Gaseous isopropanol stable conveying system

Abstract

The utility model provides a gaseous isopropanol stable conveying system which comprises a mixing chamber, an isopropanol conveying pipeline and a carrier gas conveying pipeline, the mixing chamber is connected with a cleaning chamber through a main conveying pipeline, and a heating device and a pressure stabilizing device are sequentially arranged on the main conveying pipeline; the isopropanol conveying pipeline is connected with the mixing chamber, the input end of the isopropanol conveying pipeline is connected with a vaporization device, and the vaporization device is connected with a liquid storage tank; the carrier gas conveying pipeline is connected with the mixing chamber; the input end of the carrier gas conveying pipeline is connected with a nitrogen source. According to the gaseous isopropanol stable conveying system provided by the utility model, the isopropanol conveying pipeline and the carrier gas conveying pipeline are respectively arranged, so that the mixing proportion of gaseous isopropanol and nitrogen can be more accurately controlled, the evaporation efficiency of isopropanol is improved through the vaporization device, and the heating device and the pressure stabilizing device are arranged on the main conveying pipeline, so that the heating efficiency is improved. The pressure of mixed gas can be effectively stabilized, the temperature of the mixed gas can be increased, gaseous isopropanol is prevented from being condensed, and the cleaning yield is increased.

Description

Technical Field

[0001] This invention belongs to the field of wafer drying and cleaning technology, specifically relating to a stable gaseous isopropanol delivery system. Background Technology

[0002] With the rapid development of semiconductor manufacturing processes, the complexity of the fine structures on wafer surfaces has increased significantly, making the cleaning of high aspect ratio trenches, three-dimensional vias, and nanoscale features a key challenge. Traditional wet cleaning relies on liquid reagents, but due to the surface tension and fluidity limitations of liquids, it is difficult to effectively penetrate into the interior of high aspect ratio structures. Furthermore, residual liquid after cleaning can easily form watermarks or ion contamination, affecting device performance.

[0003] Gas-phase isopropanol (IPA) cleaning technology, due to its high volatility and low surface tension, can quickly penetrate into the nanoscale structure of the wafer surface, effectively dissolving and removing photoresist residues, metal ions, and particulate contaminants, while avoiding the residue problems of traditional wet cleaning. Therefore, it is widely used in the field of wafer drying and cleaning.

[0004] In existing technologies, inert gases (such as nitrogen or argon) are typically used as carrier gases. Liquid isopropanol is contacted via bubbling or spraying to accelerate its surface evaporation. The resulting gaseous isopropanol molecules adhere to the carrier gas and are then transported to the cleaning chamber through pipelines. However, this method suffers from low isopropanol evaporation efficiency and difficulty in controlling the mixing ratio of carrier gas and gaseous isopropanol, thus affecting the consistency of the cleaning effect. Furthermore, the gaseous isopropanol mixed with the carrier gas is prone to condensation into liquid during pipeline transport, affecting the stability and uniformity of the mixed gas delivery. It may also drip onto the wafer surface, forming defects and impacting the wafer cleaning yield. Utility Model Content

[0005] This invention provides a stable gaseous isopropanol delivery system that can precisely control the mixing ratio of carrier gas and gaseous isopropanol, ensuring consistent cleaning results, while effectively preventing the condensation of gaseous isopropanol and improving the wafer cleaning yield.

[0006] To achieve the above objectives, the technical solution adopted by this utility model is: to provide a stable gaseous isopropanol delivery system, connected to the cleaning chamber of the wafer, for supplying cleaning medium into the cleaning chamber, comprising:

[0007] The mixing chamber is connected to the cleaning chamber via a main delivery pipeline, and a heating device and a pressure stabilizing device are sequentially installed on the main delivery pipeline.

[0008] An isopropanol delivery pipeline, connected to the mixing chamber, is used to supply gaseous isopropanol into the mixing chamber. The inlet end of the isopropanol delivery pipeline is connected to a vaporization device, which is connected to a liquid storage tank.

[0009] A carrier gas delivery pipeline, connected to the mixing chamber, is used to supply nitrogen gas into the mixing chamber. The input end of the carrier gas delivery pipeline is connected to a nitrogen source.

[0010] In one possible implementation, a guide vane is connected to the inner peripheral wall of the mixing chamber, and the guide vane extends spirally along the axial direction of the mixing chamber.

[0011] In one possible implementation, a first flow valve and a first flow meter are sequentially provided on the isopropanol delivery pipeline, and a second flow valve and a second flow meter are sequentially provided on the carrier gas delivery pipeline.

