Hollow cathode device and coating equipment

Abstract

The utility model relates to the technical field of solar cells, and discloses a hollow cathode device and coating equipment, the device comprises a quartz glass tube body, a conductive molybdenum tube, an arc striking power supply, a first emitter, a second emitter, a tantalum tube, a nozzle assembly, a focusing magnet, a focusing coil, a water cooling sleeve and a deflection coil; the quartz glass tube body is provided with a first cavity and a second cavity; the nozzle assembly is arranged in the second cavity; the focusing magnet and the focusing coil are arranged outside the second cavity in a sleeving manner; the water-cooling sleeve and the quartz glass tube body are coaxially arranged, the deflection coil is sleeved outside the water-cooling sleeve, and the deflection coil can move along the axial direction of the water-cooling sleeve. The device has the beneficial effects that parts in the device can be conveniently observed, the device is easy to overhaul, and meanwhile, the device can be prevented from being damaged easily due to over-high overall temperature. And the deflection angle of the emitted ion beam is adjustable, so that the device is suitable for various coating devices and is high in universality.

Description

Technical Field

[0001] This utility model relates to the field of solar cell technology, and in particular to a hollow cathode device and coating equipment. Background Technology

[0002] With the development and application of third-generation solar cells (perovskite cells), their advantages such as high photoelectric conversion efficiency and low cost have gradually been adopted by a wide range of users. The conductive layer film FTO and the electron transport layer TiO2, SnO2, ZnO2 and other metal oxides on them all need to be coated using coating equipment.

[0003] A hollow cathode is a plasma generator used in equipment such as RPD (Reactive Plasma Deposition) and hollow cathode coating machines for substrate coating. Existing hollow cathode devices are structurally complex. When the conductive molybdenum tube inside the device is damaged, it is difficult to observe, requiring disassembly and reassembly of the entire device, which affects maintenance efficiency. Furthermore, when emitting a strong plasma beam, the overall temperature of the device becomes excessively high, easily leading to damage. In addition, when the plasma beam is used in conjunction with coating equipment, the deflection angle of the ion beam is difficult to adjust, making it incompatible with various coating equipment. Utility Model Content

[0004] The purpose of this invention is to provide a hollow cathode device and coating equipment, which facilitates the observation of internal components and makes maintenance easier. It also prevents the overall device from overheating and becoming easily damaged. The emitted ion beam deflection angle is adjustable, making it suitable for various coating equipment and highly versatile.

[0005] To achieve the above objectives, this utility model provides a hollow cathode device, including a quartz glass tube, a conductive molybdenum tube, an arc-igniting power supply, a first emitter, a second emitter, a tantalum tube, a nozzle assembly, a focusing magnet, a focusing coil, a water-cooling sleeve, and a deflection coil.

[0006] The quartz glass tube is provided with a first cavity and a second cavity along the axial direction.

[0007] The conductive molybdenum tube is disposed in the first cavity and coaxially arranged with the quartz glass tube. One end of the conductive molybdenum tube is connected to one end of the quartz glass tube. The first emitter and the second emitter are spaced apart along the axial direction inside the conductive molybdenum tube. The other end of the conductive molybdenum tube is connected to the second cavity.

[0008] The arc-starting power supply is connected to the quartz glass tube.

[0009] One end of the tantalum tube is located outside the first cavity, and the other end extends along the axial direction of the quartz glass tube body and is arranged in the conductive molybdenum tube, and sequentially penetrates the first emitter and the second emitter, the tantalum tube is used for introducing inert gas and generating plasma;

[0010] The nozzle assembly is arranged in the second cavity and one end of the nozzle assembly is in communication with the first cavity and the other end of the nozzle assembly is in communication with the inside of the water-cooled sleeve tube;

[0011] The focusing magnet and the focusing coil are arranged outside the second cavity and coaxially arranged with the quartz glass tube body, and generate a focusing magnetic field in the second cavity, which is used for gathering the plasma in the first cavity into a plasma beam through the focusing magnetic field, and the plasma beam is emitted from the nozzle assembly to the water-cooled sleeve tube;

[0012] The water-cooled sleeve tube is coaxially arranged with the quartz glass tube body and externally sleeved with the deflection coil, the other end of the water-cooled sleeve tube is connected with a coating equipment, and the deflection coil can move along the axial direction of the water-cooled sleeve tube to change the deflection angle of the plasma beam entering the coating equipment.

[0013] Further, one end of the tantalum tube away from the quartz glass tube body is connected with a gas delivery pipe, and a connecting piece is arranged between the gas delivery pipe and the tantalum tube.

