Film coating mechanism for tempered glass mirror surface

Abstract

The utility model relates to the technical field of tempered glass coating, and discloses a coating mechanism for a tempered glass mirror surface, which comprises a coating chamber, a baffle plate A, a baffle plate B and a filling pipe, and cylindrical sputtering target materials and impellers which extend into the coating chamber and are arranged at intervals are arranged on a top plate of the coating chamber; the baffle A and the baffle B are respectively fixed in the coating chamber and are used for guiding airflow to flow to the cylindrical sputtering target material; the baffle A is located between the cylindrical sputtering target and the impeller, and the baffle B is located under the impeller; the filling pipes are positioned in the coating chamber, are positioned below the baffles A and are used for filling sputtering gas into the coating chamber; through rotation of the impeller, sputtering gas filled into the coating chamber in the filling pipe impacts the cylindrical sputtering target material along the outer side of the baffle B and the gap in the lower side of the baffle A, so that the contact opportunity between the sputtering gas and the surface of the target material is increased, and the sputtering effect is enhanced.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the technical field of toughened glass coating, specifically relates to a coating mechanism for toughened glass mirror surface. BACKGROUND

[0002] With the development of science and technology and the change of market demand, the application of toughened glass is more and more extensive, especially in the fields of building, automobile and household appliance. In order to improve the performance and appearance of toughened glass, it is necessary to carry out coating treatment on the surface of glass. However, the existing coating technology has some problems, such as uneven distribution of sputtering gas, low coating efficiency, etc.

[0003] The existing coating chamber only installs the filling pipe and the sputtering target material, and this design often leads to uneven distribution of sputtering gas, which will affect the quality and uniformity of the coating layer. The sputtering gas may be too concentrated in some areas and insufficiently distributed in other areas, resulting in uneven thickness of the coating layer. Due to the uneven distribution of sputtering gas, the sputtering efficiency is low. The sputtering gas flows poorly in the coating chamber, resulting in insufficient utilization of the surface of the sputtering target material and low efficiency of the sputtering process.

[0004] In view of this, we propose a coating mechanism for toughened glass mirror surface to solve the above problems. CONTENT OF THE UTILITY MODEL

[0005] The present application aims to solve the technical problems of uneven distribution of sputtering gas and low coating efficiency in the existing coating chamber design.

[0006] To achieve the above purpose, the utility model provides the following technical scheme:

[0007] A coating mechanism for toughened glass mirror surface, comprising a coating chamber, a baffle A and a baffle B, and a filling pipe, the coating chamber is installed on the base, the top plate of the coating chamber is provided with a cylindrical sputtering target material and an impeller which are arranged in the coating chamber and spaced apart; the baffle A and the baffle B are respectively fixed in the coating chamber and used for guiding the airflow to the cylindrical sputtering target material; the baffle A is located between the cylindrical sputtering target material and the impeller, and the baffle B is located directly below the impeller; the filling pipe is located in the coating chamber and below each baffle A, used for filling sputtering gas into the coating chamber;

[0008] Through the rotation of the impeller, the sputtering gas filled into the coating chamber from the filling pipe is impacted on the cylindrical sputtering target material along the outside of the baffle B and the gap below the baffle A, so as to increase the contact opportunity of the sputtering gas with the surface of the target material.

[0009] The designs of the baffle A and the baffle B are used to guide the airflow to the cylindrical sputtering target. The baffle A is located between the target and the impeller, and the baffle B is located directly below the impeller. Such a layout can make the sputtering gas flow along a specific path after entering the coating chamber, and the rotation of the impeller plays a stirring role, which makes the sputtering gas filled in the pipe flow in the coating chamber, increases the opportunity of the gas and the target surface, and enhances the sputtering effect.

[0010] As a preferred, two cylindrical sputtering targets are symmetrically arranged left and right, and the front and rear ends of the two cylindrical sputtering targets are fixed on two vertical panels, and the vertical panels are fixed on the bottom of the mounting plate A.

[0011] The symmetrical arrangement of the two cylindrical sputtering targets left and right helps to ensure uniform coverage of the substrate during sputtering, and reduces the problem of uneven film thickness caused by asymmetric position of the target.