[0012] In some embodiments, a third flow valve and a third flow meter are provided on the main delivery pipeline, both of which are located between the mixing chamber and the heating device.

[0013] In some embodiments, the main delivery pipeline is also equipped with a thermometer and a pressure sensor.

[0014] In some embodiments, the pressure stabilizing device is a pressure stabilizing pump, which is connected to the main delivery pipeline via a pressure regulating valve.

[0015] In some embodiments, the gaseous isopropanol stabilization delivery system further includes:

[0016] The flow controller is electrically connected to the first flow valve, the first flow meter, the second flow valve, the second flow meter, the third flow valve, and the third flow meter, respectively.

[0017] A temperature controller is electrically connected to both the heating device and the thermometer; and

[0018] The pressure controller is electrically connected to both the pressure sensor and the pressure regulating valve.

[0019] In one possible implementation, the main delivery pipeline is arranged to gradually slope downwards from the input end to the output end.

[0020] In one possible implementation, the outer peripheral wall of the main delivery pipeline is covered with an insulation layer.

[0021] In one possible implementation, the main delivery pipeline includes a straight pipe section and a bend section connected in sequence, wherein the bending radius R of the bend section satisfies 2d≤R≤10d, where d is the diameter of the straight pipe section.

[0022] The beneficial effects of the gaseous isopropanol stable delivery system provided by this utility model are as follows: Compared with the prior art, this gaseous isopropanol stable delivery system, by separately setting up isopropanol delivery pipelines and carrier gas delivery pipelines to supply gaseous isopropanol and nitrogen to the mixing chamber, facilitates independent adjustment of the delivery flow of the two pipelines, and can more accurately control the mixing ratio of gaseous isopropanol and nitrogen entering the mixing chamber, ensuring the consistency of cleaning effect. Simultaneously, the vaporization device can continuously and stably vaporize the liquid isopropanol supplied from the liquid storage tank into gaseous isopropanol, improving the evaporation efficiency of isopropanol, ensuring a sufficient supply of gaseous isopropanol, and ensuring the continuity of cleaning work. Furthermore, by setting up heating and pressure stabilizing devices on the main delivery pipeline, the pressure of the mixed gas in the main delivery pipeline can be effectively stabilized, and the temperature of the mixed gas can be increased to be higher than the dew point temperature of gaseous isopropanol, preventing gaseous isopropanol condensation and effectively avoiding the impact of condensate on gas delivery and wafer surface quality, thus improving the cleaning yield. Attached Figure Description

[0023] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 A schematic diagram of a gaseous isopropanol stable delivery system provided for an embodiment of this utility model;

[0025] Figure 2 This is a schematic diagram of the structure of the mixing chamber provided in an embodiment of the present invention.

[0026] The following are the labeling elements in the figure:

[0027] 1. Mixing chamber; 11. Flow guide vane; 2. Main delivery pipeline; 21. Heating device; 22. Pressure stabilizing device; 3. Isopropanol delivery pipeline; 31. Vaporization device; 32. Liquid storage tank; 321. Ball valve; 4. Carrier gas delivery pipeline; 41. Nitrogen source; 5. Flow controller; 51. First flow valve; 52. First flow meter; 53. Second flow valve; 54. Second flow meter; 55. Third flow valve; 56. Third flow meter; 6. Temperature controller; 61. Thermometer; 7. Pressure controller; 71. Pressure sensor; 72. Pressure regulating valve; 10. Cleaning chamber. Detailed Implementation

[0028] To make the technical problems, technical solutions, and beneficial effects of this utility model clearer, the present utility model will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present utility model and are not intended to limit the present utility model.

[0029] It should be noted that when an element is referred to as being "set on" another element, it can be directly on or indirectly on the other element. It should be understood that the terms "length," "width," "upper," "lower," "front," "rear," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing the invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of the invention. The terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the invention, "a plurality of" or "several" means two or more, unless otherwise explicitly specified.

