Low-temperature cold source unit based on high and low temperature mixing and temperature control system
By using a high-low temperature hybrid low-temperature cold source unit and temperature control system, the problems of narrow temperature range, small cooling capacity, and poor temperature control accuracy of existing temperature control systems are solved. This achieves a wide temperature range, large cooling capacity, high-precision temperature control, and long lifespan, making it suitable for semiconductor manufacturing.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2025-04-21
- Publication Date
- 2026-03-27
AI Technical Summary
Existing variable temperature circulating temperature control systems suffer from problems such as narrow temperature range, small cooling capacity, poor temperature control accuracy, short equipment lifespan, and high operational difficulty, especially in terms of support for high and low temperature applicability.
By employing a low-temperature cold source unit and temperature control system based on high and low temperature mixing, and by designing components such as a high-low temperature mixing cold source valve box, refrigerator, circulating pump, vacuum pump and regenerator, combined with a flow controller and heater, precise control of the working fluid temperature and efficient utilization of cold energy can be achieved.
It expands the temperature range of the temperature control system, improves the cooling capacity and temperature control accuracy, extends the equipment life, and simplifies the operation process. It is suitable for processes such as etching, ion implantation, and diffusion in semiconductor manufacturing.
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Figure CN224050688U_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The utility model relates to temperature control system technical field especially relates to a low temperature cold source unit and temperature control system based on high low temperature mixture. BACKGROUND
[0002] The development and wide application of semiconductor technology greatly promote the progress of science and technology and social economic development, become the industry that national key supports. Along with the continuous development of semiconductor manufacturing technology, the temperature change circulating temperature control system for accurately controlling the reaction chamber temperature in semiconductor manufacturing process is the indispensable key equipment in semiconductor manufacturing process, is widely used in semiconductor manufacturing, testing and other fields. Temperature change circulating temperature control system is a self-balancing circulating device, mainly comprises heat exchanger, circulating pump, compressor and control system, can provide temperature controllable low temperature medium without interruption. Guarantee the process processing temperature of etching, ion implantation, diffusion, thin film deposition, chemical mechanical polishing and other links in semiconductor manufacturing.
[0003] At present, the temperature change circulating temperature control system in the market generally has the problems of narrow temperature zone, small refrigerating capacity, poor temperature control precision, short service life of equipment, large operation difficulty and the like, which brings certain limitation to the temperature change circulating temperature control performance required in the semiconductor production process, and the support ability of the applicability of high and low temperature is weak. Therefore, it is of great significance to design a temperature change circulating temperature control system with wide temperature, large refrigerating capacity, high temperature control precision, long service life and simple operation in the field of semiconductor manufacturing.
[0004] In the closed temperature control system loop, the cold source part is provided with cold quantity by the refrigerating machine, and when the inlet and outlet flow and pressure of the refrigerating machine fluctuate, the outlet temperature of the refrigerating machine is difficult to accurately control, causing the system to run for a long time at the initial stage. UTILITY MODEL CONTENTS
[0005] In order to solve the technical problems in the background art, the utility model provides a low temperature cold source unit and temperature control system based on high low temperature mixture.
[0006] The utility model provides a low temperature cold source unit based on high low temperature mixture, comprising: cold source valve box, refrigerating machine, circulating pump, first vacuum pump, low temperature pipeline and normal temperature pipeline;
[0007] The first vacuum pump is used for vacuumizing the cold source valve box, the cold source valve box is provided with a first heat recovery outlet and a first cold quantity inlet connected with the input end and the output end of the refrigerator respectively, the cold source valve box is provided with a heat recovery device, a first outlet switch valve V13 and a first inlet switch valve V14, the first outlet switch valve V13 is connected with the first cold quantity inlet, the first heat recovery outlet is communicated with the output end of the circulating pump through the high temperature channel and the low temperature pipeline of the heat recovery device, the input end of the circulating pump is communicated with the first inlet switch valve V14 through the low temperature channel of the heat recovery device, the both ends of the normal temperature pipeline are connected with the output end of the circulating pump and the output end of the refrigerator respectively, the normal temperature pipeline is provided with a normal temperature flow controller, and the low temperature pipeline is provided with a low temperature flow controller.
[0008] Preferably, the cold source valve box is further provided with a cold source heater, which is arranged on the pipeline between the first outlet switch valve V13 and the first cold quantity inlet.
[0009] Preferably, the cold source valve box is provided with two first heat recovery devices and a second heat recovery device arranged in series.
[0010] Preferably, the cold source valve box is further provided with a first-stage pre-cooling pipeline, the both ends of the first-stage pre-cooling pipeline are connected with the pipeline upstream of the first outlet switch valve V13 and the pipeline downstream of the first outlet switch valve V13 respectively, and the first-stage pre-cooling pipeline is provided with a first-stage low temperature switch valve V15.
[0011] Preferably, the system further comprises a first buffer tank, which is arranged on the pipeline between the circulating pump and the low temperature channel of the heat recovery device.
[0012] Preferably, the system further comprises a gas supplementing device, which is connected to the pipeline between the first buffer tank and the low temperature channel of the heat recovery device, and is used for supplementing gas into the loop.
[0013] In the utility model, the first vacuum pump is used for vacuumizing the cold source valve box, the cold source valve box is provided with a first heat recovery outlet and a first cold quantity inlet connected with the input end and the output end of the refrigerator respectively, the first heat recovery outlet is communicated with the output end of the circulating pump through the high temperature channel and the low temperature pipeline of the heat recovery device, the input end of the circulating pump is communicated with the first inlet switch valve V14 through the low temperature channel of the heat recovery device, the both ends of the normal temperature pipeline are connected with the output end of the circulating pump and the output end of the refrigerator respectively, and the high and low temperature pipeline is respectively provided with a flow controller. The heat recovery pipeline is designed as the normal temperature pipeline outside the valve box and the low temperature pipeline inside the valve box, the opening degree of the flow controller on the two pipelines is controlled, thereby the input working medium temperature of the refrigerator is adjusted to obtain the required output working medium temperature, and the system stable time is shortened in the initial stage.