[0012] As a preferred, a plurality of impellers are arranged longitudinally equidistantly and rotatably mounted on the mounting plate B, and a driving box is mounted on the mounting plate B, and a driving motor module for driving the rotation of the impeller is arranged in the driving box. The longitudinal equidistance arrangement of the impellers can ensure the uniform distribution of the sputtering gas in the entire coating chamber, and improve the uniformity of the coating.

[0013] As a preferred, positioning notches are arranged on the top plate of the coating chamber to limit the insertion and positioning of the mounting plate A and the mounting plate B, and the mounting plate A and the mounting plate B are fixed on the positioning notches by bolts. The design of the positioning notches ensures that the mounting plate A and the mounting plate B can be accurately positioned and fixed.

[0014] As a preferred, inlet and outlet openings are arranged on both sides of the coating chamber, two guide grooves are fixed on the outer side of the coating chamber and located on both sides of the inlet and outlet openings, two guide rods are inserted into the two guide grooves, the top of the two guide rods is fixedly connected with a limiting strip which is limited above the two guide grooves, the bottom of the limiting strip is provided with a sealing plate for sealing the inlet and outlet openings, a pushing block driven by a gas cylinder is fixedly arranged on the limiting strip, and the gas cylinder is fixed on a mounting block on one side of the top plate of the coating chamber.

[0015] The guide rod, the limiting strip and the sealing plate are driven downward or upward by the action of the gas cylinder to seal or open the inlet and outlet openings.

[0016] The automatic opening and closing of the sealing plate is realized by the action of the gas cylinder, which can be integrated with the automatic control system of the coating process to improve the production efficiency.

[0017] As a preferred, a roller conveying line is rotatably arranged on the inside bottom end of the coating chamber and located above the base. The roller conveying line can realize continuous and stable material conveying of the tempered glass, which is suitable for mass production.

[0018] Compared with the prior art, the technical effects and advantages of the utility model are:

[0019] The film coating mechanism for the toughened glass mirror realizes uniform distribution and effective impact of the sputtering gas on the target material through the left-right symmetric cylindrical sputtering target material and the rotating impeller, improves the sputtering efficiency and the film coating uniformity. The longitudinal equidistance arrangement of the impeller and the design of the driving box ensure the stable rotation of the impeller, facilitate maintenance and reduce interference, and meanwhile improve the production efficiency. The arrangement of the baffle A and the baffle B helps to guide the airflow to the target material, and through the rotation of the impeller, the contact opportunity of the gas and the target material surface is increased, thereby enhancing the sputtering effect.

[0020] The top plate of the film coating chamber is provided with a positioning notch, which ensures the accurate positioning and fixing of the mounting plate, reduces the installation error, improves the installation efficiency, and improves the stability and reliability of the system through bolt screwing fixing. At the same time, the installation and disassembly and maintenance of the impeller and the sputtering target material are facilitated.

[0021] The inlet and outlet port system of the film coating chamber automatically opens and closes the sealing plate through the action of the air cylinder, realizes automatic control and accurate control, improves the production efficiency and safety. The arrangement of the roller conveying line provides continuous and stable material conveying, is suitable for mass production, reduces the production cycle time, and improves the overall production efficiency.

[0022] The design of the film coating mechanism for the toughened glass mirror improves the uniformity of the sputtering gas distribution, reduces the problem of uneven film coating thickness caused by the asymmetric position of the target material, thereby improving the sputtering efficiency and the film coating uniformity. In addition, through the longitudinal equidistance arrangement of the impeller and the design of the driving box, the stable rotation of the impeller is ensured, maintenance and interference are facilitated, and the production efficiency is improved. The arrangement of the baffle A and the baffle B helps to guide the airflow to the target material, and through the rotation of the impeller, the contact opportunity of the gas and the target material surface is increased, thereby enhancing the sputtering effect. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 It is a structural schematic view of the utility model;

[0024] Figure 2 It is an exploded view of the utility model;

[0025] Figure 3 It is a sectional view of the utility model;

[0026] Figure 4 It is an installation structure schematic view of the cylindrical sputtering target material of the utility model;

[0027] Figure 5 It is an installation structure schematic view of the impeller of the utility model.

