Micro-texture structure, product with micro-texture structure and electronic equipment with micro-texture structure

Abstract

The utility model provides a micro-texture structure, a product with the micro-texture structure and electronic equipment. The micro-texture structure comprises a substrate and at least one bulge, wherein the bulge is arranged on at least part of the surface of the substrate, the bulge is provided with at least one connecting part, and the connecting part is connected with the substrate; an included angle alpha is formed between the connecting part and the base, and the included angle alpha is larger than or equal to 5 degrees and smaller than or equal to 45 degrees; the problem that a product subjected to surface treatment is large in surface roughness can be solved.

Description

Technical Field

[0001] This application relates to the field of surface treatment technology, and in particular to a microtextured structure, an article having a microtextured structure, and an electronic device. Background Technology

[0002] Surface treatment is a process that artificially forms a layer of protrusions on the surface of a substrate material that have different mechanical, physical, and chemical properties from the substrate.

[0003] Surface treatment involves creating a raised layer with one or more special properties on the surface of a substrate using physical or chemical methods. The purpose of surface treatment is to meet the product's requirements for corrosion resistance, abrasion resistance, decoration, or other special functions.

[0004] In related technologies, products that have undergone surface treatment often have a large surface roughness. Utility Model Content

[0005] This application provides microtextured structures, articles with microtextured structures, and electronic devices, which can solve the problem that the surface roughness of surface-treated articles results in poor hand feel.

[0006] The embodiments of this application provide the following technical solutions:

[0007] A first aspect of this application provides a microtexture structure, including:

[0008] Base;

[0009] At least one protrusion is disposed on at least a portion of the surface of the substrate, and the protrusion has at least one connecting portion connected to the substrate;

[0010] The connecting part is set at an angle α with the base, and the angle α satisfies:

[0011] 5°≤α≤45°.

[0012] It is understood that the protrusion is disposed on at least a portion of the surface of the substrate and connected to the substrate to change the shape of at least a portion of the surface of the substrate connected to the protrusion, and to allow the substrate to form a pattern; the provision of the connecting portion can make the transition between the protrusion and the substrate smoother, and the connecting portion and the substrate are disposed at an angle. Compared with physical surface treatment, the microtexture structure provided by this application can reduce the roughness at the connection between the substrate and the protrusion; compared with chemical surface treatment, the microtexture structure provided by this application can increase the reflective surface of the connecting portion, thereby improving the gloss of the microtexture structure.

[0013] In one possible implementation, the base has a mounting surface, and the protrusion has a top wall and an outer peripheral wall;

[0014] One end of the outer peripheral wall is connected to the mounting surface, and the other end of the outer peripheral wall is connected to the top wall;

[0015] Along the height direction of the base, the top wall and the mounting surface are spaced apart.

[0016] Understandably, the mounting surface is used to support the protrusion, and the design of the top wall and outer peripheral wall can increase the surface area of ​​the protrusion to improve the gloss of the microtexture structure. Furthermore, the spacing between the top wall and the mounting surface can give the microtexture structure a better visual appearance.

[0017] In one feasible implementation, it further includes:

[0018] The transition surface has one end connected to the mounting surface and the other end connected to the top wall; the transition surface is connected to the connecting part to form an outer peripheral wall.

[0019] It is understandable that the connection and transition surfaces together form the outer peripheral wall, which can make the connection and transition surfaces on the outer peripheral wall present different gloss levels, so that the micro-texture structure has a better visual appearance.

[0020] In one feasible implementation, multiple connecting parts are provided, and the multiple connecting parts are connected to jointly enclose and form a raised outer peripheral wall.

[0021] It is understandable that multiple connecting parts are connected to form an outer peripheral wall, which allows the reflected light from the connecting parts to interfere, making the appearance of the microtexture structure more three-dimensional and more gorgeous, thus giving the microtexture structure a better visual effect.

[0022] In one feasible implementation, multiple protrusions are provided, and the multiple protrusions are spaced apart.

[0023] It is understandable that the protrusions can make the pattern formed by the micro-texture structure three-dimensional, and can increase the gloss and clarity of the three-dimensional pattern; increasing the number of protrusions can increase the size of the pattern formed by the micro-texture structure, thereby giving the micro-texture structure a better visual appearance.

[0024] In one feasible implementation, the protrusion has a first thickness H along the height direction of the substrate, the first thickness H satisfying:

[0025] 2 micrometers ≤ H ≤ 20 micrometers.

[0026] It is understandable that the first thickness H satisfies: 2 micrometers ≤ L1 ≤ 20 micrometers. This can increase the surface area of ​​the reflective surface of the connection part while reducing the connection roughness between the substrate and the protrusion, thereby improving the visual effect of the micro-texture structure.

[0027] In one feasible implementation, a first gap L1 is formed between the orthographic projection of the end of the connecting part connected to the mounting surface and the orthographic projection of the end of the connecting part connected to the top wall on the mounting surface, wherein the first gap L1 satisfies:

[0028] 15 micrometers ≤ L1 ≤ 40 micrometers.

[0029] Understandably, the surface area of ​​the reflective surface of the connecting part can be increased to allow more reflected light to be reflected from the connecting part, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0030] In one feasible implementation, the top wall has a second length L2, which satisfies:

[0031] 1 micrometer ≤ L2 ≤ 20 micrometers.

[0032] Understandably, increasing the surface area of ​​the reflective surface of the top wall can improve the visual appearance of the pattern formed by the micro-texture structure processing.

[0033] In one feasible implementation, multiple protrusions are provided, and among the multiple protrusions, there is a third distance L3 between two adjacent protrusions, the third distance L3 satisfying:

[0034] 15 micrometers ≤ L3 ≤ 40 micrometers.

[0035] Understandably, setting the third spacing L3 can increase the surface area of ​​the reflective surface between two adjacent protrusions 200, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0036] In one feasible implementation, the ratio range of the third spacing L3, the second length L2, and the first spacing L1 is:

[0037] 1:(0.025-1.3):(0.0375-2.7).

[0038] It is understandable that the ratio of the third spacing L3, the second length L2 and the first spacing L1 is in the range of 1:(0.025-1.3):(0.0375-2.7), which can improve the appearance and visual effect between the connecting part, the top wall and the two adjacent protrusions, as well as their connection points; thereby improving the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0039] In one feasible implementation, the connecting portion has a plurality of first recesses, which are spaced apart along the extending direction of the connecting portion.

