Filtering system of polishing equipment

Abstract

The utility model relates to the technical field of chemical mechanical polishing, and discloses a filtering system of polishing equipment, which comprises the polishing equipment, the primary filtering part is communicated with the polishing equipment; a filter screen is arranged in the primary filtering part; a liquid inlet of the second liquid storage tank is communicated with the primary filtering part, and a liquid outlet of the second liquid storage tank is communicated with polishing equipment; a filter; a liquid inlet of the stirring equipment is communicated with the second liquid storage tank, and a liquid outlet of the stirring equipment is communicated with the polishing equipment; a supplementary device; a first valve; a second valve; according to the filtering system of the polishing equipment, provided by the utility model, before the filter purifies the polishing solution, the primary filtering part can effectively intercept and remove impurity particles with larger volumes in the polishing solution, so that the impurity particles are prevented from blocking the filter element in the subsequent purification treatment; the supplementing device can supplement necessary additives in time, recover the original performance of the polishing solution, ensure the stability and high efficiency of polishing operation, realize direct backflow of the polishing solution or backflow after regeneration treatment, and improve the production efficiency.

Description

TECHNICAL FIELD

[0001] The utility model relates to chemical mechanical polishing technical field, concretely relates to a polishing equipment filtering system. BACKGROUND

[0002] Chemical mechanical polishing, abbreviated as CMP, is an advanced surface treatment technology, which is widely used in the fields of semiconductor manufacturing, optical device processing and precision mechanical component manufacturing.

[0003] As the core material of CMP process, the quality and performance of polishing liquid are directly related to polishing efficiency, surface quality and material removal rate.

[0004] In the related technical field, the polishing equipment often purifies the polishing liquid by means of the filtering system, however, in the traditional polishing equipment filtering system, due to the high content of solid particles in the polishing liquid, the filter element in the filter is easy to be blocked, which affects the polishing efficiency and continuity, secondly, the composition of the polishing liquid is continuously consumed after multiple recycling, which reduces the effectiveness of the polishing liquid, the purity of the polishing liquid cannot reach the ideal state, and the polishing quality is affected. UTILITY MODEL CONTENTS

[0005] Therefore, the utility model provides a polishing equipment filtering system to solve the defects that the filter element in the filter is easy to be blocked and the effectiveness of the polishing liquid is reduced after multiple recycling in the traditional polishing equipment filtering system when processing the polishing liquid, which causes the problem of affecting the polishing operation.

[0006] The utility model provides a polishing equipment filtering system, which comprises a polishing equipment, a primary filtering part in communication with the polishing equipment, a filter screen inside the primary filtering part, a second liquid storage tank in communication with the primary filtering part at an inlet and in communication with the polishing equipment at an outlet, a filter arranged between the primary filtering part and the second liquid storage tank, a stirring equipment in communication with the second liquid storage tank at an inlet and in communication with the polishing equipment at an outlet, a supplementing device arranged between the stirring equipment and the second liquid storage tank, a first valve arranged at a pipeline connecting the second liquid storage tank and the polishing equipment, and a second valve arranged at a pipeline between the second liquid storage tank and the supplementing device.

[0007] In an alternative embodiment, the primary filtering unit further comprises a first liquid storage tank, and the filter screen is arranged inside the first liquid storage tank; the polishing device is connected with a liquid outlet pipe and a liquid return pipe, and the first liquid storage tank is connected with the liquid outlet pipe; the second liquid storage tank is connected with the first liquid storage tank through a first pipeline, and the filter is arranged at the first pipeline; the second liquid storage tank is connected with the liquid return pipe through a first branch, and the first valve is arranged at the first branch; the stirring device is connected with the second liquid storage tank through a second pipeline, and the replenishing device and the second valve are arranged at the second pipeline in sequence, and the second valve is located at the upstream side of the replenishing device; the stirring device is connected with the liquid return pipe through a second branch.

[0008] In an alternative embodiment, the filter comprises a detachable cover and a cylinder, and a filter core is arranged inside the filter; the filter core is connected with the cover at the end thereof, and at least a part of the filter core is arranged inside the cylinder.

[0009] In an alternative embodiment, the filter screen corresponds to the inlet of the first liquid storage tank, and is adapted to make the introduced polishing liquid flow into the first liquid storage tank after passing through the filter screen.

[0010] In an alternative embodiment, a third valve is arranged at the first pipeline and located at the outlet side of the first liquid storage tank; and the third valve is located at the upstream side of the filter.

