Reaction tank

Abstract

The utility model relates to a reaction tank, comprising: a tank body provided with a mounting port and a liquid outlet; the first liquid inlet pipe is located in the tank body, at least one part of the first liquid inlet pipe penetrates through the mounting opening and extends out of the tank body, and the first liquid inlet pipe is in sealed connection with the mounting opening; the second liquid inlet pipe is arranged outside the tank body, and the second liquid inlet pipe is detachably connected with the end, extending out of the tank body, of the first liquid inlet pipe. According to the reaction tank, when the first liquid inlet pipe needs to be cleaned and dredged, the first liquid inlet pipe can be detached from the outside of the tank body, the tank body does not need to be completely opened or the first liquid inlet pipe does not need to be detached after entering the tank body, the detaching difficulty of the first liquid inlet pipe is reduced, and meanwhile the cleanliness of the environment in the tank and the working effect of a liquid medium in the tank are guaranteed.

Description

Technical Field

[0001] This application relates to the field of silicon wafer manufacturing and processing technology, and in particular to a reaction tank. Background Technology

[0002] The booming semiconductor industry and the rapid advancements in manufacturing technology mean that silicon wafers, as the fundamental material for chip manufacturing, need to undergo cleaning or etching reactions in reaction tanks. During these processes, debris and other reaction byproducts can easily clog the outlet holes of the liquid inlet pipes located within the reaction tank. This affects the uniformity and concentration of the liquid medium within the tank, thereby reducing silicon wafer production efficiency. Therefore, regular cleaning and unblocking of the liquid inlet pipes are necessary.

[0003] However, the current reaction tank has a complex structure, and the connection point between the liquid inlet pipe and the reaction tank is located inside the tank. The connection between the liquid inlet pipe and the tank is inconvenient and time-consuming, which affects the production efficiency of silicon wafers and poses safety risks and pollution hazards. Utility Model Content

[0004] This application discloses a reaction tank in which the connection node of the liquid inlet pipe is set outside the tank body, which enables easy separation of the liquid inlet pipe from the tank body outside the tank body, simplifies the cleaning and maintenance steps of the liquid inlet pipe, and improves the production efficiency of silicon wafers.

[0005] To achieve the above objectives, this application discloses a reaction tank, comprising: a tank body having an installation port and an outlet; a first inlet pipe located inside the tank body, at least a portion of the first inlet pipe extending out of the tank body through the installation port, and the first inlet pipe being sealed to the installation port; and a second inlet pipe located outside the tank body, the second inlet pipe being detachably connected to one end of the first inlet pipe extending out of the tank body.

[0006] In some embodiments, the reaction tank further includes: an extension portion extending from the installation port to the outside of the tank body; a swivel joint located outside the tank body, sleeved on the extension portion and detachably connected to the extension portion; the swivel joint being sleeved on the outside of the second inlet pipe, the portion of the second inlet pipe located inside the swivel joint being sleeved on the outside of the first inlet pipe, and the second inlet pipe abutting against the extension portion.

[0007] In some embodiments, the extension is provided with an external mounting thread on its exterior; the inner circumferential surface of the union is provided with an internal mounting thread, and the external mounting thread and the internal mounting thread are engaged for connection.

[0008] In some embodiments, the inner circumferential surface of the mounting port is provided with a first internal thread; the outer surface of the first liquid inlet pipe is provided with a first external thread, and the first liquid inlet pipe is connected to the mounting port through the first external thread and the first internal thread.

[0009] In some embodiments, the outer diameter of the first external thread is larger than the diameter of the first inlet pipe.

[0010] In some embodiments, the reaction tank further includes a sealing ring disposed on the outer surface of the first inlet pipe or the inner circumferential surface of the mounting port, the sealing ring being located between the first inlet pipe and the mounting port.

[0011] In some embodiments, there are multiple first inlet pipes, mounting ports, and second inlet pipes, and the first inlet pipes, mounting ports, and second inlet pipes are provided in a one-to-one correspondence.

[0012] In some embodiments, the reaction tank further includes a connecting pipe, which includes a plurality of connecting interfaces, each of which is detachably connected to a second inlet pipe.

[0013] In some embodiments, the surface of the first inlet pipe is provided with a plurality of outlet holes, and the center line of the outlet hole has an angle with the bottom wall of the tank, the angle being an acute angle.

[0014] In some embodiments, the reaction tank further includes: a flow equalization plate, which is fixedly disposed in the tank body, the flow equalization plate covers the first liquid inlet pipe, the first liquid inlet pipe is located between the bottom wall of the tank body and the flow equalization plate, and the first liquid inlet pipe extends along a first direction; the flow equalization plate is provided with a plurality of flow equalization holes, the flow equalization holes penetrate the flow equalization plate along a second direction, and the first direction intersects the second direction.

[0015] In some embodiments, the mounting port is disposed on the side wall of the tank, and along the second direction, the mounting port is located between the flow equalization plate and the bottom wall of the tank.

[0016] In some embodiments, the reaction tank further includes a support frame disposed on the inner wall of the tank body, the support frame being used to support the first liquid inlet pipe.

