Reaction kettle

Abstract

The utility model provides a reaction kettle. The reaction kettle comprises a kettle body, a main shaft and a cleaning assembly, the kettle body is provided with a kettle top, a kettle bottom and a kettle wall, and a reaction cavity is formed among the kettle top, the kettle bottom and the kettle wall; the main shaft is arranged in the reaction cavity, one end of the main shaft is fixed on the kettle top, and the other end of the main shaft extends towards the kettle bottom; the cleaning assembly comprises an annular support and a cleaning pipeline, the annular support is arranged in the reaction cavity, and the annular support is located between the kettle wall and the main shaft; a spray head is arranged on the annular bracket, and an opening of the spray head faces one end, close to the kettle top, of the main shaft; the cleaning pipeline penetrates through the kettle wall and is used for conveying a cleaning solvent to the spray head. The cleaning effect of the reaction kettle can be improved.

Description

Technical Field

[0001] This utility model relates to the field of reactor cleaning technology, and more specifically, to a reactor. Background Technology

[0002] Polyurethane waterproof coatings undergo a dehydration reaction in a reactor and are then applied to building surfaces. They react with water to form a seamless film that isolates moisture, thus preventing leaks and dampness.

[0003] However, in the prior art, the cleaning components of the reactor are usually set on the main shaft, while polyurethane waterproof coatings usually use vacuum negative pressure dehydration, with the vacuum pipeline located above the reactor. When a large amount of coating is produced or the stirring power of the main shaft is high, vacuum negative pressure dehydration will cause the coating to splash and adhere to the top of the main shaft and the reactor top, resulting in poor cleaning effect of the cleaning components set on the main shaft.

[0004] Therefore, a new technical solution is needed to solve the above-mentioned technical problems. Utility Model Content

[0005] One objective of this invention is to provide a new technical solution for a reaction vessel.

[0006] According to a first aspect of the present invention, a reaction vessel is provided, wherein the reaction vessel comprises:

[0007] The vessel body has a top, a bottom, and a wall, and a reaction chamber is formed between the top, the bottom, and the wall;

[0008] A main shaft is disposed in the reaction chamber, one end of which is fixed to the top of the vessel, and the other end of which extends toward the bottom of the vessel.

[0009] A cleaning assembly includes an annular support and a cleaning pipe. The annular support is disposed in the reaction chamber and is located between the vessel wall and the main shaft. A nozzle is disposed on the annular support, with the opening of the nozzle facing the end of the main shaft near the top of the vessel. The cleaning pipe passes through the vessel wall to deliver cleaning solvent to the nozzle.

[0010] Optionally, the nozzle is a universal conical nozzle.

[0011] Optionally, the cleaning assembly further includes a wall support, which is disposed in the reaction chamber. One end of the wall support is connected to the annular support, and the other end of the wall support is connected to a cleaning pipe that penetrates the vessel wall.

[0012] Both the wall support and the annular support are hollow structures.

[0013] Optionally, a connecting rod is provided at one end of the main shaft near the bottom of the vessel, and a first scraper and a second scraper are provided on the connecting rod. The first scraper is tangent to the vessel wall, and the second scraper is tangent to the bottom of the vessel.

[0014] Optionally, it further includes a first stirring shaft and a second stirring shaft, both of which are disposed in the reaction chamber and are located between the annular support and the main shaft;

[0015] Wherein, one end of the first stirring shaft is fixed to the top of the vessel, and the other end of the first stirring shaft extends toward the bottom of the vessel; one end of the second stirring shaft is fixed to the top of the vessel, and the other end of the second stirring shaft extends toward the bottom of the vessel; the distance between the first stirring shaft and the bottom of the vessel is greater than the distance between the second stirring shaft and the bottom of the vessel.

[0016] Optionally, a first dispersion disk and a second dispersion disk are provided at one end of the first stirring shaft near the bottom of the vessel, and the distance between the first dispersion disk and the bottom of the vessel is greater than the distance between the second dispersion disk and the bottom of the vessel; a third dispersion disk and a fourth dispersion disk are provided at one end of the second stirring shaft near the bottom of the vessel, and the distance between the third dispersion disk and the bottom of the vessel is greater than the distance between the fourth dispersion disk and the bottom of the vessel.

[0017] The distance between the second dispersion disk and the bottom of the vessel is greater than the distance between the third dispersion disk and the bottom of the vessel.

[0018] Optionally, the reactor also includes a solvent pipeline and a vacuum pipeline, which are symmetrically arranged on the top of the reactor along the main axis. The solvent pipeline extends through the top of the reactor to deliver the reaction solvent to the reaction chamber; the vacuum pipeline extends through the top of the reactor to dehydrate the reaction raw materials for further reaction.

