Silicon carbide ceramic plate polishing tool

Abstract

A silicon carbide ceramic plate polishing tool comprises a mounting frame, a sliding guide rail is vertically arranged on the front side face of the mounting frame, a mounting plate is slidably connected to the outer surface of the sliding guide rail through a sliding block, a polishing motor is mounted below the mounting plate, and a limiting plate is arranged above the sliding guide rail and fixedly mounted on the front side face of the mounting frame. A guide hole is formed in the middle of the limiting plate, a guide column is fixedly mounted on the upper surface of the mounting plate, penetrates through the guide hole and is slidably connected with the limiting plate, the outer surface of the guide column is sleeved with a buffer spring, the two ends of the buffer spring make contact with the mounting plate and the limiting plate respectively, and a grinding head of the grinding motor makes contact with the upper surface of the silicon carbide ceramic plate. The grinding device overcomes the defects in the prior art, and the grinding head of the grinding motor is in flexible contact with the surface of the silicon carbide ceramic plate; therefore, the device can adapt to tiny fluctuation of the surface of the silicon carbide ceramic plate in the polishing process, surface damage caused by uneven stress is avoided, and it is guaranteed that polishing is uniform and efficient.

Description

TECHNICAL FIELD

[0001] The utility model relates to ceramic processing equipment technical field, concretely relates to a silicon carbide ceramic plate polishing frock. BACKGROUND

[0002] The silicon carbide ceramic plate is the product that adopts this high performance material, through a series of precision process manufacture. Silicon carbide itself has outstanding physical and chemical properties, including excellent high temperature resistance, high strength, good thermal conductivity and excellent impact resistance. These characteristics make silicon carbide ceramic plate have wide application in multiple industrial fields.

[0003] And the present traditional polishing equipment usually fixed polishing head, but for having certain cambered surface shape or the carbonized silicon ceramic plate with height difference, the polishing head is easy to cause the force of polishing to be different when polishing, and the pressure control is unstable, thereby leading to the poor polishing uniformity of ceramic plate surface. In turn lead to workpiece surface damage or low efficiency. UTILITY MODEL CONTENT

[0004] In view of the deficiencies of the prior art, the utility model provides a silicon carbide ceramic plate polishing frock, which overcomes the deficiencies of the prior art, is reasonable in design, makes the polishing head of the polishing motor and the surface of the silicon carbide ceramic plate keep flexible contact, so that the small ups and downs of the surface of the silicon carbide ceramic plate can be self-adapted in the polishing process, surface damage caused by uneven stress is avoided, and uniform and efficient polishing is ensured.

[0005] To achieve the above object, the utility model realizes through the following technical scheme:

[0006] A silicon carbide ceramic plate polishing frock, including the mounting bracket, the mounting bracket front side is vertically provided with sliding guide rail, the sliding guide rail outer surface is slidably connected with the mounting plate through the sliding block, the mounting plate lower portion is installed with the polishing motor, the sliding guide rail upper portion is provided with the limit board, the limit board is fixedly installed on the mounting bracket front side, the limit board middle portion is opened with the guide hole, the mounting plate upper surface is fixedly installed with the guide column, the guide column passes through the guide hole and is slidably connected with the limit board, the guide column outer surface is sleeved with the buffer spring, the buffer spring both ends are respectively in contact with the mounting plate and the limit board, the polishing head of the polishing motor is in contact with the upper surface of the silicon carbide ceramic plate.

[0007] Preferably, two mutually parallel adjusting plates are fixedly installed below the front side of the mounting plate, arc-shaped holes are formed in the surfaces of the adjusting plates, through holes are formed in the lower sides of the mounting plate, an adjusting seat is fixedly installed at the rear side of the polishing motor, a rotating shaft is fixedly installed at the middle of the left and right sides of the adjusting seat, the rotating shaft penetrates through the through hole and is rotationally connected with the mounting plate, the center of the arc-shaped hole coincides with the center of the rotating shaft, the adjusting seat is movably connected between the two adjusting plates, and a locking bolt is movably connected in the arc-shaped hole.

[0008] Preferably, a limiting block is fixedly installed at the lower end of the front side of the mounting frame, and the limiting block is in contact with the bottom of the sliding guide rail.

