PVD (Physical Vapor Deposition) equipment capable of automatically adjusting water vapor content

Abstract

The utility model discloses PVD (Physical Vapor Deposition) equipment capable of automatically adjusting water vapor content. The PVD equipment comprises a reaction cavity, a data terminal, a residual gas analyzer and a water vapor generating mechanism, the residual gas analyzer and the water vapor generating mechanism are both connected with the data terminal, the reaction cavity is connected with the residual gas analyzer and the water vapor generating mechanism, and the residual gas analyzer is used for monitoring the water vapor content in the reaction cavity and transmitting the water vapor content data to the data terminal. And the data terminal controls the water vapor generating mechanism to automatically convey water vapor into the reaction cavity according to water vapor content data fed back by the residual gas analyzer. The device has the advantages of being compact in structure, convenient to maintain, high in automation degree and the like, an optimal process window is obtained through quantitative control over water vapor, therefore, deposition of films of different batches is more uniform, the performance of the films of different batches is more stable, and the working stability and efficiency of the PVD procedure are remarkably improved.

Description

TECHNICAL FIELD

[0001] The utility model relates to new energy battery preparation technical field, concretely relates to a kind of PVD equipment of automatic regulation water vapor content. BACKGROUND

[0002] With the continuous development of new energy battery technology, HIT battery, perovskite battery as a kind of new energy battery, TCO film, seed layer etc. are usually deposited on HJT battery piece by PVD, and ETL / HTL / TCO layer etc. is deposited on perovskite battery piece. Therefore, PVD equipment is the key equipment for new energy battery preparation.

[0003] At present, the water vapor content in the cavity of PVD equipment is mainly adjusted by manual intervention, such as frequent replacement of carrier plate. This method not only shortens the service life of carrier plate, but also increases the use cost of equipment due to frequent replacement of carrier plate, and manual intervention also makes it difficult to control the water vapor fluctuation in the cavity, which leads to unstable PVD process. UTILITY MODEL CONTENT

[0004] The technical problem to be solved by the utility model is to solve the problem of difficult control of water vapor content in the cavity of current PVD equipment, which affects the quality of battery, and to provide a PVD equipment with compact structure, accurate control and high stability for automatic regulation of water vapor content.

[0005] In order to solve the above technical problems, the utility model adopts the following technical scheme:

[0006] A PVD equipment for automatic regulation of water vapor content, comprising: a reaction cavity, a data terminal, a residual gas analyzer and a water vapor generating mechanism; the residual gas analyzer and the water vapor generating mechanism are connected with the data terminal, the reaction cavity is connected with the residual gas analyzer and the water vapor generating mechanism respectively, the residual gas analyzer is used for monitoring the water vapor content in the reaction cavity and transmitting the water vapor content data to the data terminal, and the data terminal controls the water vapor generating mechanism to automatically deliver water vapor into the reaction cavity according to the water vapor content data fed back by the residual gas analyzer.

[0007] As a further improvement of the utility model, it further comprises a water vapor capturing mechanism, which is connected with the reaction cavity and the data terminal respectively, and the data terminal controls the water vapor capturing mechanism to automatically capture the water vapor in the reaction cavity.

[0008] As a further improvement of the utility model, a fourth control valve is arranged on the connecting pipeline between the residual gas analyzer and the reaction cavity.

[0009] As a further improvement of the utility model, a transmission device is arranged in the reaction cavity, and the transmission device is used for conveying carrier plate.

[0010] As a further improvement of the utility model, the water vapor capturing mechanism comprises a copper pipe and a water vapor capturing pump; the copper pipe is arranged below the conveying device along the conveying direction of the carrier plate to capture water vapor in the reaction cavity; the water vapor capturing pump is arranged outside the reaction cavity and is connected with the copper pipe and the data terminal respectively; the data terminal controls the operation of the water vapor capturing pump according to the water vapor content data fed back by the residual gas analyzer to extract water vapor in the reaction cavity.

[0011] As a further improvement of the utility model, the water vapor generating mechanism comprises a source bottle, which is connected with the reaction cavity through a pipeline with a second control valve to realize water vapor delivery into the reaction cavity.

[0012] As a further improvement of the utility model, a mass flow meter is further arranged on the connecting pipeline between the source bottle and the reaction cavity, and the mass flow meter is connected with the data terminal.

[0013] As a further improvement of the utility model, a third control valve is further arranged on the connecting pipeline between the source bottle and the reaction cavity, and the third control valve is connected with the data terminal.

