QDR tank with cleaning and detecting functions

Abstract

The utility model relates to the field of semiconductors, in particular to a QDR tank with cleaning and detecting functions, which comprises a cleaning tank with a top opening, a water inlet pipe is arranged on the side of the bottom of the cleaning tank, a water outlet is arranged at the bottom of the cleaning tank, and an overflow tank for containing liquid overflowing from the cleaning tank is fixedly mounted on the periphery of the top of the cleaning tank. The top of the cleaning tank is provided with two movable frames which are oppositely arranged left and right, the two movable frames are driven by a power mechanism to be close to or far away from each other, the two movable frames are each provided with a spraying pipe capable of rotating around the axis of the spraying pipe, and the spraying pipes horizontally extend in the direction perpendicular to the moving direction of the movable frames; the cleaning tank is further provided with an angle adjusting assembly used for driving the spraying pipe to rotate. In the process that the spraying pipes wash the wafer, the motor drives the positive and negative tooth lead screws to rotate alternately in the positive and negative directions, and then the two spraying pipes are driven to move alternately in the mode that the spraying pipes move and spray water mist at the same time.

Description

Technical Field

[0001] This utility model relates to the semiconductor field, specifically to a QDR tank with cleaning and detection. Background Technology

[0002] In wafer cleaning equipment, the QDR (Quick Drain) is an indispensable part. It is mainly used to clean the surface of wafers after production using DIW (Digital Diffusion Washing) or UPW (Upper Washing) to remove particulate impurities and residual chemicals from the wafer surface, thus making the wafer surface clean.

[0003] In the prior art, utility model patent application number CN202321330980.2 discloses a chip QDR cleaning tank, including a tank body, a filter base plate, a nitrogen device, and a spray device. The tank body is used to hold DI water. The filter base plate has multiple filter holes running through it. The nitrogen device includes an outlet, an inlet, and a nitrogen delivery section. The spray device includes a first water inlet pipe and a spray section, with the spray section located on the first water inlet pipe and facing inwards towards the tank body. After soaking and cleaning, the spray device is turned on to rinse the surface of the chip, removing residual chemicals and improving the cleaning effect.

[0004] However, the spray device of the QDR cleaning tank is fixed, which can easily leave spray dead zones, thereby reducing the cleaning effect on the wafer. Utility Model Content

[0005] The purpose of this invention is to provide a cleaning and inspection QDR tank, which can reduce spray dead zones and solve the defects mentioned in the background art.

[0006] To achieve the above objectives, this utility model provides the following technical solution:

[0007] A cleaning and detection QDR tank includes a cleaning tank with a top opening, a water inlet pipe on the bottom side of the cleaning tank, a drain outlet at the bottom of the cleaning tank, and an overflow tank fixedly installed on the top periphery of the cleaning tank to collect liquid overflowing from the cleaning tank. The top of the cleaning tank has two movable frames arranged opposite each other, driven by a power mechanism to move closer or further apart. Each of the two movable frames is equipped with a spray pipe that can rotate around its own axis. The spray pipes extend horizontally along a direction perpendicular to the movement of the movable frames. The cleaning tank also has an angle adjustment component for rotating the spray pipes.

[0008] As a further improvement, the angle adjustment assembly includes a torsion spring connected between the corresponding spray pipe and the movable frame. Gears are fixedly installed at one end of the two spray pipes in the same direction, and a rack is provided between the two gears. The rack is fixedly installed on the cleaning tank or the overflow tank. When the two movable frames approach each other, they drive the two gears to mesh with the rack.

[0009] As a further improvement, two support plates arranged opposite each other are fixedly installed at the front and rear ends of the overflow channel. A horizontally extending slide rod is fixedly installed between the two support plates at the front end, and the two movable frames are slidably connected to the slide rod. The power mechanism includes a positive and negative threaded rod driven by a motor and located between the two support plates at the rear end. The positive and negative threaded rod is arranged parallel to the slide rod, and the positive and negative threaded rod is provided with two external threads with opposite directions of rotation. The two movable frames are respectively threadedly connected to the external threads with different directions of rotation of the positive and negative threaded rod.

