Quartz boat support

Abstract

The utility model discloses a quartz boat support, which comprises a chassis; the plurality of side walls are arranged around the chassis, and the plurality of side walls comprise two first side walls which are oppositely arranged; the first supporting part is arranged on the first side wall; the second supporting part is arranged on the first side wall; wherein the first supporting part and the second supporting part are used for supporting the quartz boats, and the distance from the second supporting part to the chassis is greater than the distance from the first supporting part to the chassis, so that two adjacent quartz boats have a height difference. By means of the arrangement, the two adjacent small quartz boats are staggered in the vertical direction at intervals and are not completely attached to each other, gas can more easily move to act on silicon wafers of the quartz boats, the gas amount, time, temperature and the like needed by the same sheet resistance are reduced, the sheet resistance uniformity of the prepared silicon wafers is more excellent, and the production efficiency is improved. And the appearance of the BSG layer is more uniform, so that a battery made of the silicon wafer has better photoelectric conversion efficiency.

Description

Technical Field

[0001] This application relates to the field of battery equipment manufacturing, and more particularly to a quartz boat support. Background Technology

[0002] With the development of the photovoltaic industry and the continuous improvement of battery technology, production has evolved from the initial manual wafer insertion and low-volume production to today's fully automated and intelligent production, resulting in a significant increase in production efficiency. In the diffusion process, the output of a single tube has also increased to 3,000 wafers. At the same time, the size of silicon wafers is also constantly increasing, and the size of the equipment has become larger to meet the demand for production capacity.

[0003] However, while production capacity has increased, the size of the furnace tubes and quartz boats has also increased. This has led to problems such as increased sheet resistance uniformity, higher material consumption, and higher energy consumption, even though the single-tube capacity has increased. Currently, in the diffusion process, silicon wafers are loaded using small quartz boats placed in boat holders, with each boat holder typically holding multiple small quartz boats side by side. This results in poor sheet resistance uniformity of the silicon wafers within the quartz boats, increased gas consumption and process temperature during diffusion, and the small spacing between adjacent quartz boats hinders the free flow of gas, affecting the diffusion and oxidation effects. Utility Model Content

[0004] This application discloses a quartz boat holder in which quartz boats of different heights are not placed in complete contact, ensuring free flow of gas. This makes it easier for the gas to move and act on the silicon wafers on the quartz boats, greatly reducing the amount of gas, time, temperature, etc. required for the same sheet resistance. This ensures the free flow of gas and thus ensures the diffusion effect of the processed silicon wafers.

[0005] To achieve the above objectives, this application discloses a quartz boat support, comprising:

[0006] Chassis;

[0007] Multiple sidewalls are arranged around the chassis, including two opposing first sidewalls;

[0008] The first support part is disposed on the first side wall;

[0009] The second support is disposed on the first side wall;

[0010] The first support and the second support are used to support the quartz boat, and the distance between the second support and the chassis is greater than the distance between the first support and the chassis, so that there is a height difference between the two adjacent quartz boats.

[0011] As an optional implementation, the first sidewall includes a first support wall and a second support wall spaced apart in a horizontal direction, wherein the upper edge of the second support wall is higher than the upper edge of the first support wall, and the first support portion is disposed on the upper edge of the first support wall and the second support portion is disposed on the upper edge of the second support wall.

[0012] As an optional implementation, there are multiple first support portions and second support portions, with one second support portion disposed between every two adjacent first support portions.

[0013] As an optional implementation, the first support wall is provided with a plurality of first hollow grooves, and the plurality of first hollow grooves are arranged one-to-one with the first support part in the vertical direction. The first hollow grooves are located below the first support part. When the quartz boat is placed on the first support part, the first hollow grooves are opposite to the side wall of the quartz boat.

[0014] As an optional implementation, the second support wall is provided with a plurality of second hollow grooves, which are arranged one-to-one with the second support part in the vertical direction, and the second hollow grooves are located below the second support part. When the quartz boat is placed on the second support part, the second hollow grooves are opposite to the side wall of the quartz boat.

[0015] As an optional implementation, the second support wall is also provided with a plurality of third hollow grooves, which correspond one-to-one with the second hollow grooves along the vertical direction, and the third hollow grooves are located below the second hollow grooves. When the quartz boat is placed on the second support part, the third hollow grooves are opposite to the space below the bottom of the quartz boat.