[0011] In an alternative embodiment, a fourth valve is arranged at the second branch and located at the outlet side of the stirring device.

[0012] In an alternative embodiment, a connecting end is arranged at the cover, and the cylinder is detachably connected with the connecting end.

[0013] In an alternative embodiment, a plurality of filters are arranged at the first pipeline in intervals; and a plurality of replenishing devices are arranged at the second pipeline in intervals.

[0014] In an alternative embodiment, the filter further comprises a detection member arranged at the cover, and a sealing member arranged around the cylinder and adapted to detachably connect the cylinder with the cover.

[0015] In an alternative embodiment, the stirring device is an ultrasonic stirrer.

[0016] Beneficial effects: By setting a primary filter part in the system, the primary filter part can effectively intercept and remove larger impurity particles in the polishing liquid, such as dislodged abrasives, debris or other coarse solid waste generated during polishing, before the filter purifies the polishing liquid, preventing it from clogging the filter core in subsequent filtration and purification treatment, greatly reducing the burden on the filter core, prolonging the service life of the filter core, and reducing maintenance costs; By setting a supplement device in the system, when the polishing liquid is used for a high number of cycles and the purity decreases, necessary additives can be supplemented in time to restore the original performance of the polishing liquid and ensure the stability and efficiency of the polishing operation. In addition, by setting a second branch at the second liquid tank, the polishing liquid can be directly returned or returned after regeneration treatment, optimizing the polishing liquid circulation process and improving production efficiency.

[0017] Beneficial effects: The cover part and the barrel part are detachably connected, facilitating the user to disassemble and assemble the filter, simplifying the replacement and maintenance process of the filter core, and effectively reducing maintenance costs and time; The filter core is composed of multiple layers of filter materials with different pore sizes to achieve fractional filtration of different size particle impurities in the polishing liquid; The outer layer adopts a coarse filter material with a larger pore size and stronger interception capacity to intercept larger particle impurities, reducing the burden on the subsequent fine filter layer and prolonging its service life; The inner layer adopts a fine filter material with a smaller pore size and higher filtration precision, which can effectively remove small particles, colloidal substances and part of the dissolved impurities, thereby meeting the requirements of polishing operation. BRIEF DESCRIPTION OF DRAWINGS

[0018] In order to more clearly illustrate the specific embodiments of the present application or the technical solutions in the prior art, the drawings needed in the specific embodiments or prior art description will be briefly introduced as follows. Obviously, the drawings in the following description are some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor.

[0019] Figure 1 It is a schematic diagram of the polishing equipment filter system of the present application.

[0020] Figure 2 It is an exploded schematic diagram of the filter of the present application.

[0021] Explanation of reference signs:

[0022] 1, polishing equipment;11, liquid outlet pipe;12, liquid return pipe;2, primary filter part;21, first liquid storage tank;22, filter screen;3, second liquid storage tank;31, first branch;311, first valve;4, first pipeline;41, third valve;5, filter;51, cover part;511, connecting end;52, cylinder part;521, liquid outlet end;522, fifth valve;53, filter element;54, sealing element;55, detection element;6, stirring equipment;61, second branch;611, fourth valve;7, second pipeline;71, second valve;8, supplement device. DETAILED DESCRIPTION

[0023] In order to make the purpose, technical scheme and advantages of the embodiments of the present application more clear, the technical scheme in the embodiments of the present application will be described clearly and completely below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are some embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without making creative efforts fall within the scope of protection of the present application.

[0024] In the description of the present application, it should be noted that the orientations or positional relationships indicated by the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like are based on the orientations or positional relationships shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", "third" are only for the purpose of description, and cannot be understood as indicating or implying relative importance.

[0025] In the description of the present application, it should be noted that, unless otherwise explicitly specified and limited, the terms "mounting", "connection", "connection" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected;It can be mechanically connected, or it can be electrically connected;It can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0026] In addition, the technical features involved in the different embodiments of the present application described below can be combined with each other as long as there is no conflict between them.

[0027] The embodiments of the present application will be described below in combination with Figures 1 to 2 .

[0028] According to the embodiment of the utility model, provide a kind of polishing equipment 1 filtering system, comprising: polishing equipment 1;Primary filter part 2, with polishing equipment 1 intercommunication;The primary filter part 2 inside has filter screen 22;Second liquid storage tank 3, inlet with the primary filter part 2 intercommunication, outlet with polishing equipment 1 intercommunication;Filter 5, between the primary filter part 2 with second liquid storage tank 3;Stirring equipment 6, inlet with the second liquid storage tank 3 intercommunication, outlet with polishing equipment 1 intercommunication;Supplement device 8, between the stirring equipment 6 with second liquid storage tank 3;First valve 311, at the place of second liquid storage tank 3 and the pipeline of polishing equipment 1 interface;Second valve 71, at the place of second liquid storage tank 3 and the pipeline between supplement device 8.

