Film removing device and film removing system

Abstract

The utility model provides a film removing device and a film removing system. The film removing device comprises a machine table and two dismounting mechanisms. Wherein the machine table comprises fixed base plates located at the two ends and a plurality of guide rods connected with the two fixed base plates, the surfaces of the fixed base plates are perpendicular to the first direction, and the guide rods are arranged in parallel to the first direction. A frame-shaped accommodating device is arranged in the machine table and is used for fixing the periphery of the photolithography mask and completely exposing protective films on the two sides of the photolithography mask. The two dismounting mechanisms are symmetrically arranged on the two sides of the containing device. The dismounting mechanism comprises a linear motion mechanism, a heater and a plurality of fixing claws, the linear motion mechanism comprises a motion base plate and a motion push rod, the heater and the fixing claws are arranged on the side, close to the containing device, of the motion base plate, and clamping heads are arranged at the first ends of the fixing claws. According to the technical scheme provided by the invention, non-contact double-sided simultaneous film removal can be carried out on the photolithography mask with protective films pasted on the double sides, the film removal efficiency of the photolithography mask can be effectively improved, and the process cost is reduced.

Description

Technical Field

[0001] This application relates to the field of semiconductor processing, and more specifically, to a film removal apparatus and a film removal system. Background Technology

[0002] A photomask is a pattern master used in photolithography processes. Its main function is to accurately replicate a pre-set photolithographic pattern onto a wafer or substrate. Typically, a photomask has a transparent substrate with a mask pattern structure formed by an opaque light-blocking film on its front side and a smooth plane on its back side. During use, light emitted from a light source passes through the mask pattern structure and selectively illuminates the photoresist layer on the wafer or substrate, altering the chemical properties of the photoresist. Subsequent development removes the altered photoresist, resulting in a patterned photoresist layer. This patterned photoresist layer acts as a mask, facilitating subsequent selective etching, implantation, or deposition on the wafer or substrate to obtain a patterned wafer or substrate. During production, impurities in the environment may adhere to the photolithographic pattern on the photomask, causing unexpected changes and affecting the accuracy of subsequent replication onto the wafer or substrate. To address this issue, a common solution is to attach a protective film to the front side of the photomask to prevent impurities from directly contacting the photolithographic pattern.

[0003] In actual production, thinner photomasks are sometimes used, such as those with a thickness of 0.9 inches or 0.12 inches. During use, some impurities in the environment may adhere to the back of the photomask. Because the photomask is relatively thin, the shadows cast by these impurities can interfere with the imaging accuracy of the front side, and in severe cases, may even lead to complete failure of the photolithographic pattern transfer. Therefore, these photomasks need to have protective films applied not only to the front but also to the back. However, in existing technologies, the film removal devices for photomasks are usually single-sided heating removal mechanisms, meaning that only one side of the film can be removed at a time, which is not suitable for photomasks with double-sided films. In addition, existing film removal devices usually use contact removal methods, such as using pry bars to remove the film, which may damage the surface of the photomask and negatively impact the yield rate. Utility Model Content

[0004] The purpose of this application is to provide a film removal device and a film removal system. The film removal device can perform non-contact, simultaneous film removal on both sides of a photomask with protective films applied to both sides, which can effectively improve the film removal efficiency of such photomasks and reduce process costs.

[0005] In a first aspect, this application provides a film removal apparatus for double-sided film removal from a photomask. The photomask includes a substrate and protective films covering both sides of the substrate. Multiple clamping holes are provided on the outer side of the protective film frame. The film removal apparatus includes a machine base and two removal mechanisms. The machine base includes fixed substrates at both ends and multiple guide rods connecting the two fixed substrates. The surface of the fixed substrates is perpendicular to a first direction, and the guide rods are parallel to the first direction. A frame-shaped receiving device is provided in the machine base to fix the perimeter of the photomask and fully expose the protective films on both sides of the photomask. The two removal mechanisms are symmetrically arranged on both sides of the receiving device. Each removal mechanism includes a linear motion mechanism, a heater, and multiple fixing claws. The linear motion mechanism includes a moving substrate and a moving push rod. The heater and fixing claws are located on the side of the moving substrate closer to the receiving device, and a clamping head is provided at the first end of each fixing claw.