[0028] In the figure: 1, coating chamber; 2, base; 3, cylindrical sputtering target material; 4, impeller; 5, baffle A; 6, baffle B; 7, filling pipe; 8, vertical panel; 9, mounting plate A; 10, mounting plate B; 11, drive box; 12, positioning notch; 13, inlet and outlet; 14, guide groove; 15, guide rod; 16, limit strip; 17, sealing plate; 18, air cylinder; 19, mounting block; 20, roller conveying line; 21, push block. DETAILED DESCRIPTION

[0029] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the utility model.

[0030] The drawings will be described below Figures 1-5 The application will be further described in detail,

[0031] The embodiments of the application disclose a coating mechanism for toughened glass mirror, which comprises a coating chamber 1, baffles A 5 and B 6 and a filling pipe 7, the coating chamber 1 is installed on a base 2, and a cylindrical sputtering target material 3 and an impeller 4 are installed on the top plate of the coating chamber 1 and arranged at intervals and extend into the coating chamber 1; the cylindrical sputtering target material 3 is symmetrically arranged on the left and right, and the front and rear ends of the two cylindrical sputtering target materials 3 are fixed on two vertical panels 8, and the vertical panels 8 are fixed on the bottom of a mounting plate A 9. The left and right symmetrical arrangement of the two cylindrical sputtering target materials 3 helps to ensure uniform coverage of the substrate during sputtering, and reduces the problem of uneven coating thickness caused by the asymmetric position of the target material. The symmetrical target material helps to maintain the mechanical balance of the sputtering system, and reduces vibration and mechanical stress caused by imbalance. Moreover, the rotating impeller 4 helps to impact the cylindrical sputtering target materials 3 on both sides of the impeller 4 with sputtering gas.

[0032] The impeller 4 is longitudinally arranged at equal distances and is rotatably installed on a mounting plate B 10, a drive box 11 is installed on the mounting plate B 10, and a drive motor module for driving the rotation of the impeller 4 is arranged in the drive box 11. The longitudinal equal-distance arrangement of the impeller 4 can ensure uniform distribution of sputtering gas in the entire coating chamber 1, and improve the uniformity of coating. The arrangement of the drive motor module in the drive box 11 can provide stable power output, ensure uniform rotation of the impeller 4, and thus maintain stable flow of sputtering gas. The design of the drive box 11 makes it more convenient to maintain and replace the drive motor module. The drive box 11 isolates the drive motor from the sputtering process, reducing the interference of motor operation on the sputtering process.

[0033] The top plate of the coating chamber 1 is provided with positioning slots 12 for limiting and positioning the mounting plate A 9 and the mounting plate B 10, respectively. The mounting plate A 9 and the mounting plate B 10 are fixed on the positioning slots 12 by bolts. The design of the positioning slots 12 ensures that the mounting plate A 9 and the mounting plate B 10 can be accurately positioned and fixed, reducing errors caused by inaccurate installation. The positioning slots 12 enable the mounting plate to be quickly assembled in place, improving the installation efficiency of the equipment. The mounting plate is fixed by bolts, improving the stability and reliability of the entire system. Moreover, it is convenient for the installation and disassembly and maintenance of the impeller 4 and the cylindrical sputtering target 3.

[0034] The baffle A 5 and the baffle B 6 are fixed in the coating chamber 1 and are used to guide the airflow to the cylindrical sputtering target 3. The baffle A 5 is located between the cylindrical sputtering target 3 and the impeller 4, and the baffle B 6 is located directly below the impeller 4. The filling pipe 7 is located in the coating chamber 1 and below each baffle A 5, and is used to fill sputtering gas into the coating chamber 1.

[0035] Through the rotation of the impeller 4, the sputtering gas filled into the coating chamber 1 from the filling pipe 7 hits the cylindrical sputtering target 3 along the gap between the outside of the baffle B 6 and the underside of the baffle A 5, to increase the contact opportunity of the sputtering gas with the surface of the target.

