Material uniformizing device for CVD (Chemical Vapor Deposition) furnace

Abstract

The utility model provides a material uniformizing device for a CVD (chemical vapor deposition) furnace. The material uniformizing device comprises a mounting component, the connecting assembly is connected to the bottom of the mounting assembly; the rotating shaft is rotationally arranged in the connecting assembly, a cleaning claw is connected to the outer wall of the rotating shaft, the face, close to the rotating shaft, of the cleaning claw is a bent face, and the tail end of the cleaning claw is of an acute-angle sharp structure; the material pushing rake is connected to the bottom of the connecting assembly, and a gap of the material pushing rake corresponds to the cleaning claw; wherein the material pushing rake is used for uniformly pushing a catalyst in the CVD furnace, the cleaning claw rotates through the rotating shaft and is inserted into a gap of the material pushing rake through an acute-angle sharp structure, and the gap of the material pushing rake is cleaned through a claw body of the cleaning claw. According to the utility model, the catalyst is bulldozed through the material pushing rake, so that the catalyst can be uniformly laid in the chemical vapor deposition furnace, and the cleaning claw rotates through the rotating shaft, so that the cleaning claw can correspondingly extrude out the catalyst accumulated in the gap of the material pushing rake, and the material pushing rake is cleaned.

Description

Technical Field

[0001] This utility model relates to the technical field of carbon nanotube processing equipment, and in particular to a homogenizing device for a CVD furnace. Background Technology

[0002] Chemical vapor deposition (CVD) furnaces are the core equipment for preparing carbon nanotubes. They grow carbon nanotubes on the substrate surface through the decomposition and reaction of gaseous precursors at high temperatures. The reaction chamber of a CVD furnace is typically made of stainless steel or other non-metallic materials.

[0003] In existing technologies, when preparing carbon nanotubes using a chemical vapor deposition furnace, a catalyst needs to be uniformly spread within the furnace. Traditional catalyst addition involves placing the catalyst in several feed pipes, extending these pipes into different positions within the furnace, and then pouring the catalyst into the furnace. However, this results in uneven catalyst distribution within the furnace, affecting the preparation of carbon nanotubes. Furthermore, when using tools like rakes to spread the catalyst, the gaps in the rakes can become clogged by carbon nanotube powder, hindering subsequent uniform catalyst distribution and making the rakes difficult to clean. Utility Model Content

[0004] Therefore, the purpose of this utility model is to provide a material homogenizing device for a CVD furnace to overcome the shortcomings of the prior art.

[0005] This utility model provides a material homogenizing device for a CVD furnace, comprising:

[0006] Install components;

[0007] A connecting component is attached to the bottom of the mounting component;

[0008] A rotating shaft is rotatably disposed within the connecting assembly. A cleaning claw is connected to the outer wall of the rotating shaft. The side of the cleaning claw near the rotating shaft is a curved surface, and the end of the cleaning claw is an acute-angled pointed structure.

[0009] A pusher rake is connected to the bottom of the connecting assembly, and the gap of the pusher rake is set to correspond to that of the cleaning claw;

[0010] The pusher rake is used to even out the catalyst in the CVD furnace. The cleaning claw rotates via the rotating shaft to insert into the gap of the pusher rake through the acute-angled pointed structure and cleans the gap of the pusher rake through the claw body.

[0011] Compared with the prior art, the beneficial effects of this utility model are: the catalyst is leveled by the pusher rake so that the catalyst can be evenly spread in the chemical vapor deposition furnace, and the cleaning claw is rotated by the rotating shaft so that the cleaning claw can squeeze out the carbon nanotube powder accumulated in the gap of the pusher rake to complete the cleaning of the pusher rake. Furthermore, the sharp-angled tip structure makes it easier to insert the cleaning claw into the gap of the pusher rake.

[0012] Furthermore, the mounting assembly includes a first mounting plate and a second mounting plate, the first mounting plate being connected to the top of the second mounting plate, and the connecting assembly being connected to the bottom of the second mounting plate.

[0013] Furthermore, the first mounting plate and the second mounting plate are integrally formed, and the length of the first mounting plate is shorter than that of the second mounting plate.

[0014] Furthermore, the mounting component is provided with mounting holes, which are disposed on the first mounting plate and the second mounting plate that are integrally formed.

[0015] Furthermore, an operating lever is provided on the mounting hole.

[0016] Furthermore, the connecting assembly includes a plurality of connecting cylinders, which are evenly connected to the bottom of the mounting assembly. The rotating shaft is rotatably disposed within the plurality of connecting cylinders, and the pusher rake is connected to the bottom of the plurality of connecting cylinders.

