High anti-interference semiconductor gas mass flow controller

Abstract

The utility model discloses a high anti-interference type semiconductor gas mass flow controller which comprises a through-flow seat, the through-flow seat is communicated with a capillary tube sensor, the capillary tube sensor is electrically connected with a flow control valve, the flow control valve is communicated with the through-flow seat, and the capillary tube sensor is electrically connected with the flow control valve. The two ends of the through-flow seat are in threaded connection with the first communication guide block and the second communication guide block respectively, the second communication guide block is communicated with the air guide valve, the through-flow seat is provided with a through-flow hole, the through-flow hole is communicated with the first communication guide block and the second communication guide block respectively, and a first plug discharging structure and a second plug discharging structure are arranged in the through-flow seat. The utility model solves the problems that the existing capillary tube causes blockage of impurities in gas and is difficult to clean, and the impurities can cause blockage for a long time to interfere with the flow control of a semiconductor gas mass flow controller; the flow control of the semiconductor gas mass flow controller is not accurate; the system performance is reduced; and a series of possible equipment faults are caused.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of semiconductor process equipment, concretely to a high anti -jamming type semiconductor gas mass flow controller. BACKGROUND

[0002] Patent No. CN113900455B discloses a fluid flow control method, comprising: determining the flow interval where the target flow is located; when the flow difference value is less than the preset flow difference value, determining the control parameter corresponding to the target flow according to the flow difference value, and controlling the fluid flow based on the determined control parameter; wherein the determined control parameter continuously and monotonically changes from the preset control parameter corresponding to the previous flow interval to the preset control parameter corresponding to the flow interval where the target flow is located as the flow difference value increases. In this invention, the mass flow controller can determine the control parameter corresponding to the target flow according to the flow difference value when the target flow is close to the boundary value of the flow interval, and the determined control parameter continuously and monotonically changes between the two preset control parameters as the flow difference value increases, thereby avoiding sudden changes in the control parameter and eliminating the risk of flow overshoot, which helps to more accurately control the gas flow.

[0003] The existing semiconductor gas flow controller, i.e. gas mass flow controller (MFC), plays a crucial role in the semiconductor manufacturing industry. MFC has multiple application scenarios in semiconductor manufacturing, including gas flow control during cleaning and drying to ensure cleaning and drying effectiveness; gas mixing and purification, mixing multiple gases in a certain proportion and detecting impurity and pollutant content in the gas; in chemical vapor deposition (CVD) process, accurately controlling the flow of precursor gas to ensure the accuracy and stability of the reaction; and real-time monitoring of gas flow changes for leak detection and repair. However, the working principle of MFC flow controller is based on heat conduction effect. The thermal mass flow controller measures the heat carried away by the gas flow through the arrangement of a heater and two temperature sensors on the gas flow channel and a capillary tube, thereby calculating the mass flow and controlling the flow control valve output gas.

[0004] However, the existing capillary tube causes blockage of impurities in the gas, which is difficult to clean, and long-term impurities can cause blockage and interfere with the flow control of the semiconductor gas mass flow controller, resulting in inaccurate flow control of the semiconductor gas mass flow controller, system performance degradation, and a series of possible equipment failures. Meanwhile, blockage of the laminar flow element of the semiconductor gas mass flow controller can also cause inaccurate flow control of the semiconductor gas mass flow controller, thereby affecting the stability of the semiconductor production process and product quality.

[0005] There is a need for a high anti-interference semiconductor gas mass flow controller to solve the above problems. UTILITY MODEL CONTENT

[0006] The utility model discloses a high anti -interference type semiconductor gas mass flow controller to solve the problem of above -mentioned background art.

[0007] To realize above -mentioned purpose, the utility model provides the following technical scheme: a high anti -interference type semiconductor gas mass flow controller, including through -flow seat, the through -flow seat with capillary sensor intercommunication, capillary sensor with flow control valve electric connection, flow control valve with through -flow seat intercommunication, the both ends of through -flow seat are connected with first intercommunication guide block, second intercommunication guide block screw -thread connection, second intercommunication guide block with gas -guiding valve intercommunication,

[0008] The through -flow seat is provided with a through -flow hole, and the through -flow hole is communicated with the first intercommunication guide block and the second intercommunication guide block.