[0016] As an optional implementation, the area of ​​the third hollow groove is larger than the areas of the first hollow groove and the second hollow groove.

[0017] As an optional implementation, the first sidewall is provided with a first mounting part and a second mounting part, wherein the two opposing first mounting parts on the two first sidewalls are used to mount a first carrier to support the bottom of the quartz boat on the first support part, and the two opposing second mounting parts on the two first sidewalls are used to mount a second carrier to support the bottom of the quartz boat on the second support part.

[0018] As an alternative implementation, the multiple sidewalls include two opposing second sidewalls, wherein the second sidewalls, the first sidewalls, and the chassis together form a receiving cavity for placing a quartz boat, and a boat support handle is provided on the side of the second sidewall away from the receiving cavity.

[0019] As an optional implementation, a fourth perforated groove is provided on the second side wall. The fourth perforated groove is located below the handle of the boat support and is used to increase the airflow at the bottom of the receiving cavity.

[0020] As an optional implementation, both the first and second sidewalls are coated with a heat-resistant layer.

[0021] Compared with the prior art, the beneficial effects of this application are as follows:

[0022] In this application, multiple sidewalls are first set around the chassis, and the multiple sidewalls include a first sidewall. Adjacent first support parts and second support parts are set on the first sidewall, and the first support parts and second support parts are set at different heights, so that the quartz boats supported by the first support parts and the second support parts are at different heights and are not completely attached to each other. This ensures the free flow of gas in the quartz boat, making it easier for the gas to move and act on the silicon wafers in the quartz boat. This greatly reduces the amount of gas, time, temperature, etc. required to achieve the same sheet resistance, and makes the sheet resistance of the processed silicon wafers more uniform, ensuring the diffusion and oxidation effects of the processed silicon wafers. Attached Figure Description

[0023] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 A schematic diagram of the structure of a quartz boat support (including a quartz boat) provided in an embodiment of this application;

[0025] Figure 2 A schematic diagram of the structure of a quartz boat support (excluding the quartz boat) provided for an embodiment of this application;

[0026] Figure 3 for Figure 1 Front view of a quartz boat support.

[0027] Explanation of reference numerals in the attached figures:

[0028] 100-quartz boat support;

[0029] 10-Chassis; 11-First sidewall; 110-First support wall; 111-Second support wall; 112-First support part; 113-Second support part; 114-First hollow groove; 115-Second hollow groove; 116-Third hollow groove; 117-First mounting part; 118-Second mounting part; 12-Second sidewall; 120-Boat support handle; 121-Fourth hollow groove;

[0030] 20 - Quartz boat; 21 - Quartz boat handle;

[0031] 30 - First load-bearing component; 31 - Second load-bearing component. Detailed Implementation

[0032] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0033] In this application, the terms "installation," "setup," "equipped with," "connection," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral structure; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium, or an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.

[0034] Furthermore, the terms "first," "second," etc., are primarily used to distinguish different devices, elements, or components (which may be the same or different in specific type and construction), and are not intended to indicate or imply the relative importance or quantity of the indicated devices, elements, or components. Unless otherwise stated, "a plurality of" means two or more.

[0035] Quartz boats are widely used in chemical, metallurgical, electrical, and scientific research fields, and are indispensable, especially in the production of semiconductor materials and devices. However, continuous upgrades have also brought some new problems. For example, tubular diffusion furnaces are becoming larger and taller, with thicker furnace tubes and larger quartz boats, significantly increasing single-tube capacity. However, this has also brought other issues. Currently, diffusion furnace tubes have a single-tube capacity of 2760 wafers, but the sheet resistance uniformity of the diffused silicon wafers, the consumption of auxiliary materials in the diffusion process, and energy consumption have all presented significant problems. Ultimately, the main issues are related to silicon wafer quality, sheet resistance uniformity during diffusion, and sheet resistance uniformity after oxidation, among others.

[0036] In view of this, this application provides a quartz boat support, comprising: a chassis; multiple sidewalls surrounding the chassis, including two opposing first sidewalls; a first support portion disposed on the first sidewall; and a second support portion disposed on the first sidewall. The first and second support portions support the quartz boats, and the distance between the second support portion and the chassis is greater than the distance between the first support portion and the chassis, so that adjacent quartz boats have a height difference. This ensures that the quartz boats supported by the first and second support portions are at different heights and not completely attached, guaranteeing free gas flow and making it easier for the gas to move and act on the silicon wafers of the quartz boats, greatly reducing the amount of gas, time, and temperature required to achieve the same sheet resistance.

