Diaphragm type substrate processing apparatus
By designing the support, carrier, and isolation structure of the diaphragm-type substrate processing device, the leakage problem between the substrate and the carrier was solved, achieving effective sealing of the liquid and corrosion protection of the negative pressure chamber.
Patent Information
- Application Number
- CN202423250301.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-27
- Publication Date
- 2025-12-12
- Estimated Expiration
- 2034-12-27
AI Technical Summary
In existing substrate processing equipment, during the processing, the chemical solution can easily seep into the gap between the substrate and the carrier and corrode the negative pressure pipeline through the pores, leading to leakage problems.
It adopts a diaphragm structure, which includes a support base, a carrier, and an isolation structure. It uses negative pressure to make the substrate and the diaphragm fit tightly, and the isolation structure prevents the liquid medicine from seeping into the negative pressure chamber and corroding the pipeline.
It effectively prevents drug leakage, protects negative pressure pipelines, and ensures the stability and reliability of the processing.
Smart Images
Figure CN223665435U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to a substrate processing device, especially a film type substrate processing device capable of preventing leakage. BACKGROUND
[0002] The existing substrate processing device generally has a carrier for carrying a substrate to be processed, and the substrate to be processed is placed on a base by the carrier for processing. Negative pressure suction is a means for fixing the substrate. Generally, the carrier has a hole, and the substrate can be adsorbed on the top of the carrier by configuring a negative pressure pipeline at the bottom of the carrier to provide negative pressure. However, since the substrate and the carrier are in plane-to-plane contact, it is difficult to completely seal, and when the substrate is processed on the top of the carrier, the chemical liquid used in the processing process can easily penetrate into the gap between the substrate and the carrier and further penetrate into the negative pressure pipeline at the bottom of the carrier through the hole of the carrier, thereby corroding the negative pressure pipeline.
[0003] Therefore, the utility model is aimed at the above-mentioned prior art, and the problems are solved by careful research and the use of theory, which is the improvement target of the utility model. SUMMARY
[0004] The utility model provides a film type substrate processing device capable of preventing leakage.
[0005] The utility model provides a film type substrate processing device, which is used for carrying and processing a circular substrate, and comprises a carrying seat, a carrier and an isolation structure. The carrying seat has a negative pressure chamber. The carrier comprises an outer frame and a diaphragm arranged in the outer frame. The outer edge of the diaphragm is fixed to the outer frame, and the diaphragm is stacked on the carrying seat to close the negative pressure chamber. The diaphragm has a working surface, and a plurality of through holes penetrating the diaphragm are arranged at the position of the working surface corresponding to the negative pressure chamber. The isolation structure is used for carrying the circular substrate, and the isolation structure is protrudingly arranged on the working surface of the diaphragm to arrange the circular substrate and the working surface of the diaphragm in a spaced manner.
[0006] In an embodiment of the utility model, the top of the isolation structure is arranged along a carrying plane, and the carrying plane is arranged in a spaced manner with the working surface of the diaphragm.
[0007] In an embodiment of the utility model, the isolation structure comprises a plurality of ring ribs integrally formed in the diaphragm. The ring ribs are protrudingly arranged on the working surface of the diaphragm and arranged in a concentric manner. Each ring rib has a top edge, and the top edges are coplanarly arranged to define a carrying plane.
[0008] In an embodiment of the utility model, the ring ribs comprise one ring rib, and the through holes are arranged within the range surrounded by the ring rib.
[0009] In an embodiment of the utility model, the ring rib is arranged corresponding to the edge of the circular substrate.
[0010] In an embodiment of the utility model, the isolation structure has a plate body, the plate body is stacked on the working surface of the diaphragm, and the bearing plane is defined on the top of the plate body.
[0011] In an embodiment of the utility model, the through holes are arranged within the range surrounded by the periphery of the plate body.
[0012] In an embodiment of the utility model, a plurality of channels are arranged in the positions corresponding to the through holes of the plate body, and each channel is connected between the bearing plane and the corresponding through hole.
[0013] In an embodiment of the utility model, the periphery of the plate body is located within the periphery of the circular substrate, and the periphery of the plate body is arranged at intervals with the periphery of the circular substrate.
[0014] When the circular substrate is processed in the diaphragm type substrate processing device, the circular substrate is stacked on the working surface of the diaphragm, and the circular substrate is carried on the bearing plane defined by the shape of the isolation structure, so as to be arranged at intervals with the working surface. When the circular substrate is processed, the structure can avoid the process liquid from penetrating into the negative pressure chamber through the gap between the circular substrate and the working surface of the diaphragm, so as to cause the corrosion of the pipeline.
