Dewar part cleaning limiting device
By using a limiting device during the cleaning process of Dewar parts, the problems of parts bumping and scratching are solved, cleaning efficiency is improved, multi-layer stacking cleaning is achieved, and product quality is protected.
Patent Information
- Application Number
- CN202423174635.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-23
- Publication Date
- 2025-12-26
- Estimated Expiration
- 2034-12-23
AI Technical Summary
Dewar parts are prone to bumps and scratches during cleaning, and the cleaning efficiency is low.
Design a Dewar parts cleaning limiting device. By setting limiting structures and support columns on the cleaning tray, a multi-layer stacking method is formed, which improves the space utilization by utilizing the vertical space and avoids collisions and scratches between parts.
It effectively prevents the outer surface of Dewar parts from being damaged by collisions during the cleaning process, improves cleaning efficiency, and increases the number of parts cleaned each time.
Smart Images

Figure CN223717955U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to cleaning equipment technical field, further relates to a dewar part cleaning limiting device. BACKGROUND
[0002] As a kind of device that can detect infrared radiation and convert it into electrical signal or visual image, infrared detector has wide application in security monitoring, industrial detection, medical health and other fields, and brings great convenience and benefit to people's production and life.
[0003] Infrared detector field Dewar plays a vital role, can provide low temperature reliable working environment for detector chip.Dewar bottle (Dewars) also called thermos, is a kind of ideal container and tool for storing liquid gas, low temperature research and crystal element protection.The sidewall of Dewar bottle is double layer and vacuumized, this design can greatly reduce heat conduction and heat convection, so as to maintain the low temperature environment required by detector, therefore, Dewar has very high requirement for vacuum degree in Dewar interlayer, oil stain, dust, water stain and other foreign matters attached in Dewar production process will affect Dewar vacuum degree, similar foreign matter will outgas in environment, make Dewar internal vacuum degree gradually deteriorate, finally fail.Therefore, in Dewar production process, parts need to be cleaned in multiple steps, to reduce the introduction of oil stain, dust, water stain and other foreign matters.
[0004] As shown in Figure 1 When traditional Dewar part is cleaned, the part is placed in the bottom of container 01, placed in turn, solvent is poured, then ultrasonic cleaning is carried out, this method has many disadvantages: since Dewar part is mostly ceramic and metal part, there will be vibration in ultrasonic process, leading to mutual collision between parts, and scratch of part, which affects product quality and appearance.In addition, since only bottom part is placed in container during each cleaning, leading to limited cleaning quantity each time, waste container space, and affect production efficiency.
[0005] For those skilled in the art, how to solve the problems of part collision, scratch and low cleaning efficiency during Dewar part cleaning is a technical problem to be solved at present. Utility model content
[0006] The core of the utility model is to provide a Dewar part cleaning limiting device, the limiting structure arranged on the cleaning tray can form limiting, so as to avoid displacement due to vibration; through the cooperation of supporting column and cleaning tray, multi-layer stacking mode is formed, the vertical space is utilized to improve space utilization rate, and the specific scheme is as follows:
[0007] A Dewar part cleaning limiting device, comprising a cleaning tray and a supporting column, the upper surface of the cleaning tray is provided with a plurality of limiting structures, and each limiting structure is used for circumferentially limiting the position of the Dewar part.
[0008] The bottom end of the support column is fixedly assembled to the cleaning tray, and the top end of the support column is higher than the Dewar part;
[0009] The top end of the support column is used for supporting the upper cleaning tray.
[0010] Optionally, the cleaning tray is provided with a connecting screw hole, and the bottom end of the support column is provided with a connecting screw column, and the connecting screw column and the connecting screw hole are matched and assembled.
[0011] Optionally, the limiting structure is a limiting groove provided on the cleaning tray, and the lateral position of the Dewar part is limited by the side wall of the limiting groove.
[0012] Optionally, the bottom surface of the limiting groove is provided with a through hole for the cleaning liquid to flow to the bottom surface of the Dewar part.
