Stirring tank for semiconductor etching liquid

Abstract

The utility model discloses a stirring tank for semiconductor etching liquid, which relates to the technical field of stirring tanks and comprises a tank body arranged at the top end of a support, a motor is mounted at the bottom end of the tank body, the output end of the motor is connected with a sleeve, and positioning holes are annularly formed in the surface of the sleeve at equal intervals; and a connecting rod is sleeved with the sleeve, stirring rods are arranged on the surface of the connecting rod at equal intervals, and a first connecting ring is movably connected to the surface of the connecting rod. According to the stirring device disclosed by the utility model, by moving the first connecting ring and the second connecting ring, an extrusion block is conveniently moved to the surface of an extrusion ball to extrude and move the extrusion ball, and the extrusion ball drives a positioning rod to move into a positioning hole, so that a connecting rod and a stirring rod can be mounted on the contrary of a sleeve; and the connecting rod and the stirring rod can be conveniently detached from the interior of the sleeve, so that the surfaces of the connecting rod and the stirring rod can be conveniently maintained or checked, and the stirring rod and the like are prevented from being corroded and damaged by the semiconductor etching liquid under long-time use.

Description

TECHNICAL FIELD

[0001] The utility model relates to agitator tank technical field especially, it is a kind of agitator tank for semiconductor etching liquid. BACKGROUND

[0002] Semiconductor etching liquid is chemically reacted with semiconductor material by the chemical substance contained therein, so that the material surface partial area is dissolved or corroded, to achieve the purpose of processing, modification or pattern formation. In the semiconductor manufacturing process, etching liquid is widely used in the manufacture of integrated circuits, flat panel displays and other microelectronic devices, and the removal of materials such as transistors, to manufacture integrated circuits and electronic components, semiconductor etching liquid needs to use agitator tank in processing process, the agitator tank for semiconductor etching liquid currently usually installs stirring rod on the output shaft of motor, and because semiconductor etching liquid usually contains some strong acid, strong base or oxidant and other chemical substances, these substances have corrosive property, can be chemically reacted with metal or other materials, so as to cause corrosion or damage of stirring rod, so it is necessary to regularly maintain and check the stirring rod inside tank body, since the stirring rod is installed on the output shaft of motor, it is relatively inconvenient to disassemble or install it, thereby affecting the maintenance or inspection of stirring rod. SUMMARY

[0003] The utility model provides a kind of agitator tank for semiconductor etching liquid, solve the problem in background art.

[0004] In order to achieve the above object, the utility model adopts the following technical scheme:

[0005] An agitator tank for semiconductor etching liquid, comprising a tank body provided at the top end of a support, a motor is installed at the bottom end of the tank body, and the output end of the motor is connected with a sleeve, and a plurality of positioning holes are evenly arranged on the surface of the sleeve in a ring shape;

[0006] A connecting rod is sleeved in the sleeve, and a plurality of stirring rods are evenly arranged on the surface of the connecting rod, a first connecting ring is movably connected to the surface of the connecting rod, a plurality of vertical rods are symmetrically arranged at the bottom end of the first connecting ring, and a second connecting ring is movably connected to the surface of the vertical rod, and a plurality of mounting rods are connected to the inner wall of the second connecting ring in a ring shape;

[0007] A plurality of moving grooves are evenly arranged on the lower side of the surface of the connecting rod in a ring shape, a plurality of moving rods are connected to the mounting rods through the moving grooves, and a plurality of extrusion blocks are connected to the bottom end of the moving rods;

[0008] The inside of the connecting rod is connected with a fixed plate, the inner wall of the fixed plate is connected with a moving plate, and the moving plate is connected with a first spring on the inner wall of the connecting rod, the surface of the moving plate is fixedly connected with a positioning rod connected with the inside of the positioning hole, and the other end of the positioning rod is connected with a pressing ball in contact with the pressing block.

[0009] As a further description of the above technical solution:

[0010] The pressing block is conical.

[0011] As a further description of the above technical solution:

[0012] The diameter of the positioning rod is the same as the inner diameter of the positioning hole.

[0013] As a further description of the above technical solution:

[0014] The bottom end of the connecting rod is connected with a fixed rod, the surface of the fixed rod is connected with a sleeve on both sides, the inside of the sleeve is connected with a second spring, the top end of the second spring is connected with a circular plate, the top end of the circular plate is connected with a limiting rod, the inner wall of the sleeve is connected with a partition plate, and the surface of the partition plate is symmetrically provided with limiting holes.

[0015] As a further description of the above technical solution:

[0016] The distance between the centers of the two limiting holes is the same as the distance between the centers of the two limiting rods.

[0017] As a further description of the above technical solution:

[0018] The diameter of the connecting rod is the same as the inner diameter of the sleeve.