[0017] In some embodiments, the reaction tank further includes: a liquid outlet pipe communicating with the interior of the tank through a liquid outlet; and a circulation device communicating with the second liquid inlet pipe and the liquid outlet pipe for circulating the liquid medium inside the tank.

[0018] In some embodiments, the liquid outlet is disposed on the side wall of the tank and located between the flow equalization plate and the bottom wall of the tank; or the liquid outlet is disposed on the bottom wall of the tank; the liquid outlet is connected to the circulation device.

[0019] Compared with the prior art, the beneficial effects of this application are:

[0020] The reaction tank provided in this application embodiment can easily separate the first liquid inlet pipe from the tank body from the outside of the tank body. When cleaning and maintaining the reaction tank, the first liquid inlet pipe and the second liquid inlet pipe can be separated from the outside of the tank body, which makes it easy for operators to pull out the first liquid inlet pipe from the outside of the tank body without the need for operators to enter the tank body for disassembly. This reduces the difficulty of removing the first liquid inlet pipe, prevents damage and pollution that may be caused when entering the tank for disassembly, improves the efficiency of reaction tank cleaning and maintenance, reduces the downtime of the reaction tank, and thus improves the efficiency of silicon wafer cleaning and processing. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is one of the three-dimensional structural schematic diagrams of the reaction tank provided in the embodiments of this application;

[0023] Figure 2 This is a schematic diagram of the tank structure of the reaction vessel provided in the embodiments of this application;

[0024] Figure 3 A cross-sectional schematic diagram of the joint of the reaction tank provided in an embodiment of this application;

[0025] Figure 4 A three-dimensional structural schematic diagram of the first liquid inlet pipe of the reaction tank provided in an embodiment of this application;

[0026] Figure 5 This is a second three-dimensional structural schematic diagram of the reaction tank provided in the embodiments of this application;

[0027] Figure 6 for Figure 5 A cross-sectional view along the AA direction.

[0028] Explanation of reference numerals in the attached figures:

[0029] 100-Reaction tank; 1-Tank body; 11a-Mounting port; 111-Extension; 111a-External thread; 111b-Internal thread; 101-First internal thread; 12a-Outlet; 2-First inlet pipe; 21a-Outlet hole; 201-First external thread; 3-Positioning fitting; 4-Second inlet pipe; 5-Connecting pipe; 51a-Connecting interface; 6-Flow equalizer; 61a-Flow equalizer hole; 7-Support frame; 8-Outlet pipe; 9-Circulation equipment; X-First direction; Y-Second direction. Detailed Implementation

[0030] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0031] In this application, the terms "upper," "lower," "top," "bottom," "inner," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0032] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0033] Furthermore, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0034] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0035] With the booming development of the semiconductor industry, silicon wafers, as the basic material for chip manufacturing, have seen their size continuously increase. This continuous increase in silicon wafer size has not only improved the production capacity and efficiency of silicon wafers, but has also directly led to the expansion of the size of reaction tanks (such as wet etching tanks and cleaning tanks) used in the semiconductor manufacturing process. The increase in the size of the reaction tanks has also led to the lengthening of the liquid inlet pipes.

[0036] Given that debris, residue, and reaction products from the production process can easily clog the small holes in the circulation pipes, leading to uneven distribution and concentration fluctuations of the liquid medium, ultimately affecting the A-grade rate and production yield of the solar cells, regular cleaning and unblocking of the inlet pipe are necessary. Therefore, regular cleaning and maintenance of the first inlet pipe to ensure unobstructed flow of the liquid medium has become an important task in semiconductor manufacturing.

[0037] However, the current tank design presents numerous challenges for cleaning the inlet pipe. The inlet pipe is installed within the tank and its compact layout makes disassembly and assembly not only time-consuming and labor-intensive but also difficult to flexibly schedule within production plans. Furthermore, the increased length of the inlet pipe due to the enlargement of the reaction tank further complicates cleaning and unblocking the pipe.

[0038] Importantly, the entry of dismantling and assembly personnel into the tank not only increases personal safety risks, but may also introduce new sources of pollution due to careless operation, exacerbating the tank's pollution problem and impacting the production environment.

[0039] To solve the above problems, the inventors studied the existing connection method between the liquid inlet pipe and the tank body, improved the tank body design of the existing reaction tank, and designed a reaction tank in which the liquid inlet pipe can be disassembled and assembled outside the reaction tank, simplifying the disassembly and assembly process of the liquid inlet pipe.

[0040] Based on this, this application discloses a reaction tank that can solve the problem of difficult disassembly and assembly of the inlet pipe in traditional reaction tanks.

[0041] The technical solution of this application will be further described below with reference to the embodiments and accompanying drawings.

[0042] Please see Figure 1 and Figure 2 , Figure 1 This is one of the three-dimensional structural schematic diagrams of the reaction tank 100 provided in the embodiments of this application. Figure 2 This is a schematic diagram of the tank body 1 of the reaction tank 100 provided in an embodiment of this application. This application discloses a reaction tank 100, comprising: a tank body 1, the tank body 1 having an installation port 11a and a liquid outlet 12a; a first liquid inlet pipe 2, located inside the tank body 1, at least a portion of the first liquid inlet pipe 2 extending out of the tank body 1 through the installation port 11a, the first liquid inlet pipe 2 being sealed to the installation port 11a; and a second liquid inlet pipe 4, located outside the tank body 1, the second liquid inlet pipe 4 being detachably connected to one end of the first liquid inlet pipe 2 extending out of the tank body 1.