[0009] Further, the second intercommunication guide block is connected with one end of the connecting rod, the other end of the connecting rod is connected with one side of the laminar flow element, the through -flow hole at the upper end of the connecting rod is communicated with one end of the capillary guide pipe, the other side of the laminar flow element is in contact with one side of the snap ring, the outer ring of the snap ring is connected with the through -flow hole, and the other side of the snap ring is provided with the first plug structure.

[0010] Further, the first plug structure comprises a connecting ring, the connecting ring is connected with the inner wall of the through -flow hole, one side of the connecting ring is connected with one end of the short elastic piece, the other side of the connecting ring is provided with the second plug structure, the through -flow hole between the other side of the connecting ring and the second plug structure is communicated with the other end of the capillary guide pipe, the other end of the short elastic piece is connected with the first piston, the first piston is in sliding connection with the inner wall of the through -flow hole, a first flow guide groove is formed in the inner wall of the through -flow hole at the position of the outer ring of the first piston, and the first piston is in contact with the snap ring.

[0011] Further, the inner ring of the short elastic piece is provided with a short telescopic rod, and the short telescopic rod is provided with a first rectangular hollow groove.

[0012] Further, the second plug structure comprises a second piston, the second piston is in sliding connection with the inner wall of the through -flow hole, a second flow guide groove is formed in the inner wall of the through -flow hole at the position of the outer ring of the second piston, one side of the second piston away from the first plug structure is connected with one end of the long elastic piece, and the other end of the long elastic piece is connected with the first intercommunication guide block.

[0013] Further, the inner ring of the long elastic piece is provided with a long telescopic rod, and the long telescopic rod is provided with a second rectangular hollow groove.

[0014] Further, the through -flow hole is communicated with the collecting groove, and the communication position of the through -flow hole and the collecting groove is located at the lower end of the connecting rod.

[0015] Compared with the prior art, the high anti-interference semiconductor gas mass flow controller has the following advantages:

[0016] (1) The first and second plug structures are triggered to open the air guide valve to flush out the blockage of the capillary guide pipe and the blockage of the laminar element, so that the blockage falls into the lower end collecting groove, thereby avoiding the blockage of the capillary guide pipe, which causes inaccurate flow control of the semiconductor gas mass flow controller, system performance degradation, and a series of possible equipment failures, and the blockage of the laminar element, which causes inaccurate flow control of the semiconductor gas mass flow controller, thereby affecting the stability of the semiconductor production process and product quality.

[0017] (2) As the use time increases, the laminar element may lose its original function due to wear, blockage or contamination, causing inaccurate flow control. By rotating the second communication guide block threadedly connected with the through-flow seat, the second communication guide block causes the connecting rod to drive the laminar element to be removed, thereby facilitating the convenience of regularly removing the laminar element to ensure the accuracy of flow control. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 is a schematic diagram of the overall structure of the utility model;

[0019] Figure 2 is a schematic diagram of the cross-sectional structure of the utility model;

[0020] Figure 3 Figure 2 is an enlarged view of the middle A;

[0021] Figure 4 is a schematic diagram of the cross-sectional structure of the utility model when the air guide valve is open;

[0022] Figure 5 is a schematic diagram of the structure of the first plug structure in the utility model;

[0023] Figure 6 is a schematic diagram of the structure of the second plug structure in the utility model.

[0024] In the figure: 1 - capillary sensor, 11 - capillary guide pipe, 2 - flow control valve, 3 - through-flow seat, 31 - through-flow hole, 32 - first flow guide groove, 33 - second flow guide groove, 41 - first plug structure, 411 - first piston, 412 - short telescopic rod, 413 - connecting ring, 414 - short elastic element, 42 - second plug structure, 421 - second piston, 422 - long elastic element, 423 - long telescopic rod, 5 - first communication guide block, 6 - second communication guide block, 61 - connecting rod, 62 - clasp ring, 7 - laminar element, 8 - collecting groove. DETAILED DESCRIPTION

[0025] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the scope of protection of the utility model.