[0019] As a further description of the above technical solution:

[0020] The top end of the tank body is provided with a cover body, and the top end of the cover body is respectively provided with a liquid feeding port, a solid feeding port and an air outlet pipe.

[0021] As described above, due to the adoption of the above technical solution, the beneficial effects of the present application are:

[0022] In the present application, by moving the first connecting ring and the second connecting ring, the pressing block can be moved to the surface of the pressing ball for extrusion and movement, the pressing ball drives the positioning rod to move to the inside of the positioning hole, so that the connecting rod and the stirring rod can be installed in the sleeve, and vice versa, the connecting rod and the stirring rod can be disassembled from the inside of the sleeve, so that the surface of the connecting rod and the stirring rod can be maintained or inspected, and the semiconductor etching liquid can be prevented from corroding and damaging the stirring rod after long-term use. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 It is a kind of stirring tank structure schematic diagram for semiconductor etching liquid;

[0024] Figure 2 It is a kind of sleeve surface partial structure schematic diagram in the utility model;

[0025] Figure 3 It is a kind of sleeve internal partial structure schematic diagram in the utility model;

[0026] Figure 4 It is a kind of connecting rod surface partial structure schematic diagram in the utility model;

[0027] Figure 5 It is a kind of second connecting ring internal structure schematic diagram in the utility model;

[0028] Figure 6 It is a kind of connecting rod internal partial structure schematic diagram in the utility model;

[0029] Figure 7 It is a kind of sleeve internal partial structure schematic diagram in the utility model.

[0030] Legend:

[0031] 1, support;2, tank body;3, motor;4, sleeve;5, positioning hole;6, connecting rod;7, stirring rod;8, first connecting ring;9, vertical rod;10, second connecting ring;11, mounting rod;12, moving groove;13, moving rod;14, extrusion block;15, fixed plate;16, moving plate;17, first spring;18, positioning rod;19, extrusion ball;20, fixed rod;21, sleeve;22, second spring;23, circular plate;24, limiting rod;25, partition;26, limiting hole;27, cover;28, liquid feeding port;29, solid feeding port;30, gas outlet pipe. DETAILED DESCRIPTION

[0032] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the utility model.

[0033] Reference Figures 1-7The utility model provides a kind of stirring tank for semiconductor etching liquid, including the tank body 2 being arranged in support 1 top, the bottom end of tank body 2 is equipped with motor 3, and the output end of motor 3 is connected with sleeve 4, and the surface of sleeve 4 is annularly equidistantly provided with positioning hole 5;Sleeve 4 is internally sleeved with connecting rod 6, and the surface of connecting rod 6 is equidistantly provided with stirring rod 7, the surface of connecting rod 6 is movably connected with first connecting ring 8, and the bottom end of first connecting ring 8 is symmetrically provided with vertical rod 9, and the surface of vertical rod 9 is connected with second connecting ring 10 movably connected with the surface of connecting rod 6, and the inner wall of second connecting ring 10 is annularly equidistantly connected with mounting rod 11;The surface lower side of connecting rod 6 is annularly equidistantly provided with moving groove 12, and mounting rod 11 passes through moving groove 12 and is connected with moving rod 13, and the bottom end of moving rod 13 is connected with extrusion block 14;Connecting rod 6 is internally connected with fixed plate 15, and the inner wall of fixed plate 15 is connected with moving plate 16, and the inner wall of moving plate 16 is connected with first spring 17 with connecting rod 6, the surface of moving plate 16 is fixedly connected with the positioning rod 18 connected with the inside of positioning hole 5, and the other end of positioning rod 18 is connected with the extrusion ball 19 in contact with extrusion block 14, by moving first connecting ring 8, it can drive second connecting ring 10, mounting rod 11, moving rod 13 and extrusion block 14 to move, so as to move extrusion block 14 to the surface of extrusion ball 19 and extrude it, make extrusion ball 19 drive positioning rod 18 to move, so as to move positioning rod 18 to the inside of positioning hole 5, so as to install connecting rod 6 and stirring rod 7 in the inside of sleeve 4, vice versa, it is convenient to disassemble connecting rod 6 and stirring rod 7 and maintain or check, after moving first connecting ring 8, it needs to be fixed by bolt through first connecting ring 8 and connecting rod 6 and be connected with each other.

[0034] Further, the extrusion block 14 is conical, which is convenient for moving the extrusion ball 19 and the positioning rod 18 when extruding the extrusion ball 19 through the extrusion block 14.

[0035] Further, the diameter of the positioning rod 18 is the same as the inner diameter of the positioning hole 5, which avoids the gap between them, thereby preventing the connecting rod 6 from shaking when rotating.

