Exposure detection system for TFT (Thin Film Transistor) liquid crystal panel

Abstract

The utility model discloses an exposure detection system for a TFT (Thin Film Transistor) liquid crystal panel. The exposure detection system comprises a preset photomask, TFT liquid crystal panel moving equipment, image acquisition equipment and computing equipment, the preset photomask is provided with a hollowed exposure demand area used for limiting the position of a to-be-exposed area on the TFT liquid crystal panel; a first caliper and a second caliper are respectively printed outwards at the central positions of two opposite side edges of the exposure demand area, and the patterns are complementary; the TFT liquid crystal panel moving equipment is used for moving a first to-be-exposed area on the TFT liquid crystal panel to the position below an exposure demand area to receive first exposure treatment and then moving a second to-be-exposed area to receive second exposure treatment; the image acquisition equipment is used for acquiring a target caliper graph developed after two times of exposure processing; and the computing device is used for computing the gray-scale curve of the target caliper graph and comparing the gray-scale curve with a standard gray-scale curve to determine whether the exposure range is qualified or not. The device can automatically monitor the exposure range and judge whether the exposure range is qualified or not.

Description

TECHNICAL FIELD

[0001] The utility model belongs to the field of thin film transistor, concretely relates to an exposure detection system for TFT liquid crystal panel. BACKGROUND

[0002] Take TFT (Thin Film Transistor) industry as an example, a larger TFT liquid crystal panel needs to make multiple Panel (liquid crystal panel product), then needs to carry out multiple Scan (scan) exposure formation to remove the metal at the gap between two adjacent Panel. Each Scan needs a certain distance of repeated exposure area, but because the size of exposure area and actual will appear deviation, repeated exposure area will also appear multiple exposure or less exposure because of deviation, multiple exposure will expose to other useful area, less exposure will make repeated area residual metal etc., all will affect the quality of product. Therefore, a caliper is designed in the repeated exposure area to monitor whether the position of exposure edge meets the design requirement. But the caliper for monitoring is mostly ruler-shaped, the formed pattern will appear deformation or uneven at the end of ruler, although it can be judged whether it is compliant through personnel visual judgment, but cannot realize automatic monitoring. CONTENT OF UTILITY MODEL

[0003] In order to solve the above problems existing in the prior art, the utility model provides an exposure detection system for TFT liquid crystal panel. The technical problem to be solved by the utility model is realized through the following technical scheme:

[0004] An exposure detection system for TFT liquid crystal panel, comprising:

[0005] A preset mask, TFT liquid crystal panel moving device, image acquisition device, computing device; wherein,

[0006] The preset mask is provided with hollowed-out exposure requirement area, and the exposure requirement area is used for limiting the position of the to-be-exposed area on the TFT liquid crystal panel. The center positions of the opposite two sides of the exposure requirement area are outwardly printed with a first caliper and a second caliper respectively, and the patterns of the first caliper and the second caliper are complementary.

[0007] The TFT liquid crystal panel moving device is used for moving the first to-be-exposed area on the TFT liquid crystal panel to the exposure requirement area of the preset mask, so that the exposure requirement area receives first exposure processing, and then moving the second to-be-exposed area on the TFT liquid crystal panel to the exposure requirement area of the preset mask, so that the exposure requirement area receives second exposure processing. Wherein, the first to-be-exposed area and the second to-be-exposed area correspond to one liquid crystal panel product; the exposure target area is between the first to-be-exposed area and the second to-be-exposed area.

[0008] The image acquisition device is configured to acquire a target caliper pattern developed in the exposure target region on the TFT liquid crystal panel after twice exposure processing; the target caliper pattern is an overlapping developed pattern of the first caliper and the second caliper;

[0009] The computing device is configured to calculate a gray scale curve corresponding to the target caliper pattern, compare the gray scale curve corresponding to the target caliper pattern with a standard gray scale curve corresponding to a standard caliper pattern when the exposure target region is fully exposed, and determine whether the exposure range is qualified according to a comparison result.

[0010] In an embodiment of the present application, the exposure requirement region is arranged at the center of the preset photomask and is in a rectangular shape.

[0011] In an embodiment of the present application, the first caliper and the second caliper are respectively located at the upper edge and the lower edge of the exposure requirement region and are arranged with a common central axis.