[0014] The utility model further provides a temperature control system based on high and low temperature mixture, and the temperature control system comprises the low temperature cold source unit.
[0015] Preferably, the low-temperature distribution unit further comprises a distribution valve box and a second vacuum pump for vacuumizing the distribution valve box, the distribution valve box is provided with a cold energy outlet connected with the target plate, a heat recovery inlet, a second cold energy inlet connected with the cold source valve box and a second heat recovery outlet, the cold energy outlet and the second cold energy inlet form a cold energy pipeline, and the heat recovery inlet and the second heat recovery outlet form a heat recovery pipeline.
[0016] Preferably, the low-temperature throttle valve TV is further arranged on the cold energy pipeline.
[0017] In the utility model, the temperature control system based on high and low temperature mixing has similar technical effects with the low-temperature cold source unit, and thus will not be repeated. BRIEF DESCRIPTION OF DRAWINGS
[0018] Figure 1 FIG. 1 is a structural schematic diagram of an embodiment of a low-temperature cold source unit based on high and low temperature mixing according to the utility model.
[0019] Figure 2 FIG. 2 is a structural schematic diagram of an embodiment of a low-temperature cold source unit and a temperature control system based on high and low temperature mixing according to the utility model.
[0020] Figure 3 FIG. 3 is a structural schematic diagram of another embodiment of a low-temperature cold source unit based on high and low temperature mixing according to the utility model.
[0021] Figure 4 FIG. 4 is a structural schematic diagram of a low-temperature distribution unit of an embodiment of a temperature control system based on high and low temperature mixing according to the utility model.
[0022] REFERENCE SIGNS:
[0023] 1, cold source valve box; 2, refrigerator; 3, circulating pump; 4, first vacuum pump; 5, distribution valve box; 6, second vacuum pump; 8, inlet heater; 9, outlet heater; 11, first-stage precooling pipeline; 12, second-stage precooling pipeline; 13, third-stage precooling pipeline; 14, first heat recovery device; 15, second heat recovery device; 16, first buffer tank; 17, second buffer tank; 18, first vacuum gauge; 19, second vacuum gauge; 20, cold source heater; 21, low-temperature flow controller; 22, normal-temperature flow controller; 23, nitrogen inlet pipeline; 24, nitrogen outlet pipeline; 25, filter;
[0024] 100, working target plate; 200, precooling target plate. DETAILED DESCRIPTION
[0025] REFERENCE Figure 1The utility model provides a kind of low-temperature cold source unit and temperature control system based on high-low temperature mixing, comprising: cold source valve box 1, refrigerator 2, circulating pump 3, first vacuum pump 4, low-temperature pipeline and normal temperature pipeline;
[0026] First vacuum pump 4 is used to vacuumize cold source valve box 1, and first regenerative outlet and first cold quantity inlet are connected with the input end and output end of refrigerator 2 respectively on cold source valve box 1, regenerator, first outlet on-off valve V13 and first inlet on-off valve V14 are equipped in cold source valve box 1, and first outlet on-off valve V13 is connected with first cold quantity inlet;First regenerative outlet is communicated with the output end of circulating pump 3 through the high-temperature passage of regenerator, and the input end of circulating pump 3 is communicated with first inlet on-off valve V14 through the low-temperature passage of regenerator, and the output end of circulating pump 3 and the output end of refrigerator 2 are connected respectively at both ends of normal temperature pipeline, and normal temperature flow controller 22 is equipped on normal temperature pipeline, and low-temperature flow controller 21 is equipped on low-temperature pipeline.
[0027] To explain the working mode of the low-temperature cold source unit based on high-low temperature mixing of the embodiment in detail, refer to Figure 2 The utility model also provides a kind of temperature control system, comprising: the low-temperature cold source unit and low-temperature distribution unit of above, and low-temperature distribution unit includes distribution valve box 5 and second vacuum pump 6, and second vacuum pump 6 is used to vacuumize distribution valve box 5, and cold quantity outlet and regenerative inlet connected with target disc and second cold quantity inlet and second regenerative outlet connected with cold source valve box 1 are equipped on distribution valve box 5, and cold quantity pipeline is formed between the cold quantity outlet and the second cold quantity inlet, and regenerative pipeline is formed between the regenerative inlet and the second regenerative outlet.
[0028] In specific working process, under the action of circulating pump 3, nitrogen as working medium is cooled by refrigerator 2, enters into cold source valve box 1 via first cold quantity inlet, and cold quantity is sent to working target disc 100 from cold source valve box 1 via distribution unit via first outlet on-off valve, for the target disc cooling of semiconductor processing;Nitrogen after warming returns to cold source valve box via distribution unit, then the low-temperature passage of regenerator passes through circulating pump, and part of it enters into the high-temperature passage of regenerator via low-temperature pipeline to precool and return, realizes the cold quantity utilization of low-temperature working medium before entering into normal temperature circulating pump, and another part directly returns via normal temperature pipeline outside valve box, and two parts of working medium are mixed at the input end of refrigerator, and the temperature of working medium at the outlet of refrigerator is controlled by mixing, to complete closed cycle of nitrogen working medium.
[0029] The interior of cold source valve box is evacuated by first vacuum pump to form vacuum environment, which can reduce the convection heat transfer of residual gas molecules inside, reduce the heat leakage of low-temperature working medium, and ensure the low-temperature temperature of nitrogen return gas.
[0030] In order to expand the temperature zone of the temperature control system, a low-temperature throttle valve TV can be further arranged on the cold energy pipeline of the distribution valve box, so as to effectively reduce the temperature of the working medium entering the distribution valve box by means of pressure reduction.
