Liftable wafer water tank on CMP (chemical mechanical polishing) equipment
By installing a liftable wafer water tank on the CMP equipment and using a lifting component to control the raising and lowering of the water tank, the problem of misalignment and displacement of the wafer carrier in pure water was solved, thus improving operational accuracy.
Patent Information
- Application Number
- CN202422329526.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-23
- Publication Date
- 2025-11-18
- Estimated Expiration
- 2034-09-23
AI Technical Summary
In existing CMP equipment, when the wafer carrier is placed in pure water, the buoyancy and light refraction cause misalignment and displacement, which affects the accurate handling by the robotic arm.
A liftable wafer water tank is installed on the CMP equipment. The lifting mechanism controls the raising and lowering of the water tank to ensure that the mounting plate and wafer carrier can avoid pure water during assembly and unloading, thus avoiding the effects of buoyancy and light refraction.
This effectively avoids misalignment and displacement problems caused by pure water buoyancy and light refraction during the assembly and unloading of wafer carriers, thus improving the operating accuracy of the robotic arm.
Smart Images
Figure CN223558157U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to the field of wafer tank technology, especially to a liftable wafer tank on CMP equipment. BACKGROUND
[0002] In actual production process, in order to ensure that wafer is in wet state, wafer needs to be immersed in pure water, as shown in figure Figure 1 The existing tank is provided with a mounting plate in the tank, and the mounting plate is connected to the rack through a connecting rod above the mounting plate. Since the mounting plate is immersed in pure water, the wafer carrier will be affected by the pure water buoyancy and light refraction when placed manually, resulting in misplacement of the wafer carrier, which is not conducive to subsequent mechanical arm taking wafers. UTILITY MODEL CONTENTS
[0003] In order to improve the problem that the wafer carrier will be affected by the pure water buoyancy and light refraction when placed manually, resulting in misplacement of the wafer carrier, the present application provides a liftable wafer tank on CMP equipment.
[0004] The liftable wafer tank on CMP equipment provided by the present application adopts the following technical solution:
[0005] The application discloses a liftable wafer tank on a CMP device, which comprises a tank, a rack, a connecting rod and a mounting plate, the tank is arranged on the rack, the rack is provided with a lifting assembly for lifting the tank, the connecting rod is connected to the rack, the mounting plate is connected to the end of the connecting rod, the mounting plate and the connecting rod are arranged perpendicularly to each other, and the mounting plate can be located in the tank; the lifting assembly comprises a lifting cylinder and a connecting seat, the lifting cylinder is connected to the rack, the piston rod of the lifting cylinder is arranged in a direction perpendicular to the rack, the connecting seat is connected to the bottom of the tank, the piston rod of the lifting cylinder is connected to the connecting seat, the connecting seat is provided with a connecting hole for inserting the piston rod of the lifting cylinder, and the connecting seat is provided with a locking assembly for locking the piston rod of the lifting cylinder; the locking assembly comprises a cover, a pull rod, a sliding block, a spring, a connecting plate, a handle and a locking rod, the connecting seat is provided with a mounting groove, the cover is connected to the groove opening of the mounting groove, the pull rod is arranged in the mounting groove in a penetrating mode, the axis of the pull rod is arranged in line with the axis of the mounting groove, the sliding block is connected to the end of the pull rod located in the mounting groove, the sliding block is cuboid-shaped, the side wall of the sliding block is slidably attached to the inner wall of the mounting groove, the spring is sleeved on the rod of the pull rod located in the mounting groove, one end of the spring is abutted against the sliding block, and the other end of the spring is abutted against the cover, the connecting plate is connected to the end of the pull rod not penetrating into the mounting groove, the connecting plate and the pull rod are arranged perpendicularly to each other, the handle is connected to the connecting plate, the handle is located on the surface of the connecting plate away from the connecting seat, the locking rod is connected to the connecting plate, the locking rod is arranged in a direction perpendicular to the connecting plate, the connecting seat is provided with a through hole for penetrating the locking rod, and the piston rod of the lifting cylinder is provided with a locking hole for inserting the locking rod.
[0006] Preferably, the rack is connected with support columns arranged in a direction perpendicular to the rack, and the support columns are arranged on both sides of the lifting assembly respectively, and the support columns can abut against the bottom of the tank.
[0007] In conclusion, the application has the following beneficial technical effects:
[0008] The liftable wafer tank on the CMP device comprises a tank, a rack, a connecting rod, a mounting plate and a lifting assembly, the lifting assembly is arranged on the rack, the tank is lowered to a standby state by the lifting assembly when the wafer carrier is assembled and unloaded, the mounting plate and the wafer carrier are both leaked with pure water, the tank is lifted to a working state by the lifting assembly after the assembly or unloading is completed, the mounting plate is leaked with pure water, and the wafer carrier is not affected by the buoyancy of pure water and light refraction when the wafer carrier is assembled and unloaded, so that the problem that the wafer carrier is placed in a wrong position and deviates due to the influence of the buoyancy of pure water and light refraction when the wafer carrier is placed manually is solved. BRIEF DESCRIPTION OF DRAWINGS
[0009] Figure 1 is a schematic view of a sink in the background of the present application;
[0010] Figure 2 is a structural schematic view of a liftable wafer sink on a CMP device in the embodiment of the present application;
[0011] Figure 3 is a schematic view for embodying a locking assembly in the embodiment of the present application.