[0014] As a further improvement of the utility model, a vacuum extraction mechanism is further arranged, which is connected with the reaction cavity and the data terminal respectively, and is used to maintain a vacuum state in the reaction cavity.

[0015] As a further improvement of the utility model, the vacuum extraction mechanism comprises a vacuum pump and a vacuum valve, both of which are connected with the data terminal, and the vacuum valve is arranged on the connecting pipeline between the vacuum pump and the reaction cavity.

[0016] Compared with the prior art, the utility model has the advantages of:

[0017] The PVD equipment for automatically adjusting water vapor content of the utility model connects the reaction cavity with the residual gas analyzer and the water vapor generating mechanism respectively, and the residual gas analyzer and the water vapor generating mechanism are both connected with the data terminal, the residual gas analyzer monitors the water vapor content in the reaction cavity in real time, transmits the monitoring data to the data terminal, and the data terminal controls the water vapor generating mechanism to automatically deliver water vapor into the reaction cavity according to the water vapor content monitoring data in the reaction cavity, realizes quantitative control of water vapor, facilitates obtaining the best process window, and makes the deposition of different batches of thin films more uniform, the performance of different batches of thin films more stable, and the working stability and efficiency of the PVD process significantly improved. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is the overall structure principle schematic view of the PVD equipment for automatically adjusting water vapor content in the embodiment of the utility model.

[0019] Legend: 11, vacuum pump; 12, vacuum valve; 13, reaction cavity; 14, carrier plate; 15, conveying device; 16, first control valve; 17, source bottle; 18, second control valve; 19, mass flow meter; 20, third control valve; 21, copper pipe; 22, water vapor capture pump; 23, data terminal; 24, residual gas analyzer; 25, fourth control valve; 200, vacuumizing mechanism; 300, water vapor generating mechanism; 400, water vapor capturing mechanism. DETAILED DESCRIPTION

[0020] The utility model will be further described below in combination with the drawings and specific preferred embodiments, but it is not limited to the protection scope of the utility model.

[0021] In the description of the utility model, it is understood that the orientation or positional relationship indicated by the terms "side", "center", "longitudinal", "transverse", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential" are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the utility model and simplifying the description, and cannot be understood as indicating or implying that the indicated device or element must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the utility model.

[0022] In addition, the terms "first" and "second" are only for the purpose of description, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of indicated technical features, so that the features with "first" and "second" can explicitly or implicitly include one or more features, and in the description of the utility model, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0023] Embodiment

[0024] As Figure 1As shown, the automatic water vapor content adjusting PVD equipment of the utility model, include: reaction cavity 13, data terminal 23, residual gas analyzer 24 and water vapor generating mechanism 300.Residual gas analyzer 24 and water vapor generating mechanism 300 are connected with data terminal 23, and reaction cavity 13 is connected with residual gas analyzer 24 and water vapor generating mechanism 300 respectively.Residual gas analyzer 24 is used for monitoring the water vapor content in reaction cavity 13, and transmits the water vapor content data to data terminal 23, and data terminal 23 controls water vapor generating mechanism 300 to automatically deliver water vapor to reaction cavity 13 according to the water vapor content data fed back by residual gas analyzer 24.In the embodiment, data terminal 23 can specifically adopt PLC controller, has the characteristics of simple principle and accurate control, to improve the automation degree of water vapor content adjustment in reaction cavity 13.

[0025] In the embodiment, by connecting reaction cavity 13 with residual gas analyzer 24 and water vapor generating mechanism 300 respectively, residual gas analyzer 24 and water vapor generating mechanism 300 are connected to data terminal 23, residual gas analyzer 24 monitors the water vapor content in reaction cavity 13 in real time and transmits the monitoring data to data terminal 23, and data terminal 23 controls water vapor generating mechanism 300 to automatically deliver water vapor to reaction cavity 13 according to the water vapor content monitoring data in reaction cavity 13, realizes the quantitative control of water vapor, is convenient for obtaining the best process window, so that the thin film deposition of different batches is more uniform, and the performance of different batches of thin films is also more stable, significantly improves the working stability and efficiency of PVD process.

[0026] In the embodiment, the connecting pipeline between residual gas analyzer 24 and reaction cavity 13 is provided with the fourth control valve 25.The fourth control valve 25 is a manual valve, when it is necessary to detect the water vapor content in reaction cavity 13, the fourth control valve 25 is opened, and the gas in reaction cavity 13 automatically enters residual gas analyzer 24.

[0027] As shown, Figure 1 It also includes vacuumizing mechanism 200.Vacuumizing mechanism 200 is connected with reaction cavity 13 and data terminal 23 respectively, and data terminal 23 controls vacuumizing mechanism 200 to automatically run, to realize the vacuum state inside reaction cavity 13.