[0014] Further, the connecting piece comprises an adapter block, a stepped hole is formed in the adapter block, one end of the stepped hole is inserted with the gas delivery pipe, and the other end of the stepped hole is inserted with the tantalum tube, a sealing ring is embedded in the inner wall of one end of the stepped hole close to the tantalum tube, and the sealing ring is sleeved outside the tantalum tube.

[0015] Further, one end of the conductive molybdenum tube close to the second cavity is provided with a tungsten disc, one end of the tungsten disc is sleeved outside the conductive molybdenum tube, and the other end of the tungsten disc is provided with a through hole coaxial with the tantalum tube.

[0016] Further, the nozzle assembly comprises a first nozzle and a second nozzle, the first nozzle and the second nozzle are sequentially and spaced apart along the axial direction of the quartz glass tube body and away from the first cavity, one end of the first nozzle is in communication with the first cavity, and the other end of the first nozzle is arranged in the second cavity, one end of the second nozzle is in communication with the first nozzle, and the other end of the second nozzle extends into the water-cooled sleeve tube, the focusing magnet is sleeved outside the second cavity and corresponds to the first nozzle, and the focusing coil is sleeved outside the second cavity and corresponds to the second nozzle.

[0017] Further, the second nozzle is internally provided with a first channel and a second channel, the first channel is communicated with the first nozzle, the second channel is communicated with the water cooling sleeve, and the inner diameter of the second channel gradually increases in the direction away from the second cavity.

[0018] Further, the other end of the water cooling sleeve is connected with an insulation layer for connecting with the coating equipment.

[0019] Further, the first emitter and the second emitter are made of lanthanum hexaboride.

[0020] The utility model also provides a coating equipment which comprises the hollow cathode device of any one of the above, and further comprises a vacuum cavity, a crucible, an ITO magnet and an ITO coil, the crucible is arranged in the vacuum cavity, and the crucible is sleeved with the ITO magnet and the ITO coil.

[0021] Compared with the prior art, the utility model embodiment hollow cathode device and coating equipment have the beneficial effects that the quartz glass tube body is arranged, the conductive molybdenum tube in the quartz glass tube body can be observed conveniently, and the maintenance is easy.Meanwhile, the first emitter and the second emitter are arranged, the relatively strong plasma beam can be emitted when the temperature is lower than the melting point of the tantalum tube, the water cooling sleeve is arranged, the overall temperature of the hollow cathode device is avoided to be too high, and the service life of the device is improved.In addition, the deflection coil can move along the axial direction of the water cooling sleeve, the water cooling sleeve is connected with the coating equipment, the angle of the plasma beam of the hollow cathode device into the coating equipment can be adjusted, and the universality is high.Furthermore, the focusing magnet and the focusing coil are arranged, the plasma can be gathered into the plasma beam easily, and the stability of the plasma beam formation is improved. BRIEF DESCRIPTION OF DRAWINGS

[0022] Figure 1 is the structure schematic diagram of the coating equipment of the utility model embodiment;

[0023] Figure 2 is the structure schematic diagram of the hollow cathode device of the utility model embodiment.

[0024] In the drawing, 1, quartz glass tube body;100, first cavity;101, second cavity;2, conductive molybdenum tube;21, tungsten disc;211, via hole;3, arc striking power supply;4, first emitter;5, second emitter;6, tantalum tube;7, nozzle assembly;71, first nozzle;72, second nozzle;721, first channel;722, second channel;8, focusing magnet;9, focusing coil;10, water cooling sleeve;11, deflection coil;12, gas delivery pipe;13, connecting piece;131, adapter block;132, stepped hole;133, sealing ring;14, insulation layer;15, vacuum cavity;16, crucible;17, ITO coil;18, ITO magnet;a, substrate. DETAILED DESCRIPTION

[0025] The specific embodiments of the present application will be further described in detail below with reference to the accompanying drawings and examples. The following examples are used to illustrate the present application, but not to limit the scope of the present application.

[0026] In the description of the present application, it should be understood that the positions or location relationships indicated by the terms "upper", "lower", "front", "back", "inner", "outer" and the like in the present application are based on the positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices and elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application.

[0027] In the description of the present application, it should be understood that the terms "first", "second" and the like are used to describe various information in the present application, but these information should not be limited to these terms, and these terms are only used to distinguish the same type of information from each other. For example, the "first" information can also be referred to as "second" information without departing from the scope of the present application, and similarly, the "second" information can also be referred to as "first" information.

