Pedestal and vapor deposition device

Abstract

The utility model provides a base and a vapor deposition device. The base comprises a bearing surface, an accommodating cavity, a driving gas conveying pipeline, a gas guide flow channel, a gas collecting groove and an exhaust pipeline, the accommodating cavity is arranged on the bearing surface, and the top surface of the accommodating cavity is opened to place a substrate bearing piece or a substrate; the at least one gas guide flow channel is arranged on the inner bottom surface of the accommodating cavity and comprises a near end part communicated with the driving gas conveying pipeline, so that the driving gas flows towards the tail end part of the gas guide flow channel along the gas guide flow channel; the at least one gas collection tank is arranged in one-to-one correspondence with the gas guide flow channels, the gas collection tank is arranged around the tail end parts of the gas guide flow channels, and at least one first exhaust port is formed in the gas collection tank; the exhaust pipeline is arranged on the base and communicated with the first exhaust ports so that the driving gas entering the exhaust pipeline can be exhausted towards the bottom of the base. The driving gas is exhausted towards the bottom of the base, so that the adverse effect on a process gas flow field above the substrate due to escape of the driving gas is avoided or relieved.

Description

Technical Field

[0001] This application relates to the field of semiconductor manufacturing equipment technology, and more particularly to a substrate and vapor deposition apparatus. Background Technology

[0002] Chemical vapor deposition (CVD) equipment is a device that uses a gaseous reaction source to deposit solid thin film materials on the surface of a substrate, and it is widely used in the field of semiconductor device fabrication.

[0003] A CVD (Continuous Chemical Deposition) apparatus includes a substrate that supports the substrate. Process gases are introduced into the substrate area of ​​the substrate, and a deposition reaction occurs under specific temperature and pressure to form a solid film. To improve the temperature uniformity of the substrate and the mixing of the surrounding process gases to obtain a high-quality solid film, the bottom of the recessed cavity on the substrate that supports the substrate is provided with spiral-shaped airflow channels. Inside the substrate, there are channels for introducing driving gases, allowing the driving gases to flow within the airflow channels to create an air cushion that supports and rotates the substrate.

[0004] However, the escape of the driving gas towards the gap between the substrate and the cavity edge is unavoidable. Furthermore, the driving gas escaping from the guide gas channel has a certain velocity and directionality. If not effectively controlled, the escaping driving gas will generate impactful turbulence in several localized areas at the substrate and cavity edges, significantly disrupting the process gas flow field above the substrate and negatively impacting film quality. Therefore, a driving gas exhaust channel is needed to ensure proper exhaust of the driving gas and avoid adverse effects on the process gas flow field. Utility Model Content

[0005] The purpose of this application is to provide a base and a vapor deposition apparatus that, by achieving exhaust of the driving gas toward the bottom of the base, avoids or mitigates the adverse effects of the escape of the driving gas on the process gas flow field above the substrate.

[0006] To achieve the above objectives, in a first aspect, the base provided in this application includes a bearing surface, a receiving cavity, a driving gas delivery pipeline, a guiding gas channel, a gas collecting groove, and an exhaust pipe. The receiving cavity is disposed on the bearing surface, with an opening on its top surface for placing a substrate carrier or substrate. The driving gas delivery pipeline is disposed within the base for transmitting driving gas. At least one guiding gas channel is provided and disposed on the bottom surface of the cavity of the receiving cavity. The guiding gas channel includes a proximal end communicating with the driving gas delivery pipeline, allowing the driving gas to flow along the guiding gas channel toward its end portion. At least one gas collecting groove is provided and is disposed corresponding to each guiding gas channel. The gas collecting groove is disposed around the end portion of the guiding gas channel, and at least one first exhaust port is provided within the gas collecting groove. The exhaust pipe is disposed on the base and communicates with each of the first exhaust ports to discharge the driving gas entering the exhaust pipe toward the bottom of the base.

