Coating device

Abstract

The utility model relates to a coating device. The coating device comprises a base platform which comprises a first surface, the first surface is used for placing a crystalline silicon cell, and a plurality of first vent holes are formed in the first surface of the base platform; the coating mechanism can move along the base station and is used for coating the perovskite solution on the surface of the crystalline silicon cell; the vacuum assembly comprises a cover body, and the cover body is used for covering the crystalline silicon battery to enable the crystalline silicon battery to be located in the cover body; and an air exhaust end of the air exhaust mechanism is connected with the first vent hole, and air exhaust can be performed on the interior of the cover body through the first vent hole when the cover body covers the crystalline silicon cell. Through the synergistic effect of the base station, the coating mechanism and the vacuum assembly, the laminated cell can be integrally prepared, the process complexity and the equipment cost are reduced, and the production efficiency is improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to photovoltaic cell technical field especially relates to coating device. BACKGROUND

[0002] The perovskite solar cell is a kind of combination of crystal silicon battery and perovskite battery laminated structure, and the crystal silicon battery layer is usually located at the bottom, and the perovskite battery layer is located at the upper layer.

[0003] In the conventional technology, the preparation of the perovskite solar cell is generally carried out on the crystal silicon battery, and the perovskite thin film deposition is carried out on the crystal silicon battery, and the processing capacity is only one piece each time, and it needs to be transferred to different base steps to carry out crystallization and pre-solidification process, which leads to slow production efficiency. UTILITY MODEL CONTENT

[0004] Therefore, it is necessary to provide a coating device to solve the problem of slow production efficiency of the traditional laminated battery.

[0005] A kind of coating device, comprising:

[0006] Base station, including first surface, the first surface is used to place crystal silicon battery, the base station is opened in the first surface with multiple first air holes;

[0007] Coating mechanism can be moved along the base station, for coating perovskite solution on the surface of the crystal silicon battery;And

[0008] Vacuum assembly, including cover body, the cover body is used to cover on the crystal silicon battery, so that the crystal silicon battery is in the cover body;And

[0009] Exhaust mechanism, the exhaust end of the exhaust mechanism is connected with the first air hole, can carry out exhaust to the inside of the cover body through the first air hole when the cover body is covered on the crystal silicon battery.

[0010] Optionally, the coating device further comprises: a mask plate, the mask plate is provided with more than one accommodating space, the accommodating space is used to accommodate the crystal silicon battery, the accommodating space is consistent with the shape of the crystal silicon battery, and the height of the mask plate is consistent with the crystal silicon battery.

[0011] Optionally, the coating device further comprises a supporting table, and the base station and the coating mechanism are arranged on the supporting table;The coating mechanism comprises a first moving assembly and a coating part, and the first moving assembly is used to drive the coating part to move in a second direction and / or a third direction.

[0012] Optionally, the coating device further comprises an air extraction mechanism, the base table is provided with a plurality of second air holes on the first surface, the second air holes are connected to the air extraction end of the air extraction mechanism, so that the crystalline silicon cell can be adsorbed on the base table when the crystalline silicon cell is located on the second air hole.

[0013] Optionally, the coating device further comprises a lifting mechanism, the lifting mechanism comprises a lifting piece, and the lifting piece is arranged in the base table; the lifting piece comprises an extended state and a retracted state, the end of the lifting piece extends out of the first surface when the lifting piece is in the extended state, and the end of the lifting piece is located in the base table when the lifting piece is in the retracted state.

[0014] Optionally, the coating device further comprises a chamber cover, the chamber cover covers the bottom of the base table and covers the second air hole in the chamber, the chamber cover is provided with an air pipe, and the second air hole is connected to the air extraction mechanism through the air pipe.

[0015] Optionally, the vacuum assembly further comprises a second moving assembly, and the second moving assembly is used to control the cover to move in the direction close to or away from the base table.

[0016] The vacuum assembly further comprises a gas supply assembly, the gas supply assembly comprises a spraying piece arranged in the inside of the cover, and the gas supply assembly is used to input gas into the inside of the cover through the spraying piece.

