Slurry coating device for photovoltaic industry

Abstract

The utility model discloses a slurry coating device for the photovoltaic industry. The slurry coating device comprises a slurry coating device body and a coating assembly. The slurry coating device body comprises a moving module and a silicon wafer carrier; the silicon wafer carrier is arranged on the moving module in a sliding mode through the coating assembly. The coating assembly comprises a pressurizing motor, a circulating pump, a pressurizing cavity, a pressurizing plunger, a filling port, an exhaust recycling port, a feeding pipe and a returning pipe. The pressurizing motor is slidably arranged on the moving module through a sliding plate; the circulating pump is fixedly arranged on the pressurizing motor through a bolt; the pressurizing cavity is fixedly arranged on the pressurizing motor; the plurality of pressurizing plungers are connected through a connecting plate; the filling port is connected with the circulating pump through a filling valve; the exhaust recovery port is connected with the circulating pump through an exhaust valve; the slurry coating device for the photovoltaic industry is simple and reasonable in structure and ingenious in design, grooves can be carved in the silicon wafer carrier through laser, the line width smaller than 20 micrometers can be achieved through laser groove carving, the limitation of the traditional screen printing line width is broken through, the using amount of slurry can be reduced, and cost can be reduced.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic silicon wafer manufacturing technical field, concretely for a kind of for photovoltaic industry slurry coating device. BACKGROUND

[0002] Photovoltaic industry is the industry using solar light to convert into electric energy by photovoltaic effect, and photovoltaic industry belongs to new energy industry, with renewable, clean, environmental protection and other characteristics, is widely used in electric power, transportation, building and other fields.

[0003] As a kind of superfine line diameter screen printing plate manufacturing method and application provided in Chinese invention patent with publication number CN117183563A, the method is to use metal wire woven metal mesh cloth as raw material to make screen printing plate, use etching liquid to etch the metal wire on the screen printing plate which is not covered by mask or directly etch all the metal wire of metal mesh cloth, the mask refers to the high molecular film compounded on the surface of metal mesh cloth, after etching, the line diameter is reduced, then the mask is removed, and the plate making of opening pattern is carried out. The technical scheme provided by the present application has the following advantages compared with the prior art: the whole surface or the mask according to the needs can be made, the line diameter of the mesh cloth in the required place is made fine, which can be used for the production of finer fine grid, improves the efficiency of solar cell and reduces the consumption of silver paste; the line diameter of the pattern area and the non-pattern area can be made different, that is, the strength of the mesh cloth is ensured and the required precision is obtained; the difficulty of high-precision mesh cloth production and production cost are reduced.

[0004] Photovoltaic electrode preparation process refers to plating metal on the surface of silicon wafer to form electrode, forming ohmic contact at both ends of PN junction to realize current output. At present, the mainstream technology in the metallization link of photovoltaic cell is slurry screen printing, but the screen printing process still has many problems such as high material consumption, easy to block mesh hole, limited screen printing line width and so on. According to CN117183563A, the width of the secondary grid line of the solar cell printed with primary grid line and secondary grid line is 22 μm, which is basically the minimum width of screen printing, and cannot be smaller, and the screen printing line width is limited. UTILITY MODEL CONTENTS

[0005] The utility model aims at providing a kind of for photovoltaic industry slurry coating device to solve the problem of limited screen printing line width raised in the above background technology.

[0006] In order to achieve the above object, the utility model provides the following technical scheme: a kind of slurry coating device for photovoltaic industry, including the slurry coating device body and coating assembly for photovoltaic industry;The slurry coating device body includes mobile module and silicon wafer carrier;The silicon wafer carrier is slidably arranged on mobile module by coating assembly;The coating assembly includes pressurizing motor, circulating pump, pressurizing cavity, pressurizing plunger, filling port, exhaust recovery port, feed pipe and back material pipe;The pressurizing motor is slidably arranged on mobile module by sliding plate;The circulating pump is fixed on pressurizing motor by bolt;The pressurizing cavity is fixed on pressurizing motor, and the pressurizing cavity and baffle constitute coating port;Several pressurizing plungers are connected by connecting plate and arranged in linear array on pressurizing cavity;The filling port is connected with circulating pump by filling valve;The exhaust recovery port is connected with circulating pump by exhaust valve;The two ends of pressurizing cavity and the two ends of circulating pump are connected by feed pipe and back material pipe respectively.