[0026] Please refer to Figures 1-5 The utility model provides a kind of technical scheme: a kind of high anti-interference type semiconductor gas mass flow controller, including through-flow seat 3, through-flow seat 3 with capillary tube sensor 1 intercommunication, capillary tube sensor 1 is electrically connected with flow control valve 2, flow control valve 2 is communicated with through-flow seat 3, and the both ends of through-flow seat 3 are respectively connected with first intercommunication guide block 5, second intercommunication guide block 6 screw thread connection, second intercommunication guide block 6 is communicated with air guide valve, through-flow seat 3 is equipped with first plug structure 41 and second plug structure 42, and first plug structure 41 and second plug structure 42 are triggered by air guide valve opening, and plug of capillary guide pipe 11 and plug of laminar element 7 are flushed out by reverse air intake, to fall into lower end collecting groove 8, to avoid the blockage of capillary guide pipe 11 cause semiconductor gas mass flow controller flow control inaccuracy, system performance decline and cause a series of possible equipment failure and laminar element 7 blockage cause semiconductor gas mass flow controller flow control inaccuracy, to further influence the stability of semiconductor production process and product quality.

[0027] Second intercommunication guide block 6 is connected with one end of connecting rod 61, and the other end of connecting rod 61 is connected with one side of laminar element 7, and the through-flow hole 31 in the upper end of connecting rod 61 is communicated with one end of capillary guide pipe 11, and the other side of laminar element 7 is in contact with one side of snap ring 62, and the outer ring of snap ring 62 is connected with through-flow hole 31, and the other side of snap ring 62 is provided with first plug structure 41, as time goes on, laminar element 7 can lose its original function due to wear, blockage or pollution, leading to inaccurate flow control, by rotating second intercommunication guide block 6 screw thread connection with through-flow seat 3, second intercommunication guide block 6 causes connecting rod 61 to drive laminar element 7 to be taken out, to facilitate the convenience of taking out laminar element 7 regularly to ensure the accuracy of flow control.

[0028] The first row of plug structure 41 includes a connecting ring 413 connected with the inner wall of the through-flow hole 31, one side of the connecting ring 413 is connected with one end of the short elastic member 414, the other side of the connecting ring 413 is provided with the second row of plug structure 42, the through-flow hole 31 between the other side of the connecting ring 413 and the second row of plug structure 42 is in communication with the other end of the capillary guide pipe 11, the other end of the short elastic member 414 is connected with the first piston 411, the first piston 411 is in sliding connection with the inner wall of the through-flow hole 31, the inner wall of the through-flow hole 31 at the position of the outer circle of the first piston 411 is provided with the first flow guide groove 32, the first piston 411 is in contact with the clasp ring 62, when the air guide valve is opened to cause no pressure in the through-flow hole 31, the first piston 411 is located in the first flow guide groove 32, so that the short elastic member 414 pushes the first piston 411 to slide into the through-flow hole 31, and the gas between the first piston 411 and the laminar flow element 7 is pushed on the laminar flow element 7 by the sliding of the first piston 411, so that the blockage on the laminar flow element 7 is washed down into the collection groove 8, avoiding the blockage of the laminar flow element 7 to cause inaccurate flow control of the semiconductor gas mass flow controller, and further affecting the stability of the semiconductor production process and the product quality.

[0029] The inner circle of the short elastic member 414 is provided with a short telescopic rod 412, the short telescopic rod 412 is provided with a first rectangular hollow groove, and the stability of the short elastic member 414 can be ensured through the short telescopic rod 412, so that the short elastic member 414 does not drive the first piston 411 to shake, causing unstable phenomenon.

[0030] The second row of plug structure 42 includes a second piston 421 in sliding connection with the inner wall of the through-flow hole 31, the inner wall of the through-flow hole 31 at the outer circle of the second piston 421 is provided with a second flow guide groove 33, one side of the second piston 421 away from the first row of plug structure 41 is connected with one end of a long elastic member 422, the other end of the long elastic member 422 is connected with the first communication guide block 5, the inner circle of the long elastic member 422 is provided with a long telescopic rod 423, the long telescopic rod 423 is provided with a second rectangular hollow groove, when the air guide valve is opened to cause no pressure in the through-flow hole 31, the second piston 421 is located in the second flow guide groove 33, so that the long elastic member 422 pushes the second piston 421 to slide into the through-flow hole 31, and the gas between the second piston 421 and the capillary guide pipe 11 is pushed into the capillary guide pipe 11 by the sliding of the second piston 421, so that the blockage in the capillary guide pipe 11 is washed down into the collection groove 8, avoiding the blockage of the capillary guide pipe 11 to cause inaccurate flow control of the semiconductor gas mass flow controller, system performance degradation and a series of possible equipment failures.