[0015] The utility model is described in detail below in combination with the drawings and specific embodiments, but is not limited to the utility model. BRIEF DESCRIPTION OF DRAWINGS
[0016] Figure 1 It is a perspective view of the diaphragm type substrate processing device of the first embodiment of the utility model.
[0017] Figure 2 It is a top view of the diaphragm type substrate processing device of the first embodiment of the utility model.
[0018] Figure 3 It is a sectional view of the diaphragm type substrate processing device of the first embodiment of the utility model.
[0019] Figure 4 It is a partial enlarged view of Figure 3
[0020] Figure 5 It is a perspective view of the diaphragm type substrate processing device of the second embodiment of the utility model.
[0021] Figure 6 It is a top view of the diaphragm type substrate processing device of the second embodiment of the utility model.
[0022] Figure 7 It is a sectional view of the diaphragm type substrate processing device of the second embodiment of the utility model.
[0023] Figure 8 It isFigure 7 Enlarged view of a specific area.
[0024] In the attached figures, the following labels are used:
[0025] 10: Circular substrate
[0026] 100: Support seat
[0027] 101: Negative Pressure Chamber
[0028] 200: Vehicles
[0029] 210: Outer frame
[0030] 220: Membrane
[0031] 221: Working face
[0032] 222: Back
[0033] 223: Through hole
[0034] 224: Fasteners
[0035] 300: Isolation Structure
[0036] 301: Bearing plane
[0037] 310: Ring rib
[0038] 311: Top Edge
[0039] 310a: Support rib
[0040] 311a: Apex
[0041] 320:Plate body
[0042] 323: Channel
[0043] 324: Trench Detailed Implementation
[0044] In the description of this utility model, it should be understood that the terms "front side", "rear side", "left side", "right side", "front end", "rear end", "end", "longitudinal", "lateral", "vertical", "top", "bottom", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this utility model and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting conditions of this utility model.
[0045] Unless otherwise defined, terms such as "substantially" and "approximately" are used to describe and narrate small changes. When combined with an event or situation, the term may include the exact moment the event or situation occurred, or an approximate point in time. For example, when combined with a numerical value, the term may include a range of variation less than or equal to ±10% of the value, such as less than or equal to ±5%, less than or equal to ±4%, less than or equal to ±3%, less than or equal to ±2%, less than or equal to ±1%, less than or equal to ±0.5%, less than or equal to ±0.1%, or less than or equal to ±0.05%.
[0046] The detailed description and technical content of this utility model will be explained in conjunction with the accompanying drawings. However, the accompanying drawings are for illustrative purposes only and are not intended to limit the scope of this utility model.
[0047] Figure 1 This is a three-dimensional schematic diagram of the diaphragm substrate processing device according to the first embodiment of the present invention. Figure 2 This is a top view of the diaphragm substrate processing apparatus according to the first embodiment of the present invention. Figure 3 This is a cross-sectional view of the diaphragm substrate processing apparatus according to the first embodiment of the present invention. Figure 4 for Figure 3 A magnified view of a portion of the image.
[0048] See Figures 1 to 4 The first embodiment of this utility model provides a diaphragm substrate processing device for carrying and processing a circular substrate 10, and includes a support 100, a carrier 200 and an isolation structure 300.
[0049] The support 100 is generally in the shape of a true column and can rotate along its central axis. The support 100 has a negative pressure chamber 101, which is disposed at the top of the support 100 and can be open at the top of the support 100. The negative pressure chamber 101 can be connected to a negative pressure source through a pipeline.
[0050] A carrier 200 is disposed on top of a support 100 and is used to support a circular substrate 10 so as to place the circular substrate 10 on the support 100. In this embodiment, the carrier 200 includes an outer frame 210 and a diaphragm 220 disposed within the outer frame 210, with the outer edge of the diaphragm 220 fixed to the outer frame 210. Specifically, the diaphragm 220 has a working surface 221 and a back surface 222 opposite to the working surface 221. A fastener 224 is protruding on the back surface 222 at the outer edge of the diaphragm 220, and the diaphragm 220 is fixed to the outer frame 210 by fastening the fastener 224. The diaphragm 220 is stacked on top of the support 100 and closes the negative pressure chamber 101 with its back surface 222. The diaphragm 220 has a plurality of through holes 223 penetrating the diaphragm 220 at the position corresponding to the negative pressure chamber 101 on its working surface 221, and each through hole 223 is connected to the negative pressure chamber 101.
