Rough grinding and fine grinding of silicon rod for integrated circuit

Abstract

The utility model relates to the technical field of silicon rod grinding, in particular to a silicon rod rough grinding and fine grinding device for an integrated circuit, which comprises a base, a grinding machine is mounted on one side of the base, a feeding mechanism is mounted on the base, the feeding mechanism comprises a placing table, the placing table is mounted at the top of the base, and a baffle is mounted on the outer side of the placing table. A containing plate is installed on one side of the base, first electric push rods are installed at the two ends of the top of the containing plate correspondingly, output shafts of the two first electric push rods extend to the two ends of a containing table, a push plate is arranged at the edge of the containing table, the two ends of the push plate are connected with the output shafts of the two first electric push rods, and a protection mechanism is installed on a baffle. Dust collection mechanisms are mounted at the two ends of the base; according to the silicon rod feeding and discharging device, silicon rods can be rapidly fed and discharged, operation is convenient and labor-saving, the overall working efficiency is improved, and potential safety hazards occurring in the operation process are reduced.

Description

Technical Field

[0001] This utility model relates to a grinding device, specifically a coarse and fine grinding device for silicon rods used in integrated circuits, and belongs to the field of silicon rod grinding technology. Background Technology

[0002] Silicon single crystals are an important semiconductor material with good electrical properties and thermal stability. Silicon materials have become the most widely used semiconductor material because of their good high temperature resistance and radiation resistance, making them particularly suitable for manufacturing high-power devices. Most integrated circuit semiconductor devices are made of silicon materials.

[0003] However, after the silicon rod is pulled out of the single crystal furnace, it needs to be rough and fine ground by a grinding machine. Because the silicon rod is heavy, it is mostly lifted into the equipment by hand when it is put into the equipment for processing. This back-and-forth operation is time-consuming and labor-intensive, and improper operation can easily cause safety hazards and reduce the overall work efficiency. Utility Model Content

[0004] The purpose of this invention is to provide a coarse and fine grinding method for silicon rods used in integrated circuits to solve the above-mentioned problems. This method enables quick loading and unloading of silicon rods, making the operation convenient and labor-saving, improving overall work efficiency, and reducing safety hazards during operation.

[0005] This utility model achieves the above-mentioned objectives through the following technical solution: coarse and fine grinding of silicon rods for integrated circuits, including a base, a grinding machine mounted on one side of the base, a feeding mechanism mounted on the base, the feeding mechanism including a placement platform, a placement platform mounted on the top of the base, a baffle mounted on the outer side of the placement platform, a placement plate mounted on one side of the base, first electric push rods mounted at both ends of the top of the placement plate, the output shafts of the two first electric push rods extending to both ends of the placement platform, a push plate provided at the edge of the placement platform, the two ends of the push plate connected to the output shafts of the two first electric push rods, a protective mechanism mounted on the baffle, and a dust collection mechanism mounted at both ends of the base.

[0006] Preferably, a support plate is installed at each of the bottom ends of the placement plate, one end of the support plate is perpendicularly connected to the side wall of the base, and the support plate has a trapezoidal structure.

[0007] Preferably, protective covers are installed at both ends of the placement plate, the first electric push rod is located inside the protective cover, and the push plate has a trapezoidal structure.

[0008] Preferably, the top of the placement plate is equipped with a plurality of equally spaced protrusions, the protrusions having a rectangular structure and the top of the protrusions having an arc-shaped structure.

[0009] Preferably, the protective mechanism includes a protective plate, the protective plate is slidably connected to the baffle, and the bottom of each end of the placement plate is vertically connected to a second electric push rod. The top output shafts of the two second electric push rods extend to both ends of the protective plate, and the top output shafts of the two second electric push rods are connected to the top ends of the protective plate through connecting blocks.

[0010] Preferably, the dust collection mechanism includes a cover, with a cover installed at each end of the baffle, a dust collection pipe installed on one side of the cover, and through grooves provided at both ends of the baffle.

[0011] Preferably, the two through slots are provided with filter screens, and the filter screens are fixedly connected to the baffles.

[0012] Preferably, the cover has a triangular structure, and the through slot is positioned higher than the top of the placement platform.