[0019] Optionally, it also includes a pressure sensing device for detecting the thickness of the coating, and at least one of the pressure sensing devices is installed on the top of the vessel, the main shaft, the first stirring shaft, and the second stirring shaft;

[0020] The cleaning pipe is equipped with a first valve, which can be opened or closed according to the coating thickness information detected by the pressure sensing device.

[0021] Optionally, it also includes a main pipeline, with both the cleaning pipeline and the solvent pipeline connected to the main pipeline; a second valve is provided on the solvent pipeline; when the first valve is open, the second valve is closed; when the first valve is closed, the second valve is open;

[0022] The cleaning solvent is made of the same material as the reaction solvent.

[0023] Optionally, the system also includes a solvent metering device and a motor, both of which are connected to the cleaning pipeline, and the distance between the solvent metering device and the vessel wall is greater than the distance between the motor and the vessel wall.

[0024] In this embodiment of the application, the reactor is equipped with an annular support with a nozzle between the reactor wall and the main shaft, and the nozzle opening faces the end of the main shaft near the top of the reactor, which effectively improves the cleaning effect of the reactor.

[0025] Other features and advantages of the present invention will become clear from the following detailed description of exemplary embodiments of the present invention with reference to the accompanying drawings. Attached Figure Description

[0026] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments of the present invention and, together with their description, serve to explain the principles of the present invention.

[0027] Figure 1 This is a schematic diagram of the structure of the reaction vessel in one embodiment of the present invention.

[0028] Figure 2 This is a top view of the reaction vessel in one embodiment of the present invention.

[0029] Explanation of reference numerals in the attached figures:

[0030] 1. Reactor body; 101. Reactor top; 102. Reactor bottom; 1021. Discharge port; 103. Reactor wall; 104. Reaction chamber;

[0031] 2. Main spindle; 201. Connecting rod;

[0032] 3. Cleaning components; 301. Circular bracket; 3011. Nozzle; 302. Cleaning pipe; 303. Wall bracket;

[0033] 4. Solvent metering device;

[0034] 5. Electric motor;

[0035] 6. First scraper;

[0036] 7. Second scraper;

[0037] 8. First stirring shaft; 801. First dispersion disc; 802. Second dispersion disc;

[0038] 9. Second stirring shaft; 901. Third dispersion disc; 902. Fourth dispersion disc;

[0039] 10. Solvent piping;

[0040] 11. Vacuum piping;

[0041] 12. Pressure sensing device;

[0042] 13. First valve;

[0043] 14. Second valve;

[0044] 15. Main pipeline. Detailed Implementation

[0045] Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. It should be noted that, unless otherwise specifically stated, the relative arrangement, numerical expressions, and values ​​of the components and steps set forth in these embodiments do not limit the scope of the present invention.

[0046] The embodiments of this application will now be described in detail, examples of which are illustrated in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0047] It should be noted that similar labels and letters in the following figures indicate similar items; therefore, once an item is defined in one figure, it does not need to be discussed further in subsequent figures.

[0048] According to one embodiment of this application, a reaction vessel is provided, see [link to embodiment]. Figure 1 and Figure 2 As shown, the reactor includes a vessel body 1, a main shaft 2, and a cleaning assembly 3. The vessel body 1 has a top 101, a bottom 102, and a wall 103, and a reaction chamber 104 is formed between the top 101, the bottom 102, and the wall 103. The main shaft 2 is disposed in the reaction chamber 104, with one end fixed to the top 101 and the other end extending toward the bottom 102. The cleaning assembly 3 includes an annular support 301 and a cleaning pipe 302. The annular support 301 is disposed in the reaction chamber 104 and is located between the wall 103 and the main shaft 2. A nozzle 3011 is disposed on the annular support 301, with the opening of the nozzle 3011 facing the end of the main shaft 2 near the top 101. The cleaning pipe 302 passes through the wall 103 to deliver cleaning solvent to the nozzle 3011.

[0049] Specifically, the reactor provided in this application embodiment can perform vacuum negative pressure dehydration on the reaction raw materials of the polyurethane waterproof coating, so that the reaction raw materials of the polyurethane waterproof coating can react better in the subsequent process and generate polyurethane waterproof coating. The polyurethane waterproof coating, after being applied to the building surface, can react with water to form a seamless, moisture-proof film. This film can prevent leakage and moisture. Furthermore, compared to other waterproof materials, the polyurethane waterproof coating prepared by the reactor in this application can be applied to areas with many pipe roots or corners, resulting in better waterproofing of the building surface.

[0050] Of course, the reaction vessel described in this application embodiment can also be used to prepare waterproof coatings made of other materials. Those skilled in the art can choose according to actual needs, and this application does not impose specific limitations here. It should be noted that the coatings described below can be polyurethane waterproof coatings or waterproof coatings made of other materials.