[0043] It is understood that the reaction tank 100 typically has a length direction, a width direction, and a height direction. The length direction is the direction in which the long side of the reaction tank 100 extends, and the width direction is the direction in which the short side of the reaction tank 100 extends. For ease of description, in this embodiment, the length direction or width direction of the reaction tank 100 is referred to as the first direction X, and the height direction of the reaction tank 100 is referred to as the second direction Y.

[0044] For example, the second direction Y can intersect the first direction X. In some examples, the second direction Y can be perpendicular or approximately perpendicular to the first direction X. Understandably, the second direction Y can be "approximately perpendicular" to the first direction X, that is, the angle between the second direction Y and the first direction X can be approximately 90°, such as 88°, 89°, 91°, or 92°, etc.

[0045] Tank 1 is the main body of reaction tank 100, used to contain the liquid medium that needs to undergo a chemical reaction with the silicon wafer or to physically process the silicon wafer. Optionally, the liquid medium can be a chemical substance, solution, suspension, etc.

[0046] The silicon wafer can undergo chemical cleaning or chemical processing reactions inside the reaction tank 100. For example, during silicon wafer processing, the liquid medium in the tank 1 can react with the silicon wafer to perform texturing; during silicon wafer cleaning, the liquid medium in the tank 1 reacts with residual substances (e.g., chemicals, additives, and other oxides) on the surface of the silicon wafer to remove the residual substances.

[0047] During the cleaning or processing of silicon wafers, a basket carrying the silicon wafers is placed inside the tank 1 and immersed in the liquid medium inside the tank 1. This allows the silicon wafers or residual substances on their surface to react chemically with the liquid medium, thereby processing or cleaning the silicon wafers. The tank 1 also provides a stable and reliable environment for the cleaning or processing of silicon wafers, preventing external environmental influences from affecting the chemical reactions occurring inside the tank 1, thus ensuring the stable progress of the silicon wafer reaction or cleaning process.

[0048] The tank 1 is provided with an installation port 11a and a liquid outlet 12a. The installation port 11a is used to install a first liquid inlet pipe 2. The liquid medium is transferred to the inside of the tank 1 through the first liquid inlet pipe 2 installed at the installation port 11a. The liquid medium inside the tank 1 is transferred to the outside of the tank 1 through the liquid outlet 12a, thereby realizing the circulation of the liquid medium from the inside of the tank 1 to the outside of the tank 1, and then back to the inside of the tank 1 after filtration or purification. Optionally, the installation port 11a or the liquid outlet 12a can be set on the side wall or the bottom wall of the tank 1. The position of the installation port 11a can be determined according to the specific implementation situation, and this embodiment does not limit it.

[0049] The first liquid inlet pipe 2 is installed on the side wall of the tank 1 through a sealed connection with the mounting hole. Liquid media outside the tank 1 are introduced into the tank 1 through the first liquid inlet pipe 2 to ensure a continuous supply of the required liquid media inside the tank 1. At least a portion of the first liquid inlet pipe 2 passes through the mounting port 11a and extends outside the tank 1, thereby communicating with the second liquid inlet pipe 4 outside the tank 1. The liquid media to be transferred can be transferred from the second liquid inlet pipe 4 outside the tank 1 to the first liquid inlet pipe 2, and then the first liquid inlet pipe 2 introduces the liquid media into the tank 1 for the cleaning or processing of silicon wafers.

[0050] Since at least a portion of the first inlet pipe 2 extends outside the tank body 1, operators can disassemble and install the first inlet pipe 2 from outside the tank body 1 during the maintenance and cleaning of the reaction tank 100. After disconnecting the connection between the first inlet pipe 2 and the second inlet pipe 4, the first inlet pipe 2 located inside the tank body 1 can be directly pulled out from the installation port 11a. Operators do not need to fully open the tank body 1 or enter the tank body 1 to disassemble the first inlet pipe 2, which simplifies the operation of cleaning, inspecting and replacing the first inlet pipe 2, reduces the difficulty of disassembling the first inlet pipe 2, reduces the maintenance cost and downtime of the reaction tank 100, improves the cleaning and maintenance efficiency of the reaction tank 100, and avoids internal contamination of the reaction tank 100 caused by operators entering the reaction tank 100 to disassemble the first inlet pipe 2.

[0051] The first liquid inlet pipe 2 is sealed to the mounting port 11a. This sealed connection ensures the airtightness of the internal environment of the tank 1, preventing external impurities and contaminants from entering the tank 1 and avoiding safety hazards caused by leakage of the liquid medium inside the tank 1. Simultaneously, the sealed connection between the first liquid inlet pipe 2 and the mounting port 11a ensures the stability of the internal environment of the tank 1, preventing fluctuations in the chemical reaction within the reaction tank 100 caused by external environmental factors, thereby improving the quality and efficiency of silicon wafer cleaning or processing. The sealed connection can be a threaded connection, a flange connection, or an interference fit with a sealing ring, etc., and this embodiment does not limit this to any particular type.