[0028] Further, vacuumizing mechanism 200 includes vacuum pump 11 and vacuum valve 12, and vacuum pump 11 and vacuum valve 12 are connected with data terminal 23, and data terminal 23 controls vacuum pump 11 and vacuum valve 12 to automatically open and close, and vacuum valve 12 is arranged on the connecting pipeline of vacuum pump 11 and reaction cavity 13.

[0029] As shown, Figure 1As shown, the water vapor capturing mechanism 400 is connected to the reaction cavity 13 and the data terminal 23, respectively, and the data terminal 23 controls the water vapor capturing mechanism 400 to automatically capture the water vapor in the reaction cavity 13.

[0030] As shown, the reaction cavity 13 is provided with a conveying device 15. The conveying device 15 is used to convey the carrier plate 14, and the structure of the conveying device 15 can adopt the conventional arrangement in the art, which will not be described here. Figure 1

[0031] In this embodiment, each carrier plate 14 is numbered and recorded in the data terminal 23, and the data terminal 23 records the cycle number of the carrier plate 14 and judges the water vapor content when each carrier plate 14 enters the reaction cavity 13. Through data accumulation analysis and learning, the data terminal 23 will automatically configure the optimal water vapor content by adjusting the water vapor generating mechanism 300 and the water vapor capturing mechanism 400 when the carrier plate 14 enters the reaction cavity 13, so as to obtain the optimal process window.

[0032] In this embodiment, the water vapor capturing mechanism 400 includes a copper pipe 21 and a water vapor capturing pump 22. The copper pipe 21 is arranged below the conveying device 15 along the conveying direction of the carrier plate 14, and the residual water vapor in the reaction cavity 13 is quickly captured through the low-temperature condensation effect on the surface of the copper pipe 21. The water vapor capturing pump 22 is arranged outside the reaction cavity 13 and is connected to the copper pipe 21 and the data terminal 23, respectively. The data terminal 23 controls the water vapor capturing pump 22 to operate according to the water vapor content data fed back by the residual gas analyzer 24, so as to extract the residual water vapor in the reaction cavity 13.

[0033] As shown, the water vapor generating mechanism 300 includes a source bottle 17, which is connected to the reaction cavity 13 through a pipeline with a second control valve 18. The source bottle 17 is provided with a heating assembly to realize the delivery of water in the source bottle 17 to the reaction cavity 13 in the form of self-evaporation. The second control valve 18 can be in the form of a manual valve, which is simple in structure and convenient to operate. Figure 1 As shown, the source bottle 17 and the connecting pipeline of the reaction cavity 13 are further provided with a mass flow meter 19, which is connected to the data terminal 23 to realize accurate monitoring and control of the amount of water vapor entering the reaction cavity 13.

[0034] Figure 1 As shown, the source bottle 17 and the connecting pipeline of the reaction cavity 13 are further provided with a third control valve 20, which is connected to the data terminal 23. The third control valve 20 can be in the form of a pneumatic valve, which is automatically opened and closed by the data terminal 23.

[0035] As shown, the source bottle 17 and the connecting pipeline of the reaction cavity 13 are further provided with a mass flow meter 19, which is connected to the data terminal 23 to realize accurate monitoring and control of the amount of water vapor entering the reaction cavity 13. Figure 1 As shown, the source bottle 17 and the connecting pipeline of the reaction cavity 13 are further provided with a third control valve 20, which is connected to the data terminal 23. The third control valve 20 can be in the form of a pneumatic valve, which is automatically opened and closed by the data terminal 23.

[0036] ​​In the embodiment, the source bottle 17 is also connected with a water supplement source through a pipeline with the first control valve 16. When the source bottle 17 needs to be supplemented with water, the first control valve 16 is opened to realize that pure water in the water supplement source enters the source bottle 17. The first control valve 16 can be in the form of a manual valve.

[0037] In the embodiment, the process of the PVD device is as follows:

[0038] (1) Parameters are set on the data terminal 23, such as setting the water vapor content range in the reaction cavity 13, the batch number of the carrier plate 14, and the like;

[0039] (2) The carrier plate 14 enters the reaction cavity 13 under the transmission of the transmission device 15;

[0040] (3) The vacuum pumping mechanism 200 operates to keep the reaction cavity 13 in a low vacuum state, so as to maintain the stability of the air pressure in the reaction cavity 13;

[0041] (4) The residual gas analyzer 24 detects whether the water vapor content in the reaction cavity 13 is within the set range after the carrier plate 14 enters the reaction cavity 13, and feeds back to the data terminal 23;

[0042] (5) If the water vapor content in the reaction cavity 13 is within the preset range, the carrier plate 14 performs the next process in the reaction cavity 13; if the water vapor content in the reaction cavity 13 exceeds the preset range, the data terminal 23 controls the water vapor generating mechanism 300 and the water vapor capturing mechanism 400 to operate to adjust the water vapor content in the reaction cavity 13 to match the process requirement of the current carrier plate 14 in combination with the water vapor content detected by the residual gas analyzer 24 and the batch of the carrier plate 14.