[0031] In the embodiment, the low-temperature cold source unit and the temperature control system based on high-low temperature mixing are provided. A first vacuum pump is used to pump the cold source valve box. The cold source valve box is provided with a first heat recovery outlet and a first cold energy inlet connected with the input end and the output end of the refrigerator respectively. The first heat recovery outlet is communicated with the output end of the circulating pump through the high-temperature channel and the low-temperature pipeline of the heat recovery device. The input end of the circulating pump is communicated with the first inlet valve V14 through the low-temperature channel of the heat recovery device. The normal-temperature pipeline is connected with the output end of the circulating pump and the output end of the refrigerator respectively. The high-low temperature pipeline is provided with flow controllers respectively. The heat recovery pipeline is designed to pass through the normal-temperature pipeline outside the valve box and the low-temperature pipeline inside the valve box. The opening degree of the flow controllers on the two pipelines is adjusted, so as to adjust the input working medium temperature of the refrigerator to obtain the required output working medium temperature and shorten the system stabilization time in the initial stage.
[0032] In the specific embodiment of the low-temperature cold source unit, the cold source heater 20 is arranged in the pipeline between the first outlet valve V13 and the first cold energy inlet in the cold source valve box 1. In the initial stage of system operation, the temperature difference between the input end and the output end of the refrigerator is large, so that the stabilization time of the system is long. The working medium is completely heated to become gaseous by the cold source heater, and then the gas is divided into two paths by the high-temperature flow controller 22 and the low-temperature flow controller 21. The two paths are mixed at the outlet of the refrigerator, and finally the power of the heater is adjusted to realize precise control of the outlet temperature. At the same time, this method can avoid the temperature fluctuation caused by the impact of the mixing of high-low temperature two-phase working medium, shorten the stabilization time of the system, and realize precise control of the fluid working medium.
[0033] In the specific design, the first heat recovery device 14 and the second heat recovery device 15 are arranged in series in the cold source valve box 1. The two heat recovery devices are connected in series to ensure sufficient heat exchanger area. The two heat recovery devices exchange heat between the low-temperature return gas medium from the low-temperature distribution unit and the external normal-temperature gas, maximize the use of the cold energy of the low-temperature return gas, realize the recovery and energy saving of the cold energy, make the working medium entering the refrigerator obtain a lower temperature, better play the cold energy of the refrigerator, make the output circulating working medium have a lower temperature, and have a higher cold energy delivery efficiency and a larger cold energy in the same temperature zone compared with other devices.
[0034] In addition, in another specific embodiment, a first-stage pre-cooling pipeline 11 is further arranged in the cold source valve box 1, and the first-stage pre-cooling pipeline 11 is connected with the pipeline upstream of the first outlet switch valve V13 and the pipeline downstream of the first outlet switch valve V13 respectively, and a first-stage low-temperature switch valve V15 is arranged on the first-stage pre-cooling pipeline 11. In the initial stage of system operation, the cold source valve box is pre-cooled through the first-stage pre-cooling pipeline, so as to ensure the low-temperature injection efficiency in the semiconductor production process.
[0035] In other specific embodiments, the low-temperature cold source unit further comprises a first buffer tank 16 arranged on the pipeline between the circulating pump 3 and the low-temperature channel of the regenerator. The buffer tank is arranged at the inlet end of the circulating pump, so as to ensure the pressure stability of the pipeline system and reduce the pressure fluctuation of the pipeline system.
[0036] Further, the low-temperature cold source unit further comprises a gas supplementing device arranged on the pipeline between the first buffer tank 16 and the low-temperature channel of the regenerator, and used for supplementing gas into the loop. In the working process, when the nitrogen pressure in the closed loop is insufficient, the gas supplementing device is used for automatically supplementing nitrogen into the pipeline. The gas supplementing device is arranged at the gas inlet side of the circulating pump, and the supplemented gas enters the refrigerator after being pre-cooled by the regenerator under the action of the circulating pump, and then enters the circulating working fluid channel, so that the influence of the supplemented gas on the system is minimized.
[0037] The temperature-variable cycle temperature control system of the present embodiment will be described in detail through specific examples.
[0038] With reference to Figure 3 and 4 , the present embodiment provides a temperature-variable cycle temperature control system, which comprises a low-temperature cold source unit and a low-temperature distribution unit. The low-temperature cold source unit and the low-temperature distribution unit are connected through a low-temperature double-layer pipeline. The low-temperature cold source unit mainly provides the target disc in the semiconductor production process with circulating fluid having a certain temperature and pressure, and forms a closed cycle to meet the low-temperature injection conditions required by the target disc. The low-temperature distribution unit is mainly used for the distribution and delivery of the low-temperature circulating medium of the working target disc and the pre-cooling target disc in the semiconductor production process. The temperature-variable cycle temperature control system can provide the semiconductor production process with wide temperature range, large refrigerating capacity, high-precision temperature control and other functions.
[0039] The low-temperature cold source unit comprises a cold source valve box, a refrigerator, a first buffer tank 16, a circulating pump, a second buffer tank 17, a low-temperature flow controller 21, a normal-temperature flow controller 22 and a refrigerator. The cold source valve box is internally provided with a low-temperature switch valve V14, a first regenerator 14, a second regenerator 15, a cold source heater, a low-temperature switch valve V13 and a low-temperature switch valve V15. The cold source valve box is evacuated through a first vacuum pump to form a vacuum environment, which can reduce the convective heat transfer of the residual gas molecules in the interior, reduce the heat leakage of the low-temperature working medium, and ensure the low-temperature temperature of the nitrogen return.
