Cleaning mechanism

Abstract

The utility model discloses a cleaning mechanism which comprises a cleaning tank, a supporting piece used for supporting the cleaning tank, a liquid storage tank and a residual liquid barrel, the top end of the cleaning tank is provided with a cleaning cavity, one side of the cleaning tank is provided with a first connector, the first connector is communicated with the cleaning cavity, the first connector is connected with the liquid storage tank through a first pipeline, and the liquid storage tank is connected with the residual liquid barrel through a second pipeline. A first connector is arranged at the bottom end of the cleaning tank, a fluid control two-way valve is arranged on the first pipeline, a second connector is arranged at the bottom end of the cleaning tank and communicated with the residual liquid barrel through a second pipeline, and a switch valve is arranged on the second pipeline. According to the utility model, the production efficiency is improved, and the production cost is reduced.

Description

Technical Field

[0001] This utility model relates to the field of battery production technology, specifically to a cleaning mechanism. Background Technology

[0002] For aluminum-cased cylindrical batteries produced during the experimental stage, after secondary electrolyte filling, it is usually necessary to apply a sealant nail to the filling hole at the center of the top of the aluminum casing. Currently, the helium return nailing test machine typically employs a two-step process for applying sealant nails to the filling hole of cylindrical batteries: the first step is pre-pressing the nail, and the second step is full helium return nailing. The second step is usually performed using the helium return nailing mechanism 200 of the helium return nailing test machine. Figure 1 As shown, the helium return nailing mechanism 200 generally includes a lifting cylinder 201, a mounting plate 202, a first nailing seat 203, a second nailing seat 204, a pressure block 205, a pressure rod, and a nailing cylinder 206. The bottom end of the pressure block 205 is provided with a sealing ring 2051. The pressure rod is disposed within the second nailing seat 204, the first nailing seat 203, and the pressure block 205, with its head extending into the sealing ring 2051. During helium return full nailing, the linear module of the helium return nailing test machine first drives the helium return nailing mechanism to move above the injection hole of the cylindrical battery. Then, the lifting cylinder 201 of the helium return nailing mechanism drives the mounting plate 202, the first nailing seat 203, and the second nailing seat 204. 04. The pressure block 205, sealing ring 2051, pressure rod, and nailing cylinder 206 move downwards so that the sealing ring 2051 abuts against the cylindrical battery. At this time, the sealing nail pre-pressed into the injection hole and the injection hole are located inside the sealing ring 2051. Then, the cylindrical battery is evacuated and helium is returned through the interior of the pressure block 205, the interior of the sealing ring 2051, the groove on the outer wall of the sealing nail, and the injection hole by the helium return device. Then, the output shaft of the nailing cylinder 206 extends out, and the end of the output shaft passes through the through hole at the top of the second nailing seat 204 and pushes the pressure rod downwards. By moving the pressure rod downwards, the part of the sealing nail located outside the injection hole can be completely pressed into the injection hole.

[0003] During the vacuuming process of the cylindrical battery, a small amount of electrolyte is often extracted. This electrolyte adheres to the inner wall of the sealing ring 2051 and the head of the pressure rod. Therefore, after the helium return and full-pin press-fit process, it is usually necessary to clean the inner wall of the sealing ring 2051 and the head of the pressure rod. Currently, this is generally done manually using cleaning tools, which reduces production efficiency and increases production costs. Utility Model Content

[0004] To overcome the shortcomings of the existing technology, this utility model provides a cleaning mechanism that improves production efficiency and reduces production costs.

[0005] The technical solution adopted by this utility model to solve its technical problem is:

[0006] This utility model provides a cleaning mechanism, including a cleaning tank, a support for supporting the cleaning tank, a storage tank, and a residual liquid bucket. The top of the cleaning tank has a cleaning cavity, and a first connector is provided on one side of the cleaning tank. The first connector is connected to the cleaning cavity and is connected to the storage tank through a first pipe. A fluid control two-way valve is provided on the first pipe. The bottom of the cleaning tank has a second connector, which is connected to the residual liquid bucket through a second pipe. A switch valve is provided on the second pipe.

