Photoetching verification machine table

Abstract

The utility model discloses a photoetching verification machine table in the maskless photoetching field, which comprises a light source adjusting module, the light source adjusting module comprises a plurality of first adjusting units which can be independently adjusted, and the adjusting ends of the plurality of first adjusting units are connected with a light source; the lens adjusting module comprises a plurality of second adjusting units which can be independently adjusted, the adjusting ends of the plurality of second adjusting units are connected with a lens mounting plate, and the lens mounting plate is arranged on the propagation path of the light source; a sample wafer adjusting module, wherein the sample wafer adjusting module comprises an adjustable sample wafer objective table; the inlet end of the focus detection module is arranged corresponding to the light source; the first adjusting unit adjusts the position of the light source, and the second adjusting unit adjusts the position of the photoetching lens, so that the adjustable degree of freedom of the device is increased, and the photoetching verification function in the sample preparation stage of the maskless photoetching machine based on the light source can be completed.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of maskless lithography technology, in particular to a photolithography verification machine. BACKGROUND

[0002] At present, maskless lithography technology is developing rapidly. Maskless lithography technology has the advantages of high flexibility, low cost, and convenient pattern modification. As a core technology of advanced micro-nano processing, maskless lithography significantly reduces the process complexity, cost, and research and development period. Its high resolution, flexible patterning capability, and digital control characteristics are irreplaceable in the fields of new semiconductor device research and development, photonic chip preparation, and nanoscience.

[0003] Micro-LED (Micro Light Emitting Diode) is a kind of light source with small size, high brightness, fast response speed, high resolution, and long service life, which can be applied in maskless lithography technology. However, the Micro-LED preparation process has deficiencies in full-colorization, mass transfer, inkjet printing technology, etc. The light emitting angle is too large (± 90°), there are challenges in collimation, the wavelength has a certain bandwidth, and the wavelength will shift after long time work. Its application in maskless lithography technology is not yet mature. Therefore, before maskless lithography, the optical performance of the Micro-LED light source needs to be verified.

[0004] The existing maskless lithography machine has low adjustable freedom between modules, and the lithography lens cannot adapt to a large bandwidth, which cannot meet the photolithography verification function in the preparation sample stage of the maskless lithography machine based on the Micro-LED light source. CONTENT OF THE INVENTION

[0005] The purpose of the present application is to provide a photolithography verification machine to solve the problems of the existing photolithography machine that cannot verify the photolithography performance of the Micro-LED light source during the preparation of the sample, and the low adjustable freedom between modules.

[0006] To achieve the above purpose, the present application adopts the following technical scheme:

[0007] The present application discloses a photolithography verification machine, which comprises:

[0008] A light source adjusting module, the light source adjusting module comprises a plurality of independently adjustable first adjusting units and an adjusting base plate, the adjusting base plate is connected to the adjusting ends of the plurality of first adjusting units; the adjusting base plate is connected with a light source;

[0009] A lens adjusting module, the lens adjusting module comprises a plurality of independently adjustable second adjusting units, the adjusting ends of the plurality of second adjusting units are connected with a lens mounting plate, and the lens mounting plate is arranged on the propagation path of the light source;

[0010] a sample adjusting module, which comprises an adjustable sample carrier, and is arranged on the propagation path of the light source;

[0011] a focusing module, which is arranged at the entrance end of the light source, and is used to obtain a real-time lithography image, wherein the light source passes through the lens adjusting module and the sample adjusting module to enter the focusing module.

[0012] In a further aspect of the present application, the first adjusting units are uniformly distributed on the edge of the adjusting base plate, and the second adjusting units are uniformly distributed on the edge of the lens mounting plate.

[0013] In a further aspect of the present application, the second adjusting units are arranged at an angle of 90° with each other.

[0014] In a further aspect of the present application, the first adjusting unit comprises a sliding seat, a wedge-shaped block and a pad, the sliding seat is fixedly arranged, the sliding seat and the wedge-shaped block are slidingly matched, the pad is slidingly connected to the wedge-shaped surface of the wedge-shaped block, the wedge-shaped block is provided with a first notch, the pad is provided with a through hole, and a first guide member is fixed to the sliding seat through the through hole and the first notch.

[0015] One side of the sliding seat is fixedly provided with a bearing with a seat, the adjusting shaft is rotatably connected to the bearing with a seat, the other end is threadedly connected to the wedge-shaped block, the rotating handle is connected to the adjusting shaft, and the adjusting shaft is rotated by rotating the rotating handle, so that the wedge-shaped block and the pad move relatively.