[0030] Please refer to the following: Figures 1 to 2 This invention provides a gaseous isopropanol stable delivery system. The gaseous isopropanol stable delivery system is connected to a wafer cleaning chamber 10 and is used to supply cleaning media into the cleaning chamber 10. It includes a mixing chamber 1, an isopropanol delivery pipeline 3, and a carrier gas delivery pipeline 4. The mixing chamber 1 is connected to the cleaning chamber 10 via a main delivery pipeline 2, on which a heating device 21 and a pressure stabilizing device 22 are sequentially installed. The isopropanol delivery pipeline 3 is connected to the mixing chamber 1 and is used to supply gaseous isopropanol into the mixing chamber 1. A vaporization device 31 is connected to the input end of the isopropanol delivery pipeline 3, and the vaporization device 31 is connected to a liquid storage tank 32. The carrier gas delivery pipeline 4 is connected to the mixing chamber 1 and is used to supply nitrogen into the mixing chamber 1. The input end of the carrier gas delivery pipeline 4 is connected to a nitrogen source 41.

[0031] This embodiment provides a stable gaseous isopropanol delivery system. Compared with existing technologies, by separately setting up isopropanol delivery pipeline 3 and carrier gas delivery pipeline 4 to supply gaseous isopropanol and nitrogen to the mixing chamber 1, it is easy to independently adjust the flow rate of the two pipelines. This allows for more precise control of the mixing ratio of gaseous isopropanol and nitrogen entering the mixing chamber 1, ensuring consistent cleaning results. Simultaneously, the vaporization device 31 continuously and stably vaporizes the liquid isopropanol supplied by the liquid storage tank 32 into gaseous isopropanol, improving the evaporation efficiency of isopropanol and ensuring a sufficient supply of gaseous isopropanol, thus ensuring the continuity of the cleaning operation. Furthermore, by installing a heating device 21 and a pressure stabilizing device 22 on the main delivery pipeline 2, the pressure of the mixed gas in the main delivery pipeline 2 can be effectively stabilized, and the temperature of the mixed gas can be increased to be higher than the dew point temperature of gaseous isopropanol. This prevents the gaseous isopropanol from condensing, effectively avoiding the impact of condensate on gas delivery and wafer surface quality, and improving the cleaning yield.

[0032] In this embodiment, nitrogen is selected as the carrier gas, and the nitrogen source 41 can be set as a storage tank for storing nitrogen to ensure a sufficient supply of nitrogen.

[0033] Liquid storage tank 32 is used to store liquid isopropanol. A ball valve 321 connects liquid storage tank 32 to vaporization device 31. During wafer cleaning operations, ensure ball valve 321 is fully open to guarantee a sufficient supply of isopropanol. After cleaning, close ball valve 321 to prevent isopropanol leakage. Liquid storage tank 32 must be grounded and equipped with safety devices such as pressure relief valves and combustible gas alarms to ensure safe system operation.

[0034] The vaporization device 31 uses an immersion electric heating vaporizer or a membrane vaporizer. After liquid isopropanol enters the vaporization device 31 from the liquid storage tank 32, it is rapidly vaporized into gaseous isopropanol under high temperature (≥85℃). The vaporization rate per unit time reaches 5-10 kg / h, which is 2-3 times higher than the traditional bubbling method.

[0035] Sufficient nitrogen is supplied to the mixing chamber 1 through nitrogen source 41 and carrier gas delivery pipeline 4. At the same time, sufficient gaseous isopropanol is supplied to the mixing chamber 1 through the cooperation of liquid storage tank 32 and vaporization device 31 and isopropanol delivery pipeline 3. The setting of two branch pipelines facilitates independent control of the flow rates of the two gases. After being fully mixed in the mixing chamber 1, the two gases form a high-quality cleaning medium, which is delivered to the cleaning chamber 10 through the main delivery pipeline 2 to effectively clean the wafer, improve cleaning efficiency, and ensure the consistency of cleaning effect.

[0036] In some possible implementations, the aforementioned mixing chamber 1 adopts, for example... Figure 2 The structure shown. See also Figure 2A guide vane 11 is connected to the inner peripheral wall of the mixing chamber 1, and the guide vane 11 extends spirally along the axial direction of the mixing chamber 1.

[0037] In this embodiment, the spiral guide vane 11 forms a spiral gas flow channel within the mixing chamber 1. When gaseous isopropanol and nitrogen enter the mixing chamber 1, the gases are forced to flow along the spiral channel. This flow pattern causes the two gases to continuously change direction and speed during the flow process, increasing the contact area and contact time between the gases, thereby promoting thorough mixing and improving the uniformity and consistency of the mixed gas. This helps ensure the stability and effectiveness of the subsequent cleaning process.

[0038] Specifically, the helical angle of the guide vane 11 is 45°-60°, and the pitch is (1-1.5)D, where D refers to the inner diameter of the mixing chamber 1. The guide vane 11 has 2-3 layers. In addition, the working pressure in the mixing chamber 1 is maintained at 0.1-0.3MPa, which further avoids the condensation of gaseous isopropanol.

