Microwave plasma water treatment reactor

Abstract

The utility model discloses a microwave plasma water treatment reactor and belongs to the field of water treatment equipment. A microwave plasma water treatment reactor comprises microwave plasma generators, a spiral water distribution disc, a reactor and a water pump, one microwave plasma generator is arranged over each water inlet point in the spiral water distribution disc, and air inlets of the microwave plasma generators are used for being connected with an air outlet of an air supply device. The water inlet end of the spiral water distribution disc is connected with the water outlet of the water pump, and the water outlet end of the spiral water distribution disc extends into the reactor. According to the utility model, the mass transfer effect of plasma system active particles in an aqueous solution is improved.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the field of water treatment equipment, especially relates to a microwave plasma water treatment reactor. BACKGROUND

[0002] Microwave plasma can produce high concentration of active particles and does not need electrode, has very extensive application potential in the fields such as biomedical, material processing and environmental protection.Compared with traditional biological method, catalytic oxidation method and other water treatment methods, microwave plasma has the advantages such as high treatment efficiency, no secondary pollution in the water treatment application process.Active particles of microwave plasma play a key role in the water treatment application process.Gaseous active particles produced by microwave plasma first enter aqueous solution and are converted into liquid active particles to play a direct role.Improving the mass transfer effect of active particles of plasma in aqueous solution is a key factor affecting the application of microwave plasma.

[0003] The microwave plasma generation module for water treatment, the reactor and the application thereof are disclosed in the prior art Chinese patent application with the authorization announcement No.CN 109761304 B and the authorization announcement date of 2024.07.02.The water inlet and the water outlet of the reactor are arranged at two ends of the reactor, the reactor has multiple microwave plasma generation modules, and the plasma generation modules are uniformly installed on the side wall of the water treatment reactor.The end of the outer electrode, the inner electrode and the gas guide layer of the plasma generation module is in the reactor and directly contacts with the water to be treated in the reactor.However, the contact area of the water to be treated in the reactor with the plasma generation module is limited, so the mass transfer effect of active particles of plasma in aqueous solution is poor.Therefore, it is urgent to design a microwave plasma water treatment reactor to improve the utilization efficiency of active particles of plasma. UTILITY MODEL CONTENT

[0004] The utility model aims at overcoming the defects of prior art and providing a microwave plasma water treatment reactor.

[0005] The utility model realizes the following technical scheme: a microwave plasma water treatment reactor, including microwave plasma generator, spiral water distribution disc, reactor and water pump, the upper of each water inlet point in spiral water distribution disc is provided with a microwave plasma generator, the air inlet of microwave plasma generator is used for connecting with the air outlet of gas supply device, the water inlet end of spiral water distribution disc is connected with the water outlet of water pump, and the water outlet end of spiral water distribution disc extends into the reactor.

[0006] Further, the microwave plasma generator comprises a microwave source, a circulator, a water load, a three-pin tuner, a waveguide-coaxial converter and a coaxial plasma excitation structure, which are sequentially connected, the water load is connected with the circulator, the coaxial plasma excitation structure is provided with an air inlet, and the air inlet of the coaxial plasma excitation structure is used to be connected with an air outlet of the air supply device.

[0007] Further, the water outlet of the water pump is connected with the water inlet end of the spiral water distribution disc through a water supply pipeline, and the water supply pipeline is provided with a flow meter and an adjusting valve.

[0008] Further, the water outlet of the reactor is arranged on the side wall thereof.

[0009] Further, the spiral water distribution disc comprises a plurality of annular water channels which are nested one by one, the annular water channel comprises an annular bottom plate, the two sides of the annular bottom plate are respectively extended upwards to form an inner wall and an outer wall, the top of the outer wall of the annular water channel located at the inner side of the two adjacent annular water channels is connected with the bottom of the inner wall of the annular water channel located at the outer side, the bottom of the inner wall of the annular water channel located at the innermost side is connected with the top end of a water outlet pipe, the outer wall of the annular water channel located at the outermost side and the inner walls of all the annular water channels are provided with water inlet points, the water inlet point on the outer wall of the annular water channel located at the outermost side is configured as the water inlet end of the spiral water distribution disc, and the bottom end of the water outlet pipe is configured as the water outlet end of the spiral water distribution disc.