[0013] The beneficial effects of this utility model are as follows: the installation of the base facilitates the connection to the placement platform, thereby enabling the placement and processing of silicon rods. With the cooperation of the grinding machine, the outer side of the silicon rods can be ground. The installation of the baffle helps to shield the periphery of the placement platform, preventing coolant from splashing out. The installation of the placement plate enables temporary loading and unloading of silicon rods, facilitating loading operations. Furthermore, the operation of the two first electric push rods enables the push plate to pull the silicon rods on the placement platform, pushing the silicon rods onto the placement plate, facilitating unloading operations. The operation is convenient and labor-saving. With the cooperation of the protective mechanism, the baffle side is protected during processing, while facilitating subsequent unloading and discharge. With the cooperation of the dust extraction mechanism, the dust or water mist containing debris generated during grinding is easily removed. Attached Figure Description

[0014] Figure 1 This is a schematic diagram of the overall structure of this utility model;

[0015] Figure 2 This is a schematic diagram of the connection structure between the placement platform, baffle and base of this utility model;

[0016] Figure 3 This is a schematic diagram of the connection structure between the placement plate and the base of this utility model;

[0017] Figure 4 This is a schematic diagram of the connection structure between the second electric push rod and the protective plate of this utility model;

[0018] Figure 5 This is a schematic diagram of the connection structure between the connecting block, the second electric push rod, and the protective plate of this utility model.

[0019] In the diagram: 1. Base; 2. Grinding machine; 3. Feeding mechanism; 301. Baffle; 302. Placement platform; 303. Protective cover; 304. Placement plate; 305. Push plate; 306. Protrusion; 307. Support plate; 308. First electric push rod; 4. Protective mechanism; 401. Protective plate; 402. Second electric push rod; 403. Connecting block; 5. Dust collection mechanism; 501. Cover; 502. Dust collection pipe; 503. Through groove; 504. Filter screen. Detailed Implementation

[0020] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0021] Please see Figure 1-5 As shown, the coarse and fine grinding of silicon rods for integrated circuits includes a base 1, a grinding machine 2 mounted on one side of the base 1, a feeding mechanism 3 mounted on the base 1, the feeding mechanism 3 including a placement platform 302, the placement platform 302 mounted on the top of the base 1, a baffle 301 mounted on the outer side of the placement platform 302, a placement plate 304 mounted on one side of the base 1, first electric push rods 308 mounted on both ends of the top of the placement plate 304, the output shafts of the two first electric push rods 308 extending to both ends of the placement platform 302, a push plate 305 provided at the edge of the placement platform 302, the two ends of the push plate 305 connected to the output shafts of the two first electric push rods 308, a protective mechanism 4 mounted on the baffle 301, and a dust collection mechanism 5 mounted on both ends of the base 1.

[0022] As a technical optimization of this utility model, support plates 307 are respectively installed at both ends of the bottom of the placement plate 304. One end of the support plate 307 is vertically connected to the side wall of the base 1. The support plate 307 has a trapezoidal structure. The installation of the support plate 307 helps to support the placement plate 304 stably and facilitates the placement and unloading of heavy silicon rods.

[0023] As a technical optimization of this utility model, protective covers 303 are respectively installed at both ends of the placement plate 304. The first electric push rod 308 is located inside the protective cover 303. The push plate 305 has a trapezoidal structure. The installation of the protective cover 303 helps to shield and protect the first electric push rod 308 on the placement plate 304, thereby preventing damage from bumps.

[0024] As a technical optimization of this utility model, the top of the placement plate 304 is equipped with a plurality of equally spaced protrusions 306. The protrusions 306 have a rectangular structure and an arc-shaped top. The installation of the protrusions 306 helps to increase friction and prevent slippage, so that the silicon rod is placed stably on the placement plate 304 and will not roll and fall off at will.

[0025] As a technical optimization of this utility model, the protective mechanism 4 includes a protective plate 401. The protective plate 401 is slidably connected to the baffle 301. The bottom ends of the placement plate 304 are respectively vertically connected to the second electric push rods 402. The top output shafts of the two second electric push rods 402 extend to both ends of the protective plate 401. The top output shafts of the two second electric push rods 402 are connected to the top ends of the protective plate 401 through connecting blocks 403. The installation of the protective plate 401 serves to shield and protect one side of the baffle 301. The operation of the second electric push rods 402 realizes the lifting and lowering control of the protective plate 401, thereby facilitating the control of the storage of the protective plate 401 during loading and unloading.

[0026] As a technical optimization of this utility model, the dust collection mechanism 5 includes a cover 501, and the cover 501 is respectively installed at both ends of the baffle 301. A dust collection pipe 502 is installed on one side of the cover 501. The baffle 301 has through grooves 503 at both ends. The dust collection pipe 502 is connected to the vacuum cleaner, which facilitates the extraction of air from the inside of the cover 501 and the removal of dust or water mist with debris generated during polishing.