[0028] As shown in Figure 1 , Figure 2 The hollow cathode device of the preferred embodiment of the present application is used to generate a plasma beam to bombard the film material in the film coating equipment, evaporate the film material and deposit a thin film on the substrate. It comprises a quartz glass tube body 1, a conductive molybdenum tube 2, an arc striking power supply 3, a first emitter 4, a second emitter 5, a tantalum tube 6, a nozzle assembly 7, a focusing magnet 8, a focusing coil 9, a water-cooled sleeve 10 and a deflection coil 11. Among them, the quartz glass tube body 1 serves as a mounting carrier, and for the convenience of mounting other parts, the quartz glass tube body 1 is provided with a first cavity 100 and a second cavity 101 along the axial direction. Since the quartz glass tube body 1 is of transparent material, it is beneficial to observe the installation condition of the parts in the quartz glass tube body 1, and easy to maintain.

[0029] Specifically, in order to facilitate the setting of the conductive molybdenum tube 2, the conductive molybdenum tube 2 is arranged in the first cavity 100 and coaxially arranged with the quartz glass tube body 1, the conductive molybdenum tube 2 is connected with one end of the quartz glass tube body 1, the first emitter 4 and the second emitter 5 are arranged in the conductive molybdenum tube 2 in the axial direction, and the other end of the conductive molybdenum tube 2 is communicated with the second cavity 101; the arc striking power supply 3 is connected with the quartz glass tube body 1. One end of the tantalum tube 6 is located outside the first cavity 100, the other end extends along the axial direction of the quartz glass tube body 1 and is arranged in the conductive molybdenum tube 2, and sequentially penetrates the first emitter 4 and the second emitter 5, the tantalum tube 6 is used for introducing inert gas and generating plasma. Specifically, when the inert gas (such as argon) enters the tantalum tube 6, the glow discharge is generated at the end of the tantalum tube 6 by the arc striking power supply 3, after the discharge, the argon ions in the tantalum tube 6 bombard the tantalum tube 6 under the action of the electric field, so that the temperature of the tantalum tube 6 sharply rises, thereby the tantalum tube 6 can emit a large amount of plasma, and the plasma is accelerated through the first emitter 4 and the second emitter 5, so that a relatively strong plasma beam can be emitted when the temperature of the tantalum tube 6 is lower than the melting point of the tantalum tube 6, thereby the tantalum tube 6 is prevented from being damaged due to overheating, and the service life of the device is improved. The first emitter 4 and the second emitter 5 are both made of lanthanum hexaboride, and have good electron emission performance and stability.

[0030] Specifically, in order to facilitate the emission of the plasma beam, the nozzle assembly 7 is arranged in the second cavity 101, one end of the nozzle assembly 7 is communicated with the first cavity 100, and the other end of the nozzle assembly 7 is communicated with the inside of the water-cooled sleeve 10; the focusing magnet 8 and the focusing coil 9 are arranged outside the second cavity 101 and coaxially arranged with the quartz glass tube body 1, and generate a focusing magnetic field in the second cavity 101, which is used for gathering the plasma in the first cavity 100 into a plasma beam through the focusing magnetic field, the plasma beam is emitted from the nozzle assembly 7 to the water-cooled sleeve 10, the other end of the water-cooled sleeve 10 is connected with the coating equipment, and is used for coating the substrate. The water-cooled sleeve 10 is coaxially arranged with the quartz glass tube body 1, and is externally sleeved with the deflection coil 11, the water-cooled structure (not shown in the figure, generally a cold water pipe is embedded in the wall of the water-cooled sleeve 10, the water in the cold water pipe is connected with the circulating water supply system, and the circulating water flow carries away the excess heat generated by the device) is arranged in the water-cooled sleeve 10, which is used for water cooling of the whole device, in order to facilitate the application of the device with different coating equipment, the deflection coil 11 can move along the axial direction of the water-cooled sleeve 10, so as to change the deflection angle of the plasma beam entering the coating equipment.

[0031] Specifically, in some embodiments, in order to facilitate the positioning of the deflection coil 11 after moving along the axial direction of the water-cooled sleeve 10, the adjustment range of the deflection coil 11 is as shown in Figure 1 、 Figure 2 The deflection coil 11 can be detachably fixed with the water-cooled sleeve 10 through a locking screw or a clamp, so as to facilitate the position adjustment in the adjustment range.

