Polarized light detection device and photoetching equipment

Abstract

The utility model relates to the technical field of photoetching, and discloses a polarized light detection device and photoetching equipment, and the polarized light detection device comprises a light splitting element, a polarizer and a photoelectric sensor, wherein the polarizer is an optical element which allows a light beam in a preset polarization direction to be completely transmitted; the light splitting element is arranged on an output light path of the light source and splits a light beam output by the light source into a detection light beam and an exposure light beam with the same polarization characteristics according to a set proportion; the detection light beam can be incident to the polarizer; the photoelectric sensor is used for detecting light energy output by the detection light beam through transmission of the polarizer so as to determine whether the polarization direction of the exposed light beam is the same as a preset polarization direction; wherein the preset polarization direction is a required polarization direction when the exposure light beam is used for exposure. The light beam polarization characteristic detection and the photoetching process can be synchronously carried out, and the light path structure is simple and easy to realize, so that the polarized light detection difficulty in the photoetching equipment is reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to the field of photoetching technology, especially to a polarized light detection device and photoetching equipment. BACKGROUND

[0002] With the continuous upgrading of chip manufacturing, the numerical aperture of the exposure objective lens in the photoetching equipment is also continuously improved, the wavelength of the light output by the light source is continuously reduced, so that the exposure depth of focus is also reduced, but at the same time, the light intensity output by the light source diffuses obviously with the change of the polarization direction of the light, which will affect the pattern of the photoetching mask to some extent, so it is particularly important to accurately detect and control the polarization characteristics of the light output by the light source.

[0003] The existing detection of the polarization performance of the light output by the light source in the photoetching equipment needs to use special mask and special detector to realize the detection of polarized light, the special mask is heavy and difficult to install and fix, and is easy to fall off, and the detection of the polarization characteristics of the light is often carried out when the polarization performance of the light is poor on the photoetched chip product, so there is a certain delay in the detection of the polarization characteristics of the light, which is easy to cause great economic loss. UTILITY MODEL CONTENTS

[0004] The utility model aims at providing a polarized light detection device and photoetching equipment, which can realize the synchronization of the exposure photoetching process and the polarization characteristic detection of the light beam in the photoetching equipment, the detection light path structure is simple and easy to realize, and the difficulty of the polarization characteristic detection of the light beam is reduced.

[0005] To solve the above technical problems, the utility model provides a polarized light detection device, which comprises:

[0006] A light splitting element, a polarizer and a photoelectric sensor, wherein the polarizer is an optical element allowing complete transmission of a light beam with a preset polarization direction;

[0007] The light splitting element is arranged on the output light path of the light source and splits the light beam output by the light source to form a detection light beam and an exposure light beam with the same polarization characteristics according to a set ratio, and the detection light beam can be incident on the polarizer;

[0008] The photoelectric sensor is used to detect the light energy of the detection light beam transmitted by the polarizer, so as to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction, wherein the preset polarization direction is the required polarization direction of the exposure light beam when used for exposure.

[0009] In an optional embodiment of the present application, a switching platform and a reference photoelectric sensor are further included.

[0010] The reference photoelectric sensor and the first detection light path structure are arranged on the switching platform; the first detection light path structure comprises the polarizer and the photoelectric sensor;

[0011] The switching platform is configured to switch the position of the first detection light path structure and the reference photoelectric sensor, so that the first detection light path structure or the reference photoelectric sensor is located on the light path of the detection light beam output by the light splitting element.

[0012] When the reference photoelectric sensor is located on the output light path of the light splitting element, the reference photoelectric sensor is configured to detect reference light energy of the detection light beam, so as to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction according to the reference light energy and the light energy contrast.

[0013] In an optional embodiment of the present application, the switching platform comprises a first rotating platform carrying the reference photoelectric sensor and the first detection light path structure, a driving motor connected to the first rotating platform, and a limiting structure limiting the rotation position of the first rotating platform.

[0014] The limiting structure is configured to limit the driving of the first rotating platform by the driving motor to switch between a first angle position and a second angle position.

[0015] When the first rotating platform rotates to the first angle position, the first detection light path structure is located on the output light path of the detection light beam output by the light splitting element.

[0016] When the first rotating platform rotates to the second angle position, the reference photoelectric sensor is located on the output light path of the detection light beam output by the light splitting element.

[0017] In an optional embodiment of the present application, the switching platform is further provided with a plurality of groups of second detection light path structures; each group of second detection light path structures comprises the light splitting element, the polarizer and the photoelectric sensor arranged in sequence; and the preset polarization direction corresponding to the polarizer in each group of second detection light path structures is different.

[0018] The switching platform is configured to switch the position of each group of second detection light path structures, so that the light splitting element of one group of second detection light path structures in each group of second detection light path structures is located on the output light path of the light source.

[0019] In an optional embodiment of the present application, the switching platform comprises a second rotating platform and a driving motor fixedly connected to the second rotating platform.

[0020] Each of the second detection light path structures is radially arranged on the rotating platform with the rotation center axis of the second rotating platform as the center.