[0051] An isolation structure 300 is used to support the circular substrate 10. The isolation structure 300 protrudes from the working surface 221 of the diaphragm 220, such that the circular substrate 10 and the working surface 221 of the diaphragm 220 are spaced apart. In this embodiment, the top of the isolation structure 300 is disposed along a bearing plane 301, and the bearing plane 301 is spaced apart from the working surface 221 of the diaphragm 220. Specifically, the isolation structure 300 includes a ring rib 310, which is integrally formed on the diaphragm 220 and protrudes from the working surface 221 of the diaphragm 220. The ring rib 310 has a top edge 311 that defines the bearing plane 301, and the ring rib 310 is disposed corresponding to the edge of the circular substrate 10. In this embodiment, the through holes 223 are disposed within the area enclosed by the ring rib 310.
[0052] In this embodiment, the isolation structure 300 further includes a plurality of support ribs 310a. The support ribs 310a are integrally formed on the diaphragm 220 and protrude from the working surface 221 of the diaphragm 220, and these support ribs 310a are disposed within the area enclosed by the annular ribs 310. Each support rib 310a has a top edge 311a, and these top edges 311a of the support ribs 310a are coplanarly disposed on the bearing plane 301. Specifically, the support ribs 310a can be circular or arc-shaped and concentrically disposed with the annular ribs 310.
[0053] When the circular substrate 10 is processed in the diaphragm substrate processing apparatus of this embodiment, the circular substrate 10 is stacked on the working surface 221 of the diaphragm 220, and the circular substrate 10 is supported on the bearing plane 301 defined by the shape of the isolation structure 300, thus being spaced apart from the working surface 221. One side of the edge of the circular substrate 10 is stacked on the top edge 311 of the ring rib 310. The negative pressure source establishes a negative pressure in the negative pressure chamber 101, causing the circular substrate 10 to be attracted towards the working surface 221 by the negative pressure of each through hole 223, thereby compressing the ring rib 310 and sealing the circular substrate 10 and the diaphragm 220. The support rib 310a can support the circular substrate 10 to prevent the circular substrate 10 from bending under negative pressure. When the other side of the circular substrate 10 is processed, the aforementioned structure can prevent the process solution from seeping into the negative pressure chamber 101 through the gap between the circular substrate 10 and the diaphragm 220 and corroding the pipeline.
[0054] Figure 5 This is a three-dimensional schematic diagram of the membrane substrate processing device according to the second embodiment of the present invention. Figure 6 This is a top view of the membrane substrate processing apparatus according to the second embodiment of the present invention. Figure 7 This is a cross-sectional view of the membrane substrate processing apparatus according to the second embodiment of the present invention. Figure 8 for Figure 7 Enlarged view of a specific area.
[0055] See Figures 5 to 8 The second embodiment of this utility model provides a diaphragm substrate processing device for carrying and processing a circular substrate 10, and includes a support 100, a carrier 200 and an isolation structure 300.
[0056] The support 100 is generally in the shape of a true column and can rotate along its central axis. The support 100 has a negative pressure chamber 101, which is disposed at the top of the support 100 and can be open at the top of the support 100. The negative pressure chamber 101 can be connected to a negative pressure source through a pipeline.
[0057] A carrier 200 is disposed on top of a support 100 and is used to support a circular substrate 10 so as to place the circular substrate 10 on the support 100. In this embodiment, the carrier 200 includes an outer frame 210 and a diaphragm 220 disposed within the outer frame 210, with the outer edge of the diaphragm 220 fixed to the outer frame 210. Specifically, the diaphragm 220 has a working surface 221 and a back surface 222 opposite to the working surface 221. The outer edge of the working surface 221 of the diaphragm 220 is embedded in the outer frame 210 and attached and fixed to the outer frame 210. The diaphragm 220 is stacked on top of the support 100 and its back surface 222 closes the negative pressure chamber 101. The diaphragm 220 has a plurality of through holes 223 at the position of its working surface 221 corresponding to the position of the negative pressure chamber 101, and each through hole 223 is connected to the negative pressure chamber 101.
[0058] An isolation structure 300 is used to support the circular substrate 10. The isolation structure 300 protrudes from the working surface 221 of the diaphragm 220, such that the circular substrate 10 and the working surface 221 of the diaphragm 220 are spaced apart. In this embodiment, the top of the isolation structure 300 is disposed along a bearing plane 301, and the bearing plane 301 is spaced apart from the working surface 221 of the diaphragm 220. Specifically, the isolation structure 300 has a plate 320, which is stacked on the working surface 221 of the diaphragm 220, and the bearing plane 301 is defined on the top of the plate 320. The through holes 223 of the diaphragm 220 are disposed within the area enclosed by the periphery of the plate 320. The plate 320 is provided with a plurality of channels 323, each channel 323 penetrating both sides of the plate 320 and corresponding to the positions of the through holes 223 on the diaphragm 220. Each channel 323 is connected between the bearing plane 301 and the corresponding through hole 223. A channel connecting these channels 323 can be further provided on the top of the plate 320.