[0012] The first caliper includes first caliper pattern one, first caliper pattern two, first caliper pattern three and first caliper pattern four, and a total of four patterns; the first caliper pattern two, the first caliper pattern three and the first caliper pattern four are arranged with a common central axis and are spaced from top to bottom; the first caliper pattern one is arranged beside the first caliper pattern two;

[0013] The second caliper includes second caliper pattern one, second caliper pattern two, second caliper pattern three and second caliper pattern four, and a total of four patterns; the second caliper pattern two, the second caliper pattern three and the second caliper pattern four are arranged with a common central axis and are spaced from bottom to top; the second caliper pattern one is arranged beside the second caliper pattern two;

[0014] The first caliper and the second caliper have the same pattern size corresponding to the name;

[0015] The first caliper pattern one and the second caliper pattern one are used for identifying the region to be exposed;

[0016] The region between the first caliper pattern three and the first caliper pattern four and the region between the second caliper pattern three and the second caliper pattern four are used as exposure compliance indication regions and are used for indicating the edge position of the region to be exposed.

[0017] In an embodiment of the present application, the first caliper pattern one is arranged at the left side of the first caliper pattern two and is an upward arrow; the second caliper pattern one is arranged at the right side of the second caliper pattern two and is a downward arrow.

[0018] In an embodiment of the utility model, the first caliper pattern two and the second caliper pattern two are rectangular of first width.

[0019] The first caliper pattern three is a square with 1 / 4 missing at the lower left, and the second caliper pattern three is a square with 1 / 4 missing at the upper right; and the side length of the square is equal to the first width.

[0020] The first caliper pattern four and the second caliper pattern four are rectangular of second width; the first width is greater than the second width.

[0021] In an embodiment of the utility model, the area formed by the center of the first caliper pattern three and the upper edge of the first caliper pattern four, and the area formed by the center of the second caliper pattern three and the lower edge of the second caliper pattern four, are used as an exposure compliance indication area.

[0022] In an embodiment of the utility model, the exposure device is further included.

[0023] In an embodiment of the utility model, the TFT liquid crystal panel moving device is specifically used for:

[0024] The first exposure area on the TFT liquid crystal panel is moved to the exposure requirement area of the preset photomask, so that the lower edge of the first exposure area is within the area formed by the center of the second caliper pattern three and the lower edge of the second caliper pattern four; the exposure device determines the positioning position of the center of the second caliper on the TFT liquid crystal panel, and performs first exposure processing on the exposure requirement area according to the positioning position, so that the pattern of the second caliper is developed on the TFT liquid crystal panel; then the TFT liquid crystal panel moving device moves the second exposure area on the TFT liquid crystal panel to the exposure requirement area of the preset photomask, so that the upper edge of the second exposure area is within the area formed by the center of the first caliper pattern three and the upper edge of the first caliper pattern four; the exposure device determines that the position of the center of the first caliper on the TFT liquid crystal panel is the positioning position, and performs second exposure processing on the exposure requirement area according to the positioning position, so that the pattern of the first caliper is developed on the TFT liquid crystal panel to obtain the target caliper pattern after the pattern of the second caliper and the pattern of the first caliper are overlaid and developed.

[0025] In an embodiment of the utility model, the computing device is specifically used for: calculating the gray scale curve corresponding to the first exposure according to the left half of the target caliper pattern, and calculating the gray scale curve corresponding to the second exposure according to the right half of the target caliper pattern;The gray scale curve corresponding to the first exposure is compared with the standard gray scale curve corresponding to the left half of the standard caliper pattern, and the gray scale curve corresponding to the second exposure is compared with the standard gray scale curve corresponding to the right half of the standard caliper pattern, if the two comparison results are consistent, then it is determined that the exposure range is qualified, otherwise it is determined that the exposure range is unqualified.

[0026] In an embodiment of the utility model, the standard caliper pattern comprises a first rectangle, a square with left lower right upper 1 / 4 missing and a second rectangle from top to bottom;Wherein, the first rectangle and the second rectangle are same as the first caliper pattern two and the second caliper pattern two.