[0031] When the air valve is opened, due to the short elastic member 414 being shorter and the long elastic member 422 being longer, the short elastic member 414 preferentially pushes the first piston 411 a distance to flush the gas on the laminar flow element 7, causing the blockage on the laminar flow element 7 to fall into the collection groove 8, and then the long elastic member 422 subsequently pushes a longer distance than the short elastic member, causing the second piston 421 to slide to push more gas into the capillary guide pipe 11, avoiding the blockage of the capillary guide pipe 11, and the two are not affected.

[0032] It is obvious for those skilled in the art that the present application is not limited to the details of the above exemplary embodiments, but can be implemented in other concrete forms without departing from the spirit or essential characteristics of the present application. Therefore, the embodiments should be regarded as exemplary and non-limiting, and the scope of the present application is defined by the appended claims rather than the above description, and therefore all changes falling within the meaning and scope of the equivalent elements of the claims are intended to be embraced in the present application. Any reference signs in the claims should not be regarded as limiting the claims involved.

Claims

1. A high anti-interference type semiconductor gas mass flow controller comprising a through-flow seat (3), characterized in that: The through-flow seat (3) is in communication with the capillary sensor (1), the capillary sensor (1) is electrically connected with the flow control valve (2), the flow control valve (2) is in communication with the through-flow seat (3), the through-flow seat (3) is threadedly connected with the first communication guide block (5) and the second communication guide block (6) at two ends respectively, and the second communication guide block (6) is in communication with the air guide valve. The through-flow seat (3) is provided with a through-flow hole (31), and the through-flow hole (31) is in communication with the first communication guide block (5) and the second communication guide block (6) respectively.

2. The high anti-interference type semiconductor gas mass flow controller according to claim 1, characterized in that: The second communication guide block (6) is connected with one end of a connecting rod (61), the other end of the connecting rod (61) is connected with one side of a laminar flow element (7), a through-flow hole (31) at the upper end of the connecting rod (61) is in communication with one end of a capillary guide pipe (11), the other side of the laminar flow element (7) is in contact with one side of a clamping ring (62), the outer ring of the clamping ring (62) is connected with the through-flow hole (31), and the other side of the clamping ring (62) is provided with a first plug structure (41).

3. The high anti-interference type semiconductor gas mass flow controller according to claim 2, characterized in that: The first plug structure (41) comprises a connecting ring (413), the connecting ring (413) is connected with the inner wall of the through-flow hole (31), one side of the connecting ring (413) is connected with one end of a short elastic piece (414), the other side of the connecting ring (413) is provided with a second plug structure (42), the through-flow hole (31) between the other side of the connecting ring (413) and the second plug structure (42) is in communication with the other end of the capillary guide pipe (11), the other end of the short elastic piece (414) is connected with a first piston (411), the first piston (411) is in sliding connection with the inner wall of the through-flow hole (31), the inner wall of the through-flow hole (31) at the position of the outer ring of the first piston (411) is provided with a first flow guide groove (32), and the first piston (411) is in contact with the clamping ring (62).

4. The high anti-interference type semiconductor gas mass flow controller according to claim 3, characterized in that: The inner ring of the short elastic piece (414) is provided with a short telescopic rod (412), and the short telescopic rod (412) is provided with a first rectangular hollow groove.

5. The high anti-interference type semiconductor gas mass flow controller according to claim 3, characterized in that: The second plug structure (42) comprises a second piston (421), the second piston (421) is in sliding connection with the inner wall of the through-flow hole (31), the inner wall of the through-flow hole (31) at the outer ring of the second piston (421) is provided with a second flow guide groove (33), one side of the second piston (421) away from the first plug structure (41) is connected with one end of a long elastic piece (422), and the other end of the long elastic piece (422) is connected with the first communication guide block (5).

6. The high anti-interference type semiconductor gas mass flow controller according to claim 5, characterized in that: The inner ring of the long elastic piece (422) is provided with a long telescopic rod (423), and the long telescopic rod (423) is provided with a second rectangular hollow groove.

7. The high anti-interference type semiconductor gas mass flow controller according to claim 1, characterized in that: The through-flow hole (31) is in communication with the collecting groove (8), and the communication position of the through-flow hole (31) with the collecting groove (8) is located at the lower end of the connecting rod (61).

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