[0017] Optionally, the coating device further comprises an infrared heating mechanism for infrared heating of the crystalline silicon cell, the infrared heating mechanism comprises an infrared light source and a third moving assembly, and the third moving assembly is used to control the infrared light source to move. Optionally, the third moving assembly is used to control the infrared light source to move in the first direction and / or the third direction.

[0018] The coating device comprises a base table, a coating mechanism, a vacuum assembly and an air extraction mechanism, and the crystalline silicon cell is placed on the base table. The coating mechanism is used to coat the crystalline silicon cell with perovskite solution after the crystalline silicon cell is placed on the base table. The cover is arranged on the crystalline silicon cell after the coating is completed, so that the crystalline silicon cell is located in the inside of the cover. The air extraction mechanism is used to extract air from the inside of the cover through the first air hole, so that the solvent of the perovskite solution is extracted, a crystallized perovskite film is formed, and a laminated battery with the crystalline silicon cell as the bottom and the perovskite film as the top is obtained. Through the synergistic effect of the base table, the coating mechanism, the vacuum assembly and the air extraction mechanism, the laminated battery can be integrally prepared, the process complexity and the equipment cost are reduced, the production efficiency is improved, the transfer frequency in the preparation process of the perovskite layer is reduced, and the consistency and stability in batch production are improved. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1Fig. 1 is a perspective view of a coating device according to an embodiment of the present application;

[0020] Figure 2 Fig. 2 is a schematic view of a mask plate according to an embodiment of the present application;

[0021] Figure 3 Fig. 3 is a front view of a coating device according to an embodiment of the present application;

[0022] Figure 4 Fig. 4 is an enlarged view of a chamber cover portion according to an embodiment of the present application;

[0023] Figure 5 Fig. 5 is a schematic view of a cover body covering a crystalline silicon cell according to an embodiment of the present application;

[0024] Figure 6 Fig. 6 is a schematic view of an infrared heating mechanism heating a crystalline silicon cell according to an embodiment of the present application.

[0025] BRIEF DESCRIPTION OF DRAWINGS

[0026] 11, base; 111, second air vent; 12, coating mechanism; 121, first moving unit; 122, second moving unit; 123, coating member; 13, vacuum assembly; 131, cover body; 132, second moving assembly; 133, spraying member; 14, infrared heating mechanism; 141, infrared light source; 142, third moving assembly; 15, chamber cover; 16, supporting table; 17, mask plate; 18, lifting mechanism; 181, lifting member; 182, lifting driving member; 20, crystalline silicon cell; X, first direction; Y, second direction; Z, third direction. DETAILED DESCRIPTION

[0027] In order to make the above objectives, features and advantages of the present application more apparent, specific embodiments of the present application will be described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, it will be apparent to one skilled in the art that the present application can be practiced without some or all of these specific details. In other instances, well known process steps have not been described in detail in order not to unnecessarily obscure the present application. Accordingly, the present application is not limited to the embodiments disclosed below, but rather, the intent is to cover all modifications, alternatives, and equivalents falling within the scope of the application.

[0028] In the description of the utility model, it is understood that the orientation or positional relationship indicated by the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like is the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, which is only for the convenience of describing the utility model and simplifying the description, and does not indicate or imply that the device or element indicated must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the utility model.

[0029] In addition, the terms "first" and "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined with "first" and "second" can explicitly or implicitly include at least one of the features. In the description of the utility model, the meaning of "multiple" is at least two, such as two, three, etc., unless otherwise specifically limited.

[0030] In the utility model, unless otherwise specifically defined and limited, the terms "mounting", "connection", "connection", "fixing" and the like should be understood in a broad sense, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship of two elements, unless otherwise specifically limited. For ordinary skilled in the art, the specific meaning of the above terms in the utility model can be understood according to the specific circumstances.