[0040] Understandably, the setting of the first pit can increase the reflective area of ​​the connecting part, thereby increasing the reflective area of ​​the micro-texture structure and reducing the roughness of the protrusion, so as to improve the feel of the micro-texture structure; the multiple first pits are set at intervals along the extension direction of the connecting part, so that the light projected on the connecting part is diffusely reflected, thereby improving the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0041] In one feasible implementation, at least a portion of the substrate has a plurality of second recesses, which are spaced apart along the extension direction of the substrate.

[0042] Understandably, the setting of the second pit can increase the reflective area of ​​the substrate, thereby increasing the reflective area of ​​the microtexture structure and reducing the roughness of the substrate to improve the feel of the microtexture structure. The multiple second pits are set at intervals along the extension direction of the substrate, which allows the light projected onto the substrate to be diffusely reflected, thereby improving the appearance and visual effect of the pattern formed by the microtexture structure processing.

[0043] In one feasible implementation, the surface roughness of the protrusion is 0.001 micrometers to 0.4 micrometers.

[0044] Understandably, the surface roughness of the raised area is 0.001 micrometers to 0.4 micrometers. Reducing the surface roughness of the raised area can improve the grip feel of the micro-textured structure and enhance the visual appearance of the pattern formed by the micro-textured structure.

[0045] In one feasible implementation, the surface roughness of the mounting surface of the substrate is 0.1 micrometers to 0.3 micrometers.

[0046] Understandably, the surface roughness of the mounting surface of the substrate is 0.1 micrometers to 0.3 micrometers. This reduces the surface roughness of the mounting surface, making the transition between the protrusion and the mounting surface more natural, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0047] In one feasible implementation, the surface gloss of the raised surface is 360Gu-700Gu.

[0048] Understandably, a raised surface gloss of 360Gu-700Gu makes the raised surface appear brighter and allows light incident on it to produce specular reflection, thus improving its visual appearance. Furthermore, the large difference between the gloss and roughness of the raised surface gives it a strong shimmering effect.

[0049] In one feasible implementation, the surface gloss of the mounting surface of the substrate is 200Gu-350Gu.

[0050] Understandably, the surface gloss of the mounting surface of the substrate is 200Gu-350Gu, which makes the mounting surface brighter and allows light incident on the mounting surface to produce specular reflection, thereby improving the appearance of the mounting surface. Furthermore, the large difference between the gloss and roughness of the mounting surface can make the mounting surface present a strong flashing effect.

[0051] In one feasible implementation, it further includes:

[0052] A coating layer is disposed on at least one of the mounting surface of the substrate and the protrusion.

[0053] It is understandable that the coating layer on the mounting surface is used to reduce the direct contact between the mounting surface and the outside air, thereby reducing the oxidation of the mounting surface; and the coating layer can improve the gloss of the mounting surface and reduce the surface roughness of the mounting surface. The coating layer on the protrusion is used to reduce the direct contact between the protrusion and the outside air, thereby reducing the oxidation of the protrusion; and the coating layer can improve the gloss of the protrusion and reduce the surface roughness of the protrusion.

[0054] In one feasible implementation, when the coating layer is provided on a raised surface...

[0055] The surface roughness of the coating layer is 0.001 micrometers to 0.2 micrometers;

[0056] And / or, the surface gloss of the coating layer is 360Gu-850Gu.

[0057] Understandably, when the coating layer is applied to a raised surface, a surface roughness of 0.001-0.2 micrometers reduces the surface roughness of the raised surface, thereby improving the grip feel of the microtextured structure and enhancing the visual appeal of the patterns formed by the microtextured structure. When the coating layer is applied to a raised surface, a surface gloss of 360-850 Gu makes the raised surface appear brighter and allows light incident on it to produce specular reflection, further enhancing its visual appeal. Furthermore, the significant difference between the gloss and roughness of the raised surface creates a strong, shimmering visual effect.

[0058] In one feasible implementation, when the coating layer is disposed on the mounting surface...

[0059] The surface roughness of the coating layer is 0.01 micrometers to 0.2 micrometers;

[0060] And / or, the surface gloss of the coating layer is 300Gu-700Gu.

[0061] Understandably, when the coating layer is applied to the mounting surface, a surface roughness of 0.01-0.2 micrometers reduces the surface roughness of the mounting surface, thereby improving the grip feel of the micro-textured structure and enhancing the visual appeal of the patterns formed by the micro-textured structure. When the coating layer is applied to the mounting surface, a surface gloss of 300-700 Gu makes the mounting surface appear brighter and allows light incident on it to undergo specular reflection, further improving its visual appearance. Furthermore, the significant difference between the gloss and roughness of the mounting surface results in a strong, shimmering visual effect.

[0062] A second aspect of this application provides an article with a microtexture structure, including an article body and a microtexture structure, wherein the microtexture structure is disposed on the article body.

[0063] A third aspect of this application provides an electronic device including a microtexture structure.

[0064] In addition to the technical problems solved by the embodiments of this application, the technical features constituting the technical solutions, and the beneficial effects brought about by the technical features of these technical solutions described above, other technical problems that can be solved by the microtexture structure, the article with the microtexture structure, and the electronic device provided by the embodiments of this application, other technical features included in the technical solutions, and the beneficial effects brought about by these technical features will be further explained in detail in the specific embodiments. Attached Figure Description

[0065] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0066] Figure 1 One of the schematic diagrams of the connection structure between the base and the protrusion provided for an embodiment of this application;

[0067] Figure 2 A second schematic diagram of the connection structure between the base and the protrusion provided for an embodiment of this application;

[0068] Figure 3 A schematic diagram of the connection structure between the first and second surfaces provided for an embodiment of this application;

[0069] Figure 4 The second schematic diagram shows the connection structure of the first and second sides provided for embodiments of this application.

[0070] Explanation of reference numerals in the attached figures:

[0071] 100 - Base; 101 - Mounting surface;

[0072] 200 - Protrusion; 201 - Connecting part; 202 - Top wall; 203 - Outer peripheral wall;

[0073] α - included angle;

[0074] H - First thickness;

[0075] L1 - First spacing;

[0076] L2 - Second length;

[0077] L3 - Third spacing. Detailed Implementation

[0078] Surface treatment is a process that artificially forms a layer of protrusions on the surface of a substrate material that have different mechanical, physical, and chemical properties from the substrate.