[0037] The present application will be described in detail below through specific embodiments:

[0038] See Figure 1 and Figure 2 , Figure 1 This is a schematic diagram of the structure of a quartz boat support 100 (including a quartz boat 20) provided in an embodiment of this application. Figure 2 This is a schematic diagram of the structure of a quartz boat support 100 (excluding the quartz boat 20) provided in an embodiment of this application. The quartz boat support in this embodiment includes: a chassis 10; multiple sidewalls arranged around the chassis 10, including two opposing first sidewalls 11; a first support portion 112 disposed on the first sidewall 11; and a second support portion 113 disposed on the first sidewall 11. The first support portion 112 and the second support portion 113 are used to support the quartz boat 20, and the distance between the second support portion 113 and the chassis 10 is greater than the distance between the first support portion 112 and the chassis 10, so that adjacent quartz boats 20 have a height difference.

[0039] The quartz boat holder 100 disclosed in this application embodiment is first provided with multiple sidewalls surrounding the chassis 10, and the multiple sidewalls include a first sidewall 11. The first sidewall is provided with adjacent first support portion 112 and second support portion 113, and the first support portion 112 and the second support portion 113 are set at different heights, so that the quartz boat 20 supported by the first support portion 112 and the second support portion 113 are at different heights and are not placed completely attached to each other. This ensures the free flow of gas inside the quartz boat holder, making it easier for the gas to move and act on the silicon wafer of the quartz boat. This reduces the amount of gas, time, temperature, etc. required for the same sheet resistance, and makes the sheet resistance of the prepared quartz boat more uniform, as well as a more uniform BSG layer appearance, thereby making the battery made from the silicon wafer have better photoelectric conversion efficiency.

[0040] It's important to understand that the BSG layer typically refers to boron silicon glass. In photovoltaic cell manufacturing, especially in the production of N-type passivated contact cells, the BSG layer is formed on the silicon wafer surface through a boron diffusion process. The main function of the BSG layer is as part of the emitter, significantly impacting cell performance. Grade A efficiency generally refers to the efficiency level of a cell during manufacturing and testing, meeting or exceeding certain standards. Grade A represents higher efficiency and performance. This efficiency typically refers to the cell's ability to convert chemical energy into electrical energy, i.e., the cell's conversion efficiency.

[0041] Furthermore, such as Figure 1 and Figure 2 As shown, the first sidewall 11 includes a first support wall 110 and a second support wall 111 arranged in a horizontal direction. The upper edge of the second support wall 111 is higher than the upper edge of the first support wall 110. The first support portion 112 is disposed on the upper edge of the first support wall 110, and the second support portion 113 is disposed on the upper edge of the second support wall 111.

[0042] In this embodiment, the upper edge of the second support wall 111 is higher than the upper edge of the first support wall 110. The first support part 112 is disposed on the upper edge of the first support wall 110, and the second support part 113 is disposed on the upper edge of the second support wall 111, so that the second support part 113 and the first support part 112 have a height difference. A quartz boat 20 is placed on the second support part 113 and the first support part 112, ensuring that the quartz boat 20 on the second support part 113 and the first support part 112 also have a height difference, so that the gas flows more freely between the two adjacent quartz boats 20 and can more easily act on the silicon wafer of the quartz boat. The second support part 113 and the first support part 112 are both used to support the handle 21 of the quartz boat.

[0043] Further, see Figure 3 There are multiple first support parts 112 and second support parts 113, with one second support part 113 provided between every two adjacent first support parts 112. Through the first support parts 112 and second support parts 113 spaced apart on the first sidewall 11, a support network can be formed on the first sidewall 11, realizing point-to-point support of the first support parts 112 and second support parts 113 for the quartz boat 20 inside the quartz boat holder 100, while ensuring the structural strength of the first sidewall 11.

[0044] It is worth noting that the multiple first support parts 112 and multiple second support parts 113 refer to the fact that there are at least two first support parts 112 and at least two second support parts 113. That is, there can be five, six or ten first support parts 112 and second support parts 113. The number of first support parts 112 and second support parts 113 can be selected according to the actual situation. This embodiment does not make a specific limitation on this.