[0010] As a further improvement, a drain pipe is fixedly installed at the bottom of the overflow trough, and the drain pipe is connected to a water resistance meter through a tee connector.

[0011] As a further improvement, a U-shaped frame is fixedly installed on the bottom wall of the cleaning tank located below the drain outlet. A cylinder with an upwardly extending piston rod is installed inside the U-shaped frame, and a sealing valve for sealing the drain outlet is fixedly installed on the piston rod of the cylinder.

[0012] Compared with the prior art, the beneficial effects of this utility model are:

[0013] 1. In the process of rinsing the wafer with the spray pipe, the present application uses a motor to drive the forward and reverse screws to rotate alternately, thereby causing the two spray pipes to move closer and further away from each other, so that the spray pipes spray water mist while moving, resulting in a better rinsing effect on the wafer.

[0014] 2. When the two movable frames approach each other and move the spray pipes to a preset position, the bottom of the gears on the two spray pipes engages with the rack. As the two movable frames and the spray pipes approach each other further, the rack acts on the two gears and drives the spray nozzles to deflect outward at the bottom of the spray pipes, thereby changing the spray angle of the spray nozzles to reduce spray dead angles and further improve the rinsing effect on the wafers. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this utility model or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this utility model. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a structural schematic diagram of an embodiment of the present utility model;

[0017] Figure 2 yes Figure 1 A cross-sectional view;

[0018] Figure 3 yes Figure 1 Another structural diagram from a different perspective;

[0019] Figure 4 This is a schematic diagram of the structure of the movable frame according to an embodiment of the present utility model;

[0020] Figure 5 This is a schematic diagram of the torsion spring according to an embodiment of the present invention.

[0021] In the diagram: 1-Cleaning tank; 2-Water inlet pipe; 3-Drain outlet; 4-Cylinder; 5-Blocking valve; 6-Overflow tank; 7-Modular frame; 8-Support plate; 9-Slide rod; 10-Motor; 11-Forward and reverse threaded rod; 12-Spray pipe; 13-Torsion spring; 14-Slot; 15-Clamping block; 16-Gear; 17-Rack; 18-Drain pipe; 19-T-connector; 20-Water resistance meter; 21-Spray nozzle. Detailed Implementation

[0022] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments. Based on the embodiments of the present utility model, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the present utility model.

[0023] like Figures 1 to 5As shown, the QDR tank with cleaning and testing includes a cleaning tank 1 with a top opening. Two symmetrically arranged water inlet pipes 2 are located on the front bottom of the cleaning tank 1. A drain outlet 3 is located at the bottom of the cleaning tank 1. A U-shaped frame is bolted to the bottom wall of the cleaning tank 1 below the drain outlet 3. A cylinder 4 with an upwardly extending piston rod is bolted inside the U-shaped frame. A sealing valve 5 for blocking the drain outlet 3 is fixedly installed on the piston rod of the cylinder 4. When the cylinder 4 extends, it causes the sealing valve 5 to move upward and fit against the bottom of the cleaning tank 1, blocking the drain outlet 3. When the cylinder 4 retracts, it causes the sealing valve 5 to move downward and disengage from the drain outlet 3, opening the drain outlet 3 and allowing the liquid in the cleaning tank 1 to drain quickly.

