Particulate matter removing jig and semiconductor manufacturing equipment

Abstract

The utility model provides a particulate matter removing jig and semiconductor manufacturing equipment. The particulate matter removing jig comprises a base, a moving assembly, a dropper and a horizontal adjusting assembly. The moving assembly and the horizontal adjusting assembly are both arranged on the base. The moving assembly comprises two sections of moving arms and a limiting device; the two sections of moving arms at least can move in the direction perpendicular to the base; one end of the second-section moving arm is connected with the dropper, and the second-section moving arm is used for driving the dropper to move to the position above particles on the mask protective film; a limiting device is arranged at the other end of the second-section moving arm and used for limiting displacement of the second-section moving arm in the direction perpendicular to the base. The horizontal adjusting assembly is used for bearing the mask and adjusting the levelness of the mask after the chemical liquid drops on the particulate matter, so that the chemical liquid rolls to the edge. By means of the particulate matter removing jig, the problem that in the prior art, the height of the dropper, the using amount of the chemical liquid drops and the rolling speed of the chemical liquid drops cannot be controlled can be solved.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor manufacturing, and in particular to a particulate matter removal fixture and semiconductor manufacturing equipment. Background Technology

[0002] To ensure that the mask can be used properly, a protective film is usually applied to the molded mask to prevent dust from falling into the graphic area of ​​the mask.

[0003] Sometimes, due to environmental or other reasons, large, visible particles can form on the protective film of a mask that has already been applied. Some of these particles can be removed using a nitrogen gun, while others stick to the protective film and cannot be blown off. Furthermore, some protective films are too thin and sensitive to external forces, making them prone to deformation and unsuitable for nitrogen gun removal.

[0004] Therefore, the existing solution usually involves the operator manually taking a clean cotton swab / dropper, dipping it in isopropanol and dripping it onto the particulate matter to dissolve the particulate matter or reduce the adhesion between the particulate matter and the protective film. Then, the mask is tilted, and the particulate matter along with the isopropanol solution rolls down to the edge of the mask, where it is then absorbed by a clean cotton swab.

[0005] The existing solution has the following problems:

[0006] 1. When applying isopropyl alcohol, the cotton swab / dropper needs to be close to the protective film, which carries the risk of puncturing the protective film;

[0007] 2. When manually dripping isopropanol, it is difficult to control the amount dripped, and it is easy to drip too much, which may cause it to overflow into the graphic area.

[0008] 3. When manually tilting the mask, it is not easy to control the rolling speed of isopropyl alcohol, which is prone to rolling onto the mask surface.

[0009] Therefore, how to control the amount and rolling speed of chemical droplets during the particulate matter removal process has become a technical problem that needs to be solved by those skilled in the art. Utility Model Content

[0010] The purpose of this invention is to provide a particulate matter removal fixture and a semiconductor manufacturing device to solve the problems of existing technologies being unable to control the height of the dropper, the amount of chemical droplets used, and the rolling speed of the chemical droplets.

[0011] To achieve the above objectives, this utility model provides a particulate matter removal fixture, comprising: a base, a moving component, a dropper, and a leveling component;

[0012] Both the moving component and the horizontal adjustment component are disposed on the base;

[0013] The moving component includes two moving arms and a limiting device; the two moving arms are capable of moving at least in a direction perpendicular to the base;

[0014] One end of the two-section moving arm is connected to the dropper and is used to drive the dropper to move above the particles on the mask protective film; the other end of the two-section moving arm is provided with the limiting device, which is used to limit the displacement of the two-section moving arm in a direction perpendicular to the base.

[0015] The dropper is used to deliver chemical liquid to particles on the mask protective film;

[0016] The leveling component is used to support the mask and to adjust the level of the mask after the chemical liquid is dripped onto the particles, so that the chemical liquid rolls to the edge of the mask protective film.

[0017] Optionally, the two-section movable arm includes a first movable section and a second movable section; the second movable section is movably disposed on the first movable section along the extending direction of the first movable section, and the second movable section is capable of rotating about a rotation axis perpendicular to the base.

