Double-sided coating machine

Abstract

The utility model discloses a double-sided coating machine which comprises a vacuum cavity, and an unwinding device for releasing a film and a winding device for winding to finish coating are arranged in the vacuum cavity; a first cooling main drum, a traction assembly and a second cooling main drum are arranged on a film feeding path of the unwinding device and the winding device, and evaporation devices are arranged below the first cooling main drum and the second cooling main drum correspondingly, so that first film layers are formed on the two side faces of a film correspondingly; magnetron sputtering devices are arranged on the peripheral sides of the first cooling main drum and the second cooling main drum so as to deposit a second film layer on the first film layer; the traction assembly is partially located on a film feeding path of the first cooling main drum and the second cooling main drum so that the to-be-coated face of the film can be turned over. By the adoption of the double-sided coating machine, double-sided coating can be rapidly achieved, and the problem that in the prior art, the coating effect is poor is solved.

Description

TECHNICAL FIELD

[0001] The utility model relates to a film plating equipment technical field, especially in kind of double -sided film plating machine. BACKGROUND

[0002] Vacuum coating technology is a kind of coating process on the surface of material in vacuum environment, is widely used in optical devices, electronic components, decorative materials etc. It not only can improve the appearance of material, also can promote its wear resistance, corrosion resistance and other functional properties.

[0003] Traditional battery electrode material is mostly copper foil or aluminum foil as current collector, these materials have certain conductivity, but there are deficiencies in battery energy density, cycle life and safety etc., composite current collector material as a new type of electrode material, combines the advantages of a variety of materials, is considered to be the substitute of traditional electrode material. Vacuum coating technology as a main preparation method of composite current collector material, under vacuum condition, using vacuum evaporation or sputtering coating method, material is evaporated or deposited on the surface of substrate, forming uniform film.

[0004] However, the current vacuum coating technology produces substrate and the bonding force between coating is not enough, easy to fall off.

[0005] Thus the prior art remains to be improved and improved. INVENTION CONTENTS

[0006] In view of the above deficiencies of the prior art, the purpose of the utility model is to provide a kind of double -sided film plating machine, to solve the problem of poor coating effect in prior art.

[0007] In order to achieve the above purpose, the utility model takes the following technical scheme:

[0008] A kind of double -sided film plating machine, including vacuum cavity, the vacuum cavity is provided with the unwinding device for releasing film and the winding device for winding coating completion;First cooling main drum, traction assembly and second cooling main drum are arranged on the film conveying path of the unwinding device and the winding device, the lower portion of the first cooling main drum and the second cooling main drum are provided with evaporation device, so that the two sides of film each form first film layer;The periphery of the first cooling main drum and the second cooling main drum is provided with magnetron sputtering device, to deposit second film layer on the first film layer;The traction assembly is partially located in the film conveying path of the first cooling main drum and the second cooling main drum, so that the film to be plated surface is turned over.

[0009] The periphery of the first cooling main drum and the second cooling main drum is also provided with electron beam evaporation coating device, to form primer film layer between first film layer and film.

[0010] The traction assembly comprises a traction roller arranged on the film conveying path between the first cooling main drum and the second cooling main drum.

[0011] The diameter of the first cooling main drum and the diameter of the second cooling main drum are 2-6 times the diameter of the traction roller.

[0012] The vacuum cavity is provided with an evaporation area and a magnetron area, the evaporation device is arranged in the evaporation area, the magnetron sputtering device is arranged in the magnetron area, and a baffle is arranged between the evaporation area and the magnetron area.

[0013] The first cooling main drum and the second cooling main drum are both provided with a gap between the baffle on the side where each of them is located.

[0014] The gap between the first cooling main drum and the second cooling main drum and the baffle on the side where each of them is located is 3-10 mm.

[0015] The vacuum degree of the magnetron area is 1.7 -1 pa-2.2 -1 pa, the vacuum degree of the evaporation area is 1.0 -4 mpa-5.0 - 5 mpa.

[0016] The distance between the first cooling main drum and the second cooling main drum and the target material of the magnetron sputtering device on the side where each of them is located is 50-400 mm.

[0017] The evaporation device is a crucible.