[0024] An overflow trough 6 is welded to the top periphery of the cleaning tank 1 to collect any liquid overflowing from the cleaning tank 1. The top of the cleaning tank 1 has two movable frames 7 arranged opposite each other. Each movable frame 7 has a horizontal plate at the top and vertical plates extending downwards at the front and rear ends of the horizontal plate, integrally formed. Two support plates 8, arranged opposite each other, are bolted to the front and rear ends of the overflow trough 6. A horizontally extending slide rod 9 is fixed between the two support plates 8 at the front end. The vertical plates at the front ends of both movable frames 7 are slidably connected to the slide rod 9, which provides support and guidance for the movable frames 7. The two movable frames 7 are driven by a power mechanism to move closer or further apart, such as... Figure 3 As shown, the power mechanism includes a forward and reverse threaded rod 11 driven by a motor 10, located between two support plates 8 at the rear end. The forward and reverse threaded rod 11 is arranged parallel to the slide rod 9. The left end of the forward and reverse threaded rod 11 is rotatably mounted on the left rear support plate 8 via a bearing, and the right end is connected to the rotating shaft of the motor 10 via a coupling. The motor 10 is bolted to the right rear support plate 8. The forward and reverse threaded rod 11 has two external threads with opposite directions of rotation. The vertical plates at the rear ends of the two movable frames 7 are respectively threaded onto the external threads of the forward and reverse threaded rod 11 with different directions of rotation. The motor 10 drives the forward and reverse threaded rod 11 to rotate alternately in both directions, thereby causing the two movable frames 7 to move alternately closer and further away from each other.

[0025] Two movable frames 7 are each equipped with a spray pipe 12 that can rotate around its own axis. The spray pipe 12 extends horizontally back and forth along the direction of movement perpendicular to the movable frame 7. The front and rear ends of the spray pipe 12 are respectively rotatably mounted on two vertical plates of the corresponding movable frame 7 through bearings. The front end of the spray pipe 12 is provided with a water inlet, which is connected to a water source. One side of the spray pipe 12 is provided with multiple water nozzles 21 that are evenly spaced along its length. The wafers in the cleaning tank 1 are sprayed and rinsed through the multiple water nozzles 21.

[0026] The cleaning tank 1 is also equipped with an angle adjustment assembly for driving the spray pipe 12 to rotate. The angle adjustment assembly includes a torsion spring 13 connected between the corresponding spray pipe 12 and the movable frame 7, such as... Figure 4 and Figure 5 As shown, the outer rear end of the spray pipe 12 has a stepped surface, which is located inside the movable frame 7. A torsion spring 13 is sleeved on the spray pipe 12 between the stepped surface and the vertical plate at the rear end of the movable frame 7. A slot 14 is provided on the stepped surface. One end of the torsion spring 13 is bent along the axial direction of the spray pipe 12 and inserted into the slot 14. A locking block 15 is provided on the inner side of the vertical plate at the rear end of the movable frame 7. The locking block 15 has a slot for the other end of the torsion spring 13 to be engaged. When no external force is applied, the torsion spring 13 keeps the angle of the spray pipe 12 fixed and keeps the water nozzle 21 slightly tilted inward at the bottom of the spray pipe 12.

[0027] Gears 16 are fixedly installed at the rear ends of the two spray pipes 12, and a rack 17 is provided between the two gears 16. A crossbar is fixedly installed between the two support plates 8 located at the rear by bolts, and the rack 17 is fixedly installed on the top of the crossbar by bolts. When the two spray pipes 12 are located on the top left and right sides of the cleaning tank 1 respectively, the gears 16 do not contact the rack 17; when the two movable frames 7 approach each other, they will drive the bottom of the two gears 16 to mesh with the rack 17.

[0028] A drain pipe 18 is fixedly installed at the bottom of the overflow tank 6. The end of the drain pipe 18 away from the overflow tank 6 is connected to the water resistance meter 20 through a three-way connector 19. The drain pipe 18 and the water resistance meter 20 are respectively connected to the two horizontal ends of the three-way connector 19. The third end of the three-way connector 19 is an outlet facing upwards.

[0029] In use, firstly, the drain outlet 3 is blocked by the sealing valve 5, and deionized water is continuously injected into the overflow tank 6 through the water inlet pipe 2 to soak and clean the wafers in the cleaning tank 1. After the water level in the cleaning tank 1 rises, it overflows into the overflow tank 6 and enters the drain pipe 18, and then is discharged through the outlet at the top of the three-way connector 19. The water resistance value of the discharged wastewater can be detected by the water resistance meter 20. When the water resistance value reaches the predetermined value, the drain outlet 3 is opened to quickly discharge the water in the cleaning tank 1, and then deionized water is sprayed through the spray pipe 12 to rinse the wafers.