[0079] In related technologies, in order to give the surface to be treated a better visual appearance, surface treatment can be carried out by physical or chemical methods.

[0080] The physical method mainly involves using CNC machine tools to grind the surface to be processed. However, due to the limitations of the machining accuracy of CNC machining tools, the surface to be processed has a large surface roughness.

[0081] The chemical method involves treating the surface to be treated through the following steps.

[0082] Step 1: Uniformly spray photoresist onto the surface to be treated; Step 2: Place a mask on the photoresist and expose the photoresist layer; Step 3: Develop; Step 4: Bake; Step 5: Etch; Step 6: Remove the photoresist. This method creates a planar pattern in the etched area, which can lead to insufficient gloss and texture clarity on the finished surface.

[0083] It is understandable that in related technologies, products that have undergone surface treatment have the problem of large surface roughness.

[0084] The microtextured structure provided in the embodiments of this application has protrusions disposed on at least a portion of the surface of the substrate and connected to the substrate to change the shape of at least a portion of the surface of the substrate connected to the protrusions, and to enable the substrate to form a pattern; the provision of the connecting portion can make the transition between the protrusions and the substrate smoother, and the connecting portion and the substrate are disposed at an angle. Compared with physical surface treatment, the microtextured structure provided in this application can reduce the roughness at the connection between the substrate and the protrusions; compared with chemical surface treatment, the microtextured structure provided in this application can increase the reflective surface of the connecting portion, thereby improving the gloss of the microtextured structure.

[0085] like Figure 1 and Figure 2 As shown, the microtexture structure provided in the embodiments of this application includes: a substrate 100 and at least one protrusion 200; wherein, the protrusion 200 is disposed on at least a portion of the surface of the substrate 100, and the protrusion 200 has at least one connecting portion 201, which is connected to the substrate 100.

[0086] It should be noted that there are several different ways to set up the base 100 and the protrusion 200. The following are examples of the ways to set up the base 100 and the protrusion 200.

[0087] In one feasible implementation, the surface of the substrate 100 has a protrusion 200, that is, the substrate 100 and the protrusion 200 are integrally formed, and a portion of the surface of the substrate 100 forms the protrusion 200; the protrusion 200 can increase the reflective area of ​​the microtexture structure to improve the gloss of the microtexture structure.

[0088] In another feasible embodiment, the surface of the substrate 100 is coated with a protrusion 200, that is, the substrate 100 and the protrusion 200 are separately arranged, and the substrate 100 is connected to the protrusion 200; the arrangement of the protrusion 200 can improve the gloss of the microtexture structure.

[0089] It is understandable that the specific connection method between the base 100 and the protrusion 200 is not limited and can be selected according to actual usage requirements.

[0090] It should be noted that when the surface of the substrate 100 is coated with the protrusions 200, the substrate 100 can be configured in a variety of ways. The following are examples of the configuration methods of the substrate 100.

[0091] In one feasible implementation, the substrate 100 is an aluminum alloy layer, and the protrusion 200 is a photoresist layer. The photoresist layer is coated on the aluminum alloy layer. The photoresist layer can reduce the difficulty of image processing on the surface of the aluminum alloy layer and can protect the aluminum alloy layer to extend its service life.

[0092] In another feasible embodiment, the substrate 100 is a titanium alloy layer, and the protrusion 200 is a photoresist layer. The photoresist layer is coated on the titanium alloy layer. The photoresist layer can reduce the difficulty of image processing on the surface of the titanium alloy layer and can protect the titanium alloy layer to extend its service life.

[0093] In addition, in another feasible embodiment, the substrate 100 is a glass layer, the protrusion 200 is a photoresist layer, the photoresist layer is coated on the glass layer, and the photoresist layer can protect the glass layer to extend its service life.

[0094] In addition, in other feasible embodiments, the substrate 100 is a plastic layer, the protrusion 200 is a photoresist layer, the photoresist layer is coated on the plastic layer, and the photoresist layer can protect the plastic layer to extend its service life.

[0095] Understandably, there are no restrictions on the specific settings of the substrate 100; it can be selected according to actual usage needs.

[0096] like Figure 3 and Figure 4 As shown, it should be noted that the connecting part 201 and the base 100 are set at an angle α, and the angle α satisfies: 5°≤α≤45°.

[0097] It should be noted that if the angle between the connecting part 201 and the base 100 is greater than 45 degrees, the tilt angle between the connecting part 201 and the base 100 will increase, resulting in insufficient gloss of the microtexture structure and high surface roughness at the connection between the connecting part 201 and the base 100, thus deteriorating the feel of the microtexture structure.

[0098] It should be noted that if the angle between the connecting part 201 and the base 100 is less than 5 degrees, the tilt angle between the first connecting surface and the base 100 will become smaller, resulting in insufficient three-dimensionality of the texture pattern on the microtexture structure.

[0099] It is understandable that the included angle α between the connecting part 201 and the substrate 100 satisfies: 5°≤α≤45°, which can reduce the roughness at the connection between the substrate 100 and the protrusion 200; and can increase the reflective surface of the connecting part 201, thereby improving the gloss of the microtexture structure.

[0100] It should be noted that the included angle α has several different setting ranges, and the following examples illustrate the setting ranges of the included angle α.

[0101] In one feasible implementation, the included angle α satisfies: 5°≤α≤35°. It can be understood that the included angle α between the connecting part 201 and the base 100 satisfies: 5°≤α≤35°, which can reduce the roughness at the connection between the base 100 and the protrusion 200; and can increase the reflective surface of the connecting part 201, thereby improving the gloss of the microtexture structure.

[0102] In another feasible implementation, the included angle α satisfies: 25°≤α≤45°. It can be understood that the included angle α between the connecting part 201 and the base 100 satisfies: 25°≤α≤45°, which can reduce the roughness at the connection between the base 100 and the protrusion 200; and can increase the reflective surface of the connecting part 201, thereby improving the gloss of the microtexture structure.

[0103] It is understood that the range of the included angle α provided in the embodiments of this application is not limited and can be selected according to actual usage requirements.

[0104] It should be noted that the included angle between the connecting part 201 and the base 100 has a variety of different angles. The following are examples of the included angles between the connecting part 201 and the base 100.

[0105] In one possible implementation, the connecting portion 201 and the base 100 are arranged at a 25° angle.