[0018] Compared with the prior art, the double-sided coating machine provided by the utility model includes a vacuum cavity, a film unwinding device for releasing a film and a film winding device for winding a completed coating are arranged in the vacuum cavity; a first cooling main drum, a traction assembly and a second cooling main drum are arranged on a film conveying path of the film unwinding device and the film winding device, a vapor deposition device is arranged below the first cooling main drum and the second cooling main drum, so that a first film layer is formed on each of two sides of the film; a magnetron sputtering device is arranged on the circumferential side of the first cooling main drum and the second cooling main drum, so as to deposit a second film layer on the first film layer; the traction assembly is partially arranged on the film conveying path of the first cooling main drum and the second cooling main drum, so as to turn over the film surface to be coated. In the application, the first film layer is vapor deposited on one side of the film through the vapor deposition device below the first cooling main drum, and the second film layer is deposited on the first film layer through the magnetron sputtering device on the circumferential side of the first cooling main drum, when the first film layer is still at a high temperature, the high energy characteristics of the magnetron sputtering are utilized to firmly fix the film layer on the film, so as to improve the problem that the bonding force between the film and the film layer is not enough in the prior art; after the coating of one side of the film is completed, the film is conveyed and turned over through the traction assembly, the first film layer is vapor deposited and the second film layer is deposited on the other side of the film when the film is conveyed through the second cooling main drum, so as to realize double-sided coating and improve the production efficiency. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 The structure diagram of the double-sided coating machine is provided. DETAILED DESCRIPTION

[0020] In order to make the purpose, technical scheme and effect of the utility model more clear and definite, the utility model is further described in detail below with reference to the drawings and examples. It should be understood that the specific examples described herein are only used to explain the utility model and not to limit the utility model.

[0021] It should be noted that when a component is referred to as "mounted on", "fixed on" or "disposed on" another component, it can be directly on another component or there can be a middle component. When a component is referred to as "connected to" another component, it can be directly connected to another component or there can be a middle component.

[0022] It should also be noted that the left, right, up, down and other orientation terms in the utility model examples are only relative concepts or are referenced to the normal use state of the product, and should not be considered as limiting.

[0023] Vacuum coating technology is a process of coating the surface of materials in a vacuum environment, widely used in optical devices, electronic components, decorative materials, etc. It not only improves the appearance of materials, but also enhances their wear resistance, corrosion resistance and other functional properties.

[0024] Traditional battery electrode materials mostly use copper foil or aluminum foil as current collector. Although these materials have certain electrical conductivity, they have deficiencies in battery energy density, cycle life and safety, etc. Composite current collector material, as a new type of electrode material, combines the advantages of various materials and is considered as a substitute for traditional electrode materials. Vacuum coating technology, as a main preparation method of composite current collector material, uses vacuum evaporation or sputtering coating method to evaporate or deposit materials on the surface of the substrate under vacuum conditions to form a uniform film.

[0025] However, the current vacuum coating technology produces a substrate and a coating with insufficient adhesion between them, which is prone to falling off. In addition, for substrates with specific requirements, double-sided coating is needed. In the prior art, after completing single-sided coating, the substrate is removed from the winding device and placed on the unwinding device to repeat the single-sided coating process to complete coating on the other side of the substrate. Each time double-sided coating is achieved, the film needs to be reloaded and unloaded, and vacuum pumping is required. During the loading and unloading process, the film is also prone to damage, affecting product quality. At the same time, the entire process wastes time, reduces production efficiency, and increases production cost.

[0026] The utility model provides a double -sided coating machine, please refer to Figure 1 , including vacuum cavity, be provided with the unwinding device 1 for releasing film and be provided with the winding device 2 for winding the coating of completion in vacuum cavity, the film path of unwinding device 1 with winding device 2 is provided with first cooling main drum 31, traction assembly and second cooling main drum 32, the lower portion of first cooling main drum 31 with second cooling main drum 32 all is provided with evaporation device 5 to make the both sides of film each form first film layer, the circumferential side of first cooling main drum 31 with second cooling main drum 32 all is provided with magnetron sputtering device 6 to deposit second film layer on first film layer, the traction assembly part is located on the film path of first cooling main drum 31 with second cooling main drum 32 to make the film surface to be plated film overturn. The double -sided coating machine of the application can quickly realize double -sided coating, improve the problem of poor coating effect in prior art.