[0007] Preferably, further comprising adjustment assembly;The adjustment assembly is arranged on pressurizing cavity.

[0008] Preferably, the adjustment assembly includes adjustment groove, adjustment block and adjustment bolt;Adjustment groove is formed in the pressurizing cavity;The adjustment block is arranged in adjustment groove;The adjustment bolt is arranged on pressurizing cavity and is rotatably connected with adjustment block by pivot.

[0009] Preferably, the adjustment block and adjustment groove are slidingly matched.

[0010] Preferably, the adjustment bolt is threadedly connected with pressurizing cavity.

[0011] Preferably, the adjustment assembly further includes sealing groove and sealing block;At least one sealing groove is formed in the adjustment groove;At least one sealing block is fixed on adjustment block.

[0012] Preferably, the sealing block is sawtooth structure, and the shape of the sealing block is matched with the shape of the sealing groove.

[0013] Compared with prior art, the utility model has the beneficial effects that:

[0014] 1. The utility model discloses a coating assembly is set up through, through the laser groove on the silicon wafer carrier, laser groove can realize less than 20mu m line width, break the limitation of traditional screen printing line width, can save the amount of use of pulp, reduce the cost, there is no traditional silk screen printing block net leakage and the problem such as printing collapse after forming trapezoidal electrode, the feed pipe, circulating pump, pressurizing cavity, return pipe are designed into closed loop, when the circulating pump is operating, the pulp is closed circulation between the circulating pump, feed pipe, pressurizing cavity, return pipe, through the circulation, the air wrapped in the pulp can be effectively removed, and the pulp viscosity of each point in the closed cavity is kept, the servo motor is used to push the pressurizing plunger and advance in the mode of setting speed, the pulp in the pressurizing cavity is pushed out uniformly from the coating port, the pressurizing cavity is the cuboid structure, a plurality of pressurizing plungers are connected in parallel, and all pressurizing plungers are driven by the same motor to advance simultaneously, so that each point of the pressurizing cavity is uniformly stressed during coating, and the effect that the pulp is uniformly discharged from each coating port is accurately controlled.

[0015] 2. The utility model discloses an adjusting assembly is set up, through the rotation adjusting bolt, make adjusting bolt and pressurizing cavity screw connection, make the adjusting block slide in the adjusting groove, make the sealing block slide in the sealing groove, the distance between adjusting block and baffle gradually increases or reduces, to play the role of adjusting the size of coating port, the sealing block is set as sawtooth structure, to facilitate the extension of the contact area between sealing block and sealing groove, improve the sealing property between sealing block and sealing groove. ACCOUT OF DRAWINGS

[0016] Figure 1 It is the whole structure schematic diagram of the utility model;

[0017] Figure 2 It is the coating assembly schematic diagram of the utility model;

[0018] Figure 3 It is the coating assembly sectional view of the utility model;

[0019] Figure 4 It is the partial structure sectional view of the utility model;

[0020] Figure 5 It is the partial structure split schematic diagram of the utility model.

[0021] In the drawing:

[0022] 1, pulp coating device body;2, coating assembly;3, adjusting assembly;

[0023] 101, mobile module;102, silicon wafer carrier;

[0024] 201, pressurizing motor;202, circulating pump;203, pressurizing cavity;204, pressurizing plunger;205, filling port;206, air exhaust recovery port;207, feed pipe;208, return pipe;

[0025] 301, adjustment groove; 302, adjustment block; 303, adjustment bolt; 304, sealing groove; 305, sealing block. DETAILED DESCRIPTION

[0026] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0027] Please refer to Figures 1 to 5 The present application provides a technical solution: a slurry coating device for the photovoltaic industry, comprising a slurry coating device body 1 for the photovoltaic industry and a coating assembly 2; the slurry coating device body 1 comprises a moving module 101 and a silicon wafer carrier 102; the silicon wafer carrier 102 is slidably arranged on the moving module 101 through the coating assembly 2; the coating assembly 2 comprises a pressurizing motor 201, a circulating pump 202, a pressurizing cavity 203, a pressurizing plunger 204, a filling port 205, an exhaust recovery port 206, a feed pipe 207 and a return pipe 208; the pressurizing motor 201 is slidably arranged on the moving module 101 through a sliding plate, and the pressurizing motor 201 is a servo motor; the circulating pump 202 is fixedly arranged on the pressurizing motor 201 through bolts; the pressurizing cavity 203 is fixedly arranged on the pressurizing motor 201, and the pressurizing cavity 203 and a baffle plate constitute a coating port; a plurality of pressurizing plungers 204 are connected through a connecting plate and arranged in a linear array on the pressurizing cavity 203; the filling port 205 is connected with the circulating pump 202 through a filling valve; the exhaust recovery port 206 is connected with the circulating pump 202 through an exhaust valve, and a partition valve is connected between the filling valve and the exhaust valve; the two ends of the pressurizing cavity 203 and the two ends of the circulating pump 202 are respectively connected through the feed pipe 207 and the return pipe 208.

