Frame structure for improving reliability of etched product

Abstract

The utility model discloses a frame structure for improving reliability of an etched product, which comprises a frame body, the frame body is provided with a base island and a plurality of pins distributed on the periphery of the base island, the peripheral edge of the back surface of the base island is provided with a concave part structure, and the concave part structure is provided with a plurality of semi-etched U-shaped grooves distributed at intervals. One side, close to the back surface of the base island, of each semi-etching U-shaped groove is opened to form a first opening, and one side, close to the pin, of each semi-etching U-shaped groove is opened to form a second opening. The semi-etching U-shaped grooves distributed at intervals are adopted, and the fluctuation range of the depth difference of the semi-etching U-shaped grooves is small in the etching processing process, so that the depth of the semi-etching U-shaped grooves is more uniform; the actual combination strength of the base island and the EMC is higher, and the reliability is higher.

Description

TECHNICAL FIELD

[0001] The utility model relates to integrated circuit packaging technical field, concretely relates to a framework structure of improving etching product reliability. BACKGROUND

[0002] The lead frame of the current DFN / QFN product (such as the attached Figure 1 ), mainly includes the frame body 10, the base island 11 and the pin 12, and a circle of half-etching bevel structure 13 is designed on the edge of the back of the base island, the purpose is to strengthen the combination strength of the base island and EMC.

[0003] But due to the large overall area of the half-etching bevel structure, and the influence of etching process conditions, the depth difference fluctuation range of the half-etching bevel structure is large, which leads to the uneven depth of the half-etching bevel structure, and causes the poor actual combination strength of the base island and EMC, and low reliability; in addition, the half-etching bevel structure also has the problems of increasing the water vapor intrusion and causing the poor welding of the base island edge ground wire (when welding, the suspension under the edge of the base island will affect the force of the splitting knife). UTILITY MODEL CONTENTS

[0004] The utility model provides a framework structure of improving etching product reliability in view of the defects of prior art, which can adopt a plurality of interval distribution half-etching U-shaped grooves, the depth difference fluctuation range of the half-etching U-shaped groove is small in the etching processing process, so that the depth of the half-etching U-shaped groove is more uniform, the actual combination strength of the base island and EMC is higher, and the reliability is higher.

[0005] To achieve the above object, the utility model adopts the following technical scheme:

[0006] A framework structure of improving etching product reliability, including frame body, the frame body has base island and a plurality of distribution in the periphery of base island pin, the four peripheral edges of the back of base island are each equipped with recess structure, the recess structure has a plurality of interval distribution half-etching U-shaped groove, the side close to the back of base island of half-etching U-shaped groove is open and is formed with first opening, the side close to pin of half-etching U-shaped groove is open and is formed with second opening.

[0007] By setting recess structure on the four peripheral edges of the back of base island, the recess structure has a plurality of interval distribution half-etching U-shaped groove, the side close to the back of base island of half-etching U-shaped groove is open and is formed with first opening, the side close to pin of half-etching U-shaped groove is open and is formed with second opening, adopt a plurality of interval distribution half-etching U-shaped groove, the depth difference fluctuation range of half-etching U-shaped groove is small in the etching processing process, so that the depth of half-etching U-shaped groove is more uniform, the actual combination strength of base island and EMC is higher, and the reliability is higher; in addition, the total length of half-etching area is shortened by the half-etching U-shaped groove spaced apart from each other, and the path of water vapor intrusion is reduced.

[0008] In one embodiment, the inner sidewall of the opposite two sides of the half-etching U-shaped groove is formed with an inclined surface, and the interval between the two inclined surfaces gradually decreases from top to bottom.

[0009] In one embodiment, the inclined angle β of the inclined surface is 10°±2°.

[0010] In one embodiment, the inner sidewall of the opposite two sides of the half-etching U-shaped groove is formed with an arc-shaped corner between the inner top wall.

[0011] In one embodiment, the inner top wall of the half-etching U-shaped groove has a flat surface.

[0012] In one embodiment, the length d2 of the flat surface is not less than 1 / 2 of the length d1 of the first opening.