[0051] Among them, such as Figure 1 As shown, the reactor body 1 of this application has a top 101, a bottom 102, and a wall 103. One end of the wall 103 is connected to the top 101, and the other end is connected to the bottom 102, forming a reaction chamber 104 for dehydrating the raw materials for coatings between the top 101, bottom 102, and wall 103. A main shaft 2 is provided inside the reaction chamber 104. One end of the main shaft 2 is fixed to the top 101, and the other end extends towards the bottom 102. The main shaft 2 is used to stir the raw materials to improve the coating preparation efficiency. One end of the main shaft 2 can be fixed at the center of the top 101 to better stir the raw materials in the reaction chamber 104, making the coating preparation efficiency of the reactor higher. The bottom 102 is provided with a discharge port 1021, from which the coating formed in the reaction chamber 104 can flow out. The other end of the main shaft 2 can extend toward the bottom of the vessel 102 and have a certain distance between it and the outlet 1021 of the bottom of the vessel 102, so that the coating formed in the reaction chamber 104 can flow to the outlet 1021 more quickly.

[0052] Furthermore, since the reactor described in this application uses vacuum negative pressure dehydration, when the reactor produces a large amount of coating or the main shaft 2 in the reactor has a high power, vacuum negative pressure dehydration causes the coating to splash and adhere to the top 101 of the reactor and the end of the main shaft 2 near the top 101. After a period of time, the adhered coating will become soft glue impurities or hard impurities, and will gradually thicken with production time, thus seriously affecting the stirring efficiency of the main shaft 2. Moreover, during the production process, the adhered coating will fall back into the reactive coating after the reaction solidifies, and because the quality of the adhered coating is different from that of the reactive coating, it is equivalent to the adhered coating becoming an impurity in the reactive coating, resulting in lower quality of the coating produced subsequently. In addition, after large pieces of soft glue impurities or hard impurities fall off, they will flow with the output of the coating to the discharge port 1021, which may block the discharge port 1021 in severe cases, resulting in poor production efficiency of the reactor.

[0053] Therefore, in order to remove the coating adhering to the top 101 of the reactor and the end of the main shaft 2 near the top 101, the reactor described in this application is further provided with a cleaning assembly 3. The cleaning assembly 3 includes an annular support 301 and a cleaning pipe 302. The annular support 301 is disposed in the reaction chamber 104, and the cleaning pipe 302 passes through the reactor wall 103 to communicate with the annular support 301 disposed in the reaction chamber 104. The annular support 301 is disposed between the reactor wall 103 and the main shaft 2, and a nozzle 3011 is provided on the annular support 301. The opening of the nozzle 3011 faces the end of the main shaft 2 near the top 101 of the reactor.

[0054] Therefore, when a large amount of coating adheres to the top of the reactor 101 or the end of the main shaft 2 near the top of the reactor 101, this application can transport the cleaning solvent to the nozzle 3011 through the cleaning pipe 302. The nozzle 3011 sprays a large amount of cleaning solvent onto the top of the reactor 101 and the end of the main shaft 2 near the top of the reactor 101, thereby effectively improving the cleaning effect of the reactor and avoiding the impact of the adhered coating on the stirring efficiency of the main shaft 2 and the production quality of the coating.

[0055] Furthermore, the annular support 301 described in this application has a hollow structure, which allows the cleaning solvent transported by the cleaning pipe 302 to be delivered to the nozzle 3011. Of course, the annular support 301 may not be a hollow structure; in this case, the cleaning assembly 3 also includes a delivery pipe (not shown in the figure), which is disposed in the reaction chamber and fixed to the annular support 301.

[0056] Furthermore, the nozzle 3011 described in this application can be configured as three nozzles, which are evenly arranged along the annular support 301. This arrangement allows for better cleaning of the vessel top 101 and the end of the main shaft 2 near the vessel top 101 when cleaning these surfaces. Of course, the nozzle 3011 described in this application can also be configured as one, two, or more nozzles. Those skilled in the art can choose according to actual needs, and this application does not impose specific limitations.

[0057] In one embodiment, the nozzle 3011 is a universal conical nozzle.

[0058] Specifically, in this embodiment, by setting the nozzle 3011 to a universal conical nozzle, on the one hand, the nozzle 3011 can be freely adjusted so that, in addition to cleaning the coating adhering to the top of the reactor 101 and the end of the main shaft 2 near the top of the reactor 101, the nozzle 3011 can also clean the coating adhering to the end of the main shaft 2 away from the top of the reactor 101 or the coating on the reactor wall 103; on the other hand, the cleaning solvent sprayed by the nozzle 3011 can be in a conical shape, so that the nozzle 3011 can clean the coating adhering to the top of the reactor 101 and the end of the main shaft 2 near the top of the reactor 101 over a large area. Thus, by setting a smaller number of nozzles 3011, the cleaning of the reactor can be achieved, effectively reducing the manufacturing cost of the reactor.