[0028] The utility model discloses a coating assembly 2 is set up, and through the laser groove on the silicon piece carrier 102, the laser groove can realize less than 20mu m line width, breaks the limitation of traditional screen printing line width, can save the amount of use of slurry, reduces the cost, does not have the problem such as traditional silk screen printing blockage and printing after the collapse of the trapezoidal electrode, and the feeding pipe 207, circulating pump 202, pressurizing cavity 203, return pipe 208 are designed into closed loop, and when circulating pump 202 is running, slurry is closed circulation between circulating pump 202, feeding pipe 207, pressurizing cavity 203, return pipe 208, and through the circulation, the air wrapped in the slurry can be effectively removed, and the slurry viscosity of each point in the closed cavity is maintained, the pressurizing plunger 204 is pressed by servo motor to advance in the set speed mode, and the slurry in the pressurizing cavity 203 is pushed out uniformly from the coating port, the pressurizing cavity 203 is the cuboid structure, a plurality of pressurizing plungers 204 are connected in parallel, and all pressurizing plungers 204 are driven by the same motor to advance simultaneously, so that the pressurizing cavity 203 is uniformly stressed at each point during coating, and the effect that the slurry is uniformly discharged from each coating port is accurately controlled.

[0029] As a preferred embodiment, it further includes an adjusting assembly 3; the adjusting assembly 3 is arranged on the pressurizing cavity 203; the adjusting assembly 3 includes an adjusting groove 301, an adjusting block 302, an adjusting bolt 303, a sealing groove 304 and a sealing block 305; the adjusting groove 301 is arranged in the pressurizing cavity 203; the adjusting block 302 is arranged in the adjusting groove 301; the adjusting block 302 is in sliding fit with the adjusting groove 301; the adjusting bolt 303 is arranged on the pressurizing cavity 203 and is rotationally connected with the adjusting block 302 through a rotating shaft; the adjusting bolt 303 is in threaded connection with the pressurizing cavity 203; two sealing grooves 304 are symmetrically arranged on the inner wall of the adjusting groove 301; two sealing blocks 305 are symmetrically arranged on the two sides of the adjusting block 302; the sealing block 305 is in a sawtooth structure, and the shape of the sealing block 305 is matched with the shape of the sealing groove 304.

[0030] By rotating the adjusting bolt 303, the adjusting bolt 303 is in threaded connection with the pressurizing cavity 203, the adjusting block 302 slides in the adjusting groove 301, the sealing block 305 slides in the sealing groove 304, and the distance between the adjusting block 302 and the baffle gradually increases or decreases, so that the size of the coating port is adjusted.

[0031] Working principle: the silicon wafer carrier 102 is fixed, the coating assembly 2 is used for precisely controlling uniform slurry of each coating port, the moving module 101 is used for driving the coating assembly 2 to move, the filling port 205 is used for manually adding slurry into the cavity of the circulating pump 202, the circulating pump 202 is used for delivering slurry to the pressurized cavity 203, and the viscosity of slurry at each position is adjusted by pump circulation to remove the gas wrapped in the slurry, the pressurized cavity 203 is a cuboid structure and is used for storing coating slurry, the pressurized cavity 203 is provided with coating micro-holes at the top according to the requirements of the silicon wafer process, the slurry is uniformly removed from the micro-holes under the pushing action of the slurry pressurizing plunger 204, a plurality of slurry pressurizing plungers 204 are connected in parallel and are driven by the same motor, all the slurry pressurizing plungers 204 advance at the same time, the pressurized cavity 203 is uniformly stressed during coating, the uniform slurry of each coating port can be precisely controlled, the slurry is manually added into the cavity of the circulating pump 202 through the filling port 205, and the circulating pump 202 is started to deliver the slurry to the feeding pipe 207, the pressurized cavity 203, the return pipe 208 and the exhaust recovery port 206, when the slurry flows out of the exhaust recovery port 206, the exhaust valve is manually closed, the partition valve and the filling valve are manually opened, the exhaust valve is closed, and the circulating pump 202 is continuously operated, so that the slurry is closed in the circulating pump 202, the feeding pipe 207, the pressurized cavity 203 and the return pipe 208, the air wrapped in the slurry is removed by circulation, and the viscosity of the slurry at each point in the closed cavity is adjusted, the silicon wafer carrier 102 is fixed, the filling valve and the exhaust valve are manually closed, the pressurizing motor 201 is started and drives the slurry pressurizing plunger 204 to advance at a set speed, the slurry in the pressurized cavity 203 is uniformly pushed out from the coating port, and the moving module 101 drives the coating assembly 2 to move at the same time, so that the slurry pushed out from the coating port is uniformly coated on the silicon wafer carrier 102.