[0017] Furthermore, the movable plate is provided with connection holes. Attached Figure Description

[0018] Figure 1 This is a front view of the material homogenizing device for a CVD furnace in an embodiment of this utility model;

[0019] Figure 2 This is a rear view of the material homogenizing device for a CVD furnace in an embodiment of this utility model;

[0020] Figure 3 This is a side view of the material homogenizing device for a CVD furnace in an embodiment of the present invention;

[0021] Figure 4 This is a side view schematic diagram of the process of cleaning the gaps in the material homogenizing device for a CVD furnace in an embodiment of this utility model;

[0022] Figure 5 This is a schematic diagram of the movable plate and cleaning claw in an embodiment of the present invention.

[0023] Explanation of key component symbols:

[0024] 10. Mounting components; 11. First mounting plate; 12. Second mounting plate; 13. Mounting holes; 14. Operating lever;

[0025] 20. Connecting component; 21. Connecting cylinder;

[0026] 30. Rotating shaft; 31. Cleaning claw; 32. Movable plate; 33. Connecting hole;

[0027] 40. Pusher rake.

[0028] The following detailed description, in conjunction with the accompanying drawings, will further illustrate this utility model. Detailed Implementation

[0029] To facilitate understanding of this utility model, a more complete description will be given below with reference to the accompanying drawings. Several embodiments of this utility model are shown in the drawings. However, this utility model can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of this utility model will be more thorough and complete.

[0030] It should be noted that when a component is said to be "fixed to" another component, it can be directly on the other component or there may be an intervening component. When a component is said to be "connected to" another component, it can be directly connected to the other component or there may be an intervening component. The terms "vertical," "horizontal," "left," "right," and similar expressions used in this document are for illustrative purposes only.

[0031] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "and / or" as used herein includes any and all combinations of one or more of the associated listed items.

[0032] Please see Figures 1 to 5 The image shows a material leveling device for a CVD furnace in an embodiment of this utility model, including an installation component 10, a connecting component 20, a rotating shaft 30, and a pusher rake 40.

[0033] The connecting assembly 20 is connected to the bottom of the mounting assembly 10. The rotating shaft 30 is rotatably disposed within the connecting assembly 20. A cleaning claw 31 is connected to the outer wall of the rotating shaft 30. The side of the cleaning claw 31 near the rotating shaft 30 is curved, and the end of the cleaning claw 31 is a sharp-angled pointed structure. The pusher rake 40 is connected to the bottom of the connecting assembly 20. The gap of the pusher rake 40 is correspondingly set with the cleaning claw 31. The pusher rake 40 is used to push and even out the catalyst in the CVD furnace. The cleaning claw 31 rotates via the rotating shaft 30 to insert into the gap of the pusher rake 40 through the sharp-angled pointed structure and cleans the gap of the pusher rake 40 through the claw body of the cleaning claw 31.

[0034] It needs to be explained that the pusher 40 can spread the catalyst evenly in the chemical vapor deposition furnace by pushing the catalyst back and forth. However, during the process of pushing the catalyst back and forth, the pusher 40 will accumulate material in the gaps between the pusher 40, which will not only affect the spreading effect of the pusher 40, but also make it difficult to clean. The cleaning claw 31 can be rotated by the rotating shaft 30, so that one end of the cleaning claw 31 can squeeze out the accumulated material in the gaps between the pusher 40, thereby completing the cleaning of the pusher 40.

[0035] It is worth noting that during the cleaning process, the sharp-angled structure at the end of the cleaning claw 31 makes it easier for the end of the cleaning claw 31 to be inserted into the gap of the pusher rake 40, thereby making it easier to clean the gap of the pusher rake 40.

[0036] Specifically, in this embodiment, the mounting assembly 10 includes a first mounting plate 11 and a second mounting plate 12. The first mounting plate 11 is connected to the top of the second mounting plate 12, and the connecting assembly 20 is connected to the bottom of the second mounting plate 12. The first mounting plate 11 and the second mounting plate 12 are integrally formed. The length of the first mounting plate 11 is less than that of the second mounting plate 12. The mounting assembly 10 is provided with a mounting hole 13, which is provided on the integrally formed first mounting plate 11 and second mounting plate 12. An operating lever 14 is provided on the mounting hole 13.

[0037] It should be noted that the first mounting plate 11 and the second mounting plate 12 are integrally welded together. The mounting hole 13 is set on the integrally welded first mounting plate 11 and second mounting plate 12. The mounting hole 13 spans the first mounting plate 11 and the second mounting plate 12. An operating rod 14 can be installed on the mounting hole 13, so that the operating rod 14 can drive the pusher rake 40 through the first mounting plate 11, the second mounting plate 12 and the connecting component 20, so that the pusher rake 40 can perform catalyst leveling work.