[0052] The first inlet pipe 2 and the second inlet pipe 4 are detachably connected. The second inlet pipe 4 can be directly detachably connected to the first inlet pipe 2, or detachably connected through other connectors.

[0053] The second inlet pipe 4 is located outside the tank 1. The second inlet pipe 4 can transfer the liquid medium located outside the tank 1 to the first inlet pipe 2, thereby allowing the liquid medium to enter the tank 1 and react chemically with the silicon wafer or residual substances on the silicon wafer. Because the second inlet pipe 4 and the first inlet pipe 2 are detachably connected, when the reaction tank 100 needs maintenance, cleaning, or component replacement, the second inlet pipe 4 can be disassembled from the first inlet pipe 2, allowing the first inlet pipe 2 to be pulled out through the mounting port 11a, achieving the purpose of removing the first inlet pipe 2 from the tank 1 for cleaning.

[0054] Optionally, both the first inlet pipe 2 and the second inlet pipe 4 can be made of stainless steel, polytetrafluoroethylene, special alloys, or composite materials, etc., and this embodiment does not limit this. The materials of the first inlet pipe 2 and the second inlet pipe 4 should have chemical stability and corrosion resistance to prevent the first inlet pipe 2 from reacting with the liquid medium in the reaction tank 100 and affecting the chemical properties of the liquid medium in the reaction tank 100, thereby ensuring the reliability of the chemical reaction in the reaction tank 100.

[0055] Optionally, other liquid medium processing procedures can be introduced between the first inlet pipe 2 and the second inlet pipe 4. For example, operations such as heating, cooling, filtering, and adding chemical reagents can be performed on the liquid medium between the first inlet pipe 2 and the second inlet pipe 4, and then the processed liquid medium can be transferred back to the tank 1 through the first inlet pipe 2.

[0056] Furthermore, by adjusting the number, layout, and size of the first liquid inlet pipe 2, such as increasing the number of the first liquid inlet pipe 2, distributing the first liquid inlet pipe 2 evenly within the tank 1, or increasing the diameter and length of the first liquid inlet pipe 2, it is helpful to make the liquid medium flow evenly within the tank 1, thereby improving the circulation efficiency of the liquid medium, reducing dead zones and stagnant areas in the liquid medium flow, and improving the reaction efficiency between the silicon wafer and the liquid medium and the quality of the silicon wafer.

[0057] Thus, the reaction tank 100 provided in this embodiment can achieve easy separation of the first liquid inlet pipe 2 from the tank body 1 outside the tank body 1. When cleaning and maintaining the reaction tank 100, the first liquid inlet pipe 2 and the second liquid inlet pipe 4 can be separated from the tank body 1 outside the tank body 1, which makes it convenient for operators to pull out the first liquid inlet pipe 2 from the outside of the tank body 1 without the need for operators to enter the tank body 1 for disassembly. This reduces the difficulty of removing the first liquid inlet pipe 2, prevents damage and contamination that may be caused when entering the interior of the reaction tank 100 for disassembly, improves the efficiency of cleaning and maintaining the reaction tank 100, reduces the downtime of the reaction tank 100, thereby improving the efficiency of silicon wafer cleaning and processing, and also improving the yield of silicon wafer production and processing.

[0058] Please see Figure 3 , Figure 3This is a cross-sectional view of the joint of the reaction tank 100 provided in an embodiment of this application. In some embodiments, the reaction tank 100 further includes: a tank body 1 having an extension 111 corresponding to the mounting port 11a; a flexible connector 3 located outside the tank body 1, sleeved on the extension 111 and detachably connected to the extension 111; the flexible connector 3 being sleeved on the outside of the second inlet pipe 4, the portion of the second inlet pipe 4 located inside the flexible connector 3 being sleeved on the outside of the first inlet pipe 2, and the second inlet pipe abutting against the extension.

[0059] The tank 1 is provided with an extension 111 corresponding to the mounting port 11a. The extension 111 is integrally formed with the tank 1 and is used to install and fix the live pipe joint 3.

[0060] The swivel joint 3 connects and links the first liquid inlet pipe 2 and the second liquid inlet pipe 4 located outside the tank body 1, making the assembly and disassembly of the first liquid inlet pipe 2 and the second liquid inlet pipe 4 flexible and removable. At the same time, the swivel joint 3 allows the first liquid inlet pipe 2 and the second liquid inlet pipe 4 to have a certain range of motion or adjustment space at the connection point.

[0061] The union fitting 3 is sleeved on and detachably connected to the extension 111, facilitating the separation of the first inlet pipe 2 and the second inlet pipe 4 by disassembling the union fitting 3 when disassembling the first inlet pipe 2. Optionally, the union fitting 3 and the extension 111 can be threaded together to ensure the sealing of the connection between the union fitting 3 and the extension 111 of the tank body 1, preventing leakage of liquid medium from the connection between the extension 111 and the union fitting 3.