[0018] The first movable section is capable of moving in a direction perpendicular to the base, the limiting device is disposed at one end of the first movable section, and the dropper is disposed at the end of the second movable section away from the first movable section.

[0019] Optionally, the moving component further includes a connecting rod, one end of which is connected to the base, the first moving section is connected to the connecting rod, and the limiting device is disposed at the connection between the first moving section and the connecting rod.

[0020] The connecting rod is provided with a sliding groove extending in a direction perpendicular to the base, and the first moving part can slide in the sliding groove so that the first moving part can move in a direction closer to or away from the base.

[0021] Optionally, the limiting device includes a locking knob and a connecting frame; the first movable part passes through the connecting frame and extends into the slide groove, the connecting frame is sleeved on the periphery of the connecting rod, and moves along the extension direction of the slide groove with the first movable part; the locking knob is disposed on the side wall of the connecting frame and is threadedly connected to the connecting frame.

[0022] The locking knob is movably disposed between an engaged position and a disengaged position along a direction close to or away from the connecting rod; when the locking knob is in the engaged position, it abuts against the outer wall of the connecting rod to limit the displacement of the connecting frame and the first movable part in a direction perpendicular to the base; when the locking knob is in the disengaged position, it leaves a gap with the connecting rod to release the restriction on the displacement of the connecting frame and the first movable part.

[0023] Optionally, a first scale is also provided on the side wall of the connecting rod, the first scale being used to obtain the displacement of the first moving part in a direction perpendicular to the base;

[0024] A second scale is provided on the side wall of the first moving part, and the second scale is used to obtain the displacement of the second moving part along the extension direction of the first moving part.

[0025] Optionally, a guide is provided at one end of the dropper away from the second moving part, and the guide hangs down in a direction perpendicular to the base to guide the chemical liquid to drip onto the particulate matter.

[0026] Optionally, the horizontal adjustment assembly includes a support cavity recessed from the surface of the base for supporting the mask.

[0027] Optionally, the leveling assembly further includes a chassis and an adjustment knob; the chassis is disposed in the bearing cavity, and the adjustment knob is disposed on the base, the adjustment knob being used to adjust the height of the chassis.

[0028] Optionally, the number of the chassis and the adjustment knobs is set to be multiple, with the multiple chassis evenly arranged in the bearing cavity and in contact with the mask when the bearing cavity carries the mask; the adjustment knobs are arranged in a one-to-one correspondence with the chassis.

[0029] To achieve the above objectives, this utility model also provides a semiconductor manufacturing apparatus, including the particulate matter removal fixture described above.

[0030] Compared with existing particulate cleaning methods, the particulate removal fixture and semiconductor manufacturing equipment provided in this application have the following advantages:

[0031] The particulate removal fixture provided in this embodiment features a dropper at one end of a two-segment moving arm and a limiting device at the other end. This allows the limiting device to restrict the displacement of the two-segment robotic arm perpendicular to the base as it moves the dropper above the particulate matter, controlling the dropper height and ensuring a gap between the dropper and the protective mask film to prevent the dropper from puncturing the film. Simultaneously, the dropper, positioned on the two-segment robotic arm, dispenses chemical solution after moving above the particulate matter, controlling the amount of chemical solution used and preventing excessive spillage into the pattern area. Furthermore, a leveling component adjusts the mask's level. After the chemical solution drips onto the particulate matter, the mask is tilted, and the solution is absorbed by a cotton swab after rolling to the edge of the protective film. The leveling component controls the mask's tilt, thereby controlling the rolling speed of the chemical solution and preventing it from rolling onto the mask surface. Attached Figure Description

[0032] Figure 1 This is a schematic diagram of the particulate matter removal fixture provided in an embodiment of the present invention;

[0033] Figure 2 A schematic diagram showing the movement of a two-section movable arm along a slide groove, provided in an embodiment of this utility model;

[0034] Figure 3 A schematic diagram illustrating the limiting device for restricting the displacement of a two-section moving arm in an embodiment of this utility model;

[0035] Figure 4 A schematic diagram showing the mask placed on the chassis according to an embodiment of this utility model;

[0036] Figure 5 This is a schematic diagram of the horizontal adjustment component provided in an embodiment of the present invention for adjusting the level of the mask.