[0030] During the process of rinsing the wafer by the spray pipe 12, the motor 10 drives the forward and reverse threaded rod 11 to rotate alternately in both directions. In turn, the forward and reverse threaded rod 11 drives the two movable frames 7 and the two spray pipes 12 to move closer and further away from each other alternately, so that the spray pipes 12 spray water mist while moving, resulting in a better rinsing effect on the wafer.

[0031] In addition, when the two spray pipes 12 are located on the top left and right sides of the cleaning tank 1 respectively, the gear 16 does not contact the rack 17. Under the action of the torsion spring 13, the spray nozzle 21 is kept slightly tilted inward at the bottom of the spray pipe 12. When the two movable frames 7 approach each other and drive the spray pipe 12 to move to the preset position, the bottom of the gear 16 on the two spray pipes 12 is driven to mesh with the rack 17. As the two movable frames 7 and the spray pipe 12 approach each other further, the rack 17 acts on the two gears 16 and drives the spray nozzle 21 to deflect outward at the bottom of the spray pipe 12, thereby changing the spray angle of the spray nozzle 21 to reduce the spray dead angle and further improve the rinsing effect on the wafer.

[0032] The foregoing has shown and described the basic principles, main features, and advantages of this utility model. Those skilled in the art should understand that this utility model is not limited to the above embodiments. The embodiments and descriptions in the specification are merely preferred examples and are not intended to limit the utility model. Various changes and modifications can be made to this utility model without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed utility model. The scope of protection of this utility model is defined by the appended claims and their equivalents.

Claims

1. A cleaning and detection QDR tank, characterized in that: The system includes a cleaning tank with an open top, a water inlet pipe on the bottom side of the cleaning tank, a drain outlet at the bottom of the cleaning tank, and an overflow tank fixedly installed on the top periphery of the cleaning tank to collect liquid overflowing from the cleaning tank. The top of the cleaning tank has two movable frames arranged opposite each other, driven by a power mechanism to move closer or further apart. Each of the two movable frames is equipped with a spray pipe that can rotate around its own axis. The spray pipes extend horizontally along a direction perpendicular to the movement of the movable frames. The cleaning tank also has an angle adjustment component for rotating the spray pipes.

2. The QDR tank with cleaning detection as described in claim 1, characterized in that: The angle adjustment assembly includes a torsion spring connected between the corresponding spray pipe and the movable frame. Gears are fixedly installed at one end of the two spray pipes in the same direction, and a rack is provided between the two gears. The rack is fixedly installed on the cleaning tank or the overflow tank. When the two movable frames approach each other, they drive the two gears to mesh with the rack.

3. The QDR tank with cleaning and detection as described in claim 1, characterized in that: Two support plates, arranged opposite each other, are fixedly installed at the front and rear ends of the overflow trough. A horizontally extending slide rod is fixedly installed between the two support plates at the front end. Both movable frames are slidably connected to the slide rod. The power mechanism includes a positive and negative threaded rod driven by a motor and located between the two support plates at the rear end. The positive and negative threaded rod is arranged parallel to the slide rod. The positive and negative threaded rod has two external threads with opposite directions of rotation. The two movable frames are respectively threaded to the external threads of the positive and negative threaded rod with different directions of rotation.

4. The QDR tank with cleaning detection as described in claim 1, characterized in that: A drain pipe is fixedly installed at the bottom of the overflow trough, and the drain pipe is connected to a water resistance meter through a T-joint.

5. The QDR tank with cleaning and detection as described in claim 1, characterized in that: A U-shaped frame is fixedly installed on the bottom wall of the cleaning tank located below the drain outlet. A cylinder with an upwardly extending piston rod is installed inside the U-shaped frame. A sealing valve for sealing the drain outlet is fixedly installed on the piston rod of the cylinder.

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