[0027] The utility model discloses the beneficial effects of:

[0028] The utility model embodiment improves the caliper pattern on the mask, thereby constructs a kind of exposure detection system for TFT liquid crystal panel, and its caliper pattern design and system implementation scheme can form the pattern that image acquisition equipment and computing device are easily identified after exposure development, can make that the caliper pattern formed to meet exposure range and the caliper pattern of non-regulation form obvious difference, realize quick determination by figure gray scale curve comparison, to realize the purpose of automatic monitoring whether exposure range is regular, therefore can realize automatic detection in production, feedback and revision in time. BRIEF DESCRIPTION OF DRAWINGS

[0029] Figure 1 It is the schematic diagram of traditional exposure caliper;

[0030] Figure 2 It is the structure schematic diagram of a kind of exposure detection system for TFT liquid crystal panel provided by the utility model embodiment;

[0031] Figure 3 It is the structure schematic diagram of preset mask provided by the utility model embodiment;

[0032] Figure 4 It is a pattern example of first caliper and second caliper provided by the utility model embodiment;

[0033] Figure 5 It is the position schematic diagram of exposure regularity indicating area in the first caliper and second caliper of the utility model embodiment example;

[0034] Figure 6 It is the process schematic diagram of target caliper pattern obtained by twice exposure of the utility model embodiment embodiment;

[0035] Figure 7 A schematic diagram of a standard caliper pattern of an embodiment of the present application;

[0036] Figure 8 A schematic diagram of three non-compliant target caliper patterns of an embodiment of the present application;

[0037] Figure 9 A working process schematic diagram of an exposure detection system for a TFT liquid crystal panel provided by an embodiment of the present application. DETAILED DESCRIPTION

[0038] The present application will be further described in detail below in conjunction with specific embodiments, but the embodiments of the present application are not limited thereto.

[0039] Traditional exposure calipers, such as Figure 1 As shown, although visual detection by personnel can be achieved, because of the deviation and diffraction problems in the exposure process, the caliper end will appear deformed or the pattern end will not be uniform, and automated detection in the rear image detection system cannot be achieved, and manual judgment of whether the caliper pattern is compliant is required. Therefore, automated detection cannot be achieved in production, and caliper out-of-gauge cannot be timely fed back and corrected. In order to solve the above problems, an exposure detection system for a TFT liquid crystal panel is provided by an embodiment of the present application.

[0040] As shown in Figure 2 The exposure detection system for a TFT liquid crystal panel can include:

[0041] a preset photomask, a TFT liquid crystal panel moving device, an image acquisition device, and a computing device; wherein

[0042] the preset photomask is provided with a hollow exposure requirement area, the exposure requirement area is used to limit the position of a to-be-exposed area on the TFT liquid crystal panel; the center positions of the opposite two sides of the exposure requirement area are outwardly printed with a first caliper and a second caliper, respectively, the patterns of the first caliper and the second caliper are complementary;

[0043] the TFT liquid crystal panel moving device is used to move a first to-be-exposed area on the TFT liquid crystal panel to below the exposure requirement area of the preset photomask, so that the exposure requirement area receives a first exposure treatment, and then move a second to-be-exposed area on the TFT liquid crystal panel to below the exposure requirement area of the preset photomask, so that the exposure requirement area receives a second exposure treatment; wherein the first to-be-exposed area and the second to-be-exposed area each correspond to one liquid crystal panel product; and the first to-be-exposed area and the second to-be-exposed area are an exposure target area therebetween;

[0044] The image acquisition device is configured to acquire a target caliper pattern in the exposure target region on the TFT liquid crystal panel after twice exposure processing and development; the target caliper pattern is an overlapping development pattern of the first caliper and the second caliper;

[0045] The computing device is configured to calculate a gray scale curve corresponding to the target caliper pattern, compare the gray scale curve corresponding to the target caliper pattern with a standard gray scale curve corresponding to a standard caliper pattern in full exposure of the exposure target region, and determine whether the exposure range is qualified according to a comparison result.

[0046] Specifically, first, the preset mask of the utility model is described. The material of the preset mask is glass, such as Figure 3 As shown in the structure schematic diagram of the preset mask of the utility model. The oblique line shadow part is the exposure requirement region hollowed out on the preset mask, and the exposure requirement region is used to limit the position of the to-be-exposed region on the TFT liquid crystal panel; in an optional embodiment, the exposure requirement region is arranged at the center of the preset mask and is in a rectangular shape.