[0062] Optionally, the union fitting 3 can be threaded or interference-fitted with the first inlet pipe 2 and / or the second inlet pipe 4; this embodiment does not limit this. Meanwhile, the union fitting 3 provides good sealing performance, preventing liquid medium from leaking from the connection between the first inlet pipe 2 and the second inlet pipe 4.

[0063] The swivel joint 3 is fitted over the outside of the second inlet pipe 4, and its interior mates with the second inlet pipe 4. At least a portion of the second inlet pipe 4 is fitted over the outside of the first inlet pipe 2, allowing the first inlet pipe 2 to be directly inserted into the second inlet pipe 4. The sealing and locking function provided by the swivel joint 3 ensures a secure connection between the second inlet pipe 4 and the first inlet pipe 2. When disassembly is required, simply loosen the locking device of the swivel joint 3 to separate the second inlet pipe 4 and the first inlet pipe 2.

[0064] Optionally, a seal may be provided on the contact surface between the second inlet pipe 4 and the tank 1 to prevent liquid medium from leaking from the contact point between the second inlet pipe 4 and the tank 1.

[0065] In some embodiments, the extension 111 is provided with an external mounting thread 111a on its outer side; the inner circumferential surface of the swivel joint 3 is provided with an internal mounting thread 111b, and the external mounting thread 111a and the internal mounting thread 111b are engaged and connected.

[0066] The extension 111 has an external mounting thread 111a on its exterior, and the inner circumferential surface of the swivel joint 3 has an internal mounting thread 111b corresponding to the external mounting thread 111a. This allows for a threaded connection between the extension 111 and the swivel joint 3, thus mounting the swivel joint 3 on the outer wall of the tank body 1. The threaded connection provides a tightening force, ensuring a secure connection between the swivel joint 3 and the extension 111. This provides support to the swivel joint 3 from the tank body 1, preventing it from shaking or falling off due to liquid flow or other external forces. Please refer to [link / reference]. Figure 2 and Figure 4 , Figure 4 This is a three-dimensional structural diagram of the first liquid inlet pipe 2 of the reaction tank 100 provided in an embodiment of this application. In some embodiments, the inner circumferential surface of the mounting port 11a is provided with a first internal thread 101; the outer surface of the first liquid inlet pipe 2 is provided with a first external thread 201, and the first liquid inlet pipe 2 is connected to the mounting port 11a through the first external thread 201 and the first internal thread 101.

[0067] The inner circumferential surface of the mounting port 11a is provided with a first internal thread 101, and the outer surface of the first liquid inlet pipe 2 is provided with a first external thread 201 corresponding to the first internal thread 101, thereby enabling a threaded connection between the first liquid inlet pipe 2 and the mounting port 11a. The threaded connection has a tightening force, which can ensure a firm connection between the first liquid inlet pipe 2 and the mounting port 11a, thereby allowing the tank body 1 to provide a certain support for the first liquid inlet pipe 2 and prevent the first liquid inlet pipe 2 from shaking or falling off inside the reaction tank 100 due to liquid flow or other external forces.

[0068] The mating of the first internal thread 101 and the first external thread 201 also prevents leakage of liquid medium at the connection between the mounting port 11a and the first inlet pipe 2. The mating connection of the first internal thread 101 and the first external thread 201 also makes installation and disassembly easier, and facilitates maintenance, cleaning and replacement of the first inlet pipe 2.

[0069] Please see Figure 4 In some embodiments, the outer diameter of the first external thread 201 is larger than the diameter of the first inlet pipe 2, thereby ensuring that the first inlet pipe 2 can be smoothly pulled out from the mounting port 11a to the outside of the tank body 1 without interfering with the first internal thread 101 on the mounting port 11a.

[0070] Meanwhile, the fact that the outer diameter of the first external thread 201 is larger than that of the first inlet pipe 2 directly increases the contact area between the first external thread 201 and the first internal thread 101, thereby improving the strength and stability of the threaded connection. By increasing the outer diameter of the first external thread 201, a wider sealing surface can be formed between the first external thread 201 and the first internal thread 101, which helps to prevent leakage of liquid medium at the connection between the first inlet pipe 2 and the mounting port 11a.

[0071] In some embodiments, the reaction tank 100 further includes a sealing ring disposed on the outer surface of the first liquid inlet pipe 2 or the inner circumferential surface of the mounting port 11a, with the sealing ring located between the first liquid inlet pipe 2 and the mounting port 11a.

[0072] The sealing ring can be embedded in the outer surface of the first inlet pipe 2, and the thickness of the sealing ring is sufficient to form a tight fit with the inner circumferential surface of the mounting port 11a. Alternatively, the sealing ring can also be embedded in the inner circumferential surface of the mounting port 11a, and the thickness of the sealing ring is sufficient to form a tight fit with the outer circumferential surface of the first inlet pipe 2.

[0073] When the first inlet pipe 2 is inserted into the mounting port 11a, the first inlet pipe 2 and the mounting port 11a will squeeze the sealing ring. The sealing ring will deform due to the compression. The sealing ring can fill the gap between the first inlet pipe 2 and the mounting port 11a by compression and deformation, thereby achieving a sealing effect.