[0040] The low-temperature cold source unit and the low-temperature distribution unit are connected through a low-temperature double-layer pipe. The first regenerator 14 and the second regenerator 15 are connected in series, and the inlet and outlet of the series-connected heat exchanger are respectively provided with an eighth temperature sensor, a ninth temperature sensor, a tenth temperature sensor, an eleventh temperature sensor, an eighth pressure sensor and an eleventh pressure sensor for monitoring the temperature and pressure of the working medium at the inlet and outlet of the regenerator. The first buffer tank 16 and the second buffer tank 17 are connected through a single-layer pipe, and a circulating pump for driving the circulation of the working medium is arranged between the first buffer tank 16 and the second buffer tank 17. The first buffer tank 16 is provided with a ninth pressure sensor, and the second buffer tank 17 is provided with a tenth pressure sensor and a ninth pressure relief valve. The outlet of the second buffer tank 17 is connected through a single-layer pipe with a low-temperature flow controller 21, which is used for conveying and regulating the low-temperature gas into the second regenerator 15 for precooling. The outlet of the second buffer tank 17 is connected through a single-layer pipe with a normal-temperature flow controller 22, which is used for conveying and regulating the high-temperature gas into the low-temperature distribution unit.
[0041] The outlet of the refrigerator is provided with a cold source heater for mixing the high-temperature gas passing through the normal-temperature flow controller 22 and the low-temperature gas passing through the low-temperature flow controller 21, so as to regulate the temperature of the working medium at the outlet of the refrigerator. The outlet of the cold source heater and the inlet of a low-temperature switch valve V13 are connected through a pipe, and a first low-temperature switch valve V15 is arranged for a first-stage precooling closed cycle of the low-temperature cold source unit, and a twelfth temperature sensor is arranged.
[0042] The cold source valve box is connected with the first vacuum pump through a pipe, and an electromagnetic valve for controlling the start and stop of the interlayer vacuumization of the cold source valve box is arranged therebetween. The outside of the cold source valve box is connected with a first vacuum gauge 18 for monitoring the vacuum degree of the interlayer of the cold source valve box.
[0043] The inlet pipe of the first buffer tank 16 is sequentially connected with a first check valve, a first diaphragm valve BV1, a pressure reducing valve and a filter 25 for nitrogen supplement of the pipe system. The inlet pipe of the first buffer tank 16 is connected with a second diaphragm valve BV2 for vacuumization displacement of the pipe of the low-temperature cold source unit.
[0044] The low-temperature distribution unit comprises a distribution valve box, a working target disc and a precooling target disc. The distribution valve box is connected with the second vacuum pump through a pipe, and a second electromagnetic valve for controlling the start and stop of the interlayer vacuumization of the cold source valve box is arranged. The outside of the low-temperature valve box is connected with a second vacuum gauge 19 for monitoring the vacuum degree of the interlayer of the distribution valve box.
[0045] The inlet of a second low-temperature switch valve V16 is connected with the outlet of the low-temperature cold source unit, and the outlet thereof is connected with the inlet of the low-temperature cold source unit, which serves as a switch control of a second-stage precooling pipe. The outlet of the low-temperature cold source unit is provided with a first temperature sensor, a first pressure sensor and a first pressure relief valve SRV1.
[0046] The pipeline system in which the working target disk 100 is located is sequentially connected with a first low-temperature throttle valve TV1, a low-temperature switch valve V3, the working target disk 100, and a low-temperature switch valve V5. The inlet of the first low-temperature throttle valve TV1 is connected with the outlet of the low-temperature cold source unit, and the outlet of the low-temperature switch valve V5 is connected with the inlet of the low-temperature cold source unit. The low-temperature throttle valve TV1 is used for controlling the temperature of the working medium entering the working target disk. The outlet of the low-temperature switch valve V5 is provided with a seventh pressure sensor.
[0047] The inlet of a third low-temperature switch valve V17 is connected with the outlet of the first low-temperature throttle valve TV1, and the outlet thereof is connected with the inlet of the low-temperature cold source unit, serving as a switch control of the third pre-cooling pipeline. The outlet of the first low-temperature throttle valve TV1 is provided with a third temperature sensor, a third pressure sensor, and a third pressure relief valve SRV3.
[0048] The pipeline between the inlet of the working target disk 100 and the outlet of the low-temperature switch valve V3 is provided with a fourth pressure sensor, a fourth pressure relief valve SRV4, and a low-temperature switch valve V11. The outlet of the working target disk is provided with a fourth pressure sensor.
[0049] The pipeline system in which the pre-cooling target disk 200 is located is sequentially connected with a low-temperature throttle valve TV2, a low-temperature switch valve V4, the pre-cooling target disk 200, and a low-temperature switch valve V6. The inlet of the low-temperature throttle valve TV2 is connected with the outlet of the low-temperature cold source unit, and the outlet of the low-temperature switch valve V6 is connected with the inlet of the low-temperature cold source unit. The low-temperature throttle valve TV2 is used for controlling the temperature of the working medium entering the pre-cooling target disk. The inlet of a low-temperature switch valve V18 is connected with the outlet of the second low-temperature throttle valve TV2, and the outlet thereof is connected with the inlet of the low-temperature cold source unit, serving as a switch control of the third pre-cooling pipeline. Specifically, the outlet of the low-temperature throttle valve TV2 is provided with a second temperature sensor, a second pressure sensor, and a first pressure relief valve SRV2. The pipeline between the inlet of the pre-cooling target disk and the outlet of the low-temperature switch valve V4 is provided with a fifth pressure sensor, a fifth pressure relief valve SRV5, and a low-temperature switch valve V12. The outlet of the pre-cooling target disk is provided with a fifth pressure sensor.
[0050] The pipeline system in which the working target disk is located is sequentially connected with a second check valve, a third diaphragm valve, a target disk inlet heater, a low-temperature switch valve V7, the working target disk, a low-temperature switch valve V9, a target disk outlet heater, and a third check valve. The inlet of the target disk inlet heater is provided with a sixth pressure sensor, and the outlet thereof is provided with a sixth temperature transmitter. The outlet of the target disk outlet heater is provided with a seventh temperature sensor. The pipeline system in which the pre-cooling target disk is located is sequentially connected with a second check valve, a third diaphragm valve, a target disk inlet heater, a low-temperature switch valve V8, the working target disk, a low-temperature switch valve V10, a target disk outlet heater, and a third check valve.