[0007] Preferably, the gas collection groove includes a plurality of sub-gas collection grooves, which are arranged circumferentially around the end portion, and each sub-gas collection groove is provided with at least one first exhaust port.

[0008] Preferably, the base further includes at least one second exhaust port, which is disposed within the end portion and / or in the region between the end portion and the gas collection groove.

[0009] Preferably, the base further includes a radial exhaust channel, which communicates with the first exhaust port and / or the second exhaust port through the exhaust pipe, and the radial exhaust channel extends toward the center of the base and / or the edge of the base.

[0010] Preferably, at least one first exhaust port and at least one second exhaust port corresponding to the same airflow channel are connected to the same radial exhaust pipe through the exhaust pipe.

[0011] Preferably, the airflow channels are provided with at least two, and the at least two airflow channels include a first airflow channel and a second airflow channel; at least one exhaust port and / or at least one second exhaust port corresponding to the first airflow channel and at least one first exhaust port and / or at least one second exhaust port corresponding to the second airflow channel are all connected to the same radial exhaust pipe through the exhaust pipe.

[0012] Preferably, the airflow channel further includes an airflow guide section located between the proximal end and the corresponding distal end, defining an airflow vortex extending from the proximal end to the distal end and spiraling along the airflow channel, a first tangent circle centered on the endpoint of the airflow vortex and tangent to the edge of the bottom surface of the cavity, and a second tangent circle centered on the endpoint of the airflow vortex and tangent to the airflow guide section adjacent to the distal end in the radial direction; the airflow vortex is the central axis of the airflow channel extending from the proximal end to the distal end, and the endpoint of the airflow vortex is the intersection point of the airflow vortex and the end face of the distal end; when the number of intersection points between the airflow guide section adjacent to the distal end in the radial direction and the first tangent circle is 0, the first exhaust port and / or the second exhaust port are located within the area enclosed by the orthographic projection of the first tangent circle onto the bottom surface of the cavity; when the second tangent circle is located within the first tangent circle, the first exhaust port and / or the second exhaust port are located within the area enclosed by the orthographic projection of the second tangent circle onto the bottom surface of the cavity.

[0013] Preferably, the radius of the second tangent circle is R, and a positioning circle with the end point of the airflow vortex as the center and a radius of 0.5R is defined. The first exhaust port and / or the second exhaust port are located within the area enclosed by the orthographic projection of the positioning circle onto the bottom surface of the cavity.

[0014] Preferably, the gas collecting groove includes at least one arc-shaped structure; when the gas collecting groove is composed of at least two arc-shaped gas collecting grooves, it has the following characteristics: the at least two arc-shaped gas collecting grooves are sequentially connected or spaced apart in a ring around the end portion in the circumferential direction.

[0015] Secondly, the vapor deposition apparatus provided in this application includes a process chamber and the aforementioned base disposed within the process chamber.

[0016] The base described in this application and the vapor deposition apparatus including the base both have the following beneficial effects:

[0017] The gas collecting grooves are arranged in a one-to-one correspondence with the air guiding channels. Each gas collecting groove has at least one first exhaust port, ensuring that the driving gas in the air guiding channels is discharged from the first exhaust port in the corresponding gas collecting groove. This improves the exhaust effect of the driving gas at the first exhaust port and reduces the escape of driving gas. This reduces or prevents the driving gas from escaping from the gap between the substrate support or the radial outer edge of the substrate and the inner wall of the base (i.e., the receiving cavity) to the top of the substrate, thus avoiding adverse effects on the process gas flow field and improving the stability and uniformity of the process. Furthermore, by arranging the gas collecting grooves around the ends of the air guiding channels, the corresponding air guiding channels are ensured to have as long a driving gas flow path as possible, thereby guaranteeing the air-floating rotation effect of the substrate. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the structure of the receiving cavity in the base according to an embodiment of this application. Figure 1 .

[0019] Figure 2 This is a schematic diagram of the structure of the base and substrate according to an embodiment of this application.