[0106] It is understandable that the connection part 201 is set at a 25° angle with the substrate 100, which can increase the area of ​​the connection part 201 to improve the gloss of the microtexture structure; and can reduce the surface roughness at the connection between the connection part 201 and the substrate 100, thereby improving the feel of the microtexture structure.

[0107] In another feasible embodiment, the connecting part 201 is arranged at a 30° angle to the base 100.

[0108] It is understandable that the connection part 201 is set at a 30° angle with the substrate 100, which can increase the area of ​​the connection part 201 to improve the gloss of the microtexture structure; and can reduce the surface roughness at the connection between the connection part 201 and the substrate 100, thereby improving the feel of the microtexture structure.

[0109] In addition, in another feasible embodiment, the connecting part 201 is arranged at a 37° angle with the base 100.

[0110] It is understandable that the connection part 201 is set at a 37° angle with the substrate 100, which can increase the area of ​​the connection part 201 to improve the gloss of the microtexture structure; and can reduce the surface roughness at the connection between the connection part 201 and the substrate 100, thereby improving the feel of the microtexture structure.

[0111] It is understandable that the specific angle between the connecting part 201 and the base 100 is not limited and can be selected according to actual usage requirements, as long as the included angle α satisfies: 5°≤α≤45°.

[0112] The substrate 100 provided in the embodiments of this application has a mounting surface 101, and the protrusion 200 has a top wall 202 and an outer peripheral wall 203. One end of the outer peripheral wall 203 is connected to the mounting surface 101, and the other end of the outer peripheral wall 203 is connected to the top wall 202. The top wall 202 and the mounting surface 101 are spaced apart along the height direction of the substrate 100.

[0113] Understandably, the mounting surface 101 is used to connect the protrusion 200, the top wall 202, and the outer peripheral wall 203, which can increase the surface area of ​​the protrusion 200 to improve the gloss of the microtexture structure. Furthermore, the top wall 202 is spaced apart from the mounting surface 101, which allows the microtexture structure to have a better visual appearance.

[0114] The outer peripheral wall 203 provided in the embodiments of this application has a variety of different configuration methods. The configuration methods of the outer peripheral wall 203 will be illustrated below.

[0115] In one feasible implementation, the microtexture structure further includes a transition surface, one end of which is connected to the mounting surface 101 and the other end of which is connected to the top wall 202; the transition surface is connected to the connecting portion 201 to enclose and form an outer peripheral wall 203.

[0116] It is understandable that the connecting part 201 and the transition surface together form the outer peripheral wall 203, which can make the connecting part 201 and the transition surface on the outer peripheral wall 203 present different gloss levels, so that the micro-texture structure has a better visual appearance.

[0117] In another feasible implementation, multiple connecting portions 201 are provided, and the multiple connecting portions 201 are connected to jointly enclose and form an outer peripheral wall 203.

[0118] It is understandable that the connection of multiple connecting parts 201 to jointly enclose and form an outer peripheral wall 203 can cause interference of the reflected light from the connecting parts 201, making the appearance of the microtexture structure more three-dimensional and more gorgeous, thus giving the microtexture structure a better visual effect.

[0119] It is understandable that there are no restrictions on the specific configuration of the outer peripheral wall 203, and it can be selected according to actual usage requirements.

[0120] It should be noted that there are multiple protrusions 200, and these protrusions 200 are spaced apart.

[0121] It is understandable that setting the protrusion 200 can make the pattern formed by the micro-texture structure processing into a three-dimensional pattern, and can increase the gloss and clarity of the three-dimensional pattern; increasing the number of protrusions 200 can increase the size of the pattern formed by the micro-texture structure processing, thereby giving the micro-texture structure a better visual appearance.

[0122] It should be noted that the microtexture structure provided in the embodiments of this application has a first thickness H along the height direction of the substrate 100, and the first thickness H satisfies: 2 micrometers ≤ H ≤ 20 micrometers.

[0123] It should be noted that if the first thickness H is less than 2 micrometers, the distance between the protrusion 200 and the substrate 100 along the height direction will be shorter, resulting in a smaller connection height between the substrate 100 and the protrusion 200, which will lead to a worse visual effect of the pattern formed by the microtexture structure processing.

[0124] It should be noted that if the first thickness H is greater than 20 micrometers, the height of the protrusion 200 in the height direction of the substrate 100 will increase, which will increase the roughness at the connection between the substrate 100 and the protrusion 200, thereby resulting in a deterioration in the appearance and visual effect of the pattern formed by the microtexture structure processing.

[0125] It is understandable that the first thickness H satisfies: 2 micrometers ≤ L1 ≤ 20 micrometers, which can increase the surface area of ​​the reflective surface of the connection part 201 while reducing the connection roughness between the substrate 100 and the protrusion 200, thereby improving the visual effect of the micro-texture structure.

[0126] It should be noted that the first thickness H can be set in several different ways. Examples of the ways to set the first thickness H will be given below.

[0127] In one feasible implementation, the first thickness H is 5 micrometers, that is, the maximum height of the protrusion 200 along the height direction of the substrate 100 is 5 micrometers.

[0128] Understandably, a first thickness H of 5 micrometers can increase the surface area of ​​the reflective surface of the connection 201 while reducing the connection roughness between the substrate 100 and the protrusion 200, thereby improving the visual effect of the micro-texture structure.

[0129] In one feasible implementation, the first thickness H is 10 micrometers, that is, the maximum height of the protrusion 200 along the height direction of the substrate 100 is 10 micrometers.

[0130] Understandably, a first thickness H of 10 micrometers can increase the surface area of ​​the reflective surface of the connection 201 while reducing the connection roughness between the substrate 100 and the protrusion 200, thereby improving the visual effect of the micro-texture structure.

[0131] Understandably, there are no restrictions on how the first thickness H is set; it can be selected according to actual usage requirements, as long as the first thickness H satisfies: 2 micrometers ≤ L1 ≤ 20 micrometers.

[0132] The microtexture structure provided in the embodiments of this application has a first gap L1 between the end of the connecting part 201 connected to the mounting surface 101 and the end of the connecting part 201 connected to the top wall 202 and the orthographic projection of the mounting surface 101. The first gap L1 satisfies: 15 micrometers ≤ L1 ≤ 40 micrometers.

[0133] Understandably, the surface area of ​​the reflective surface of the connecting part 201 can be increased so that the reflected light reflected by the connecting part 201 is more abundant, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0134] It should be noted that if the first spacing L1 is less than 15 micrometers, it will result in poor gloss of the connecting part 201; if the first spacing L1 is greater than 40 micrometers, it will result in high surface roughness of the connecting part 201.