[0007] As a preferred technical solution, the top of the cleaning tank is provided with a groove and an overflow channel. The groove is connected to the cleaning chamber and the overflow channel respectively. The bottom of the cleaning tank is provided with a third connector at the position corresponding to the overflow channel. The third connector is connected to the overflow channel and is connected to the residual liquid tank through a third pipe.

[0008] As a preferred technical solution, the bottom of the cleaning chamber is provided with a first channel, and the cleaning tank is provided with a second channel and a third channel. The first channel, the second connector and the third channel are all connected to the second channel, and the first connector is connected to the third channel.

[0009] As a preferred technical solution, the cleaning mechanism further includes a residual liquid box, the cleaning tank is located above the residual liquid box and inside the residual liquid box, a first connector and a second connector are respectively provided on both sides of the top of the residual liquid box, the first connector and the second connector are respectively provided on both sides of the cleaning tank, the bottom of the residual liquid box is provided with a residual liquid connector, the residual liquid connector is connected to the interior of the residual liquid box, and the residual liquid connector is connected to the residual liquid tank through a residual liquid pipe.

[0010] As a preferred technical solution, there are two support members, the cleaning tank is located between the two support members, and the top of each support member is provided with an installation member, which is disposed at the top of the cleaning tank.

[0011] As a preferred technical solution, the liquid storage tank includes a tank body and a tank cover that covers the open end of the tank body. A liquid level sensor is provided on the tank body, and the liquid level sensor is used to detect the height of the liquid level in the tank body.

[0012] As a preferred technical solution, the overflow channel includes a rectangular channel and a circular channel. The top of the cleaning tank is provided with the rectangular channel, and the bottom of the rectangular channel is provided with the circular channel. The rectangular channel is connected to the groove, and the circular channel is connected to the third connector. The inner diameter of the circular channel is smaller than the length and width of the rectangular channel.

[0013] The beneficial effects of this utility model are: the cleaning mechanism of this utility model, through the cleaning tank, the support for supporting the cleaning tank, the liquid storage tank and the residual liquid bucket, can clean the inner wall of the sealing ring and the head of the pressure rod of the helium return nailing mechanism of the helium return nailing test machine, without the need for manual cleaning, thereby improving production efficiency and reducing production costs. Attached Figure Description

[0014] The present invention will be further described below with reference to the accompanying drawings and embodiments.

[0015] Figure 1 This is a schematic diagram of the helium return nailing mechanism;

[0016] Figure 2 This is a schematic diagram of a cleaning mechanism and mounting bracket provided in one embodiment of the present invention;

[0017] Figure 3 yes Figure 2 A schematic diagram of the cleaning tank, support components, and residual liquid box of the cleaning mechanism shown from a first angle;

[0018] Figure 4 yes Figure 3 A structural schematic diagram of the cleaning tank, support components, and residual liquid box from a second angle;

[0019] Figure 5 yes Figure 3 A structural schematic diagram of the cleaning tank, support components, and residual liquid box from a third angle;

[0020] Figure 6 yes Figure 3 The diagram shows a cross-sectional view of the cleaning tank, support components, and residual liquid container.

[0021] Figure label:

[0022] 10. Cleaning tank; 11. Cleaning chamber; 111. First channel; 112. Second channel; 113. Third channel; 13. First pipe; 14. Fluid control two-way valve; 15. Second connector; 16. Groove; 17. Overflow channel; 171. Rectangular channel; 172. Circular channel; 18. Third connector;

[0023] 20. Supporting components; 21. Mounting components;

[0024] 30. Storage tank; 31. Tank body; 32. Tank cover; 33. Mounting base; 34. Liquid level sensor;

[0025] 40. Residual liquid container; 41. First connector; 42. Second connector; 43. Residual liquid connector;

[0026] 50. Mounting bracket;

[0027] 200. Helium return nailing mechanism; 201. Lifting cylinder; 202. Mounting plate; 203. First nailing seat; 204. Second nailing seat; 205. Pressure block; 2051. Sealing ring; 206. Nail-driving cylinder. Detailed Implementation

[0028] The following will clearly and completely describe the concept, specific structure, and technical effects of this utility model in conjunction with embodiments and accompanying drawings, so as to fully understand the purpose, features, and effects of this utility model. Obviously, the described embodiments are only a part of the embodiments of this utility model, not all of them. Other embodiments obtained by those skilled in the art based on the embodiments of this utility model without creative effort are all within the scope of protection of this utility model. Furthermore, all connections / linkages involved in the patent do not simply refer to direct contact between components, but rather to the ability to form a better connection structure by adding or reducing connecting accessories according to specific implementation conditions. The various technical features in this utility model can be combined interactively without contradicting each other.