[0037] The explanations of the reference numerals in the accompanying drawings are as follows:

[0038] 1-Base;

[0039] 2-Moving component; 20-Two-section moving arm; 21-Limiting device; 22-Connecting rod; 200-First section moving part; 201-Second section moving part; 202-Second scale; 210-Clamping knob; 211-Connecting frame; 220-Slide groove; 221-First scale;

[0040] 3-Dropper; 30-Guide;

[0041] 4-Level adjustment assembly; 40-Bearing cavity; 41-Chassis; 42-Adjustment knob; 43-Transmission system;

[0042] 5-Mask; 6-Mask protective film;

[0043] X - The extension direction of the first moving part; Y - The direction perpendicular to the base. Detailed Implementation

[0044] To make the objectives, advantages, and features of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and specific embodiments. It should be noted that the drawings are all in a very simplified form and are not drawn to scale, and are only used to facilitate and clarify the explanation of the objectives of the embodiments of this utility model. Furthermore, the structures shown in the drawings are often part of the actual structure. In particular, different drawings may emphasize different aspects and sometimes use different scales.

[0045] As used herein, the singular forms “a,” “an,” and “the” include plural objects; the term “or” is generally used to mean “and / or”; the term “a number” is generally used to mean “at least one”; and the term “at least two” is generally used to mean “two or more”. Furthermore, the terms “first,” “second,” and “third” are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as “first,” “second,” or “third” may explicitly or implicitly include one or at least two of that feature. “One end” and “the other end,” as well as “proximal end” and “distal end,” generally refer to two corresponding parts, including not only endpoints. The terms “installed,” “connected,” and “joined” should be interpreted broadly; for example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two elements or the interaction between two elements. Furthermore, as used in this specification, the phrase "one element is disposed on another element" generally only indicates that there is a connection, coupling, cooperation, or transmission relationship between the two elements, and the connection, coupling, cooperation, or transmission between the two elements can be direct or indirect through an intermediate element. It should not be construed as indicating or implying a spatial positional relationship between the two elements, i.e., one element can be located arbitrarily inside, outside, above, below, or to the side of another element, unless otherwise explicitly stated. The terms "above," "below," "top," and "bottom" generally refer to relative positional relationships arranged according to the direction of gravity; the terms "vertical" or "vertical direction" generally refer to the direction of gravity, which is generally perpendicular to the ground; "horizontal" or "horizontal plane direction" generally refers to a direction parallel to the ground. Those skilled in the art can understand the specific meaning of the above terms in this specification according to the specific circumstances.

[0046] The purpose of this invention is to provide a particulate matter removal fixture and a semiconductor manufacturing device to solve the problems of existing technologies being unable to control the height of the dropper, the amount of chemical droplets used, and the rolling speed of the chemical droplets.

[0047] Please refer to Figure 1 This utility model provides a particulate matter removal fixture, including: a base 1, a moving component 2, a dropper 3, and a horizontal adjustment component 4; both the moving component 2 and the horizontal adjustment component 4 are disposed on the base 1; the moving component 2 includes a two-section moving arm 20 and a limiting device 21; the two-section moving arm 20 is at least able to move along a direction Y perpendicular to the base; one end of the two-section moving arm 20 is connected to the dropper 3 for driving the dropper 3 to move above the particulate matter on the mask protective film 6; the other end of the two-section moving arm 20 is provided with the limiting device 21, which is used to limit the displacement of the two-section moving arm 20 along the direction Y perpendicular to the base; the dropper 3 is used to provide chemical liquid to the particulate matter on the mask protective film 6; the horizontal adjustment component 4 is used to support the mask 5, and the horizontal adjustment component 4 is used to adjust the level of the mask 5 after the chemical liquid is dripped onto the particulate matter, so that the chemical liquid rolls to the edge of the mask protective film 6.