[0074] Optionally, the sealing ring can be made of materials that can achieve a sealing effect, such as rubber, silicone, or polytetrafluoroethylene. This embodiment does not limit this.

[0075] The sealing ring prevents leakage of liquid media from the gap between the first inlet pipe 2 and the mounting port 11a. The sealing ring provides a tight contact surface, ensuring a tight seal at the connection between the first inlet pipe 2 and the mounting port 11a. The sealing ring also helps enhance the overall stability of the connection. Simultaneously, the sealing ring prevents loosening or leakage between the first inlet pipe 2 and the mounting port 11a due to factors such as vibration, pressure fluctuations, or temperature changes.

[0076] Please see Figure 5 , Figure 5 This is a second three-dimensional structural schematic diagram of the reaction tank 100 provided in an embodiment of this application. In some embodiments, there are multiple first inlet pipes 2, mounting ports 11a, and second inlet pipes 4, and the first inlet pipes 2, mounting ports 11a, and second inlet pipes 4 are arranged in a one-to-one correspondence.

[0077] Depending on the size of the tank 1 and the actual production and processing requirements, different numbers of first liquid inlet pipes 2 can be set to meet the cleaning or production processing needs of different scales. By setting multiple first liquid inlet pipes 2 in the tank 1, the liquid medium inside the reaction tank 100 can be circulated more effectively, making the flow of the liquid medium in each part of the reaction tank 100 more uniform, thereby improving the stability and effectiveness of the silicon wafer cleaning or production processing.

[0078] The mounting port 11a is set in a one-to-one correspondence with the second liquid inlet pipe 4 and the first liquid inlet pipe 2, so as to ensure that each first liquid inlet pipe 2 can be disconnected from the second connecting pipe 5 outside the tank body 1 and separated from the tank body 1 from the outside of the tank body 1, thereby realizing the efficient disassembly and assembly of multiple first liquid inlet pipes 2.

[0079] It is understandable that if each second inlet pipe 4 is connected to the first inlet pipe 2 through a swivel joint 3, then the number of swivel joints 3 will also be multiple.

[0080] Please see Figure 5 In some embodiments, the reaction tank 100 further includes a connecting pipe 5, which includes a plurality of connecting interfaces 51a, each connecting interface 51a being detachably connected to a second liquid inlet pipe 4.

[0081] The connecting pipe 5 is connected to the second inlet pipe 4 and the circulation device 9 that provides the liquid medium. The liquid medium in the connecting pipe 5 can be transferred into the tank 1 through the second inlet pipe 4. The connecting pipe 5 integrates multiple second inlet pipes 4 through multiple connecting interfaces 51a, so that multiple second inlet pipes 4 are connected to the same connecting pipe 5. By supplying liquid medium to one connecting pipe 5, it is possible to supply liquid medium to multiple second inlet pipes 4, thereby supplying liquid medium to multiple first inlet pipes 2 and improving the efficiency of the reaction tank 100 in receiving liquid medium.

[0082] The connecting pipe 5 integrates multiple second liquid inlet pipes 4 to avoid interference with other production and processing equipment when the second liquid inlet pipes 4 are directly connected to the circulation equipment 9, thus improving the operability of the system.

[0083] Furthermore, the connection interface 51a is detachably connected to the second liquid inlet pipe 4, so the second liquid inlet pipe 4 can be added, removed or replaced as needed.

[0084] Optionally, the connecting pipe 5 can be set as a bend or a straight pipe, depending on the actual production needs and the arrangement of the second liquid inlet pipe 4. This embodiment does not limit this.

[0085] Please see Figure 6 , Figure 6 for Figure 5A cross-sectional view along the AA direction. In some embodiments, the surface of the first inlet pipe 2 is provided with a plurality of outlet holes 21a, and the center line of the outlet hole 21a forms an angle with the bottom wall of the tank 1, the angle being an acute angle.

[0086] The centerline of the liquid outlet 21a forms an angle with the bottom wall of the tank 1. The angle is acute. The liquid outlet 21a faces the bottom wall of the tank 1, which can ensure that the liquid medium that needs to undergo chemical reaction is more evenly distributed in the tank 1.

[0087] For example, when the liquid medium is sprayed from the outlet hole 21a of the first inlet pipe 2 to the bottom wall of the tank 1, the liquid medium will cover the bottom and even the side wall of the tank 1 at a wider angle, thereby reducing the dead angle of the liquid medium flow, and can more effectively impact and agitate the tank 1, improving the uniformity and activity of the overall liquid medium tank liquid.

[0088] Importantly, the liquid outlet 21a is tilted towards the bottom wall of the tank 1, which can prevent the liquid medium that may be directly impacted by the liquid outlet 21a pointing directly upward or horizontally from damaging the silicon wafers in the tank 1, or damaging the texturing results on the silicon wafer surface.

[0089] When the liquid medium is ejected from the first inlet pipe 2 at a certain speed, the liquid medium will be transmitted along the injection direction. The injection direction of the outlet hole 21a toward the edge of the bottom wall of the tank 1 can make the liquid medium form a more complex flow pattern in the tank 1, increasing the mixing and exchange between the liquid medium in the reaction tank 100 and the liquid medium transported by the first inlet pipe 2.

