Portable temperature-control photochemical flow reaction device

Abstract

The utility model discloses a portable temperature-control photochemical flow reaction device, which is characterized in that a temperature-control medium flow guide cavity wraps the periphery of a quartz reactor, so that a temperature-control medium directionally flows along the cavity at a preset flow speed; a simulation light source in the simulation light source temperature control structure is arranged in a cylindrical structure, and a sleeve is arranged outside the simulation light source, so that the temperature control medium flow guide cavity passes through the sleeve; the purge gas cooling assembly precools purge gas and inputs the purge gas into the cooling cavity; the sample gas temperature pretreatment structure adopts a conical structure, the periphery of the sample gas temperature pretreatment structure is wrapped with a temperature control medium flow guide cavity, and a sample introduction channel is reserved in the middle; the temperature control medium supply unit is provided with a temperature adjusting assembly in a matched mode and inputs a temperature control medium with the preset temperature into the temperature control medium flow guide cavity. According to the technical scheme of the utility model, the temperature of the oxidation reaction environment can be accurately controlled, so that the device can be applied indoors and outdoors and in more scenes.

Description

TECHNICAL FIELD

[0001] The utility model relates to chemical device technical field especially relates to a portable temperature control photochemical flow reaction device. BACKGROUND

[0002] At present, in the laboratory research of atmospheric chemistry, a smoke box is mainly used to simulate the SOA generation process, but the experimental period of the smoke box is long and inconvenient, since the oxidation flow reactor can generate high concentration oxidation conditions and has the characteristics of being movable, it can simulate the long-period atmospheric chemical process in a short time, but since the oxidation flow reactor applied in the laboratory at present, the internal temperature cannot be accurately controlled, there is a large temperature difference in the reaction cavity, which leads to great limitations of simulation data and application scenarios. SUMMARY

[0003] In view of the above problems, the utility model provides a portable temperature control photochemical flow reaction device, by the temperature control medium is introduced into the temperature control medium flow guide cavity structure wrapped outside the reaction cavity, realize the temperature accurate control of oxidation reaction environment, and can module assembly, thereby realizing the application of indoor and outdoor and more scene, make the experimental simulation data more reproducible.

[0004] To achieve the above object, the utility model provides a portable temperature control photochemical flow reaction device, comprising: temperature control medium flow guide cavity, simulation light source temperature control structure, purge gas cooling assembly, sample gas temperature pretreatment structure and temperature control medium supply unit;

[0005] The temperature control medium flow guide cavity is wrapped around the periphery of the quartz reactor, so that the temperature control medium flows at a preset flow rate in a directional manner along the cavity;

[0006] The simulation light source temperature control structure adopts a sleeve type cylindrical structure, the simulation light source is arranged in the cylindrical structure, and a sleeve is arranged outside the simulation light source, so that the temperature control medium flow guide cavity passes through the sleeve;

[0007] The purge gas cooling assembly pre-cools the purge gas and inputs the purge gas into the cooling cavity;

[0008] The sample gas temperature pretreatment structure is arranged at the sample inlet end of the quartz reactor, the sample gas temperature pretreatment structure adopts a conical structure, the periphery of the sample gas temperature pretreatment structure is wrapped with the temperature control medium flow guide cavity, and a sample inlet channel is reserved in the middle;

[0009] The temperature control medium supply unit is matched with a temperature adjusting assembly, and the temperature control medium at a preset temperature is input into the temperature control medium flow guide cavity.

[0010] In the technical scheme, preferably, the temperature control medium flow cavity is respectively provided with a temperature adjusting module, a flow adjusting module and a flow rate adjusting module, so that the temperature, flow and flow rate of the temperature control medium in the temperature control medium flow cavity are adjusted.

[0011] In the technical scheme, preferably, the cooling gas inlet of the purge gas cooling assembly is arranged at the sample inlet end of the quartz reactor, the purge gas cooling assembly is in a tubular, surrounding or full-outlet labyrinth type, and the purge gas is used to pre-cool the purge gas and to cool and purge the temperature control structure of the simulated light source.

