Tail gas washing and cooling device
By adopting a Z-shaped channel and baffle structure in the exhaust gas water washing and cooling device, combined with cooling water and rectifier channels, the problems of poor cooling effect and uneven airflow of high-temperature exhaust gas are solved, achieving efficient cooling and uniform diffusion, and improving the water washing adsorption effect.
Patent Information
- Application Number
- CN202423295011.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-12-31
- Publication Date
- 2026-01-02
- Estimated Expiration
- 2034-12-31
AI Technical Summary
In existing technologies, the high-temperature exhaust gas generated during semiconductor manufacturing has poor cooling effect, which increases the burden on the scrubbing tower, and the uneven exhaust gas flow leads to poor water washing adsorption effect.
Design a tail gas water washing and cooling device, which includes a cooling chamber and a rectification channel in the liquid storage chamber. Utilizing the Z-shaped channel and baffle structure, combined with cooling water and the rectification channel, the tail gas is buffered, cooled and uniformly diffused. The buffer chamber and the gas passage chamber further rectify and buffer the tail gas to ensure uniform diffusion in the scrubbing tower.
It improves the cooling effect of exhaust gas, reduces the burden on the scrubbing tower, and enhances the water washing and adsorption effect, achieving uniform diffusion and thorough water washing and adsorption of exhaust gas.
Smart Images
Figure CN223747246U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to semiconductor tail gas treatment technical field, concretely is a tail gas water washing cooling device. BACKGROUND
[0002] In the semiconductor manufacturing process, especially in chemical vapor deposition (CVD), etching and other processes involving gas reaction, a variety of harmful tail gas will be produced. These tail gas may contain volatile organic compounds (VOCs), fluorides, chlorides, acidic gases and other toxic or corrosive substances.
[0003] Plasma technology is a method for treating semiconductor tail gas, which uses high temperature plasma to decompose harmful gas components. The plasma generator is a non-transferred arc DC plasma torch, which uses nitrogen or oxygen as the plasma working gas, and uses arc discharge to generate a hot plasma jet with a temperature of up to 16000℃. The industrial waste gas to be treated is decomposed into atoms or dissociated into charged particles, and there are a large number of ions, free radicals and active molecules, which can rapidly thermally decompose or oxidize the industrial waste gas into harmless products or easily handled substances.
[0004] The plasma tail gas treatment equipment still has a high temperature after thermal decomposition or oxidation, and needs to be cooled and then water-washed and adsorbed before being discharged. In the prior art, spray water is often used for cooling, and the spray water cooling often has limited cooling effect. Moreover, the tail gas often has a high flow rate before entering the scrubbing tower for water-washing and adsorption, and the cooling effect is insufficient, which increases the burden of the scrubbing tower. In addition, generally speaking, the more stable and uniform the gas flow of the tail gas entering the scrubbing tower, the better the water-washing and adsorption effect. However, in the existing products, the water-washing and adsorption effect is often unsatisfactory due to the uneven gas flow of the tail gas. SUMMARY
[0005] The utility model discloses a kind of tail gas water washing cooling devices, it solves the technical problem that tail gas discharged from high temperature reaction chamber in prior art cooling effect is poor, and it can increase the burden of scrubbing tower, with Rational structure, cooling effect is good and it is advantageous to improve the technical effect of water-washing and adsorption effect. The technical scheme as follows is used:
[0006] The utility model provides a kind of exhaust gas water washing cooling device, including liquid storage cavity, the cooling cavity and rectifying passage are arranged in parallel in the liquid storage cavity, the cooling cavity and rectifying passage are communicated in lower part, the cooling cavity is opened above to be communicated with exhaust gas treatment reaction cavity, Z-shaped passage is formed in the cooling cavity, and the cooling cavity is further communicated with water inlet and water outlet, cooling water supplied by the water inlet is discharged along Z-shaped passage downwards by water outlet;The rectifying passage is snakily extended and is connected with the end of Z-shaped passage, and the lower of the end of rectifying passage is equipped with leakage port, exhaust gas can enter scrubber for water washing adsorption after passing through rectifying passage.