[0036] The design of the baffle A 5 and the baffle B 6 is used to guide the airflow to the cylindrical sputtering target 3. The baffle A 5 is located between the target and the impeller 4, and the baffle B 6 is located directly below the impeller 4. Such a layout can make the sputtering gas flow along a specific path after entering the coating chamber 1, guided by the baffles. The rotation of the impeller 4 plays a stirring role, which makes the sputtering gas in the filling pipe 7 flow in the coating chamber 1, increasing the opportunity of the gas with the target surface. The rotation of the impeller 4 also helps the gas to be evenly distributed in the coating chamber 1. Under the action of the impeller 4, the sputtering gas hits the cylindrical sputtering target 3 through the gap between the outside of the baffle B 6 and the underside of the baffle A 5. This design can improve the collision efficiency of sputtering gas ions with the target, thereby enhancing the sputtering effect.

[0037] Through the rotation of the impeller 4 and the guidance of the baffles, the sputtering gas can more effectively hit the target, improving the sputtering efficiency and reducing the energy loss in the sputtering process. The combined design of the impeller 4 and the baffles helps to achieve uniform distribution of the sputtering gas, which is directly related to the improvement of the uniformity of the coating layer, avoiding uneven thickness or defects of the film layer. The design of this mechanism makes the sputtering process more controllable, and the rotation speed of the impeller 4, the position of the baffle and the flow of the sputtering gas can be accurately adjusted to adapt to different coating needs. By optimizing the sputtering process, production efficiency can be improved, production time can be reduced, and cost can be reduced.

[0038] The coating chamber 1 is provided with an inlet and outlet 13 on both sides, and two guide grooves 14 are fixed on the outer side of the coating chamber 1 and located on both sides of the inlet and outlet 13. Two guide rods 15 are inserted into the two guide grooves 14, and the top of the two guide rods 15 is fixedly connected with a limiting strip 16 which is limited above the two guide grooves 14. The bottom of the limiting strip 16 is provided with a sealing plate 17 which seals the inlet and outlet 13. A pushing block 21 driven by a gas cylinder 18 is fixedly arranged on the limiting strip 16, and the gas cylinder 18 is fixed on a mounting block 19 on one side of the top plate of the coating chamber 1.

[0039] The guide rod 15, the limiting strip 16 and the sealing plate 17 are driven by the gas cylinder 18 to move downward or upward, so that the sealing plate 17 seals or opens the inlet and outlet 13.

[0040] The automatic opening and closing of the sealing plate 17 by the action of the gas cylinder 18 can be integrated with the automatic control system of the coating process to improve the production efficiency. The power provided by the gas cylinder 18 can accurately control the position of the sealing plate 17 to ensure the sealing and safety of the inlet and outlet 13. The automatic operation of the sealing plate 17 reduces the workload of the operator and reduces the frequency of manual intervention and the possibility of errors. The design of the guide rod 15 and the limiting strip 16 ensures the stable movement of the sealing plate 17, avoiding equipment damage or personnel injury due to misoperation. The sealing action of the sealing plate 17 can ensure that the vacuum state in the coating chamber 1 is not destroyed, improving the quality of the sputtering coating process.

[0041] A roller conveying line 20 is rotatably arranged on the inner side of the bottom end of the coating chamber 1 and above the base 2. The roller conveying line 20 can realize continuous and stable material conveying of the tempered glass, which is suitable for mass production.

[0042] The coating mechanism for the mirror surface of the tempered glass realizes uniform distribution and effective impact of the sputtering gas on the target material through the left and right symmetrically arranged cylindrical sputtering target 3 and the rotating impeller 4, improving the sputtering efficiency and coating uniformity. The longitudinal equidistant arrangement of the impeller 4 and the design of the drive box 11 ensure the stable rotation of the impeller 4, which is convenient for maintenance and reduces interference, and improves the production efficiency. The arrangement of the baffle A5 and the baffle B6 helps to guide the airflow to the target material, and the rotation of the impeller 4 increases the contact opportunity of the gas and the surface of the target material, thereby enhancing the sputtering effect.