[0010] Further, the positions of the two adjacent water inlet points in the spiral water distribution disc are opposite.

[0011] Further, the air supply device comprises an air source, the air source is connected with the air inlet of the microwave plasma generator through an air supply pipeline, and the air supply pipeline is provided with a mass flow controller.

[0012] Compared with the prior art, the utility model has the following advantages and beneficial effects:

[0013] (1) the utility model discloses a spiral water distribution disc is used to the water inlet, and the coaxial plasma excitation structure is installed in each layer flow passageway of spiral water distribution disc, makes the water to be handled and plasma contact fully, improves the mass transfer effect of active particle in the aqueous solution of plasma system, solves the problem that the active particle of plasma is poor in the mass transfer effect in the aqueous solution due to the limited contact area of plasma module and the water to be handled in the prior art;

[0014] (2) the utility model adds microwave plasma generator on the basis of water treatment reactor, and the efficiency of plasma water treatment is in the number of plasma source, and the microwave plasma generator is arranged in each layer water inlet point of spiral water distribution disc, so that the number of plasma source is increased, and the effect of reducing COD of sewage is good. Attached Figure Description

[0015] The accompanying drawings, which are included to provide a further understanding of the embodiments of the present invention and form part of this application, do not constitute a limitation thereof. In the drawings:

[0016] Figure 1 This is a schematic diagram of the structure of the microwave plasma generator in this utility model;

[0017] Figure 2 This is a top view schematic diagram of the spiral water distribution plate in this utility model;

[0018] Figure 3 This is a cross-sectional structural diagram of the spiral water distribution plate in this utility model;

[0019] Figure 4 This is a schematic diagram of the structure of the microwave plasma generator in this utility model;

[0020] Figure 5 This is a schematic diagram of the gas supply device in this utility model;

[0021] In the figure, 1—microwave plasma generator, 11—microwave source, 12—circulator, 13—three-pin tuner, 14—waveguide coaxial converter, 15—coaxial plasma excitation structure, 16—water load, 2—spiral water distribution plate, 21—outer annular water channel, 22—inner annular water channel, 23—outlet pipe, 3—reactor, 4—water pump, 5—regulating valve, 6—flow meter, 7—mass flow controller, 8—gas source. Detailed Implementation

[0022] The technical solution of the present invention will be further described below with reference to the accompanying drawings and specific embodiments.

[0023] The accompanying drawings are for illustrative purposes only and are schematic diagrams, not actual pictures. They should not be construed as limiting the invention. To better illustrate the embodiments of the invention, some parts in the drawings may be omitted, enlarged, or reduced, and do not represent the actual product dimensions. It is understandable to those skilled in the art that some well-known structures and their descriptions may be omitted in the drawings.

[0024] The same or similar reference numerals in the drawings of the embodiments of the present application correspond to the same or similar components; in the description of the present application, it is understood that if the terms "upper", "lower", "left", "right", "inner", "outer" and the like indicating the orientation or positional relationship are used, the orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, therefore the terms describing the positional relationship in the drawings are only used for exemplary illustration, and cannot be understood as a limitation on the present application, for those skilled in the art, the specific meaning of the above terms can be understood according to the specific circumstances.

[0025] In the description of the present application, unless otherwise explicitly specified and limited, if the term "connection" and the like indicating the connection relationship between components appears, the term should be broadly understood, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the communication inside two components or the interaction relationship between two components. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0026] As Figures 1 to 5 shown, the utility model discloses a microwave plasma water treatment reactor.

[0027] As Figure 1 shown, a microwave plasma water treatment reactor, including microwave plasma generator 1, spiral water distribution disc 2, reactor 3 and water pump 4, spiral water distribution disc 2 every water inlet point's just above all be provided with a microwave plasma generator 1, the air inlet of microwave plasma generator 1 is used to with the air outlet of gas supply device connects, the water inlet end of spiral water distribution disc 2 is connected with the water outlet of water pump 4, the water outlet end of spiral water distribution disc 2 stretches into reactor 3.

[0028] The number of microwave plasma generators 1 is the same as the number of water inlet points in the spiral water distribution disc 2, and each microwave plasma generator 1 corresponds to a water inlet point in the spiral water distribution disc 2.