[0039] In some possible implementations, the aforementioned isopropanol delivery pipeline 3 and carrier gas delivery pipeline 4 adopt the following... Figure 1 The structure shown. See also Figure 1 The isopropanol delivery pipeline 3 is equipped with a first flow valve 51 and a first flow meter 52 in sequence, and the carrier gas delivery pipeline 4 is equipped with a second flow valve 53 and a second flow meter 54 in sequence.

[0040] The first flow valve 51 is used to adjust the supply of gaseous isopropanol according to the actual working conditions. The first flow meter 52 is used to monitor the flow rate of gaseous isopropanol in real time and provide feedback data. The operator can accurately control the supply of gaseous isopropanol based on the feedback data to achieve the concentration and amount required for the best cleaning effect.

[0041] Similarly, the second flow valve 53 and the second flow meter 54 work together to precisely control the nitrogen delivery flow rate. Precise control of the carrier gas flow rate is crucial for maintaining the proper proportions of the mixed gas, ensuring uniform distribution of gaseous isopropanol within the carrier gas, and providing the mixed gas with good flowability and delivery stability.

[0042] By controlling the two flow valves and two flow meters, the optimal mixing ratio of gaseous isopropanol and nitrogen is achieved, thereby ensuring the stability of the mixed gas performance and improving the consistency of the cleaning effect.

[0043] In some possible implementations, the main delivery pipeline 2 mentioned above adopts, for example... Figure 1 The structure shown. See also Figure 1 The main delivery pipeline 2 is equipped with a third flow valve 55 and a third flow meter 56, both of which are located between the mixing chamber 1 and the heating device 21.

[0044] The third flow meter 56 can monitor the total flow rate of the mixed gas flowing out of the mixing chamber 1 and into the main delivery pipeline 2 in real time and accurately. The third flow valve 55 is used to precisely adjust and control the total flow rate according to the actual process requirements, so as to ensure that the flow rate of the mixed gas entering the cleaning chamber 10 is stable and meets the specific process requirements.

[0045] Specifically, the first flow meter 52, the second flow meter 54, and the third flow meter 56 are all mass flow meters, used to directly measure the mass flow rate of each gas. They are not affected by changes in parameters such as temperature, pressure, and density, ensuring the accuracy of flow measurement and providing a reliable basis for precise flow control.

[0046] Furthermore, a thermometer 61 and a pressure sensor 71 are also installed on the main delivery pipeline 2. The thermometer 61 is used to monitor the temperature of the mixed gas in the main delivery pipeline 2 in real time, and the pressure sensor 71 is used to provide real-time feedback on the delivery pressure of the mixed gas.

[0047] Based on the temperature information fed back by thermometer 61, the heating power of heating device 21 on the main delivery pipeline 2 can be adjusted in a timely manner to ensure that the temperature inside the main delivery pipeline 2 is always higher than the dew point temperature of gaseous isopropanol, effectively preventing the condensation of gaseous isopropanol. Based on the pressure feedback from pressure sensor 71, the output power of pressure stabilizing device 22 on the main delivery pipeline 2 can be adjusted in a timely manner to avoid large fluctuations in gas pressure inside the main delivery pipeline 2, thereby avoiding affecting the vaporization state of gaseous isopropanol and helping to maintain stable delivery of gaseous isopropanol.

[0048] For example, the pressure stabilizing device 22 is a pressure stabilizing pump, which is connected to the main delivery pipeline 2 via a pressure regulating valve 72. The pressure stabilizing pump continuously provides stable pressure to the main delivery pipeline 2, ensuring the stability of the gas pressure within the pipeline and maintaining the effective delivery of gaseous isopropanol. The pressure regulating valve 72 can precisely adjust the output pressure of the pressure stabilizing pump according to actual process requirements, improving the system's versatility and flexibility.

[0049] In some embodiments, the gaseous isopropanol stable delivery system further includes a flow controller 5, a temperature controller 6, and a pressure controller 7. The flow controller 5 is electrically connected to a first flow valve 51, a first flow meter 52, a second flow valve 53, a second flow meter 54, a third flow valve 55, and a third flow meter 56, respectively. The temperature controller 6 is electrically connected to a heating device 21 and a thermometer 61, respectively. The pressure controller 7 is electrically connected to a pressure sensor 71 and a pressure regulating valve 72, respectively.