[0059] In another embodiment, the nozzle 3011 can also be a universal conical high-pressure nozzle, thereby further improving the cleaning effect on the vessel top 101 and the main shaft 2 when cleaning them.

[0060] In one embodiment, the cleaning assembly 3 further includes a wall support 303 disposed in the reaction chamber 104. One end of the wall support 303 is connected to the annular support 301, and the other end of the wall support 303 is connected to a cleaning pipe 302 that penetrates the vessel wall 103. Both the wall support 303 and the annular support 301 are hollow structures.

[0061] Specifically, such as Figure 1 and Figure 2As shown in the embodiment of this application, one end of the wall support 303 is connected to the annular support 301, and the other end of the wall support 303 is connected to the cleaning pipe 302 that runs through the reactor wall 103. Both the wall support 303 and the annular support 301 are hollow structures. The hollow structure of the wall support 303 and the annular support 301 can transport the cleaning solvent in the cleaning pipe 302 to the nozzle 3011, thereby effectively reducing the piping of the cleaning components in the reactor and further improving the cleaning efficiency of the nozzle 3011.

[0062] In this embodiment, the wall support 303 and the annular support 301 may not be hollow structures. In this case, the cleaning solvent in the cleaning pipe 302 can be transported to the nozzle 3011 through an additional conveying pipe, and the additional conveying pipe is fixed to the wall support 303 and the annular support 301.

[0063] In one embodiment, a connecting rod 201 is provided at one end of the main shaft 2 near the bottom of the vessel 102. A first scraper 6 and a second scraper 7 are provided on the connecting rod 201. The first scraper 6 is tangent to the vessel wall 103, and the second scraper 7 is tangent to the bottom of the vessel 102.

[0064] Specifically, such as Figure 1 As shown in the embodiment of this application, the reactor further includes a first scraper 6 and a second scraper 7. There are two first scrapers 6, which are fixed to the main shaft 2 by a connecting rod 201 on the main shaft 2. The two first scrapers 6 are symmetrically arranged with respect to the main shaft 2, and both first scrapers 6 are tangent to the reactor wall 103. There are also two second scrapers 7, which are fixed to the main shaft 2 by a connecting rod 201 on the main shaft 2. The two second scrapers 7 are symmetrically arranged with respect to the main shaft 2, and both second scrapers 7 are tangent to the reactor bottom 102.

[0065] When producing coatings in the reactor, the coatings tend to settle more easily at the bottom 102 of the reactor due to their composition. This can cause the main shaft 2 to overload its motor when agitating the coatings. Furthermore, the coatings settling at the bottom 102 can easily clog the discharge port 1021 during discharge. Therefore, the two first scrapers 6 and two second scrapers 7 provided in the reactor of this application can rotate with the main shaft 2. Since both first scrapers 6 are tangent to the reactor wall 103 and both second scrapers 7 are tangent to the bottom 102, the first scrapers 6 and second scrapers 7 can scrape the reactor wall 103 and the bottom 102 respectively, thereby effectively preventing the coatings from adhering to the reactor wall 103 and the bottom 102, thus avoiding overloading of the motor of the main shaft 2 or clogging of the discharge port 1021.

[0066] Furthermore, since the formed coating is prone to sedimentation, the vacuuming effect on the coating is poor. Therefore, in order to further improve the quality of the coating prepared by the reactor, the two first scrapers 6 and the two second scrapers 7 provided in the reactor of this application can also stir the coating during the rotation of the main shaft 2, thereby further improving the dispersion effect of the coating by the reactor.

[0067] Alternatively, the reactor described in this application may be equipped with only one first scraper 6 and one second scraper 7, or the reactor may be equipped with three first scrapers 6 and three second scrapers 7. Those skilled in the art can choose according to actual needs, and this application does not impose specific restrictions here.

[0068] In one embodiment, the reactor further includes a first stirring shaft 8 and a second stirring shaft 9, both of which are disposed in the reaction chamber 104 and are located between the annular support 301 and the main shaft 2. One end of the first stirring shaft 8 is fixed to the reactor top 101, and the other end extends towards the reactor bottom 102. One end of the second stirring shaft 9 is fixed to the reactor top 101, and the other end extends towards the reactor bottom 102. The distance between the first stirring shaft 8 and the reactor bottom 102 is greater than the distance between the second stirring shaft 9 and the reactor bottom 102.