[0021] In an alternative embodiment of the present application, the switching platform is further provided with at least one set of reference light path structures; the reference light path structure comprises a reference light splitting element and a reference photoelectric sensor;

[0022] The switching platform is used to switch the positions of the reference light path structure and each set of the second detection light path structure, so that the reference light splitting element in one set of the reference light path structure or the light splitting element in one set of the second detection light path structure is located on the output light path of the light source;

[0023] When the reference light splitting element is located on the output light path of the light source, the reference light splitting element is used to split the light beam output by the light source according to the set proportion to form a detection light beam and an exposure light beam; and the reference photoelectric sensor is used to detect the reference light energy of the detection light beam output through the reference light splitting element.

[0024] In an alternative embodiment of the present application, a uniform light lens group is further arranged between the light splitting element and the polarizer; and a condensing lens group is further arranged between the polarizer and the photoelectric sensor.

[0025] The uniform light lens group comprises a convex lens and a concave lens arranged in sequence on the output light path of the light splitting element, and the convex lens is arranged on the focal plane of the concave lens.

[0026] In an alternative embodiment of the present application, the set proportion between the detection light beam and the exposure light beam is not greater than 5%.

[0027] In an alternative embodiment of the present application, the light splitting element is a right-angle triangular prism provided with a semi-transparent and semi-reflective film layer.

[0028] A photolithography device, comprising a light source, a photolithography light path assembly, and the polarized light detection device according to any one of the above;

[0029] The light splitting element in the polarized light detection device is arranged on the output light path of the light source, and is used to split the light beam output by the light source according to a set proportion to form a detection light beam and an exposure light beam with the same polarized characteristics;

[0030] The photolithography light path assembly is used to perform photolithography exposure processing on a processed chip by using the exposure light beam;

[0031] The detection light beam is incident to a polarizer in the polarized light detection device; the polarizer is an optical element allowing a light beam of a preset polarization direction to be completely transmitted, and the preset polarization direction is a polarization direction of the exposure light beam required by the photolithography light path assembly for photolithography exposure processing;

[0032] The photoelectric sensor in the polarized light detection device is used to detect the light energy of the light transmitted through the polarizer to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction.

[0033] The utility model provides a kind of polarized light detection device and photolithography equipment, and the polarized light detection device includes optical element, polarizer and photoelectric sensor;Wherein, polarizer is the optical element allowing the light beam of preset polarization direction to be completely transmitted;Optical element is used to be arranged on the output light path of light source, and the light beam of light source output is split according to set proportion to form the detection light beam and exposure light beam with same polarization characteristics;And detection light beam can be incident to polarizer;Photoelectric sensor is used to detect the light energy of detection light beam transmitted output by polarizer, to determine whether the polarization direction of exposure light beam is the same as preset polarization direction;Wherein, the preset polarization direction is the required polarization direction when the exposure light beam is used for exposure.

[0034] The polarized light detection device of the present application can detect the polarization characteristics of the light beam for photolithography in the photolithography equipment, and the optical element can be placed on the output light path of light source, and the optical element can split the light beam output by light source according to set proportion to form two light beams of detection light beam and exposure light beam with same polarization characteristics, wherein the exposure light beam can be transmitted along the light path in the photolithography equipment to be used for exposure photolithography on chip product;And detection light beam can be incident to polarizer, and because the polarizer only allows the light beam of preset polarization direction to be completely transmitted, when the polarization direction of detection light beam is the same as the preset polarization direction corresponding to polarizer, the detection light beam can be completely transmitted through polarizer and incident to photoelectric detector, otherwise only part of energy of detection light beam can be transmitted through polarizer and incident to photoelectric sensor or cannot be transmitted from polarizer;When the light energy detected by photoelectric detector is equal to the energy of detection light beam split and output by optical element, it can be determined that the polarization direction of detection light beam and exposure light beam is the same as preset polarization direction, otherwise not.

[0035] In the present application, part of the light beam output by the light source can be used for detecting the polarization characteristics, and the other part of the exposure light beam can be used for photolithography exposure, so the detection process of the polarization characteristics of the exposure light beam and the photolithography exposure process of the exposure light beam can be carried out at the same time, that is, the detection of the polarization characteristics can be realized when the polarization performance difference has not yet appeared on the product of the photolithography chip, so that the economic loss caused by the polarization performance difference can be greatly reduced; and the light path structure for realizing the detection of the polarization characteristics of the light beam is simple and easy to realize, so that the difficulty of the polarization detection in the photolithography equipment is reduced. BRIEF DESCRIPTION OF DRAWINGS

[0036] In order to more clearly illustrate the technical scheme in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiment or the prior art description. Obviously, the drawings in the following description are only some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained without creative labor on the basis of these drawings.

