Anti-reflection and anti-reflection film in specific visible light range and optical element made of anti-reflection and anti-reflection film
By stacking nanoscale CeF3, TiO2 and MgF2 layers on the surface of optical elements, the problem of stray light at the edge of optical elements was solved, high transmittance and high reflectance were achieved, optical performance and wear resistance were improved, and production costs were reduced.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-14
- Publication Date
- 2026-03-03
AI Technical Summary
Stray light from side edges and edge locations in existing optical components causes image quality degradation. Existing antireflective coatings have low transmittance and reflectance in a specific visible light range, which cannot meet the requirements of high-performance equipment.
An antireflective coating structure with repeated stacking of nanoscale CeF3, TiO2 and MgF2 layers is designed as a three-segment structure, with CeF3, TiO2 and MgF2 layers as the center wavelengths of 555nm, 445nm and 455nm respectively. By rationally designing the thickness of each layer, optical properties with high transmittance and high reflectance are achieved.
Achieving high transmittance and high reflectance within a specific visible light range improves the image quality of optical components, meets the requirements of high-performance equipment, and reduces production costs and equipment wear risks.
Smart Images

Figure CN223966713U_ABST
Abstract
Description
Technical Field
[0001] This invention belongs to the field of optical thin film technology, specifically relating to an antireflective coating in a specific visible light range and optical elements made therefrom. Background Technology
[0002] Existing optical elements such as lenses and prisms not only receive incident light at the center position, but also at the peripheral positions such as the side edges of the optical elements. They also generate reflections at the edges of the optical elements, forming stray light. When this stray light mixes with the incident light at the front and peripheral positions, the resulting image will have reflected light spots, ghosting, and other issues, which will lead to a reduction in the optical characteristics of the optical instrument.
[0003] To solve the stray light problem mentioned above, the current approach is to coat the surface, edges, and other peripheral areas of the optical element with a coating that has anti-reflection and anti-reflection functions, thereby forming an anti-reflection and anti-reflection film.
[0004] The utility model patent with publication number CN217443572U discloses an antireflection and antitransmittance film system. For light with a wavelength range of 400nm-700nm, the minimum transmittance is greater than 91.50% and the average transmittance is greater than 93.50%. The wavelength range with the highest reflectance is 430nm-515nm. It can be seen that its transmittance and reflectance are not high, and it is difficult to play its role in some high-performance devices, which cannot meet the user's needs in specific scenarios. Utility Model Content
[0005] To address the aforementioned problems, this invention proposes an antireflective coating for a specific visible light range and an optical element made therefrom.
[0006] The antireflective coating of this application in a specific visible light range includes: repeatedly stacked nanoscale CeF3 layers, nanoscale TiO2 layers and nanoscale MgF2 layers.
[0007] The nanoscale CeF3 layer, nanoscale TiO2 layer, and nanoscale MgF2 layer are stacked in three repeated segments. The first segment includes layers 1-3, the second segment includes layers 4-27, and the third segment includes layers 28-33.
[0008] The center wavelength of the first segment is 555nm, the first layer is CeF3, the second layer is TiO2, and the third layer is MgF2.
[0009] The thickness of the first layer is 8.5123 × 10. -8 m, the thickness of the second layer is 1.1145 × 10 m. -7 m, the thickness of the third layer is 1.0054 × 10 m. -7 m.
[0010] The center wavelength of the second segment is 445nm. The fourth layer is a CeF3 layer, the fifth layer is a TiO2 layer, and the sixth layer is a MgF2 layer. Every three layers are stacked repeatedly, and the stacking is repeated 7 times.
[0011] The thickness of the fourth layer is 6.8252 × 10⁻⁶. -8 m, the thickness of the 5th layer is 8.9357×10 m. -8 m, the thickness of the 6th layer is 8.0616×10 m. -8 m, repeat the stacking process every three layers, and continue stacking 7 times.