[0048] In this embodiment, the two-segment moving arm 20 can be a robotic arm; as those skilled in the art will understand, robotic arms typically have multiple degrees of freedom. Figure 1 For example, the two-stage moving arm 20 can move in the direction Y perpendicular to the base, or in the direction parallel to the base 1, and can also rotate around the rotation axis in a plane parallel to the base 1. With this configuration, the two-stage moving arm 20 can drive the dropper 3 to move and / or rotate based on the position of the particles on the mask protective film 6, so as to move the dropper 3 directly above the particles. Simultaneously, a limiting device 21 is provided at one end of the two-stage moving arm 20 to limit the displacement of the two-stage moving arm 20 in the direction Y perpendicular to the base, allowing the operator to stop the dropper 3 in time after it has moved to a suitable height, ensuring a gap between the dropper 3 and the mask protective film 6, and preventing the mask protective film 6 from being punctured due to the dropper 3 being too close to it. It should be noted that the limiting device 21 only restricts the displacement of the two-section moving arm 20 in the direction Y perpendicular to the base. The limiting device 21 does not restrict the movement of the two-section moving arm 20 in other directions. That is, after the height of the dropper 3 is determined and limited by the limiting device 21, the two-section robotic arm can still drive the dropper 3 to move in the direction parallel to the base 1, and can also drive the dropper 3 to rotate in the plane parallel to the base 1.

[0049] In other embodiments, the movement direction of the two-section movable arm 20 can also be a combination of any two other directions. For example, the two-section movable arm 20 can move along a direction Y perpendicular to the base and can move along a direction parallel to the base 1; or, the two-section movable arm 20 can move along a direction Y perpendicular to the base and can rotate around the rotation axis in a plane parallel to the base 1. Those skilled in the art can reasonably configure the movement direction of the two-section movable arm 20 according to the actual situation.

[0050] As an optional embodiment, in Figure 1 In the illustrated example, one end of the two-section moving arm 20 is equipped with a dropper 3. The operator can select a suitable chemical liquid based on the size, thickness, and other texture of the particles. This liquid can be IPA (isopropanol), ethanol, or a mixture of multiple substances. Based on experience, an appropriate amount of chemical liquid can be added to the dropper 3, which is positioned directly above the particles, using a measuring cup or dropper 3. This avoids the difficulty in controlling the amount of chemical liquid dispensed manually, which could lead to excessive liquid overflowing into the pattern area and affecting the subsequent use of the mask 5. Those skilled in the art will understand that when the chemical liquid is dripped onto the particles, it can dissolve the particles or weaken the adsorption between the particles and the mask protective film 6, allowing the particles to move with the rolling of the chemical liquid.

[0051] Please continue to refer to Figure 1 In this embodiment, the mask 5 is placed on the leveling component 4. After the chemical liquid drips onto the particles, it is allowed to stand for 5-10 seconds. Then, the leveling component 4 can be used to adjust the level of the mask 5, tilting it in a certain direction. The particles move with the rolling of the chemical liquid. The operator can use a lint-free cotton swab to absorb the chemical liquid and particles at the edge of the mask protective film 6 on the tilted side of the mask 5, thus removing the particles. With this setup, the leveling component 4 can control the tilt angle and degree of the mask 5, thereby controlling the rolling speed of the chemical liquid and preventing the chemical liquid from rolling too fast and directly flowing into the graphic area when the mask 5 is tilted manually. Of course, in other embodiments, a suction port can also be provided on the tilted side of the mask 5, so that the chemical liquid can be directly absorbed by the suction port after moving to the edge of the mask protective film 6.

[0052] With this configuration, the particulate removal fixture provided in this embodiment, by setting a limiting device 21, places the dropper 3 at one end of the two-section moving arm 20 and places the mask 5 on the horizontal adjustment component 4, so that the height of the dropper 3, the amount of chemical liquid used, and the rolling speed of the chemical liquid can be controlled. This can reduce the experience requirements of personnel in handling particulate abnormalities, increase the speed of particulate removal, reduce the risk of abnormal demolding due to improper handling, and thus save production costs.

