Punch and punching device

Abstract

The utility model relates to a punch and a punching device which are used for punching a substrate along a preset direction z, the thickness of the substrate is S, the aperture of a punched hole is L, and an included angle alpha is formed between the diameter of the punched hole along a first direction x and a preset plane; the width of the punch corresponding to the diameter of the punched hole in the first direction x is d1, d1 = L * cos alpha + S * sin alpha, and the preset plane is perpendicular to the preset direction z. According to the punch and the punching device, the existence of the included angle alpha is considered, so that the hole diameter L of the punched hole actually machined through the punch is consistent with the hole diameter of the needed punched hole, the influence of the existence of the included angle alpha on the actual hole diameter of the punched hole can be compensated, and the precision of the actually-machined punched hole can be improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of punching equipment, in particular to a punch and a punching device. BACKGROUND

[0002] Punching is a processing technology of punching holes on a substrate by a punch. Common punching includes vertical punching and angle punching. The vertical punching means that the punching axis is consistent with the thickness direction of the substrate. At this time, the punch diameter is set to be the same as the diameter of the punching to be processed, so that the required punching can be processed. The angle punching means that the punching axis is inclined relative to the thickness direction of the substrate. For the punching with a small inclination angle, for example, the punching with an inclination angle within 5°, the punch diameter is still set to be the same as the diameter of the punching to be processed, so that the required punching can be processed. However, for the punching with a large inclination angle, if the punch diameter is still set to be the same as the diameter of the punching to be processed, the actual punching diameter processed by the punch will have a large deviation from the required punching diameter, so that the actual punching is unqualified. SUMMARY

[0003] Therefore, it is necessary to provide a punch to solve the problem that the actual punching diameter processed by the punch will have a large deviation from the required punching diameter when the angle punching with a large inclination angle is performed, so that the actual punching is unqualified.

[0004] A punch is used for punching a substrate along a preset direction z. The thickness of the substrate is S, the hole diameter of the punching is L, and the diameter of the punching along a first direction x forms an angle a with a preset plane. The width of the punch corresponding to the diameter of the punching along the first direction x is d1, and d1=L*cos a+S*sin a, wherein the preset plane is perpendicular to the preset direction z.

[0005] In one embodiment, the diameter of the punching along a second direction y forms an angle β with the preset plane, and the width of the punch corresponding to the diameter of the punching along the second direction y is d2, and d2=L*cos β+S*sin β, wherein the second direction y is arranged at an angle with the first direction x. It can be understood that, by such arrangement, the influence of the angle β on the actual hole diameter of the punching can be compensated, so that the accuracy of the punching processed by the punch is further improved.

[0006] In one embodiment, the second direction y is arranged perpendicular to the first direction x. It can be understood that, by such arrangement, the structure of the punch is simplified, so that the punch processing is facilitated.

[0007] In one embodiment, the cross section of the punch along the preset plane is an elliptical cross section, and the elliptical cross section has a major axis and a minor axis. The length of the major axis is d2, and the length of the minor axis is d1.

[0008] In one of the embodiments, 5° < a < 16°, and 5° < β < 16°.

[0009] In one of the embodiments, the punch has a guide slope which is arranged obliquely relative to the preset plane, and the guide slope is arranged at the end surface of the punch which faces the substrate. It can be understood that, by such arrangement, the stroke of the punch along the preset direction z required to complete the punching can be reduced, thereby facilitating reduction of the wear of the punch caused by the punching.

[0010] In one of the embodiments, the angle of inclination of the guide slope relative to the preset plane is consistent with the angle of inclination of the substrate relative to the preset plane. It can be understood that, by such arrangement, when the punch punches the substrate along the preset direction z, the guide slope can be in synchronous contact with the surface of the substrate, thereby reducing the stroke of the punch along the preset direction required to complete the punching, and reducing the wear of the punch caused by the punching.

[0011] In one of the embodiments, an included angle γ is formed between the guide slope and the preset plane, and γ = a, or γ = β.