[0069] Specifically, such as Figure 1As shown in the embodiment of this application, the reaction vessel further includes a first stirring shaft 8 and a second stirring shaft 9. Both the first stirring shaft 8 and the second stirring shaft 9 are disposed in the reaction chamber 104, and one end of each is symmetrically disposed along the main shaft 2 at the top of the vessel 101. The first stirring shaft 8 and the second stirring shaft 9 also have a third end, both extending towards the bottom of the vessel 102. The distance between the other end of the first stirring shaft 8 and the bottom of the vessel 102 is greater than the distance between the other end of the second stirring shaft 9 and the bottom of the vessel 102.

[0070] Therefore, this application uses the first stirring shaft 8 to stir the reaction material near the top 101 of the reaction chamber 104, and the second stirring shaft 9 to stir the reaction material near the bottom 102 of the reaction chamber 104, which effectively improves the stirring effect of the reaction vessel on the reaction material.

[0071] Furthermore, the first stirring shaft 8 of this application is also disposed between the annular support 301 and the main shaft 2. Therefore, when a large amount of coating is produced in the reactor or the power of the first stirring shaft 8 is high, causing coating to splash and adhere to the first stirring shaft 8, this application can use the nozzle 3011 on the annular support 301 to spray a large amount of cleaning solvent onto the first stirring shaft 8, thereby cleaning the first stirring shaft 8 and effectively preventing the adhered coating from affecting the stirring efficiency of the first stirring shaft 8. Of course, the second stirring shaft 9 of this application can also be disposed between the annular support 301 and the main shaft 2. Therefore, when a large amount of coating is produced in the reactor or the power of the second stirring shaft 9 is high, causing coating to splash and adhere to the second stirring shaft 9, this application can also use the nozzle 3011 on the annular support 301 to spray a large amount of cleaning solvent onto the second stirring shaft 9, thereby cleaning the second stirring shaft 9 and effectively preventing the adhered coating from affecting the stirring efficiency of the second stirring shaft 9.

[0072] In one embodiment, a first dispersion disk 801 and a second dispersion disk 802 are provided at one end of the first stirring shaft 8 near the bottom of the vessel 102, and the distance between the first dispersion disk 801 and the bottom of the vessel 102 is greater than the distance between the second dispersion disk 802 and the bottom of the vessel 102; a third dispersion disk 901 and a fourth dispersion disk 902 are provided at one end of the second stirring shaft 9 near the bottom of the vessel 102, and the distance between the third dispersion disk 901 and the bottom of the vessel 102 is greater than the distance between the fourth dispersion disk 902 and the bottom of the vessel 102; wherein, the distance between the second dispersion disk 802 and the bottom of the vessel 102 is greater than the distance between the third dispersion disk 901 and the bottom of the vessel 102.

[0073] Specifically, such as Figure 1 As shown in the embodiment of this application, the first stirring shaft 8 is provided with a first dispersing disk 801 near the top of the vessel 101 and a second dispersing disk 802 away from the top of the vessel 101. The first dispersing disk 801 and the second dispersing disk 802 can rotate with the first stirring shaft 8. The second stirring shaft 9 is provided with a third dispersing disk 901 near the top of the vessel 101 and a fourth dispersing disk 902 away from the top of the vessel 101. The third dispersing disk 901 and the fourth dispersing disk 902 can rotate with the second stirring shaft 9. The first dispersing disk 801, the second dispersing disk 802, the third dispersing disk 901, and the fourth dispersing disk 902 are all peripheral toothed dispersing disks.

[0074] Therefore, this application greatly increases the dispersion effect of the coating in the reaction chamber 104 by dispersing the coating through the first dispersion disk 801, the second dispersion disk 802, the third dispersion disk 901 and the fourth dispersion disk 902, thus avoiding the situation where the coating is not dispersed and impurities are generated due to local reaction, resulting in poor coating quality.

[0075] In this application, the distance between the first dispersion disk 801 and the bottom of the reactor 102 is greater than the distance between the second dispersion disk 802 and the bottom of the reactor 102, the distance between the third dispersion disk 901 and the bottom of the reactor 102 is greater than the distance between the fourth dispersion disk 902 and the bottom of the reactor 102, and the distance between the second dispersion disk 802 and the bottom of the reactor 102 is greater than the distance between the third dispersion disk 901 and the bottom of the reactor 102. That is, in this application, the first dispersion disk 801, the second dispersion disk 802, the third dispersion disk 901 and the fourth dispersion disk 902 are arranged sequentially along the direction from the top of the reactor 101 to the bottom of the reactor 102, so that the first dispersion disk 801, the second dispersion disk 802, the third dispersion disk 901 and the fourth dispersion disk 902 can respectively disperse the coating in different parts of the reaction chamber 104 at high speed, thereby further improving the production quality of the coating.