[0032] In some embodiments, in order to facilitate the connection of the tantalum tube 6 and the inert gas supply device, the gas delivery pipe 12 is connected to the end of the quartz glass tube body 1 away from the tantalum tube 6, the other end of the gas delivery pipe 12 is connected to the gas supply device, and a connecting piece 13 is arranged between the gas delivery pipe 12 and the tantalum tube 6 to improve the sealing effect between the gas delivery pipe 12 and the tantalum tube 6. Specifically, the connecting piece 13 includes an adapter block 131, wherein a stepped hole 132 is formed in the adapter block 131, one end of the stepped hole 132 is inserted with the gas delivery pipe 12, the other end is inserted with the tantalum tube 6, and a sealing ring 133 is embedded in the inner wall of the end of the stepped hole 132 close to the tantalum tube 6, and the sealing ring 133 is sleeved on the outside of the tantalum tube 6.

[0033] Further, in order to avoid damage to the end of the conductive molybdenum tube 2 under the impact of high temperature and plasma, a tungsten disc 21 is arranged at the end of the conductive molybdenum tube 2 close to the second cavity 101, one end of the tungsten disc 21 is sleeved on the outside of the conductive molybdenum tube 2, and the other end is provided with a through hole 211 coaxial with the tantalum tube 6.

[0034] Further, in order to facilitate the setting of the nozzle assembly 7 and the contraction or expansion of the plasma beam in the nozzle assembly, the nozzle assembly 7 includes a first nozzle 71 and a second nozzle 72, which are arranged in sequence along the axial direction of the quartz glass tube body 1 and away from the first cavity 100, one end of the first nozzle 71 is in communication with the first cavity 100, and the other end is arranged in the second cavity 101, one end of the second nozzle 72 is in communication with the first nozzle 71, and the other end extends into the water-cooled sleeve 10, a focusing magnet 8 is arranged outside the second cavity 101 corresponding to the first nozzle 71, and a focusing coil 9 is arranged outside the second cavity 101 corresponding to the second nozzle 72. Wherein, the first nozzle 71 is correspondingly provided with a focusing magnet 8, and the plasma beam emitted from the tantalum tube 6 is gathered by the magnetic field generated by the focusing magnet 8 and then enters the second nozzle 72, and the second nozzle 72 is correspondingly provided with a focusing coil 9, the current size of the focusing coil 9 can be adjusted to adjust the magnetic field strength, so that the plasma beam can be expanded (the diameter of the plasma beam is enlarged) or contracted (the diameter of the plasma beam is reduced), which is easy to adjust.

[0035] Further, in order to facilitate the design of the internal structure of the second nozzle 72, the second nozzle 72 is provided with a first channel 721 and a second channel 722, the first channel 721 is in communication with the first nozzle 71, and the second channel 722 is in communication with the water-cooled sleeve 10, in order to increase the expansion range of the plasma beam, the inner diameter of the second channel 722 gradually increases in the direction away from the second cavity 101.

[0036] Further, in order to facilitate the insulation of the hollow cathode device when connected to the coating equipment, and to avoid the influence of the current in the coating equipment on the magnetic field in the hollow cathode device, the other end of the water-cooled sleeve 10 is connected with an insulating layer 14 for connection with the coating equipment.

[0037] The utility model also provides a kind of coating equipment, including hollow cathode device, still including vacuum cavity 15, crucible 16, ITO magnet 17, ITO coil 18, crucible 16 is equipped in vacuum cavity 15, crucible 16 is equipped with ITO magnet 17, ITO coil 18 outside sleeve. Figure 2 As shown, after the plasma beam is adjusted to emit angle from in water cooling sleeve pipe 10 through deflection coil 11, is bombarded on the film material made of ITO and metal oxide in crucible 16 by the magnetic field effect of ITO magnet 17, ITO coil 18, makes film material evaporate, so that the substrate a located above the crucible 16 is deposited thin film, completes coating process.

[0038] In conclusion, the utility model embodiment provides a kind of hollow cathode device and coating equipment compared with prior art, its beneficial effect lies in: it is equipped with quartz glass tube body 1, it is convenient to observe the conductive molybdenum tube 2 in quartz glass tube body 1, easy to overhaul.Meanwhile, it is equipped with first emitter 4, second emitter 5, can emit stronger plasma beam when being lower than the melting point of tantalum tube 6, and it is equipped with water cooling sleeve pipe 10, avoid that the overall temperature of hollow cathode device is too high, improve the service life of device overall.In addition, deflection coil 11 can be moved along the axial direction of water cooling sleeve pipe 10, water cooling sleeve pipe 10 is connected with coating equipment, can adjust the plasma beam angle of hollow cathode device injection coating equipment, and it is strong in versatility.Moreover, it is equipped with focusing magnet 8 and focusing coil 9, easy to gather into plasma beam with plasma, improve the stability of plasma beam formation.