[0135] It should be noted that the first spacing L1 has several different values, and examples of the values ​​of the first spacing L1 will be given below.

[0136] In one feasible implementation, the first spacing L1 is set to 25 micrometers. Setting the first spacing L1 to 25 micrometers can reduce the surface roughness of the reflective surface of the connecting part 201, thereby improving the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0137] In another feasible implementation, the first spacing L1 is set to 35 micrometers. Setting the first spacing L1 to 35 micrometers can improve the gloss of the reflective surface of the connecting part 201, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0138] It is understandable that the specific value of the first spacing L1 is not restricted and can be selected according to actual usage requirements, as long as the first spacing L1 satisfies: 15 micrometers ≤ L1 ≤ 40 micrometers.

[0139] It should be noted that the top wall 202 has a second length L2, which satisfies the following condition: 1 micrometer ≤ L2 ≤ 20 micrometers.

[0140] Understandably, increasing the surface area of ​​the reflective surface of the top wall 202 can improve the visual appearance of the pattern formed by the micro-texture structure processing.

[0141] It should be noted that if the second length L2 is less than 1 micrometer, it will increase the processing difficulty of the top wall 202 and reduce the gloss of the microtexture structure. If the second length L2 is greater than 20 micrometers, it will increase the area occupied by the top wall 202 and result in a large surface roughness of the microtexture structure.

[0142] It should be noted that the second length L2 has several different values, and examples of the possible values ​​of the second length L2 will be given below.

[0143] In one feasible implementation, the second length L2 is set to 8 micrometers. Setting the second length L2 to 8 micrometers can reduce the surface roughness of the reflective surface of the top wall 202, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0144] In another feasible implementation, the second length L2 is set to 13 micrometers. Setting the second length L2 to 13 micrometers can improve the gloss of the reflective surface of the top wall 202, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0145] It is understandable that the specific value of the second length L2 is not restricted and can be selected according to actual usage requirements, as long as the second length L2 satisfies: 1 micrometer ≤ L1 ≤ 20 micrometers.

[0146] It should be noted that there are multiple protrusions 200. Among the multiple protrusions 200, there is a third spacing L3 between two adjacent protrusions 200. The third spacing L3 satisfies: 15 micrometers ≤ L3 ≤ 40 micrometers.

[0147] Understandably, setting the third spacing L3 can increase the surface area of ​​the reflective surface between two adjacent protrusions 200, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0148] It should be noted that the third spacing L3 is the minimum spacing between two adjacent protrusions 200 among the multiple protrusions 200.

[0149] It should be noted that the minimum spacing between two adjacent protrusions 200 is the distance between the connection position of one of the two adjacent protrusions 200 and the base 100 along the height direction of the base 100, and the connection position of the other of the two adjacent protrusions 200 and the base 100.

[0150] It should be noted that if the third spacing L3 is less than 15 micrometers, it will result in a difference in gloss between two adjacent protrusions 200. If the third spacing L3 is greater than 40 micrometers, it will result in a large surface roughness between two adjacent protrusions 200.

[0151] It should be noted that the third spacing L3 has several different values, and examples of the possible values ​​of the third spacing L3 will be given below.

[0152] In one feasible implementation, the third spacing L3 is set to 21 micrometers. Setting the third spacing L3 to 21 micrometers can reduce the surface roughness of the reflective surface between two adjacent protrusions 200, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0153] In another feasible implementation, the third spacing L3 is set to 30 micrometers. Setting the third spacing L3 to 30 micrometers can improve the gloss of the reflective surface between two adjacent protrusions 200, thereby improving the visual appearance of the pattern formed by the micro-texture structure processing.

[0154] It is understandable that the specific value of the third spacing L3 is not restricted and can be selected according to actual usage requirements, as long as the third spacing L3 satisfies: 15 micrometers ≤ L1 ≤ 40 micrometers.

[0155] It should be noted that the ratio of the third spacing L3, the second length L2, and the first spacing L1 is in the range of 1:(0.025-1.3):(0.0375-2.7).

[0156] It is understandable that the ratio of the third spacing L3, the second length L2 and the first spacing L1 is in the range of 1:(0.025-1.3):(0.0375-2.7), which can improve the appearance and visual effect between the connecting part 201, the top wall 202 and the two adjacent protrusions 200, as well as their connection points; thereby improving the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0157] It should be noted that the connecting portion 201 has a plurality of first recesses, which are spaced apart along the extending direction of the connecting portion 201.

[0158] It is understandable that the setting of the first pit can increase the reflective area of ​​the connecting part 201, thereby increasing the reflective area of ​​the micro-texture structure and reducing the roughness of the protrusion 200 to improve the feel of the micro-texture structure; the multiple first pits are arranged at intervals along the extension direction of the connecting part 201, so that the light projected on the connecting part 201 is diffusely reflected, thereby improving the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0159] It should be noted that at least a portion of the substrate 100 has a second pit, and a plurality of second pits are spaced apart along the extending direction of the substrate 100.

[0160] Understandably, the setting of the second recess can increase the reflective area of ​​the substrate 100, thereby increasing the reflective area of ​​the microtexture structure and reducing the roughness of the substrate 100 to improve the feel of the microtexture structure. The multiple second recesses are set at intervals along the extension direction of the substrate 100, which allows the light projected onto the substrate 100 to be diffusely reflected, thereby improving the appearance and visual effect of the pattern formed by the microtexture structure processing.

[0161] It should be noted that the first and second pits can be processed by integral polishing. The specific operation method is as follows: using phosphoric acid containing 650-750 ml / L and sulfuric acid containing 350-250 ml / L, integral polishing is performed by bubbling and oscillating. The raised area 200 will be subjected to greater force and scouring under the liquid flow, so as to etch and form multiple first pits; the edges of the connection area between the raised area 200 and the substrate 100 will also be further polished and passivated; the substrate 100 is etched to form the second pit; thus completing the processing of the first and second pits.

[0162] It should be noted that the surface roughness of protrusion 200 is 0.001 micrometers to 0.4 micrometers.

[0163] It is understandable that the surface roughness of the protrusion 200 is 0.001 micrometers to 0.4 micrometers. This can reduce the surface roughness of the protrusion 200, thereby improving the grip feel of the micro-texture structure and enhancing the visual appearance of the pattern formed by the micro-texture structure processing.