[0012] In one of the embodiments, the designed aperture of the punching is L1, and L = L1 + Δl, wherein Δl is the aperture tolerance, and 0 < Δl ≤ 0.2 mm. It can be understood that, by such arrangement, the wear of the punch when punching the substrate can be compensated, thereby facilitating improvement of the precision of the punching processed by the punch.

[0013] The application further provides a punching device, which comprises the punch according to any one of the above embodiments.

[0014] Compared with the related structure in which the punch diameter is arranged to be the same as the diameter of the punching to be processed, to punch the substrate at an oblique angle, the punch and the punching device provided by the application take into account the existence of the included angle a, by arranging d1 = L*cos a + S*sin a, so that the actual punching aperture L processed by the punch is consistent with the aperture of the punching required, thereby compensating for the influence of the actual punching aperture caused by the existence of the included angle a, to improve the precision of the actual punching processed. BRIEF DESCRIPTION OF DRAWINGS

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description only show some of the embodiments of the application, and other drawings can also be obtained by those of ordinary skill in the art without any creative effort based on these drawings.

[0016] Figure 1 The schematic view of the punch provided by the application cooperating with the substrate;

[0017] Figure 2 A schematic view of a structure of punching on a substrate is provided for the present application;

[0018] Figure 3 A perspective view of a punch is provided for the present application;

[0019] Figure 4 A schematic view of a process of punching a substrate by a punch is provided for the present application Figure 1 ;

[0020] Figure 5 A schematic view of a process of punching a substrate by a punch is provided for the present application Figure 2 ;

[0021] Figure 6 A schematic view of a process of punching a substrate by a punch is provided for the present application Figure 3 .

[0022] Reference numerals: 100, punch; 110, elliptical cross section; 111, major axis; 112, minor axis; 120, guide slope; 200, substrate; 210, punched hole; 300, preset plane. DETAILED DESCRIPTION

[0023] In order to make the above objectives, features and advantages of the present application more clear and comprehensible, the specific embodiments of the present application will be described in detail below with reference to the accompanying drawings. In the following description, a lot of specific details are set forth in order to fully understand the present application. However, the present application can be implemented in many different ways other than those described herein, and those skilled in the art can make similar improvements without departing from the spirit of the present application, so the present application is not limited to the specific embodiments disclosed below.

[0024] It should be noted that when a component is referred to as being "fixed to" or "disposed on" another component, it can be directly on the other component or there can be a middle component. When a component is referred to as being "connected to" another component, it can be directly connected to the other component or there can be a middle component. The terms "vertical", "horizontal", "up", "down", "left", "right", and similar expressions used in the description of the present application are for the purpose of illustration only and do not indicate the only implementation.

[0025] In addition, the terms "first", "second", etc. are used only for the purpose of description and should not be understood as indicating or implying relative importance or implying the number of the technical features indicated. Therefore, the features defined as "first", "second" can explicitly or implicitly include at least one of the features. In the description of the present application, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0026] In the present application, unless specifically defined and limited otherwise, the first feature is "on", "under", "above" or "over" the second feature, which means that the first feature is in direct contact with the second feature or indirectly contacts the second feature through an intermediate medium. Moreover, the first feature is "above", "over" and "on" the second feature, which means that the first feature is directly above or obliquely above the second feature, or only means that the first feature is higher than the second feature in horizontal height. The first feature is "below", "under" and "under" the second feature, which means that the first feature is directly below or obliquely below the second feature, or only means that the first feature is lower than the second feature in horizontal height.

[0027] Unless otherwise defined, all technical and scientific terms used in the specification of the present application have the same meaning as commonly understood by one of ordinary skill in the art to which the present application belongs. The terms used in the specification of the present application are only for the purpose of describing specific embodiments and are not intended to limit the present application. The term "and / or" used in the specification of the present application includes any and all combinations of one or more related listed items.