[0020] Figure 3 This is a schematic diagram of the base structure according to an embodiment of this application.

[0021] Figure 4 This is a schematic diagram of a structure in which a gas channel is provided in the housing cavity of the base according to an embodiment of this application.

[0022] Figure 5 This is a schematic diagram of the structure of the base containing two air channels in an embodiment of this application.

[0023] Figure 6 This is a schematic diagram of the structure of the base containing four air channels in an embodiment of this application.

[0024] Figure 7 This is a schematic diagram of the structure of the base containing a plurality of air channels in an embodiment of this application.

[0025] Figure 8 This is a schematic diagram of the structure of the gas collection groove in the base of this application embodiment. Figure 1 .

[0026] Figure 9 This is a schematic diagram of the structure of the gas collection groove in the base of this application embodiment. Figure 2 .

[0027] Figure 10 This is a schematic diagram of the structure of the gas collection groove in the base of this application embodiment. Figure 3 .

[0028] Figure 11 This is a schematic diagram of the structure of the receiving cavity in the base according to an embodiment of this application. Figure 2 .

[0029] Figure 12 This is a schematic diagram of the structure of the first tangent circle in the base of an embodiment of this application.

[0030] Figure 13 This is a schematic diagram of the structure of the second tangent circle in the base of an embodiment of this application.

[0031] Figure 14 This is a schematic diagram of the positioning circle in the base according to an embodiment of this application.

[0032] Figure 15 This is a schematic diagram of the structure of a vapor deposition apparatus according to an embodiment of this application. Detailed Implementation

[0033] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions in the embodiments of this application will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art to which this application pertains. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but does not exclude other elements or objects.

[0034] To overcome the problems existing in the prior art, this application provides a base and a vapor deposition apparatus, which avoids or reduces the adverse effects of the escape of the driving gas on the process gas flow field above the substrate by realizing the exhaust of the driving gas toward the bottom of the base.

[0035] In some embodiments, reference is made to Figures 1 to 3 The base 10 includes a bearing surface (not shown in the figure), a receiving cavity 1, a gas guiding channel 2, a gas collecting groove 3, a driving gas delivery pipeline (not shown in the figure), and an exhaust pipe (not shown in the figure); the receiving cavity 1 is disposed on the bearing surface (not shown in the figure), with an opening on its top surface for placing a substrate carrier or substrate 20; the driving gas delivery pipeline (not shown in the figure) is disposed within the base 10 for transmitting driving gas; the gas guiding channel 2 has at least one and is disposed on the bottom surface 11 of the cavity of the receiving cavity 1, and the gas guiding channel 2 includes the driving gas delivery pipeline (… The proximal end 22 (not shown in the figure) is connected to the airflow channel 2, allowing the driving gas to flow along the airflow channel 2 toward the end 21 of the airflow channel 2; at least one gas collecting groove 3 is provided and is arranged one-to-one with the airflow channel 2, and the gas collecting groove 3 is arranged around the end 21 of the airflow channel 2, and at least one first exhaust port 4 is provided in the gas collecting groove 3; the exhaust pipe (not shown in the figure) is provided on the base 10 and communicates with each of the first exhaust ports 4, so as to discharge the driving gas entering the exhaust pipe (not shown in the figure) toward the bottom of the base 10.