[0031] In the utility model, unless otherwise specifically defined and limited, the first feature "on" or "under" the second feature can be direct contact between the first and second features, or indirect contact between the first and second features through an intermediate medium. Moreover, the first feature "above", "above" and "above" the second feature can be directly above or obliquely above the first feature, or only indicate that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature can be directly below or obliquely below the first feature, or only indicate that the horizontal height of the first feature is less than that of the second feature.

[0032] It is to be understood that when an element such as a layer, region or substrate is referred to as being "on" or "connected to" another element, it can be directly on or connected to the other element or intervening elements can be present. In contrast, when an element is referred to as being "directly on" or "directly connected to" another element, there are no intervening elements present. It will be understood that, when a term is used in this specification and / or claims - such as "including", "containing", "comprising", "having" and / or the like - there are no limitations thereof and such terms are intended to permit the presence of other elements.

[0033] The top layer of the perovskite crystalline silicon solar cell is a perovskite cell with a wider optical band gap, which mainly utilizes high-energy short-wavelength and medium-energy medium-wavelength photons in the solar spectrum. The bottom layer is a crystalline silicon cell with a narrower band gap, which mainly utilizes medium-low energy medium-wavelength and long-wavelength photons in the solar spectrum. In this way, the photons in the short, medium and long wavelength ranges of the solar spectrum can be more fully and efficiently utilized, making the cell generate more power.

[0034] Referring to Figure 1 and Figure 3 , Figure 1 The structure of the coating device in an embodiment of the utility model is shown, Figure 3 The coating device in some embodiments is shown in a front view. The coating device provided by an embodiment of the utility model includes a base 11, a coating mechanism 12, a vacuum assembly 13 and an air extraction structure (not shown in the figure). The base 11 is used to place a crystalline silicon cell 20, the coating mechanism 12 is used to coat a perovskite solution on the crystalline silicon cell 20, and the vacuum assembly 13 includes a cover body 131 used to cover the crystalline silicon cell 20. When the cover body is placed on the crystalline silicon cell 20, the air extraction mechanism extracts air from the inside of the cover body 131, so that the solvent in the perovskite solution volatilizes and is extracted by the air extraction mechanism, and a vacuum environment is formed in the inside of the cover body 131. When the perovskite solution is crystallized into a perovskite film, a solar laminated cell with a silicon wafer as the bottom and a perovskite film as the top is obtained.

[0035] Specifically, the base 11 includes at least a first surface used to place the crystalline silicon cell 20. The first surface can be the top of the base 11, so that the crystalline silicon cell 20 can be placed directly on the top surface of the base 11. Optionally, the base 11 is a marble base 11. Optionally, the base 11 can be a cuboid structure and can further include a second surface opposite to the first surface. In some embodiments, the coating device further includes an air extraction mechanism (not shown in the figure), and the base 11 is provided with a plurality of second air holes 111 on the first surface, and the second air holes 111 are connected to the air extraction end of the air extraction mechanism. Exemplarily, the air extraction mechanism can be a vacuum pump or the like.

[0036] The coating mechanism 12 can move along the base 11 to coat the perovskite solution on the surface of the crystalline silicon cell 20. The coating mechanism 12 can coat the perovskite solution on the surface of the crystalline silicon cell 20 during the movement along the base 11.

[0037] The vacuum assembly 13 includes a cover 131 for covering the crystalline silicon cell 20 so that the crystalline silicon cell 20 is in the cover 131. The suction end of the suction mechanism is connected to the first air hole, and the suction mechanism can suck the inside of the cover 131 through the first air hole when the cover is covered on the crystalline silicon cell.

[0038] After the crystalline silicon cell 20 is coated with the perovskite solution, the cover 131 is covered on the crystalline silicon cell 20, and the inside of the cover 131 is sucked by the suction mechanism, so that the solvent in the perovskite solution is volatilized and preliminarily crystallized, and a uniform perovskite thin film is obtained by drying.