[0029] Specifically, the polishing equipment 1 is used for polishing and grinding work; the polishing equipment 1 is communicated with the liquid outlet pipe 11, and the liquid outlet pipe 11 is used for leading out the polishing liquid after use; the polishing equipment 1 is also communicated with the liquid return pipe 12, and the liquid return pipe 12 is used for introducing the polishing liquid treated by purification into the polishing equipment 1; the primary filter part 2 includes the first liquid storage tank 21 and the filter screen 22 arranged in the first liquid storage tank 21, the filter screen 22 can filter out large particle impurities in the polishing liquid, and prevent the filter core 53 in the filter 5 from being blocked in the subsequent purification process; the first liquid storage tank 21 is communicated with the liquid outlet pipe 11; the second liquid storage tank 3 is communicated with the first liquid storage tank 21 by means of the first pipeline 4; the filter 5 is arranged at the first pipeline 4 and used for filtering and purifying the polishing liquid; wherein the second liquid storage tank 3 is suitable for temporarily storing the polishing liquid filtered and purified, and the second liquid storage tank 3 is communicated with the liquid return pipe 12 by means of the first branch 31, the first valve 311 is arranged at the first branch 31, and the opening and closing of the first valve 311 can control the on-off of the first branch 31; the stirring equipment 6 is communicated with the second liquid storage tank 3 by means of the second pipeline 7; the supplement device 8 is arranged at the second pipeline 7 and is suitable for supplementing additives to the polishing liquid, the additives can be but are not limited to oxidizing agents and PH regulators, and are used for ensuring the purity and effectiveness of the polishing liquid; the stirring equipment 6 is used for stirring the polishing liquid, so that the subsequently supplemented additives are mixed with the original liquid; the second valve 71 is arranged at the second pipeline 7 and located on the upstream side of the supplement device 8; wherein the stirring equipment 6 is communicated with the liquid return pipe 12 by means of the second branch 61.

[0030] The working process of the polishing equipment 1 filtering system is as follows: the used polishing liquid is guided out of the polishing equipment 1, flows to the primary filtering part 2 through the liquid outlet pipe 11, and the first liquid storage tank 21 of the primary filtering part 2 is provided with at least one layer of filter screen 22 which is hung and opened in the tank, the polishing liquid passes through the filter screen 22 and enters the tank, the filter screen 22 is used for preliminarily filtering the polishing liquid, and can effectively intercept and remove relatively large impurity particles in the polishing liquid, such as the abrasive, debris or other coarse solid waste generated in the polishing process, so as to prevent the polishing liquid from being blocked in the subsequent filtering and purifying treatment, and greatly reduce the burden of the filter core 53.

[0031] The polishing liquid flows from the first liquid storage tank 21 to the filter 5 through the first pipeline 4, and the filter 5 performs filtering and purifying treatment on the polishing liquid; when the filter 5 works, the probability of the filter core 53 being blocked is greatly reduced due to the reduction of large particle impurities in the polishing liquid, because the large impurities which may cause the filter core 53 to be rapidly blocked have been effectively removed, the service life of the filter core 53 of the filter 5 is prolonged, and the downtime caused by frequent replacement of the filter core 53 is reduced.

[0032] After the polishing liquid is purified by the filter 5, the polishing liquid flows to the second liquid storage tank 3; according to the actual use condition, if the number of recycling of the polishing liquid is low and the performance of the polishing liquid is still stable, the second valve 71 is kept closed and the first valve 311 is kept open, so that the purified polishing liquid directly flows through the first branch 31 without additional treatment, directly flows to the liquid return pipe 12, and then flows to the polishing equipment 1 for use; if the number of recycling of the polishing liquid is high and the purity of the polishing liquid is low, the first valve 311 is kept closed to block the path of the polishing liquid directly flowing to the liquid return pipe 12, the second valve 71 is opened to guide the polishing liquid to enter the second pipeline 7, the supplement device 8 supplements the additive into the polishing liquid to restore the original performance of the polishing liquid, the polishing liquid containing the newly supplemented additive flows into the stirring device 6, the stirring device 6 fully mixes the newly added additive with the original polishing liquid, and the polishing liquid meeting the polishing operation requirements is obtained; the polishing liquid flows to the polishing equipment 1 for use through the second branch 61 and the liquid return pipe 12.