[0012] In the technical scheme, preferably, the sample gas temperature pretreatment structure is provided with a sample gas inlet and a sheath gas inlet, the sample gas and the sheath gas pass through the channels arranged at the sample inlet end, so that the sample gas is mixed by the multi-flow path mixing structure, and the sheath gas is in a laminar flow state by the damping flow stabilizing structure.

[0013] In the technical scheme, preferably, the quartz reactor is provided with a sample gas collection end opposite to the sample inlet end, and the sample gas is output by the sample gas collection end after passing through the quartz reactor.

[0014] In the technical scheme, preferably, the temperature adjusting assembly comprises a temperature and humidity sensor, the temperature and humidity sensor is arranged at the sample gas collection end, and the temperature and humidity sensor is used to measure the sampling temperature of the sample gas collection end.

[0015] In the technical scheme, preferably, the temperature adjusting assembly further comprises a medium temperature control module, and the medium temperature control module is used to input the temperature control medium with a preset temperature into the temperature control medium flow cavity.

[0016] Compared with the prior art, the beneficial effects of the portable temperature control photochemical flow reaction device are as follows: the temperature control medium is introduced into the temperature control medium flow cavity structure wrapped outside the reaction cavity, the temperature of the oxidation reaction environment is accurately controllable, the module assembly is assembled, the indoor and outdoor and more scene applications are realized, and the experimental simulation data is more reproducible. BRIEF DESCRIPTION OF DRAWINGS

[0017] Figure 1 FIG. 1 is a perspective view of a portable temperature control photochemical flow reaction device according to an embodiment of the present application;

[0018] Figure 2 FIG. 1 is a perspective view of a portable temperature control photochemical flow reaction device according to an embodiment of the present application;

[0019] Figure 3 FIG. 1 is a perspective view of a portable temperature control photochemical flow reaction device according to an embodiment of the present application;

[0020] Figure 4 The sectional view structure schematic diagram of the portable temperature control photochemical flow reaction device is disclosed for an embodiment of the utility model.

[0021] In the drawing, the correspondence between each component and the reference numeral is:

[0022] 1. Temperature control medium flow cavity, 2. Analog light source temperature control structure, 21. Analog light source, 22. Lamp tube fixing seat, 3. Purge gas cooling assembly, 31. Cooling gas inlet, 4. Sample gas temperature pretreatment structure, 41. Gas mixing structure, 51. Temperature and humidity sensor, 52. Medium temperature control module, 6. Quartz reactor, 61. Sample gas inlet, 62. Sheath gas inlet, 63. Sample gas collection end. DETAILED DESCRIPTION

[0023] To make the purpose, technical scheme and advantages of the embodiments of the utility model clearer, the technical scheme in the embodiments of the utility model will be described clearly and completely below in combination with the drawings in the embodiments of the utility model. Obviously, the described embodiments are part of the embodiments of the utility model, rather than all the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by those skilled in the art without creative labor belong to the protection scope of the utility model.

[0024] The utility model will be described in further detail below in combination with the drawings:

[0025] As Figures 1 to 4 indicated, according to the portable temperature control photochemical flow reaction device provided by the utility model, it comprises: temperature control medium flow cavity 1, analog light source temperature control structure 2, purge gas cooling assembly 3, sample gas temperature pretreatment structure 4 and temperature control medium supply unit 5.