[0013] In one embodiment, the width b1 of the first opening is 0.18mm±0.03mm.

[0014] In one embodiment, the adjacent two half-etching U-shaped grooves in the same recess structure are separated by a connecting rib.

[0015] In one embodiment, the width b2 of the connecting rib is 0.20mm±0.03mm.

[0016] In one embodiment, the base island is square, and the plurality of half-etching U-shaped grooves in the same recess structure are arranged in a straight line.

[0017] The utility model discloses a recess structure is arranged on the four peripheral edges of the back of the base island, and the recess structure has a plurality of half-etching U-shaped grooves arranged at intervals. The side of the half-etching U-shaped groove close to the back of the base island is open to form a first opening, and the side of the half-etching U-shaped groove close to the pin is open to form a second opening. The plurality of half-etching U-shaped grooves arranged at intervals have a small fluctuation range of the depth difference of the half-etching U-shaped groove in the etching process, so that the depth of the half-etching U-shaped groove is more uniform, the strength of the actual combination of the base island and the EMC is higher, and the reliability is higher. In addition, the half-etching U-shaped grooves separated from each other shorten the total length of the half-etching area and reduce the path of water vapor intrusion.

[0018] To make the structure, technical means and specific purposes and functions of the utility model clearer, the utility model will be further described in detail below in combination with the drawings and specific embodiments: BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 is a schematic diagram of a frame structure of the prior art;

[0020] Figure 2 is a structural schematic view of an embodiment of the present application;

[0021] Figure 3 is Figure 2 a sectional view at A-A in the middle;

[0022] Figure 4 is Figure 2 a sectional view at B-B in the middle;

[0023] Figure 5 is Figure 4 a partial enlarged view of C part in the middle.

[0024] The drawing label description:

[0025] 10-frame body, 11-base island, 111-front surface, 112-back surface, 12-pin, 13-semi-etching inclined surface structure, 14-recess structure, 15-semi-etching U-shaped groove, 151-first opening, 152-second opening, 153-inclined surface, 154-flat surface, 155-arc-shaped corner, 16-continuous rib. DETAILED DESCRIPTION

[0026] In the description of the present application, it should be explained that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" and the like indicate the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the application and simplifying the description, and do not indicate or imply that the position or element must have a specific orientation, be constructed and operated in a specific orientation, therefore it cannot be understood as a limitation on the application.

[0027] In the description of the present application, it should be explained that unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected;It can be mechanically connected, or it can be electrically connected;It can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication between two elements inside. For ordinary skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0028] As Figures 2-5 shown, the utility model discloses a kind of frame structure for improving etching product reliability, including frame body 10, the frame body 10 has base island 11 and several distribution in the periphery of base island 11 pin 12.

[0029] The four peripheral edges of the back surface 112 of the base island 11 are each provided with a recess structure 14, the recess structure 14 has a plurality of spaced-apart semi-etching U-shaped grooves 15, in the same recess structure 14, the number of semi-etching U-shaped grooves 15 is eight, the semi-etching U-shaped groove 15 is open to form a first opening 151 on the side close to the back surface 112 of the base island 11, and the semi-etching U-shaped groove 15 is open to form a second opening 152 on the side close to the pin 12.

[0030] The inner side walls of the opposite sides of the semi-etching U-shaped groove 15 are each formed with an inclined surface 153, and the spacing between the two inclined surfaces 153 gradually decreases from top to bottom; by arranging the inclined surface 153 on the inner side walls of the opposite sides of the semi-etching U-shaped groove 15, and gradually reducing the spacing between the two inclined surfaces 153 from top to bottom, it is beneficial to lock with EMC and improve the bonding strength.

[0031] The inclination angle β of the inclined surface 153 is 10°±2°.

[0032] The inner side walls of the opposite sides of the semi-etching U-shaped groove 15 are each formed with an inclined surface 153, and the spacing between the two inclined surfaces 153 gradually decreases from top to bottom; by arranging the inclined surface 153 on the inner side walls of the opposite sides of the semi-etching U-shaped groove 15, and gradually reducing the spacing between the two inclined surfaces 153 from top to bottom, it is beneficial to lock with EMC and improve the bonding strength.