[0051] The first relief valve SRV1, the first relief valve SRV2, the third relief valve SRV3, the fourth relief valve SRV4, the fifth relief valve SRV5, the sixth relief valve SRV6 and the seventh relief valve SRV7 connected with the internal pipelines of the low-temperature valve box are connected with the first muffler and the second muffler after being collected. The nitrogen discharge pipeline of the temperature return pipeline is also collected with the discharge pipeline of the relief valve and discharged through the second muffler.
[0052] A first electromagnetic valve is arranged between the cold source valve box and the first vacuum pump for controlling the opening and closing of the suction pipeline. The cold source valve box is connected with a first vacuum gauge 18 for monitoring the vacuum degree of the internal interlayer of the cold source valve box. When the vacuum degree value is higher than the set value, the feedback signal is transmitted to the first electromagnetic valve and the first vacuum pump. According to the principle of starting the first vacuum pump first and then opening the first electromagnetic valve, the external air is prevented from entering the internal cold source valve box, so that the cold source valve box is prevented from instant frosting and dewing. When the vacuum degree value reaches the set value, the first electromagnetic valve is closed first and then the first vacuum pump is closed, so that the internal vacuum is maintained. Through the measurement of the pressure value in the pipeline, the automatic air supply function is realized, the highly automatic operation of the system is completely realized, the operation difficulty of the workers is completely solved, the hands of the workers are liberated, and the work efficiency is improved.
[0053] Two regenerators are arranged in the cold source valve box, which are a first regenerator 14 and a second regenerator 15. The two regenerators are connected in series to ensure sufficient heat exchanger area. The two regenerators exchange heat between the low-temperature return gas medium from the low-temperature distribution unit and the external normal-temperature gas, maximize the use of the cold quantity of the return gas, realize the recovery and energy saving of the cold quantity, make the working medium entering the refrigerator obtain a lower temperature, better play the cold quantity of the refrigerator, make the output circulating working medium have a lower temperature, and have higher cold quantity delivery efficiency and larger cold quantity in the same temperature zone compared with other devices. The inlet of the return gas pipeline of the regenerator is provided with an eighth temperature sensor and an eighth pressure sensor for monitoring the temperature and pressure of the return gas inlet. The outlet of the return gas pipeline of the regenerator is provided with a ninth temperature sensor, and the first buffer tank 16 is provided with a ninth pressure sensor for monitoring the temperature of the return gas outlet. The inlet of the gas inlet pipeline of the regenerator is provided with a tenth temperature sensor, and the second buffer tank 17 is provided with a tenth pressure sensor for monitoring the temperature and pressure of the gas inlet. The outlet of the gas outlet pipeline of the regenerator is provided with an eleventh temperature sensor and an eleventh pressure sensor for monitoring the temperature and pressure of the gas outlet.
[0054] The power of the low-temperature cold source unit is provided by a circulating pump, and a scroll compressor is selected as the circulating power of the driving working medium. In order to ensure the pressure stability of the pipeline system and reduce the pressure fluctuation of the pipeline system, a first buffer tank 16 is arranged at the inlet of the circulating pump, and a second buffer tank 17 is arranged at the outlet of the circulating pump. The volume of the two buffer tanks is 250L. Since the circulating pump is turned on, the inlet is low temperature and the outlet is high pressure, and a ninth pressure relief valve is arranged on the second buffer tank, which can discharge the working medium in the pipeline system when the pressure is too high, avoid equipment damage, and ensure the personal safety of the operator.
[0055] The inlet pipeline of the first buffer tank 16 is equipped with an automatic air supplement device, which sequentially includes a filter 25, a pressure reducing valve, a first diaphragm valve BV1 and a first check valve. The filter 25 removes water in the supplemented nitrogen gas. Since the freezing point of water is 0℃, if water enters the pipeline system, it will cause pipeline blockage, flow reduction or even zero. If water enters the internal part of the refrigerator, the low-temperature on-off valve and the low-temperature regulating valve, it will cause damage to the refrigerator or the valve. The function of the pressure reducing valve is to control the pressure of the nitrogen gas entering the pipeline system by adjusting the handle of the pressure reducing valve, so as to avoid damage to the pipeline due to excessive pressure. The first diaphragm valve BV1 is mainly used for opening and closing when nitrogen is supplemented. The diaphragm valve is interlocked with the ninth pressure sensor, and the ninth pressure sensor is used to monitor the pressure value of the nitrogen gas in the pipeline system. When the pressure value is lower than the set value, the feedback signal is transmitted to the first diaphragm valve BV1 to start the first diaphragm valve BV1 to supplement nitrogen into the pipeline system. When the pressure value reaches the set value, the first diaphragm valve BV1 is closed, and the automatic supplement of the working medium in the pipeline system is completed. The system realizes high automation operation, completely solves the problem of manual operation, liberates the hands of workers, and improves the work efficiency. In order to avoid the reverse overflow of nitrogen gas in the pipeline system, a first check valve is arranged at the outlet of the first diaphragm valve BV1. The first check valve allows gas to flow from outside to inside, but not in the opposite direction, thereby ensuring the outflow of gas in the pipeline.
[0056] The outlet of the second buffer tank 17 is provided with two working medium output pipelines, one of which passes through the low-temperature flow controller 21 to enter the gas inlet of the second regenerator 15, exchanges heat with the low-temperature return gas, and makes the low-temperature fluid enter the inlet of the refrigerator. The refrigerator exchanges heat with the internal cold head and the self heat exchanger, further cools the low-temperature fluid, and thus outputs circulating working medium with lower temperature, thereby reducing the cold loss inside the refrigerator. The other passes through the normal-temperature flow controller 22 to enter the outlet of the refrigerator. According to the value of the twelfth temperature sensor at the outlet of the refrigerator, the opening degrees of the low-temperature flow controller 21 and the normal-temperature flow controller 22 are adjusted, so as to obtain the required output working medium temperature. Considering the need for output of high-temperature working medium, a cold source heater is arranged at the outlet of the refrigerator. When the device needs higher temperature, the cold source heater is started. The heater uses direct current power to output power to heat the working medium. By setting the required working medium temperature, the powered working medium can be adaptively output, so as to realize the output of high-temperature working medium, avoid the temperature fluctuation caused by the mixing of high-temperature and low-temperature two-phase working medium, shorten the system stabilization time, and meet the precise control of the low-temperature and high-temperature continuous temperature zones.