[0043] The top plate of the coating chamber 1 is provided with a positioning notch 12 to ensure accurate positioning and fixation of the mounting plate, reduce installation errors, improve installation efficiency, and improve the stability and reliability of the system through bolted fixation. At the same time, it is convenient for the installation and disassembly and maintenance of the impeller 4 and the sputtering target.

[0044] The system of the inlet and outlet of the coating chamber 1 13 automatically opens and closes the sealing plate 17 through the action of the air cylinder 18, realizes automatic and precise control, and improves production efficiency and safety. The setting of the roller conveying line 20 provides continuous and stable material conveying, is suitable for mass production, reduces production cycle time, and improves overall production efficiency.

[0045] Finally, it should be noted that: the above only for the preferred embodiments of the present application, and not for limiting the present application, although the foregoing embodiments of the present application are described in detail, for those skilled in the art, it still can be modified, or part of the technical features of the equivalent replacement, within the spirit and principles of the present application, any modification, equivalent replacement, improvement, etc., should be included within the scope of the present application.

Claims

1. A coating mechanism for tempering a glass mirror, characterized by, The utility model relates to a kind of coating chamber, including: Coating chamber (1), coating chamber (1) is installed on pedestal (2), and cylindrical sputtering target material (3) and impeller (4) are installed on the top plate of coating chamber (1) and are arranged at intervals and extend into coating chamber (1); Baffle A (5) and baffle B (6), baffle A (5) and baffle B (6) are fixed in coating chamber (1) respectively and are used to guide airflow to cylindrical sputtering target material (3);Baffle A (5) is located between cylindrical sputtering target material (3) and impeller (4), and baffle B (6) is located directly below impeller (4); Fill pipe (7), fill pipe (7) is located in coating chamber (1) and is located below each baffle A (5), for filling sputtering gas into coating chamber (1); By the rotation of impeller (4), sputtering gas filled into coating chamber (1) from fill pipe (7) impacts cylindrical sputtering target material (3) along the outside of baffle B (6) and the lower side gap of baffle A (5), to increase the contact opportunity of sputtering gas and target material surface.

2. The coating mechanism for tempering glass mirrors according to claim 1, characterized in that: Cylindrical sputtering target material (3) is symmetrically provided with two, and the front and back ends of the two cylindrical sputtering target materials (3) are fixed on two vertical panels (8), and the vertical panels (8) are fixed on the bottom of mounting plate A (9).

3. The coating mechanism for tempering a glass mirror according to claim 2, wherein: Impeller (4) is arranged at equal distances in the longitudinal direction and is rotatably mounted on mounting plate B (10), and driving box (11) is mounted on mounting plate B (10), and driving motor module for driving impeller (4) to rotate is arranged in driving box (11).

4. The coating mechanism for tempering a glass mirror according to claim 3, wherein: The top plate of coating chamber (1) is provided with positioning slot (12) for limiting insertion positioning of mounting plate A (9) and mounting plate B (10) respectively, and mounting plate A (9) and mounting plate B (10) are fixed on positioning slot (12) by bolts respectively.

5. The coating mechanism for tempering glass mirrors according to claim 1, characterized in that: Two guide grooves (14) are fixed on the outside of coating chamber (1) and are located on both sides of inlet and outlet (13), two guide rods (15) are inserted into two guide grooves (14), the top of two guide rods (15) is fixedly connected with limiting strip (16) which is limited above two guide grooves (14), the bottom of limiting strip (16) is provided with sealing plate (17) for sealing inlet and outlet (13), pushing block (21) driven by air cylinder (18) is fixed on limiting strip (16), and air cylinder (18) is fixed on mounting block (19) on one side of the top plate of coating chamber (1); The downward movement or upward movement of guide rod (15), limiting strip (16) and sealing plate (17) is driven by the action of air cylinder (18), so that sealing plate (17) seals or opens inlet and outlet (13).

6. The coating mechanism for tempering a glass mirror according to claim 1, wherein: Roller conveying line (20) located above pedestal (2) is rotatably arranged on the inside bottom end of coating chamber (1).

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