[0047] The center positions of the two opposite sides of the exposure requirement region are outwardly printed with a first caliper and a second caliper, respectively, as an example, the first caliper and the second caliper are located at the upper edge and the lower edge of the exposure requirement region, respectively, and are arranged with a common center axis. Specifically, please refer to Figure 3 , Figure 3 The center position of the upper edge of the exposure requirement region is upwardly printed with a first caliper, and the center position of the lower edge of the exposure requirement region is downwardly printed with a second caliper; for simplicity, in the illustration, the first caliper is marked as caliper 1, and the second caliper is marked as caliper 2. As can be seen, Figure 3 In the figure, the center lines of the caliper 1 and the caliper 2 coincide, and are both the center line of the exposure requirement region.

[0048] Of course, as other examples, the first caliper and the second caliper can also be arranged at the center positions of the left side and the right side of the exposure requirement region.

[0049] In the utility model, the patterns of the first caliper and the second caliper are complementary; for the convenience of understanding, the utility model takes the caliper position of Figure 3 as an example for description.

[0050] The first caliper includes a first caliper pattern one, a first caliper pattern two, a first caliper pattern three and a first caliper pattern four, a total of four patterns; the first caliper pattern two, the first caliper pattern three and the first caliper pattern four are arranged with a common center axis interval from top to bottom; the first caliper pattern one is arranged beside the first caliper pattern two;

[0051] The second caliper includes a second caliper pattern one, a second caliper pattern two, a second caliper pattern three and a second caliper pattern four, a total of four patterns; the second caliper pattern two, the second caliper pattern three and the second caliper pattern four are arranged in a common central axis from bottom to top; the second caliper pattern one is arranged on the side of the second caliper pattern two;

[0052] The first caliper and the second caliper have the same size of the patterns with the same name;

[0053] The first caliper pattern one and the second caliper pattern one are used for identifying the area to be exposed;

[0054] The area between the first caliper pattern three and the first caliper pattern four, and the area between the second caliper pattern three and the second caliper pattern four, as an exposure compliance indication area, is used for indicating the edge position of the area to be exposed.

[0055] Specific examples are shown in Figure 4 , Figure 4 A pattern example of the first caliper and the second caliper is provided. The first caliper and the second caliper are both made of metal.

[0056] For the first caliper, the first caliper pattern one, the first caliper pattern two, the first caliper pattern three and the first caliper pattern four contained therein are shown in Figure 4 The pattern one, the pattern two, the pattern three and the pattern four in the caliper 1.

[0057] For the second caliper, the second caliper pattern one, the second caliper pattern two, the second caliper pattern three and the second caliper pattern four contained therein are shown in Figure 4 The pattern one, the pattern two, the pattern three and the pattern four in the caliper 2.

[0058] For the first caliper and the second caliper, the pattern two, the pattern three and the pattern four are arranged in a common central axis from top to bottom; the pattern one is arranged on the side of the pattern two. In the specific example of Figure 4 , the first caliper pattern one is arranged on the left side of the first caliper pattern two, as an upward arrow; the second caliper pattern one is arranged on the right side of the second caliper pattern two, as a downward arrow.

[0059] For the first caliper and the second caliper, the pattern one is the same, the pattern two is the same, the pattern three is the same, and the pattern four is also the same.

[0060] The first caliper pattern one and the second caliper pattern one are used for identifying the area to be exposed, that is, the pattern one is used for distinguishing the belonging of the exposure Scan. The pattern two, the pattern three and the pattern four are detection patterns after exposure, mainly used for automatic detection of the exposure area.

[0061] Please refer to Figure 4 , the first and second caliper patterns two are rectangles of a first width;

[0062] The first caliper pattern three is a square with a 1 / 4 missing on the lower left, and the second caliper pattern three is a square with a 1 / 4 missing on the upper right; and the side length of the square is equal to the first width;

[0063] The first and second caliper patterns four are rectangles of a second width; the first width is greater than the second width.

[0064] The area formed by the center of the first caliper pattern three and the upper edge of the first caliper pattern four, and the area formed by the center of the second caliper pattern three and the lower edge of the second caliper pattern four, as an exposure compliance indication area.

[0065] Please refer to Figure 5 , Figure 5 The position diagram of the exposure compliance indication area in the first and second calipers of the utility model example; the center of pattern three and the top end of pattern four are the exposure requirement area, that is, the exposure compliance indication area, and the length thereof can be designed according to actual requirements. The exposure in this area is required to be compliant.

[0066] The following describes the remaining parts of the system in combination with the exposure use process of the first and second calipers on the preset photomask. Meanwhile, the system also comprises an exposure device for performing exposure operation, and existing devices can be adopted to realize.