[0036] In this embodiment, at least one gas collecting groove 3 is provided and is arranged one-to-one with the air guiding channel 2. The gas collecting groove 3 is arranged around the end portion 21 of the air guiding channel 2. At least one first exhaust port 4 is provided in the gas collecting groove 3, so that the driving gas in the air guiding channel 2 is discharged from the first exhaust port 4 in the gas collecting groove 3 surrounding its end portion 21 and the exhaust pipe (not shown in the figure) communicating with each first exhaust port 4. This realizes the exhaust of the driving gas toward the bottom of the base, improves the exhaust effect of the driving gas at the first exhaust port 4, and can reduce the escape of driving gas. This reduces or avoids the escape of driving gas from the gap between the receiving cavity 1 and the substrate support or substrate 20 to the top of the substrate 20, thus avoiding the adverse effects on the process gas flow field and improving the stability and uniformity of the process. Furthermore, by having the gas collecting groove 3 arranged around the end portion 21 of the air guiding channel 2, and the first exhaust port 4 arranged within the gas collecting groove 3, it is possible to ensure that the air guiding channel 2 corresponding to the gas collecting groove 3 has a driving airflow channel as long as possible, thereby ensuring the air-floating rotation effect of the substrate 20.

[0037] In this embodiment, reference Figure 1 and Figure 3 The receiving cavity 1 is provided at least one. For example, several receiving cavities 1 can be provided, or only one receiving cavity 1 can be provided. The specific number is set according to the type, purpose, and process requirements of the vapor deposition apparatus. In some embodiments, there are 5 receiving cavities 1, such as... Figure 2 As shown. In other embodiments, the receiving cavity 1 has 6, such as... Figure 3 As shown.

[0038] In this embodiment, reference Figure 1 and Figure 3 The near end 22 of the airflow channel 2 is also provided with an air inlet 6. The air inlet 6 is connected to a driving gas delivery pipeline (not shown in the figure) so as to deliver the driving gas into the airflow channel 2.

[0039] In this embodiment, Figure 2 The substrate 20 shown can also be a substrate carrier, which has several support recesses for supporting each substrate. The substrate carrier is used to support the substrate 20. The driving gas enters the airflow channel 2 through the driving gas delivery pipeline and the air inlet 6, flows along the airflow channel 2, and forms an air cushion that can support the substrate carrier or the substrate 20. The substrate carrier or the substrate 20 rotates around the central axis of the bottom surface 11 of the cavity under the buoyancy of the driving gas.

[0040] In this embodiment, at least one airflow channel 2 is arranged in a spiral shape around the center 111 of the inner bottom surface 11 of the receiving cavity 1. One or more airflow channels 2 can be provided, the specific number depending on the type, application, and process requirements of the vapor deposition apparatus. Their shape, size, and arrangement can be selected according to the process requirements, ensuring that the driving gas entering the airflow channel 2 at a certain rate flows within the airflow channel 2 to form an air cushion, enabling the substrate 20 above it to achieve air buoyancy and stable rotation. The specific implementation method is a conventional technique in the art. For example, in some embodiments, three airflow channels 2 are provided on the inner bottom surface 11 of the receiving cavity 1, such as... Figure 1 and Figure 3 As shown. In other embodiments, such as Figure 4 , Figure 5 , Figure 6 and Figure 7 As shown, the bottom surface 11 of the cavity of the receiving cavity 1 is provided with one, two, four and several airflow channels 2, respectively.

[0041] In some embodiments, reference is made to Figures 1 to 3 , Figures 5 to 7 The airflow channel 2 is provided with a plurality of such channels, and the end portions 21 of the plurality of airflow channels 2 are evenly distributed circumferentially with the center 111 of the bottom surface 11 of the cavity as the center, and the proximal portions 22 of the plurality of airflow channels 2 are evenly distributed circumferentially with the center 111 of the bottom surface 11 of the cavity as the center.

[0042] In some embodiments, reference is made to Figure 8 The gas collecting groove 3 includes several sub-gas collecting grooves 33, which are arranged around the end portion 21 in the circumferential direction. Each sub-gas collecting groove 33 is provided with at least one first exhaust port 4, which is beneficial to improve exhaust efficiency and can further avoid or reduce the adverse effects of the escape of driving gas on the process gas flow field above the substrate.