[0009] The utility model provides a kind of silicon carbide ceramic plate polishing frock, with the following beneficial effects: by installing polishing motor on mounting plate, and make mounting plate be slidably connected with mounting frame by sliding block and sliding guide rail, so that the entire polishing motor can have certain displacement in vertical direction. In addition, by setting limiting plate and buffer spring, provide a vertical direction elastic support for mounting plate by buffer spring, so that mounting plate can always have a downward elastic force, so that the polishing head of polishing motor and silicon carbide ceramic plate surface keep flexible contact;And by the sliding connection effect of mounting plate and mounting frame, the polishing motor has vertical self-adapting ability. It can adapt to the slight ups and downs of silicon carbide ceramic plate surface in polishing process, avoid surface damage caused by uneven stress, ensure that polishing is uniform and efficient. At the same time, the elastic adjustment function of buffer spring effectively absorbs vibration in polishing process, prolongs equipment service life, improves processing precision. BRIEF DESCRIPTION OF DRAWINGS

[0010] In order to more clearly illustrate the technical scheme of the utility model or the prior art, the following will briefly introduce the drawings needed to be used in the description of the prior art.

[0011] Fig. 1 The structural schematic diagram of the utility model;

[0012] Fig. 2 The partial structural schematic diagram of the utility model;

[0013] Explanation of reference numerals in the drawing:

[0014] 1, mounting frame;2, sliding guide rail;3, mounting plate;4, polishing motor;5, limiting plate;6, guide column;7, buffer spring;8, limiting block;9, sliding block;31, adjusting plate;32, arc-shaped hole;41, adjusting seat;42, rotating shaft. DETAILED DESCRIPTION

[0015] To make the objectives, technical solutions, and advantages of this utility model clearer, the technical solutions of this utility model will be clearly and completely described below with reference to the accompanying drawings.

[0016] Example 1, as Figs. 1-2 As shown, a silicon carbide ceramic plate grinding fixture includes a mounting frame 1. A sliding guide rail 2 is vertically arranged on the front side of the mounting frame 1. A mounting plate 3 is slidably connected to the outer surface of the sliding guide rail 2 via a slider 9. A grinding motor 4 is installed below the mounting plate 3. A limit plate 5 is arranged above the sliding guide rail 2. The limit plate 5 is fixedly installed on the front side of the mounting frame 1. A guide hole is opened in the middle of the limit plate 5. A guide post 6 is fixedly installed on the upper surface of the mounting plate 3. The guide post 6 passes through the guide hole and is slidably connected to the limit plate 5. A buffer spring 7 is sleeved on the outer surface of the guide post 6. The two ends of the buffer spring 7 are in contact with the mounting plate 3 and the limit plate 5, respectively. The grinding head of the grinding motor 4 is in contact with the upper surface of the silicon carbide ceramic plate.

[0017] Working principle:

[0018] During operation, the mounting bracket 1 can be installed on the three-axis moving module. By controlling the three-axis moving module, the mounting bracket 1 and the grinding motor 4 can be moved, so that the grinding head of the grinding motor 4 gradually approaches and contacts the surface of the silicon carbide ceramic plate. Then, by controlling the three-axis moving module, the mounting bracket 1 can be moved horizontally, so that the grinding motor 4 can move and grind the surface of the silicon carbide ceramic plate.

[0019] In this embodiment, by mounting the grinding motor 4 on the mounting plate 3, and making the mounting plate 3 slidably connected to the mounting frame 1 via the slider 9 and the sliding guide rail 2, the grinding motor 4 can have a certain amount of displacement in the vertical direction. Furthermore, by setting a limiting plate 5 and a buffer spring 7, the buffer spring 7 provides a vertical elastic support for the mounting plate 3, ensuring that the mounting plate 3 always has a downward elastic force, thus maintaining flexible contact between the grinding head of the grinding motor 4 and the surface of the silicon carbide ceramic plate. Moreover, the sliding connection between the mounting plate 3 and the mounting frame 1 gives the grinding motor 4 a vertical self-adaptive capability. This allows it to adapt to the slight undulations on the surface of the silicon carbide ceramic plate during grinding, avoiding surface damage caused by uneven force and ensuring uniform and efficient grinding. Simultaneously, the elastic adjustment function of the buffer spring 7 effectively absorbs vibrations during grinding, extending the service life of the equipment and improving processing accuracy.

