Wafer shelf

Abstract

The utility model provides a wafer shelf. The wafer shelf comprises a support; the material platform is arranged on the bracket and is used for bearing a wafer; the fan set is arranged on the support and located above the material table, the fan set comprises a plurality of ion fans and a plurality of filtering fans, the ion fans are used for providing ion airflow for the wafer, and the filtering fans are used for providing filtering airflow towards the wafer. According to the technical scheme, the ion fan and the filter fan are arranged on the wafer shelf, the ion fan provides the ion airflow with positive and negative charges, charges on the surface of the wafer can be neutralized, the electrostatic effect is eliminated, and risks caused by static electricity are reduced; and by providing fresh and clean filtering airflow, a pollution source is effectively diluted and flushed, so that the concentration of pollutants is reduced, and particle pollutants on the surface of the wafer are reduced.

Description

Technical Field

[0001] This utility model relates to the semiconductor field, and more particularly to a wafer rack. Background Technology

[0002] In the wafer manufacturing process, static electricity and particulate contamination may have a serious impact on product quality and production efficiency: (1) Static electricity damages wafer structure: Static electricity can cause charge accumulation on the wafer and may cause problems such as arc discharge, damage to electronic components, and short circuits. Static discharge may damage the wafer surface and internal structure, such as the destruction of the oxide layer and the electrical breakdown of the wafer material, thereby reducing the reliability and performance of the product; (2) Static electricity contaminates the wafer surface: Static electricity can attract particles in the air, causing dust and other contaminants to accumulate on the wafer surface; (3) Particulate contamination affects circuit performance: Particulate contaminants may cause short circuits or leakage in the circuits on the wafer surface.

[0003] In existing technologies, wafer fabs typically equip their facilities with ion fans or ion bars to generate large volumes of positively and negatively charged airflows to neutralize the charges on the wafer surfaces and reduce the risks associated with static electricity. However, during actual production and testing, some equipment cannot be affected by ion fans or ion bars. Furthermore, different cleanrooms within a wafer fab often have different cleanroom classifications; a typical cleanroom is Class 100, but some areas may contain Class 1000 cleanrooms. For higher-class cleanrooms, it is necessary to plan the installation of fan filter units (FFUs) in specific areas. A fan filter unit is a self-powered, modular terminal air supply device with filtration capabilities. However, due to the compact layout of wafer fabs, complete isolation is not feasible, making it impossible to install fan filter units only in specific areas.

[0004] Therefore, how to avoid interference with other equipment and processes during the operation of ion fans and blower filter units is a problem that needs to be solved. Summary of the Invention

[0005] The technical problem to be solved by this utility model is how to avoid interference with other equipment and processes during the operation of ion fans and blower filter units, and to provide a wafer rack.

[0006] To address the aforementioned problems, this utility model provides a wafer rack, comprising: a support frame; a material platform disposed on the support frame for supporting wafers; and a fan unit disposed on the support frame and located above the material platform. The fan unit includes multiple ion fans and multiple filter fans, wherein the ion fans are used to provide ion airflow to the wafers, and the filter fans are used to provide filtered airflow toward the wafers.

[0007] The above technical solution involves installing ion fans and filter fans on the wafer rack. The ion fans provide an airflow of positively and negatively charged ions, which neutralizes the charges on the wafer surface, eliminating static electricity and reducing the risks associated with it. Furthermore, by providing a fresh and clean filtered airflow, it effectively dilutes and washes away contaminants, thereby reducing the concentration of pollutants and particulate contaminants on the wafer surface. The wafer rack provided by this invention can be used in a small area, avoiding interference with other equipment and processes during operation of the ion fans and filter fans. It is also easy to move, improving the convenience and flexibility of wafer electrostatic treatment and contaminant removal.

[0008] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit the present invention. Techniques, methods, and devices known to those skilled in the art may not be discussed in detail, but where appropriate, such techniques, methods, and devices should be considered part of the specification. Attached Figure Description

[0009] To more clearly illustrate the technical solutions in the specific embodiments of this utility model, the accompanying drawings used in the description of the specific embodiments will be briefly introduced below. Obviously, the drawings described below are only some specific embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without any creative effort.

[0010] Figure 1 This is a three-dimensional structural diagram of one embodiment of the wafer rack described in this utility model.

[0011] Figure 2 This is a front view of an embodiment of the wafer rack described in this utility model.

[0012] Figure 3 This is a schematic diagram of another embodiment of the wafer rack described in this utility model.