[0164] It should be noted that the surface roughness of the mounting surface 101 of the substrate 100 is 0.1 micrometers to 0.3 micrometers.

[0165] Understandably, the surface roughness of the mounting surface 101 of the substrate 100 is 0.1 micrometer to 0.3 micrometer, which can reduce the surface roughness of the mounting surface 101, thereby making the transition between the protrusion 200 and the substrate 100 more natural, so as to improve the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0166] It should be noted that the surface gloss of the raised 200 is 360Gu-700Gu.

[0167] Understandably, the surface gloss of the protrusion 200 is 360Gu-700Gu, which makes the visual effect of the protrusion 200 brighter and allows light incident on the protrusion 200 to produce specular reflection, thereby improving the visual appearance of the protrusion 200. Furthermore, the large difference between the gloss and roughness of the protrusion 200 allows the protrusion 200 to present a strong flashing effect.

[0168] It should be noted that the surface gloss of the mounting surface 101 of the substrate 100 is 200Gu-350Gu.

[0169] Understandably, the surface gloss of the mounting surface 101 of the substrate 100 is 200Gu-350Gu, which makes the mounting surface 101 appear brighter and allows light incident on the mounting surface 101 to produce specular reflection, thereby improving the appearance of the mounting surface 101. Furthermore, the large difference between the gloss and roughness of the mounting surface 101 allows it to present a strong shimmering effect.

[0170] The microtexture structure provided in the embodiments of this application further includes a coating layer disposed on at least one of the mounting surface 101 of the substrate 100 and the protrusion 200.

[0171] It should be noted that the coating layer can be set in various different positions. Examples of the setting positions of the coating layer will be given below.

[0172] In one feasible embodiment, a coating layer is disposed on the mounting surface 101. The coating layer is used to reduce the direct contact between the mounting surface 101 and the outside air, thereby reducing the oxidation of the mounting surface 101. Furthermore, the coating layer can improve the gloss of the mounting surface 101 and reduce the surface roughness of the mounting surface 101.

[0173] In another feasible embodiment, a coating layer is disposed on the protrusion 200. The coating layer is used to reduce the direct contact between the protrusion 200 and the outside air, thereby reducing the oxidation of the protrusion 200. The coating layer can also improve the gloss of the protrusion 200 and reduce the surface roughness of the protrusion 200.

[0174] In addition, in another feasible embodiment, the coating layers are respectively disposed on the mounting surface 101 and the protrusion 200. The coating layer disposed on the mounting surface 101 is used to reduce the direct contact between the mounting surface 101 and the outside air, thereby reducing the oxidation of the mounting surface 101; and the coating layer can improve the gloss of the mounting surface 101 and reduce the surface roughness of the mounting surface 101. The coating layer disposed on the protrusion 200 is used to reduce the direct contact between the protrusion 200 and the outside air, thereby reducing the oxidation of the protrusion 200; and the coating layer can improve the gloss of the protrusion 200 and reduce the surface roughness of the protrusion 200.

[0175] It is understandable that there are no restrictions on the location of the coating layer, and it can be selected according to the actual use requirements, as long as the coating layer is placed on at least one of the mounting surface 101 and the protrusion 200.

[0176] It should be noted that there are several different ways to set the coating layer. The following are examples of how to set the coating layer.

[0177] In one feasible implementation, the coating layer may be an anodized layer, which is disposed on at least one of the mounting surface 101 and the protrusion 200. The anodized layer can isolate the coating location from direct contact with the outside air, thereby reducing the occurrence of surface oxidation at the coating location and extending the service life of the microtexture structure.

[0178] In another feasible embodiment, the coating layer may be a plasma film disposed on at least one of the mounting surface 101 and the protrusion 200. The plasma film can fill and level the surface of the coating location, thereby reducing the surface roughness of the coating location and improving the appearance and visual effect of the pattern formed by the micro-texture structure processing.

[0179] In addition, in another feasible embodiment, the coating layer can be two layers, one of which is an anodic oxide layer and the other is a plasma film. The anodic oxide layer can isolate the coating location from direct contact with the outside air, thereby reducing the occurrence of surface oxidation at the coating location and extending the service life of the microtexture structure. The plasma film can fill and level the surface of the coating location, thereby reducing the surface roughness of the coating location and improving the appearance and visual effect of the pattern formed by the microtexture structure processing.

[0180] Understandably, there are no restrictions on the specific settings of the coating layer; it can be selected according to actual usage requirements.

[0181] It should be noted that when the coating layer is set on the protrusion 200, the protrusion 200 covering the coating layer has a variety of different surface parameters. The surface parameters of the protrusion 200 covering the coating layer will be illustrated with examples below.

[0182] In one feasible implementation, when the coating layer is provided on the protrusion 200, the surface roughness of the coating layer is 0.001 micrometers to 0.2 micrometers.

[0183] It is understandable that when the coating layer is set on the protrusion 200, the surface roughness of the coating layer is 0.001 micrometers to 0.2 micrometers. This can reduce the surface roughness of the protrusion 200 covering the coating layer, thereby improving the grip feel of the micro-texture structure and enhancing the visual appearance of the pattern formed by the micro-texture structure processing.

[0184] In one feasible implementation, when the coating layer is provided on the protrusion 200, the surface gloss of the coating layer is 360Gu-850Gu.

[0185] Understandably, when the coating layer is set on the protrusion 200, the surface gloss of the coating layer is 360Gu-850Gu, which makes the visual effect of the protrusion 200 covered by the coating layer brighter, and allows the light incident on the protrusion 200 covered by the coating layer to produce specular reflection, thereby improving the appearance and visual effect of the protrusion 200 covered by the coating layer.

[0186] In addition, in another feasible embodiment, when the coating layer is provided on the protrusion 200, the surface roughness of the coating layer is 0.001 micrometers to 0.2 micrometers, and the surface gloss of the coating layer is 360Gu to 850Gu.

[0187] Understandably, when the coating layer is applied to the protrusion 200, the surface roughness of the coating layer is 0.001 micrometers to 0.2 micrometers. This reduces the surface roughness of the protrusion 200 covered by the coating layer, thereby improving the grip feel of the micro-textured structure and enhancing the visual appearance of the pattern formed by the micro-textured structure. When the coating layer is applied to the protrusion 200, the surface gloss is 360Gu to 850Gu. This makes the protrusion 200 covered by the coating layer appear brighter and allows light incident on it to produce specular reflection, further enhancing its visual appearance. Furthermore, the significant difference between the gloss and roughness of the protrusion 200 covered by the coating layer results in a strong, shimmering visual effect.