[0037] Figure 1 The optical path schematic diagram of the polarization light detection device provided by the embodiment of the present application;

[0038] Figure 2 The optical path structure schematic diagram of the polarization light detection device provided by the embodiment of the present application for a photolithography equipment;

[0039] Figure 3 The structure schematic diagram of the switching platform in the polarization light detection device provided by the embodiment of the present application;

[0040] Figure 4 Another structure schematic diagram of the switching platform in the polarization light detection device provided by the embodiment of the present application. DETAILED DESCRIPTION

[0041] The core of the present application is to provide a polarization light detection device used in a photolithography equipment, which can realize real-time monitoring of the polarization characteristics of the light beam without affecting the photolithography process, and the structure of the whole detection device is simple and the implementation cost is low.

[0042] In order to make the person skilled in the art better understand the present application, the present application will be further described in detail below in combination with the drawings and specific embodiments. Obviously, the described embodiments are only some embodiments of the present application, not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative labor are within the scope of protection of the present application.

[0043] As shown in the drawings, Figures 1 to 4 ​Figure 1 This is a schematic diagram of the optical path of the polarization detection device provided in the embodiments of this application; Figure 2 This is a schematic diagram of the optical path structure of the polarization detection device provided in the embodiments of this application for use in a photolithography equipment; Figure 3 A schematic diagram of the switching platform in the polarization detection device provided in the embodiments of this application; Figure 4 This is another schematic diagram of the switching platform in the polarization detection device provided in the embodiments of this application.

[0044] In one specific embodiment of this application, the polarization detection device may include:

[0045] The beam splitter 11, the polarizer 13, and the photoelectric sensor 15; wherein, the polarizer 13 is an optical element that allows the beam of light with a preset polarization direction to be fully transmitted.

[0046] The beam splitter 11 is used to be placed in the output optical path of the light source 21 and splits the beam output by the light source 21 into a detection beam and an exposure beam with the same polarization characteristics according to a set ratio; and the detection beam can be incident on the polarizer 13.

[0047] The photoelectric sensor 15 is used to detect the light energy output by the detection beam transmitted through the polarizer 13, so as to determine whether the polarization direction of the exposed beam is the same as the preset polarization direction; wherein, the preset polarization direction is the required polarization direction of the exposure beam when it is used for exposure.

[0048] like Figure 1 As shown, in Figure 1 In the illustrated embodiment, a right-angle prism is used as the beam splitter 11. The laser beam output from the laser source 21 in the photolithography equipment is incident perpendicularly onto the right-angle prism. A beam-splitting film layer may be provided on the right-angle prism to partially reflect and partially transmit the beam. The reflected beam is used as the detection beam, while the transmitted beam is used as the exposure beam. In practical applications, the beam splitter 11 can be a right-angle prism, a dichroic mirror, or other beam splitters 11, which will not be specifically shown in this application.

[0049] like Figure 2 As shown, after being output by the beam splitter 11, the exposure beam can be transmitted sequentially through multiple lenses, mirrors, and other optical elements, ultimately used for the exposure processing of the chip product. The polarization characteristics of the detection beam can be detected using the polarizer 13 and the photoelectric sensor 15.

[0050] It can be understood that because the exposure light beam and the detection light beam are both derived from the light beam output by the light source 21, the polarization characteristics of the exposure light beam and the detection light beam should be consistent, so that when the polarization direction of the detection light beam is determined, the polarization characteristics of the exposure light beam used for exposure processing of the chip product can be obtained, that is, whether the polarization direction of the light beam used for exposure of the chip conforms to the required polarization direction can be determined.

[0051] In addition, further considering that the exposure light beam needs to perform photoetching processing on the chip product, the light intensity thereof needs to reach a certain energy requirement; therefore, in order to ensure that the exposure light beam has sufficient light intensity, when the light splitting element 11 splits the light beam output by the light source 21, the proportion of the light intensity of the light beam that is reflected and transmitted can be not greater than a set proportion, for example, the light intensity of the detection light beam output through the light splitting element 11 can be only 1%, 2%, 3%, 4%, 5%, or the like of the light intensity of the exposure light beam. In summary, the light intensity of the detection light beam is as small as possible on the basis of meeting the detection requirement of the polarization characteristics, so as to ensure that the exposure light beam has a large enough light intensity.

[0052] On this basis, the detection light beam output through the light splitting element 11 can be incident to the photoelectric sensor 15 after passing through the polarizer 13. Based on the basic characteristics of the polarizer 13, it is known that the polarizer 13 has a specific polarization direction, that is, the polarization direction of the light beam that can be completely transmitted through the polarizer 13; the polarizer 13 used in the embodiment can also be a device with the same polarization direction as the light beam required for exposure of the chip. Therefore, when the polarization direction of the detection light beam is the same as the preset polarization direction corresponding to the polarizer 13, the detection light beam can be completely transmitted from the polarizer 13 and incident to the photoelectric sensor 15, and at this time, the light energy detected by the photoelectric sensor 15 is equal to the light energy of the detection light beam incident to the polarizer 13. When there is a certain angle between the polarization direction of the detection light beam and the preset polarization direction of the polarizer 13, the detection light beam can only be partially transmitted from the polarizer 13 and incident to the photoelectric sensor 15, and the light energy detected by the photoelectric sensor 15 is obviously smaller than the light energy of the detection light beam incident to the polarizer 13; and the greater the angle between the polarization direction of the detection light beam and the polarization direction of the polarizer 13, the smaller the light energy of the detection light beam that can be transmitted from the polarizer 13, that is, the smaller the light energy detected by the photoelectric sensor 15. When the polarization direction of the detection light beam is perpendicular to the preset polarization direction of the polarizer 13, the detection light beam cannot be transmitted from the polarizer 13 at all, and the light energy detected by the photoelectric sensor 15 is 0.

