle. The water vapor can soften the phosphoric acid crystals in the exhaust pipe, condenser, and liquid collection bottle into a flowable phosphoric acid solution, increasing the service life of the exhaust pipe and facilitating maintenance personnel to maintain and clean the liquid collection bottle. Attached Figure Description

[0028] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0029] Figure 1 This is a schematic diagram of the crystallization and dissolution apparatus disclosed in the embodiments of this application;

[0030] Figure 2 This is a schematic diagram of the exhaust gas treatment device disclosed in the embodiments of this application.

[0031] Explanation of reference numerals in the attached figures:

[0032] 100-Crystallization and dissolution device; 1-Water storage component; 2-Heating component; 3-Gas outlet pipe; 4-Gas delivery assembly; 41-Gas inlet pipe; 411-Flow meter; 42-First valve; 43-First drive component; 431-First programmable controller; 432-First solenoid valve; 5-Water inlet pipe; 51-Second valve; 52-Second drive component; 521-Second programmable controller; 522-Second solenoid valve; 200-Tail gas treatment device; 6-Tail gas pipe; 7-Condenser pipe; 8-Liquid collection bottle; 81-Exhaust port; 82-Drain port. Detailed Implementation

[0033] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0034] In this application, the terms "upper," "left," "top," "bottom," "inner," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0035] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0036] Furthermore, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0037] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, components, or parts (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, components, or parts. Unless otherwise stated, "a plurality of" means two or more.

[0038] In the field of solar cell manufacturing, especially in the production of high-efficiency heterojunction (HJT) cells, tubular getter technology is a crucial step. The main purpose of this technology is to improve the quality of silicon wafers by forming a doped layer on the wafer surface, thereby increasing the photoelectric conversion efficiency of the cell. In the HJT cell production process, tubular gettering typically occurs after silicon wafer texturing and cleaning. Through tubular gettering, a uniform doped layer can be formed on the silicon wafer surface, which is essential for subsequent steps such as amorphous / microcrystalline silicon film deposition and transparent conductive film deposition. Furthermore, gettering removes metallic impurities from inside the silicon wafer, reducing contamination during wafer processing and other processes, thus improving the overall performance of the cell. By introducing the gettering step, the demand for silicon wafers in HJT cells can be reduced, allowing the purchase of ordinary silicon materials and eliminating the NP price difference caused by the silicon material stage, thereby lowering costs. In addition, the gettering process can improve the efficiency of HJT cells by reducing minority carrier recombination centers in the silicon wafer, thus increasing the open-circuit voltage of the cell.

[0039] In the tubular getter process, silicon wafers are first placed in a tubular diffusion furnace, using liquid phosphorus oxychloride (POCl3) as the diffusion source. At high temperatures, POCl3 decomposes to produce phosphorus and oxygen, which enter the silicon wafer surface to form an N-type doped layer. During this process, the inside of the tubular furnace is a vacuum, heated by furnace-type heating wires. The tubular diffusion furnace mainly consists of four parts: the loading and unloading section of the quartz boat, the exhaust chamber, the furnace body, and the gas holder. The process of introducing phosphorus oxychloride, nitrogen, and oxygen into the high-temperature furnace tubes for getter treatment generates exhaust gas emissions. This exhaust gas contains phosphoric acid waste liquid, oxygen, nitrogen, and some acidic gases. As the process time increases, the phosphoric acid waste liquid condenses and crystallizes, accumulating in the exhaust pipe, condenser, and liquid collection bottle, affecting the service life of the exhaust pipe and the need for maintenance personnel to clean the liquid collection bottle.

[0040] Based on this, embodiments of this application disclose a crystallization dissolution device and a tail gas treatment device, which can generate water vapor and pass it into a tail gas pipe, a condenser pipe and a liquid collection bottle to soften phosphoric acid crystals into a phosphoric acid solution.

[0041] The technical solution of this application will be further described below with reference to the embodiments and accompanying drawings.