[0039] The coating device described above simultaneously includes the base 11, the coating mechanism 12, the vacuum assembly 13 and the suction mechanism. After the crystalline silicon cell 20 is placed on the base 11, the coating mechanism 12 can be used to coat the crystalline silicon cell 20 with the perovskite solution. After the coating is completed, the cover 131 is covered on the crystalline silicon cell 20 so that the crystalline silicon cell 20 is in the cover 131. Then the suction mechanism sucks the inside of the cover 131 through the first air hole, the solvent in the perovskite solution is removed, and a dry perovskite thin film is obtained. In turn, a stacked cell with crystalline silicon as the bottom and perovskite thin film as the top is obtained. Through the synergistic effect of the base 11, the coating mechanism 12, the vacuum assembly 13 and the suction mechanism, the stacked cell can be prepared integrally, the process complexity and equipment cost are reduced, the production efficiency is improved, and the number of transfers in the preparation process of the perovskite layer is reduced, which helps to improve the consistency and stability in batch production.

[0040] As shown in FIG. 1, Figure 5 As shown in FIG. 1, Figure 5 FIG. 1 shows a schematic diagram of the cover 131 covering the crystalline silicon cell 20 in some embodiments. The cover 131 can be covered on the base 11 and can accommodate the crystalline silicon cell 20 coated with the perovskite solution. When the cover 131 is covered on the base 11, a cavity is formed between the cover 131 and the base 11, and the crystalline silicon cell 20 is located in the cavity of the cover 131. The base 11 also has a first air hole, and the first air hole can form a vacuum environment in the cover 131 by the suction mechanism.

[0041] In this embodiment, the inside of the cavity of the cover 131 is sucked by the suction mechanism, so that the gas in the vacuum cavity is sucked out through the first air hole, and the vacuum cavity forms a vacuum environment to realize the volatilization and preliminary crystallization of the solvent in the perovskite layer.

[0042] In some embodiments, the perovskite solution can be any perovskite layer material suitable for perovskite solar cells, such as FAPbI3, MAPbI3, FACsPbI3, and the like. The chemical formula of the material can be ABX3, or other perovskite layer materials, or mixed cation perovskite materials, mixed anion perovskite materials, which are not limited in the present application. The material of the perovskite layer can be selected from, for example, FACsPbIBrCl, FAMACsPbIBrCl, FACsDMAPbIBrCl, CsDMAPbIBrCl, FACsPbIBr, FAMACsPbSnIbIBr, FACsDMAPbIBr, and CsDMAPbIBr.

[0043] In an embodiment, the base 11 is provided with a plurality of second air holes 111 penetrating the base 11. The second air holes 111 can penetrate the first surface and the second surface of the base 11 along the third direction Z. The second air holes 111 on the first surface of the base 11 are used to adsorb the crystalline silicon cell 20, and the second air holes 111 on the second surface of the base 11 are connected to the suction end of the suction mechanism. The diameter of the second air holes 111 is smaller than the bottom area of the crystalline silicon cell 20.

[0044] When the crystalline silicon cell 20 is located on the first surface of the base 11, the suction of the suction mechanism can form a negative pressure to adsorb the crystalline silicon cell 20, so that the crystalline silicon cell 20 is adsorbed on the first surface of the base 11. By providing the second air holes 111, the crystalline silicon cell 20 is adsorbed on the base 11, preventing displacement of the crystalline silicon cell 20 during subsequent operations, and improving the stability and reliability of the silicon wafer placement. Further, the flatness of the base 11 is less than 5 μm, which helps to improve the uniformity of coating.

[0045] Referring to Figure 2 , Figure 2 A structure diagram of the mask plate 17 in an embodiment is shown. In some embodiments, the coating device further comprises a mask plate 17, and the mask plate 17 is provided with one or more accommodation spaces for accommodating the crystalline silicon cell 20. The mask plate 17 is embedded and installed around the crystalline silicon cell 20, which can accurately control the coating range and prevent the perovskite solution from overflowing to the unnecessary area, thereby improving the coating efficiency and the product quality of the final solar cell, and helping to produce the perovskite layer with high throughput.