[0053] On this basis, in the case that the type of the light source 21 is known, the light energy of the light beam output by the light source 21 is also known; at the same time, the energy ratio between the detection light beam and the exposure light beam formed by the light splitting element 11 is also known, i.e. the above-mentioned set ratio; based on the light energy of the light beam output by the light source 21 and the set ratio corresponding to the light splitting of the light splitting element 11, the light energy of the detection light beam output from the light splitting element 11 can be determined; thus, the light energy measured by the photoelectric sensor 15 and the light energy of the detection light beam output from the light splitting element 11 can be compared, if they are equal, the polarization direction of the detection light beam is the same as the preset polarization direction of the polarizer 13, correspondingly, the polarization direction of the exposure light beam is the required polarization direction for exposure; while if the light energy measured by the photoelectric sensor 15 is less than the light energy of the detection light beam output from the light splitting element 11, it indicates that there is a relative angle between the polarization direction of the exposure light beam and the required polarization direction for exposure; when the light energy measured by the photoelectric sensor 15 is 0, it indicates that the polarization direction of the detection light beam output from the light splitting element 11 is perpendicular to the required polarization direction for exposure of the exposure light beam; thus, the detection of the polarization direction of the exposure light beam for photolithography exposure can be realized.

[0054] In the polarized light detection device 10 in the embodiment, the light beam output from the light source 21 is split by the light splitting element 11 to form two light beams of the detection light beam and the exposure light beam, so that the detection of the polarization direction is realized by using the detection light beam, and the exposure light beam is used for photolithography exposure, i.e. the real-time synchronization of the polarization detection and the photolithography process is realized, even if the change of the polarization direction of the exposure light beam has not yet been reflected on the exposure pattern of the chip product, the detection of the polarization direction of the detection light beam can timely find that the polarization direction of the exposure light beam does not meet the requirement, so that the economic loss caused by the deviation of the polarization characteristics of the exposure light beam is largely avoided, the economic benefit is improved on the basis of ensuring the photolithography effect; and the structure of the entire polarized light detection device 10 is simple and easy to realize, which reduces the difficulty of detecting the polarization characteristics of the light beam in the photolithography equipment.

[0055] In the process of detecting whether the detection light beam can be completely transmitted through the polarizer 13 as described above, the energy of the detection light beam incident to the polarizer 13 can be determined based on the intensity of the light beam output by the light source 21 and the energy ratio between the two light beams formed by the light splitting element 11. However, it is further considered that the light source 21 does not necessarily maintain a constant state of the energy of the output light beam as the use time is prolonged, which may result in that the determined energy of the detection light beam incident to the polarizer 13 is not accurate.

[0056] Therefore, in another optional embodiment of the present application, the polarized light detection device 10 can further include:

[0057] The switching platform and the reference photoelectric sensor 16;

[0058] The reference photoelectric sensor 16 and the first detection light path structure 101 are arranged on the switching platform; the first detection light path structure 101 comprises the polarizer 13 and the photoelectric sensor 15;

[0059] The switching platform is used to switch the position of the first detection light path structure 101 and the reference photoelectric sensor 16, so that the first detection light path structure 101 or the reference photoelectric sensor 16 is located on the light path of the detection light beam output by the light splitting element 11;

[0060] When the reference photoelectric sensor 16 is located on the output light path of the light splitting element 11, the reference photoelectric sensor 16 is used to detect the reference light energy of the detection light beam, so as to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction according to the contrast between the reference light energy and the light energy.

[0061] In the embodiment, the switching platform is used to switch the reference photoelectric sensor 16 and the first detection light path structure 101 on the output light path of the detection light beam, so that when the reference photoelectric sensor 16 is located on the output light path of the detection light beam, the detection light beam output by the light splitting element 11 can be directly incident on the reference photoelectric sensor 16, and at this time, the reference light energy detected by the reference photoelectric sensor 16 is the light energy of the detection light beam output by the light splitting element 11; when the first detection light path structure 101 composed of the polarizer 13 and the photoelectric sensor 15 is located on the output light path of the detection light beam output by the light splitting element 11, the light energy detected by the photoelectric sensor 15 is the light energy of the detection light beam transmitted through the polarizer 13, so that when determining the polarization direction of the detection light beam, the reference light energy detected by the reference photoelectric sensor 16 and the light energy detected by the photoelectric sensor 15 are compared, when the two are equal, it means that the polarization direction of the detection light beam is the same as the polarization direction of the polarizer 13, and when the reference light energy is less than the light energy, it means that there is a certain angle between the polarization direction of the detection light beam and the polarization direction of the polarizer 13.