[0012] Legend: 1, sink; 2, rack; 21, support column; 3, connecting rod; 4, mounting plate; 5, lifting assembly; 51, lifting cylinder; 52, connecting seat; 6, locking assembly; 61, cover; 62, pull rod; 63, sliding block; 64, spring; 65, connecting plate; 66, handle; 67, locking rod. DETAILED DESCRIPTION
[0013] In order for the person skilled in the art to better understand the scheme of the present application, the scheme in the embodiment of the present application will be described clearly and completely below in conjunction with the drawings. Obviously, the described embodiment is only a part of the embodiment of the present application, rather than all the embodiments. Based on the embodiment in the present application, all other embodiments obtained by the person skilled in the art without making creative efforts shall belong to the protection scope of the present application.
[0014] In the description of the present application, it should be noted that the orientation or position relationship indicated by the terms “center”, “upper”, “lower”, “left”, “right”, “vertical”, “horizontal”, “inner”, “outer” and the like is the orientation or position relationship based on the orientation or position relationship shown in the drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application; the terms “first”, “second”, “third” are only for the purpose of description, and cannot be understood as indicating or implying relative importance; in addition, unless otherwise explicitly specified and limited, the terms “mounting”, “connection”, “connection” should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or the communication inside two elements. For the person skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.
[0015] The embodiment of the present application discloses a liftable wafer sink on a CMP device. Referring to Figure 1 and Figure 2The liftable wafer tank 1 on the CMP device comprises a tank 1, a frame 2, a connecting rod 3 and a mounting plate 4, the tank 1 is arranged on the frame 2, the frame 2 is provided with a lifting assembly 5 for lifting the tank 1, the connecting rod 3 is connected to the frame 2, the mounting plate 4 is connected to the end of the connecting rod 3, the mounting plate 4 is arranged perpendicularly to the connecting rod 3, and the mounting plate 4 can be located inside the tank 1.
[0016] A control switch for controlling the lifting assembly 5 can be arranged outside, which is a prior art and will not be described here.
[0017] By arranging the lifting assembly 5 on the frame 2, when assembling and disassembling the wafer carrier, the staff can control the lifting assembly 5 through the control switch, lower the tank 1 to the standby state by the lifting assembly 5, so that the mounting plate 4 and the wafer carrier both leak pure water, and after the assembly or disassembly is completed, the tank 1 is raised to the working state by the lifting assembly 5, and the mounting plate 4 leaks pure water, so that the assembly and disassembly of the wafer carrier will not be affected by the buoyancy of the pure water and the refraction of light, thereby achieving the effect of improving the problem that the manual placement of the wafer carrier will be affected by the buoyancy of the pure water and the refraction of light, resulting in misplacement of the wafer carrier.
[0018] The lifting assembly 5 comprises a lifting cylinder 51 and a connecting seat 52, the lifting cylinder 51 is connected to the frame 2, the piston rod of the lifting cylinder 51 is arranged in a direction perpendicular to the frame 2, the lifting cylinder 51 is electrically connected to the control switch, the connecting seat 52 is connected to the bottom of the tank 1, the piston rod of the lifting cylinder 51 is connected to the connecting seat 52, the connecting seat 52 is provided with a connecting hole for inserting the piston rod of the lifting cylinder 51, and the connecting seat 52 is provided with a locking assembly 6 for locking the piston rod of the lifting cylinder 51. When assembling and disassembling the wafer carrier, the tank 1 is lowered to the standby state by the lifting cylinder 51, so that the mounting plate 4 and the wafer carrier both leak pure water, and after the assembly or disassembly is completed, the tank 1 is raised to the working state by the lifting cylinder 51, and the mounting plate 4 leaks pure water, so that the assembly and disassembly of the wafer carrier will not be affected by the buoyancy of the pure water and the refraction of light.