[0038] Specifically, in this embodiment, the connecting component 20 includes a plurality of connecting cylinders 21, which are evenly connected to the bottom of the mounting component 10. The rotating shaft 30 is rotatably disposed within the plurality of connecting cylinders 21, and the pusher rake 40 is connected to the bottom of the plurality of connecting cylinders 21.

[0039] It should be explained that the connecting cylinder 21 is connected to the bottom of the second mounting plate 12. In specific implementation, the rotating shaft 30 rotates, so that the cleaning claw 31 can move back and forth in the gap of the pusher rake 40, thereby cleaning the gap of the pusher rake 40.

[0040] It is worth noting that the cleaning claw 31 has a curved surface on the side near the pusher rake 40, which allows the cleaning claw 31 to clean the higher parts of the gaps in the pusher rake 40, thereby facilitating the cleaning of the pusher rake 40.

[0041] In addition, a movable plate 32 is connected to the outer wall of the rotating shaft 30. The movable plate 32 has a bent structure and is provided with a connecting hole 33.

[0042] It should be explained that the connecting hole 33 on the movable plate 32 can be connected to the operating handle (not shown in the figure). The operating handle can easily pull the movable plate 32, so that the movable plate 32 can drive the cleaning claw 31 through the rotating shaft 30, so that the cleaning claw 31 can easily clean the gap of the pusher rake 40.

[0043] In summary, the material leveling device for a CVD furnace in the above embodiments of this utility model uses a pusher rake 40 to level the catalyst, so that the catalyst can be evenly spread in the chemical vapor deposition furnace. The cleaning claw 31 is rotated by the rotating shaft 30, so that the cleaning claw 31 can squeeze out the carbon nanotube powder or catalyst accumulated in the gap of the pusher rake 40 to complete the cleaning of the pusher rake 40. Furthermore, the sharp-angled tip structure allows the cleaning claw 31 to be inserted into the gap of the pusher rake 40 with less effort.

[0044] In the description of this specification, the references to terms such as "one embodiment," "some embodiments," "example," "specific example," or "some examples," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0045] The embodiments described above are merely illustrative of several implementations of this utility model, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of this utility model patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this utility model, and these all fall within the protection scope of this utility model. Therefore, the protection scope of this utility model patent should be determined by the appended claims.

Claims

1. A material homogenizing device for a CVD furnace, characterized in that, include: Install components; A connecting component is attached to the bottom of the mounting component; A rotating shaft is rotatably disposed within the connecting assembly. A cleaning claw is connected to the outer wall of the rotating shaft. The side of the cleaning claw near the rotating shaft is a curved surface, and the end of the cleaning claw is an acute-angled pointed structure. A pusher rake is connected to the bottom of the connecting assembly, and the gap of the pusher rake is set to correspond to that of the cleaning claw; The pusher rake is used to even out the catalyst in the CVD furnace. The cleaning claw rotates via the rotating shaft to insert into the gap of the pusher rake through the acute-angled pointed structure and cleans the gap of the pusher rake through the claw body.

2. The uniform material device for a CVD furnace according to claim 1, characterized by, The mounting assembly includes a first mounting plate and a second mounting plate, the first mounting plate being connected to the top of the second mounting plate, and the connecting assembly being connected to the bottom of the second mounting plate.

3. The material uniformizing device for a CVD furnace according to claim 2, wherein The first mounting plate and the second mounting plate are integrally formed, and the length of the first mounting plate is shorter than that of the second mounting plate.

4. The material uniformizing device for a CVD furnace according to claim 3, wherein The mounting component is provided with mounting holes, which are disposed on the first mounting plate and the second mounting plate that are integrally formed.

5. The material uniformizing device for a CVD furnace according to claim 4, wherein An operating lever is provided on the mounting hole.

6. The uniform material device for a CVD furnace according to claim 1, wherein The connecting assembly includes several connecting cylinders, which are evenly connected to the bottom of the mounting assembly. The rotating shaft is rotatably disposed inside the several connecting cylinders, and the pusher rake is connected to the bottom of the several connecting cylinders.

7. The uniform material device for a CVD furnace according to claim 1, wherein A movable plate is connected to the outer wall of the rotating shaft, and the movable plate has a bent structure.

8. The uniform material device for a CVD furnace according to claim 7, wherein The movable plate is provided with connection holes.

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