[0029] Please refer to Figures 2 to 6 An embodiment of the present invention provides a cleaning mechanism, including a cleaning tank 10, a support member 20 for supporting the cleaning tank 10, a liquid storage tank 30, a residual liquid bucket (not shown in the figure), and a residual liquid box 40.

[0030] Support members 20 are used to be installed at the top of the helium remelting nail tester. In this embodiment, there are two support members 20, which are arranged symmetrically from left to right and are both L-shaped. The cleaning tank 10 is located between the two support members 20. The top of the support member 20 is provided with a mounting member 21, which is installed at the top of the cleaning tank 20.

[0031] The cleaning tank 10 has a cleaning chamber 11 at its top center. A first connector 12 is located on one side of the cleaning tank 10, for example, the rear side. The first connector 12 communicates with the cleaning chamber 11 and is connected to a storage tank 30 via a first pipe 13. The storage tank 30 is used to hold the cleaning fluid. A fluid control two-way valve 14 is installed on the first pipe 13, located close to the storage tank 30, and is used to control the flow rate of the cleaning fluid. A second connector 15 is located at the bottom of the cleaning tank 10. The second connector 15 communicates with a residual liquid tank via a second pipe (not shown in the figure). The residual liquid tank is used to recover the cleaning fluid. A switch valve is installed on the second pipe to control the opening and closing of the second pipe.

[0032] In this embodiment, as Figure 6As shown, the bottom of the cleaning chamber 11 is provided with a first channel 111, and the cleaning tank 10 is provided with a second channel 112 and a third channel 113. The second channel 112 is located below the first channel 111 and is perpendicular to the first channel 111. The third channel 113 is located on one side of the second channel 112, for example, behind the second channel 112 and is perpendicular to the second channel 112. The first channel 111, the second connector 15 and the third channel 113 are all connected to the second channel 112, and the first connector 12 is connected to the third channel 113.

[0033] In this embodiment, a first mounting hole is provided on one side, such as the rear side, of the cleaning tank 10. The first mounting hole communicates with the third channel 113. A first connector 12 is disposed in the first mounting hole, and a portion of the first connector 12 protrudes from one side, such as the right side, of the cleaning tank 10. A second mounting hole is provided at the bottom end of the cleaning tank 10. The second mounting hole communicates with the second channel 112. A second connector 15 is disposed in the second mounting hole, and a portion of the second connector 15 protrudes from the bottom end of the cleaning tank 10.

[0034] The top of the cleaning tank 10 is provided with a groove 16 and an overflow channel 17. The groove 16 is located on one side of the cleaning chamber 11, for example, to the right of the cleaning chamber 11, and the overflow channel 17 is located on one side of the groove 16, for example, behind the groove 16. The groove 16 communicates with both the cleaning chamber 11 and the overflow channel 17, and the depth of the groove 16 is less than the depth of the cleaning chamber 11. At the bottom of the cleaning tank 10, corresponding to the overflow channel 17, a third connector 18 is provided. The third connector 18 communicates with the overflow channel 17 and is connected to the residual liquid tank via a third pipe (not shown in the figure). In practical applications, the liquid level in the cleaning chamber 11 is lower than the bottom of the groove 16.

[0035] In this embodiment, the overflow channel 17 includes a rectangular channel 171 and a circular channel 172. The top of the cleaning tank 10 is provided with the rectangular channel 171, and the bottom of the rectangular channel 171 is provided with the circular channel 172. The rectangular channel 171 communicates with the groove 16, and the circular channel 172 communicates with the third connector 18. The rectangular channel 171 has a rectangular cross-sectional shape, and the circular channel 172 has a circular cross-sectional shape. The inner diameter of the circular channel 172 is smaller than the length and width of the rectangular channel 171. When the cleaning fluid passes through the circular channel 172, the flow rate of the cleaning fluid will increase, thereby allowing the cleaning fluid to flow quickly into the third pipe through the third connector 18.