[0042] Please see Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the crystallization and dissolution apparatus 100 disclosed in an embodiment of this application. Figure 2This is a schematic diagram of the exhaust gas treatment device 200 disclosed in an embodiment of this application. This application discloses a crystallization dissolution device 100 for use in the exhaust gas treatment device 200. The exhaust gas treatment device 200 includes an exhaust pipe 6. The crystallization dissolution device 100 includes a water storage component 1, a heating component 2, an exhaust pipe 3, and an air supply assembly 4. The heating component 2 is connected to the water storage component 1 and can heat the water in the water storage component 1 to form water vapor. One end of the exhaust pipe 3 is connected to the water storage component 1, and the other end is connected to the exhaust pipe 6. The air supply assembly 4 is connected to the water storage component 1 and applies pressure to the water vapor in the water storage component 1, causing the water vapor to flow through the exhaust pipe 3 to the exhaust pipe 6. Water is heated into steam, which enters the exhaust pipe 6 through the exhaust pipe 3, and then enters the condenser pipe 7 and the liquid collection bottle 8. The steam can soften the phosphoric acid crystals in the exhaust pipe 6, condenser pipe 7 and liquid collection bottle 8 into a flowable phosphoric acid solution, avoiding the possibility of crystal accumulation in the exhaust pipe 6, condenser pipe 7 and liquid collection bottle 8, increasing the service life of the exhaust pipe 6, and making it easier for maintenance personnel to maintain and clean the liquid collection bottle 8.

[0043] It should be noted that the heating element 2 mentioned above can be any device that can heat the water in the water storage device 1 into water vapor, and this embodiment does not limit it.

[0044] It should also be noted that the water in the water storage device 1 can be manually injected or introduced through a water pipe; this embodiment does not limit this.

[0045] As an optional implementation, the gas supply assembly 4 includes an inlet pipe 41 connected to the water storage unit 1 to introduce pressurized gas. The pressurized gas enters the heating element 2 through the inlet pipe 41, driving the water vapor in the heating element 2 into the outlet pipe 3. Thus, by introducing pressurized gas through the inlet pipe 41, the pressure within the water storage unit 1 is increased, prompting water vapor to form more quickly and be driven into the outlet pipe 3, thereby improving the water vapor delivery efficiency. The introduction of pressurized gas not only accelerates water vapor formation but also more effectively promotes the dissolution of crystals in the water vapor, as the pressurized environment helps increase the dissolution rate, ensuring that the phosphate crystals in the tailpipe 6, condenser 7, and collection bottle 8 can be dissolved and processed more thoroughly. Heating element 2 heats the water to 50-60 degrees Celsius, and then pressurized gas forces the water vapor into the exhaust pipe 6. This prevents excessive pressure or overheating inside the water storage unit 1, thereby increasing the safety and operational stability of the device. It also prevents gas in the exhaust pipe 6 from entering the water storage unit 1 through the outlet pipe 3. The design of the air supply assembly 4 ensures sufficient contact between the water vapor and the exhaust gas, improving the efficiency and effectiveness of exhaust gas treatment and helping to more thoroughly remove harmful components from the exhaust gas.

[0046] Optionally, the pressurized gas is nitrogen. Nitrogen does not chemically react with water vapor or other substances in the exhaust pipe 6, which helps reduce the risk of fire or explosion, especially when dealing with exhaust gases that may contain flammable or reactive substances. The use of nitrogen also removes oxygen from the water storage unit 1, thereby preventing the oxidation of water vapor or dissolved substances during heating, which is crucial for maintaining the chemical stability of sensitive substances in the exhaust gas treatment device 200. As a pressurized gas, nitrogen helps control the pressure inside the system, ensuring that water vapor flows through the outlet pipe 3 to the exhaust pipe 6 at an appropriate rate and pressure, thus guaranteeing the stable operation of the entire exhaust gas treatment device 200.

[0047] Combination Figure 1 In some possible implementations, the gas supply assembly 4 also includes a first valve 42, which is disposed on the inlet pipe 41 to control the opening and closing of the inlet pipe 41. The first valve 42 allows the operator or automatic control system to adjust the flow rate of the pressurized gas as needed, thereby controlling the steam generation rate and the internal pressure of the system, ensuring the adaptability and safety of the device under different operating conditions. In case of system malfunction or maintenance, the supply of pressurized gas can be quickly cut off by closing the first valve 42, preventing equipment damage or safety accidents caused by excessive pressure. By precisely controlling the opening and closing of the inlet pipe 41, on the one hand, the operation of the exhaust gas treatment device 200 can be managed more effectively, reducing energy waste and maintaining the continuity and stability of the treatment process; on the other hand, it makes it easier for maintenance personnel to inspect and maintain the inlet pipe 41 and related components, improving the reliability and ease of maintenance of the device.