[0043] In the process, the data terminal 23 realizes automatic matching and adjustment of various parameters by learning the recorded parameters, so as to improve the efficiency of the PVD process.

[0044] The above only describes preferred embodiments of the present application, and the protection scope of the present application is not limited to the above embodiments. Any technical solution falling within the concept of the present application belongs to the protection scope of the present application. It should be noted that, for ordinary technical personnel in the technical field, some improvements and decorations without departing from the principle of the present application are also considered to be within the protection scope of the present application.

Claims

1. A PVD device for automatically adjusting water vapor content, characterized in that, include: The reaction chamber (13), data terminal (23), residual gas analyzer (24), and water vapor generator (300) are connected to the data terminal (23). The reaction chamber (13) is connected to the residual gas analyzer (24) and the water vapor generator (300) respectively. The residual gas analyzer (24) is used to monitor the water vapor content in the reaction chamber (13) and transmit the water vapor content data to the data terminal (23). The data terminal (23) controls the water vapor generator (300) to automatically deliver water vapor to the reaction chamber (13) based on the water vapor content data fed back by the residual gas analyzer (24).

2. The PVD equipment for automatically adjusting water vapor content according to claim 1, characterized in that, It also includes a water vapor capture mechanism (400), which is connected to the reaction chamber (13) and the data terminal (23) respectively. The data terminal (23) controls the water vapor capture mechanism (400) to automatically capture water vapor in the reaction chamber (13).

3. The PVD equipment for automatically adjusting water vapor content according to claim 1, characterized in that, A fourth control valve (25) is provided on the connecting pipe between the residual gas analyzer (24) and the reaction chamber (13).

4. The PVD equipment for automatically adjusting water vapor content according to claim 2, characterized in that, The reaction chamber (13) is equipped with a transmission device (15) for conveying the carrier plate (14).

5. The PVD equipment for automatically adjusting water vapor content according to claim 4, characterized in that, The water vapor capture mechanism (400) includes a copper pipe (21) and a water vapor capture pump (22); the copper pipe (21) is arranged below the transmission device (15) along the conveying direction of the carrier plate (14) to capture water vapor in the reaction chamber (13); the water vapor capture pump (22) is arranged outside the reaction chamber (13) and is connected to the copper pipe (21) and the data terminal (23) respectively; the data terminal (23) controls the operation of the water vapor capture pump (22) according to the water vapor content data fed back by the residual gas analyzer (24) to extract water vapor in the reaction chamber (13).

6. The PVD equipment for automatically adjusting water vapor content according to any one of claims 1 to 5, characterized in that, The water vapor generating mechanism (300) includes a source bottle (17), which is connected to the reaction chamber (13) through a pipe with a second control valve (18) to realize the delivery of water vapor to the reaction chamber (13).

7. The PVD equipment for automatically adjusting water vapor content according to claim 6, characterized in that, A mass flow meter (19) is also provided on the connecting pipe between the source bottle (17) and the reaction chamber (13), and the mass flow meter (19) is connected to the data terminal (23).

8. The PVD equipment for automatically adjusting water vapor content according to claim 7, characterized in that, A third control valve (20) is also provided on the connecting pipe between the source bottle (17) and the reaction chamber (13), and the third control valve (20) is connected to the data terminal (23).

9. The PVD equipment for automatically adjusting water vapor content according to any one of claims 1 to 5, characterized in that, It also includes a vacuum pumping mechanism (200), which is connected to the reaction chamber (13) and the data terminal (23) respectively. The vacuum pumping mechanism (200) is used to maintain a vacuum state inside the reaction chamber (13).

10. The PVD equipment for automatically adjusting water vapor content according to claim 9, characterized in that, The vacuum pumping mechanism (200) includes a vacuum pump (11) and a vacuum valve (12). Both the vacuum pump (11) and the vacuum valve (12) are connected to the data terminal (23). The vacuum valve (12) is located on the connecting pipe between the vacuum pump (11) and the reaction chamber (13).

Images