[0016] In a further aspect of the present application, the adjusting base plate is provided with a through hole, and the first guide member is partially arranged in the through hole.

[0017] In a further aspect of the present application, the second adjusting unit comprises a fixedly arranged support cross bar, a mounting block, a lower wedge block, a bolt and an upper wedge block.

[0018] The mounting block is fixed to the support cross bar, the lower wedge block is slidingly connected to the mounting block, the lower wedge block is provided with a second notch, the inclined surface of the upper wedge block is slidingly matched with the inclined surface of the lower wedge block, and the opposite surfaces are connected to the lens mounting plate; the bolt is threadedly fixed to the mounting block through the through hole of the lens mounting plate, the through hole of the upper wedge block and the second notch.

[0019] The top of the upper wedge block is hemispherical.

[0020] In a further aspect of the present application, the support cross bar is arranged in space orthogonally to the lens optical axis along the radial extension line of the light source optical axis.

[0021] In a further aspect of the present application, the light source heat dissipation module comprises a water tank, a heat dissipation aluminum row and a fan, and the water tank, the heat dissipation aluminum row and the fan are fixed to one side of the light source.

[0022] In a further embodiment of this application, the focusing module includes a microscope system and a microscope adjustment mechanism. The adjustment end of the microscope adjustment mechanism is connected to the microscope system and is used to adjust the position of the microscope system. The microscope system includes a microscope tube, an objective lens, and an image sensor. The microscope tube and the objective lens are arranged at an angle. A reflecting mirror is provided inside the microscope tube. The light generated by the light source passes through the objective lens, the reflecting mirror, and the microscope tube in sequence and is then captured by the image sensor.

[0023] In a further embodiment of this application, the light source adjustment module, lens adjustment module, sample adjustment module, and focus detection module are supported at intervals from top to bottom by a frame.

[0024] The beneficial effects of this application are as follows:

[0025] This application includes multiple first adjustment units and multiple second adjustment units. The first adjustment units adjust the spatial position of the light source, and the second adjustment units adjust the spatial position of the lithography lens. This increases the adjustable degrees of freedom of the device. Individual adjustment in actual use can realize the pitch angle adjustment of the corresponding components and high-precision position switching. Combined with the existing Micro-LED collimation design, the device can verify the performance of light sources of different wavelengths, thereby enabling the lithography verification function in the sample preparation stage of the maskless lithography machine based on the light source. Attached Figure Description

[0026] Figure 1 This is a schematic diagram of the structure of the photolithography verification machine in the embodiments of this application.

[0027] Figure 2 This is a top view of the light source adjustment module in an embodiment of this application;

[0028] Figure 3 This is a bottom view of the light source adjustment module in an embodiment of this application.

[0029] Figure 4 This is a schematic diagram of the structure of the first adjustment unit in the embodiments of this application;

[0030] Figure 5 This is a schematic diagram of the lens adjustment module in an embodiment of this application;

[0031] Figure 6 This is a schematic diagram of the structure of the second adjustment unit in the embodiments of this application;

[0032] Figure 7 This is a schematic diagram of the microscopic system structure in an embodiment of this application;

[0033] Figure 8 This is a schematic diagram of the microscope adjustment mechanism in an embodiment of this application.

[0034] In the diagram: 100, Light source heat dissipation module; 200, Light source adjustment module; 300, Lens adjustment module; 400, Sample adjustment module; 500, Focusing module; 210, Adjustment base plate; 220, Light source; 230, Adapter plate; 240, First adjustment unit; 241, Rotating handle; 242, Bearing with seat; 243, Wedge block; 244, Pad block; 245, Slide block; 301, Support crossbar; 302, Mounting block; 303, Lower wedge block; 304, Upper wedge block; 305, Lens mounting plate; 510, Z-axis adjustment module; 520, Y-axis adjustment module; 530, X-axis adjustment module; 501, Objective lens; 502, Reflecting mirror; 503, Lens plate; 504, Image sensor; 505, Lens barrel. Detailed Implementation

[0035] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The following description of at least one exemplary embodiment is merely illustrative and is in no way intended to limit this application or its application or use.