[0027] The first film layer is evaporated on one side of the film by the evaporation device 5 below the first cooling main drum 31, and the second film layer is deposited on the first film layer by the magnetron sputtering device 6 around the first cooling main drum 31. When the first film layer is still at a high temperature, the high-energy characteristics of the magnetron sputtering are used to firmly fix the two film layers on the film, so as to improve the problem that the bonding force between the film and the film layer is not enough in the prior art. After the film coating on one side of the film is completed, the film is transported by the traction assembly and guided to turn over. The first film layer and the second film layer are evaporated and deposited on the other side of the film when the second cooling main drum 32 transports the film, so as to realize double-sided film coating and improve the production efficiency. It should be noted that the film in the present application is the substrate to be coated. The film in the present application is usually a PP film, a PET film, a PI film or other insulating and non-conductive film. During the film coating process, the film is cooled by the first cooling main drum 31 and the second cooling main drum 32, so as to ensure that the film is not burned by high-temperature metal materials to form pinholes, and also to prevent the film from becoming brittle at high temperature.

[0028] Further, the first cooling main drum 31 and the second cooling main drum 32 are also provided with an electron beam evaporation film coating device 7 around the side, so as to form a primer film layer between the first film layer and the film. The electron beam evaporation film coating device 7 in the present application is used to evaporate a primer film layer on the film, that is, a primer film layer is first formed on the film by the electron beam evaporation film coating device 7, and then the first film layer is deposited on the primer film layer by heating the material to be evaporated by the evaporation device 5, so as to improve the bonding force between the first film layer and the film, and also to help improve the overall performance of the film. The evaporation device 5 in the present application is a crucible evaporation. In order to improve the evaporation efficiency, more materials are placed in the crucible during evaporation, so that the film bears a higher temperature during the evaporation of the first film layer. A thin primer film layer is formed on the film in advance by the electron beam evaporation film coating device 7, so as to improve the high-temperature resistance of the film and avoid the film from becoming brittle and burning out due to high temperature during the evaporation of the first film layer. The metal material contained in the crucible and the metal target material sputtered by the magnetron sputtering can be the same or different; preferably, the metal target material sputtered by the magnetron sputtering is different from the metal material evaporated by the crucible, especially when the material evaporated by the crucible is copper, the first film layer and the second film layer are prone to adhere.

[0029] The electron beam evaporation method is a method of evaporating materials by direct heating with an electron beam under vacuum conditions, vaporizing the evaporated materials and transporting them to the substrate, and condensing them on the substrate to form a thin film. Evaporation is a method of evaporating and depositing particles on the surface of a substrate to form a film layer by heating and evaporating the film material under vacuum conditions. In the present application, the film layer made by adjusting the energy and focus of the electron beam of the electron beam evaporation device 7 has high purity and the thickness can be accurately controlled. Therefore, a primer film layer is formed on the thin film before the first film layer is evaporated on the thin film. The primer film layer fills the small defects on the surface of the thin film, such as scratches and pits, so that the surface of the thin film is more flat. Since the first film layer is used to thicken the thin film, a large amount of evaporated material will be deposited on the thin film during the formation of the first film layer. If the surface of the thin film is not flat, the thin film will be unevenly heated during the evaporation process, which may cause the thin film to deform.

[0030] Further, the traction assembly includes traction rollers 41 arranged on the film conveying path of the first and second cooling main drums 31 and 32. Two traction rollers 41 are arranged on the film conveying path of the first and second cooling main drums 31 and 32. By accurately controlling the rotation speed of the traction rollers 41, the film plating speed can be adjusted to avoid the situation that the film plating effect is poor due to too fast or too slow film conveying. The two traction rollers 41 also play a guiding and positioning role to ensure that the film can be conveyed according to the predetermined path and position during the film plating process. Meanwhile, the two traction rollers 41 make the film to be plated surface turn over during the film conveying process after the film plating on one side is completed, so as to facilitate the film plating on the other side. The traction rollers 41 are also arranged on the film conveying path of the second cooling main drum 32 and the winding device 2 to smoothly wind the plated film on the winding device 2.

[0031] In the present application, the film is plated by evaporation and magnetron sputtering in sequence when passing through the first and second cooling main drums 31 and 32. In order to avoid interference between the two plating methods, the diameter of the first cooling main drum 31 and the diameter of the second cooling main drum 32 are 2-6 times the diameter of the traction rollers 41. In the present application, the first and second cooling main drums 31 and 32 support the film during the film conveying process, the electron beam evaporation device 7 forms a primer film layer on the film, the evaporation device 5 evaporates a first film layer on the primer film layer, and the magnetron sputtering device 6 deposits a second film layer on the first film layer. This can realize continuous double-sided film plating in the vacuum chamber, greatly reduce the double-sided film plating time, improve the production efficiency, reduce the number of opening and breaking the vacuum, and avoid the oxidation of the film.