[0029] In this embodiment, the water to be treated is introduced through the water inlet of the water pump 4, and the microwave plasma generator 1 is turned on to observe the plasma generated by the discharge of the microwave plasma generator 1, and then the microwave plasma generator 1 is adjusted to obtain stable microwave plasma. The water to be treated flows into the reactor 3 through the spiral water distributor 2 for water treatment, and finally the treated water is discharged through the water outlet on the reactor 3. Since a microwave plasma generator 1 is arranged above each water inlet point in the spiral water distributor 2, the water to be treated is in full contact with the plasma, improving the mass transfer effect of the plasma active particles in the aqueous solution.

[0030] In some embodiments of the present embodiment, as shown in Figure 2 and Figure 3 The spiral water distributor 2 includes a plurality of annular water channels nested in sequence, the annular water channels include an annular bottom plate, the two sides of the annular bottom plate extend upward to form an inner wall and an outer wall respectively, the top of the outer wall of the inner annular water channel in the two adjacent annular water channels is connected with the bottom of the inner wall of the outer annular water channel, the bottom of the inner wall of the innermost annular water channel is connected with the top end of a water outlet pipe 23, the outer wall of the outermost annular water channel and the inner wall of all annular water channels are provided with water inlet points, and the water inlet point on the outer wall of the outermost annular water channel is configured as the water inlet end of the spiral water distributor 2, and the bottom end of the water outlet pipe 23 is configured as the water outlet end of the spiral water distributor 2.

[0031] The water inlet points in the spiral water distributor 2 are water passing holes for the water to be treated to flow through.

[0032] In these embodiments, the plurality of annular water channels and the water outlet pipe 23 form a funnel-like structure, the water to be treated enters the spiral water distributor 2 through the water inlet point on the outer wall of the outermost annular water channel, then enters the second layer of annular water channel through the water inlet point on the inner wall of the outermost annular water channel, then enters the third layer of annular water channel through the water inlet point on the inner wall of the second layer of annular water channel, and so on. The water to be treated enters the innermost annular water channel, then enters the water outlet pipe 23 through the water inlet point on the inner wall of the innermost annular water channel 22, and finally enters the reactor 3 through the bottom end of the water outlet end.

[0033] In some embodiments of the present embodiment, the positions of the two adjacent water inlet points in the spiral water distributor 2 are opposite, thereby increasing the flow distance of the water to be treated in each layer of annular water channel, so that the water to be treated is in full contact with the plasma.

[0034] Figure 2 and Figure 3The spiral water distributor 2 has two layers of annular water channels and a water outlet pipe 23, from outside to inside, they are an outside annular water channel 21, an inside annular water channel 22 and the water outlet pipe 23. The outside wall of the outside annular water channel 21 is provided with a water inlet point, which is the water inlet end of the spiral water distributor 2, used for connecting with the water outlet of the water pump 4 through the water supply pipeline. The inner wall of the outside annular water channel 21 is provided with a water inlet point, which connects the outside annular water channel 21 and the inside annular water channel 22. The inner wall of the inside annular water channel 22 is provided with a water inlet point, which connects the inside annular water channel 22 and the water outlet pipe 23. After the water to be treated flows out of the water pump 4, it enters the outside annular water channel 21 through the water inlet point on the outside wall of the outside annular water channel 21, then enters the inside annular water channel 22 through the water inlet point on the inner wall of the outside annular water channel 21, and then enters the water outlet pipe 23 through the water inlet point on the inner wall of the inside annular water channel 22, and finally flows out through the water outlet end of the water outlet pipe 23. The water inlet point on the outside wall of the outside annular water channel 21 is located on the left side of the outside annular water channel 21, the water inlet point on the inner wall of the outside annular water channel 21 is located on the right side of the outside annular water channel 21, and the water inlet point on the inner wall of the inside annular water channel 22 is located on the left side of the inside annular water channel 22, so that the positions of adjacent water inlet points are opposite, thereby increasing the flow distance of the water to be treated in the annular water channel, and making the water to be treated more fully contact with the plasma.