[0036] like Figures 1 to 7 As shown, this embodiment discloses a photolithography verification machine, which includes a light source adjustment module 200, a lens adjustment module 300, a sample adjustment module 400, and a focus detection module 500. The light source adjustment module 200 includes four independently adjustable first adjustment units 240, and the adjustment ends of the four first adjustment units 240 are connected to a light source 220. The light source in this embodiment uses a Micro-LED light source with a center wavelength of 390~450nm and each light-emitting pixel has a size of 5~15μm. The Micro-LED light source has been collimated using existing technology (the emission angle is within 0~30°). The photolithography lens is designed with this emission angle in mind to meet its numerical aperture matching requirements. The design of the lithography lens is existing technology, and the design principles and processes will not be described in detail here. The lens adjustment module 300 includes four independently adjustable second adjustment units. The adjustment ends of the four second adjustment units are connected to the lens mounting plate 305, which is located on the propagation path of the light source. The sample adjustment module 400 includes an adjustable sample stage, which is located on the propagation path of the light source and at the entrance of the focusing module 500. The sample stage is set in relation to the light source 220 to acquire real-time lithography images. The emitted light from the light source 220 passes through the lens adjustment module 300 and the sample adjustment module 400 and enters the focusing module 500.

[0037] In use, the photolithography lens is fixed to the lens mounting plate 305 with bolts, and the Micro-LED light source is fixed to the side of the adjustment base plate 210 facing the lens adjustment module 300 through the adapter plate 230. Then, the sample is fixed on the sample stage. By adjusting the first adjustment unit 240 and the second adjustment unit in each position, the corresponding light source 220 is made to be horizontal and the corresponding lens is made to reach the required angle. The light source 220 is activated, and the light source 220 can generate the required photolithography pattern to perform photolithography processing on the sample.

[0038] In some embodiments, the lithography verification machine is designed as follows:

[0039] The photolithography verification machine includes a light source heat dissipation module 100, a light source adjustment module 200, a lens adjustment module 300, a sample adjustment module 400, and a focus detection module 500. These modules are installed sequentially from top to bottom on a frame.

[0040] As attached Figures 2 to 4 As shown, in this embodiment, the light source adjustment module 200 comprises an adjustment base plate 210 and four first adjustment units 240. The four first adjustment units 240 form a regular quadrilateral structure. Each first adjustment unit 240 includes a rotating handle 241, a bearing 242 with a seat, a wedge block 243, a pad 244, a first guide member, and a slide block 245. The slide block 245 is fixed on the frame (the frame is not shown). The slide block 245 and the wedge block 243 are slidably engaged. The pad block 244 is slidably connected to the inclined surface of the wedge block 243. The wedge block 243 has a first slot, and the pad block 244 has a... The adjustment base plate 210 has a through hole, through which the first guide member passes and is fixed to the slide 245. A seated bearing 242 is fixed on one side of the slide 245. The adjustment shaft is rotatably connected to the seated bearing 242, and the other end is threadedly connected to the wedge block 243. The rotating handle 241 is connected to the adjustment shaft. By rotating the handle 241, the adjustment shaft is rotated, causing the wedge block 243 and the pad block 244 to move relative to each other. The adjustment shafts are adjusted synchronously to move the adjustment base plate 210 in the Z-axis direction. The light source device is fixed directly below the center of the adjustment base plate 210 through the adapter plate 230.