[0036] The bottom end of the cleaning tank 10 is provided with a third mounting hole at the position corresponding to the overflow channel 17. The third mounting hole is connected to the circular channel 172. The third connector 18 is provided in the third mounting hole and the third connector 18 protrudes from the bottom end of the cleaning tank 10.

[0037] In this embodiment, the storage tank 30 is located above and behind the cleaning tank 10. The storage tank 30 includes a tank body 31 for holding cleaning fluid and a lid 32 that covers the open end of the tank body 31. By opening the lid 32, cleaning fluid can be added to the tank body 31. In practical applications, the tank body 31 is mounted on the mounting frame 50 of the helium recycle nail testing machine via a mounting base 33. The mounting frame 50 is located at the top of the machine base of the helium recycle nail testing machine, thereby supporting the storage tank 30. The mounting frame 50 is located behind the cleaning tank 10.

[0038] A liquid level sensor 34 is installed on the tank 31. The liquid level sensor 34 is used to detect the height of the liquid level inside the tank 31 so that the operator can add cleaning fluid to the tank 31 in a timely manner when the liquid level inside the tank 31 is lower than a preset height value. The liquid level sensor 34 is preferably an ultrasonic liquid level sensor.

[0039] The cleaning tank 10 is located above and inside the residual liquid box 40, which is situated between two support members 20. A first connector 41 and a second connector 42 are respectively located on both sides of the top of the residual liquid box 40, positioned at the front and rear of the cleaning tank 10. The number of first connectors 41 and second connectors 42 can be adjusted according to actual conditions. A residual liquid connector 43 is located at the bottom of the residual liquid box 40, communicating with the interior of the box and connected to a residual liquid tank via a residual liquid pipe (not shown in the figure).

[0040] In this embodiment, the bottom end of the residual liquid box 40 is provided with a connector mounting hole, the residual liquid connector 43 is disposed in the connector mounting hole and the residual liquid connector 43 protrudes from the bottom end of the residual liquid box 40.

[0041] With the above structure, in practical application, the linear module of the helium return nailing test mechanism is set between the mounting frame 50 and the cleaning tank 10. The helium return nailing mechanism 200 of the helium return nailing test machine is located above the cleaning tank 10. First, the fluid control two-way valve 14 is opened, so that a predetermined amount of cleaning liquid can be introduced into the cleaning chamber 11 through the storage tank 30 via the first pipe 13, the first connector 12, the third channel 113, the second channel 112, and the first channel 111. Then, the fluid control two-way valve 14 is closed to stop the introduction of cleaning liquid into the cleaning chamber 11 through the storage tank 30. After the helium-returning nailing mechanism 200 of the helium-returning nailing test machine completes the helium-returning full nailing process, the helium-returning nailing mechanism 200 is first moved above the cleaning tank 10 by the linear module, and the pressure block 205 and sealing ring 2051 of the helium-returning nailing mechanism 200 are aligned with the cleaning chamber 11. Then, the lifting cylinder 201 of the helium-returning nailing mechanism 200 drives the first nailing seat 203, the second nailing seat 204, the pressure block 205, the sealing ring 2051 and the pressure rod to move downward until the pressure block 205 and the sealing ring 2051 are located in the cleaning chamber 11. At this time, the cleaning fluid can enter the interior of the sealing ring 2051 and the head of the pressure rod is immersed in the cleaning fluid. After standing for a period of time, the electrolyte on the inner wall of the sealing ring 2051 and the electrolyte on the head of the pressure rod can be dissolved in the cleaning fluid. In this way, the inner wall of the sealing ring 2051 and the head of the pressure rod of the helium-returning nailing mechanism 200 are cleaned. Then, the lifting cylinder 201 drives the first nailing seat 203, the second nailing seat 204, the pressure block 205, the sealing ring 2051, and the pressure rod set in the first nailing seat 203 and the second nailing seat 204 to move upward to the initial position. Then, the switch valve is opened, so that the cleaning fluid in the cleaning chamber 11 can flow into the residual liquid tank for recycling through the first channel 111, the second channel 112, the second connector 15, and the second pipe. During the process of the lifting cylinder 201 of the helium return nailing mechanism 200 driving the first nailing seat 203, the second nailing seat 204, the pressure block 205, the sealing ring 2051, and the pressure rod set in the first nailing seat 203 and the second nailing seat 204 to move downwards so that the pressure block 205 and the sealing ring 2051 are located in the cleaning chamber 11, the pressure block 205 and the sealing ring 2051 will raise the liquid level in the cleaning chamber 11. When the liquid level corresponds to the groove 16, the cleaning liquid will flow into the overflow channel 17 through the groove 16, and then flow into the residual liquid tank through the third connector 18 and the third pipe for recycling. This can prevent the cleaning liquid from overflowing to the outside of the cleaning tank 10, thereby avoiding the cleaning liquid dripping onto the machine platform of the helium return nailing test machine and ensuring that the machine platform is clean. When cleaning fluid overflows outside the cleaning tank 10, the overflowing cleaning fluid can flow into the residual liquid box 40 below the cleaning tank 10, and then flow into the residual liquid bucket through the residual liquid connector 43 and residual liquid pipe for recycling. This also avoids the cleaning fluid dripping onto the machine platform of the helium nail tester.