[0059] In this embodiment, the isolation structure 300 further includes a plurality of support ribs 310a. The support ribs 310a are integrally formed on the diaphragm 220 and protrude from the working surface 221 of the diaphragm 220, and these support ribs 310a are disposed within the area enclosed by the annular ribs 310. Each support rib 310a has a top edge 311a, and these top edges 311a of the support ribs 310a are coplanarly disposed on the bearing plane 301. Specifically, the support ribs 310a can be circular or arc-shaped and concentrically disposed with the annular ribs 310.
[0060] When the circular substrate 10 is processed in the diaphragm substrate processing apparatus of this embodiment, the circular substrate 10 is stacked on the working surface 221 of the diaphragm 220, and the circular substrate 10 is supported on the bearing plane 301 defined by the shape of the isolation structure 300, thus being spaced apart from the working surface 221. One side of the circular substrate 10 is stacked on the plate body 320, and the periphery of the plate body 320 is located within the periphery of the circular substrate 10. A negative pressure source establishes a negative pressure in the negative pressure chamber 101, causing the circular substrate 10 to be attracted by the negative pressure of each through hole 223 and adsorbed onto the plate body 320. The channels on the top of the plate body 320 can disperse the negative pressure at these channels 323, so that the negative pressure exerted on the circular substrate 10 is uniform. When the other side of the circular substrate 10 is processed, the aforementioned structure can prevent the process solution from seeping into the negative pressure chamber 101 through the gap between the circular substrate 10 and the plate body 320, thus preventing corrosion of the pipeline.
[0061] The above description is only a preferred embodiment of the present utility model and is not intended to limit the patent scope of the present utility model. Other equivalent changes that utilize the patent spirit of the present utility model should all fall within the patent scope of the present utility model.
[0062] Of course, there may be other embodiments of this utility model. Without departing from the spirit and essence of this utility model, those skilled in the art can make various corresponding changes and modifications based on this utility model, but these corresponding changes and modifications should all fall within the protection scope of the claims of this utility model.
Claims
1. A diaphragm-type substrate processing apparatus for carrying and processing a circular substrate, characterized in that, Include: A support base with a negative pressure chamber; A carrier includes an outer frame and a diaphragm disposed within the outer frame. The outer edge of the diaphragm is fixed to the outer frame, and the diaphragm is stacked on a support to close a negative pressure chamber. The diaphragm has a working surface, and a plurality of through holes are provided on the working surface corresponding to the negative pressure chamber. An isolation structure for supporting the circular substrate is provided on the working surface of the diaphragm, such that the circular substrate and the working surface of the diaphragm are spaced apart.
2. The diaphragm substrate processing apparatus according to claim 1, characterized in that, The top of the isolation structure is disposed along a bearing plane, and the bearing plane is spaced apart from the working surface of the diaphragm.
3. The diaphragm substrate processing apparatus according to claim 2, characterized in that, The isolation structure includes an annular rib integrally formed on the diaphragm, the annular rib protruding from the working surface of the diaphragm, the annular rib having a top edge, and the top edge of the annular rib defining the bearing plane.
4. The diaphragm substrate processing apparatus according to claim 3, characterized in that, The isolation structure includes a plurality of support ribs integrally formed on the diaphragm, the plurality of support ribs protruding from the working surface of the diaphragm, each support rib having a top edge, and the top edges of the plurality of support ribs being coplanarly arranged on the bearing plane.
5. The diaphragm substrate processing apparatus according to claim 4, characterized in that, The multiple support ribs are arranged within the area enclosed by the ring rib.
6. The diaphragm substrate processing apparatus according to claim 3, characterized in that, The multiple through holes are arranged within the area enclosed by the ring rib.
7. The diaphragm substrate processing apparatus according to claim 6, characterized in that, The ring rib is configured corresponding to the edge of the circular substrate.
8. The diaphragm substrate processing apparatus according to claim 2, characterized in that, The isolation structure has a plate that is stacked on the working surface of the diaphragm, and the bearing plane is defined on the top of the plate.
9. The diaphragm substrate processing apparatus according to claim 8, characterized in that, The multiple through holes are arranged within the area enclosed by the perimeter of the plate.
10. The diaphragm substrate processing apparatus according to claim 8, characterized in that, The plate is provided with multiple channels corresponding to the multiple through holes, and each channel is connected between the bearing plane and the corresponding through hole.
11. The diaphragm substrate processing apparatus according to claim 8, characterized in that, The periphery of the plate is located within the periphery of the circular substrate, and the periphery of the plate is spaced apart from the periphery of the circular substrate.