[0057] The circulating system is provided with multi-stage pre-cooling pipelines, which facilitates step-by-step detection and ensures the safety of the target disc. In order to improve production efficiency, two low-temperature injection pipelines are designed, which can simultaneously work the target disc and the pre-cooling target disc to transport cold energy. The pre-cooling target disc is first pre-cooled, and after the pre-cooling treatment is completed, the process is transferred to the working target disc to complete the final low-temperature injection. An independent temperature return pipeline is designed to quickly return the temperature of the target disc.
[0058] Firstly, primary precooling is run, and the working medium circulates along the primary precooling pipeline, the pipeline connection is in turn the first regenerator 14 back gas port, the second regenerator 15 first regenerator 14 back gas port, the first buffer tank 16, the circulating pump, the second buffer tank 17, the low-temperature flow controller 21, the second regenerator 15 gas inlet, the first regenerator 14 gas inlet, the refrigerator, and the low-temperature switch valve V15. The primary precooling is mainly used for self-circulation start-up cooling of the low-temperature cold source unit, the refrigerator is started to reduce the working medium from normal temperature to the lowest temperature -150℃, and the operation of the cold source unit in the cooling process is monitored. After the primary precooling is completed, the low-temperature switch valve V15 is closed, secondary precooling is started, and the working medium circulates along the secondary precooling pipeline, the pipeline connection is in turn the low-temperature switch valve V14, the first regenerator 14 back gas port, the second regenerator 15 first regenerator 14 back gas port, the first buffer tank 16, the circulating pump, the second buffer tank 17, the low-temperature flow controller 21, the second regenerator 15 gas inlet, the first regenerator 14 gas inlet, the refrigerator, the low-temperature switch valve V13, and the low-temperature switch valve V16. The secondary precooling is mainly used for self-circulation start-up cooling of the low-temperature cold source unit and the low-temperature distribution unit, the low-temperature cold source unit and the low-temperature distribution unit are connected through the low-temperature double-layer pipe, the -150℃ low-temperature working medium generated by starting the refrigerator is transported to the secondary pipeline of the low-temperature distribution valve box, and the operation of the working medium in the process of being transported from the low-temperature cold source unit to the low-temperature distribution unit is monitored.
[0059] After the secondary precooling is completed, the low temperature switch valve V16 is closed, and the tertiary precooling is started. The tertiary precooling is parallel to two paths, which are the working target disc tertiary precooling and the precooling target disc tertiary precooling. The working target disc tertiary precooling circulates along the tertiary precooling pipeline, and the pipeline is connected in sequence as the low temperature switch valve V14, the first regenerator 14 return gas port, the second regenerator 15 first regenerator 14 return gas port, the first buffer tank 16, the circulating pump, the second buffer tank 17, the low temperature flow controller 21, the second regenerator 15 gas inlet, the first regenerator 14 gas inlet, the refrigerator, the low temperature switch valve V13, the low temperature throttle valve TV1, and the low temperature switch valve V17. The working target disc tertiary precooling is mainly used for regulating the opening of the low temperature regulating valve TV1 to complete the throttling and cooling of the low temperature working medium, and the lowest temperature after throttling of the low temperature regulating valve TV1 is obtained by monitoring the third temperature sensor. The precooling target disc tertiary precooling circulates along the tertiary precooling pipeline, and the pipeline is connected in sequence as the low temperature switch valve V14, the first regenerator 14 return gas port, the second regenerator 15 first regenerator 14 return gas port, the first buffer tank 16, the circulating pump, the second buffer tank 17, the low temperature flow controller 21, the second regenerator 15 gas inlet, the first regenerator 14 gas inlet, the refrigerator, the low temperature switch valve V13, the low temperature throttle valve TV2, and the low temperature switch valve V18. The precooling target disc tertiary precooling is mainly used for regulating the opening of the low temperature regulating valve TV2 to complete the throttling and cooling of the low temperature working medium, and the lowest temperature after throttling of the low temperature regulating valve TV2 is obtained by monitoring the second temperature sensor. The lowest temperature of the same type of equipment in China can only reach-120℃, and the system has a wider application temperature range. The throttling and pressure reduction cooling technology is adopted, the low temperature throttle valve is arranged, and the nitrogen temperature is reduced to below-160℃ in a pressure reduction mode.
[0060] After the tertiary precooling is completed, the low temperature switch valve V17 and the low temperature switch valve V18 are closed, and the working target disc circulation system and the precooling target disc circulation system are started. The working target disc circulation system circulates along the working target disc circulation system pipeline, and the pipeline is connected in sequence as the low temperature switch valve V14, the first regenerator 14 return gas port, the second regenerator 15 first regenerator 14 return gas port, the first buffer tank 16, the circulating pump, the second buffer tank 17, the low temperature flow controller 21, the second regenerator 15 gas inlet, the first regenerator 14 gas inlet, the refrigerator, the low temperature switch valve V13, the low temperature throttle valve TV1, the low temperature switch valve V3, the working target disc, and the low temperature switch valve V5. The low temperature working medium is further throttled and cooled by the low temperature throttle valve TV1, is delivered to the working target disc, and the low temperature working target disc is used for low temperature injection.