[0007] On the basis of the above technical solution, a plurality of baffles are fixed on the opposite two side walls of the cooling cavity, the baffles have an angle that inclines downward from outside to inside, and the plurality of baffles are staggered to form the Z-shaped passage.
[0008] On the basis of the above technical solution, the end of the upper baffle extends outward and partially shields the lower baffle, so that a water curtain is formed when cooling water flows through adjacent two baffles.
[0009] On the basis of the above technical solution, the Z-shaped passage and the rectifying passage are connected at the head and tail.
[0010] On the basis of the above technical solution, the rectifying passage includes a plurality of rectifying branches arranged in parallel, adjacent two rectifying branches are connected at the head and tail, and at least one of the rectifying branches is provided with a spray pipe.
[0011] On the basis of the above technical solution, the rectifying branch is vertically arranged.
[0012] On the basis of the above technical solution, further comprising an air passing cavity, the air passing cavity is upwardly open and can be communicated with the inner cavity of the scrubber, and the end of the rectifying passage is connected with the air passing cavity through a plurality of air passing pipelines to buffer exhaust gas flow.
[0013] On the basis of the above technical solution, the top of the inner cavity of the liquid storage cavity is further formed with a buffer cavity communicated with the end of the rectifying passage, and the air inlet of the air passing pipeline is communicated with the buffer cavity.
[0014] On the basis of the above technical solution, the buffer cavity protrudes outward on the liquid storage cavity to form a convex part.
[0015] On the basis of the above technical solution, the air passing outlet of the air passing pipeline communicated with the air passing cavity is arranged on the side wall of the air passing cavity and horizontally communicated with the air passing cavity.
[0016] Beneficial effects
[0017] The utility model discloses a structure is reasonable, and the liquid storage cavity forms the parallelly arranged cooling cavity and rectification passage, and the cooling cavity is communicated with the reaction cavity upwards, when the high temperature tail gas after reaction enters the cooling cavity downwards, on one hand, the tail gas directly impacts cooling water, improves the cooling effect, on the other hand, the baffle plate is set to the gas outlet of reaction cavity, can effectively buffer high temperature tail gas, further improves the cooling effect, in addition, the Z-shaped passage is formed in the cooling cavity, so in the limited space, the tail gas diffusion length in the cooling cavity is greatly extended, not only further buffers the tail gas, but also makes the tail gas and cooling water fully contact, improves the cooling effect, and carries out the water washing adsorption of partial degree simultaneously, on the other hand, the cooling water forms the'water curtain'between the two baffles of adjacent, further plays the effect of buffering tail gas and cooling.
[0018] The cooling cavity and rectification passage lower portion are communicated in the utility model, so the flow velocity of tail gas is further reduced after multiple collisions in rectification passage, and the large particle liquid beads in it fall, and the rectification plays the gas-liquid separation effect simultaneously. The setting of buffer cavity, gas passing cavity and gas passing pipeline makes the tail gas discharged from rectification passage further buffer and rectify, makes the tail gas entering the scrubber diffuse evenly in the scrubber, so it is beneficial to the water washing adsorption of tail gas fully, and it is beneficial to improving the tail gas treatment effect. DRAWINGS
[0019] In order to more clearly illustrate the technical scheme in the embodiment of the utility model or prior art, the following will briefly introduce the drawing needed to be used in the embodiment or prior art description. Obviously, the drawing in the following description is only one embodiment of the utility model, and for those skilled in the art, other embodiment drawings can be obtained according to the provided drawing without paying creative labor.
[0020] Figure 1 The sectional structure schematic diagram of the front view of the utility model;
[0021] Figure 2 The three-dimensional structure schematic diagram of the utility model; DETAILED DESCRIPTION
[0022] The following description and drawings are illustrative of specific embodiments thereof and are not intended to be limiting in any way in describing the present teachings. Some of the features of the embodiments can be included with or alternative methods of other embodiments. The scope of the embodiments of the present teachings is commensurate with the entire scope of claims, and all available equivalents thereof. In the present document, the terms "first", "second", and the like, are used merely to distinguish one element from another, and do not require or imply any actual relationship or order between such elements. Indeed, a first element could be termed a second element without departing from the teachings. Moreover, the terms "comprises", "comprising", or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a structure, device or apparatus that comprises a list of elements does not include only those elements but can also include other elements not expressly listed or inherent to such structure, device or apparatus. An element proceeded by "comprises... a" does not, without more constraints, exclude the existence of additional identical elements in the structure, device or apparatus that includes the element. The various embodiments are described in the following progressive manner, each of which focuses on the differences from other embodiments, and the same or similar parts between the various embodiments can be mutually referred to.