[0013] Optionally, the limiting structure is a limiting boss provided on the cleaning tray, and the lateral position of the Dewar part is limited by the side wall of the limiting boss.
[0014] Optionally, the area surrounded by the limiting boss is provided with a through hole for the cleaning liquid to flow to the bottom surface of the Dewar part.
[0015] Optionally, the limiting boss is formed by a plurality of independent bosses, and there is an interval for the cleaning liquid to flow between adjacent bosses.
[0016] Optionally, the area surrounded by the limiting boss is provided with a support boss, and the height of the support boss is lower than the height of the limiting boss.
[0017] The support boss is gradually tapered from large to small downward, for reducing the contact area with the Dewar part.
[0018] Optionally, the shape of the cleaning tray is consistent with the shape of the inner wall of the cleaning machine, for laterally limiting the cleaning tray.
[0019] Optionally, the cleaning tray and the support column are made of polytetrafluoroethylene material, or the outer surface of the cleaning tray and the support column is provided with a polytetrafluoroethylene coating.
[0020] The utility model provides a kind of dowa parts cleaning limiting device, including cleaning tray and support column, the upper surface of cleaning tray is provided with several limiting structures, each limiting structure is used to circumferential limit dowa parts, when dowa parts is placed on the upper surface of cleaning tray and is transversely limited by limiting structure, so that dowa parts cannot mutually contact and form collision, dowa parts will not be damaged outer surface due to collision;The bottom end of support column is fixedly assembled in cleaning tray, the top end of support column is higher than dowa parts, cleaning tray can be provided with more than two layers, the top end of support column is used to support upper cleaning tray, by setting multilayer cleaning tray, the quantity of dowa parts is increased, to improve cleaning efficiency. BRIEF DESCRIPTION OF DRAWINGS
[0021] In order to more clearly illustrate the technical scheme in the embodiments of the utility model or prior art, the drawings needed to be used in the embodiment or prior art description will be briefly introduced below, and obviously, the drawings in the following description are only some embodiments of the utility model, and other drawings can also be obtained according to these drawings without creative labor for those skilled in the art.
[0022] Figure 1 It is the structural schematic diagram of traditional dowa parts cleaning;
[0023] Figure 2 It is the stacking assembly schematic diagram of the utility model dowa parts cleaning limiting device;
[0024] Figure 3 It is the explosion diagram of cleaning tray first embodiment and support column;
[0025] Figure 4 It is the axonometric drawing of cleaning tray first embodiment;
[0026] Figure 5 It is the axonometric drawing of cleaning tray second embodiment;
[0027] Figure 6 It is the axonometric drawing of cleaning tray third embodiment;
[0028] Figure 7 It is the axonometric drawing of cleaning tray fourth embodiment;
[0029] Figure 8 It is the axonometric drawing of cleaning tray fifth embodiment.
[0030] The drawings include:
[0031] Cleaning tray 1, limiting structure 11, limiting groove 111, limiting boss 112, connecting screw hole 12, through hole 13, support boss 14, support column 2, connecting stud 21. DETAILED DESCRIPTION
[0032] In order for those skilled in the art to better understand the technical scheme of the present application, the following will combine the drawings and specific embodiments to introduce and explain the limiting device for cleaning the Dewar parts in detail.
[0033] As shown in Figure 2 , Figure 3 The present application provides a limiting device for cleaning Dewar parts, which comprises a cleaning tray 1 and a support column 2. The upper surface of the cleaning tray 1 is provided with a plurality of limiting structures 11, each of which is used to limit the position of a Dewar part in the circumferential direction. The limiting structures 11 isolate each Dewar part placed on the same layer of cleaning tray 1 from each other, and the Dewar parts cannot contact each other. The horizontal range defined by the limiting structure 11 is slightly larger than the bottom area of the Dewar part, so that the Dewar part can be placed in the limiting structure 11.