[0012] The center wavelength of the third segment is 455nm. The 28th layer is a CeF3 layer, the 29th layer is a TiO2 layer, and the 30th layer is a MgF2 layer. Every three layers are stacked repeatedly.
[0013] The thickness of the 28th layer is 6.9785 × 10⁻⁶. -8 m, the thickness of the 29th layer is 9.1365×10 m. -8 m, the thickness of the 30th layer is 8.2428×10 m. -8 m.
[0014] The substrate of the antireflective coating is glass.
[0015] The optical element of the visible light receiving device of this application has an anti-reflection and anti-transmittance film attached to its surface or periphery. The anti-reflection and anti-transmittance film comprises a laminate, which is a laminate of a visible light anti-reflection and anti-transmittance film and at least a film with high reflection of ultraviolet or infrared light. The visible light anti-reflection and anti-transmittance film is an anti-reflection and anti-transmittance film within a specific visible light range.
[0016] The beneficial effects of this utility model are:
[0017] 1. In terms of cost, the raw materials for CeF3, TiO2 and MgF2 are relatively easy to obtain. They are all materials with relatively mature industrial production. Bulk purchase costs are low. In addition, commonly used thin film preparation methods are applicable to these three materials, and multilayer thin films can be prepared on the same production line, which reduces the cost of production equipment.
[0018] 2. In terms of wear resistance, TiO2 has a high hardness and serves as an outer or middle wear-resistant layer to withstand external friction and scratches. CeF3 and MgF2 play an auxiliary supporting and buffering role inside. The alternating stacking of the three materials makes the film less susceptible to damage from external forces.
[0019] 3. In terms of light transmittance, CeF3, TiO2, and MgF2 are complementary. MgF2 has high transmittance over a wide ultraviolet-infrared band, TiO2 has high transmittance in the visible light range, and CeF3 has good transmittance in the 300-5000nm range. By rationally designing the structure and thickness of each layer of the multilayer thin film, optical thin films can achieve anti-reflection and anti-reflection effects over a wider wavelength range, effectively reducing reflection loss and improving transmittance.
[0020] 4. In terms of transmittance and reflectance, the antireflective coating of this application can achieve high transmittance (average transmittance greater than 98%) in the range of 500nm-720nm and high reflectance (average reflectance greater than 99%) in the range of 720nm-1000nm. Both transmittance and reflectance are high, which can meet the usage requirements of high-performance equipment in specific scenarios. Attached Figure Description
[0021] Figure 1 This is a schematic diagram of the structure of the antireflective coating of this utility model in a specific visible light range.
[0022] Figure 2 This is the data simulation result of this utility model. Detailed Implementation
[0023] The embodiments of the present invention are described in detail below, examples of which are shown in the accompanying drawings. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention.
[0024] like Figures 1-2 As shown, the antireflective coating of this application in a specific visible light range includes: repeatedly stacked nanoscale CeF3 layers, nanoscale TiO2 layers and nanoscale MgF2 layers.
[0025] The nanoscale CeF3 layer, nanoscale TiO2 layer and nanoscale MgF2 layer are stacked in three segments from bottom to top. The first segment includes layers 1-3, the second segment includes layers 4-27, and the third segment includes layers 28-33.
[0026] The center wavelength of the first segment is 555nm, and the first layer is a CeF3 layer with a thickness of 8.5123×10⁻⁶. -8 m, the second layer is a TiO2 layer with a thickness of 1.1145 × 10 m. -7 m, the third layer is a MgF2 layer with a thickness of 1.0054 × 10 m. -7 m.
[0027] The center wavelength of the second segment is 445 nm, and the fourth layer is a CeF3 layer with a thickness of 6.8252 × 10⁻⁶. -8m, the 5th layer is a TiO2 layer with a thickness of 8.9357×10 m. -8 m, the 6th layer is a MgF2 layer with a thickness of 8.0616 × 10 m. -8 m, stacked repeatedly every three layers, for a total of 8 stacks.