[0023] The terms "longitudinal", "lateral", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only used for the convenience of description herein and simplification of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the present application. In the description herein, unless otherwise specified and limited, the terms "mount", "connect", "connection" should be interpreted broadly, for example, it can be a mechanical connection or an electrical connection, it can be a communication between two elements inside, it can be a direct connection, or an indirect connection through an intermediate medium, and the specific meaning of the above terms can be understood by the person skilled in the art according to the specific circumstances.
[0024] In the present document, the term "a plurality of" means two or more, unless otherwise specified.
[0025] In the present document, the character " / " represents an "or" relationship between the objects before and after it. For example, A / B means: A or B.
[0026] In the present document, the term "and / or" is a description of the relationship between the objects, which means that there can be three relationships. For example, A and / or B means: A or B, or, A and B, the three relationships.
[0027] As Figure 1 and2 The tail gas water washing cooling device shown comprises a liquid storage cavity 100, a cooling cavity 1 and a rectifying channel 2 are arranged side by side in the liquid storage cavity 100, and the cooling cavity 1 and the rectifying channel 2 are communicated at the lower part.
[0028] The cooling cavity 1 is open at the upper part to communicate with a tail gas treatment reaction cavity, a plurality of flow baffles 11 are fixed on the opposite side walls of the cooling cavity 1, the flow baffles 11 have an angle of downward inclination from outside to inside, the angle of inclination of the flow baffles 11 is 15-45°, and the plurality of flow baffles 11 are arranged staggeredly to jointly form a Z-shaped channel 12.
[0029] As shown in the figure, Figure 2 The cooling cavity 1 is further communicated with a water inlet 13 and a water outlet 14, the water inlet 13 is arranged above the flow baffles 11 at a higher position, under the action of gravity, the cooling water supplied by the water inlet 13 is discharged downward along the Z-shaped channel 12 through the water outlet 14; as shown in the figure, Figure 1 The end of the upper flow baffle 11 extends outward and partially shields the lower flow baffle 11, so that a water curtain is formed when the cooling water flows through the adjacent two flow baffles 11. In this way, when the tail gas diffuses along the Z-shaped channel 12, the process of passing through the water curtain not only effectively buffers the tail gas, but also exchanges heat, which is beneficial to improve the cooling effect.
[0030] As shown in the figure, Figure 1 The rectifying channel 2 extends in a meandering manner and is connected with the end of the Z-shaped channel 12, that is, the Z-shaped channel 12 and the rectifying channel 2 are communicated in a head-to-tail manner, the rectifying channel 2 comprises a plurality of rectifying branches 21 arranged vertically and side by side, the adjacent two rectifying branches 21 are connected in a head-to-tail manner, and the lower part of the end of the rectifying channel 2 is provided with a liquid leakage port. In the process of the tail gas in the rectifying channel 2, the tail gas frequently collides with the inner wall of the channel, so that the flow rate of the tail gas is slowed down, the large particles or large water droplets in the tail gas are settled, a certain degree of gas-liquid separation is achieved, and the tail gas is prevented from entering the scrubbing tower at a high flow rate. In addition, at least one rectifying branch 21 is provided with a spray pipe 22 for spraying and washing the tail gas flowing therethrough.
[0031] Further comprising a gas passing cavity 5, the gas passing cavity 5 is open upward and communicated with the inner cavity of the scrubbing tower 4, the gas passing cavity 5 is communicated with the end of the rectifying channel 2 downward, and the top of the inner cavity of the liquid storage cavity 100 further forms a buffer cavity 3 communicated with the end of the rectifying channel 2, the buffer cavity 3 protrudes outward on the liquid storage cavity 100 to form a convex part, further improving the buffering effect, and the buffer cavity 3 is communicated with the gas passing cavity 5 through a plurality of gas passing pipes 6, so that the tail gas enters the scrubbing tower 4 smoothly.