[0026] The temperature control medium flow cavity 1 is wrapped around the periphery of the quartz reactor 6, so that the temperature control medium flows at a preset flow rate along the cavity in a direction;

[0027] The analog light source temperature control structure 2 adopts a sleeve type cylindrical structure, the analog light source 21 is arranged in the cylindrical structure, and a sleeve is arranged outside the analog light source 21, so that the temperature control medium flow cavity 1 passes through the sleeve;

[0028] The purge gas cooling assembly 3 pre-cools the purge gas and inputs the purge gas into the cooling cavity;

[0029] The sample gas temperature pretreatment structure 4 is arranged at the sample inlet end of the quartz reactor 6, the sample gas temperature pretreatment structure 4 adopts a conical structure, the periphery of the sample gas temperature pretreatment structure 4 is wrapped with the temperature control medium flow cavity 1, and a sample inlet channel is reserved in the middle;

[0030] The temperature control medium supply unit 5 is matched with a temperature adjusting assembly, and inputs the temperature control medium at a preset temperature into the temperature control medium flow guide cavity 1.

[0031] In this embodiment, by introducing the temperature control medium into the temperature control medium flow guide cavity 1 structure wrapped outside the reaction cavity, the temperature of the oxidation reaction environment can be accurately controlled, and the module assembly can be realized, thereby realizing the application in indoor and outdoor and more scenes, making the experimental simulation data more reproducible, and providing a portable temperature control oxidation flow reaction device that can meet the application of multiple working conditions for simulating atmospheric chemistry related experiments.

[0032] Specifically, by designing and installing a tubular or surrounding cavity outside the reactor, the reaction cavity is wrapped, the temperature control medium in the tubular or surrounding cavity flows at a set flow rate along the directional cavity, the heat of the reactor is taken out, and at the same time, the cold and heat of the temperature control medium contributes to the temperature controllable effect of the reaction cavity, the characteristics are no leakage, no influence on the intensity of the simulation light source, no influence on the laminar flow state in the reaction cavity, no participation in the sample gas reaction, and the synergistic operation of the simulation light source temperature control structure 2, the purge gas cooling assembly 3 and the sample gas temperature pretreatment structure 4 is combined, and the temperature control type oxidation flow reaction device with accurate temperature control is achieved.

[0033] The simulation light source temperature control structure 2 adopts a sleeve type cylindrical barrel structure, and the simulation light source 21 is arranged in the sleeve type cylindrical barrel structure, and the sleeve type cylindrical barrel structure is characterized in that one or more sleeves are arranged outside the simulation light source, and the temperature control medium flows in the sleeves in an organized manner, and the purge in the light source pipe greatly reduces the influence of the heat generated by the simulation light source 21 on the reactor and the temperature control.

[0034] In the above embodiment, preferably, the temperature control medium flow guide cavity 1 is respectively provided with temperature, flow and flow rate adjusting modules to adjust the temperature, flow and flow rate of the temperature control medium in the temperature control medium flow guide cavity 1.

[0035] Specifically, by the above adjusting modules, the temperature, flow and flow rate of the temperature control medium in the temperature control medium flow guide cavity 1 can be adjusted, and the temperature control medium can flow according to the shape and direction of the cavity.

[0036] In the above embodiment, preferably, the cooling gas inlet 31 of the purge gas cooling assembly 3 is arranged at the sample inlet end of the quartz reactor 6, the purge gas cooling assembly 3 adopts a tubular, surrounding or full outlet labyrinth type to pre-cool the purge gas, and more efficiently realizes the precise temperature control effect, and the purge gas is used to cool and purge the cooling cavity and the simulation light source temperature control structure 2.

[0037] In the above embodiment, preferably, the inlet of the sample gas temperature pretreatment structure 4 is provided with a sample gas inlet 61 and a sheath gas inlet 62, and the sample gas and the sheath gas pass through the channels preset at the sample inlet end respectively, so that the sample gas is mixed by the multi-flow path mixing structure 41 and the sheath gas realizes the laminar flow state by the damping flow stabilization structure.

[0038] In the above embodiment, preferably, the quartz reactor 6 is provided with a sample gas collection end 63 opposite to the sample inlet end, and the sample gas is output by the sample gas collection end 63 after passing through the quartz reactor 6.