[0067] As understood by those skilled in the art, the TFT liquid crystal panel is a large plate, and multiple liquid crystal panel products Panel can be produced by multiple Scan exposure. In this process, the TFT liquid crystal panel is placed below, the preset photomask is placed parallel above the TFT liquid crystal panel and fixed, the TFT liquid crystal panel is moved by the TFT liquid crystal panel moving device, and each to-be-exposed area on the TFT liquid crystal panel is aligned with the exposure requirement area on the preset photomask, that is, the liquid crystal panel product area to be produced is aligned.

[0068] With the caliper position and pattern example described above Figures 3 to 5 , the TFT liquid crystal panel moving device first moves the first to-be-exposed area on the TFT liquid crystal panel below the exposure requirement area of the preset photomask, the exposure requirement area is subjected to first exposure treatment by the exposure device, and then the second to-be-exposed area on the TFT liquid crystal panel is moved below the exposure requirement area of the preset photomask, and the exposure requirement area is subjected to second exposure treatment by the exposure device;

[0069] The first to-be-exposed area and the second to-be-exposed area correspond to one liquid crystal panel product respectively, and an exposure target area is between the first to-be-exposed area and the second to-be-exposed area. The TFT liquid crystal panel moving device can move the TFT liquid crystal panel up and down.

[0070] Please refer to Figure 6 It is understood that Figure 6 The process diagram of the target caliper pattern obtained by twice exposure of the utility model is shown. The first to-be-exposed area is exposure area one, and the second to-be-exposed area is exposure area two. The edges exposed by Scan1 and Scan2 during exposure are required to reach the exposure requirement area shown in the figure. The center positions of the two calipers need to be in the same position on the glass after repeated exposure, that is, the projection centers of caliper 1 and caliper 2 on the glass overlap after twice exposure. Figure 5

[0071] In this process, the TFT liquid crystal panel moving device is specifically used for:

[0072] The first to-be-exposed area on the TFT liquid crystal panel is moved to below the exposure requirement area of the preset photomask, so that the lower edge of the first to-be-exposed area is within the area formed by the center of the second caliper pattern three and the lower edge of the second caliper pattern four. After the exposure device determines the positioning position of the center of the second caliper on the TFT liquid crystal panel, the exposure requirement area is exposed for the first time according to the positioning position, so that the pattern of the second caliper is developed on the TFT liquid crystal panel. Then, the TFT liquid crystal panel moving device moves the second to-be-exposed area on the TFT liquid crystal panel to below the exposure requirement area of the preset photomask, so that the upper edge of the second to-be-exposed area is within the area formed by the center of the first caliper pattern three and the upper edge of the first caliper pattern four. After the exposure device determines that the position of the center of the first caliper on the TFT liquid crystal panel is the positioning position, the exposure requirement area is exposed for the second time according to the positioning position, so that the pattern of the first caliper is developed on the TFT liquid crystal panel, to obtain the target caliper pattern after the pattern of the second caliper and the pattern of the first caliper are overlaid and developed.

[0073] Those skilled in the art combine Figure 6 ​It can be understood that, for the first to-be-exposed area, after the first exposure process, the upper edge of the TFT liquid crystal panel develops the pattern of the caliper 1 and the lower edge develops the pattern of the caliper 2; for the second to-be-exposed area, after the second exposure process, the upper edge of the TFT liquid crystal panel develops the pattern of the caliper 1 and the lower edge develops the pattern of the caliper 2, so that in the exposure target area of the middle area, that is, in the repeated exposure area, the overlapping developed pattern of the caliper 1 of the second exposure and the caliper 2 of the first exposure is developed, which is called a target caliper pattern. The target caliper pattern can be collected by using an image collection device. In an optional implementation, the image collection device includes a CCD camera.

[0074] It can be understood by those skilled in the art that, if the exposure area I and the exposure area II both reach the required exposure position, the overlapping developed pattern of the caliper 1 and the caliper 2, that is, the target caliper pattern, should be the pattern of the standard caliper pattern as shown in Figure 7 .

[0075] The standard caliper pattern includes, from top to bottom, a first rectangle, a square with a left lower right upper 1 / 4 missing, and a second rectangle; wherein the first rectangle and the second rectangle are the same as the first caliper pattern II and the second caliper pattern II.