[0050] In this embodiment, the flow controller 5 is electrically connected to the first flow valve 51, the first flow meter 52, the second flow valve 53, the second flow meter 54, the third flow valve 55, and the third flow meter 56, respectively. It can acquire the flow data of the gas in the isopropanol delivery pipeline 3, the carrier gas delivery pipeline 4, and the main delivery pipeline 2 in real time, and accurately control the opening of each flow valve based on these data, thereby precisely adjusting the flow of gaseous isopropanol, nitrogen, and mixed gas, ensuring that gaseous isopropanol and carrier gas are mixed in a precise ratio, ensuring the stability of the cleaning medium composition, and thus improving the consistency and reliability of the wafer cleaning process.

[0051] Furthermore, by using flow controller 5 to control the concentration of gaseous isopropanol in the mixed gas to below 50% of the saturation concentration under the current temperature and pressure conditions, the condensation of gaseous isopropanol during transportation can be effectively reduced. Simultaneously, since gaseous isopropanol is toxic and flammable, controlling its concentration helps improve process stability and safety.

[0052] Temperature controller 6 is electrically connected to heating device 21 and thermometer 61, respectively. It can monitor the temperature of the mixed gas in the main delivery pipeline 2 in real time and automatically adjust the power of heating device 21 according to the set temperature parameters. This precise temperature control can effectively avoid problems such as condensation and incomplete vaporization of gaseous isopropanol caused by temperature fluctuations, ensuring that the mixed gas remains in a stable gaseous state during the delivery process, guaranteeing the normal operation of the delivery system and the smooth progress of the cleaning process.

[0053] Specifically, the heating device 21 can use heating methods such as resistance wire winding heating or silicone heating tape to ensure that the temperature of the mixed gas in the main delivery pipeline 2 is always 5-10°C higher than the dew point temperature of gaseous isopropanol, effectively preventing the condensation of gaseous isopropanol.

[0054] The pressure controller 7 is electrically connected to the pressure sensor 71 and the pressure regulating valve 72, and can monitor the gas pressure in the main delivery pipeline 2 in real time. When the pressure sensor 71 detects abnormal pressure fluctuations, the pressure controller 7 will automatically control the opening of the pressure regulating valve 72 and the operating frequency of the pressure stabilizing pump according to the preset pressure range, so as to ensure that the gas pressure in the main delivery pipeline 2 is stable within the range of the set value (operating pressure value) ±0.05MPa.

[0055] The automated control of the gaseous isopropanol stable delivery system, achieved through the configuration of flow controller 5, temperature controller 6, and pressure controller 7, reduces manual intervention and the possibility of human error. Operators only need to preset relevant parameters (such as flow rate, temperature, and pressure) in the system, and each controller will automatically adjust online based on real-time monitoring data to ensure stable system operation. Furthermore, the system can be remotely monitored and data recorded by connecting each controller to a host computer, allowing operators to understand the system's operating status in real time, perform data analysis and fault diagnosis, further improving the system's intelligence and management efficiency.

[0056] In some possible implementations, the main delivery pipeline 2 is arranged to gradually slope downwards from the input end to the output end. The inclined pipeline facilitates the automatic downward flow of any condensate that may be present in the main delivery pipeline 2 by means of gravity, preventing condensate from accumulating in the pipeline and thus preventing blockage of the main delivery pipeline 2 and damage to the equipment due to excessive condensate.

[0057] The main delivery pipeline 2 slopes downwards to facilitate the collection of condensate at its end. Operators can easily collect and treat the condensate by installing a dedicated collection device at the end, reducing the difficulty of maintenance. Specifically, the slope of the main delivery pipeline 2 is 3‰-5‰.

[0058] Preferably, the outer wall of the main delivery pipeline 2 is covered with an insulation layer. The insulation layer is made of materials with low thermal conductivity, such as rock wool or polyurethane foam, to ensure that the heat exchange between the mixed gas in the main delivery pipeline 2 and the external environment is minimized, which helps to maintain the temperature stability in the main delivery pipeline 2 and reduce the energy consumption of the heating device 21.

[0059] Furthermore, the main delivery pipeline 2 is made of smooth stainless steel or polytetrafluoroethylene to ensure the smoothness of the inner wall of the main delivery pipeline 2, which also helps to reduce the adsorption and condensation of gaseous isopropanol on the pipeline surface.

[0060] In some embodiments, the main delivery pipeline 2 includes a straight pipe section and a bend section connected in sequence, wherein the bending radius R of the bend section satisfies 2d≤R≤10d, where d is the diameter of the straight pipe section.