[0076] Furthermore, in this embodiment, the first stirring shaft 8 may also be provided with a first spiral dispersion disk (not shown in the figure), which is fixed to the first stirring shaft 8 along the direction from the top of the vessel 101 to the bottom of the vessel 102; the second stirring shaft 9 may also be provided with a second spiral dispersion disk (not shown in the figure), which is fixed to the second stirring shaft 9 along the direction from the top of the vessel 101 to the bottom of the vessel 102. Thus, by providing the first spiral dispersion disk and the second spiral dispersion disk, this application effectively achieves the dispersion of coatings in different parts of the reaction chamber 104.

[0077] Of course, in the embodiments of this application, the first stirring shaft 8 and the second stirring shaft 9 can also be configured with other structures of dispersion discs, as long as they can achieve the dispersion of the coating. Those skilled in the art can make selections according to actual needs, and this application does not make specific restrictions here.

[0078] In one embodiment, the reaction vessel further includes a solvent pipe 10 and a vacuum pipe 11, which are symmetrically arranged on the top 101 of the vessel along the main axis 2. The solvent pipe 10 passes through the top 101 of the vessel to deliver the reaction solvent to the reaction chamber 104; the vacuum pipe 11 passes through the top 101 of the vessel to dehydrate the reaction raw materials for the next reaction.

[0079] Specifically, such as Figure 1 As shown in the embodiment of this application, the reaction vessel further includes a solvent pipeline 10 and a vacuum pipeline 11. One end of the solvent pipeline 10 is connected to the supply end of the reaction solvent, and the other end of the solvent pipeline 10 passes through the top of the vessel 101 and is connected to the reaction chamber 104. One end of the vacuum pipeline 11 is connected to a vacuum pump, and the other end of the vacuum pipeline 11 passes through the top of the vessel 101 and is connected to the reaction chamber 104.

[0080] Therefore, the vacuum pipe 11 of this application evacuates the reaction raw materials in the reaction chamber 104 to remove water, and the solvent pipe 10 delivers the reaction solvent to the reaction chamber 104, which effectively improves the production efficiency and quality of the coating.

[0081] Since the vacuum pipe 11 is under negative pressure when vacuuming, this application effectively avoids the reaction solvent coming out of the solvent pipe 10 being drawn away by the vacuum pipe 11 due to the close distance between the vacuum pipe 11 and the solvent pipe 10 by symmetrically arranging the solvent pipe 10 and the vacuum pipe 11 along the main axis 2 on the top of the reactor 101.

[0082] In one embodiment, the reactor further includes a pressure sensing device 12 for detecting the thickness of the coating. At least one pressure sensing device 12 is installed on the reactor top 101, the main shaft 2, the first stirring shaft 8, and the second stirring shaft 9. A first valve 13 is provided on the cleaning pipe 302, which can be opened or closed according to the coating thickness information detected by the pressure sensing device 12.

[0083] Specifically, such as Figure 1 As shown in the embodiment of this application, the reactor further includes a pressure sensing device 12. Multiple pressure sensing devices 12 are provided, and these devices can be respectively disposed on the reactor top 101, the main shaft 2, the first stirring shaft 8, and the second stirring shaft 9. The pressure sensing device 12 can detect the thickness of the coating adhering to the reactor top 101, the main shaft 2, the first stirring shaft 8, and the second stirring shaft 9. A first valve 13 is provided on the cleaning pipe 302, which can control the connection or disconnection of the cleaning pipe 302. The first valve 13 can be electrically connected to the pressure sensing device 12.

[0084] When the pressure sensing device 12 detects that the thickness of the coating adhering to the top of the vessel 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 is greater than a first threshold, the first valve 13 opens, the cleaning pipe 302 delivers cleaning solvent to the nozzle 3011, and the nozzle 3011 sprays a large amount of cleaning solvent onto the top of the vessel 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 to achieve cleaning of the top of the vessel 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9.

[0085] When the pressure sensing device 12 detects that the thickness of the coating adhering to the top of the reactor 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 is less than or equal to a first threshold, the first valve 13 closes, the cleaning pipe 302 disconnects, and the reactor stops cleaning the top of the reactor 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9.

[0086] Therefore, this application uses the pressure sensing device 12 to detect the thickness of the coating adhering to the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 in real time. When the thickness of the coating adhering to the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 is greater than a first threshold, the first valve 13 can be opened immediately to clean the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9, effectively improving the cleaning efficiency of the reactor.

[0087] Furthermore, the reactor described in this application can be cleaned when the reaction solvent is added at the end. At this time, only a small amount of coating remains on the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9. This can prevent excessive cured coating adhering to the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 from falling into the coating and forming impurities, thereby effectively improving the quality of the coating prepared by the reactor.