[0019] The locking assembly 6 comprises a cover 61, a pull rod 62, a sliding block 63, a spring 64, a connecting plate 65, a handle 66 and a locking rod 67, the connecting seat 52 is provided with a mounting groove, the cover 61 is connected to the groove opening of the mounting groove, the pull rod 62 is arranged in the mounting groove through the cover 61, the axis of the pull rod 62 is arranged in line with the axis of the mounting groove, the sliding block 63 is connected to the end of the pull rod 62 in the mounting groove, the sliding block 63 is arranged in a cubic shape, the side wall of the sliding block 63 is slidingly fitted to the inner wall of the mounting groove, the spring 64 is sleeved on the rod of the pull rod 62 in the mounting groove, one end of the spring 64 abuts against the sliding block 63, and the other end of the spring 64 abuts against the cover 61, the connecting plate 65 is connected to the end of the pull rod 62 not penetrating into the mounting groove, the connecting plate 65 is arranged perpendicular to the pull rod 62, the handle 66 is connected to the connecting plate 65, the handle 66 is located on the surface of the connecting plate 65 away from the connecting seat 52, the locking rod 67 is connected to the connecting plate 65, the locking rod 67 is arranged in a direction perpendicular to the connecting plate 65, the connecting seat 52 is provided with a through hole for the locking rod 67 to pass through, and the piston rod of the lifting cylinder 51 is provided with a locking hole for the locking rod 67 to insert, when the sink 1 is installed, the handle 66 is first pulled outward, so that the locking rod 67 is away from the connecting seat 52, then the piston rod of the lifting cylinder 51 is inserted into the connecting hole of the connecting seat 52, then the handle 66 is released, the spring 64 pushes the sliding block 63 to drive the locking rod 67 on the connecting plate 65 to insert into the locking hole of the piston rod of the lifting cylinder 51 through the pull rod 62; when the sink 1 is disassembled, the handle 66 is pulled outward, so that the locking rod 67 is separated from the locking hole, and the sink 1 can be lifted upward, so that the sink 1 is convenient to maintain.
[0020] The support column 21 is connected to the rack 2 and is arranged in a direction perpendicular to the rack 2, and one support column 21 is arranged on each side of the lifting assembly 5, the support column 21 can abut against the bottom of the sink 1, the sink 1 can be supported by the support column 21 when the sink 1 is in the standby state, and the lifting cylinder 51 is in the closed state to rest.
[0021] Finally, it should be noted that: the above only describes preferred embodiments of the present application, the protection scope of the present application is not limited to the above-mentioned embodiments, any technical solutions falling within the scope of the present application shall be deemed to fall within the protection scope of the present application. It should be noted that for ordinary technical personnel in the technical field, some improvements and decorations without departing from the principles of the present application can also be regarded as the protection scope of the present application.
Claims
1. A liftable wafer tank on a CMP apparatus, characterized by: The utility model provides a sink (1), frame (2), connecting rod (3) and mounting plate (4), the sink (1) is located frame (2), the frame (2) is equipped with for lifting sink (1) lifting assembly (5), connecting rod (3) is connected on frame (2), the mounting plate (4) is connected in the end of connecting rod (3), the mounting plate (4) is perpendicular to each other with connecting rod (3) setting, the mounting plate (4) can be located inside sink (1);Lifting assembly (5) includes lifting cylinder (51) and connecting seat (52), lifting cylinder (51) is connected on frame (2), the piston rod of lifting cylinder (51) is along the direction perpendicular to frame (2) setting, connecting seat (52) is connected on sink (1) bottom, the piston rod of lifting cylinder (51) is connected on connecting seat (52), the connecting seat (52) is equipped with the connecting hole that the piston rod of lifting cylinder (51) inserts on, the connecting seat (52) is equipped with for locking the piston rod of lifting cylinder (51) locking assembly (6);Locking assembly (6) includes cover (61), pull rod (62), sliding block (63), spring (64), connecting plate (65), handle (66) and locking rod (67), the connecting seat (52) is equipped with the installation groove on, the cover (61) is connected on the slot of installation groove, pull rod (62) passes through cover (61) and is set in the installation groove, the axis of pull rod (62) is arranged in line with the axis of installation groove, sliding block (63) is connected on pull rod (62) in the end in the installation groove, sliding block (63) is cuboid setting, the sidewall of sliding block (63) is slidably fitted to the inner wall of installation groove, spring (64) is set on the rod of pull rod (62) in the installation groove, one end of spring (64) is resisted on sliding block (63), the other end is resisted on cover (61), connecting plate (65) is connected on the end of pull rod (62) not entering the installation groove, connecting plate (65) is perpendicular to each other with pull rod (62) setting, handle (66) is connected on connecting plate (65), handle (66) is located on the surface of connecting plate (65) away from connecting seat (52), locking rod (67) is connected on connecting plate (65), locking rod (67) is along the direction perpendicular to connecting plate (65) setting, the through -hole for locking rod (67) passes through is equipped with on connecting seat (52), the locking hole for locking rod (67) inserts is equipped with on the piston rod of lifting cylinder (51).
2. The liftable wafer water tank on a CMP apparatus according to claim 1, wherein: The frame (2) is connected with support column (21), the support column (21) is along the direction perpendicular to frame (2) setting, the support column (21) is equipped with one on the both sides of lifting assembly (5) respectively, the support column (21) can resist on sink (1) bottom.