[0045] In some embodiments, combined with Figures 1 to 3 The first support wall 110 is provided with a plurality of first hollow grooves 114, which are arranged one-to-one with the first support portion 112 in the vertical direction. The first hollow grooves 114 are located below the first support portion 112. When the quartz boat 20 is placed on the first support portion 112, the first hollow grooves 114 are opposite to the sidewalls of the quartz boat 20 to increase the gas flow inside the quartz boat 20 on the first support portion 112. During the diffusion and oxidation process of silicon wafers, it is often necessary to maintain the silicon wafer in a good gas flow environment to ensure the effect and quality of diffusion and oxidation. The design of the first hollow grooves 114 makes it easier for gas to flow inside the quartz boat 20 placed on the first support portion 112, which helps to evenly distribute and remove waste gas, thereby improving diffusion efficiency.

[0046] Furthermore, such as Figure 2 As shown, the second support wall 111 is provided with multiple second hollowed-out grooves 115. These grooves 115 are vertically aligned with the second support portion 113, and are located below the second support portion 113. When the quartz boat 20 is placed on the second support portion 113, the second hollowed-out grooves 115 are opposite to the sidewalls of the quartz boat 20, increasing gas flow within the quartz boat 20 on the second support portion 113. Because the quartz boat 20 is supported on the second support portion 113, the design of the second hollowed-out grooves 115 facilitates gas flow within the quartz boat 20 on the second support portion 113, aiding in the uniform distribution and removal of exhaust gases, thereby improving the diffusion effect. Simultaneously, by improving gas flow, the second hollowed-out grooves 115 help achieve a more uniform temperature distribution, improving process stability and product quality.

[0047] Optionally, such as Figure 2As shown, the first support wall 110 is also provided with a plurality of third hollow grooves 116. These third hollow grooves 116 correspond vertically to the second hollow grooves 115, and are located below the second hollow grooves 115. When the quartz boat 20 is placed on the second support part 113, the third hollow grooves 116 are opposite to the space below the bottom of the quartz boat 20, thereby increasing gas flow at the bottom of the quartz boat 20 on the second support part 113. Inside the quartz boat 20, especially in the bottom area, gas is easily trapped due to gravity, leading to incomplete local reactions or adverse consequences. The presence of the third hollow grooves 116 effectively reduces this gas trapping phenomenon, making the gas distribution inside the quartz boat 20 more uniform. The setting of the third hollow grooves 116 directly increases the gas flow path at the bottom of the quartz boat 20, allowing the reacting gas to penetrate to the bottom of the quartz boat 20 more quickly and make full contact with the silicon wafer at the bottom. Meanwhile, by enhancing bottom gas flow, the third perforated groove 116 helps to achieve a more uniform temperature distribution and gas concentration distribution, thereby improving the sheet resistance uniformity of the silicon wafer produced by the process.

[0048] Optionally, the area of ​​the third perforated groove 116 is larger than the areas of the first perforated groove 114 and the second perforated groove 115. When the quartz boat 20 is placed in the quartz boat holder 100, the sidewall of the quartz boat 20 supported by the first support part 112 is in contact with the first perforated groove 114, the sidewall of the quartz boat 20 supported by the second support part 113 is in contact with the second perforated groove 115, and the third perforated groove 116 is directly opposite the area below the quartz boat 20 supported by the second support part 113. A larger perforated groove area means that more gas can circulate through these channels, increasing the gas exchange rate inside the quartz boat. Furthermore, it reduces the resistance to gas flow during circulation, making the gas flow smoother and facilitating a more uniform gas and temperature distribution. In addition, the increased size of the third perforated groove 116 helps to accelerate heat dissipation, reduce the temperature gradient inside the quartz boat 20, and reduce the risk of thermal stress concentration and potential thermal damage caused by localized high temperatures.

[0049] In this embodiment, the second support portion 113 and the first support portion 112 are at different heights and are arranged alternately, so that the quartz boats supported by the first support portion and the second support portion are at different heights and are not placed in complete contact. This makes it easier for gas to move and act on the silicon wafer on the quartz boat. Since the second support portion 113 is relatively high, there is a relatively large distance between the quartz boat 20 on the second support portion 113 and the chassis 10. Therefore, the area of ​​the second cutout groove 115 is set to be larger, and the area of ​​the third cutout groove 116 is larger than the area of ​​the first cutout groove 114 and the second cutout groove 115. This makes the gas flow inside and at the bottom of the quartz boat 20 on the second support portion 113 better, ensuring the quality of the silicon wafer processed by the process.