[0006] In use, the linear motion mechanism has a first working position away from the receiving device and a second working position close to the receiving device. When the linear motion mechanism reaches the second working position, the clamping head engages with the clamping hole on the outside of the photomask frame to achieve relative fixation between the removal mechanism and the frame.

[0007] In one feasible embodiment, the motion base plate is movably mounted on the guide rod.

[0008] In one feasible embodiment, the surface of the motion substrate is provided with a first adjustment mechanism that can move relative to the motion substrate in a second direction and a third direction, respectively, and the fixing claw is movably connected to the motion substrate through the first adjustment mechanism.

[0009] In one feasible solution, the second end of the fixing claw is provided with an elastic element.

[0010] In one feasible embodiment, a second adjustment mechanism that can move relative to the motion substrate along a first direction is movably disposed on the motion substrate, and the heater is movably connected to the motion substrate through the second adjustment mechanism.

[0011] In one feasible embodiment, the heater includes a back plate and one or more heating lamps disposed on the back plate, the heating lamps being arranged in a ring.

[0012] In one feasible solution, a lampshade for focusing light is provided on the outside of the heater.

[0013] In one feasible embodiment, the receiving device has an inlet / outlet on its side for inserting and removing the photomask.

[0014] In one feasible embodiment, an operating handle is rotatably mounted on the machine base. The operating handle is fixedly connected to a first worm gear, and a second worm gear, cooperating with the first worm gear, is mounted at the end of the motion push rod away from the motion base plate. The motion push rod is a lead screw structure, and a lead screw nut, cooperating with the motion push rod, is fixedly mounted at the center of the second worm gear. In use, rotating the operating handle drives the first worm gear to rotate, causing the second worm gear to rotate and driving the lead screw nut to rotate, thereby realizing the movement of the motion push rod along a first direction.

[0015] Secondly, this application also provides a film removal system, including a film removal device, a controller, and a driver. The controller is signal-connected to the heater and the driver, respectively, for controlling the heater to open or close, and controlling the driver to drive the linear motion mechanism to move along a first direction.

[0016] Compared with the prior art, the beneficial effects of this application include at least the following:

[0017] In use, the protective film removal device of this application employs a fixing claw on its removal mechanism that engages with the clamping holes of the protective film frame on the photomask. Simultaneously, a heater softens the adhesive on the photomask, allowing the removal mechanism to be moved and the protective film removed. Throughout the entire removal process, the removal mechanism does not come into contact with the substrate of the photomask, helping to reduce the probability of damage to the substrate surface. Furthermore, the device features a removal mechanism on each side of the receiving device, enabling simultaneous removal of protective film from both sides of the photomask, thereby effectively improving the removal efficiency and reducing process costs. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings used in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a first overall schematic diagram of a membrane removal device according to an embodiment of this application;

[0020] Figure 2 This is a partial schematic diagram of the dismantling mechanism;

[0021] Figure 3 This is a schematic diagram of the heater structure;

[0022] Figure 4 This is a schematic diagram of the heater's operating state;

[0023] Figure 5 A second overall schematic diagram of a membrane removal device with a controller and driver.

[0024] In the diagram: 1. Machine base; 2. Removal mechanism; 3. Controller; 4. Driver; 5. Photomask; 6. Operating handle; 101. Fixed substrate; 102. Guide rod; 103. Receiving device; 201. Linear motion mechanism; 202. Heater; 203. Fixed claw; 211. Motion substrate; 212. Motion push rod; 221. Heating lamp tube; 222. Back plate; 223. Lamp cover; 231. Clamping head; 232. Elastic element; 241. First adjustment mechanism; 242. Second adjustment mechanism; 251. Lateral motion device; 252. Longitudinal motion device; 601. First worm gear; 602. Second worm gear; L1. First direction; L2. Second direction; L3. Third direction. Detailed Implementation

[0025] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0026] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0027] like Figure 1 As shown, this application provides a film removal device for double-sided film removal of a photomask 5, wherein the photomask includes a substrate and a protective film covering both sides of the substrate, and a plurality of clamping holes are provided on the outer side of the protective film frame.