[0043] In this embodiment, the number of the sub-collecting slots 33 is determined based on the radial area of ​​the bottom surface 11 inside the cavity and the exhaust requirements. For example, in some embodiments, refer to Figure 8 The sub-collecting gas groove 33 includes a first sub-collecting gas groove 331 and a second sub-collecting gas groove 332, with the first sub-collecting gas groove 331 disposed between the second sub-collecting gas groove 332 and the end portion 21.

[0044] In this embodiment, the shapes of the plurality of sub-collecting gas slots 33 may be the same or different. The size and number of the first exhaust ports 4 within the plurality of sub-collecting gas slots 33 may be the same or different. For example, in some specific embodiments, refer to... Figure 8The size and number of the first exhaust port 4 in the first sub-collecting gas groove 331 are different from the size and number of the first exhaust port 4 in the second sub-collecting gas groove 332.

[0045] In some embodiments, reference is made to Figures 1 to 10 The gas collecting groove 3 includes at least one arc-shaped structure, which helps to prevent the driving gas from escaping and ensures that the driving gas is discharged from the first exhaust port 4, while further improving the exhaust efficiency.

[0046] In some specific embodiments, reference is made to Figure 1 , Figures 3 to 8 The gas collecting groove 3 is composed of an arc-shaped structure. The gas collecting groove 3 has an open ring structure. The air guiding channel 2 extends from the opening into the ring structure, and the gas collecting groove 3 is arranged circumferentially around the end portion 21 of the air guiding channel 2.

[0047] In some embodiments, reference is made to Figure 9 and Figure 10 When the gas collecting groove 3 is composed of at least two arc-shaped gas collecting grooves, it has the following characteristics: the at least two arc-shaped gas collecting grooves are sequentially connected or spaced apart in a ring around the end portion 21 in the circumferential direction. This helps to prevent the driving gas from escaping and improve exhaust efficiency, while reducing the impact on the temperature field of the substrate 20. Specifically, the arrangement of the gas collecting groove 3 is determined according to the exhaust requirements and to avoid affecting the temperature field uniformity of the substrate 20. For example, in some specific embodiments, refer to... Figure 9 The gas collecting groove 3 is composed of three arc-shaped gas collecting grooves, which are circumferentially spaced around the end portion 21, and the gas collecting groove 3 surrounds a portion of the end portion 21 of the airflow channel 2. In other specific embodiments, see reference... Figure 10 The gas collecting groove 3 is composed of 6 arc-shaped gas collecting grooves. The 6 arc-shaped gas collecting grooves are connected sequentially along the circumference and arranged around the end portion 21. The gas collecting groove 3 is arranged around the end portion 21 of all the air guiding channels 2. That is, the gas collecting groove 3 is provided with several partitions 31. The partitions 31 divide the gas collecting groove 3 into several independent arc-shaped gas collecting grooves. In this way, while ensuring exhaust efficiency, it is convenient to adjust the temperature field of the substrate 20 by adjusting the exhaust of the first exhaust port 4 in each arc-shaped gas collecting groove.

[0048] In this embodiment, when the gas collecting groove 3 is composed of at least two arc-shaped gas collecting grooves, at least one first exhaust port 4 can be provided in each arc-shaped gas collecting groove, or the first exhaust port 4 can be omitted from the arc-shaped gas collecting groove. For example, in some specific embodiments, refer to Figure 9The gas collecting groove 3 includes three arc-shaped gas collecting grooves, namely a first arc-shaped gas collecting groove 301, a second arc-shaped gas collecting groove 302, and a third arc-shaped gas collecting groove 303. The first arc-shaped gas collecting groove 301 is provided with one first exhaust port 4, the third arc-shaped gas collecting groove 303 uses two first exhaust ports 4, and the second arc-shaped gas collecting groove 302 is not provided with a first exhaust port 4, so as to adjust the temperature field of the substrate 20.