[0050] In some embodiments, such as Figure 3 As shown, the first sidewall 11 is provided with a first mounting part 117 and a second mounting part 118. The two opposing first mounting parts 117 on the two first sidewalls 11 are used to mount the first bearing member 30 to support the bottom of the quartz boat 20 on the first support part 112. The two opposing second mounting parts 118 on the two first sidewalls 11 are used to mount the second bearing member 31 to support the bottom of the quartz boat 20 on the second support part 113.

[0051] Thus, the two opposing first mounting portions 117 and second mounting portions 118 on the first sidewall 11 are used to mount the first bearing member 30 and the second bearing member 31, respectively. This dual-point support design can distribute the weight of the quartz boat 20 more evenly than single-point support, reducing instability or deformation caused by excessive force at a single point. The first bearing member 30 and the second bearing member 31 are used to position and support the quartz boat 20, effectively ensuring that the quartz boat 20 can be stably placed on the quartz boat support. Furthermore, this forms a stable support frame, ensuring that the quartz boat 20 remains stable and reducing damage caused by vibration or impact.

[0052] It is worth noting that the first support member 30 and the second support member 31 can be a support column, which makes it easier to position the quartz boat. The first support member 30 and the second support member 31 can also be other components with positioning and support functions. This embodiment does not limit this.

[0053] In some embodiments, such as Figure 2 As shown, the multiple sidewalls include two opposing second sidewalls 12. The second sidewalls 12, the first sidewalls 11, and the chassis 10 together form a receiving cavity for placing the quartz boat 20. A boat support handle 120 is provided on the side of the second sidewall 12 away from the receiving cavity. Thus, on the one hand, the combination of the second sidewall 12, the first sidewall 11, and the chassis 10 forms a complete enclosing structure, providing all-around support for the quartz boat 20 and enhancing the stability and safety of the entire structure. On the other hand, the boat support handle 120 on the second sidewall 12 provides a convenient way to handle and move the boat. Without direct contact with the quartz boat 20 itself, the entire quartz boat support 100, along with the quartz boat 20, can be easily moved using the handle, reducing operational difficulty and risk, improving work efficiency, and minimizing potential damage to the quartz boat 20 caused by frequent handling.

[0054] Furthermore, combined Figure 1 and Figure 2A fourth perforated groove 121 is provided on the second sidewall 12, located below the boat support handle 120. The fourth perforated groove 121 is used to increase gas flow at the bottom of the receiving cavity. Thus, the fourth perforated groove 121, acting as a gas flow channel, significantly improves ventilation at the bottom of the receiving cavity, facilitating more uniform and faster gas exchange, thereby improving process stability and efficiency. The fourth perforated groove 121 can also promote uniform heat distribution, reducing thermal stress or thermal deformation caused by excessive temperature gradients, and protecting the quartz boat 20 and silicon wafer from damage.

[0055] Furthermore, both the first sidewall 11 and the second sidewall 12 are coated with a heat-resistant layer, which effectively improves the high-temperature resistance of the quartz boat support 100. It should be noted that the heat-resistant layer generally refers to coatings or materials that maintain their physical and chemical stability under high-temperature environments. Such materials have wide applications in industry, especially in hot forging dies, high-temperature equipment, and other scenarios requiring high-temperature conditions. Materials with high temperature stability and good chemical inertness are typically chosen as the base material for the heat-resistant layer. For example, oxide ceramic materials (such as ZrO2 and Al2O3). This application does not limit the material and preparation process of the heat-resistant layer; it can be selected according to the actual situation.

[0056] In one embodiment of this application, two layers of quartz boats 20 are placed staggered vertically, with a first hollow groove 114, a second hollow groove 115, and a third hollow groove 116 at different positions and with different areas. In addition, a fourth hollow groove 121 is also provided on the side of the quartz boat support 100. This combination design ensures that the wafers of the upper and lower layers of quartz boats are not in close contact, making it easier for gas to act on the silicon wafer, greatly improving diffusion efficiency, ensuring uniformity, and significantly reducing time, auxiliary materials, and temperature. This results in a silicon wafer with a higher quality PN junction and a more uniform BSG layer, and provides more adequate protection in subsequent processes, thus improving efficiency and yield to a certain extent.