[0062] Optionally, for the switching platform for realizing the back-and-forth switching of the reference photoelectric sensor 16 and the first detection light path structure 101 on the light path of the detection light beam, as shown in Figure 3 , specifically can comprise:

[0063] The first rotating table 151 carrying the reference photoelectric sensor 16 and the first detection light path structure 101, the driving motor connected with the first rotating table 151, and the limiting structure 152 limiting the rotating position of the first rotating table 151;

[0064] The limiting structure 152 is used to limit the driven motor to drive the first rotating platform 151 to switch between the first angle position and the second angle position; when the first rotating platform 151 rotates to the first angle position, the first detection light path structure 101 is located on the output light path of the detection light beam output by the light splitting element 11, and when the first rotating platform 151 rotates to the second angle position, the reference photoelectric sensor 16 is located on the output light path of the detection light beam output by the light splitting element 11.

[0065] In Figure 3 In the embodiment shown, the first rotating platform 151 is a quarter-fan-shaped flat plate structure, which can be driven by the driven motor to rotate about an axis perpendicular to the first rotating platform 151 and passing through the center of the first rotating platform 151; on this basis, the reference photoelectric sensor 16 and the first detection light path structure 101 are arranged in two radial directions perpendicular to each other on the first rotating platform 151, so that when the first rotating platform 151 rotates to the first angle position, the center of the first rotating platform 151 and the light splitting element 11 and the reference photoelectric sensor 16 are located on the same straight line, so that the detection light beam output by the light splitting element 11 can be incident on the reference photoelectric sensor 16; when the first rotating platform 151 rotates to the second angle position, the center of the first rotating platform 151 and the light splitting element 11 and the first detection light path structure 101 are located on the same straight line, and at this time the detection light beam output by the light splitting element 11 can also be incident in the detection light path structure 101. Thus, with the rotation of the first rotating platform 151, the reference photoelectric sensor 16 and the detection light path structure 101 arranged on the first rotating platform 151 can be switched back and forth on the output light path of the light splitting element 11.

[0066] On this basis, the embodiment further considers that merely controlling the rotation angle of the first rotating platform 151 by the driven motor to control the switching of the first rotating platform 151 between the first angle position and the second angle position requires relatively high driving precision of the driven motor; therefore, in order to more accurately control the rotation angle of the first rotating platform 151 without increasing the cost of the entire device, thereby ensuring that the reference photoelectric sensor 16 and the first detection light path structure 101 can be more accurately switched to the output light path of the light splitting element 11, the embodiment further provides a limiting structure 151 for limiting the rotation position of the first rotating platform 151. Figure 3 In the embodiment shown, the limiting structure 151 can be a straight bar, and the radial edge of one side of the first rotating platform 151 is attached to the bar, so that the rotation angle of the first rotating platform 151 can be limited to only 90 degrees, thereby limiting the first rotating platform 151 to rotate back and forth between the first angle position and the second angle position.

[0067] It can be understood that in actual application, the first rotating table 151 is not limited to a 90-degree sector structure, but can also be a 30-degree sector structure, a 45-degree sector structure, etc. In addition, the first rotating table 151 is not limited to a sector structure, but can also be an L-shaped flat structure or other rotatable structures, which are not specifically limited in the embodiment.

[0068] In addition, further considering that switching the reference photoelectric sensor 16 and the polarizer 13 and the photoelectric sensor 15 on the output light path of the light splitting element 11 can affect the accuracy of the relative positions between the light splitting element 11 and the reference photoelectric sensor 16, the polarizer 13 and the photoelectric sensor 15 to some extent, the two light splitting elements 11 can be arranged on the first rotating table 151, the reference photoelectric sensor 16 is arranged on the output light path of one light splitting element 11, and the polarizer 13 and the photoelectric sensor 15 are arranged on the output light path of the other light splitting element 11, and the two light splitting elements 11 can be completely identical light splitting elements 11. Thus, in actual application, the first rotating table 151 can switch the first light path composed of one light splitting element 11 and the reference photoelectric sensor 16 and the second light path composed of the other light splitting element 11, the polarizer 13 and the photoelectric sensor 15 on the output light path of the light source 21, and the technical solution of the application can also be achieved.

[0069] Based on the above discussion, in another optional embodiment of the application, the polarized light detection device 10 can include:

[0070] The switching platform is provided with a plurality of groups of second detection light path structures 102; each group of second detection light path structures 102 includes a light splitting element 11, a polarizer 13 and a photoelectric sensor 15 arranged in sequence; and the preset polarization directions of the polarizers 13 in each group of second detection light path structures 102 are different from each other.

[0071] The switching platform is used for position switching of each group of second detection light path structures 102, so that the light splitting element 11 of one group of second detection light path structures 102 in each group of second detection light path structures 102 is located on the output light path of the light source 21.