[0188] It is understandable that when the coating layer is set on the protrusion 200, the surface parameters of the protrusion 200 covering the coating layer are not limited and can be selected according to actual usage requirements.

[0189] It should be noted that when the coating layer is provided on the mounting surface 101, the mounting surface 101 covering the coating layer has a variety of different surface parameters. The surface parameters of the mounting surface 101 covering the coating layer will be illustrated below.

[0190] In one feasible implementation, when the coating layer is provided on the mounting surface 101, the surface roughness of the coating layer is 0.01 micrometers to 0.2 micrometers.

[0191] It is understandable that when the coating layer is set on the mounting surface 101, the surface roughness of the coating layer is 0.01 micrometers to 0.2 micrometers, which can reduce the surface roughness of the mounting surface 101 covering the coating layer, thereby improving the grip feel of the micro-texture structure and enhancing the visual appearance of the pattern formed by the micro-texture structure processing.

[0192] In one feasible implementation, when the coating layer is provided on the mounting surface 101, the surface gloss of the coating layer is 300Gu-700Gu.

[0193] Understandably, when the coating layer is applied to the mounting surface 101, the surface gloss of the coating layer is 300Gu-700Gu, which makes the visual effect of the mounting surface 101 covered by the coating layer brighter and allows the light incident on the mounting surface 101 covered by the coating layer to produce specular reflection, thereby improving the appearance and visual effect of the mounting surface 101 covered by the coating layer.

[0194] In addition, in another feasible embodiment, when the coating layer is provided on the mounting surface 101, the surface roughness of the coating layer is 0.01 micrometers to 0.2 micrometers, and the surface gloss of the coating layer is 300Gu to 700Gu.

[0195] Understandably, when the coating layer is applied to the mounting surface 101, the surface roughness of the coating layer is 0.01 micrometers to 0.2 micrometers. This reduces the surface roughness of the mounting surface 101 covered by the coating layer, thereby improving the grip feel of the micro-textured structure and enhancing the visual appearance of the pattern formed by the micro-textured structure. When the coating layer is applied to the mounting surface 101, the surface gloss is 300 Gu to 700 Gu. This makes the visual effect of the mounting surface 101 covered by the coating layer brighter and allows light incident on the mounting surface 101 to produce specular reflection, further enhancing the visual appearance of the mounting surface 101 covered by the coating layer. Furthermore, the significant difference between the gloss and roughness of the mounting surface 101 covered by the coating layer results in a strong, shimmering visual effect.

[0196] It is understandable that when the coating layer is set on the mounting surface 101, the surface parameters of the mounting surface 101 covering the coating layer are not limited and can be selected according to actual usage requirements.

[0197] It should be noted that, taking the substrate 100 as an aluminum alloy layer as an example, the anodized layer can be generated in the following way.

[0198] The reaction tank contains a sulfuric acid solution with a concentration of 0.5 mol / L and a temperature of 18℃. An aluminum alloy layer is placed in the reaction tank. Under the action of an external current, an anodic oxide layer is formed on the surface of the aluminum alloy layer. The pore size of the micropores in the anodic oxide layer is 10 nm-100 nm, and the number of micropores in the anodic oxide layer is 100-3000 per μm².

[0199] It should be noted that, taking the substrate 100 as an aluminum alloy layer as an example, the plasma film can be generated in the following way.

[0200] The aluminum alloy layer, or an aluminum alloy layer with an anodized layer, is placed into a vacuum coating machine; after vacuuming, heating, and ion cleaning, the coating process is performed. The specific coating process is as follows:

[0201] Preparation of the first base layer: A Cr target was used, with a bias voltage of -300V, a Cr target current of 25A, and a film thickness of 50nm. The average grain size of the first base layer was 8nm, and the nanohardness of the first base layer was 14GPa. After coating, the film was bombarded with ions for 10min.

[0202] Preparation of the second base layer: A Cr target was used, and the DC mode was set, i.e. no bias voltage. The Cr target current was 8A, the film thickness was 80nm, the average grain size of the second base layer was 60nm, and the nanohardness of the second base layer was 8GPa.

[0203] Preparation of the third base layer: Using a Cr target, the bias voltage is set to -80V, the Cr target current is 20A, the film thickness is 60nm, the average grain size of the third base layer is 40nm, and the nanohardness of the third base layer is 9GPa, thus completing the base layer deposition.

[0204] Preparation of the transition layer: Ti and Cr targets were used for co-deposition, DC mode was set, i.e. no bias voltage, target current 20A, and the film thickness was 500nm.

[0205] Preparation of the color layer: A Ti target was used, and a reaction gas, namely nitrogen, was introduced during magnetron sputtering. The DC mode was set, i.e., no bias voltage, the target current was 20A, and the film thickness was 800nm.

[0206] It should be noted that when the substrate 100 and the protrusion 200 are separately configured, and at least a portion of the substrate 100 is connected to the protrusion 200, the microtexture structure can be processed in the following manner:

[0207] S1: Preparation of bump 200: Spray 3-9μm photoresist onto the surface of substrate 100, pre-bake at 100℃ for 4 minutes, and perform LDi exposure on the photoresist using a preset wavelength. Then, use a developer to dissolve the photoresist that has undergone chemical changes after exposure. After development, hard bake at 140-180℃ for 20-50 minutes to solidify the photoresist and form bump 200.

[0208] S2: Forming bump 200: Use a chemical polishing solution containing 650-750 ml / L of phosphoric acid and 350-250 ml / L of sulfuric acid to perform chemical polishing etching at 70-95℃ for 1-5 min, and then use an organic solvent to remove the photoresist so that bump 200 can be raised.

[0209] S3: Forming the first and second pits: Using phosphoric acid containing 650-750 ml / L and sulfuric acid containing 350-250 ml / L, the entire surface is polished by bubbling and oscillating. The raised area 200 will be subjected to greater force scouring under the liquid flow to etch and form multiple first pits; the edges of the connection area between the raised area 200 and the substrate 100 will also be further polished and passivated; a part of the substrate 100 will be scouring under the liquid flow to etch and form second pits.

[0210] S4: Coating: The micro-textured structure treated above is placed in a vacuum coating machine, and after vacuuming, heating, and ion cleaning, a coating process is performed.