[0053] In an alternative embodiment, please continue to refer to Figure 1 The two-section moving arm 20 includes a first moving part 200 and a second moving part 201. The second moving part 201 is movably disposed on the first moving part 200 along the extension direction X of the first moving part, and the second moving part 201 can rotate about a rotation axis A in a direction Y perpendicular to the base. The first moving part 200 can move along the direction Y perpendicular to the base. A limiting device 21 is disposed at one end of the first moving part 200, and a dropper 3 is disposed at the end of the second moving part 201 away from the first moving part 200.

[0054] It should be noted that the two-section moving arm 20 includes two movable sections. The first movable section 200 is movable along a direction Y perpendicular to the base. A limiting device 21 is connected to the first movable section 200 to limit its displacement along the Y direction perpendicular to the base after the dropper 3 reaches above the particles. The second movable section 201 is movable along the extension direction X of the first movable section and can rotate around the rotation axis A. In this embodiment, a slide rail is provided on the first movable section 200. One end of the second movable section 201 is connected to the slide rail via a slider, which drives the second movable section 201 to move within the slide rail. The second movable section 201 is fitted outside the slider and can rotate around the slider's rotation axis A, which is perpendicular to the Y direction of the base. Therefore, the second movable section 201 can rotate on a surface parallel to the base 1. The dropper 3 is provided at the other end of the second movable section 201.

[0055] Therefore, the process of using the two-section moving arm 20 to drive the dropper 3 to move is divided into two parts: movement in the direction Y perpendicular to the base and movement and rotation in the direction parallel to the base 1. Optionally, the operator first drives the first moving part 200 to move in the direction Y perpendicular to the base until there is a gap of 1-2 mm between the dropper 3 and the surface of the mask protective film 6, and then uses the limiting device 21 to limit the first moving part 200; then the operator drives the second moving part 201 to move on the slide rail and rotate on the surface parallel to the base 1 until the dropper 3 moves above the particles.

[0056] Please refer to Figures 1 to 3The movable component 2 also includes a connecting rod 22, one end of which is connected to the base 1. The first movable part 200 is connected to the connecting rod 22. A limiting device 21 is provided at the connection between the first movable part 200 and the connecting rod 22. The connecting rod 22 is provided with a sliding groove 220 extending in a direction Y perpendicular to the base. The first movable part 200 can slide in the sliding groove 220 so that the first movable part 200 can move in a direction closer to or away from the base 1.

[0057] Optional, please continue to refer to Figures 1 to 3 The limiting device 21 includes a locking knob 210 and a connecting frame 211; the first moving part 200 passes through the connecting frame 211 and extends into the slide groove 220. The connecting frame 211 is sleeved on the periphery of the connecting rod 22 and moves along the extension direction of the slide groove 220 with the first moving part 200; the locking knob 210 is disposed on the side wall of the connecting frame 211 and is threadedly connected to the connecting frame 211; the locking knob 210 is movably disposed between the locking position and the releasing position in the direction close to or away from the connecting rod 22; when the locking knob 210 is in the locking position, it abuts against the outer wall of the connecting rod 22 to limit the displacement of the connecting frame 211 and the first moving part 200 in the direction Y perpendicular to the base; when the locking knob 210 is in the releasing position, there is a gap between it and the connecting rod 22 to release the restriction on the displacement of the connecting frame 211 and the first moving part 200.

[0058] It needs to be explained that, in Figure 1 In the illustrated example, one end of the first movable section 200 passes through the connecting frame 211 sleeved around the connecting rod 22 and extends into the slide groove 220, allowing it to slide along the extension direction of the slide groove 220. Optionally, a locking knob 210 is provided on the side wall of the connecting frame 211. The locking knob 210 can be a screw with a threaded section, and a threaded hole is provided on the side wall of the connecting frame 211, with the locking knob 210 threadedly connected to the threaded hole. The locking knob 210 can move in a direction closer to or away from the connecting rod 22 by twisting between the threaded section and the threaded hole. During the movement of the locking knob 210, the operator can directly rotate the locking knob 210 in a specific direction. For example, rotating the locking knob 210 clockwise moves it closer to the connecting rod 22; rotating it counterclockwise moves it away from the connecting rod 22. Figure 2 In the illustrated embodiment, the locking knob 210 is in the released position, and a gap is left between the locking knob 210 and the side wall of the connecting rod 22, allowing the first moving part 200 to slide within the slide groove 220; Figure 3In the illustrated embodiment, the locking knob 210 is in the engaged position, and the locking knob 210 abuts against the side wall of the connecting rod 22. The connecting frame 211 cannot move relative to the connecting rod 22, thereby restricting the movement of the first moving part 200 passing through the connecting frame 211, so as to limit the first moving part 200 in the direction Y perpendicular to the base.