[0088] In addition, since some of the coating needs to be dehydrated before the reaction vessel described in this application is prepared, cleaning it directly when the reaction solvent is added at the beginning can easily cause the cleaning solvent to be drawn away by the vacuum pump, thus failing to achieve the cleaning effect. Furthermore, the reaction vessel is in a high-temperature state during dehydration, which can also easily cause the cleaning solvent to evaporate. Therefore, this application effectively avoids the above problems by cleaning it when the reaction solvent is added at the end.

[0089] In one embodiment, the reactor further includes a main pipeline 15, and the cleaning pipeline 302 and the solvent pipeline 10 are both connected to the main pipeline 15; a second valve 14 is provided on the solvent pipeline 10; when the first valve 13 is open, the second valve 14 is closed; when the first valve 13 is closed, the second valve 14 is open; wherein, the material of the cleaning solvent is the same as the material of the reaction solvent.

[0090] Specifically, since the cleaning solvent used in this application is made of the same material as the reaction solvent used to prepare the coating, this application can achieve cleaning of the reactor top 101, the main shaft 2, the first stirring shaft 8 or the second stirring shaft 9 during the coating production process, thereby effectively improving the cleaning effect of the reactor.

[0091] Among them, such as Figure 1 As shown, the reactor described in this application further includes a main pipeline 15, which is used to transport solvent, which can be used as a cleaning solvent or a reaction solvent. One end of the main pipeline 15 is connected to the solvent supply end, and the other end of the main pipeline 15 is connected to the cleaning pipeline 302 and the solvent pipeline 10, respectively. The cleaning pipeline 302 is provided with a first valve 13, and the solvent pipeline 10 is provided with a second valve 14. The first valve 13 and the second valve 14 are electrically connected.

[0092] When the pressure sensing device 12 detects that the thickness of the coating adhering to the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 is greater than a first threshold, the first valve 13 opens and the second valve 14 closes. The main pipeline 15 delivers solvent to the nozzle 3011 through the cleaning pipeline 302. The nozzle 3011 sprays a large amount of solvent onto the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 to achieve cleaning of the reactor top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9.

[0093] When the pressure sensing device 12 detects that the thickness of the coating adhering to the top of the vessel 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 is less than or equal to a first threshold, the first valve 13 closes and the second valve 14 opens. The main pipeline 15 delivers solvent to the reaction chamber 104 through the solvent pipeline 10, thereby carrying out the coating production-related reaction steps.

[0094] In one embodiment, the reactor further includes a solvent metering device 4 and a motor 5. Both the solvent metering device 4 and the motor 5 are connected to the cleaning pipe 302, and the distance between the solvent metering device 4 and the reactor wall 103 is greater than the distance between the motor 5 and the reactor wall 103.

[0095] Specifically, such as Figure 1 and Figure 2 As shown in the embodiment of this application, the reaction vessel also includes a solvent metering device 4, which is disposed in the cleaning pipe 302. The solvent metering device 4 is used to calculate the mass of the cleaning solvent delivered to the nozzle 3011 through the cleaning pipe 302. Therefore, when cleaning of the vessel top 101, the main shaft 2, the first stirring shaft 8, or the second stirring shaft 9 is required during production, this application can add appropriate cleaning solvent according to the coating production formula and the cleaning status of the coating in the reaction chamber 104, effectively improving the coating production efficiency and avoiding the situation where excessive or insufficient cleaning solvent leads to poor coating quality.

[0096] Since the reactor can be cleaned when the reaction solvent is added at the end, this application can better add the weight of the cleaning solvent according to the coating formula by setting the solvent metering device 4 on the cleaning pipe 302, so as to complete the cleaning of the reactor when the production is completed.

[0097] In addition, the reaction vessel described in this application also includes a motor 5, which is disposed in the cleaning pipe 302. The motor 5 is used to drive the cleaning solvent to be sprayed at high pressure on the nozzle 3011 so that the reaction vessel can achieve a better cleaning effect.

[0098] In addition, considering that the motor 5 is used to spray the cleaning solvent at high pressure, the distance between the solvent metering device 4 and the vessel wall 103 is greater than the distance between the motor 5 and the vessel wall 103. That is, by setting the solvent metering device 4 at the end of the motor 5 away from the nozzle 3011, the failure rate of the solvent metering device 4 is effectively reduced.

[0099] The above embodiments mainly describe the differences between the various embodiments. As long as the different optimization features between the various embodiments are not contradictory, they can be combined to form a better embodiment. For the sake of brevity, they will not be elaborated here.

[0100] Although specific embodiments of the present invention have been described in detail by way of examples, those skilled in the art should understand that the above examples are for illustrative purposes only and are not intended to limit the scope of the present invention. Those skilled in the art should understand that modifications can be made to the above embodiments without departing from the scope and spirit of the present invention. The scope of the present invention is defined by the appended claims.