[0046] The accommodating space of the mask plate 17 is consistent with the shape of the crystalline silicon cell 20, but the size of the accommodating space is larger than the crystalline silicon cell 20, so that the edge of the crystalline silicon cell 20 has a preset distance from the mask plate 17. In some possible embodiments, the gap between the edge of the crystalline silicon cell 20 and the mask plate 17 is 10 μm-100 μm. Alternatively, the mask plate 17 is located on the second air hole 111, so that the mask plate 17 is adsorbed on the base 11 at the same time as the crystalline silicon cell 20, to ensure the stability and reliability of the placement of the mask plate 17.

[0047] The height of the mask plate 17 is consistent with the crystalline silicon cell 20. The height of the mask plate 17 can be equal to the height of the crystalline silicon cell 20, or the height of the mask plate 17 can be within a preset range of the height of the crystalline silicon cell 20. Alternatively, the thickness deviation of the mask plate 17 and the crystalline silicon cell 20 is less than ±10 μm, which helps to maintain uniform coating thickness during the coating process, avoids non-uniformity caused by thickness deviation, and improves the uniformity and consistency of the perovskite layer.

[0048] Continuing to refer to Figure 1 In some embodiments, the coating device further comprises a bearing table 16, and the base 11 and the coating mechanism 12 are arranged on the bearing table 16. The coating mechanism 12 comprises a first moving assembly and a coating piece 123, and the first moving assembly is used to drive the coating piece 123 to move in the second direction Y and / or the third direction Z.

[0049] For example, as Figure 1 shown, the first direction X and the second direction Y can be horizontal directions, that is, directions parallel to the first surface of the base 11, and the third direction Z can be a vertical direction, that is, a direction perpendicular to the first surface of the base 11. Among them, the first direction X, the second direction Y and the third direction Z are perpendicular to each other.

[0050] As Figure 1 shown, in some possible embodiments, the first moving assembly comprises a first moving unit 121 and a second moving unit 122, and the first moving unit 121 and the second moving unit 122 are respectively located on both sides of the base 11 and can move along the first direction X. The coating piece 123 is arranged between the first moving unit 121 and the second moving unit 122, and the first moving unit 121 and the second moving unit 122 are used to drive the coating piece 123 to move. Alternatively, the coating piece 123 can be a doctor blade, which uniformly coats the solution on the surface of the crystalline silicon cell 20.

[0051] For example, the bearing table 16 is provided with a first track and a second track extending in the second direction Y on both sides of the base 11, the first moving unit 121 is provided with a pulley at the bottom and can move along the second direction Y on the first track, and the second moving unit 122 is provided with a pulley at the bottom and can move along the second direction Y on the second track.

[0052] In some other embodiments, the carrying table 16 can further be provided with a first sliding groove and a second sliding groove extending along the second direction Y on both sides of the base table 11, and the first moving unit 121 and the second moving unit 122 are provided with sliding blocks at the bottom, so that the first moving unit 121 can move on the first sliding groove and the second moving unit 122 can move on the second sliding groove.

[0053] When the first moving unit 121 and the second moving unit 122 move the coating member 123 along the second direction Y, the coating member 123 moves along the first surface of the base table 11, and when the coating member 123 moves along the third direction Z, the distance between the coating member 123 and the first surface of the base table 11 can be adjusted, and thus the thickness of the paste can be adjusted to adjust the thickness of the perovskite layer finally formed.

[0054] For example, before the coating process is performed, an appropriate amount of perovskite solution is uniformly dropped at the center of the pre-fixed crystalline silicon cell 20, and then the solution is uniformly coated on the surface of the crystalline silicon cell 20 by the coating device.

[0055] It should be noted that the present application does not limit the specific coating process of the perovskite layer, and the specific process can refer to the coating process of the perovskite layer in the related art.

[0056] Continuing to refer to Figure 3 , Figure 3 A front view of the coating device in an embodiment is shown. In some embodiments, the coating device further comprises a lifting mechanism 18, the lifting mechanism 18 comprises a lifting member 181, the base table 11 is provided with a lifting hole, and the lifting member 181 is arranged in the lifting hole of the base table 11; the lifting member 181 comprises an extended state and a retracted state, when the lifting member 181 is in the extended state, the end of the lifting member 181 extends out of the first surface, and when the lifting member 181 is in the retracted state, the end of the lifting member 181 is located in the base table 11.