[0028] The film removal device includes a machine base 1 and two removal devices 2. The machine base 1 includes fixed substrates 101 at both ends and multiple guide rods 102 connecting the two fixed substrates 101. The surfaces of the fixed substrates 101 are perpendicular to a first direction L1, and the guide rods 102 are parallel to the first direction L1. A frame-shaped receiving device 103 is provided in the machine base 1. The receiving device 103 is used to fix the perimeter of the photomask 5 and fully expose the protective film on both sides of the photomask 5. Preferably, the receiving device 103 can be detachably fitted onto the guide rods 102 to allow for the replacement of different receiving devices 103 for photomasks of different sizes. Furthermore, an inlet / outlet can be provided on the side of the receiving device 103 for inserting and removing the photomask 5. Additionally, a fixing device (not shown in the figure), such as a fixing pin, can be provided on the receiving device 103 to better fix the photomask 5 and prevent it from shifting. The two removal devices 2 are symmetrically arranged on both sides of the receiving device 103. The dismantling mechanism 2 includes a linear motion mechanism 201, a heater 202, and multiple fixing claws 203. The linear motion mechanism 201 includes a motion base plate 211 and a motion push rod 212. The heater 202 and the fixing claws 203 are disposed on the side of the motion base plate 211 near the receiving device 103. The first end of the fixing claw 203 is provided with a clamping head 231.

[0029] like Figure 2 As shown, in use, the photomask is first fixed in the receiving device 103, at which point the linear motion mechanism 201 is in a first working position away from the receiving device 103. Then, as... Figure 1 As shown, the linear motion mechanism 201 moves along the first direction L1 to the second working position. At this time, the clamping head 231 engages with the clamping hole on the outside of the photomask frame, thus fixing the removal mechanism 2 relative to the frame. Simultaneously, the photomask is heated by the heater 202 to soften the adhesive. Then, the linear motion mechanism 201 moves along the first direction L1 to the first working position, thereby removing the protective film. During the entire film removal operation, the removal mechanism 2 does not come into contact with the photomask substrate, which helps reduce the probability of damage to the photomask surface. Furthermore, since the film removal device of this application has a removal mechanism 2 on each side of the receiving device 103, it can simultaneously remove the protective film from both sides of the photomask, thereby effectively improving the film removal efficiency for such photomasks and reducing process costs.

[0030] In one embodiment, such as Figure 1As shown, the motion substrate 211 is movably mounted on the guide rod 102. Mounting the motion substrate 211 on the guide rod 102 helps ensure the accurate movement direction of the removal mechanism 2 and provides stable support for the motion substrate, ensuring smooth movement and reducing the occurrence of offset or wobbling. This improves the accuracy and reliability of the film removal process and reduces the possibility of damage to the photomask. Preferably, the motion substrate 211 may be provided with a sleeve structure or a groove structure that matches the position and size of the guide rod 102 to improve the sliding effect between the motion substrate 211 and the guide rod 102. Furthermore, the guide rod 102 can be made of a metal material with high strength and low friction characteristics, including but not limited to stainless steel, aluminum alloy, and composite materials.

[0031] In one embodiment, such as Figure 2 As shown, the surface of the motion substrate 211 is provided with a first adjustment mechanism 241 that can move relative to the motion substrate 211 along the second direction L2 and the third direction L3, respectively. The fixing claw 203 is movably connected to the motion substrate 211 through the first adjustment mechanism 241. Figure 1 As shown, the first direction L1, the second direction L2, and the third direction L3 are mutually perpendicular. Figure 2 As shown, the first adjustment mechanism 241 includes a lateral motion device 251 that can move along a second direction L2 and a longitudinal motion device 252 that can move along a third direction L3. The lateral motion device 251 includes a lateral linear guide rail and a corresponding lateral slider disposed on the surface of the motion base plate 211. The longitudinal motion device 252 includes a longitudinal linear guide rail and a corresponding longitudinal slider disposed on the lateral slider. A fixing claw 203 is fixedly disposed on the longitudinal slider.

