Manual acid-base cleaning equipment with acid-base neutralization function

Abstract

The utility model relates to the technical field of silicon wafer production, and discloses a manual acid-base cleaning device with an acid-base neutralization function, which comprises a machine base, an efficient cleaning mechanism is arranged at the top of the machine base, a waste gas discharge mechanism is arranged on the back of the efficient cleaning mechanism, the efficient cleaning mechanism comprises an ultrasonic cleaning bin, and the ultrasonic cleaning bin is arranged in the machine base. The ultrasonic cleaning bin is fixedly connected to the top of the machine base, a sealing door is rotationally connected to the front face of the ultrasonic cleaning bin, and a glass plate is fixedly installed on the inner wall of the sealing door. By means of the design of the pump machine, cleaning liquid in the machine base can be absorbed from the water inlet pipe opening, then the cleaning liquid flows back and is conveyed into the machine base from the three sets of water outlet pipe openings at different angles, internal circulation of the cleaning liquid is achieved, and therefore after a neutralizing agent is added, the neutralizing agent can be rapidly and evenly diffused into the cleaning liquid, and the cleaning effect is improved. And the efficiency of neutralizing and cleaning the silicon wafers in the inner cavity of the base is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to the technical field of silicon wafer production, and in particular to a manual acid-base cleaning equipment with acid-base neutralization function. BACKGROUND

[0002] In semiconductor device production, silicon wafers must undergo a rigorous cleaning process. This is because the surface of the silicon wafer may be left with various types of contamination impurities, including organic and inorganic substances, which can exist in atomic, ionic, thin film, or particulate form. These contaminants can cause surface defects on the silicon wafer, which in turn affect the performance and stability of the device, and in severe cases can even cause the device to fail. Therefore, the purpose of cleaning is to remove these surface contamination impurities to prevent device failure. The cleaning method mainly includes physical cleaning and chemical cleaning. Physical cleaning methods include brushing or scrubbing, high-pressure cleaning, and ultrasonic cleaning. Sometimes the silicon wafer needs to be cleaned with acid-base neutralization. In the production and processing of silicon wafers, acid-base neutralization cleaning is an important step aimed at removing contaminants and residues from the surface of the silicon wafer to ensure the quality and performance of the silicon wafer.

[0003] In the process of cleaning the silicon wafer with ultrasonic waves, if acid-base neutralization cleaning is required, the user needs to add an acidic or basic neutralizing agent to the equipment. The added neutralizing agent cannot quickly and uniformly diffuse to the inside of the cleaning solution, thereby affecting the efficiency of the neutralization cleaning. SUMMARY

[0004] The utility model aims at providing a kind of manual acid-base cleaning equipment with acid-base neutralization function, solve the problem that the neutralizing agent added in prior art cannot quickly and uniformly diffuse to the inside of the cleaning solution, thereby affecting the efficiency of the neutralization cleaning.

[0005] The utility model provides the following technical scheme: a kind of manual acid-base cleaning equipment with acid-base neutralization function, including base, the top of the base is provided with high-efficiency cleaning mechanism, the back of the high-efficiency cleaning mechanism is provided with waste gas discharge mechanism.

[0006] The high-efficiency cleaning mechanism includes an ultrasonic cleaning bin, which is fixedly connected to the top of the base. A sealing door is rotatably connected to the front of the ultrasonic cleaning bin. A glass plate is fixedly installed on the inner wall of the sealing door. A water inlet strip pipe is fixedly installed on the left side of the inner wall of the ultrasonic cleaning bin. A water inlet pipe opening is fixedly connected to the right side of the water inlet strip pipe. A water outlet strip pipe is fixedly installed on the left side of the inner wall of the ultrasonic cleaning bin. A water outlet pipe opening is fixedly connected to the right side and the outer surface near the right side of the water outlet strip pipe. A pump is fixedly installed on the left side of the inner wall of the ultrasonic cleaning bin. The input pipe of the pump is fixedly connected to the top of the water inlet strip pipe. The output pipe of the pump is fixedly connected to the left side of the water outlet strip pipe.

[0007] As the preferred of the above technical scheme, the lateral rail rod is fixedly installed between the two sides of the inner wall of the ultrasonic cleaning bin, the outer wall of the lateral rail rod is slidably connected with the sliding arm, the bottom of the sliding arm is fixedly installed with the supporting table, and the top of the supporting table is fixedly installed with the positioning frame.

[0008] Through the above technical scheme, the supporting table can be limited to move left and right through the cooperation of the lateral rail rod and the sliding arm.

[0009] As the preferred of the above technical scheme, the right side of the inner wall of the ultrasonic cleaning bin is fixedly installed with the support, and the inner wall of the support and the inner wall of the base are fixedly installed with the electric telescopic rod.