[0034] The bottom of the Dewar part is placed on the cleaning tray 1, and the Dewar part is horizontally limited by the limiting structure 11. Each Dewar part on the entire cleaning tray 1 is spaced apart, and when ultrasonic cleaning occurs, the Dewar parts will not collide with each other. The hardness of the limiting structure 11 is lower than the thickness of the Dewar part, so that the mutual contact between the Dewar part and the limiting structure 11 will not damage the Dewar part.
[0035] The Dewar part is cylindrical in shape, and the limiting structure 11 can be circular or other shapes, as long as it can limit the movement of the Dewar part. The longitudinal height of the limiting structure 11 does not have to be too high in order to facilitate the taking and placing of the Dewar part.
[0036] As shown in Figure 2 , Figure 3 The bottom end of the support column 2 is fixedly assembled to the cleaning tray 1, and the support column 2 and the cleaning tray 1 are relatively fixed as a whole. When the bottom end of the support column 2 is fixed to the cleaning tray 1, the top end of the support column 2 is higher than the Dewar part, and when the support column 2 supports the cleaning tray 1 above, the cleaning tray 1 above will not contact the Dewar part placed below. When multiple layers of cleaning trays 1 are provided, the top end of the support column 2 is used to support the cleaning tray 1 above, and the top end of the support column 2 does not need to be relatively fixed with the cleaning tray 1 above, and only needs to contact the support column 2 with the cleaning tray 1 above. The position of the support column 2 is located between the limiting structures 11, avoiding interference with the Dewar part. If multiple layers of cleaning trays 1 are provided, the uppermost cleaning tray 1 does not need to be installed with a support column 2.
[0037] The utility model discloses a duvet part cleaning limiting device, each limiting knot 11 is used for circumferential position duvet part, when duvet part is placed on the upper surface of cleaning tray 1 and is transversely limited by limiting structure 11, the mutual contact of duvet part cannot form the collision, and the outer surface of duvet part will not be damaged due to the collision, the bottom end of support column 2 is fixedly assembled to cleaning tray, and the top end of support column is used for supporting the cleaning tray 1 of upper side, thereby forming the state of multilayer stacking, the quantity of duvet part can be increased through the setting of multilayer cleaning tray 1, and more duvet parts can be cleaned at a time, thereby improving the cleaning efficiency.
[0038] Combining Figure 2 As shown in the utility model discloses a cleaning tray 1 sets up connecting screw hole 12, connecting screw hole 12 sets up internal thread, and connecting screw hole 12 sets up between each limiting structure 11. The bottom end of support column 2 sets up connecting screw post 21, and connecting screw post 21 sets up external thread, and connecting screw post 21 and connecting screw hole 12 match and assemble, form detachable connection fixed, and be convenient for arbitrary assembly.
[0039] The utility model discloses limiting structure 11 exists a variety of different setting forms:
[0040] Combining Figure 3 , Figure 4 As shown in the utility model discloses a cleaning tray 1 sets up connecting screw hole 12, connecting screw hole 12 sets up internal thread, and connecting screw hole 12 sets up between each limiting structure 11. The bottom end of support column 2 sets up connecting screw post 21, and connecting screw post 21 sets up external thread, and connecting screw post 21 and connecting screw hole 12 match and assemble, form detachable connection fixed, and be convenient for arbitrary assembly.
[0041] Combining Figure 3 , Figure 4 As shown in the utility model discloses a cleaning tray 1 sets up connecting screw hole 12, connecting screw hole 12 sets up internal thread, and connecting screw hole 12 sets up between each limiting structure 11. The bottom end of support column 2 sets up connecting screw post 21, and connecting screw post 21 sets up external thread, and connecting screw post 21 and connecting screw hole 12 match and assemble, form detachable connection fixed, and be convenient for arbitrary assembly. Figure 4 When the bottom surface of each limiting recess 111 corresponds to set up a through hole 13, the diameter of through hole 13 is less than the diameter of limiting recess 111, and both are concentrically arranged. The shape of through hole 13 can be the same as the shape of limiting recess 111, or different shapes can be used, for example, circular, rectangular, etc.