[0028] Please refer to Figure 1 and Figure 2 , the present application provides a punch 100 for punching a substrate 200 along a preset direction z, the thickness of the substrate 200 is S, the aperture of the punch hole 210 is L, the diameter of the punch hole 210 along the first direction x forms an angle a with the preset plane 300; the width of the punch 100 corresponding to the diameter of the punch hole 210 along the first direction x is d1, and d1=L*cos a+S*sin a, wherein the preset plane 300 is perpendicular to the preset direction z.

[0029] It should be noted that the preset direction z is the direction of punching the substrate by the punch 100. It can be understood that if the width of the punch 100 is set as L, due to the existence of the angle a, the aperture of the punch hole 210 actually processed by the punch 100 is L / cos a-S*tan a, which deviates greatly from the required punch hole aperture L. The present application takes into account the angle a, by setting d1=L*cos a+S*sin a, so that the aperture L of the punch hole 210 actually processed by the punch 100 is consistent with the required aperture of the punch hole 210, thereby compensating for the influence of the angle a on the actual aperture of the punch hole 210, to avoid the actual processing of the punch hole being unqualified.

[0030] Further, the punch 210 is designed with a diameter L1, and L=L1+Δl, where Δl is a diameter tolerance, and 0<Δl≤0.2mm. In this way, by setting the diameter tolerance Δl, the wear of the punch 100 when punching the substrate 200 can be compensated, thereby facilitating to improve the precision of the punch 100 in machining the punch hole 210. Alternatively, Δl can be 0.05mm, 0.1mm, 0.15mm, or 0.2mm, etc.

[0031] Further, in an embodiment, as shown in Figures 1 to 3 the punch hole 210 forms an angle β with the preset plane 300 along the second direction y; the punch 100 has a width d2 corresponding to the diameter of the punch hole 210 along the second direction y, and d2=L*cosβ+S*sinβ, where the second direction y is arranged at an angle with the first direction x.

[0032] It can be understood that in the three-dimensional space, the angles formed between the diameters of the punch hole 210 in different directions and the preset plane 300 are different, and in order to adapt to the machining requirements of the punch hole 210 in different directions, the widths of the punch 100 corresponding to the diameters of the punch hole 210 in different directions should also be set differently. In the present embodiment, by setting the width d2 of the punch 100 corresponding to the diameter of the punch hole 210 along the second direction y, and d2=L*cosβ+S*sinβ, the influence of the angle β on the actual diameter of the punch hole 210 can be compensated, thereby facilitating to further improve the precision of the punch 100 in machining the punch hole 210.

[0033] wherein 5°<α<16° and 5°<β<16°.

[0034] Further, the second direction y is arranged perpendicularly to the first direction x. That is, the width d1 and the width d2 of the punch 100 are perpendicular to each other, which facilitates to simplify the structure of the punch 100, thereby facilitating the machining of the punch 100.

[0035] Alternatively, the cross section of the punch 100 along the preset plane 300 is an elliptical cross section 110, and the elliptical cross section 110 has a major axis 111 and a minor axis 112, the length of the major axis 111 is d2, and the length of the minor axis 112 is d1.

[0036] In an embodiment, please refer to Figures 4 to 6The punch 100 has a guide inclined surface 120 which is arranged to be inclined to a preset plane 300, and the guide inclined surface 120 is arranged on the end surface of the punch 100 which faces the substrate 200. It can be understood that if the end surface of the punch 100 which faces the substrate 200 is arranged to be parallel to the preset direction z, then during the punching process of the punch 100 to the substrate 200, one end of the punch 100 first contacts the substrate 200, and the other end is arranged to be spaced apart from the substrate 200, and the punch 100 needs to move a relatively large stroke along the preset direction z to complete the punching, and thus the wear of the punch 100 to the punching hole 210 is also relatively large. In the embodiment, by arranging the guide inclined surface 120, the stroke of the punch 100 along the preset direction to complete the punching is reduced, and thus the wear of the punch 100 to the punching hole 210 is reduced.

[0037] Further, the inclination angle of the guide inclined surface 120 to the preset plane 300 is consistent with the inclination angle of the substrate 200 to the preset plane 300. In this way, when the punch 100 punches the substrate 200 along the preset direction z, the guide inclined surface 120 can be in synchronous contact with the surface of the substrate 200, so as to reduce the stroke of the punch 100 along the preset direction to complete the punching, and reduce the wear of the punch 100 to the punching hole 210.