[0041] As attached Figure 5As shown, in this embodiment, the lens adjustment module 300 includes four second adjustment units and a lens mounting plate 305. The second adjustment unit includes a support crossbar 301, a mounting block 302, a lower wedge 303, bolts, and an upper wedge 304. The support crossbar 301 is fixed on the frame, and a space for light to pass through is reserved in the middle. The mounting block 302 is fixed to the support crossbar 301 by bolts. The lower wedge 303 is slidably connected to the mounting block 302. The inclined surface of the upper wedge 304 is slidably engaged with the inclined surface of the lower wedge 303, and the other side is connected to the lens mounting plate 305. The lower wedge 303 is provided with a second slot, and the upper wedge 304 is provided with a through hole. After the lower wedge 303 and the upper wedge 304 are installed, the through hole of the upper wedge 304 and the second slot are connected. The lens mounting plate 305 is provided with a through hole. The bolt passes through the through hole of the lens mounting plate 305, the through hole of the upper wedge 304, and the second slot and is threadedly fixed to the mounting block 302. In use, the movable mounting block 302, constrained by the bolts, causes the upper wedge block 304 and the lower wedge block 303 to interact. The upper wedge block 304 drives the lens mounting plate 305 to adjust its height. After adjustment, tightening the bolts secures the second adjustment unit. The four sets of second adjustment units are evenly distributed around the lens optical axis, with adjacent sets of second adjustment units spaced at 90° equidistant angles. The mounting block 302 of each second adjustment unit is fixedly connected to the corresponding support crossbar 301. The multi-degree-of-freedom coordinated adjustment method of the lens adjustment module 300 is based on the following principle: the lithography lens is fixed by the lens mounting plate 305, and a spatial motion mechanism is constructed by using four sets of symmetrically arranged second adjustment units to achieve precise adjustment of four degrees of freedom: linear displacement along the Z-axis and angular displacements around three orthogonal axes, namely α-axis (pitch), β-axis (yaw), and γ-axis (rotation). The principle is that by applying driving force to one or more cooperating second adjustment units, the pitch, yaw, and rotation of the lithography lens can be adjusted. When equal synchronous radial displacement is applied to the four sets of second adjustment units, adjustment in the Z-axis direction can be achieved.

[0042] In actual use, the numerical aperture of the lithography lens in the object space is 0.26; the working wavelength of the lithography lens is 390-450nm; the working band resolution of the lithography lens is >200lp / mm; the object-side working distance of the lithography lens is >5mm; and the image-side working distance of the lithography lens is >5mm.

[0043] The sample adjustment module 400 in this embodiment consists of a sample stage and a sample adjustment mechanism. The sample adjustment mechanism adjusts the sample stage to adjust its degrees of freedom. The sample adjustment module 400 is an existing product and will not be described in detail here.

[0044] As attached Figure 1 , Figure 7 and Figure 8As shown, in this embodiment, the focusing module 500 includes a microscope adjustment mechanism and a microscopic system. The microscopic system includes a microscope tube 505, an objective lens 501, and an image sensor 504. The microscope tube 505 and the objective lens 501 are arranged at an angle. A reflecting mirror 502 is provided inside the microscope tube 505. The light generated by the light source passes sequentially through the objective lens 501, the reflecting mirror 502, and the microscope tube 505 before being captured by the image sensor 504. The image sensor 504 is connected to a control center. The microscopic system is fixed to the adjustment end of the microscope adjustment mechanism via a lens plate 503. The sample adjustment mechanism and the microscope adjustment mechanism utilize existing products.

[0045] The light source heat dissipation module 100 involved in this embodiment includes a water tank, a heat dissipation aluminum radiator, and a fan. The water tank and the heat dissipation aluminum radiator contact the adjustment base plate 210. The water tank and the heat dissipation aluminum radiator absorb the heat of the light source, and the fan is turned on to perform forced convection heat dissipation on the heat dissipation aluminum radiator and the water tank, so as to achieve efficient thermal management. In actual use, the fan is also connected to the control center by wire.

[0046] The working process of the verification machine described in this utility model is as follows:

[0047] S1. Adjust the optical platform used to mount the Micro-LED maskless lithography verification machine to a horizontal position, and place the Micro-LED maskless lithography verification machine on the optical platform.

[0048] The optical platform can be a wooden table, a metal tabletop, a glass plate, etc. The optical platform here uses a metal tabletop or a vibration-damping marble tabletop with active air-bearing vibration isolation.

[0049] S2. Place the lithography lens on the lens adjustment module 300 and adjust it to be horizontal. (Refer to...) Figure 7 The lens adjustment module 300 of this utility model includes a lens mounting plate 305 for coaxial fixed connection between the lithography lens and the light source; the lithography lens is mounted on the lens mounting plate 305; and four symmetrically distributed second adjustment units. Each second adjustment unit consists of a wedge mounting block 302, a lower wedge block 303, and an upper wedge block 304 arranged in a hierarchical assembly structure from bottom to top. The four second adjustment units are evenly arranged along the circumference of the optical axis of the lithography lens, and adjacent unit groups are spaced at equal angles of 90°.

[0050] The wedge mounting block 302 is fixed to the top of the support crossbar 301 by bolt fastening. The radial extension line of the support crossbar 301 is spatially orthogonal to the optical axis of the photolithography lens. The lower wedge block 303 forms a sliding fit with the first groove structure on the top surface of the wedge mounting block 302 through the first guide rail at its bottom. The upper wedge block 304 forms a sliding fit with the second groove structure on the top surface of the lower wedge block 303 through the second guide rail at its bottom.