[0072] In the embodiment, it is considered that in actual application, the polarization direction requirements of the exposure light beam are different for different chip products; therefore, in the embodiment, a plurality of groups of second detection light path structures 102 composed of light splitting elements 11, polarizers 13 and photoelectric sensors 15 are arranged, and each group of second detection light path structures 102 is arranged on the switching platform, so as to realize switching of each group of second detection light path structures 102 with the light splitting element 11 on the output light path of the light source 21 by using the switching platform.

[0073] It can be understood that in actual application, the polarization directions of the polarizers 13 in each group of the second detection light path structures 102 are different, while the beam splitting elements 11 and the photoelectric sensors 15 can be the same. Therefore, in actual application, only the polarizers 13 in each group of the second detection light path structures 102 can be switched, and the technical solution of the present application can also be implemented.

[0074] Further, there are various ways to realize the position switching of each group of the second detection light path structures 102; for example, Figure 4 As shown in another alternative embodiment of the present application, the switching platform for realizing the switching of each group of the second detection light path structures 102 can further include:

[0075] a second rotating platform 17 and a driving motor fixedly connected to the second rotating platform 17;

[0076] Each group of the second detection light path structures 102 is arranged in a different radial direction with the rotation center axis of the second rotating platform 17 as the center.

[0077] In the embodiment shown in Figure 4 The second rotating platform 17 can have extension parts 171 extending in multiple different radial directions with the central region as the center, and each extension part 171 is provided with a group of the second detection light path structures 102, so that each group of the second detection light path structures 102 is radially distributed with the second rotating platform 17 as the center, and the rotation center axis of the second rotating platform 17 is the center of the distribution of each group of the second detection light path structures 102. On this basis, a position point on the rotation track of the beam splitting element 11 in each group of the second detection light path structures 102 is located on the output light path of the light source 21, so that as each group of the second detection light path structures 102 rotates, the beam splitting element 11 of each group of the detection light path can in turn pass through the output light path of the light source 21, and further split the light beam output by the light source 21 to form a detection light beam and an exposure light beam, thereby realizing the detection of the polarization direction of the detection light beam.

[0078] In addition, in another alternative embodiment of the present embodiment, the polarized light detection device can further include:

[0079] At least one group of reference light path structures 160 is arranged on the switching platform; the reference light path structure includes a reference beam splitting element and a reference photoelectric sensor 16;

[0080] The switching platform is used for position switching of the reference light path structure 160 and each group of the second detection light path structures 102, so that the reference beam splitting element in one group of the reference light path structures 160 or the beam splitting element in one group of the second detection light path structures 102 is located on the output light path of the light source 21;

[0081] When the reference beam splitter is located in the output light path of the light source 21, the reference beam splitter is used to split the light beam output by the light source 21 according to a set ratio to form a detection beam and an exposure beam; the reference photoelectric sensor 16 is used to detect the reference light energy of the detection beam output by the reference beam splitter.

[0082] like Figure 4 The second rotating platform 17 shown includes eight extensions 171, seven of which are each provided with a set of second detection optical path structures 102, while the remaining extension 171 is provided with a reference optical path structure 160. This allows the seven sets of second detection optical path structures 102 to share a set of reference optical path structures 160. In this case, the reference beam splitting element and the beam splitting element 11 in each set of second detection optical path structures 102 should all be completely identical optical elements, at least in the same proportion of splitting the beam output from the light source 21. Alternatively, the reference photoelectric sensor 16 and the second detection optical path structure 102 can be alternately arranged on each extension 171. There are other implementation methods, which are not listed in this embodiment.

[0083] Based on the above embodiments, in another optional embodiment of this application, the polarization detection light detection device may further include:

[0084] A beam-splitting lens group 12 is also provided between the beam splitter 11 and the polarizer 13; a beam-concentrating lens group 14 is also provided between the polarizer 13 and the photoelectric sensor 15.

[0085] like Figure 1 As shown, in this embodiment, a homogenizing lens group 12 is used to homogenize the detection beam output from the beam splitter 11, avoiding the influence of uneven beam brightness on subsequent light energy detection. In practical applications, the homogenizing lens group 12 may include a convex lens and a concave lens arranged sequentially in the output optical path of the beam splitter 11, with the convex lens positioned on the focal plane of the concave lens. Thus, the detection beam output from the beam splitter 11 is first focused by the convex lens and then collimated by the concave lens, thereby achieving homogenization and shaping of the detection beam.

[0086] Based on this, the beam transmitted and output by the polarizer 13 can be further focused by the condenser lens group 14, thereby ensuring that the photoelectric sensor 15 can more accurately detect light energy.

[0087] In addition, the reference optical path structure with reference photoelectric sensor 16 should also include a uniform lens group 12 and a condenser lens group 14 disposed between the beam splitter 11 and the reference photoelectric sensor 16, and the arrangement of the uniform lens group 12 and the condenser lens group 14 is the same as in the above embodiment, which will not be described again in this application.