[0032] In one embodiment, such as Figure 2 As shown, the second end of the fixing claw 203 is provided with an elastic element 232. In use, during the movement of the linear motion mechanism 201 from the first working position to the second working position, the clamping head 231 of the fixing claw 203 first contacts the outer side of the photomask protective film frame. Due to the action of the elastic element 232, the clamping head 231 undergoes a slight displacement in the second direction L2, thereby conforming to the outer side of the film frame and continuing to advance along the first direction L1. When the clamping head 231 moves along the first direction L1 to the clamping hole of the film frame, under the elastic force of the elastic element 232, the fixing claw 203 drives the clamping head 231 to engage in the clamping hole, thus securely fixing the fixing claw 203 and the film frame. Preferably, as shown... Figure 2 As shown, a spring can be used as the elastic element 232. Alternatively, an elastic sheet can also be used as the elastic element 232; no specific limitation is made here.

[0033] In one embodiment, such as Figure 3As shown, a second adjustment mechanism 242, movable relative to the motion base plate 211 along a first direction L1, is movably disposed on the motion base plate 211. The heater 202 is movably connected to the motion base plate 211 via the second adjustment mechanism 242. Specifically, the second adjustment mechanism 242 may include a lead screw and a lead screw nut (not shown in the figure), wherein the lead screw is rotatably disposed on the motion base plate 211, and the lead screw nut is sleeved on the outside of the lead screw and fixedly disposed on the heater 202. As the lead screw rotates, the lead screw nut can drive the heater 202 to move along the first direction L1.

[0034] In one embodiment, such as Figure 3 As shown, the heater 202 includes a back plate 222 and one or more heating lamps 221 disposed on the back plate 222, the heating lamps 221 being arranged in a ring. The ring-shaped arrangement of the heating lamps 221 helps to distribute heat as evenly as possible around the periphery of the film frame, thereby allowing the adhesive between the protective film of the photomask and the substrate to soften uniformly, ensuring a smooth descaling process. Specifically, the back plate 222 is made of a high-temperature resistant material, such as aluminum, stainless steel, or ceramic, etc., without limitation. In addition, one or more of halogen heating lamps, tungsten heating lamps, and infrared heating lamps can be used as the heating lamps 221, without limitation.

[0035] Preferably, all heating lamps 221 can be connected in series. This is because if some heating lamps 221 malfunction and cannot work properly during use, some parts of the photomask will not be heated sufficiently, which may result in some adhesives not softening completely. When the linear motion mechanism 201 moves along the first direction L1 to the first working position, it may pull on the substrate of the photomask, causing unnecessary damage. However, when the series connection is used, if some heating lamps 221 malfunction and cannot work properly, all heating lamps 221 will not work, which helps to ensure that all parts of the photomask can be heated evenly.

[0036] In one embodiment, such as Figure 1 and Figure 4 As shown, a lampshade 223 for focusing light can be provided on the outside of the heater 202. Specifically, the lampshade 223 can be made of a material with high reflectivity and high temperature resistance, such as aluminum, stainless steel, or ceramic, without limitation. In addition, a high reflectivity coating, such as a silver coating or an aluminum coating, can be applied to the surface of the lampshade 223 near the heating lamp tube 221 to reflect light more effectively.

[0037] In one embodiment, such as Figure 1As shown, an operating handle 6 is rotatably mounted on the machine base 1. The operating handle 6 is fixedly connected to a first worm gear 601. A second worm gear 602, which cooperates with the first worm gear 601, is provided at the end of the motion push rod 212 away from the motion base plate 211. The motion push rod 212 is a lead screw structure, and a lead screw nut that cooperates with the motion push rod 212 is fixedly mounted at the center of the second worm gear 602. In use, rotating the operating handle 6 drives the first worm gear 601 to rotate, causing the second worm gear 602 to rotate and drive the lead screw nut to rotate, thereby realizing the movement of the motion push rod 212 along the first direction L1.

[0038] like Figure 5 As shown, this application also provides a film removal system, including a film removal device, a controller 3, and a driver 4. The controller 3 is signal-connected to both the heater 202 and the driver 4, controlling the heater 202 to open or close, and controlling the driver 4 to drive the linear motion mechanism 201 to move along a first direction L1. The controller 3 can also control the heating power of the heater 202 and has a timing function, allowing precise control of the heat received by the photomask by controlling the heating power and heating time. Furthermore, temperature sensors (not shown in the figure) can be installed on both sides of the receiving device 103, along with an alarm. The controller 3 is signal-connected to both the temperature sensors and the alarm, thereby promptly alerting the operator when the heating temperature is below or above a preset temperature range.