[0039] As shown in Figure 3 and Figure 4 In the above embodiment, preferably, the temperature adjusting assembly comprises a temperature and humidity sensor 51, and the temperature and humidity sensor 51 is arranged at the sample gas collection end 63 and is used for measuring the sample gas temperature of the sample gas collection end 63. Preferably, the temperature adjusting assembly further comprises a medium temperature control module 52, and the medium temperature control module 52 comprises but is not limited to a water bath device and is used for inputting the temperature control medium with a preset temperature into the temperature control medium flow guide cavity 1. The temperature adjusting assembly cooperates with the temperature control medium flow guide cavity 1, the simulated light source temperature control structure 2, the purge gas cooling assembly 3 and the sample gas temperature pretreatment structure 4 to realize the precise adjustment and control of the temperature.

[0040] In addition, the sample gas collection end 63 is further provided with a lamp fixing seat 22, so that the simulated light source temperature control structure 2 is fixed in the quartz reactor 6 through the lamp fixing seat 22.

[0041] The above is only the preferred embodiment of the present application and is not used to limit the present application. For those skilled in the art, the present application can have various changes and variations. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A portable temperature-controlled photochemical flow reactor apparatus, characterized by, The application relates to a temperature control medium flow guide cavity, a simulated light source temperature control structure, a purge gas cooling assembly, a sample gas temperature pretreatment structure and a temperature control medium supply unit. The temperature control medium flow guide cavity is wrapped around the periphery of the quartz reactor, so that the temperature control medium flows at a preset flow rate along the cavity. The simulated light source temperature control structure adopts a sleeve type cylindrical barrel structure, the simulated light source is arranged in the cylindrical barrel structure, a sleeve is arranged outside the simulated light source, and the temperature control medium flow guide cavity passes through the sleeve. The purge gas cooling assembly pre-cools the purge gas and inputs the purge gas into a cooling cavity. The sample gas temperature pretreatment structure is arranged at the sample inlet end of the quartz reactor, adopts a conical structure, and is wrapped around by the temperature control medium flow guide cavity and has an intermediate reserved sample inlet channel. The temperature control medium supply unit is provided with a temperature adjusting assembly and inputs the temperature control medium at a preset temperature into the temperature control medium flow guide cavity. The temperature control medium flow guide cavity is respectively provided with a temperature, flow and flow rate adjusting module to adjust the temperature, flow and flow rate of the temperature control medium in the temperature control medium flow guide cavity.

2. The portable temperature-controlled photochemical flow reactor of claim 1, wherein, The cooling gas inlet of the purge gas cooling assembly is arranged at the sample inlet end of the quartz reactor, the purge gas cooling assembly adopts a tubular, surrounding or full-outlet labyrinth type to pre-cool the purge gas, and the purge gas is used to cool and blow the cooling cavity and the simulated light source temperature control structure.

3. The portable temperature-controlled photochemical flow reactor of claim 1, wherein, The sample gas inlet and the sheath gas inlet are arranged at the inlet of the sample gas temperature pretreatment structure, the sample gas and the sheath gas pass through the channels preset at the sample inlet end, the sample gas is mixed by a multi-flow path mixing structure, and the sheath gas realizes a laminar flow state by a damping flow stabilizing structure.

4. The portable temperature-controlled photochemical flow reactor of claim 3, wherein, The quartz reactor is provided with a sample gas collection end at the other end relative to the sample inlet end, and the sample gas is output by the sample gas collection end after passing through the quartz reactor.

5. The portable temperature-controlled photochemical flow reactor of claim 4, wherein, The temperature adjusting assembly comprises a temperature and humidity sensor, the temperature and humidity sensor is arranged at the sample gas collection end, and the temperature and humidity sensor is used to measure the sampling temperature of the sample gas collection end.

6. The portable temperature-controlled photochemical flow reactor of claim 5, wherein, The temperature adjusting assembly further comprises a medium temperature control module, and the medium temperature control module is used to input the temperature control medium at a preset temperature into the temperature control medium flow guide cavity.

7. The portable temperature-controlled photochemical flow reactor of claim 6, wherein, ​

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