[0088] In summary, the present application sets a light splitting element in a photoetching light path assembly in a photoetching device, splits the light beam output by a light source into two light beams of detection light beam and exposure light beam according to a set ratio, wherein the exposure light beam can continue to transmit along the photoetching light path assembly to realize photoetching exposure on a chip product, and the detection light beam is detected in polarization direction by a polarizer which can allow light of a preset polarization direction to transmit and a photoelectric sensor in turn; thus, by comparing the light energy measured by the photoelectric sensor and the light energy before the detection light is incident to the polarizer, it can be determined whether the polarization direction of the detection light beam is consistent with the preset polarization direction corresponding to the polarizer, so as to realize the detection of the polarization direction of the detection light beam. Obviously, the polarization directions of the detection light beam and the exposure light beam for photoetching are the same, so the polarization direction detection of the exposure light beam for photoetching can be realized. In the present application, the detection process of the polarization characteristics and the photoetching exposure process of the exposure light beam can be synchronized and performed in parallel, so that the economic loss caused by poor polarization performance can be greatly reduced; and the light path structure for realizing the polarization characteristic detection of the light beam is simple and easy to realize, so as to reduce the difficulty of polarization light detection in the photoetching device.

[0089] With reference to Figure 1 and Figure 2 The present application also provides an embodiment of a photoetching device, which can include a light source 21, a photoetching light path assembly, and a polarization light detection device 10 as described in any of the above;

[0090] The light splitting element 11 in the polarization light detection device 10 is arranged on the output light path of the light source 21, and is used to split the light beam output by the light source 21 into a detection light beam and an exposure light beam with the same polarization characteristics according to a set ratio;

[0091] The photoetching light path assembly is used to perform photoetching exposure processing on a processed chip by using the exposure light beam;

[0092] The detection light beam is incident to the polarizer 13 in the polarization light detection device 10; the polarizer 13 is an optical element which allows the light beam of a preset polarization direction to be completely transmitted, and the preset polarization direction is the polarization direction of the exposure light beam required by the photoetching light path assembly for photoetching exposure processing;

[0093] The photoelectric sensor 15 in the polarization light detection device 10 is used to detect the light energy of the light transmitted by the polarizer 13, so as to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction.

[0094] With reference to Figure 1 and Figure 2In the embodiment, when the light splitting element 11 in the polarized light detection device 10 is arranged on the output light path of the light source 21, the light beam output by the light source 21 can be split into a detection light beam and an exposure light beam with the same polarization characteristics according to a set ratio; the detection light beam can be incident on the polarizer 13, and the exposure light beam is incident on the photolithography light path assembly.

[0095] The exposure light beam is transmitted along the photolithography light path assembly containing a plurality of optical elements such as lenses and mirrors, and is finally used for exposure photolithography processing of the processed chip.

[0096] When the polarization direction of the detection light beam incident on the polarizer 13 is the same as the preset polarization direction corresponding to the polarizer 13, the detection light beam can be completely transmitted through the polarizer 13 and then incident on the photosensor 15, so that the light energy of the detection light beam transmitted and output by the polarizer 13 detected by the photosensor 15 is equal to the light energy of the detection light beam split and output by the light splitting element 11; if the light energy of the detection light beam transmitted and output by the polarizer 13 detected by the photosensor 15 is less than the light energy of the detection light beam split and output by the light splitting element 11, it indicates that the polarization direction of the detection light beam is different from the preset polarization direction corresponding to the polarizer; the polarization direction of the detection light beam is the same as the polarization direction of the exposure light beam; determining whether the polarization direction of the detection light beam is the same as the preset polarization direction, that is, determining whether the polarization direction of the exposure light beam is the same as the preset polarization direction, that is, realizing the detection of the polarization direction of the exposure light beam, and then determining whether the polarization direction of the exposure light beam meets the polarization requirement of the processed chip processed through the photolithography light path assembly.

[0097] Based on the above description, in the embodiment, the light splitting element 11 is used to split the light beam output by the light source 21 into a detection light beam and an exposure light beam. The exposure light beam is transmitted along the photolithography light path assembly containing a plurality of optical elements such as lenses and mirrors, and is finally used for exposure photolithography processing of the processed chip; and the detection light beam is detected by the polarizer 13 and the photosensor 15, so that the polarization direction of the exposure light beam can be obtained in real time during the exposure photolithography process of the photolithography equipment, which is helpful to find the problem of polarization state deviation in the exposure photolithography process in time, and then is helpful to ensure the accuracy of the photolithography of the photolithography equipment.

[0098] It should be noted that the relative terms, such as first and second, and the like, are used herein solely to distinguish one entity or action from another, without necessarily requiring or implying any such actual relationship or order between such entities or actions. Moreover, the terms "comprises", "comprising", or any other variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but can include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element preceded by "comprises... " does not, without more limitations, preclude the existence of further identical elements in the process, method, article, or apparatus that comprises the recited element. In addition, the above technical solutions provided by the embodiments of the present application have not been described in detail, so as not to be too verbose.

[0099] The principles and implementation modes of the present application are described herein by applying specific examples, and the above description of the embodiments is only used to help understand the method of the present application and its core idea. It should be pointed out that for ordinary skilled persons in the technical field, without departing from the principles of the present application, the present application can be improved and modified in several ways, and these improvements and modifications also fall within the protection scope of the claims of the present application.