[0038] For example, in an embodiment, an included angle γ is formed between the guide inclined surface 120 and the preset plane 300, and γ = α. Alternatively, in another embodiment, γ = β.

[0039] For example, the process and principle of the punch 100 to perform the inclined angle punching on the automobile back panel are introduced. Specifically, the design aperture L1 of the punching hole 210 is 75 mm, the aperture tolerance Δl is 0.1 mm, the aperture L of the punching hole 210 is 75.1 mm; the included angle α between the diameter of the punching hole 210 along the first direction x and the preset plane 300 is 14.5°; the included angle β between the diameter of the punching hole 210 along the second direction y and the preset plane 300 is 4.5°; and the thickness S of the automobile back panel is 0.7 mm. Then d1 = L*cosα + S*sinα = 75.1*cos 14.5 + 0.7*sin 14.5 = 72.89 mm; d2 = L*cosβ + S*sinβ = 75.1*cos 4.5 + 0.7*sin 4.5 = 74.92 mm. The length of the major axis 111 of the elliptical section 110 of the punch 100 is 74.92 mm, and the length of the minor axis 112 of the elliptical section 110 of the punch 100 is 72.89 mm.

[0040] The application further provides a punching device, which comprises the punch 100 of any one of the above embodiments.

[0041] Any combination of the technical features in the above-described embodiments can be made, and for the sake of brevity, not all possible combinations are described, however, as long as there is no conflict, any combination of the technical features should be considered within the scope of the present disclosure.

[0042] The above-described embodiments only express several implementation manners of the present application, and the description is relatively specific and detailed, but it should not be understood as a limitation on the patent scope of the application. It should be pointed out that for ordinary skilled persons in the art, several modifications and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the patent protection scope of the present application should be subject to the appended claims.

Claims

1. A punch for punching holes in a substrate (200) along a predetermined direction z, characterized in that, The thickness of the substrate (200) is S, the diameter of the punch (210) is L, and the diameter of the punch (210) along the first direction x forms an angle α with the preset plane (300). The width of the punch (100) corresponding to the diameter of the punch (210) along the first direction x is d1, and d1 = L*cosα + S*sinα, wherein the preset plane (300) is perpendicular to the preset direction z.

2. The punch according to claim 1, characterized in that, The diameter of the punch (210) along the second direction y forms an angle β with the preset plane (300); The width of the punch (100) corresponding to the diameter of the punch (210) along the second direction y is d2, and d2 = L*cosβ + S*sinβ, wherein the second direction y is set at an angle to the first direction x.

3. The punch according to claim 2, characterized in that, The second direction y is set perpendicular to the first direction x.

4. The punch according to claim 3, characterized in that, The punch (100) has an elliptical cross section (110) along the preset plane (300), and the elliptical cross section (110) has a major axis (111) and a minor axis (112), the length of the major axis (111) is d2, and the length of the minor axis (112) is d1.

5. The punch according to claim 2, characterized in that, And 5° < α < 16°, and 5° < β < 16°.

6. The punch according to claim 2, characterized in that, The punch (100) has a guide slope (120) that is inclined relative to the preset plane (300), and the guide slope (120) is located on the end face of the punch (100) facing the substrate (200).

7. The punch according to claim 6, characterized in that, The tilt angle of the guide slope (120) relative to the preset plane (300) is the same as the tilt angle of the substrate (200) relative to the preset plane (300).

8. The punch according to claim 7, characterized in that, An angle γ is formed between the guide slope (120) and the preset plane (300), where γ = α or γ = β.

9. The punch according to claim 1, characterized in that, The designed diameter of the punch (210) is L1, L=L1+Δl, where Δl is the diameter tolerance and 0<Δl≤0.2mm.

10. A punching device, characterized in that, The punching device includes a punch (100) as described in any one of claims 1-9.

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