[0048] Combination Figure 1 In some embodiments, the air supply assembly 4 further includes a first drive element 43, which is connected to the first valve 42 to control the opening and closing of the first valve 42. The drive element enables rapid opening and closing of the first valve 42, which helps the system respond quickly in emergencies or when operating parameters need to be adjusted rapidly, thus improving the system's dynamic performance. Automated valve control reduces reliance on manual operation, lowers the possibility of operational errors, and also reduces the workload of operators, improving work efficiency.

[0049] It should be noted that the first driving component 43 can be any driving component capable of driving the valve to open or close, such as a motor or a cylinder, and this embodiment does not limit this.

[0050] Understandably, the first drive unit 43 can be connected to the automated control system, enabling the exhaust gas treatment device 200 to be remotely monitored and controlled, which is of great significance for realizing industrial automation and intelligent management.

[0051] Combination Figure 1Optionally, the first driving component 43 includes a first programmable controller 431 and a first solenoid valve 432. The first programmable controller 431 is electrically connected to the first solenoid valve 432, and the first solenoid valve 432 is connected to the first valve 42. The first programmable controller 431 can transmit signals to the first solenoid valve 432 to control the opening and closing of the first valve 42. The coil of the solenoid valve is connected to the output port of the programmable controller. When the output module of the PLC (Programmable Controller) provides a voltage signal, the solenoid coil is energized, generating a magnetic field that attracts the moving iron core to move, thereby changing the opening and closing state of the solenoid valve. The programmable controller can precisely control the opening and closing of the solenoid valve according to a preset program, thereby achieving precise control of fluid flow. Directly driving the solenoid valve can improve the system's response speed and achieve more timely and accurate control. The programming flexibility of the PLC allows for the writing and modification of logic control according to application requirements, improving the system's scalability and flexibility. In addition, the PLC has high reliability and anti-interference capabilities, which, combined with the stable performance of the solenoid valve, improves the stability of the entire control system.

[0052] Optionally, combined Figure 1 The crystallization and dissolution device 100 also includes a water inlet pipe 5, which is connected to the water storage unit 1 to inject water into the water storage unit 1. The water inlet pipe 5 allows water to be continuously injected into the water storage unit 1, ensuring that there is always enough water in the water storage unit 1, reducing the need for manual water addition, improving the convenience of operation, and helping to maintain the continuous operation of the device.

[0053] As an optional implementation, the water inlet pipe 5 is connected to the top of the water storage unit 1, and the air outlet pipe 3 is also connected to the top of the water storage unit 1. Connecting the water inlet pipe 5 to the top of the water storage unit 1 reduces the flow resistance of the liquid within the unit, allowing water to flow more smoothly into the heating element 2, thereby improving heating efficiency and the overall response speed of the system. The top connection simplifies the piping layout, making the installation and maintenance of the water inlet pipe 5 and the air outlet pipe 3 more convenient and helping to keep the device clean. Top connection points are generally easier to observe and monitor, which helps operators to promptly identify and resolve potential problems such as leaks or blockages, thereby improving the reliability and safety of the system.

[0054] Combination Figure 1 In some optional embodiments, the crystallization dissolution apparatus 100 further includes a second valve 51, which is disposed on the water inlet pipe 5 to control the opening and closing of the water inlet pipe 5. The second valve 51 allows for precise control of the process of adding water to the water storage device 1. On the one hand, it avoids over-addition or under-addition of water, ensuring accurate management of the water level. On the other hand, it avoids waste of water resources, ensuring that the amount of water added is controlled according to actual needs, improving resource utilization efficiency and enhancing operational convenience.

[0055] In some embodiments, the crystallization dissolution apparatus 100 further includes a second drive element 52 connected to the second valve 51 to control the opening and closing of the second valve 51. The second drive element 52 enables rapid opening and closing of the second valve 51, which helps the system respond quickly in emergency situations or when operating parameters need to be adjusted rapidly, improving the system's dynamic performance. Automated valve control reduces reliance on manual operation, lowers the possibility of operational errors, and also reduces the workload of operators, improving work efficiency.