[0061] The inlet of the working target disc is provided with a fourth relief valve SRV4. When the pressure value of the working medium in the pipeline entering the low-temperature target disc exceeds a certain value, the discharge pressure of the fourth relief valve SRV4 is reached, the working medium is discharged from the pipeline, and the working target disc is protected from damage caused by excessively high pipeline pressure. A low-temperature switch valve V11 is also provided for pipeline evacuation and replacement of the working target disc circulation system. The working medium of the pre-cooling target disc circulation system circulates along the pre-cooling target disc circulation system pipeline, and the pipeline connection is in sequence: low-temperature switch valve V14, first regenerator 14 gas return port, second regenerator 15 first regenerator 14 gas return port, first buffer tank 16, circulating pump, second buffer tank 17, low-temperature flow controller 21, second regenerator 15 gas inlet, first regenerator 14 gas inlet, refrigerator, low-temperature switch valve V13, low-temperature throttle valve TV2, low-temperature switch valve V4, pre-cooling target disc, and low-temperature switch valve V6. The low-temperature working medium is further throttled and cooled by the low-temperature throttle valve TV2, and is delivered to the pre-cooling target disc. The low-temperature pre-cooling target disc is used for process pre-cooling. The inlet of the pre-cooling target disc is provided with a fifth relief valve SRV5. When the pressure value of the working medium in the pipeline entering the pre-cooling target disc exceeds a certain value, the discharge pressure of the fifth relief valve SRV5 is reached, the working medium is discharged from the pipeline, and the pre-cooling target disc is protected from damage caused by excessively high pipeline pressure. The low-temperature distribution unit outlet is provided with a seventh relief valve SRV7 for overpressure relief protection of the gas return pipeline. A low-temperature switch valve V12 is also provided for pipeline evacuation and replacement of the pre-cooling target disc circulation system.
[0062] The low-temperature distribution unit is provided with independent target disc warming pipelines, including a working target disc warming system and a pre-cooling target disc warming system. The connection pipeline of the working target disc warming system is in sequence: normal-temperature nitrogen gas, second one-way valve, third diaphragm valve, target disc inlet heater, low-temperature switch valve V7, working target disc, low-temperature switch valve V9, target disc outlet heater, and third one-way valve. The third diaphragm valve is used to control the opening and closing of the working target disc warming system. The second one-way valve prevents reverse flow of nitrogen gas in the pipeline. A sixth relief valve SRV6 is also provided for safe discharge when the working target disc warming system is over-pressured, protecting the working target disc. The target disc outlet heater can further heat the low-temperature nitrogen gas after heat exchange with the working target disc, preventing the low-temperature nitrogen gas from causing pipeline frosting or even icing, which would eventually melt into water, affecting equipment operation. A third one-way valve is provided at the outlet to prevent external air from flowing into the target disc, causing damage to the target disc due to icing caused by moisture in the air. The connection pipeline of the pre-cooling target disc warming system is in sequence: normal-temperature nitrogen gas, second one-way valve, third diaphragm valve, target disc inlet heater, low-temperature switch valve V8, pre-cooling target disc, low-temperature switch valve V10, target disc outlet heater, and third one-way valve.
[0063] A second electromagnetic valve is arranged between the distribution valve box and the second vacuum pump, and is used to control the opening and closing of the suction pipe. The distribution valve box is connected with a second vacuum gauge 19, which is used to monitor the vacuum degree of the interlayer of the distribution valve box. When the vacuum degree is higher than a set value, a feedback signal is transmitted to the second electromagnetic valve and the second vacuum pump. According to the principle of first starting the second vacuum pump and then opening the second electromagnetic valve, the external air is prevented from entering the low-temperature valve box, so as to prevent the low-temperature valve box from instant frosting and dewing. When the vacuum degree reaches the set value, the second electromagnetic valve is closed first, and then the second vacuum pump is closed, so as to maintain the internal vacuum.
[0064] All the closable pipelines in the system are provided with safety relief valves. When the pressure of the working medium in the pipeline is too high during the operation of the system, the safety relief valves can discharge the working medium outward, so as to prevent the pipeline from being damaged due to the excessively high pressure, and to ensure the safety of the personnel. The internal pipelines of the distribution valve box in the low-temperature distribution unit are sequentially connected with a first relief valve SRV1, a second relief valve SRV2, a third relief valve SRV3, a fourth relief valve SRV4, a fifth relief valve SRV5, a sixth relief valve SRV6 and a seventh relief valve SRV7. The relief valves can solve the problem of excessively high nitrogen pressure in the segmented pipeline, effectively protect the working target disc and the pre-cooling target disc, and are connected with the first muffler and the second muffler after being collected, so as to be subjected to noise reduction treatment. After the nitrogen is warmed and discharged, it is also collected with the discharge pipe of the relief valve and discharged through the second muffler.
[0065] The embodiment has the following advantages:
[0066] 1. The system selects nitrogen as the circulating working medium, which has the advantages of low cost, easy acquisition, non-toxicity, harmlessness and non-pollution, and can meet the needs of long-period production of semiconductors. The technical problem to be solved is to provide a variable-temperature cycle temperature control system with wide temperature range, large refrigerating capacity, high temperature control precision, long service life and simple operation, which has great significance in the field of semiconductor manufacturing. The system can be widely applied to the fields of semiconductor manufacturing and testing, is suitable for the equipment of semiconductor production lines, and can uninterruptedly provide low-temperature medium with controllable temperature, so as to ensure the process processing temperature required by the equipment chambers of etching, ion implantation and diffusion processes in the semiconductor factory.
[0067] 2. The system adopts a regenerative closed cycle structure design, can maximize the recovery and energy utilization of cold energy, can realize large-flow and large-cold-quantity delivery, has higher cold energy delivery efficiency and larger cold energy in the same temperature zone than other equipment.
[0068] 3. The output temperature of the control fluid is controlled by two methods of high and low temperature fluid mixing and thermal opposition, the working medium is completely heated into gas by the heater, then the gas is divided into two paths by the normal temperature flow controller 22 and the low temperature flow controller 21, the two paths are mixed at the outlet of the refrigerator, and finally the outlet temperature is accurately controlled by adjusting the power of the heater at the outlet, meanwhile, the method can avoid the temperature fluctuation caused by the impact of the mixing of high and low temperature two-phase working medium, shorten the stable time of the system, and realize the accurate temperature control of the fluid working medium.