[0076] If one or both of the two exposure areas do not reach the exposure requirement, a pattern as shown in Figure 8 is formed, Figure 8 The three patterns in the above are only examples, and in actual use, there can be other target caliper patterns that do not reach the exposure requirement, which are not illustrated herein.

[0077] After obtaining the target caliper pattern, data processing is performed by using a computing device.

[0078] At this time, the computing device is specifically configured to: calculate a gray scale curve corresponding to the first exposure according to a left half of the target caliper pattern, and calculate a gray scale curve corresponding to the second exposure according to a right half of the target caliper pattern; compare the gray scale curve corresponding to the first exposure with a standard gray scale curve corresponding to the left half of the standard caliper pattern, and compare the gray scale curve corresponding to the second exposure with a standard gray scale curve corresponding to the right half of the standard caliper pattern; if both comparison results are consistent, it is determined that the exposure range is qualified, otherwise it is determined that the exposure range is unqualified.

[0079] Please refer to Figure 9 understand the working process of the exposure detection system for the TFT liquid crystal panel provided by the utility model, Figure 9The caliper pattern in the mask is the target caliper pattern, is formed on the upper surface of the TFT liquid crystal panel after development, and the pattern data is obtained by collecting the image by an image collecting device, and the gray scale is calculated by a computing device to obtain the gray scale curve of each exposure, which is compared with the standard gray scale curve, and if there is a difference, it is determined to be unqualified, so that the exposure can be automatically monitored.

[0080] The computing device can be a computer, and the gray scale calculation can be an existing algorithm, and an existing software program can be called.

[0081] The caliper pattern design and system implementation scheme of the exposure detection system for the TFT liquid crystal panel can form a pattern that is easy to identify by the image collecting device and the computing device after exposure and development, can make the caliper pattern formed in the exposure range and the caliper pattern that does not meet the regulations form obvious differences, and can realize rapid determination through comparison of the gray scale curve, so as to realize the purpose of automatically monitoring whether the exposure range is in compliance. Therefore, automatic detection can be realized in production, and feedback and correction can be made in time.

[0082] It should be noted that in the description of the utility model, it should be understood that the terms "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the utility model and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements indicated must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the utility model.

[0083] In addition, the terms "first" and "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features limited by "first" and "second" can explicitly or implicitly include one or more of the features.

[0084] The above is only a preferred embodiment of the utility model, and is not used to limit the protection scope of the utility model. Any modification, equivalent replacement, improvement, etc. made within the spirit and principles of the utility model is included in the protection scope of the utility model.

Claims

1. An exposure inspection system for TFT liquid crystal panels, characterized in that, The application relates to a TFT liquid crystal panel exposure device. The preset mask is provided with a hollow exposure demand area which is used for limiting the position of a to-be-exposed area on a TFT liquid crystal panel; the center positions of the opposite two side edges of the exposure demand area are outwardly provided with a first caliper and a second caliper respectively, and the patterns of the first caliper and the second caliper are complementary. The TFT liquid crystal panel moving device is used for moving a first to-be-exposed area on the TFT liquid crystal panel to the lower side of the exposure demand area of the preset mask, so that the exposure demand area receives first exposure treatment; and then moving a second to-be-exposed area on the TFT liquid crystal panel to the lower side of the exposure demand area of the preset mask, so that the exposure demand area receives second exposure treatment; wherein the first to-be-exposed area and the second to-be-exposed area correspond to one liquid crystal panel product; and the first to-be-exposed area and the second to-be-exposed area are exposure target areas. The image collecting device is used for collecting a target caliper pattern in the exposure target area on the TFT liquid crystal panel after the two times of exposure treatment; the target caliper pattern is an overlapping developed pattern of the first caliper and the second caliper. The computing device is used for calculating a gray scale curve corresponding to the target caliper pattern, comparing the gray scale curve corresponding to the target caliper pattern with a standard gray scale curve corresponding to a standard caliper pattern of full exposure of the exposure target area, and determining whether the exposure range is qualified according to a comparison result. The exposure demand area is arranged at the center of the preset mask and is in a rectangular shape.

2. The exposure detection system for a TFT liquid crystal panel according to claim 1, characterized by, The first caliper and the second caliper are arranged at the upper edge and the lower edge of the exposure demand area respectively and share a common central axis.