[0013] Explanation of reference numerals in the attached figures

[0014] 11 Brackets

[0015] 110 support layer

[0016] 12 material table

[0017] 13 Wind turbine units

[0018] 14 Ionizing fans

[0019] 15. Filter fan

[0020] 16 pulleys

[0021] 17 Grounding terminal

[0022] 180 main switch

[0023] 181 Ionizer Switch

[0024] 182 Filter Fan Switch Detailed Implementation

[0025] The technical solutions in the embodiments of this utility model will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this utility model, and not all of them. Based on the embodiments of this utility model, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this utility model.

[0026] Please see Figures 1-2 ,in, Figure 1 This is a three-dimensional structural diagram of one embodiment of the wafer rack described in this utility model; Figure 2 This is a front view of one embodiment of the wafer rack described in this utility model. Figures 1-2 As shown, the wafer rack includes a support 11, a material platform 12, and a fan assembly 13. The material platform 12 is mounted on the support 11 and is used to support wafers. The fan assembly 13 is mounted on the support 11 and located above the material platform 12. The fan assembly 13 includes multiple ion fans 14 and multiple filter fans 15. The ion fans 14 are used to provide ionized airflow to the wafers, and the filter fans 15 are used to provide filtered airflow toward the wafers.

[0027] The above technical solution involves installing ion fans and filter fans on the wafer rack. The ion fans provide an airflow of positively and negatively charged ions, which neutralizes the charges on the wafer surface, eliminating static electricity and reducing the risks associated with it. Furthermore, by providing a fresh and clean filtered airflow, it effectively dilutes and washes away contaminants, thereby reducing the concentration of pollutants and particulate contaminants on the wafer surface. The wafer rack provided by this invention can be used in a small area, avoiding interference with other equipment and processes during operation of the ion fans and filter fans. It is also easy to move, improving the convenience and flexibility of wafer electrostatic treatment and contaminant removal.

[0028] In some embodiments, a plurality of ion fans 14 are arranged sequentially along the extending direction of the material platform 12, and a plurality of filter fans 15 are disposed on both sides of all the ion fans 14. The material platform 12 is a rectangular material platform, and the ion fans 14 and the filter fans 15 are arranged sequentially along the extending direction of the material platform 12. In each fan group 13, the number of ion fans 14 and filter fans 15 is four; wherein, four ion fans 14 are located in the middle of the fan group 13, and four filter fans are disposed on both sides of all the ion fans 14, with two on each side. In other embodiments, the number of ion fans 14 and filter fans 15 can also be three, five, or six; the number of ion fans 14 and filter fans 15 can be equal or unequal.

[0029] In some embodiments, the ion fan 14 is an ion fan or an ion bar. The ion fan and the ion bar can generate a large amount of airflow carrying positive and negative charges to neutralize the charges on the wafer surface, reducing the risks associated with static electricity. In traditional production testing, leakage current fluctuations are found during leakage current verification on testing equipment, and interference from ion fans or ion bars in the factory can affect the test results. However, this invention places the ion fan 14 on the wafer rack, enabling the removal of static electricity from the wafer within a small area, avoiding interference with other equipment and processes.

[0030] In some embodiments, the filter fan is a fan filter unit (FFU). A fan filter unit is a self-powered air supply and filtration device, a modular terminal air supply device with filtration function.

[0031] In some embodiments, a removable cover plate (not shown) is provided at the air outlet of the fan unit 13 to protect the fan unit 13. The removable cover plate makes the maintenance of the ion fan 14 and the filter fan 15 extremely convenient.

[0032] In some embodiments, the support 11 includes a plurality of sequentially stacked support layers 110, each support layer 110 being provided with a material platform 12 and a fan unit 13. For example... Figures 1-2 As shown, in this embodiment, the support 11 includes two support layers 110, and the fan unit 13 of the lower support layer 110 is disposed at the bottom of the material platform 12 of the upper support layer 110. In other embodiments, the number of support layers 110 may be three, four, or five.

[0033] Please see Figure 3 This is a schematic diagram of another embodiment of the wafer rack described in this utility model. Figure 3 As shown, the wafer rack in this embodiment includes three stacked support layers 110. Furthermore, in this embodiment, the bottom of each support layer 11 is equipped with casters 16 for moving the wafer rack. The wafer rack has strong mobility to adapt to various process scenarios and also serves to transport wafers.

[0034] In some embodiments, the support 11 further includes at least one grounding terminal 17, providing good grounding protection for the wafer rack and ensuring safety during use. In other embodiments, the support 11 may also have a grounding terminal 17 in each of the support layers 110 to further improve the safety of the wafer rack during use.

[0035] In some embodiments, the wafer rack further includes a main switch 180 electrically connected to the fan unit 13, which can control the opening and closing of the fan unit 13. A single main switch 180 allows for one-button control of all fans in the fan unit 13, providing convenient and quick operation.