[0032] When the size of the coating port is adjusted, the adjusting screw 303 is rotated to be screwed with the pressurized cavity 203, the adjusting block 302 slides in the adjusting groove 301, the sealing block 305 slides in the sealing groove 304, and the distance between the adjusting block 302 and the baffle gradually increases or decreases, so as to adjust the size of the coating port.

[0033] The above is the working process of the whole device, and the contents not described in detail in the specification all belong to the prior art known to those skilled in the art.

[0034] Although the embodiments of the present application have been shown and described, it can be understood by those skilled in the art that various changes, modifications, replacements and deformations can be made to the embodiments without departing from the principles and concepts of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the present application is defined by the appended claims and their equivalents.

Claims

1. A paste coating device for the photovoltaic industry, characterized in that, The application relates to a slurry coating device body (1) and a coating assembly (2) for a photovoltaic industry; the slurry coating device body (1) comprises a moving module (101) and a silicon wafer carrier (102); the silicon wafer carrier (102) is slidably arranged on the moving module (101) through the coating assembly (2); the coating assembly (2) comprises a pressurizing motor (201), a circulating pump (202), a pressurizing cavity (203), a pressurizing plunger (204), a filling port (205), an exhaust gas recovery port (206), a feeding pipe (207) and a return pipe (208); the pressurizing motor (201) is slidably arranged on the moving module (101) through a sliding plate; the circulating pump (202) is fixedly arranged on the pressurizing motor (201) through bolts; the pressurizing cavity (203) is fixedly arranged on the pressurizing motor (201), and the pressurizing cavity (203) and a baffle plate constitute a coating port; a plurality of the pressurizing plungers (204) are connected through connecting plates and linearly arranged on the pressurizing cavity (203); the filling port (205) is connected with the circulating pump (202) through a filling valve; the exhaust gas recovery port (206) is connected with the circulating pump (202) through an exhaust valve; the two ends of the pressurizing cavity (203) and the two ends of the circulating pump (202) are connected through the feeding pipe (207) and the return pipe (208) respectively.

2. A paste coating device for the photovoltaic industry according to claim 1, characterized in that, The application further comprises an adjusting assembly (3); the adjusting assembly (3) is arranged on the pressurizing cavity (203).

3. A paste coating device for the photovoltaic industry according to claim 2, characterized in that, The adjusting assembly (3) comprises an adjusting groove (301), an adjusting block (302) and an adjusting bolt (303); the adjusting groove (301) is arranged in the pressurizing cavity (203); the adjusting block (302) is arranged in the adjusting groove (301); the adjusting bolt (303) is arranged on the pressurizing cavity (203) and rotationally connected with the adjusting block (302) through a rotating shaft.

4. A paste coating device for the photovoltaic industry according to claim 3, characterized in that, The adjusting block (302) is slidably matched with the adjusting groove (301).

5. A paste coating device for photovoltaic industry as claimed in claim 3 wherein, The adjusting bolt (303) is threadedly connected with the pressurizing cavity (203).

6. A paste coating device for the photovoltaic industry as claimed in claim 4, wherein, The adjusting assembly (3) further comprises a sealing groove (304) and a sealing block (305); at least one sealing groove (304) is arranged in the adjusting groove (301); at least one sealing block (305) is fixedly arranged on the adjusting block (302).

7. A paste coating device for the photovoltaic industry according to claim 6, characterized in that, The sealing block (305) is in a sawtooth structure, and the shape of the sealing block (305) is matched with the shape of the sealing groove (304).

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