[0051] The photolithography lens of this utility model is fixed by the lens mounting plate 305, and a spatial motion mechanism is constructed by four sets of symmetrically arranged second adjustment units to realize four-degree-of-freedom precise adjustment of Z-axis linear displacement and α-axis (pitch), β-axis (yaw), and γ-axis (rotation) angular displacement around three orthogonal axes.

[0052] The working principle of the Z-axis linear displacement adjustment of this utility model is as follows: by synchronously driving the lower wedge block 303 in the four lens adjustment modules 300 to translate radially and equidistantly along their respective support crossbars 301, the upper wedge block 304 will produce equal-amplitude vertical displacement, thereby realizing Z-axis adjustment.

[0053] The working principle of the α-axis pitch adjustment of this utility model is as follows: by differentially controlling the displacement of the lower wedge block 303 of the two sets of lens adjustment modules 300 that are set opposite to each other, the upper wedge block 304 forms an inclined support plane.

[0054] The principle of β-axis yaw adjustment described in this utility model is as follows: by independently adjusting the axial displacement of the lower wedge block 303 on one side, the spatial support height of the upper wedge block 304 is changed;

[0055] The principle of γ-axis rotation adjustment described in this utility model is as follows: by controlling the axial displacement distance of the lower wedge block 303 of the adjacent lens adjustment module 300, a torque effect around the Z-axis is generated.

[0056] By using the above adjustment method, the lens mounting plate 305 can be adjusted to be horizontal, thereby making the lithography lens vertical.

[0057] S3, such as Figure 2 and Figure 3 The Micro-LED light source is placed directly below the center of the adjustment base plate 210 of the light source adjustment module 200 via the adapter plate 230 and fixed with screws to achieve a stable mechanical assembly and connection. By rotating the adjustment shaft, the wedge block 243 is moved on the bottom slide 245, thereby making the adjustment base plate 210 connected above the pad block 244 horizontal, so that the Micro-LED light source is horizontal and the central optical axis of the Micro-LED light source coincides with the central optical axis of the photolithography lens.

[0058] like Figure 2 There are four first adjustment units 240. The z-axis degree of freedom and pitch angle of the adjustment substrate 210 can be adjusted through the four first adjustment units, so that the light source adjustment module 200 is horizontal. The Micro-LED light source can generate the required photolithography pattern. The emitted light can be collimated by existing technology, so that it can be used.

[0059] When the four first adjustment units 240 are adjusted to the same degree, the z-axis degree of freedom of the adjustment substrate 210 can be adjusted. When the four first adjustment units 240 are adjusted to different degrees, the pitch angle of the adjustment substrate 210 can be adjusted.

[0060] S4. Adjust the X, Y, Z axes, α, and β axes (five degrees of freedom) using the sample adjustment module 400 to level the sample stage. Place the focus detection grid plate on the sample stage, and then focus.

[0061] The microscope adjustment mechanism below the image sensor 504 includes a z-axis adjustment module 510, a y-axis adjustment module 520, and an x-axis adjustment module 530. Its adjustment range is as follows: X and Y axis stage travel 25 mm, stage size 65*65 mm, unit scale line 10 micrometers; Z axis stage travel 25 mm, stage size 90*90 mm, unit scale line 10 micrometers.

[0062] The x-axis, y-axis and z-axis degrees of freedom in the microscope adjustment mechanism are determined by the z-axis adjustment module 510, the y-axis adjustment module 520 and the x-axis adjustment module 530; the objective lens spatial pose is adjusted by the microscope adjustment mechanism so that the central optical axis of the objective lens is aligned with the normal of the surface of the focusing grid plate.

[0063] Reference Figure 7 The lithographic image after passing through objective lens 501 is reflected by mirror 502 and then passed through lens barrel 505, and is received by image sensor 504 on lens plate 503; the image sensor 504 synchronously acquires the lithographic image of superimposed grid.

[0064] Next, we will conduct coke detection analysis:

[0065] The image processing unit performs the following operations:

[0066] a) Mesh template matching to eliminate image shift caused by mechanical vibration;

[0067] b) Calculate the gradient sharpness of the local area and generate a full-field defocus distribution map;

[0068] c) Feedback control z-axis adjustment module compensates for defocus until the threshold is met (e.g., gradient value ≥ preset value).