3. The exposure detection system for a TFT liquid crystal panel according to claim 1 or 2, characterized by, The first caliper includes a first caliper pattern one, a first caliper pattern two, a first caliper pattern three and a first caliper pattern four, and a total of four patterns; the first caliper pattern two, the first caliper pattern three and the first caliper pattern four are arranged at intervals along the common central axis from top to bottom; and the first caliper pattern one is arranged beside the first caliper pattern two. The second caliper includes a second caliper pattern one, a second caliper pattern two, a second caliper pattern three and a second caliper pattern four, and a total of four patterns; the second caliper pattern two, the second caliper pattern three and the second caliper pattern four are arranged at intervals along the common central axis from bottom to top; and the second caliper pattern one is arranged beside the second caliper pattern two. The patterns corresponding to the names in the first caliper and the second caliper are consistent in size. The first caliper pattern one and the second caliper pattern one are used for identifying to-be-exposed areas. The areas between the first caliper pattern three and the first caliper pattern four and the areas between the second caliper pattern three and the second caliper pattern four are used as exposure compliance indication areas for indicating the edge positions of to-be-exposed areas. ​ 4. The exposure detection system for a TFT liquid crystal panel according to claim 3, characterized by The first gauge pattern one is an upward arrow arranged on the left side of the second gauge pattern one; and the second gauge pattern one is a downward arrow arranged on the right side of the first gauge pattern two.

5. The exposure detection system for a TFT liquid crystal panel according to claim 4, wherein The first gauge pattern two and the second gauge pattern two are rectangles of a first width. The first gauge pattern three is a square with a left lower quarter missing, and the second gauge pattern three is a square with a right upper quarter missing; and the side length of the square is equal to the first width. The first gauge pattern four and the second gauge pattern four are rectangles of a second width; and the first width is greater than the second width.

6. The exposure detection system for a TFT liquid crystal panel according to claim 5, wherein The area formed by the center of the first gauge pattern three and the upper edge of the first gauge pattern four, and the area formed by the center of the second gauge pattern three and the lower edge of the second gauge pattern four, are exposure compliance indication areas.

7. The exposure detection system for a TFT liquid crystal panel according to claim 1, characterized by Further comprising: An exposure device.

8. The exposure detection system for a TFT liquid crystal panel according to claim 6, wherein The TFT liquid crystal panel moving device is specifically used for: moving a first to-be-exposed area on the TFT liquid crystal panel to below an exposure requirement area of the preset photomask, so that the lower edge of the first to-be-exposed area is within the area formed by the center of the second gauge pattern three and the lower edge of the second gauge pattern four; determining, by an exposure device, a positioning position of the center of the second gauge on the TFT liquid crystal panel, and performing first exposure processing on the exposure requirement area according to the positioning position, so that the pattern of the second gauge is developed on the TFT liquid crystal panel; and then moving a second to-be-exposed area on the TFT liquid crystal panel to below the exposure requirement area of the preset photomask, so that the upper edge of the second to-be-exposed area is within the area formed by the center of the first gauge pattern three and the upper edge of the first gauge pattern four; determining, by the exposure device, the position of the center of the first gauge on the TFT liquid crystal panel as the positioning position, and performing second exposure processing on the exposure requirement area according to the positioning position, so that the pattern of the first gauge is developed on the TFT liquid crystal panel, to obtain a target gauge pattern after the pattern of the second gauge and the pattern of the first gauge are developed together.

9. The exposure detection system for a TFT liquid crystal panel according to claim 8, wherein The computing device is specifically used for: calculating a gray scale curve corresponding to the first exposure according to the left half of the target gauge pattern, and calculating a gray scale curve corresponding to the second exposure according to the right half of the target gauge pattern. Comparing the gray scale curve corresponding to the first exposure with a standard gray scale curve corresponding to the left half of the standard gauge pattern, and comparing the gray scale curve corresponding to the second exposure with a standard gray scale curve corresponding to the right half of the standard gauge pattern; if both comparison results are consistent, it is determined that the exposure range is qualified, otherwise it is determined that the exposure range is unqualified.

10. The exposure detection system for a TFT liquid crystal panel according to claim 9, wherein The standard gauge pattern comprises, from top to bottom, a first rectangle, the square with a left lower quarter missing and a right upper quarter missing, and a second rectangle; and the first rectangle and the second rectangle are the same as the first gauge pattern two and the second gauge pattern two.

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