[0211] This application also provides an article with a microtextured structure, including an article body and the microtextured structure described in any of the above embodiments, wherein the microtextured structure is disposed on the article body.

[0212] The article with microtextured structure in the embodiments of this application can be a vehicle, for example: the vehicle can be a gasoline vehicle, a natural gas vehicle, or a new energy vehicle, and the new energy vehicle can be a pure electric vehicle, a hybrid electric vehicle, or a range-extended electric vehicle, etc. Accordingly, the microtextured structure can be a metal surface on the vehicle or a glass surface on the vehicle.

[0213] In addition, products with microtextured structures can also be used for other devices that require surface treatment, such as mobile phones, portable devices, laptops, electric toys, power tools, ships and spacecraft, among which spacecraft can include airplanes, rockets, space shuttles or spacecraft.

[0214] Given that the article with microtexture structure in this embodiment includes the microtexture structure described in any of the above embodiments, the article with microtexture structure includes the structure and beneficial effects of the microtexture structure, which will not be elaborated further in this embodiment.

[0215] Embodiments of this application also provide an electronic device including the microtexture structure provided in any of the above embodiments.

[0216] The electronic devices in this application embodiment can be mobile phones, portable devices, laptops, electric toys, power tools, etc.

[0217] The various embodiments or implementation methods described in this specification are presented in a progressive manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the embodiments can be referred to each other.

[0218] It should be noted that the embodiments referred to in the specification, such as "one embodiment," "embodiment," "exemplary embodiment," and "some embodiments," may include specific features, structures, or characteristics, but not every embodiment necessarily includes that specific feature, structure, or characteristic. Furthermore, such phrases do not necessarily refer to the same embodiment. Moreover, when a specific feature, structure, or characteristic is described in connection with an embodiment, implementing such a feature, structure, or characteristic in conjunction with other embodiments, whether explicitly described or not, is within the knowledge scope of those skilled in the art.

[0219] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.

Claims

1. A microtextured structure, characterized in that, include: Substrate (100); At least one protrusion (200) is provided on at least a portion of the surface of the substrate (100), the protrusion (200) having at least one connecting portion (201) connected to the substrate (100); The connecting part (201) is disposed at an angle α with the base (100), and the angle α satisfies: 5°≤α≤45°； The base (100) has a mounting surface (101), and the protrusion (200) has a top wall (202) and an outer peripheral wall (203). One end of the outer peripheral wall (203) is connected to the mounting surface (101), and the other end of the outer peripheral wall (203) is connected to the top wall (202); Along the height direction of the base (100), the top wall (202) is spaced apart from the mounting surface (101).

2. The microtexture structure according to claim 1, characterized in that, Also includes: A transition surface, one end of which is connected to the mounting surface (101), and the other end of which is connected to the top wall (202); The transition surface is connected to the connecting part (201) to enclose and form the outer peripheral wall (203).

3. The microtexture structure according to claim 1, characterized in that, The connecting part (201) is provided in multiple ways, and the multiple connecting parts (201) are connected to form the outer peripheral wall (203).

4. The microtexture structure according to claim 1, characterized in that, The protrusions (200) are provided in multiple ways, and the multiple protrusions (200) are spaced apart.

5. A microtextured structure according to claim 1, characterized in that, Along the height direction of the base (100), the protrusion (200) has a first thickness H, the first thickness H satisfying: 2 micrometers ≤ H ≤ 20 micrometers.

6. A microtextured structure according to claim 2, characterized in that, The end of the connecting part (201) connected to the mounting surface (101) forms a first gap L1 between its orthographic projection on the mounting surface (101) and the end of the connecting part (201) connected to the top wall (202) forming its orthographic projection on the mounting surface (101). The first gap L1 satisfies: 15 micrometers ≤ L1 ≤ 40 micrometers.

7. A microtextured structure according to claim 6, characterized in that, The top wall (202) has a second length L2, which satisfies: 1 micrometer ≤ L2 ≤ 20 micrometers.

8. A microtextured structure according to claim 7, characterized in that, Multiple protrusions (200) are provided, and among the multiple protrusions (200), there is a third distance L3 between two adjacent protrusions (200), the third distance L3 satisfying: 15 micrometers ≤ L3 ≤ 40 micrometers.

9. A microtextured structure according to claim 8, characterized in that, The ratio range of the third spacing L3, the second length L2, and the first spacing L1 is: 1：（0.025-1.3）：（0.375-2.7）。 10. A microtextured structure according to any one of claims 1-9, characterized in that, The connecting portion (201) has a plurality of first recesses, which are spaced apart along the extending direction of the connecting portion (201).

11. A microtextured structure according to any one of claims 1-9, characterized in that, At least a portion of the substrate (100) has a plurality of second pits, which are spaced apart along the extension direction of the substrate (100).

12. A microtextured structure according to any one of claims 1-9, characterized in that, The surface roughness of the protrusion (200) is 0.001 micrometers to 0.4 micrometers.

13. A microtextured structure according to any one of claims 1-9, characterized in that, The surface roughness of the mounting surface (101) of the substrate (100) is 0.1 micrometers to 0.3 micrometers.

14. A microtextured structure according to any one of claims 1-9, characterized in that, The surface gloss of the protrusion (200) is 360Gu-700Gu.

15. A microtextured structure according to any one of claims 1-9, characterized in that, The surface gloss of the mounting surface (101) of the substrate (100) is 200Gu-350Gu.

16. A microtextured structure according to any one of claims 1-9, characterized in that, Also includes: A coating layer is disposed on at least one of the mounting surface (101) of the substrate (100) and the protrusion (200).

17. A microtextured structure according to claim 16, characterized in that, When the coating layer is provided on the protrusion (200), The surface roughness of the coating layer is 0.001 micrometers to 0.2 micrometers; And / or, the surface gloss of the coating layer is 360Gu-850Gu.

18. A microtextured structure according to claim 16, characterized in that, When the coating layer is provided on the mounting surface (101), The surface roughness of the coating layer is 0.01 micrometers to 0.2 micrometers; And / or, the surface gloss of the coating layer is 300Gu-700Gu.

19. An article having a microtextured structure, characterized in that, It includes an article body and a microtextured structure as described in any one of claims 1-18, wherein the microtextured structure is disposed on the article body.

20. An electronic device, characterized in that, Includes the microtexture structure according to any one of claims 1-18.

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