[0032] Further, the vacuum cavity is provided with an evaporation area and a magnetron area, the evaporation device 5 is located in the evaporation area, the magnetron sputtering device 6 is located in the magnetron area, and a baffle 8 separating the two areas is arranged between the evaporation area and the magnetron area. The magnetron sputtering device 6 in the application needs to participate in the evaporation process, in order to avoid the influence of inert gas (such as argon) on the evaporation of the crucible, the evaporation area and the magnetron area are separated by the baffle 8 to ensure the effect of film evaporation.

[0033] Further, the first cooling main drum 31 and the second cooling main drum 32 are provided with a gap in the vertical direction with the baffle 8 on the side where each cooling main drum is located (i.e. the lower end of the two cooling main drums and the baffle on the side where each cooling main drum is located have a height difference in the vertical direction), so that the thin film can pass between the cooling main drum and the baffle. The gap in the vertical direction between the first cooling main drum 31 and the baffle 8 on the side where the first cooling main drum 31 is located is 3-10 mm, and the gap in the vertical direction between the second cooling main drum 32 and the baffle 8 on the side where the second cooling main drum 32 is located is also 3-10 mm; preferably, the gap (i.e. the height difference) in the vertical direction between the two cooling main drums and the baffle 8 on the side where each cooling main drum is located is the same, which helps to ensure the uniformity of the first film layer on both sides of the thin film; the baffle 8 is provided with an opening with adjustable size, and the material to be evaporated after evaporation of the evaporation device 5 passes through the opening and is deposited on the thin film, and by adjusting the size of the opening, more material to be evaporated passes through the opening and is deposited on the thin film, ensuring the thickness of the film layer on the thin film.

[0034] Further, the vacuum degree of the magnetron area is 1.7 -1 pa-2.2 -1 pa, and the vacuum degree of the evaporation area is 1.0 - 4 mpa-5.0 -5 mpa, that is, the vacuum degree of the magnetron area is greater than that of the evaporation area, which is conducive to improving the bonding force of the film layer and the thin film.

[0035] Further, the distance between the first cooling main drum 31 and the second cooling main drum 32 and the target material of the magnetron sputtering device 6 on the side where the first cooling main drum 31 and the second cooling main drum 32 are located is 50mm-400mm. Specifically, when the target material of the magnetron sputtering device 6 is a rotating target material, the distance between the first cooling main drum 31 and the second cooling main drum 32 and the target material of the magnetron sputtering device 6 on the side where the first cooling main drum 31 and the second cooling main drum 32 are located is 50mm-100mm; when the target material of the magnetron sputtering device 6 is a planar target material, the distance between the first cooling main drum 31 and the second cooling main drum 32 and the target material of the magnetron sputtering device 6 on the side where the first cooling main drum 31 and the second cooling main drum 32 are located is 200mm-400mm; according to the selection of different target materials, the distance between the cooling main drum and the target material is limited, which can minimize the film coating distance and improve the adhesion of the film layer and the thin film. It should be noted that the structure and working principle of the rotating target material and the planar target material belong to the prior art, which will not be described here.

[0036] Further, the evaporation device 5 is a crucible. In this application, the metal material to be evaporated, such as aluminum or copper, is placed in the crucible. When the temperature continues to rise, the metal material will evaporate and deposit on the thin film transported by the first cooling main drum 31 and the second cooling main drum 32, thereby forming a film layer. Using a crucible as an evaporation device 5, a larger amount of metal material can be placed in the crucible at one time. Under high temperature conditions, a relatively thick film layer can be formed on the thin film at one time.