[0042] The cleaning mechanism of this utility model, through the cleaning tank 10, the support member 20 for supporting the cleaning tank 10, the liquid storage tank 30 and the residual liquid bucket, can clean the inner wall of the sealing ring 2051 and the head of the pressure rod of the helium return nailing mechanism 200 of the helium return nailing test machine. It can be done without manual means, which improves production efficiency and reduces production costs.

[0043] The above is a detailed description of the preferred embodiments of the present utility model. However, the present utility model is not limited to the described embodiments. Those skilled in the art can make various equivalent modifications or substitutions without departing from the spirit of the present utility model. All such equivalent modifications or substitutions are included within the scope defined by the claims of this application.

Claims

1. A cleaning mechanism, characterized in that, The device includes a cleaning tank, a support for supporting the cleaning tank, a storage tank, and a residual liquid tank. The top of the cleaning tank has a cleaning chamber, and a first connector is provided on one side of the cleaning tank. The first connector is connected to the cleaning chamber and is connected to the storage tank through a first pipe. A fluid control two-way valve is provided on the first pipe. The bottom of the cleaning tank has a second connector, which is connected to the residual liquid tank through a second pipe. A switch valve is provided on the second pipe.

2. The cleaning mechanism according to claim 1, characterized in that, The top of the cleaning tank is provided with a groove and an overflow channel. The groove is connected to the cleaning chamber and the overflow channel respectively. The bottom of the cleaning tank is provided with a third connector at the position corresponding to the overflow channel. The third connector is connected to the overflow channel and is connected to the residual liquid tank through a third pipe.

3. The cleaning mechanism according to claim 1, characterized in that, The bottom of the cleaning chamber is provided with a first channel, and the cleaning tank is provided with a second channel and a third channel. The first channel, the second connector and the third channel are all connected to the second channel, and the first connector is connected to the third channel.

4. The cleaning mechanism according to claim 2, characterized in that, The cleaning mechanism also includes a residual liquid box. The cleaning tank is located above and inside the residual liquid box. A first connector and a second connector are respectively provided on both sides of the top of the residual liquid box. The first connector and the second connector are respectively provided on both sides of the cleaning tank. A residual liquid connector is provided at the bottom of the residual liquid box. The residual liquid connector communicates with the interior of the residual liquid box. The residual liquid connector is connected to the residual liquid tank through a residual liquid pipe.

5. The cleaning mechanism according to claim 1, characterized in that, There are two support members, and the cleaning tank is located between the two support members. The top of each support member is provided with an installation member, which is located at the top of the cleaning tank.

6. The cleaning mechanism according to claim 1, characterized in that, The storage tank includes a tank body and a lid that covers the open end of the tank body. A liquid level sensor is provided on the tank body to detect the height of the liquid level in the tank body.

7. The cleaning mechanism according to claim 2, characterized in that, The overflow channel includes a rectangular channel and a circular channel. The top of the cleaning tank is provided with the rectangular channel, and the bottom of the rectangular channel is provided with the circular channel. The rectangular channel is connected to the groove, and the circular channel is connected to the third connector. The inner diameter of the circular channel is smaller than the length and width of the rectangular channel.

Images