[0042] In addition to setting up a through hole 13 on the bottom surface of each limiting recess 111, combining Figure 5 As shown in the utility model discloses a cleaning tray 1 sets up connecting screw hole 12, connecting screw hole 12 sets up internal thread, and connecting screw hole 12 sets up between each limiting structure 11. The bottom end of support column 2 sets up connecting screw post 21, and connecting screw post 21 sets up external thread, and connecting screw post 21 and connecting screw hole 12 match and assemble, form detachable connection fixed, and be convenient for arbitrary assembly.
[0043] In another embodiment, combining Figure 6As shown, the limiting structure 11 is a limiting boss 112 arranged on the cleaning tray 1, and the lateral position of the dewar part is limited by the sidewall of the limiting boss 112. That is, the upper surface of the cleaning tray 1 is not arranged with a slot, but is arranged with an upwardly protruding structure. The limiting boss 112 surrounds the dewar part from all around, thereby limiting the lateral position of the dewar part and preventing the dewar part from moving laterally in a large range.
[0044] The area surrounded by the limiting boss 112 is arranged with a through hole 13 for the cleaning liquid to flow to the bottom surface of the dewar part. Figure 6 As shown, a through hole 13 is arranged at the middle of the limiting boss 112, so that the bottom surface of the dewar part contacts the fluid. As shown in the following, Figure 5 A plurality of arrayed small holes are arranged as shown, and these embodiments shall be included in the protection scope of the utility model. Figure 6 The limiting boss 112 in the above is a complete annular structure, and in addition thereto, other structures can also be provided.
[0045] As shown, Figure 7 , Figure 8 As shown, the limiting boss 112 is formed by a plurality of independent protrusions, the independent protrusions are annularly distributed and surround the outer periphery of the dewar part. There is a gap between adjacent protrusions for the cleaning liquid to flow, so that the fluid can more fully contact the outer surface of the dewar part.
[0046] The limiting boss 112 formed by the independent protrusions also has different forms, Figure 7 As shown, each independent protrusion is in the shape of a circular arc, and is equivalent to a complete circle with a plurality of spaced channels removed therefrom; Figure 8 As shown, each independent protrusion is in the shape of a cylinder, and a plurality of small cylinders form a circularly surrounded area.
[0047] As shown, Figure 7 , Figure 8 As shown, the area surrounded by the limiting boss 112 is arranged with a supporting boss 14, the height of the supporting boss 14 is lower than the height of the limiting boss 112, the supporting boss 14 can lift the dewar part upward, the bottom surface of the dewar part is higher than the upper surface of the cleaning tray 1, and at this time, the bottom surface of the dewar part does not directly contact the upper surface of the cleaning tray 1. The supporting area of the dewar part is reduced by the supporting boss 14, so that the dewar part has more area to contact the fluid.
[0048] As shown, Figure 7 , Figure 8 As shown, the supporting boss 14 is tapered from large at the bottom to small at the top, for reducing the contact area with the dewar part, and the structure of the supporting boss 14 is similar to that of the limiting boss 112, and different forms can also be provided, Figure 7 The supporting boss 14 in the above is equivalent to a conical ring which is cut in the middle to form a plurality of independent blocks; Figure 8Each supporting boss 14 in the group is a conical platform. Figure 4 、 Figure 8 The through hole 13 and the supporting boss 14 can be provided simultaneously as shown in Figure 7 .
[0049] On the basis of any of the technical solutions above and the mutual combinations thereof, the cleaning tray 1 has an outer shape consistent with the inner wall of the cleaning machine, is used for transverse positioning of the cleaning tray 1, and can avoid transverse displacement of the cleaning tray 1 by being limited by the inner wall of the cleaning machine. In addition, a positioning groove can be arranged on the lower surface of the cleaning tray 1, and is used for cooperation with the supporting column 2 to realize positioning.