[0056] It should be noted that the first driving component 43 can be any driving component that can drive the valve to open or close, and this embodiment does not limit it.

[0057] Combination Figure 1 Optionally, the second driving component 52 includes a second programmable controller 521 and a second solenoid valve 522. The second programmable controller 521 is electrically connected to the second solenoid valve 522, which is connected to the second valve 51. The second programmable controller 521 can transmit signals to control the second solenoid valve 522 and thus control the opening and closing of the second valve 51. The second programmable controller 521 can precisely control the opening and closing of the second solenoid valve 522 according to a preset program, thereby achieving precise control of the water flow in the inlet pipe 5. Directly driving the solenoid valve can improve the system's response speed and achieve more timely and accurate control. The programming flexibility of the PLC allows for the writing and modification of logic control according to application requirements, improving the system's scalability and flexibility. In addition, the PLC has high reliability and anti-interference capabilities, which, combined with the stable performance of the solenoid valve, improves the stability of the entire control system.

[0058] As an optional implementation, the crystallization dissolution device 100 also includes a liquid level sensor (not shown in the figure). The liquid level sensor is disposed on the heating element 2 and is electrically connected to the first driving element 43 and the second driving element 52 to sense the water level in the water storage element 1. When the water level in the water storage element 1 reaches 2 cm, the second driving element 52 controls the second valve 51 to open. When the water level in the water storage element 1 reaches two-thirds of the total depth of the water storage element 1, the second driving element 52 controls the second valve 51 to close, and the first driving element 43 controls the first valve 42 to open.

[0059] In this way, the water level in the water storage unit 1 is automatically controlled through the electrical connection between the liquid level sensor and the first drive component 43 and the second drive component 52. When the second valve 51 is manually opened to add water to the water storage unit 1, the valve automatically opens when the water level reaches 2cm, ensuring that there is always a certain amount of water in the heating element 2 to prevent dry burning and improve safety. When the water level reaches two-thirds of the total depth of the water storage unit 1, the water inlet automatically closes to prevent overflow, and the first valve 42 opens simultaneously to effectively control the generation and emission of water vapor, improving operational efficiency. Automated water level monitoring avoids safety hazards caused by improper operation or negligence, enhances the safety of the entire device, reduces reliance on manual intervention, lowers the risk of operational errors, and improves the stability and reliability of the entire exhaust gas treatment process.

[0060] It is understandable that heating element 2 is any possible heater capable of mounting a liquid level sensing module.

[0061] In some possible implementations, the connection point between the air inlet pipe 41 and the water storage unit 1 is positioned at a point two-thirds higher than the total depth of the water storage unit 1. Connecting the air inlet pipe 41 to the water storage unit 1 at a position higher than the highest water level effectively prevents water in the water storage unit 1 from flowing back into the air inlet pipe 41, ensuring that pressurized gas smoothly enters the water storage unit 1 and drives the water vapor into the exhaust pipe 6, thereby ensuring the safe and efficient operation of the entire device.

[0062] Optionally, a flow meter 411 is installed on the inlet pipe 41 to display the flow rate of the pressurized gas. The flow meter 411 can monitor and display the flow rate of the pressurized gas in real time, thereby ensuring that the amount of gas supplied to the water storage unit 1 meets the process requirements, avoiding the inability to effectively expel water vapor due to insufficient flow rate, or the waste of energy due to excessive flow rate. Operators can adjust the supply of pressurized gas based on the data displayed by the flow meter 411, achieving precise control over the water vapor generation and gas delivery process, which helps to improve operational efficiency and the controllability of the crystallization and dissolution process. In addition, by monitoring the gas flow rate, potential leaks or blockages in the system can be detected in a timely manner, ensuring the stability and safety of the entire crystallization and dissolution device 100.

[0063] Please see Figure 2 Secondly, this application also discloses an exhaust gas treatment device 200, which includes a crystallization and dissolution device 100 as described in the first aspect, an exhaust pipe 6, a condenser pipe 7, and a liquid collection bottle 8. The first end of the condenser pipe 7 is connected to the exhaust pipe 6, and the second end of the condenser pipe 7 is connected to the liquid collection bottle 8. The top of the liquid collection bottle 8 is provided with an exhaust port 81, and the bottom of the liquid collection bottle 8 is provided with a drain port 82. The exhaust port 81 and the drain port 82 are respectively connected to a waste gas collection device. In this way, the waste gas in the exhaust gas, the water vapor flowing into the exhaust pipe 6, and the nitrogen gas can be discharged from the exhaust port, while the dissolved phosphoric acid solution is discharged from the drain port 82.