[0049] In this embodiment, when the gas collecting groove 3 is composed of at least two arc-shaped gas collecting grooves, the shapes of the first exhaust ports 4 within the arc-shaped gas collecting grooves can be the same or different. For example, in some specific embodiments, refer to... Figure 9 The gas collecting groove 3 includes three arc-shaped gas collecting grooves, and the shapes of the first exhaust port 4 in the first arc-shaped gas collecting groove 301 and the third arc-shaped gas collecting groove 303 are different. (Reference) Figure 10 The gas collecting groove 3 includes 6 arc-shaped gas collecting grooves, and the shape of the first exhaust port 4 in the 6 arc-shaped gas collecting grooves is the same.

[0050] In some embodiments, when the gas collecting groove 3 includes a plurality of sub-gas collecting grooves 33, each sub-gas collecting groove 33 includes at least one arc-shaped structure. In other embodiments, when each sub-gas collecting groove 33 is composed of at least two arc-shaped gas collecting grooves, it has the following characteristics: the at least two arc-shaped gas collecting grooves are sequentially connected or spaced apart in a ring around the end portion 21 in the circumferential direction.

[0051] In some specific embodiments, reference is made to Figure 8 The first sub-collecting gas groove 331 and the second sub-collecting gas groove 332 are both composed of an arc-shaped structure. The first sub-collecting gas groove 331 and the second sub-collecting gas groove 332 are both annular structures with openings. The air guiding channel 2 extends from the opening into the annular structure, and the first sub-collecting gas groove 331 and the second sub-collecting gas groove 332 are arranged around the end portion 21 of all the air guiding channels 2.

[0052] In some embodiments, the first exhaust port 4 is, but is not limited to, at least one of a circular structure, an arc-shaped structure, a fan-shaped structure, and a square structure. For example, in some specific embodiments, refer to... Figures 1 to 8 The first exhaust port 4 has a circular exhaust hole structure. In other specific embodiments, refer to... Figure 10 The first exhaust port 4 has an arc-shaped structure, and the first exhaust port 4 is set with a certain arc along the extending direction of the gas collecting groove 3. In some specific embodiments, refer to Figure 9 The first exhaust port 4 includes a circular exhaust hole structure and an arc structure.

[0053] In some embodiments, reference is made to Figures 4 to 7The first exhaust port 4 is provided with at least two outlets, and the at least two first exhaust ports 4 are evenly distributed within the air collection groove 3, which is beneficial to improving the exhaust effect and can also achieve exhaust from all directions of the end portion 21. In some specific embodiments, refer to Figure 8 The second sub-collecting groove 332 is arranged circumferentially around the end portion 21 of the air guiding channel 2, and six first exhaust ports 4 are evenly distributed in the second sub-collecting groove 332. This not only helps to improve the exhaust effect, but also enables exhaust to be carried out in all directions of the end portion 21.

[0054] In some embodiments, reference is made to Figures 8 to 11 The base 10 further includes at least one second exhaust port 7, which is disposed within the end portion 21 and / or within the region 8 between the end portion 21 and the gas collection groove 3, which can further improve the exhaust effect and prevent the driving gas from escaping.

[0055] In some embodiments, the region 8 between the end portion 21 and the gas collecting groove 3 includes a crescent-shaped region. This crescent-shaped region is formed by an arcuate extension line 321 extending along the extending direction of the inner sidewall 32 of the gas collecting groove 3 and intersecting the end portion 21, and by the sidewall of the end portion 21. The inner sidewall 32 of the gas collecting groove 3 is the sidewall of the gas collecting groove 3 facing the end portion 21. For example, in some specific embodiments, refer to... Figure 10 The gas collecting groove 3 is composed of an arc-shaped structure. The region 8 between the end portion 21 and the gas collecting groove 3 includes a crescent-shaped region enclosed by an arc-shaped extension line 321 that extends along the extension direction of the inner sidewall 32 of the gas collecting groove 3 and intersects with the end portion 21 and the sidewall of the end portion 21.