[0033] It should be noted that the first liquid storage tank 21, the second liquid storage tank 3 and the stirring device 6 are respectively provided with a pump body which can be but is not limited to a peristaltic pump, and is used for providing necessary power for the flow of the polishing liquid to enable the polishing liquid to normally flow.

[0034] In this embodiment, by setting the primary filter part 2 in the system, the primary filter part 2 can effectively intercept and remove larger impurity particles in the polishing liquid, such as shed abrasive, debris or other coarse solid waste generated during polishing, before the filter 5 purifies the polishing liquid, preventing it from clogging the filter core 53 in subsequent filtration and purification treatment, greatly reducing the burden on the filter core 53, prolonging the service life of the filter core 53, and reducing maintenance costs; By setting the supplement device 8 in the system, when the polishing liquid is used for a high number of times and the purity decreases, necessary additives can be supplemented in time to restore the original performance of the polishing liquid and ensure the stability and efficiency of the polishing operation. In addition, by setting the second branch 61 at the second liquid tank 3, the direct return flow or return flow after regeneration treatment of the polishing liquid is realized, optimizing the polishing liquid circulation process and improving production efficiency.

[0035] In some embodiments, in combination with Figure 2 As shown, the filter 5 includes a detachably connected cover part 51 and a barrel part 52; the filter 5 is provided with a filter core 53, the end of the filter core 53 is connected with the cover part 51, and at least part of the core body of the filter core 53 is located inside the barrel part 52.

[0036] Specifically, the cover part 51 and the barrel part 52 are detachably connected, which facilitates the user to disassemble and assemble the filter 5, simplifies the replacement and maintenance process of the filter core 53, and effectively reduces the maintenance cost and time.

[0037] Specifically, the filter core 53 is composed of multiple layers of filter materials with different pore sizes to achieve fractional filtration of different size particle impurities in the polishing liquid; the outer layer adopts coarse filter material with larger pore size and stronger interception ability to intercept larger particle impurities, thereby reducing the burden on the subsequent fine filter layer and prolonging its service life; the inner layer adopts fine filter material with smaller pore size and higher filtration precision, which can effectively remove small particles, colloidal substances and part of the dissolved impurities, thereby meeting the requirements of polishing operation.

[0038] In some embodiments, in combination with Figure 2 As shown, the cover part 51 is provided with a liquid inlet end for introducing the polishing liquid into the filter 5; the barrel part 52 is provided with a liquid outlet end 521 for leading out the purified polishing liquid.

[0039] In some embodiments, in combination with Figure 1 As shown, the filter screen 22 corresponds to the inlet of the first liquid tank 21 and is suitable for making the introduced polishing liquid flow into the first liquid tank 21 after passing through the filter screen 22.

[0040] Specifically, the filter screen 22 is arranged below the inlet of the first liquid tank 21, and the polishing liquid needs to pass through the filter screen 22 to flow into the tank, so that the filter screen 22 can intercept and remove large impurity particles in the polishing liquid, and has high practicability.

[0041] In some embodiments, in combination with Figure 1 As shown, the third valve 41 is arranged at the first pipeline 4 and located at the outlet side of the first liquid tank 21; the third valve 41 is located at the upstream side of the filter 5; the third valve 41 cooperates with the peristaltic pump at the first liquid tank 21 to ensure that the backwashing of the first liquid tank 21 is carried out smoothly; the fourth valve 611 is arranged at the second branch 61 and located at the outlet side of the stirring device 6; when the polishing liquid in the second liquid tank 3 directly returns through the first branch 31, the fourth valve 611 remains closed; when the polishing liquid in the second liquid tank 3 needs to be returned after additive supplementing treatment, the fourth valve 611 remains open.

[0042] In some embodiments, in combination with Figure 2 As shown, the cover part 51 is provided with a connecting end 511, the barrel part 52 is detachably connected with the connecting end 511, and the connecting end 511 can be but is not limited to a threaded barrel opening, and the barrel part 52 and the cover part 51 are detachably connected in a threaded manner.

[0043] In some embodiments, in combination with Figure 1 As shown, the filter 5 is provided with a plurality of filters 5, the plurality of filters 5 are arranged at the first pipeline 4 in sequence and at intervals to improve the filtering effect; the supplementing device 8 is provided with a plurality of supplementing devices 8, the plurality of supplementing devices 8 are arranged at the second pipeline 7 at intervals, and the supplementing device 8 can be but is not limited to an additive pump and is respectively used for adding an oxidizing agent and a PH adjusting agent.