Claims

1. A polarized light detecting device, characterized by, The application relates to a light splitting element, a polarizer and a photoelectric sensor; wherein the polarizer is an optical element allowing a light beam with a preset polarization direction to be completely transmitted; The light splitting element is arranged on an output light path of a light source and splits a light beam output by the light source to form a detection light beam and an exposure light beam with the same polarization characteristics according to a set ratio; and the detection light beam can be incident on the polarizer; The photoelectric sensor is used for detecting the light energy of the detection light beam transmitted by the polarizer to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction; wherein the preset polarization direction is a required polarization direction of the exposure light beam during exposure. The application further relates to a switching platform and a reference photoelectric sensor; 2. The polarized light detecting apparatus according to claim 1, wherein The reference photoelectric sensor and a first detection light path structure are arranged on the switching platform; the first detection light path structure comprises the polarizer and the photoelectric sensor; The switching platform is used for switching the positions of the first detection light path structure and the reference photoelectric sensor so that the first detection light path structure or the reference photoelectric sensor is located on the light path of the detection light beam output by the light splitting element; When the reference photoelectric sensor is located on the output light path of the light splitting element, the reference photoelectric sensor is used for detecting reference light energy of the detection light beam to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction according to the comparison between the reference light energy and the light energy. The switching platform comprises a first rotating platform carrying the reference photoelectric sensor and the first detection light path structure, a driving motor connected with the first rotating platform, and a limiting structure limiting the rotating position of the first rotating platform; 3. The polarized light detecting apparatus according to claim 2, wherein The limiting structure is used for limiting the driving of the first rotating platform by the driving motor to switch between a first angle position and a second angle position; When the first rotating platform rotates to the first angle position, the first detection light path structure is located on the output light path of the detection light beam output by the light splitting element; When the first rotating platform rotates to the second angle position, the reference photoelectric sensor is located on the output light path of the detection light beam output by the light splitting element. The application further relates to a switching platform; a plurality of groups of second detection light path structures are arranged on the switching platform; each group of the second detection light path structures comprises the light splitting element, the polarizer and the photoelectric sensor arranged in sequence; and the preset polarization directions corresponding to the polarizers in each group of the second detection light path structures are different from each other; 4. The polarized light detecting apparatus according to claim 1, wherein The switching platform is used for switching the positions of each group of the second detection light path structures so that the light splitting element of one group of the second detection light path structures in each group of the second detection light path structures is located on the output light path of the light source. The switching platform comprises a second rotating platform and a driving motor fixedly connected with the second rotating platform; 5. The polarized light detecting apparatus according to claim 4, wherein Each group of the second detection light path structures is arranged in a different radial direction with the rotating center axis of the second rotating platform as the center. ​ 6. The polarized light detecting apparatus according to claim 4, wherein The switching platform is further provided with at least one set of reference light path structures; the reference light path structure comprises a reference light splitting element and a reference photoelectric sensor; The switching platform is used for position switching of the reference light path structure and each set of the second detection light path structure, so that the reference light splitting element in one set of the reference light path structure or the light splitting element in one set of the second detection light path structure is located on the output light path of the light source; When the reference light splitting element is located on the output light path of the light source, the reference light splitting element is used for splitting the light beam output by the light source according to the set proportion to form a detection light beam and an exposure light beam; and the reference photoelectric sensor is used for detecting the reference light energy of the detection light beam output through the reference light splitting element.

7. The polarized light detecting apparatus according to claim 1, wherein A uniform light lens group is further arranged between the light splitting element and the polarizer; and a condensing lens group is further arranged between the polarizer and the photoelectric sensor; The uniform light lens group comprises a convex lens and a concave lens arranged in sequence on the output light path of the light splitting element, and the convex lens is arranged on the focal plane of the concave lens.

8. The polarized light detecting apparatus according to claim 1, wherein The set proportion between the detection light beam and the exposure light beam is not greater than 5%.

9. The polarized light detecting apparatus according to claim 1, wherein The light splitting element is a right-angle triangular prism provided with a semi-transparent and semi-reflective film layer.

10. A lithographic apparatus, characterized in that, The photolithography light path assembly is used for performing photolithography exposure processing on a processing chip by using the exposure light beam. The light splitting element in the polarized light detection device is arranged on the output light path of the light source, and is used for splitting the light beam output by the light source according to a set proportion to form a detection light beam and an exposure light beam with the same polarization characteristic; The photolithography light path assembly is used for performing photolithography exposure processing on a processing chip by using the exposure light beam. The detection light beam is incident to the polarizer in the polarized light detection device; the polarizer is an optical element allowing the light beam with a preset polarization direction to be completely transmitted, and the preset polarization direction is the polarization direction of the exposure light beam required by the photolithography light path assembly for performing photolithography exposure processing; The photoelectric sensor in the polarized light detection device is used for detecting the light energy of the light ray transmitted through the polarizer, so as to determine whether the polarization direction of the exposure light beam is the same as the preset polarization direction.

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