[0056] In some embodiments, when the gas collecting groove 3 includes a plurality of sub-gas collecting grooves 33, the crescent-shaped region is formed by an arcuate extension line 321 extending along the extending direction of the inner sidewall 32 of the sub-gas collecting groove 33 away from the end portion 21 and intersecting with the end portion 21, and the sidewall of the end portion 21. The region 8 between the end portion 21 and the gas collecting groove 3 includes the remaining region in the crescent-shaped region excluding the other sub-gas collecting grooves 33. The other sub-gas collecting grooves 33 are the other sub-gas collecting grooves 33 among the plurality of sub-gas collecting grooves 33 excluding the sub-gas collecting grooves 33 away from the end portion 21. For example, in some specific embodiments, refer to... Figure 8The gas collecting groove 3 includes a first sub-gas collecting groove 331 and a second sub-gas collecting groove 332. A crescent-shaped region is formed by an arc-shaped extension line 321 extending along the extension direction of the inner sidewall 32 of the second sub-gas collecting groove 332 and intersecting with the end portion 21 and the sidewall of the end portion 21. The first sub-gas collecting groove 331 is disposed in the crescent-shaped region. Then, the region 8 between the end portion 21 and the gas collecting groove 3 includes the remaining region of the crescent-shaped region excluding the first sub-gas collecting groove 331.

[0057] In other embodiments, the region 8 between the end portion 21 and the gas collecting groove 3 includes the crescent-shaped region 81 and at least one annular region 82, the annular region 82 being enclosed by an arcuate extension line 321 extending along the extending direction of the inner sidewall 32 of the arcuate gas collecting groove, and the crescent-shaped region 81, the end portion 21, and / or other arcuate gas collecting grooves. For example, in some specific embodiments, refer to Figure 9 The gas collecting groove 3 is composed of three arc-shaped structures. The second arc-shaped extension line 3212 extending along the extension direction of the inner wall 32 of the second arc-shaped gas collecting groove 302 and the third arc-shaped extension line 3213 extending along the extension direction of the inner wall 32 of the third arc-shaped gas collecting groove 303 coincide. The first arc-shaped extension line 3211 extending along the extension direction of the inner wall 32 of the first arc-shaped gas collecting groove 301 does not coincide with the second arc-shaped extension line 3212 extending along the extension direction of the inner wall 32 of the second arc-shaped gas collecting groove 302. The second arc-shaped extension line 3212 and the end portion 21 form a crescent-shaped region 81. The first arc-shaped extension line 3211, the end portion 21, the second arc-shaped gas collecting groove 302 and the crescent-shaped region 81 form an annular region 82. The region 8 between the end portion 21 and the gas collecting groove 3 includes the crescent-shaped region 81 and the annular region 82.

[0058] In some embodiments, the second exhaust port 7 is, but is not limited to, at least one of a circular structure, an arc-shaped structure, a fan-shaped structure, and a square structure. For example, in some specific embodiments, refer to... Figure 8 , Figure 9 and Figure 11 The second exhaust port 7 has a circular exhaust hole structure. In other specific embodiments, see reference... Figure 10 The second exhaust port 7 has an arc-shaped structure and is arranged around the end portion 21 with a certain arc.

[0059] In some embodiments, the at least one second exhaust port 7 is disposed within the end portion 21. For example, in some specific embodiments, refer to... Figure 11 The second exhaust port 7 includes a plurality of internal exhaust ports, and all of the plurality of internal exhaust ports are disposed within the end portion 21.

[0060] In other embodiments, the at least one second exhaust port 7 is disposed within the end portion 21 and within the region 8 between the end portion 21 and the gas collecting groove 3. For example, in some specific embodiments, refer to Figure 8 and Figure 9 The second exhaust port 7 includes an inner exhaust port 71 and several middle exhaust ports 72. The inner exhaust port 71 is disposed in the end portion 21, and the middle exhaust ports 72 are disposed in the region 8 between the end portion 21 and the gas collection groove 3.