[0010] As the preferred of the above technical scheme, the telescopic end of the electric telescopic rod extends to the left side of the support and is fixedly connected with the transmission elbow rod, the bottom of the transmission elbow rod is fixedly connected with the connecting rod, and the connecting rod is welded on the outer wall of the sliding arm.

[0011] Through the above technical scheme, the electric telescopic rod can drive the supporting table to move through the transmission of the transmission elbow rod and the connecting rod, and at the same time, the silicon wafer is moved to improve the cleaning effect of the silicon wafer.

[0012] As the preferred of the above technical scheme, the waste gas discharge mechanism comprises a hollow bin, the hollow bin is fixedly connected to the back of the ultrasonic cleaning bin, the back of the ultrasonic cleaning bin is provided with an exhaust hole, and the top of the hollow bin is fixedly connected with a suction fan.

[0013] Through the above technical scheme, the waste gas in the ultrasonic cleaning bin can be absorbed and treated through the cooperation of the suction fan, the hollow bin and the exhaust hole.

[0014] As the preferred of the above technical scheme, the top of the suction fan is fixedly connected with a fixed cylinder, the side of the fixed cylinder is fixedly installed with a reinforcing leg, and the reinforcing leg is fixedly installed on the top of the hollow bin.

[0015] Through the above technical scheme, the absorption cylinder can be stably supported through the cooperation of the fixed cylinder and the reinforcing leg.

[0016] As the preferred of the above technical scheme, the top of the fixed cylinder is movably inserted with a plug-in ring, the top of the plug-in ring is fixedly connected with an absorption cylinder, and the inner wall of the absorption cylinder is fixedly installed with a barrier net.

[0017] Through the above technical scheme, the barrier net is used to hollow support the activated carbon particles in the inner cavity of the absorption cylinder.

[0018] As the preferred technical scheme of the above, the inner cavity of the absorption cylinder is filled with activated carbon particles above the barrier net, the top of the absorption cylinder is movably inserted with an exhaust hose, and the side of the absorption cylinder is welded with a handle.

[0019] Through the design of the handle, the operator can conveniently disassemble and assemble the absorption cylinder.

[0020] Compared with the prior art, the present application has the following advantages:

[0021] The pump machine is designed to absorb the cleaning liquid in the base from the water inlet, and then return the cleaning liquid to the base at different angles from the three water outlets, so as to realize the internal circulation of the cleaning liquid, thereby rapidly and uniformly diffusing the neutralizing agent into the cleaning solution after the neutralizing agent is added, improving the neutralization and cleaning efficiency of the silicon wafer in the base cavity, and increasing the environmental protection of the equipment by absorbing the waste gas in the base cavity and then adsorbing and purifying the waste gas. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 It is a perspective view of the present application;

[0023] Figure 2 It is a sectional view of the ultrasonic cleaning chamber of the present application;

[0024] Figure 3 It is Figure 2 It is an enlarged structure diagram of position A;

[0025] Figure 4 It is a separation structure diagram of the hollow chamber and the ultrasonic cleaning chamber in the present application;

[0026] Figure 5 It is a sectional view of the absorption cylinder of the present application.

[0027] In the figure: 1, base; 2, high-efficiency cleaning mechanism; 21, ultrasonic cleaning chamber; 22, sealing door; 23, glass plate; 24, water inlet pipe; 241, water inlet; 25, pump; 251, water outlet pipe; 252, water outlet; 26, horizontal rail rod; 261, sliding arm; 262, support table; 263, positioning frame; 264, connecting rod; 265, support; 266, electric telescopic rod; 267, transmission elbow; 3, waste gas discharge mechanism; 31, hollow chamber; 32, exhaust hole; 33, air suction fan; 34, fixed cylinder; 35, reinforcing leg; 36, plug-in ring; 37, absorption cylinder; 38, barrier net; 39, exhaust hose. DETAILED DESCRIPTION

[0028] The technical solutions in the embodiments of the utility model will be clearly and completely described below with reference to the drawings in the embodiments of the utility model.