[0028] The center wavelength of the third segment is 455 nm, and the 28th layer is a CeF3 layer with a thickness of 6.9785 × 10⁻⁶. -8 m, the 29th layer is a TiO2 layer with a thickness of 9.1365×10 m. -8 m, the 30th layer is a MgF2 layer with a thickness of 8.2428 × 10 m. -8 m, stacked repeatedly every three layers, for a total of 2 stacks.
[0029] The substrate of the antireflective coating in this application is glass.
[0030] The antireflection and anti-reflection coating of this application, within a specific visible light range, achieves high transmittance in the reflectance image, realizing high transmittance in the 500-720nm wavelength band and high reflectance in the 720-1000nm wavelength band, with no significant fluctuations in the reflectance image within the specified range. The thin film stacking model is shown below. Figure 1 Numerical simulation results are shown in [link to simulation results]. Figure 2 .
[0031] Although the above embodiments have been shown and described, it is understood that the above embodiments are exemplary and should not be construed as limiting the present invention. Any changes, modifications, substitutions and variations made to the above embodiments by those skilled in the art are within the protection scope of the present invention.
Claims
1. An antireflective coating for a specific visible light range, characterized in that, include: Repeatedly stacked nanoscale CeF3 layers, nanoscale TiO2 layers, and nanoscale MgF2 layers.
2. The antireflective coating in a specific visible light range according to claim 1, characterized in that, The nanoscale CeF3 layer, nanoscale TiO2 layer, and nanoscale MgF2 layer are stacked in three repeated segments. The first segment includes layers 1-3, the second segment includes layers 4-27, and the third segment includes layers 28-33.
3. The antireflective coating in a specific visible light range according to claim 2, characterized in that, The center wavelength of the first segment is 555nm, the first layer is CeF3, the second layer is TiO2, and the third layer is MgF2.
4. The antireflective coating in a specific visible light range according to claim 3, characterized in that, The thickness of the first layer is 8.5123 × 10. -8 m, the thickness of the second layer is 1.1145 × 10 m. -7 m, the thickness of the third layer is 1.0054 × 10 m. -7 m.
5. The antireflective coating in a specific visible light range according to claim 2, characterized in that, The center wavelength of the second segment is 445nm. The fourth layer is a CeF3 layer, the fifth layer is a TiO2 layer, and the sixth layer is a MgF2 layer. Every three layers are stacked repeatedly, and the stacking is repeated 7 times.
6. The antireflective coating in a specific visible light range according to claim 5, characterized in that, The thickness of the fourth layer is 6.8252 × 10⁻⁶. -8 m, the thickness of the 5th layer is 8.9357×10 m. -8 m, the thickness of the 6th layer is 8.0616×10 m. -8 m, repeat the stacking process every three layers, and continue stacking 7 times.
7. The antireflective coating in a specific visible light range according to claim 2, characterized in that, The center wavelength of the third segment is 455nm. The 28th layer is a CeF3 layer, the 29th layer is a TiO2 layer, and the 30th layer is a MgF2 layer. Every three layers are stacked repeatedly.
8. The antireflective coating in a specific visible light range according to claim 7, characterized in that, The thickness of the 28th layer is 6.9785 × 10⁻⁶. -8 m, the thickness of the 29th layer is 9.1365×10 m. -8 m, the thickness of the 30th layer is 8.2428×10 m. -8 m.
9. The antireflective coating in a specific visible light range according to claim 1, characterized in that, The substrate of the antireflective coating is glass.
10. An optical element for a visible light receiving device, characterized in that, An antireflective coating is attached to its surface or periphery. The antireflective coating comprises a laminate, which is a laminate of a visible light antireflective film and a film with at least high reflectivity to ultraviolet or infrared light. The visible light antireflective film is the antireflective film in a specific visible light range as described in any one of claims 1-8.
Citation Information
Patent Citations
Anti-reflection film
CN217443572U