[0036] Further, the bottom end of the connecting rod 6 is connected with the fixed rod 20, the surface of the fixed rod 20 is connected with the sleeve 21 on both sides, the inside of the sleeve 21 is connected with the second spring 22, the top end of the second spring 22 is connected with the circular plate 23, and the top end of the circular plate 23 is connected with the limiting rod 24, the inner wall of the sleeve 4 is connected with the partition plate 25, and the surface of the partition plate 25 is symmetrically provided with the limiting hole 26, by rotating the connecting rod 6, the fixed rod 20 and the sleeve 21, the limiting rod 24 can be moved to the surface of the limiting hole 26, so that the limiting rod 24 is in contact with the inside of the limiting hole 26.

[0037] Further, the distance between the centers of the two limiting holes 26 is the same as the distance between the centers of the two limiting rods 24, which is convenient for connecting the limiting rods 24 with the interiors of the limiting holes 26, so that the positioning rod 18 and the positioning hole 5 can be aligned.

[0038] Further, the diameter of the connecting rod 6 is the same as the inner diameter of the sleeve 4, which avoids the situation that the diameter of the connecting rod 6 is different from the inner diameter of the sleeve 4, so that the limiting rods 24 in the interior of the sleeve 21 cannot be aligned with the limiting holes 26 in the interior of the sleeve 4.

[0039] Further, the top end of the tank body 2 is provided with a cover body 27, and the top end of the cover body 27 is respectively provided with a liquid feeding port 28, a solid feeding port 29 and an air outlet pipe 30, and a breathing valve is installed on the air outlet pipe 30, which is convenient for the preparation of semiconductor etching liquid and the collection of acidic waste gas.

[0040] The above is only the preferred specific implementation manner of the present application, but the protection scope of the present application is not limited to this, any skilled person in the art can make equivalent replacement or change according to the technical scheme and the inventive concept of the present application within the technical range disclosed by the present application, which should be covered in the protection scope of the present application.

Claims

1. A stirring tank for semiconductor etching solution, comprising a tank body (2) arranged at the top end of a support (1), characterized in that: The bottom end of the tank body (2) is provided with a motor (3), the output end of the motor (3) is connected with a sleeve (4), and the surface of the sleeve (4) is provided with positioning holes (5) which are annular and equidistant; The inside of the sleeve (4) is sleeved with a connecting rod (6), the surface of the connecting rod (6) is provided with stirring rods (7) which are equidistant, the surface of the connecting rod (6) is movably connected with a first connecting ring (8), the bottom end of the first connecting ring (8) is symmetrically provided with vertical rods (9), the surface of the vertical rods (9) is connected with a second connecting ring (10) which is movably connected with the surface of the connecting rod (6), and the inner wall of the second connecting ring (10) is annularly and equidistantly connected with mounting rods (11); The surface of the connecting rod (6) is annularly and equidistantly provided with moving grooves (12) on the lower side, the mounting rods (11) pass through the moving grooves (12) and are connected with moving rods (13), and the bottom end of the moving rods (13) is connected with extrusion blocks (14); The inside of the connecting rod (6) is connected with a fixed plate (15), the inner wall of the fixed plate (15) is connected with a moving plate (16), and the inner wall of the connecting rod (6) is connected with a first spring (17) and the moving plate (16); the surface of the moving plate (16) is fixedly connected with a positioning rod (18) connected with the inside of the positioning hole (5), and the other end of the positioning rod (18) is connected with an extrusion ball (19) in contact with the extrusion block (14).

2. The stirring tank for a semiconductor etching solution according to claim 1, wherein: The extrusion block (14) is conical.

3. The stirring tank for semiconductor etching solution according to claim 1, wherein: The diameter of the positioning rod (18) is the same as the inner diameter of the positioning hole (5).

4. The stirring tank for semiconductor etching solution according to claim 1, wherein: The bottom end of the connecting rod (6) is connected with a fixed rod (20), the surface of the fixed rod (20) is connected with sleeve (21) on both sides, the inside of the sleeve (21) is connected with a second spring (22), the top end of the second spring (22) is connected with a circular plate (23), and the top end of the circular plate (23) is connected with a limiting rod (24), the inner wall of the sleeve (4) is connected with a partition plate (25), and the surface of the partition plate (25) is symmetrically provided with limiting holes (26).

5. The stirring tank for a semiconductor etching solution according to claim 4, wherein: The distance between the centers of the two limiting holes (26) is the same as the distance between the centers of the two limiting rods (24).

6. The etching tank for semiconductor according to claim 1, wherein: The diameter of the connecting rod (6) is the same as the inner diameter of the sleeve (4).

7. The etching tank for semiconductor according to claim 1, wherein: The top end of the tank body (2) is provided with a cover body (27), and the top end of the cover body (27) is respectively provided with a liquid feeding port (28), a solid feeding port (29) and an air outlet pipe (30).

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