[0061] In actual installation of this gaseous isopropanol stable delivery system, the main delivery pipeline 2 will have bends and detours due to space utilization and other issues. In this embodiment, the main delivery pipeline 2 is composed of straight pipe sections and bends, and the bends are designed with large curvature radii to reduce the flow resistance of the mixed gas and the local pressure changes within the main delivery pipeline 2, thereby increasing the practicality of the system.

[0062] If the bending radius of the bend is too small, the mixed gas will form strong turbulence at the bend, resulting in increased pressure loss and affecting the conveying efficiency of gaseous isopropanol. In addition, gaseous isopropanol is prone to condensation at bends with too small a radius and accumulates in the inner wall recesses of the bend, which can not only block the pipeline but also cause secondary pollution.

[0063] In this embodiment, the bending radius R of the bend section is limited to 2d ≤ R ≤ 10d, which ensures that the mixed gas passes smoothly through the bend section, reduces pressure drop, maintains a stable gas flow rate, and provides a stable gas source for the cleaning process. Furthermore, the preferred range for the bending radius R of the bend section is 3d-5d.

[0064] The above description is only a preferred embodiment of the present utility model and is not intended to limit the present utility model. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model should be included within the protection scope of the present utility model.

Claims

1. A gaseous isopropanol stable delivery system, connected to a cleaning chamber (10) of a wafer, for supplying a cleaning medium into the cleaning chamber (10), characterized in that, include: The mixing chamber (1) is connected to the cleaning chamber (10) through the main delivery pipeline (2). The main delivery pipeline (2) is equipped with a heating device (21) and a pressure stabilizing device (22) in sequence. An isopropanol delivery pipeline (3), connected to the mixing chamber (1), is used to supply gaseous isopropanol into the mixing chamber (1). The input end of the isopropanol delivery pipeline (3) is connected to a vaporization device (31), which is connected to a liquid storage tank (32). A carrier gas delivery pipeline (4) is connected to the mixing chamber (1) and is used to supply nitrogen gas into the mixing chamber (1). The input end of the carrier gas delivery pipeline (4) is connected to a nitrogen source (41).

2. The gaseous isopropanol stable delivery system as described in claim 1, characterized in that, A guide vane (11) is connected to the inner peripheral wall of the mixing chamber (1), and the guide vane (11) extends spirally along the axial direction of the mixing chamber (1).

3. The gaseous isopropanol stable delivery system as described in claim 1, characterized in that, The isopropanol delivery pipeline (3) is provided with a first flow valve (51) and a first flow meter (52) in sequence, and the carrier gas delivery pipeline (4) is provided with a second flow valve (53) and a second flow meter (54) in sequence.

4. The gaseous isopropanol stable delivery system as described in claim 3, characterized in that, The main delivery pipeline (2) is equipped with a third flow valve (55) and a third flow meter (56), both of which are located between the mixing chamber (1) and the heating device (21).

5. The gaseous isopropanol stable delivery system as described in claim 4, characterized in that, The main delivery pipeline (2) is also equipped with a thermometer (61) and a pressure sensor (71).

6. The gaseous isopropanol stable delivery system as described in claim 5, characterized in that, The pressure stabilizing device (22) is a pressure stabilizing pump, which is connected to the main delivery pipeline (2) via a pressure regulating valve (72).

7. The gaseous isopropanol stable delivery system as described in claim 6, characterized in that, The gaseous isopropanol stable delivery system also includes: The flow controller (5) is electrically connected to the first flow valve (51), the first flow meter (52), the second flow valve (53), the second flow meter (54), the third flow valve (55), and the third flow meter (56), respectively. A temperature controller (6) is electrically connected to the heating device (21) and the thermometer (61), respectively; and The pressure controller (7) is electrically connected to the pressure sensor (71) and the pressure regulating valve (72), respectively.

8. The gaseous isopropanol stable delivery system as described in claim 1, characterized in that, The main delivery pipeline (2) is set to gradually slope downwards from the input end to the output end.

9. The gaseous isopropanol stable delivery system as described in claim 1, characterized in that, The outer wall of the main delivery pipeline (2) is covered with a heat insulation layer.

10. A stable gaseous isopropanol delivery system as described in claim 1, characterized in that, The main delivery pipeline (2) includes a straight pipe section and a bend pipe section connected in sequence. The bending radius R of the bend pipe section satisfies 2d≤R≤10d, where d is the diameter of the straight pipe section.

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