[0064] In this way, the water is heated into steam, which enters the exhaust pipe 6 through the exhaust pipe 3, and then enters the condenser pipe 7 and the liquid collection bottle 8. The steam softens the phosphoric acid crystals in the exhaust pipe 6, condenser pipe 7 and liquid collection bottle 8 into a flowable phosphoric acid solution, avoiding the possibility of crystal accumulation in the exhaust pipe 6, condenser pipe 7 and liquid collection bottle 8, increasing the service life of the exhaust pipe 6, and making it easier for maintenance personnel to maintain and clean the liquid collection bottle 8.

[0065] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A crystallization dissolution device for use in an exhaust gas treatment device, the exhaust gas treatment device comprising an exhaust gas pipe, characterized in that, The crystallization dissolution apparatus includes: Water storage components; A heating element connected to the water storage container, the heating element being capable of heating the water in the water storage container to form water vapor; An exhaust pipe, one end of which is connected to the water storage device and the other end of which is connected to the exhaust pipe; An air supply assembly is connected to the water storage device and applies pressure to the water vapor in the water storage device, causing the water vapor to flow through the air outlet pipe to the exhaust pipe.

2. The crystallization and dissolution apparatus according to claim 1, characterized in that, The gas supply assembly includes an air inlet pipe connected to the water storage unit to introduce pressurized gas, which enters the heating element from the air inlet pipe and drives the water vapor in the heating element into the air outlet pipe.

3. The crystallization and dissolution apparatus according to claim 2, characterized in that, The pressurized gas is nitrogen.

4. The crystallization and dissolution apparatus according to claim 2, characterized in that, The air supply assembly also includes a first valve, which is disposed on the air inlet pipe to control the opening and closing of the air inlet pipe.

5. The crystallization and dissolution apparatus according to claim 4, characterized in that, The air supply assembly further includes a first drive unit connected to the first valve to control the opening and closing of the first valve.

6. The crystallization and dissolution apparatus according to claim 5, characterized in that, The crystallization dissolution device also includes a water inlet pipe connected to the water storage device to inject water into the water storage device.

7. The crystallization and dissolution apparatus according to claim 6, characterized in that, The water inlet pipe is connected to the top of the water storage device, and the air outlet pipe is connected to the top of the water storage device.

8. The crystallization and dissolution apparatus according to claim 7, characterized in that, The crystallization dissolution device also includes a second valve, which is disposed on the water inlet pipe to control the opening and closing of the water inlet pipe.

9. The crystallization and dissolution apparatus according to claim 8, characterized in that, The crystallization and dissolution device further includes a second driving element connected to the second valve to control the opening and closing of the second valve.

10. The crystallization and dissolution apparatus according to claim 9, characterized in that, The crystallization dissolution device further includes a liquid level sensor, which is disposed on the heating element and electrically connected to the first driving element and the second driving element. The liquid level sensor senses the water level in the water storage container. When the water level in the water storage container reaches 2cm, the second driving element controls the second valve to open. When the water level in the water storage container reaches two-thirds of the total depth of the water storage container, the second driving element controls the second valve to close, and the first driving element controls the first valve to open.

11. The crystallization and dissolution apparatus according to claim 10, characterized in that, The connection point between the air inlet pipe and the water storage component is located at a point two-thirds higher than the total depth of the water storage component.

12. The crystallization and dissolution apparatus according to claim 2, characterized in that, The air inlet pipe is equipped with a flow meter to display the flow rate of the pressurized gas.

13. A tail gas treatment device, characterized in that, The exhaust gas treatment device includes: The crystallization dissolution apparatus as described in any one of claims 1-12; Exhaust pipe; A condenser tube, the first end of which is connected to the exhaust pipe; A liquid collection bottle is provided, with the second end of the condenser tube connected to the liquid collection bottle. The top of the liquid collection bottle is provided with an exhaust port, and the bottom of the liquid collection bottle is provided with a drain port.