[0037] The application also provides a film coating method using the double-sided film coating machine, which comprises the following steps:

[0038] vacuumizing the vacuum cavity;

[0039] releasing the thin film continuously by the unwinding device;

[0040] evaporating a first film layer on one side of the thin film by the evaporation device below the first cooling main drum;

[0041] depositing a second film layer on one side of the thin film by the magnetron sputtering device around the first cooling main drum;

[0042] evaporating a first film layer on the other side of the thin film by the evaporation device below the second cooling main drum;

[0043] depositing a second film layer on the other side of the thin film by the magnetron sputtering device around the second cooling main drum;

[0044] winding the film coated thin film continuously by the winding device. The film coating method of the application can quickly realize double-sided film coating, and the thin film is coated with a primer film layer, a first film layer and a second film layer on both sides, which makes the combination of the thin film and the film layer more compact and helps to improve the stability and durability of the thin film.

[0045] In summary, the double-sided coating machine provided by the utility model, including vacuum cavity, the vacuum cavity is provided with the unwinding device for releasing film and the winding device for winding coating completion, the film path of the unwinding device and the winding device is provided with first cooling main drum, traction assembly and second cooling main drum, the lower portion of first cooling main drum and second cooling main drum is provided with evaporation device, so that the two sides of film each form first film layer, the periphery of first cooling main drum and second cooling main drum is provided with magnetron sputtering device, to deposit second film layer on the first film layer, the traction assembly part is located in the film path of first cooling main drum and second cooling main drum, so that the film to be plated surface overturns, in the application, first film layer is evaporated to one side of film through the evaporation device under first cooling main drum, then second film layer is deposited on first film layer through the magnetron sputtering device on the periphery of first cooling main drum, when first film layer is still at high temperature, the high-energy characteristics of magnetron sputtering are used to firmly fix film layer on film, so as to improve the problem that the bonding force between film and film layer is not enough in the prior art, after coating one side of film, film is conveyed through traction assembly and guided to overturn, first film layer is evaporated and second film layer is deposited on the other side of film when film is conveyed through second cooling main drum, so as to realize double-sided coating, and the production efficiency is improved.

[0046] It can be understood that, for those skilled in the art, equivalent replacement or change can be made according to the technical scheme and utility model concept of the utility model, and all these changes or replacements shall belong to the protection scope of the claims attached to the utility model.

Claims

1. A double-sided coating machine, characterized in that, The vacuum cavity is internally provided with a film unwinding device for releasing a film and a film winding device for winding the finished film; a first cooling main drum, a traction assembly and a second cooling main drum are arranged on the film conveying path of the film unwinding device and the film winding device, and the first cooling main drum and the second cooling main drum are both provided below with an evaporation device, so that a first film layer is formed on each side of the film; the first cooling main drum and the second cooling main drum are both provided with a magnetron sputtering device on the circumferential side, so as to deposit a second film layer on the first film layer; the traction assembly is partially arranged on the film conveying path of the first cooling main drum and the second cooling main drum, so that the film surface to be plated is turned over.

2. The double-sided coating machine according to claim 1, characterized in that The circumferential side of the first cooling main drum and the second cooling main drum is also provided with an electron beam evaporation plating device to form a primer film layer between the first film layer and the film.

3. The double-sided coating machine of claim 1, wherein, The traction assembly includes a traction roller arranged on the film conveying path of the first cooling main drum and the second cooling main drum.

4. The double-sided coating machine according to claim 3, characterized in that The diameter of the first cooling main drum and the diameter of the second cooling main drum are 2-6 times the diameter of the traction roller.

5. The dual-sided coater of claim 1, wherein, The vacuum cavity is internally provided with an evaporation zone and a magnetron zone, the evaporation device is arranged in the evaporation zone, the magnetron sputtering device is arranged in the magnetron zone, and a baffle is arranged between the evaporation zone and the magnetron zone.

6. The double-sided coating machine according to claim 5, characterized in that The first cooling main drum and the second cooling main drum are both provided with a gap between the baffle on the side where each of them is located.

7. The double-sided coating machine according to claim 6, characterized in that The gap between the first cooling main drum and the second cooling main drum and the baffle on the side where each of them is located is 3-10 mm.

8. The dual-side plating machine of claim 5, wherein, The vacuum degree of the magnetic control area is 1.7 -1 pa-2.2 -1 pa, the vacuum degree of the evaporation area is 1.0 -4 mpa-5.0 -5 mpa.

9. The dual-sided coater of claim 1, wherein, The distance between the first cooling main drum and the second cooling main drum and the target material of the magnetron sputtering device on the side where each of them is located is 50-400 mm.

10. The dual-sided plating machine of claim 1, wherein, The evaporation device is a crucible.

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