[0057] In some possible implementations, the lifting mechanism 18 can further comprise a lifting driving member 182, the lifting driving member 182 is used to drive the lifting member 181 to move. For example, the lifting driving member 182 can be a motor or a pneumatic cylinder, the output end of which is connected with the lifting member 181 and can drive the lifting member 181 to move along the third direction Z, so as to realize the lifting of the crystalline silicon cell 20.

[0058] In some embodiments, the lifting mechanism 18 can further comprise a connecting member, the connecting member is connected with the plurality of lifting members 181 and connected with the driving end of the lifting driving member 182. In this way, the lifting driving member 182 can realize the synchronous lifting of the plurality of lifting members 181 by lifting the connecting member.

[0059] When the lifting member 181 is wholly inside the base 11, the top of the lifting member 181 is also inside the base 11 and does not protrude out of the base 11, which is the retracted state.

[0060] When the lifting drive 182 drives the drive member to ascend, the top of the drive member ascends in the third direction Z and exceeds the first surface of the base 11, which is the protruding state of the lifting member 181. Since the crystalline silicon cell 20 is on the first surface of the base 11, the lifting member 181 lifts the crystalline silicon cell 20 at this time, so that there is a gap between the crystalline silicon cell 20 and the first surface of the base 11.

[0061] Meanwhile, referring to Figure 3 and Figure 4 , Figure 4 , an enlarged view of the chamber cover 15 is shown. In some embodiments, the coating device further comprises a chamber cover 15, which covers the bottom of the base 11 and covers the second air holes 111 in the chamber. For example, referring to Figure 4 , the carrier table 16 can be provided with a hollow area, and the chamber cover 15 is located in the hollow area and can approach or move away from the base 11 from the hollow area.

[0062] The chamber cover 15 is provided with an air pipe, and the second air hole 111 is connected with the air extraction mechanism through the air pipe. When the chamber cover 15 covers the bottom of the base 11, a closed space is formed at the bottom of the base 11, so that the air extraction mechanism can form a negative pressure in the closed space through the air pipe, and at the same time, the crystalline silicon cell 20 on each second air hole 111 is adsorbed and fixed.

[0063] In some embodiments, the vacuum assembly 13 further comprises a second moving assembly 132, and the cover body 131 is used to cover the crystalline silicon cell 20. The second moving assembly 132 is used to control the cover body 131 to move in the direction of approaching or moving away from the base 11. For example, the second moving assembly 132 is used to control the cover body 131 to move in the first direction X and / or the third direction Z.

[0064] In some embodiments, the vacuum assembly 13 further comprises a gas delivery assembly (not shown in the figure), which comprises a spraying member arranged inside the cover body 131. The gas delivery assembly is used to input gas into the cover body 131 through the spraying member. When a vacuum is formed in the cover body 131 through the first air hole, the gas delivery assembly can input a small amount of gas into the cover body 131 through the spraying member, so as to help remove the supersaturated solvent atmosphere formed in the chamber during the vacuum extraction process, and assist the rapid nucleation and crystallization of the perovskite film. At the same time, by controlling the amount of input gas, the degree of vacuum in the chamber can also be controlled.

[0065] In some possible implementations, the gas input into the inside of the cover 131 can be nitrogen. Since the perovskite solution can generate solvent particles on the surface of the crystalline silicon cell 20 during crystallization, the input gas can clean the surface of the crystalline silicon cell 20, and improve the flatness of the formed perovskite film.

[0066] Referring to Figure 6 , Figure 6 A schematic diagram of infrared heating of the crystalline silicon cell 20 by the infrared heating mechanism 14 in some embodiments is shown. In some embodiments, the coating device further comprises an infrared heating mechanism 14 for infrared heating of the crystalline silicon cell 20, so as to achieve pre-solidification of the perovskite film.