[0039] The above is only preferred embodiment of the utility model, it should be pointed out, for ordinary skilled person in the art, without departing from the technical principle of the utility model, can make several improvements and substitutions under the premise, these improvements and substitutions also should be regarded as the protection range of the utility model.

Claims

1. A hollow cathode device, characterized in that: It includes a quartz glass tube, a conductive molybdenum tube, an arc-igniting power supply, a first emitter, a second emitter, a tantalum tube, a nozzle assembly, a focusing magnet, a focusing coil, a water-cooling jacket, and a deflection coil; The quartz glass tube is provided with a first cavity and a second cavity along the axial direction. The conductive molybdenum tube is disposed in the first cavity and coaxially arranged with the quartz glass tube. One end of the conductive molybdenum tube is connected to one end of the quartz glass tube. The first emitter and the second emitter are spaced apart along the axial direction inside the conductive molybdenum tube. The other end of the conductive molybdenum tube is connected to the second cavity. The arc-starting power supply is connected to the quartz glass tube. One end of the tantalum tube is located outside the first cavity, and the other end extends along the axial direction of the quartz glass tube and is disposed inside the conductive molybdenum tube, and passes through the first emitter and the second emitter in sequence. The tantalum tube is used to introduce inert gas and generate plasma. The nozzle assembly is located in the second cavity, with one end connected to the first cavity and the other end connected to the inside of the water-cooling sleeve; The focusing magnet and the focusing coil are sleeved outside the second cavity and coaxially arranged with the quartz glass tube. They generate a focusing magnetic field inside the second cavity to focus the plasma in the first cavity into a plasma beam. The plasma beam is ejected from the nozzle assembly to the water-cooling sleeve. The water-cooled sleeve is coaxially arranged with the quartz glass tube and the deflection coil is sleeved on the outside. The other end of the water-cooled sleeve is connected to the coating equipment. The deflection coil can move along the axial direction of the water-cooled sleeve to change the deflection angle of the plasma beam entering the coating equipment.

2. The hollow cathode device as described in claim 1, characterized in that: The end of the tantalum tube away from the quartz glass tube is connected to a gas delivery tube, and a connector is provided between the gas delivery tube and the tantalum tube.

3. The hollow cathode device as described in claim 2, characterized in that: The connector includes an adapter block with a stepped hole. One end of the stepped hole is into which the gas delivery pipe is inserted, and the other end is into which the tantalum tube is inserted. A sealing ring is embedded in the inner wall of the end of the stepped hole near the tantalum tube, and the sealing ring is fitted over the tantalum tube.

4. The hollow cathode device as described in claim 1, characterized in that: The conductive molybdenum tube has a tungsten disk at one end near the second cavity. One end of the tungsten disk is sleeved outside the conductive molybdenum tube, and the other end has a through hole coaxial with the tungsten tube.

5. The hollow cathode device as described in claim 1, characterized in that: The nozzle assembly includes a first nozzle and a second nozzle. The first nozzle and the second nozzle are arranged sequentially at intervals along the axial direction of the quartz glass tube and away from the first cavity. One end of the first nozzle is connected to the first cavity and the other end is located in the second cavity. One end of the second nozzle is connected to the first nozzle and the other end extends into the water-cooling sleeve. The focusing magnet is sleeved on the outside of the second cavity corresponding to the first nozzle, and the focusing coil is sleeved on the outside of the second cavity corresponding to the second nozzle.

6. The hollow cathode device as described in claim 5, characterized in that: The second nozzle has a first channel and a second channel inside. The first channel is connected to the first nozzle, and the second channel is connected to the water-cooling sleeve. The inner diameter of the second channel gradually increases in the direction away from the second cavity.

7. The hollow cathode device as described in claim 1, characterized in that: The other end of the water-cooled sleeve is connected to an insulating layer for connection with the coating equipment.

8. The hollow cathode device as described in claim 1, characterized in that: Both the first emitter and the second emitter are made of lanthanum hexaboride.

9. A coating apparatus comprising the hollow cathode device according to any one of claims 1-8, characterized in that: It also includes a vacuum chamber, a crucible, an ITO magnet, and an ITO coil. The crucible is disposed inside the vacuum chamber, and the ITO magnet and the ITO coil are disposed outside the crucible.

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