[0059] For preferred options, please refer to [the following]. Figure 1 A first scale 221 is also provided on the side wall of the connecting rod 22. The first scale 221 is used to obtain the displacement of the first moving part 200 in the direction Y perpendicular to the base; a second scale 202 is provided on the side wall of the first moving part 200. The second scale 202 is used to obtain the displacement of the second moving part 201 in the extension direction X of the first moving part. Figure 1 As shown, the first scale 221 can be set on the side of the connecting rod 22 where the groove 220 is provided. When the first moving part 200 slides in the groove 220, the operator can use the first scale 221 to obtain its displacement in the direction Y perpendicular to the base, so as to help judge the distance between the dropper 3 and the mask protective film 6 and avoid the dropper 3 puncturing the mask protective film 6. The slide rail of the first moving part 200 is set on the top surface, and the second scale 202 is set on the side of the first moving part 200. When the operator drives the second moving part 201 to move along the extension direction X of the first moving part, the operator can use the second scale 202 to obtain the displacement of the second moving part 201, so as to move the dropper 3 directly above the particles, thereby ensuring that the dripping chemical liquid can act on the particles.

[0060] exist Figure 1 In the illustrated example, a guide 30 is provided at the end of the dropper 3 away from the second moving part 201. The guide 30 hangs downward in a direction Y perpendicular to the base to guide the chemical liquid to drip onto the particles. Optionally, the guide 30 can be a rigid fiber that can guide the chemical liquid to drip onto the particles in a direction Y perpendicular to the base without deviation. At the same time, the arrangement of the guide 30 further reduces the drip height of the chemical liquid, preventing the chemical liquid from decomposing into fine droplets that splash onto the mask protective film 6 upon dripping onto the particles.

[0061] Please refer to Figure 1 , Figures 4 to 5 The horizontal adjustment assembly 4 includes a bearing cavity 40, which is recessed from the surface of the base 1 to support the mask 5. Furthermore, the horizontal adjustment assembly 4 also includes a chassis 41 and an adjustment knob 42; the chassis 41 is disposed in the bearing cavity 40, and the adjustment knob 42 is disposed on the base 1, used to adjust the height of the chassis 41.

[0062] As an optional embodiment, in Figure 1In the illustrated example, the bearing cavity 40 is a rectangular cavity, and at least two chassis 41s are provided, which contact the mask 5 when the mask 5 is placed in the bearing cavity 40. Adjustment knobs 42 are connected to the chassis 41 one-to-one via transmission systems 43, meaning one adjustment knob 42 is connected to one chassis 41 via one transmission system 43. The transmission system 43 can be a crankshaft and a cylinder. The adjustment knob 42 can drive the crankshaft to rotate, and the cylinder is located at the bottom of the chassis 41. The operator drives the adjustment knob 42 to rotate, thereby driving the crankshaft to rotate, causing the cylinder to rise or fall, thus adjusting the height of the chassis 41.