[0069] 4. The throttling pressure reduction and temperature reduction technology is adopted, the low temperature throttling valve is arranged to reduce the temperature of nitrogen to below-160 DEG C through pressure reduction, the minimum temperature of the domestic same type equipment can only reach-120 DEG C, and the system has a wider application temperature range.
[0070] 5. On the system flow, multi-stage pre-cooling design is carried out, the target plate is detected step by step, and the safety of the target plate is ensured; in order to improve the low temperature injection efficiency in the semiconductor production process, two low temperature injection pipelines are designed, the cold quantity of the target plate and the pre-cooled target plate can be transported at the same time, the pre-cooled target plate is pre-cooled first, after the pre-cooling is completed, the process is transferred to the working target plate, and the final low temperature injection is completed.
[0071] 6. The independent temperature recovery pipeline system of the target plate is designed, the temperature of the normal temperature nitrogen is rapidly increased after passing through the heater, becomes hot nitrogen, the heated nitrogen is transported to the low temperature target plate, the low temperature target plate is recovered by using the hot nitrogen, the rapid recovery of the low temperature target plate can be realized, and the working efficiency is greatly improved. Meanwhile, the outlet gas heater is further arranged at the outlet of the target plate, the low temperature nitrogen after heat exchange with the low temperature target plate is further heated, and the frosting or even icing of the pipeline caused by the low temperature nitrogen after being discharged is prevented.
[0072] 7. All the closable pipelines in the system are provided with safety relief valves, when the pressure of the working medium in the pipeline is too high during the system operation, the safety relief valve can be discharged to the outside, the equipment is prevented from being damaged due to the too high pressure of the pipeline, and the safety of the personnel is ensured.
[0073] 8. The system adopts the interlocking feedback design, the automatic air supply function can be realized by measuring the pressure value in the pipeline, and the pump is automatically started to be pumped by measuring the value of the interlayer vacuum degree. The design completely realizes the highly automatic operation of the system, completely solves the operation difficulty of the manual operation, liberates the hands of the workers, and improves the working efficiency.
[0074] The above merely describes the preferred specific implementation manner of the utility model, but the protection scope of the utility model is not limited to this, any skilled person in the art can make equivalent replacement or change according to the technical scheme and the utility model concept of the utility model within the technical range disclosed by the utility model, which should be covered in the protection scope of the utility model.
Claims
1. A low-temperature heat source unit based on a high-low temperature hybrid, characterized by, It comprises: a cold source valve box (1), a refrigerator (2), a circulating pump (3), a first vacuum pump (4), a low-temperature pipeline and a normal-temperature pipeline; The first vacuum pump (4) is used for vacuumizing the cold source valve box (1), the cold source valve box (1) is provided with a first heat recovery outlet and a first cold quantity inlet connected with the input end and the output end of the refrigerator (2) respectively, the cold source valve box (1) is provided with a heat recovery device, a first outlet on-off valve V13 and a first inlet on-off valve V14, the first outlet on-off valve V13 is connected with the first cold quantity inlet; the first heat recovery outlet is communicated with the output end of the circulating pump (3) through the high-temperature channel of the heat recovery device, the low-temperature pipeline and the output end of the circulating pump (3), the input end of the circulating pump (3) is communicated with the first inlet on-off valve V14 through the low-temperature channel of the heat recovery device, the normal-temperature pipeline is connected with the output end of the circulating pump (3) and the output end of the refrigerator (2) respectively, the normal-temperature pipeline is provided with a normal-temperature flow controller (22), and the low-temperature pipeline is provided with a low-temperature flow controller (21).
2. The high-low temperature hybrid based cryogenic source unit of claim 1, wherein, The cold source valve box (1) is further provided with a cold source heater (20), which is arranged on the pipeline between the first outlet on-off valve V13 and the first cold quantity inlet. 3.The high-low temperature hybrid based cryogenic source unit of claim 1, wherein, The cold source valve box (1) is provided with a first heat recovery device (14) and a second heat recovery device (15) arranged in series.
4. The high-low hybrid based cryogenic source unit of claim 1, wherein, The cold source valve box (1) is further provided with a first-stage pre-cooling pipeline (11), the two ends of the first-stage pre-cooling pipeline (11) are connected with the upstream pipeline of the first outlet on-off valve V13 and the downstream pipeline of the first outlet on-off valve V13 respectively, and a first-stage low-temperature on-off valve V15 is arranged on the first-stage pre-cooling pipeline (11).
5. The high-low hybrid based cryogenic source unit of claim 1, wherein, It further comprises a first buffer tank (16), which is arranged on the pipeline between the circulating pump (3) and the low-temperature channel of the heat recovery device.
6. The high-low temperature hybrid based cryogenic source unit of claim 5, wherein, It further comprises a gas supplementing device, which is connected to the pipeline between the first buffer tank (16) and the low-temperature channel of the heat recovery device, and is used for supplementing gas into the loop.
7. A temperature control system based on high and low temperature mixing, characterized in that, It comprises: The low-temperature cold source unit according to any one of claims 1-6.
8. The high-low temperature hybrid based temperature control system of claim 7, wherein, It further comprises a low-temperature distribution unit, which comprises a distribution valve box (5) and a second vacuum pump (6), the second vacuum pump (6) is used for vacuumizing the distribution valve box (5), the distribution valve box (5) is provided with a cold quantity outlet connected with a target disc, a heat recovery inlet and a second cold quantity inlet and a second heat recovery outlet connected with the cold source valve box (1), a cold quantity pipeline is formed between the cold quantity outlet and the second cold quantity inlet, and a heat recovery pipeline is formed between the heat recovery inlet and the second heat recovery outlet.
9. The high-low temperature hybrid based temperature control system of claim 8, wherein, A low-temperature throttle valve TV is further arranged on the cold quantity pipeline.