[0029] As Figures 1-5 The utility model provides a kind of technical scheme: a kind of manual acid-base cleaning equipment with acid-base neutralization function, including base 1, the top of base 1 is provided with high efficiency cleaning mechanism 2, the back of high efficiency cleaning mechanism 2 is provided with waste gas discharge mechanism 3, high efficiency cleaning mechanism 2 includes ultrasonic cleaning bin 21, ultrasonic cleaning bin 21 is fixedly connected at the top of base 1, the front of ultrasonic cleaning bin 21 is rotatably connected with sealing door 22, glass plate 23 is fixedly installed on the inner wall of sealing door 22, water inlet strip pipe 24 is fixedly installed on the left side of the inner wall of ultrasonic cleaning bin 21, water inlet pipe 241 is fixedly connected on the right side of water inlet strip pipe 24, water outlet strip pipe 251 is fixedly installed on the left side of the inner wall of ultrasonic cleaning bin 21, water outlet pipe 252 is fixedly connected on the right side of water outlet strip pipe 251 and the outer surface close to right side, pump 25 is fixedly installed on the left side of the inner wall of ultrasonic cleaning bin 21, the input pipe of pump 25 is fixedly connected with the top of water inlet strip pipe 24, the output pipe of pump 25 is fixedly connected with the left side of water outlet strip pipe 251, base 1 is existing structure, the inside of base 1 includes ultrasonic equipment, for driving solution in the inner chamber of ultrasonic cleaning bin 21 to carry out mechanical vibration, realize the function of ultrasonic cleaning, the inside of base 1 includes sewage discharge structure, for discharging sewage in the inner chamber of ultrasonic cleaning bin 21, control pump 25 work, can absorb cleaning solution in base 1 from water inlet pipe 241, then with different angles from three groups of water outlet pipe 252 backflow delivery to base 1, realize the internal circulation of cleaning solution, can after neutralizing agent is added, rapidly make neutralizing agent evenly spread to the inside of cleaning solution.

[0030] As a kind of implementation in this embodiment, as Figures 1-2As shown, the two sides between the inner wall of the ultrasonic cleaning bin 21 are fixedly installed with transverse rail rods 26, the outer wall of the transverse rail rod 26 is slidably connected with a sliding arm 261, the bottom of the sliding arm 261 is fixedly installed with a support table 262, the top of the support table 262 is fixedly installed with a positioning frame 263, the right side of the inner wall of the ultrasonic cleaning bin 21 is fixedly installed with a support 265, the inner wall between the support 265 and the inner wall of the machine base 1 is fixedly installed with an electric telescopic rod 266, the telescopic end of the electric telescopic rod 266 extends to the left side of the support 265 and is fixedly connected with a transmission bent rod 267, the bottom of the transmission bent rod 267 is fixedly connected with a connecting rod 264, and the connecting rod 264 is welded on the outer wall of the sliding arm 261. Place the silicon wafer in the flower basket, then insert the flower basket into the positioning frame 263, then tighten the bolts on the positioning frame 263, and the locking of the flower basket is completed. Control the electric telescopic rod 266 to extend and retract, drive the sliding arm 261 to slide on the outer wall of the transverse rail rod 26 through the transmission of the transmission bent rod 267 and the connecting rod 264, move the support table 262 and the flower basket left and right, and make the silicon wafer in the flower basket fully contact with the cleaning liquid to improve the cleaning effect of the silicon wafer.

[0031] As an embodiment in the present embodiment, as shown in Figure 1 、 Figure 4 、 Figure 5 As shown, the exhaust gas discharge mechanism 3 comprises a hollow bin 31, the hollow bin 31 is fixedly connected to the back of the ultrasonic cleaning bin 21, the back of the ultrasonic cleaning bin 21 is provided with an exhaust hole 32, the top of the hollow bin 31 is fixedly connected with a suction fan 33, the top of the suction fan 33 is fixedly connected with a fixed cylinder 34, the side of the fixed cylinder 34 is fixedly installed with a reinforcing leg 35, the reinforcing leg 35 is fixedly installed on the top of the hollow bin 31, the top of the fixed cylinder 34 is movably inserted with a plug-in ring 36, the top of the plug-in ring 36 is fixedly connected with an absorption cylinder 37, the inner wall of the absorption cylinder 37 is fixedly installed with a barrier net 38, the inner cavity of the absorption cylinder 37 is filled with activated carbon particles above the barrier net 38, the top of the absorption cylinder 37 is movably inserted with an exhaust hose 39, the side of the absorption cylinder 37 is welded with a handle, the suction fan 33 is controlled to work, the exhaust gas in the inner cavity of the ultrasonic cleaning bin 21 can be absorbed through the inner cavity of the hollow bin 31 and the exhaust hole 32, and then transported into the inner cavity of the absorption cylinder 37, the activated carbon particles in the absorption cylinder 37 can absorb and purify the exhaust gas, and then the air is discharged through the exhaust hose 39, the actual length of the exhaust hose 39 is designed according to the use environment, and the activated carbon particles can be blocked in the inner cavity of the absorption cylinder 37 through the design of the barrier net 38, the plug-in ring 36 is pulled out from the top of the fixed cylinder 34, so that the activated carbon particles in the absorption cylinder 37 can be replaced.