[0067] The infrared heating mechanism 14 comprises an infrared light source 141 and a third moving assembly 142 for controlling the infrared light source 141 to move along a third direction Z, i.e., a direction of moving close to or away from the crystalline silicon cell 20. Exemplarily, the third moving assembly 142 can also control the infrared light source 141 to move along the first direction X and / or the third direction Z.

[0068] In some embodiments, the side edges of the carrying table 16 are provided with guide rails extending along the first direction X, and the second moving assembly 132 and the third moving assembly 142 are both provided with pulleys capable of moving along the first direction X on the guide rails, so as to drive the vacuum assembly 13 and the infrared heating mechanism 14 to move along the first direction X.

[0069] The technical features of the above-described embodiments can be combined in any manner. To make the description concise, all possible combinations of the technical features in the above-described embodiments are not described, however, as long as the combinations of the technical features do not exist contradictions, they should be considered as the scope of the present disclosure.

[0070] The above-described embodiments only express several implementation manners of the present disclosure, and the description is relatively specific and detailed, but it should not be understood as a limitation on the scope of the present disclosure. It should be noted that, for those skilled in the art, without departing from the concept of the present disclosure, a number of modifications and improvements can be made, which all belong to the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be subject to the appended claims.

Claims

1. A coating device characterized by comprising: The coating device comprises: a base table comprising a first surface for placing a crystalline silicon cell, the base table being provided with a plurality of first air holes on the first surface; a coating mechanism capable of moving along the base table for coating a perovskite solution on the surface of the crystalline silicon cell; a vacuum assembly comprising a cover body for covering the crystalline silicon cell so that the crystalline silicon cell is in the cover body; and an air extraction mechanism, an air extraction end of the air extraction mechanism being connected to the first air holes, the air extraction mechanism being capable of extracting air inside the cover body through the first air holes when the cover body covers the crystalline silicon cell.

2. The coating apparatus according to claim 1, characterized in that The coating device further comprises a mask plate provided with one or more accommodation spaces for accommodating the crystalline silicon cell, the accommodation spaces being consistent with the shape of the crystalline silicon cell, and the height of the mask plate being consistent with the crystalline silicon cell.

3. The coating apparatus according to claim 1, wherein The coating device further comprises a bearing table, the base table and the coating mechanism being arranged on the bearing table; the coating mechanism comprises a first moving assembly and a coating member, the first moving assembly being used to drive the coating member to move in a second direction and / or a third direction.

4. The coating apparatus according to claim 1, wherein The base table is provided with a plurality of second air holes on the first surface, the second air holes being connected to the air extraction end of the air extraction mechanism, so that the crystalline silicon cell can be adsorbed on the base table when the crystalline silicon cell is located on the second air holes.

5. The coating apparatus according to claim 4, wherein The coating device further comprises a lifting mechanism, the lifting mechanism comprising a lifting member arranged in the base table; the lifting member comprises an extended state and a retracted state, the end of the lifting member extending out of the first surface when the lifting member is in the extended state, and the end of the lifting member being located in the base table when the lifting member is in the retracted state.

6. The coating apparatus according to claim 5, wherein The coating device further comprises a chamber cover, the chamber cover being arranged at the bottom of the base table and covering the second air holes in a chamber, the chamber cover being provided with an air pipe, and the second air holes being connected to the air extraction mechanism through the air pipe.

7. The coating apparatus according to claim 1, wherein The vacuum assembly further comprises a second moving assembly, the second moving assembly being used to control the cover body to move in a direction close to or away from the base table.

8. The coating apparatus according to claim 7, wherein The vacuum assembly further comprises a gas supply assembly, the gas supply assembly comprising a spraying member arranged inside the cover body, the gas supply assembly being used to input gas into the cover body through the spraying member.

9. The coating apparatus of claim 1, wherein The coating device further comprises an infrared heating mechanism for infrared heating of the crystalline silicon cell, the infrared heating mechanism comprising an infrared light source and a third moving assembly, the third moving assembly being used to control the infrared light source to move.

10. The coating apparatus of claim 9, wherein The third moving assembly is used to control the infrared light source to move in a first direction and / or a third direction.

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