[0036] In some embodiments, the wafer rack further includes an ion fan switch 181 and a filter fan switch 182. The ion fan switch 181 can independently control the on / off state of the ion fan 14 when the main switch 180 is on, and the filter fan switch 182 can independently control the on / off state of the filter fan 15 when the main switch 180 is on. The ion fan 14 generates a large amount of airflow carrying positive and negative charges to neutralize the charges on the wafer surface, reducing the risk of static electricity. The filter fan 15 is used to quickly deliver fresh airflow into environments such as cleanrooms, effectively diluting and rinsing contaminants, thereby reducing the concentration of pollutants. Since the ion fan 14 and the filter fan 15 have different functions and different requirements in different process scenarios, the wafer rack further provides independent switches for the ion fan 14 and the filter fan 15, making the control of the fans' on / off state more precise to adapt to the needs of different process scenarios.

[0037] In summary, the wafer rack provided by this utility model exhibits superior performance in many aspects, including static electricity elimination, reduction of particulate contamination on wafer surfaces, convenient maintenance, high mobility, simple operation, and high safety.

[0038] It should be noted that references to "an embodiment," "an embodiment," "an exemplary embodiment," "some embodiments," etc., in the specification indicate that the described embodiments may include specific features, structures, or characteristics, but each embodiment may not necessarily include that specific feature, structure, or characteristic. Furthermore, such phrases do not necessarily refer to the same embodiment. In addition, when a specific feature, structure, or characteristic is described in connection with an embodiment, whether explicitly described or not, implementing such a feature, structure, or characteristic in conjunction with other embodiments is within the knowledge of those skilled in the art.

[0039] Generally, terms can be understood at least partially from their usage in context. For example, the term "one or more," as used herein, depends at least partially on the context and can be used to describe any feature, structure, or characteristic in a singular sense, or in a plural sense, to describe a combination of features, structures, or characteristics. Similarly, terms such as "a," "a," or "the" can also be understood, at least partially on the context, to express either a singular or plural usage. Furthermore, the term "based on" can be understood not necessarily to express an exclusive set of factors, but rather, alternatively, also at least partially on the context, to allow for the presence of other factors that are not necessarily explicitly described. It should also be noted in this specification that "connection / coupling" refers not only to a direct coupling of one component to another, but also to an indirect coupling of one component to another via an intermediate component.

[0040] It should be noted that the terms "comprising" and "having," and their variations, used in this utility model document are intended to cover non-exclusive inclusion. The terms "first," "second," etc., are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence, unless explicitly indicated by the context. It should be understood that such data used interchangeably where appropriate. Furthermore, embodiments and features within embodiments of this utility model can be combined with each other without conflict. In addition, descriptions of well-known components and technologies have been omitted in the above description to avoid unnecessarily obscuring the concepts of this utility model. In the various embodiments described above, each embodiment focuses on its differences from other embodiments; similar / identical parts between embodiments can be referred to mutually.

[0041] The above description is only a preferred embodiment of the present utility model. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present utility model, and these improvements and modifications should also be considered within the protection scope of the present utility model.

Claims

1. A wafer rack, characterized in that, include: support; A material platform, mounted on the support, is used to support wafers; A fan unit is mounted on the support and located above the material platform. The fan unit includes multiple ion fans and multiple filter fans. The ion fans are used to provide ion airflow to the wafer, and the filter fans are used to provide filter airflow toward the wafer.

2. The wafer rack according to claim 1, characterized in that, Multiple ion blowers are arranged sequentially along the extension direction of the material platform, and multiple filter blowers are located on both sides of all the ion blowers.

3. The wafer rack according to claim 1, characterized in that, In each of the aforementioned fan units, there are four ion fans and four filter fans.

4. The wafer rack according to claim 1, characterized in that, The ion fan is either an ion fan or an ion bar.

5. The wafer rack according to claim 1, characterized in that, The support structure comprises multiple stacked support layers, each support layer being provided with a material platform and a fan unit.

6. The wafer rack according to claim 1, characterized in that, The bottom of the support is equipped with casters for moving the wafer rack.

7. The wafer rack according to claim 1, characterized in that, The bracket also includes at least one grounding terminal.

8. The wafer rack according to claim 1, characterized in that, The fan unit is equipped with a removable cover at the air outlet to protect the fan unit.

9. The wafer rack according to claim 1, characterized in that, The wafer rack also includes a main switch electrically connected to the fan unit, which can control the fan unit to turn on or off.

10. The wafer rack according to claim 9, characterized in that, The wafer rack also includes an ion fan switch and a filter fan switch. The ion fan switch can independently control the ion fan to turn on or off when the main switch is on, and the filter fan switch can independently control the filter fan to turn on or off when the main switch is on.

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