[0032] Working principle: first, the silicon wafer is placed in the basket, then the basket is inserted into the positioning frame 263, then the bolts on the positioning frame 263 are tightened, that is, the locking of the basket is completed, then the sealing door 22 is closed to inject cleaning solution into the inner cavity of the ultrasonic cleaning tank 21, then part of the cleaning solution is discharged, the PH value of the cleaning solution is detected, if it is acidic, the alkaline neutralizing agent is filled into the inner cavity of the ultrasonic cleaning tank 21, if it is alkaline, the acidic neutralizing agent is filled into the inner cavity of the ultrasonic cleaning tank 21, then the pump 25 is controlled to work, the cleaning solution in the base 1 can be absorbed from the water inlet port 241, then the cleaning solution is backflow transported to the base 1 at different angles from the three groups of water outlet ports 252, the internal circulation of the cleaning solution is realized, the neutralizing agent is uniformly diffused to the inside of the cleaning solution, and at the same time, the electric telescopic rod 266 is controlled to stretch out and retract, driving the silicon wafer to move left and right, that is, the cleaning function of the silicon wafer is realized.

[0033] The above examples are only used to illustrate the technical solutions of the present application, not to limit them.

Claims

1. A manual acid-base cleaning device with acid-base neutralization function, comprising a base (1), characterized in that: The top of the base (1) is provided with a high-efficiency cleaning mechanism (2), and the back of the high-efficiency cleaning mechanism (2) is provided with a waste gas discharge mechanism (3); The high-efficiency cleaning mechanism (2) comprises an ultrasonic cleaning bin (21) fixedly connected to the top of the base (1), a sealing door (22) rotatably connected to the front of the ultrasonic cleaning bin (21), a glass plate (23) fixedly installed on the inner wall of the sealing door (22), a water inlet strip pipe (24) fixedly installed on the left side of the inner wall of the ultrasonic cleaning bin (21), a water inlet pipe (241) fixedly connected to the right side of the water inlet strip pipe (24), a water outlet strip pipe (251) fixedly installed on the left side of the inner wall of the ultrasonic cleaning bin (21), a water outlet pipe (252) fixedly connected to the right side and the outer surface close to the right side of the water outlet strip pipe (251), and a pump (25) fixedly installed on the left side of the inner wall of the ultrasonic cleaning bin (21), wherein the input pipe of the pump (25) is fixedly connected to the top of the water inlet strip pipe (24), and the output pipe of the pump (25) is fixedly connected to the left side of the water outlet strip pipe (251).

2. The manual acid-base cleaning device with acid-base neutralization function according to claim 1, characterized in that: The two sides of the inner wall of the ultrasonic cleaning bin (21) are fixedly installed with a transverse rail rod (26), the outer wall of the transverse rail rod (26) is slidably connected with a sliding arm (261), the bottom of the sliding arm (261) is fixedly installed with a supporting table (262), and the top of the supporting table (262) is fixedly installed with a positioning frame (263).

3. The manual acid-base cleaning device with acid-base neutralization function according to claim 2, characterized in that: The right side of the inner wall of the ultrasonic cleaning bin (21) is fixedly installed with a support (265), and the inner wall of the support (265) and the inner wall of the base (1) are fixedly installed with an electric telescopic rod (266).

4. The manual acid-base cleaning device with acid-base neutralization function according to claim 3, characterized in that: The telescopic end of the electric telescopic rod (266) extends to the left side of the support (265) and is fixedly connected with a transmission bent rod (267), the bottom of the transmission bent rod (267) is fixedly connected with a connecting rod (264), and the connecting rod (264) is welded on the outer wall of the sliding arm (261).

5. The manual acid-base cleaning device with acid-base neutralization function according to claim 1, characterized in that: The waste gas discharge mechanism (3) comprises a hollow bin (31) fixedly connected to the back of the ultrasonic cleaning bin (21), an exhaust hole (32) formed in the back of the ultrasonic cleaning bin (21), and a suction fan (33) fixedly connected to the top of the hollow bin (31).

6. The manual acid-base cleaning device with acid-base neutralization function according to claim 5, characterized in that: The top of the suction fan (33) is fixedly connected with a fixed cylinder (34), the side surface of the fixed cylinder (34) is fixedly installed with a reinforcing leg (35), and the reinforcing leg (35) is fixedly installed on the top of the hollow bin (31).

7. The manual acid-base cleaning device with acid-base neutralization function according to claim 6, characterized in that: The top of the fixed cylinder (34) is movably inserted with a plug-in ring (36), the top of the plug-in ring (36) is fixedly connected with an absorption cylinder (37), and the inner wall of the absorption cylinder (37) is fixedly installed with a barrier net (38).

8. The manual acid-base cleaning device with acid-base neutralization function according to claim 7, characterized in that: The inner cavity of the absorption cylinder (37) is filled with activated carbon particles above the barrier net (38), the top of the absorption cylinder (37) is movably inserted with an exhaust hose (39), and the side surface of the absorption cylinder (37) is welded with a handle.

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