[0069] By completing the above steps, the focus can be checked, thereby finding the correct observation position.

[0070] S5. Remove the focus detection grid plate and place the sample wafer, typically a silicon substrate, which possesses excellent electrical and thermal properties, providing stable structural support. Turn on the power switch of the Micro-LED light source to perform photolithography. The fan must be turned off during the photolithography process to prevent errors caused by fan vibration.

[0071] S6. After photolithography is completed, remove the sample, turn off the power switch of the Micro-LED light source, and at the same time turn on the cooling fan to perform forced convection cooling of the heat sink and water tank to achieve efficient thermal management.

[0072] In the description of this application, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0073] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art will understand the specific meaning of the above terms in this application based on the specific circumstances.

Claims

1. A photolithography verification machine, characterized in that, include: A light source adjustment module includes multiple independently adjustable first adjustment units and an adjustment base plate, wherein the adjustment base plate is connected to the adjustment ends of the multiple first adjustment units; and a light source is connected to the adjustment base plate. The lens adjustment module includes multiple independently adjustable second adjustment units, the adjustment ends of which are all connected to a lens mounting plate, and the lens mounting plate is located on the propagation path of the light source. A sample adjustment module, comprising an adjustable sample stage, wherein the sample stage is disposed on the propagation path of the light source; The focus detection module has its inlet end set corresponding to the light source and is used to acquire real-time photolithography images. The light source passes through the lens adjustment module and the sample adjustment module before entering the focus detection module.

2. The photolithography verification machine according to claim 1, characterized in that, Multiple first adjustment units are evenly distributed on the edge of the adjustment substrate, and multiple second adjustment units are evenly distributed on the edge of the lens mounting plate.

3. The photolithography verification machine according to claim 1, characterized in that, The adjacent second adjustment units are arranged at a 90° angle.

4. The photolithography verification machine according to claim 1, characterized in that, The first adjustment unit includes a slide block, a wedge block, and a pad. The slide block is fixedly mounted, and the slide block and the wedge block are slidably engaged. The pad block is slidably connected to the wedge-shaped surface of the wedge block. The wedge block has a first groove, and the pad block has a through hole. A first guide member passes through the through hole and the first groove and is fixed to the slide block. A seated bearing is fixed on one side of the slide; the adjusting shaft is rotatably connected to the seated bearing, and the other end is threadedly connected to the wedge block; the rotating handle is connected to the adjusting shaft, and rotating the adjusting shaft by rotating the handle causes the wedge block and the pad block to move relative to each other.

5. The photolithography verification machine according to claim 4, characterized in that, The adjustment base plate is provided with a through hole, and the first guide part is placed in the through hole.

6. The photolithography verification machine according to claim 1, characterized in that, The second adjustment unit includes a support crossbar, a mounting block, a lower wedge, a bolt, and an upper wedge. The supporting crossbar is fixedly installed, the mounting block is fixed to the supporting crossbar, the lower wedge block is slidably connected to the mounting block, the lower wedge block is provided with a second groove, the inclined surface of the upper wedge block is slidably engaged with the inclined surface of the lower wedge block, and the opposite surface of the inclined surface of the upper wedge block contacts the lens mounting plate. The bolt passes through the through hole in the lens mounting plate, the through hole in the upper wedge, and the threaded second slot to fix it to the mounting block.

7. The photolithography verification machine according to claim 6, characterized in that, The top of the upper wedge is hemispherical.

8. The photolithography verification machine according to claim 1, characterized in that, It also includes a light source heat dissipation module, which includes a water tank, a heat dissipation aluminum radiator, and a fan, and the water tank, heat dissipation aluminum radiator, and fan are fixed to one side of the light source.

9. The photolithography verification machine according to claim 1, characterized in that, The focusing module includes a microscope system and a microscope adjustment mechanism. The adjustment end of the microscope adjustment mechanism is connected to the microscope system and is used to adjust the position of the microscope system. The microscope system includes a microscope tube, an objective lens, and an image sensor. A reflector is provided inside the microscope tube. The light generated by the light source passes through the objective lens, the reflector, and the microscope tube in sequence before being captured by the image sensor.

10. The photolithography verification machine according to any one of claims 1 to 9, characterized in that, The light source adjustment module, lens adjustment module, sample image adjustment module, and focus detection module are supported at intervals from top to bottom by a frame.

Images