[0039] Through the coordinated operation of controller 3 and driver 4, the film removal system of this application achieves automated control of the film removal process. The operator only needs to place the photomask in the receiving device 103 and set the relevant parameters for controller 3, and the film removal system can automatically complete a series of operations such as heating, clamping, and film removal, reducing manual intervention, thereby improving work efficiency and reducing the risk caused by human error.

[0040] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A film removal apparatus for double-sided film removal of a photomask, the photomask comprising a substrate and a protective film covering both sides of the substrate, wherein a plurality of clamping holes are provided on the outer side of the protective film frame, characterized in that, The film removal device includes: The machine (1) includes a fixed substrate (101) located at both ends and a plurality of guide rods (102) connecting the two fixed substrates (101). The surface of the fixed substrate (101) is perpendicular to a first direction, and the guide rods (102) are arranged parallel to the first direction. A frame-shaped receiving device (103) is provided in the machine (1). The receiving device (103) is used to fix the periphery of the photomask and fully expose the protective film on both sides of the photomask. Two dismantling mechanisms (2) are symmetrically arranged on both sides of the receiving device (103); each dismantling mechanism (2) includes a linear motion mechanism (201), a heater (202) and multiple fixing claws (203). The linear motion mechanism (201) includes a motion base plate (211) and a motion push rod (212). The heater (202) and the fixing claws (203) are arranged on the side of the motion base plate (211) close to the receiving device (103). The first end of the fixing claw (203) is provided with a clamping head (231). In use, the linear motion mechanism (201) has a first working position away from the receiving device (103) and a second working position close to the receiving device (103). When the linear motion mechanism (201) reaches the second working position, the clamping head (231) cooperates with the clamping hole on the outside of the photomask film frame to achieve relative fixation between the removal mechanism (2) and the film frame.

2. The membrane removal device according to claim 1, characterized in that, The motion base plate (211) is movably mounted on the guide rod (102).

3. The membrane removal device according to claim 1, characterized in that, The surface of the motion base plate (211) is provided with a first adjustment mechanism (241) that can move relative to the motion base plate (211) in a second direction and a third direction, respectively, and the fixing claw (203) is movably connected to the motion base plate (211) through the first adjustment mechanism (241).

4. The membrane removal device according to claim 1, characterized in that, The second end of the fixing claw (203) is provided with an elastic element (232).

5. The membrane removal device according to claim 1, characterized in that, A second adjustment mechanism (242) that can move relative to the motion substrate (211) along a first direction is movably provided on the motion substrate (211), and the heater (202) is movably connected to the motion substrate (211) through the second adjustment mechanism (242).

6. The membrane removal device according to claim 1, characterized in that, The heater (202) includes a back plate (222) and one or more heating lamps (221) disposed on the back plate (222), the heating lamps (221) being arranged in a ring.

7. The membrane removal device according to claim 1, characterized in that, The heater (202) is provided with a lampshade (223) on the outside for focusing light.

8. The membrane removal device according to claim 1, characterized in that, The receiving device (103) has an inlet and outlet on its side for inserting and removing the photomask.

9. The membrane removal device according to claim 1, characterized in that, An operating handle (6) is rotatably mounted on the machine base (1). The operating handle (6) is fixedly connected to a first worm gear (601). A second worm gear (602) that cooperates with the first worm gear (601) is provided at one end of the motion push rod (212) away from the motion base plate (211). The motion push rod (212) is a lead screw structure. A lead screw nut that cooperates with the motion push rod (212) is fixedly provided at the center of the second worm gear (602). In use, the operating handle (6) is rotated to drive the first worm gear (601) to rotate, causing the second worm gear (602) to rotate and drive the lead screw nut to rotate, so that the motion push rod (212) moves along the first direction.

10. A membrane removal system, characterized in that, The device includes the film removal apparatus as described in any one of claims 1-9, and further includes a controller (3) and a driver (4), wherein the controller (3) is signal-connected to the heater (202) and the driver (4) respectively, and is used to control the heater (202) to open or close, and to control the driver (4) to drive the linear motion mechanism (201) to move along a first direction.

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