[0063] Preferably, the number of base plates 41 and adjusting knobs 42 is multiple. Multiple base plates 41 are evenly distributed in the bearing cavity 40 and contact the mask 5 when the bearing cavity 40 bears the mask 5. The adjusting knobs 42 are arranged in a one-to-one correspondence with the base plates 41. Please refer to [reference needed]. Figure 1 , Figures 4 to 5 Four bases 41 are provided, located at the four corners of the bearing cavity 40; correspondingly, four adjustment knobs 42 are also provided, each connected to the base 41 via a transmission system 43. With this arrangement, when the operator places the mask 5 into the bearing cavity 40, the four bases 41 are at the same height (e.g., ...). Figure 4 (As shown); After the chemical liquid drips onto the mask protective film 6, a certain adjustment knob 42 can be controlled to lower or raise the height of a certain base 41, thereby causing the height of the base 41 to be inconsistent, resulting in the mask 5 tilting (as shown). Figure 5 As shown, the chemical liquid carries the particles and moves on the inclined mask protective film 6 until it reaches the edge of the mask protective film 6, where the operator uses a dust-free cotton swab to absorb them.

[0064] The following is combined Figures 1 to 5 The working principle of the particulate matter removal fixture provided in this embodiment will be further described.

[0065] The operator places the mask 5 containing residual particulate matter into the bearing cavity 40 (e.g., Figure 4 (As shown), and place the side with residual particles on top; move the first moving part 200 along the direction Y perpendicular to the base, so that when the dropper 3 is 61-2mm away from the mask protective film, use the limiting device 21 to limit the first moving part 200; then drive the second moving part 201 to move and / or rotate in the direction parallel to the base 1, so that the dropper 3 is directly above the particles; drip the determined amount of chemical liquid into the dropper 3, and the chemical liquid drips onto the particles through the guide 30. After standing for 5-10 seconds, release the limiting device 21 from the first moving part 200, and move the first moving part 200 away from the base 1; rotate the adjusting knob 42 to lower or raise the height of the corresponding base 41, and the mask 5 tilts (as shown). Figure 5 As shown, the chemical liquid carries the particles and moves on the inclined mask protective film 6 until it reaches the edge of the mask protective film 6, where the operator uses a dust-free cotton swab to absorb them.

[0066] In another embodiment, the present invention also provides a semiconductor manufacturing apparatus, including the particulate removal fixture described above. It should be noted that the particulate removal fixture can be used in conjunction with a mask 5 production apparatus, a protective film application apparatus, a protective film removal apparatus, a residual adhesive removal apparatus, and a mask 5 cleaning apparatus to cover the entire process of mask 5 from production to use. With this configuration, using the particulate removal fixture avoids the problems in the prior art where the height of the dropper 3, the amount of chemical droplets, and the rolling speed of the chemical droplets cannot be controlled.

[0067] In summary, in the particulate removal fixture and semiconductor manufacturing equipment provided in this embodiment of the present invention, the particulate removal fixture includes: a base, a moving component, a dropper, and a horizontal adjustment component; both the moving component and the horizontal adjustment component are disposed on the base; the moving component includes a two-section moving arm and a limiting device; the two-section moving arm is capable of moving at least in a direction perpendicular to the base; one end of the two-section moving arm is connected to the dropper for driving the dropper to move above the particulate matter on the mask protective film; the other end of the two-section moving arm is provided with a limiting device, which is used to limit the displacement of the two-section moving arm in a direction perpendicular to the base; the dropper is used to provide chemical liquid to the particulate matter on the mask protective film; the horizontal adjustment component is used to support the mask, and the horizontal adjustment component is used to adjust the level of the mask after the chemical liquid is dripped onto the particulate matter, so that the chemical liquid rolls to the edge of the mask protective film.

[0068] This configuration, with a dropper at one end of the two-stage moving arm and a limiting device at the other, allows the limiting device to restrict the displacement of the two-stage robotic arm in the direction perpendicular to the base as it moves the dropper above the particles. This controls the height of the dropper, ensuring a gap between it and the mask protective film and preventing the dropper from puncturing the protective film. Simultaneously, the dropper, positioned on the two-stage robotic arm, dispenses chemical liquid after moving above the particles, controlling the amount of chemical liquid used and preventing excessive spillage into the graphic area. Furthermore, a leveling component adjusts the mask's level. After the chemical liquid drips onto the particles, the mask is tilted, and once it rolls to the edge of the protective film, it is absorbed with a cotton swab. The leveling component controls the mask's tilt, thereby controlling the rolling speed of the chemical liquid and preventing it from rolling onto the mask surface.