[0020] As a further preferred solution of the embodiment one, two mutually parallel adjusting plates 31 are fixedly installed below the front side of the mounting plate 3, the surface of the adjusting plate 31 is provided with an arc-shaped hole 32, two through holes are formed in the lower sides of the mounting plate 3, an adjusting seat 41 is fixedly installed at the rear side of the polishing motor 4, a rotating shaft 42 is fixedly installed at the middle of the left and right sides of the adjusting seat 41, the rotating shaft 42 penetrates through the through holes and is rotationally connected with the mounting plate 3, the center of the arc-shaped hole 32 coincides with the center of the rotating shaft 42, the adjusting seat 41 is movably connected between the two adjusting plates 31, and a locking bolt is movably connected in the arc-shaped hole 32, the end of the locking bolt penetrates through the arc-shaped hole 32 and abuts against the adjusting seat 41.

[0021] The rotating shaft 42 is arranged to enable the adjusting seat 41 to be adaptively rotated at an angle below the mounting plate 3, thereby ensuring the flexible adjustment of the polishing motor 4 at different polishing angles; and when the adjusting seat 41 is rotated to a suitable angle, the locking bolt can be screwed into the arc-shaped hole 32 and the end of the locking bolt can abut against the adjusting seat 41, thereby achieving the stable locking of the adjusting seat 41 and ensuring the stable operation of the polishing motor 4 at a specific angle, further improving the uniformity and consistency of the polishing effect.

[0022] As a further preferred solution of the embodiment one, a limiting block 8 is fixedly installed at the lower end of the front side of the mounting frame 1 and is in contact with the bottom of the sliding guide rail 2. The movement range of the mounting plate 3 can be effectively limited by the limiting block 8 to prevent excessive displacement and ensure the stability of the polishing process.

[0023] The above embodiments are only used to illustrate the technical solutions of the present application, but not to limit it; although the present application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that the technical solutions recorded in the foregoing embodiments can still be modified, or some technical features can be replaced by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the present application.

Claims

1. A grinding tool for a silicon carbide ceramic plate, characterized by: The application relates to a polishing device, which comprises a mounting frame (1), a sliding guide rail (2) vertically arranged on the front side of the mounting frame (1), a mounting plate (3) slidably connected to the outer surface of the sliding guide rail (2) through a sliding block (9), a polishing motor (4) mounted below the mounting plate (3), a limiting plate (5) arranged above the sliding guide rail (2), the limiting plate (5) being fixedly installed on the front side of the mounting frame (1), a guide hole being formed in the middle of the limiting plate (5), a guide column (6) fixedly installed on the upper surface of the mounting plate (3), the guide column (6) penetrating through the guide hole and being slidably connected with the limiting plate (5), a buffer spring (7) sleeved on the outer surface of the guide column (6), the buffer spring (7) being in contact with the mounting plate (3) and the limiting plate (5) at two ends respectively, and the polishing head of the polishing motor (4) being in contact with the upper surface of the silicon carbide ceramic plate.

2. The polishing tool for a silicon carbide ceramic plate according to claim 1, wherein: Two mutually-parallel adjusting plates (31) are fixedly installed below the front side of the mounting plate (3), arc-shaped holes (32) are formed in the surfaces of the adjusting plates (31), through holes are formed in the lower sides of the mounting plate (3), an adjusting base (41) is fixedly installed on the rear side of the polishing motor (4), rotating shafts (42) are fixedly installed in the middle of the left and right sides of the adjusting base (41), the rotating shafts (42) penetrate through the through holes and are rotatably connected with the mounting plate (3), the centers of the arc-shaped holes (32) coincide with the centers of the rotating shafts (42), the adjusting base (41) is movably connected between the two adjusting plates (31), locking bolts are movably connected in the arc-shaped holes (32), and the end portions of the locking bolts penetrate through the arc-shaped holes (32) and abut against the adjusting base (41).

3. The polishing tool for a silicon carbide ceramic plate according to claim 1, wherein: A limiting block (8) is fixedly installed at the lower end of the front side of the mounting frame (1), and the limiting block (8) is in contact with the bottom of the sliding guide rail (2).

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