[0044] In some embodiments, in combination with Figure 1 As shown, the filter 5 further includes: a detection member 55 arranged at the cover part 51 and used for detecting the fluid pressure in the filter 5; a fifth valve 522 arranged at the liquid outlet end 521 and used for controlling the liquid outlet of the filter 5; and a sealing member 54 sleeved around the peripheral part of the barrel part 52 and adapted to sealingly connect the barrel part 52 and the cover part 51, and the sealing member 54 can be a sealing ring made of rubber.

[0045] In an optional embodiment, the stirring device 6 is an ultrasonic stirring instrument, and the polishing liquid is stirred in a non-contact manner by using ultrasonic waves.

[0046] Obviously, the above embodiments are only examples for clearly illustrating, and are not limitation to the embodiments. Although the embodiments of the present application are described in conjunction with the drawings, various modifications and changes can be made by those skilled in the art without departing from the spirit and scope of the present application, and such modifications and changes fall within the scope of the present application.

Claims

1. A polishing apparatus filtration system, comprising: The polishing device (1) comprises: A primary filter (2) in communication with the polishing device (1); the primary filter (2) has a filter screen (22) inside; A second liquid storage tank (3) with an inlet in communication with the primary filter (2) and an outlet in communication with the polishing device (1); A filter (5) arranged between the primary filter (2) and the second liquid storage tank (3); A stirring device (6) with an inlet in communication with the second liquid storage tank (3) and an outlet in communication with the polishing device (1); A replenishing device (8) arranged between the stirring device (6) and the second liquid storage tank (3); A first valve (311) arranged at the pipeline connecting the second liquid storage tank (3) and the polishing device (1); A second valve (71) arranged at the pipeline connecting the second liquid storage tank (3) and the replenishing device (8). The primary filter (2) further comprises a first liquid storage tank (21), and the filter screen (22) is arranged inside the first liquid storage tank (21); 2. The polishing apparatus filtration system of claim 1, wherein, The polishing device (1) is in communication with an outlet pipe (11) and a return pipe (12), and the first liquid storage tank (21) is in communication with the outlet pipe (11). The second liquid storage tank (3) and the first liquid storage tank (21) are in communication through a first pipeline (4), and the filter (5) is arranged at the first pipeline (4); 3. The polishing apparatus filtration system of claim 2, wherein, The second liquid storage tank (3) is in communication with the return pipe (12) through a first branch (31), and the first valve (311) is arranged at the first branch (31); The stirring device (6) and the second liquid storage tank (3) are in communication through a second pipeline (7), the replenishing device (8) and the second valve (71) are arranged at the second pipeline (7) in sequence, and the second valve (71) is located on the upstream side of the replenishing device (8); The stirring device (6) is in communication with the return pipe (12) through a second branch (61). The filter (5) comprises a detachable cover (51) and a cylinder (52); 4. The polishing apparatus filtration system of claim 1, wherein, The filter (5) is provided with a filter core (53), the end of the filter core (53) is connected with the cover (51), and at least part of the core body of the filter core (53) is located inside the cylinder (52). The filter screen (22) corresponds to the inlet of the first liquid storage tank (21), and is adapted to make the introduced polishing liquid flow into the first liquid storage tank (21) after passing through the filter screen (22).

5. The polishing apparatus filtration system of claim 2, wherein, Further comprising a third valve (41) arranged at the first pipeline (4) and located on the outlet side of the first liquid storage tank (21), and the third valve (41) is located on the upstream side of the filter (5); 6. The polishing apparatus filtration system of claim 3, wherein, A fourth valve (611) is arranged at the second branch (61) and located on the outlet side of the stirring device (6). The cover (51) is provided with a connection end (511), and the cylinder (52) is detachably connected with the connection end (511).

7. The polishing apparatus filtration system of claim 4, wherein, A plurality of filters (5) are arranged at the first pipeline (4) in intervals; 8. The polishing apparatus filtration system of claim 3, wherein, A plurality of replenishing devices (8) are arranged at the second pipeline (7) in intervals. The filter (5) further comprises:

9. The polishing apparatus filtration system of claim 4, wherein, ​ A detection piece (55) is arranged on the cover part (51); A sealing piece (54) is sleeved on the peripheral part of the barrel part (52) and is suitable for sealingly connecting the barrel part (52) and the cover part (51).

10. The polishing apparatus filtration system of claim 1, wherein, The stirring device (6) is an ultrasonic stirrer.

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