[0069] The above description is only a description of the preferred embodiment of the present utility model and is not intended to limit the scope of the present utility model in any way. Any changes or modifications made by those skilled in the art based on the above disclosure shall fall within the protection scope of the claims.

Claims

1. A particulate matter removal fixture, characterized in that, include: Base, moving assembly, dropper, and leveling assembly; Both the moving component and the horizontal adjustment component are disposed on the base; The moving component includes two moving arms and a limiting device; the two moving arms are capable of moving at least in a direction perpendicular to the base; One end of the two-section moving arm is connected to the dropper and is used to drive the dropper to move above the particles on the mask protective film; the other end of the two-section moving arm is provided with the limiting device, which is used to limit the displacement of the two-section moving arm in a direction perpendicular to the base. The dropper is used to deliver chemical liquid to particles on the mask protective film; The leveling component is used to support the mask and to adjust the level of the mask after the chemical liquid is dripped onto the particles, so that the chemical liquid rolls to the edge of the mask protective film.

2. The particulate matter removal fixture as described in claim 1, characterized in that, The two-section movable arm includes a first movable section and a second movable section; the second movable section is movably disposed on the first movable section along the extension direction of the first movable section, and the second movable section is capable of rotating about a rotation axis perpendicular to the base. The first movable section is capable of moving in a direction perpendicular to the base, the limiting device is disposed at one end of the first movable section, and the dropper is disposed at the end of the second movable section away from the first movable section.

3. The particulate matter removal fixture as described in claim 2, characterized in that, The movable component further includes a connecting rod, one end of which is connected to the base, the first movable section is connected to the connecting rod, and the limiting device is disposed at the connection between the first movable section and the connecting rod; The connecting rod is provided with a sliding groove extending in a direction perpendicular to the base, and the first moving part can slide in the sliding groove so that the first moving part can move in a direction closer to or away from the base.

4. The particulate matter removal fixture as described in claim 3, characterized in that, The limiting device includes a locking knob and a connecting frame; the first movable part passes through the connecting frame and extends into the slide groove; the connecting frame is sleeved on the periphery of the connecting rod and moves along the extension direction of the slide groove with the first movable part; the locking knob is disposed on the side wall of the connecting frame and is threadedly connected to the connecting frame. The locking knob is movably disposed between an engaged position and a disengaged position along a direction close to or away from the connecting rod; when the locking knob is in the engaged position, it abuts against the outer wall of the connecting rod to limit the displacement of the connecting frame and the first movable part in a direction perpendicular to the base; when the locking knob is in the disengaged position, it leaves a gap with the connecting rod to release the restriction on the displacement of the connecting frame and the first movable part.

5. The particulate matter removal fixture as described in claim 3, characterized in that, A first scale is also provided on the side wall of the connecting rod. The first scale is used to obtain the displacement of the first moving part in the direction perpendicular to the base. A second scale is provided on the side wall of the first moving part, and the second scale is used to obtain the displacement of the second moving part along the extension direction of the first moving part.

6. The particulate matter removal fixture as described in claim 2, characterized in that, The dropper is provided with a guide at one end away from the second moving part. The guide hangs down in a direction perpendicular to the base to guide the chemical liquid to drip onto the particulate matter.

7. The particulate matter removal fixture as described in claim 1, characterized in that, The horizontal adjustment assembly includes a support cavity, which is recessed from the surface of the base and is used to support the mask.

8. The particulate matter removal fixture as described in claim 7, characterized in that, The leveling assembly also includes a chassis and an adjustment knob; the chassis is disposed in the bearing cavity, and the adjustment knob is disposed on the base, the adjustment knob being used to adjust the height of the chassis.

9. The particulate matter removal fixture as described in claim 8, characterized in that, The number of the chassis and the adjustment knob is set to multiple, and the multiple chassis are evenly arranged in the bearing cavity, and contact the mask when the bearing cavity carries the mask; The adjustment knobs are set one-to-one with the chassis.

10. A semiconductor manufacturing apparatus, characterized in that, Includes the particulate matter removal fixture as described in any one of claims 1 to 9.

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