[0027] As a technical optimization of this utility model, the two through slots 503 are provided with filter screens 504. The filter screens 504 are fixedly connected to the baffle 301. The installation of the filter screens 504 can block large debris and provide safety protection.

[0028] As a technical optimization of this utility model, the cover 501 has a triangular structure, and the position of the through groove 503 is higher than the top position of the placement platform 302, which helps to prevent the coolant from flooding the through groove 503 and causing it to overflow, thus playing a protective role.

[0029] In use, the silicon rod is first placed on the placement plate 304. Then, the two first electric push rods 308 are controlled to work, causing the protective plate 401 to descend and retract, facilitating the pushing of the silicon rod on the placement plate 304 onto the placement table 302 for clamping. After clamping, the protective plate 401 rises and resets, serving as a shield. With the cooperation of the grinder 2, the outer side of the silicon rod is ground. The installation of the baffle 301 helps to shield the periphery of the placement table 302, preventing coolant from flying out. Subsequently, the vacuum cleaner is started, and the cover 501 removes the dust or water mist containing debris generated during grinding. After processing, the protective plate 401 retracts and descends again. Through the operation of the two first electric push rods 308, the push plate 305 pulls the silicon rod on the placement table 302, pushing the silicon rod onto the placement plate 304, facilitating the unloading of the silicon rod. The operation is convenient and labor-saving.

[0030] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention. Therefore, the embodiments should be considered illustrative and non-limiting in all respects, and the scope of this invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within this invention. No reference numerals in the claims should be construed as limiting the scope of the claims.

[0031] Furthermore, it should be understood that although this specification describes embodiments, not every embodiment contains only one independent technical solution. This narrative style is merely for clarity. Those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can also be appropriately combined to form other embodiments that can be understood by those skilled in the art.

Claims

1. A silicon rod for coarse and fine grinding of integrated circuits, including a base (1), characterized in that: A grinding machine (2) is installed on one side of the base (1). A feeding mechanism (3) is installed on the base (1). The feeding mechanism (3) includes a placement platform (302). The placement platform (302) is installed on the top of the base (1). A baffle (301) is installed on the outside of the placement platform (302). A placement plate (304) is installed on one side of the base (1). A first electric push rod (308) is installed at both ends of the top of the placement plate (304). The output shafts of the two first electric push rods (308) extend to both ends of the placement platform (302). A push plate (305) is provided at the edge of the placement platform (302). The two ends of the push plate (305) are connected to the output shafts of the two first electric push rods (308). A protective mechanism (4) is installed on the baffle (301). A dust collection mechanism (5) is installed at both ends of the base (1).

2. The coarse and fine grinding of silicon rods for integrated circuits according to claim 1, characterized in that: Support plates (307) are respectively installed at both ends of the bottom of the placement plate (304). One end of the support plate (307) is perpendicularly connected to the side wall of the base (1). The support plate (307) has a trapezoidal structure.

3. The coarse and fine grinding of silicon rods for integrated circuits according to claim 1, characterized in that: The placement plate (304) is equipped with protective covers (303) at both ends, the first electric push rod (308) is located inside the protective cover (303), and the push plate (305) has a trapezoidal structure.

4. The coarse and fine grinding of silicon rods for integrated circuits according to claim 1, characterized in that: The top of the placement plate (304) is equipped with a plurality of equally spaced protrusions (306), the protrusions (306) having a rectangular structure and the top of the protrusions (306) having an arc-shaped structure.

5. The coarse and fine grinding of silicon rods for integrated circuits according to claim 1, characterized in that: The protective mechanism (4) includes a protective plate (401), and the protective plate (401) is slidably connected to the baffle (301). The bottom of both ends of the placement plate (304) are respectively vertically connected to second electric push rods (402). The top output shafts of the two second electric push rods (402) extend to both ends of the protective plate (401). The top output shafts of the two second electric push rods (402) are connected to the top ends of the protective plate (401) through connecting blocks (403).

6. The coarse and fine grinding of silicon rods for integrated circuits according to claim 1, characterized in that: The dust collection mechanism (5) includes a cover (501), and the cover (501) is installed at both ends of the baffle (301). A dust collection pipe (502) is installed on one side of the cover (501), and through grooves (503) are provided at both ends of the baffle (301).

7. The coarse and fine grinding of silicon rods for integrated circuits according to claim 6, characterized in that: The two through slots (503) are equipped with filters (504), and the filters (504) are fixedly connected to the baffle (301).

8. The coarse and fine grinding of silicon rods for integrated circuits according to claim 7, characterized in that: The cover (501) has a triangular structure, and the through groove (503) is located higher than the top of the placement platform (302).

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