[0057] It's important to note that a PN junction is a special thin layer formed by combining P-type and N-type semiconductors. It forms the basis of many semiconductor devices such as diodes, transistors, and thyristors. Each type of semiconductor contains a large number of majority carriers: P-type semiconductors are rich in holes, while N-type semiconductors are rich in free electrons. At the interface of the PN junction, due to the difference in carrier concentration, electrons diffuse from the N-region to the P-region, and holes diffuse from the P-region to the N-region. This process leads to the accumulation of positive and negative charges at the boundaries of the N-region and P-region, respectively, forming a space charge region or depletion layer.

[0058] Optionally, a protective layer can be provided inside the cavity wall of the quartz boat holder 100. When the quartz boat 20 is placed in the cavity, it often tilts or collides with the side wall of the cavity. When a protective layer is provided inside the cavity wall, it can prevent damage caused by the collision between the quartz boat 20 and the cavity wall, effectively protecting the quartz boat 20.

[0059] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this utility model, and are not intended to limit it. Although the utility model has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this utility model.

Claims

1. A quartz boat support, characterized in that, include: Chassis; Multiple sidewalls are arranged around the chassis, and the multiple sidewalls include two opposing first sidewalls; A first support portion is disposed on the first side wall; The second support portion is disposed on the first side wall; The first support portion and the second support portion are used to support the quartz boat, and the distance from the second support portion to the chassis is greater than the distance from the first support portion to the chassis, so that there is a height difference between two adjacent quartz boats.

2. The quartz boat support according to claim 1, characterized in that, The first sidewall includes a first support wall and a second support wall arranged in a horizontal direction. The upper edge of the second support wall is higher than the upper edge of the first support wall. The first support portion is arranged at the upper edge of the first support wall, and the second support portion is arranged at the upper edge of the second support wall.

3. The quartz boat support according to claim 1, characterized in that, There are multiple first support parts and second support parts, with one second support part provided between every two adjacent first support parts.

4. The quartz boat support according to claim 2, characterized in that, The first support wall is provided with a plurality of first hollow grooves, and the plurality of first hollow grooves are arranged one-to-one with the first support part in the vertical direction. The first hollow grooves are located below the first support part. When the quartz boat is placed on the first support part, the first hollow grooves are opposite to the side wall of the quartz boat.

5. The quartz boat support according to claim 4, characterized in that, The second support wall is provided with a plurality of second hollow slots, and the plurality of second hollow slots are arranged one-to-one with the second support part along the vertical direction. The second hollow slots are located below the second support part. When the quartz boat is placed on the second support part, the second hollow slots are opposite to the side wall of the quartz boat.

6. The quartz boat support according to claim 5, characterized in that, The second support wall is also provided with a plurality of third hollow slots, which correspond one-to-one with the second hollow slots along the vertical direction, and the third hollow slots are located below the second hollow slots. When the quartz boat is placed on the second support part, the third hollow slots are opposite to the space below the bottom of the quartz boat.

7. The quartz boat support according to claim 6, characterized in that, The area of ​​the third hollow groove is larger than the areas of the first hollow groove and the second hollow groove.

8. The quartz boat support according to any one of claims 1-7, characterized in that, The first sidewall is provided with a first mounting part and a second mounting part, wherein the two opposite first mounting parts on the two first sidewalls are used to install a first bearing member to support the bottom of the quartz boat on the first support part, and the two opposite second mounting parts on the two first sidewalls are used to install a second bearing member to support the bottom of the quartz boat on the second support part.

9. The quartz boat support according to claim 1, characterized in that, The plurality of sidewalls includes two opposing second sidewalls, wherein the second sidewalls, the first sidewalls, and the chassis together form a receiving cavity for placing the quartz boat, and a boat support handle is provided on the side of the second sidewall away from the receiving cavity.

10. The quartz boat support according to claim 9, characterized in that, The second sidewall is provided with a fourth hollow groove, which is located below the handle of the boat support. The fourth hollow groove is used to increase the air flow at the bottom of the receiving cavity.

11. The quartz boat support according to claim 9, characterized in that, Both the first sidewall and the second sidewall are coated with a heat-resistant layer.

Images