[0050] The cleaning tray 1 and the supporting column 2 are integrally made of polytetrafluoroethylene material, or the cleaning tray 1 and the supporting column 2 are made of other materials to form a main body and are provided with a polytetrafluoroethylene coating on the outer surface. The polytetrafluoroethylene material has the characteristics of corrosion resistance, high temperature resistance, strong acid and strong base resistance, high reliability for chemical cleaning reagents, and lower hardness than the dewar part, which can protect the part and avoid scratching.
[0051] The utility model can be stacked layer by layer, and when there are many parts to be cleaned, the parts can be stacked and used, which greatly improves the cleaning efficiency. The dewar part is limited by the limiting structure 11, thereby avoiding mutual scratching during the cleaning process, improving the product appearance and ensuring the product quality. The through hole 13 and the supporting boss 14 are arranged, so that the cavitation bubbles and the solvent can better adhere to the inner surface of the part during ultrasonic cleaning, and the part cleaning capacity is enhanced. The utility model has the advantages of simple structure, low manufacturing cost, high applicability, simple operation method, and can be used for cleaning dewar parts of various specifications.
[0052] The above description of the disclosed embodiments enables a person skilled in the art to implement or use the utility model. Various modifications to these embodiments will be apparent to those skilled in the art, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the utility model. Therefore, the utility model will not be limited to the embodiments shown herein, but will conform to the widest scope consistent with the principles and novel features disclosed herein.
Claims
1. A Dewar part cleaning stopper, comprising: Including a cleaning tray (1) and a support column (2), the upper surface of the cleaning tray (1) is provided with a plurality of limiting structures (11), each of which is used to limit the position of the dewar part in the circumferential direction; The bottom end of the support column (2) is fixedly assembled to the cleaning tray (1), and the top end of the support column (2) is higher than the dewar part; The top end of the support column (2) is used to support the upper cleaning tray (1).
2. The dewar part washing stopper according to claim 1, wherein The cleaning tray (1) is provided with a connecting screw hole (12), and the bottom end of the support column (2) is provided with a connecting screw column (21), and the connecting screw column (21) and the connecting screw hole (12) are matched and assembled.
3. The dewar part washing stopper according to claim 1, wherein The limiting structure (11) is a limiting groove (111) provided on the cleaning tray (1), which limits the transverse position of the dewar part by the side wall of the limiting groove (111).
4. The dewar part washing stopper according to claim 3, wherein The bottom surface of the limiting groove (111) is provided with a through hole (13) for the cleaning liquid to flow to the bottom surface of the dewar part.
5. The dewar part washing stopper according to claim 1, wherein The limiting structure (11) is a limiting boss (112) provided on the cleaning tray (1), which limits the transverse position of the dewar part by the side wall of the limiting boss (112).
6. The dewar part washing stopper according to claim 5, wherein The area surrounded by the limiting boss (112) is provided with a through hole (13) for the cleaning liquid to flow to the bottom surface of the dewar part.
7. The dewar part washing stopper according to claim 5, wherein The limiting boss (112) is formed by a plurality of independent protrusions, and there is an interval between adjacent protrusions for the cleaning liquid to flow.
8. The dewar part washing stopper according to claim 5, wherein The area surrounded by the limiting boss (112) is provided with a support boss (14), and the height of the support boss (14) is lower than the height of the limiting boss (112); The support boss (14) is tapered from large to small, which is used to reduce the contact area with the dewar part.
9. A containment device for cleaning a part of a dewar according to any one of claims 1 to 8, wherein, The shape of the cleaning tray (1) is consistent with the shape of the inner wall of the cleaning machine, which is used to limit the cleaning tray (1) in the transverse direction.
10. The dewar part washing stopper device according to claim 9, wherein The cleaning tray (1) and the support column (2) are made of polytetrafluoroethylene material, or the outer surface of the cleaning tray (1) and the support column (2) is provided with a polytetrafluoroethylene coating.