[0090] Please see the return Figure 1 In some embodiments, the reaction tank 100 further includes: a flow equalization plate 6, which is fixedly disposed inside the tank body 1, the flow equalization plate 6 covers the first liquid inlet pipe 2, the first liquid inlet pipe 2 is located between the bottom wall of the tank body 1 and the flow equalization plate 6, and the first liquid inlet pipe 2 extends along the first direction X; the flow equalization plate 6 is provided with a plurality of flow equalization holes 61a, the flow equalization holes 61a penetrate the flow equalization plate 6 along the second direction Y, and the first direction X intersects the second direction Y.

[0091] The flow equalization plate 6 is set inside the tank body 1. The flow equalization plate 6 is located on the side of the first liquid inlet pipe 2 away from the bottom wall of the tank body 1. This helps to ensure that the liquid medium flowing out of the first liquid inlet pipe 2 is evenly distributed inside the tank body 1 after passing through the flow equalization holes 61a set in the flow equalization plate 6, thus avoiding excessively high or low local liquid medium concentration, which would affect the processing effect of silicon wafers.

[0092] Meanwhile, after the liquid medium passes through the flow equalization plate 6, the impact force of the liquid medium will be buffered and dispersed to a certain extent due to the presence of the flow equalization holes 61a, which helps to reduce the risk of silicon wafer damage or fragmentation caused by excessive impact force of the liquid medium.

[0093] Please see Figure 2 In some embodiments, the mounting port 11a is disposed on the side wall of the tank 1, and along the second direction Y, the mounting port 11a is located between the flow equalization plate 6 and the bottom wall of the tank 1.

[0094] The location of the mounting port 11a determines the initial flow direction of the liquid medium entering the tank 1. Setting the mounting port 11a between the flow equalization plate 6 and the bottom wall of the tank 1 ensures that after the liquid medium enters the tank 1 from the first inlet pipe 2, it first passes under the flow equalization plate 6, and then is evenly distributed to the upper area of ​​the tank 1 through the flow equalization holes 61a on the flow equalization plate 6, which helps to improve the uniformity of liquid medium distribution and mixing effect.

[0095] Because the mounting port 11a is located below the flow equalization plate 6, the liquid medium is somewhat restricted and guided when entering the tank 1, making it easier to form a uniform distribution when passing through the flow equalization hole 61a. In addition, when the liquid medium is ejected from the mounting port 11a, the impact force of the liquid medium is partially absorbed and dispersed by the bottom wall of the tank 1 and the flow equalization plate 6, further reducing the impact of the liquid medium on the silicon wafers inside the tank 1.

[0096] Setting the installation port 11a on the side wall of the tank 1 and positioning it along the second direction Y between the flow equalization plate 6 and the bottom wall of the tank 1 facilitates subsequent maintenance and cleaning of the reaction tank 100 and simplifies the installation and disassembly process of the first liquid inlet pipe 2.

[0097] like Figure 5 As shown in some embodiments, the reaction tank 100 further includes a support frame 7 disposed on the inner wall of the tank body 1, the support frame 7 being used to support the first liquid inlet pipe 2.

[0098] The support frame 7 is installed on the inner wall of the tank 1. The support frame 7 supports the first liquid inlet pipe 2 inside the tank 1, ensuring that the position of the first liquid inlet pipe 2 is stable inside the tank 1, preventing displacement or vibration caused by the flow of liquid medium or other external factors, thereby protecting the first liquid inlet pipe 2 from damage and maintaining the normal circulation of liquid medium inside the tank 1.

[0099] Optionally, the support frame 7 can be made of various materials and structural forms, such as a stainless steel bracket, a support component made of polytetrafluoroethylene or composite materials, etc. The support frame 7 can be customized according to specific needs to meet the usage requirements under different working conditions. This embodiment does not limit this.

[0100] Please see Figure 1 In some embodiments, the reaction tank 100 further includes: a liquid outlet pipe 8, which communicates with the interior of the tank body 1 through a liquid outlet 12a; and a circulation device 9, which is communicated with the second liquid inlet pipe 4 and the liquid outlet pipe 8, for circulating the liquid medium inside the tank body 1.

[0101] The outlet pipe 8 connects the internal and external circulation equipment 9 of the reaction tank 100. The outlet pipe 8 communicates with the interior of the tank 1 via the outlet port 12a. The outlet pipe 8 discharges the liquid medium from the reaction tank 100 into the tank 1, facilitating the flow and circulation of the liquid medium between the inside and outside of the reaction tank 100. The location and size of the outlet port 12a must be determined based on the specific structure of the reaction tank 100 and the reaction requirements to ensure smooth flow of the liquid medium out of the tank 1.

[0102] Optionally, a seal may be provided between the liquid outlet pipe 8 and the liquid outlet 12a to prevent the liquid medium from leaking between the liquid outlet pipe 8 and the liquid outlet 12a.

[0103] The circulation device 9 is a mechanism in the reaction tank 100 system that realizes the flow and circulation of the liquid medium. Optionally, the circulation device 9 can be a circulation pump, but this embodiment does not limit it.