Claims

1. A reaction vessel, characterized by, The utility model relates to a kind of reaction kettle, including: Kettle body (1), the kettle body (1) has kettle top (101), kettle bottom (102) and kettle wall (103), reaction cavity (104) is formed between the kettle top (101), the kettle bottom (102) and the kettle wall (103); Main shaft (2), the main shaft (2) is arranged in the reaction cavity (104), one end of the main shaft (2) is fixed to the kettle top (101), and the other end of the main shaft (2) extends towards the kettle bottom (102); Cleaning assembly (3), the cleaning assembly (3) includes annular support (301) and cleaning pipeline (302), the annular support (301) is arranged in the reaction cavity (104), and the annular support (301) is located between the kettle wall (103) and the main shaft (2);Annular support (301) is provided with spray head (3011), and the opening of the spray head (3011) is close to one end of the main shaft (2) near the kettle top (101);The cleaning pipeline (302) penetrates the kettle wall (103) to be used to deliver cleaning solvent to the spray head (3011).

2. The reactor of claim 1, wherein The spray head (3011) is a universal conical spray head.

3. The reactor of claim 1, wherein The cleaning assembly (3) further includes wall support (303), the wall support (303) is arranged in the reaction cavity (104), one end of the wall support (303) is communicated with the annular support (301), and the other end of the wall support (303) is communicated with the cleaning pipeline (302) penetrating the kettle wall (103); Wherein, the wall support (303) and the annular support (301) are both hollow structures.

4. The reactor of claim 1, wherein The main shaft (2) is provided with connecting rod (201) close to one end of the kettle bottom (102), the connecting rod (201) is provided with first scraper (6) and second scraper (7), the first scraper (6) is tangent to the kettle wall (103), and the second scraper (7) is tangent to the kettle bottom (102).

5. The reactor of claim 1, wherein Further including first stirring shaft (8) and second stirring shaft (9), the first stirring shaft (8) and the second stirring shaft (9) are arranged in the reaction cavity (104), and the first stirring shaft (8) and the second stirring shaft (9) are located between the annular support (301) and the main shaft (2); Wherein, one end of the first stirring shaft (8) is fixed to the kettle top (101), and the other end of the first stirring shaft (8) extends towards the kettle bottom (102);One end of the second stirring shaft (9) is fixed to the kettle top (101), and the other end of the second stirring shaft (9) extends towards the kettle bottom (102);The distance between the first stirring shaft (8) and the kettle bottom (102) is greater than the distance between the second stirring shaft (9) and the kettle bottom (102).

6. The reactor of claim 5, wherein The first stirring shaft (8) is provided with a first dispersing disc (801) and a second dispersing disc (802) near one end of the kettle bottom (102), the distance between the first dispersing disc (801) and the kettle bottom (102) is greater than the distance between the second dispersing disc (802) and the kettle bottom (102); the second stirring shaft (9) is provided with a third dispersing disc (901) and a fourth dispersing disc (902) near one end of the kettle bottom (102), the distance between the third dispersing disc (901) and the kettle bottom (102) is greater than the distance between the fourth dispersing disc (902) and the kettle bottom (102). The distance between the second dispersing disc (802) and the kettle bottom (102) is greater than the distance between the third dispersing disc (901) and the kettle bottom (102).

7. The reactor of claim 5, wherein Further comprising a solvent pipeline (10) and a vacuum pipeline (11), the solvent pipeline (10) and the vacuum pipeline (11) are symmetrically arranged on the kettle top (101) along the main shaft (2), the solvent pipeline (10) penetrates the kettle top (101) for conveying reaction solvent to the reaction cavity (104); the vacuum pipeline (11) penetrates the kettle top (101) for dehydrating reaction raw materials to carry out the next step reaction.

8. The reactor of claim 7, wherein, Further comprising a pressure sensing device (12) for detecting the thickness of the coating, the kettle top (101), the main shaft (2), the first stirring shaft (8) and the second stirring shaft (9) are provided with at least one pressure sensing device (12); The cleaning pipeline (302) is provided with a first valve (13), which can be opened or closed according to the thickness information of the coating detected by the pressure sensing device (12).

9. The reactor of claim 8, wherein, Further comprising a main pipeline (15), the cleaning pipeline (302) and the solvent pipeline (10) are in communication with the main pipeline (15); the solvent pipeline (10) is provided with a second valve (14); when the first valve (13) is opened, the second valve (14) is closed; when the first valve (13) is closed, the second valve (14) is opened; The material of the cleaning solvent is the same as that of the reaction solvent.

10. The reactor of claim 9, wherein, Further comprising a solvent metering device (4) and a motor (5), the solvent metering device (4) and the motor (5) are in communication with the cleaning pipeline (302), and the distance between the solvent metering device (4) and the kettle wall (103) is greater than the distance between the motor (5) and the kettle wall (103).

Images