[0035] In some embodiments of the present embodiment, the water outlet end of the spiral water distributor 2 extends into the bottom of the reactor 3, and there is a gap between the water outlet end of the spiral water distributor 2 and the bottom plate of the reactor 3 for the water to be treated to flow out. By extending the water outlet end of the spiral water distributor 2 into the bottom of the reactor 3, the residence time of the water to be treated in the reactor 3 can be increased, and the contact time between the microwave plasma and the water to be treated can be increased, thereby improving the water treatment effect.

[0036] In some embodiments of the present embodiment, as shown in Figure 4 The microwave plasma generator 1 includes a microwave source 11, a circulator 12, a water load 16, a three-pin tuner 13, a waveguide-coaxial converter 14 and a coaxial plasma excitation structure 15, which are connected in sequence. The water load 16 is connected to the circulator 12, and the coaxial plasma excitation structure 15 is provided with an air inlet, which is used for connecting with the air outlet of the air supply device. Specifically, the circulator 12 has three ports, which are respectively connected to the microwave source 11, the three-pin tuner 13 and the water load 16.

[0037] Specifically, the end of the coaxial plasma excitation structure 15 is opposite to the water inlet point in the spiral water distributor 2.

[0038] In some embodiments of the present embodiment, as shown in Figure 5As shown, the gas supply device comprises a gas source 8 connected with the gas inlet of the microwave plasma generator 1 through a gas supply pipeline, and a mass flow controller 7 is arranged on the gas supply pipeline. The gas source 8 is used to supply gas for the microwave plasma generator 1, and the mass flow controller 7 is used to control the gas supply amount of the gas source 8 to the microwave plasma generator 1.

[0039] The mass flow controller 7 can be a manual valve or an electric valve, etc.

[0040] The gas source 8 is a mixed gas of argon and oxygen.

[0041] In some embodiments of the embodiment, the outlet of the water pump 4 is connected with the water inlet end of the spiral water distributor 2 through a water supply pipeline, and a flow meter 6 and an adjusting valve 5 are arranged on the water supply pipeline.

[0042] The flow meter 6 is used to detect the flow rate of the water to be treated in the water supply pipeline, and the adjusting valve 5 is used to adjust the flow rate of the water to be treated in the water supply pipeline.

[0043] For example, when water treatment is performed, the water pump 4 and the microwave plasma generator 1 are first opened, and after stable microwave plasma is obtained, the water flow in the spiral water distributor 2 is adjusted by adjusting the adjusting valve 5 according to the detection result of the flow, so as to control the reaction time of the plasma treatment.

[0044] The adjusting valve 5 can be a manual valve or an electric valve, etc.

[0045] In some embodiments of the embodiment, the outlet of the reactor 3 is arranged on the side wall thereof. The higher the outlet on the side wall of the reactor 3, the longer the water to be treated stays in the reactor 3.

[0046] The above specific embodiments further specifically describe the purpose, technical scheme and beneficial effects of the utility model, and it should be understood that the above description is only for the specific embodiments of the utility model and is not used to limit the protection scope of the utility model. Any modification, equivalent replacement, improvement, etc. within the spirit and principle of the utility model should be included in the protection scope of the utility model.

Claims

1. A microwave plasma water treatment reactor characterized by, The microwave plasma generator, the spiral water distributor, the reactor and the water pump are connected.

2. A microwave plasma water treatment reactor according to claim 1, wherein, The microwave plasma generator comprises a microwave source, a circulator, a water load, a three-pin tuner, a waveguide-coaxial converter and a coaxial plasma excitation structure.

3. A microwave plasma water treatment reactor according to claim 1, wherein The water outlet of the water pump is connected with the water inlet end of the spiral water distributor through a water supply pipeline.

4. A microwave plasma water treatment reactor according to claim 1, wherein The water outlet of the reactor is arranged on the side wall of the reactor.

5. A microwave plasma water treatment reactor according to claim 1, wherein The spiral water distributor comprises a plurality of annular water channels which are nested one by one.

6. A microwave plasma water treatment reactor according to claim 5, wherein, The positions of the adjacent two water inlet points in the spiral water distributor are opposite.

7. A microwave plasma water treatment reactor according to claim 1, wherein The gas supply device comprises a gas source which is connected with the air inlet of the microwave plasma generator through a gas supply pipeline. The gas supply pipeline is provided with a mass flow controller.

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