[0032] In addition, the gas passing outlet of the gas passing pipe 6 communicated with the gas passing cavity 5 is arranged on the side wall of the gas passing cavity 5 and is horizontally communicated with the gas passing cavity 5, so that the tail gas flow can be further buffered and the rectifying effect is achieved, so that the tail gas is uniformly diffused in the scrubbing tower 4.
[0033] The utility model is described above by way of example, but the utility model is not limited to the above specific embodiments, any modification or change based on the utility model belongs to the range of the utility model claimed.
Claims
1. A tail gas water scrubbing cooling device, characterized in that, The application relates to a tail gas treatment device, which comprises a liquid storage cavity (100), a cooling cavity (1) and a rectifying channel (2) arranged in parallel in the liquid storage cavity (100), the cooling cavity (1) and the rectifying channel (2) are communicated at the lower part, the cooling cavity (1) is opened at the upper part to communicate with a tail gas treatment reaction cavity, a Z-shaped channel (12) is formed in the cooling cavity (1), and the cooling cavity (1) is further communicated with a water inlet (13) and a water outlet (14), cooling water supplied by the water inlet (13) is discharged downwards along the Z-shaped channel (12) through the water outlet (14); the rectifying channel (2) is snakily extended and connected with the end of the Z-shaped channel (12), and a liquid leakage port is arranged below the end of the rectifying channel (2), and tail gas can enter a water washing and adsorption scrubbing tower (4) after passing through the rectifying channel (2).
2. The tail gas water scrubbing cooling device according to claim 1, characterized in that, A plurality of flow baffles (11) are fixed on the opposite side walls of the cooling cavity (1), the flow baffles (11) have an angle which is inclined downwards from outside to inside, and the plurality of flow baffles (11) are staggered to form the Z-shaped channel (12) together.
3. The tail gas water scrubbing cooling device according to claim 2, characterized in that, The end of the flow baffles (11) of the upper layer extends outward and partially shields the flow baffles (11) of the lower layer, so that a water curtain is formed when cooling water flows through adjacent two flow baffles (11).
4. The tail gas water scrubbing cooling device according to claim 3, characterized in that, The Z-shaped channel (12) and the rectifying channel (2) are communicated in a head-to-tail mode.
5. The exhaust gas water scrubbing cooling device according to any one of claims 1 to 4, characterized in that, The rectifying channel (2) comprises a plurality of rectifying branches (21) arranged in parallel, adjacent two rectifying branches (21) are connected in a head-to-tail mode, and at least one rectifying channel (2) is provided with a spraying pipe (22).
6. The tail gas water scrubbing cooling device according to claim 5, characterized in that, The rectifying branch (21) is vertically arranged.
7. The tail gas water scrubbing cooling device according to claim 6, characterized in that, The application further comprises a gas passing cavity (5), the gas passing cavity (5) is upwardly opened and can be communicated with the inner cavity of the scrubbing tower (4), the end of the rectifying channel (2) is communicated with the gas passing cavity (5) through a plurality of gas passing pipelines (6) to buffer the tail gas flow.
8. The tail gas water scrubbing cooling device according to claim 7, characterized in that, The top of the inner cavity of the liquid storage cavity (100) is further formed with a buffer cavity (3) communicated with the end of the rectifying channel (2), and the gas inlet of the gas passing pipeline (6) is communicated with the buffer cavity (3).
9. The tail gas water scrubbing cooling device according to claim 8, characterized in that, The buffer cavity (3) protrudes outward on the liquid storage cavity (100) to form a convex part.
10. The tail gas water scrubbing cooling device according to any one of claims 7-9, characterized in that, The gas passing outlet of the gas passing pipeline (6) communicated with the gas passing cavity (5) is arranged on the side wall of the gas passing cavity (5) and horizontally communicated with the gas passing cavity (5).