[0104] In this way, the liquid medium in the tank 1 is extracted by the circulation device 9 and then filtered or purified before being reinjected into the tank 1 through the second inlet pipe 4 and the first inlet pipe 2, forming a continuous circulation of the liquid medium between the inside and outside of the tank 1.

[0105] During the cleaning or processing of silicon wafers, the circulation device 9 continuously extracts and re-injects the liquid medium from the tank 1, achieving uniform mixing of the liquid medium and sufficient contact between it and the silicon wafers. This improves the reaction efficiency between the liquid medium and the silicon wafers, as well as the quality of the silicon wafer cleaning or processing. Simultaneously, the circulating flow of the liquid medium helps control parameters such as temperature and concentration within the tank 1, ensuring that the cleaning or reaction processing of the silicon wafers proceeds under predetermined conditions.

[0106] Please see Figure 2 In some embodiments, the outlet 12a is disposed on the side wall of the tank 1 and close to the bottom wall of the tank 1; or the outlet 12a is disposed on the bottom wall of the tank 1.

[0107] Positioning the outlet 12a on the side wall near the bottom wall helps to more thoroughly drain the liquid medium from the tank 1, reducing dead zones for liquid medium flow at the bottom of the tank 1, thereby improving cleaning efficiency and the utilization rate of the liquid medium. For large or heavy tanks 1, positioning the outlet 12a on the side wall of the tank 1 facilitates the installation and maintenance of the reaction tank 100, and also facilitates connection with external pipes and equipment.

[0108] Providing a liquid outlet 12a on the bottom wall of tank 1 ensures that the liquid medium inside tank 1 is completely emptied. Optionally, the bottom of tank 1 can be designed with an appropriate inclination or flow guiding structure to guide the liquid medium to the liquid outlet 12a. This can achieve uniform discharge of the liquid medium, avoid local accumulation of liquid medium inside reaction tank 100, and prevent dead zones in the flow of liquid medium inside tank 1.

[0109] Thus, setting an outlet 12a on the bottom wall of tank 1 can simplify the overall structure of tank 1, reduce unnecessary pipes and connectors, and lower manufacturing costs and maintenance difficulty.

[0110] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A reaction tank, characterized in that, include: The tank body is provided with an installation port and a liquid outlet; A first liquid inlet pipe is located inside the tank body, and at least a portion of the first liquid inlet pipe extends out of the tank body through the mounting port, with a sealed connection between the first liquid inlet pipe and the mounting port. The second inlet pipe is located outside the tank body and is detachably connected to the end of the first inlet pipe that extends out of the tank body.

2. The reaction vessel according to claim 1, characterized in that, The reaction tank also includes: The mounting port extends outward from the groove body; A flexible fitting is located outside the groove body, sleeved on the extension and detachably connected to the extension; The swivel joint is sleeved on the outside of the second inlet pipe, and the portion of the second inlet pipe located inside the swivel joint is sleeved on the outside of the first inlet pipe. The second inlet pipe abuts against the extension portion.

3. The reaction vessel according to claim 2, characterized in that, The reaction tank also includes: The extension is provided with an external mounting thread. The inner circumferential surface of the fitting is provided with an internal thread for installation, and the external thread for installation engages with the internal thread for connection.

4. The reaction vessel according to claim 1, characterized in that, The inner circumferential surface of the mounting port is provided with a first internal thread; The first inlet pipe is provided with a first external thread, and the first inlet pipe is connected to the mounting port through the first external thread and the first internal thread.

5. The reaction vessel according to claim 1, characterized in that, There are multiple first liquid inlet pipes, multiple mounting ports and multiple second liquid inlet pipes, and the first liquid inlet pipes, the mounting ports and the second liquid inlet pipes are arranged in a one-to-one correspondence.

6. The reaction vessel according to claim 5, characterized in that, The reaction tank also includes: The connecting tube includes multiple connecting interfaces, each of which is detachably connected to a second inlet tube.

7. The reaction vessel according to any one of claims 1 to 6, characterized in that, The reaction tank also includes: A flow equalizer is fixedly installed inside the tank. The flow equalizer covers the first liquid inlet pipe. The first liquid inlet pipe is located between the bottom wall of the tank and the flow equalizer. The first liquid inlet pipe extends along a first direction. The flow equalization plate is provided with a plurality of flow equalization holes, which penetrate the flow equalization plate along a second direction, and the first direction intersects the second direction.

8. The reaction vessel according to any one of claims 1 to 6, characterized in that, The reaction tank also includes: A support frame is disposed on the inner wall of the tank, and the support frame is used to support the first liquid inlet pipe.

9. The reaction vessel according to claim 7, characterized in that, The reaction tank also includes: The liquid outlet pipe is connected to the interior of the tank through the liquid outlet; A circulation device, which is connected to the second inlet pipe and the outlet pipe, is used to circulate the internal liquid medium of the tank.

10. The reaction vessel according to claim 9, characterized in that, The liquid outlet is disposed on the side wall of the tank and located between the flow equalization plate and the bottom wall of the tank; or the liquid outlet is disposed on the bottom wall of the tank. The liquid outlet is connected to the circulation device.

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