[0033] The inner top wall of the semi-etching U-shaped groove 15 has a flat surface 154, and the flat surface 154 is parallel to the front surface 111 or the back surface 112 of the base island 11.

[0034] The length d2 of the flat surface 154 is not less than 1 / 2 of the length d1 of the first opening 151.

[0035] The width b1 of the first opening 151 is 0.18mm±0.03mm.

[0036] In the same recess structure 14, the two adjacent semi-etching U-shaped grooves 15 are separated by a connecting rib 16, the connecting rib 16 is integrally formed with the base island 11, and the lower surface of the connecting rib 16 is flush with the back surface 112 of the base island 11; by arranging the connecting rib 16 between the two adjacent semi-etching U-shaped grooves 15, the connecting rib 16 is used to support the chopper when the ground wire is welded on the edge of the front surface 111 of the base island 11, so as to avoid poor welding of the ground wire.

[0037] The width b2 of the connecting rib 16 is 0.20mm±0.03mm.

[0038] The base island 11 is a square base island 11, and the plurality of semi-etching U-shaped grooves 15 are arranged in a straight line in the same recess structure 14.

[0039] In summary, the utility model discloses a recess structure 14 is set up in the four peripheral edges of the back 112 of base island 11, recess structure 14 has several interval distribution's half etching U-shaped groove 15, and the first opening 151 is formed with the open side of half etching U-shaped groove 15 close to the back 112 of base island 11, and the second opening 152 is formed with the open side of half etching U-shaped groove 15 close to pin 12, adopts several interval distribution's half etching U-shaped groove 15, in the etching process, and the depth difference fluctuation range of half etching U-shaped groove 15 is small, makes the depth of half etching U-shaped groove 15 more uniform, and the strength of the actual combination of base island 11 and EMC is higher, and the reliability is higher, in addition, the total length of half etching area is shortened by the half etching U-shaped groove 15 that is separated from each other, and the path of water vapor intrusion is reduced.

[0040] The above is only the preferred embodiment of the utility model, and does not limit the utility model, so any modification, equivalent replacement, improvement etc. of the above embodiment according to the technical actuality of the utility model still belongs to the range of the utility model technical scheme.

Claims

1. A frame structure for improving the reliability of etched products, comprising a frame body having a base island and a plurality of pins distributed around the periphery of the base island, characterized in that: the back of the base island is provided with a recess structure around the periphery, the recess structure having a plurality of semi-etched U-shaped grooves distributed at intervals, the semi-etched U-shaped grooves being open on one side close to the back of the base island to form a first opening, and being open on one side close to the pins to form a second opening. The inner side walls of the opposite sides of the semi-etched U-shaped grooves are each formed with an inclined surface, and the spacing between the two inclined surfaces gradually decreases from top to bottom.

2. The frame structure for improving reliability of etching products according to claim 1, wherein The inclined angle β of the inclined surface is 10°±2°.

3. The frame structure for improving reliability of etching products according to claim 2, wherein The inner side walls of the opposite sides of the semi-etched U-shaped grooves are each formed with an arc-shaped corner between the inner top wall.

4. The frame structure for improving reliability of etching products according to claim 1, wherein The inner top wall of the semi-etched U-shaped groove has a flat surface.

5. The frame structure for improving reliability of etching products according to claim 1, wherein The length d2 of the flat surface is not less than 1 / 2 of the length d1 of the first opening.

6. The frame structure for improving reliability of etching products according to claim 5, wherein The width b1 of the first opening is 0.18mm±0.03mm.

7. The frame structure for improving reliability of etching products according to claim 1, wherein In the same recess structure, two adjacent semi-etched U-shaped grooves are separated by a connecting rib.

8. The frame structure for improving reliability of etching products according to claim 1, wherein The width b2 of the connecting rib is 0.20mm±0.03mm.

9. The frame structure for improving reliability of etching products according to claim 8, wherein The base island is square, and in the same recess structure, the plurality of semi-etched U-shaped grooves are arranged in a straight line.

10. The frame structure for improving reliability of etching products according to claim 1, wherein ​

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