[0061] In other embodiments, the at least one second exhaust port 7 is disposed within the region 8 between the end portion 21 and the gas collecting groove 3. For example, in some specific embodiments, refer to Figure 10 The second exhaust port 7 includes a plurality of intermediate exhaust ports, which are disposed in the region 8 between the end portion 21 and the gas collection groove 3.

[0062] In some embodiments, the exhaust pipe is arranged vertically or obliquely through the base 10 to exhaust the driving gas toward the bottom of the base, thereby avoiding or mitigating the adverse effects of the escape of the driving gas on the process gas flow field above the substrate.

[0063] In other embodiments, reference is made to Figure 1 and Figure 11 The base 10 further includes a radial exhaust pipe 5, which is connected to the first exhaust port 4 and / or the second exhaust port 7 via the exhaust pipe (not shown in the figure).

[0064] In some embodiments, the radial exhaust channel 5 extends toward the center of the base 10 to be adapted to correspond to the rotary drive device disposed in the center of the base 10.

[0065] The radial exhaust channel 5 extends toward the edge of the base 10 and is adapted to the rotary drive device provided at the edge of the base 10.

[0066] In some embodiments, a rotary drive device is disposed in the middle of the base 10, or a rotary drive device is disposed on the side wall of the base 10. The radial exhaust channel 5 enters the rotary drive device through the junction of the rotary drive device and the base 10, and extends out of the process chamber within the rotary drive device. In this case, an extraction device, such as a vacuum pump, is disposed outside the process chamber to extract air from the opening of the radial exhaust channel outside the process chamber, allowing for flexible adjustment and control of the extraction force on the driving gas. In some embodiments, refer to... Figure 2The radial exhaust channel 5 extends toward the center of the base 10 and penetrates the inner wall 102 of the base 10. In some embodiments, the radial exhaust channel 5 communicates with an exhaust pipe in the rotating shaft sleeve through an exhaust hole located in the inner wall 102. In some embodiments, reference... Figure 2 The radial exhaust channel 5 extends toward the edge of the base 10 and penetrates the outer wall 101 of the base 10. The gas outlet of the radial exhaust channel 5 on the outer wall 101 is closer to the air pump, which makes the exhaust effect better.

[0067] In some embodiments, the other end of the radial exhaust channel 5 is located near the exhaust port at the bottom of the process chamber, and the driving gas is discharged by the suction force formed below the base by the tailpipe of the process chamber. In some specific embodiments, the radial exhaust channel 5 is connected to the tailpipe through an exhaust hole located on the inner sidewall 102.

[0068] In some embodiments, reference is made to Figure 11 At least one first exhaust port 4 and at least one second exhaust port 7 corresponding to the same airflow channel 2 are connected to the same radial exhaust pipe 5 through the exhaust pipe. That is, at least one first exhaust port 4 and at least one second exhaust port 7 are connected to the same radially extending radial exhaust channel 5 after passing through the exhaust pipe, which enables exhaust control of multiple exhaust ports using the same radial exhaust channel 5, and facilitates the processing of the radial exhaust pipe 5.

[0069] Furthermore, each of the first exhaust ports 4 and each of the second exhaust ports 7 corresponding to the same airflow channel 2 are connected to a radial exhaust pipe 5 extending along the same radial direction.

[0070] In this embodiment, at least one first exhaust port 4 and at least one second exhaust port 7 corresponding to the same airflow channel 2 refer to the first exhaust port 4 disposed within the air collection groove 3 surrounding the airflow channel 2 and the second exhaust port 7 disposed within the end portion 21 of the airflow channel 2 and / or within the region 8 between the end portion 21 and the air collection groove 3. For example, in some specific embodiments, such as Figure 1 and Figure 11 As shown, the radial exhaust pipe 5 includes a first radial exhaust pipe 51 and a second radial exhaust pipe 52, which extend in different radial directions. The airflow guide duct 2 includes a first airflow guide duct 201, a second airflow guide duct 202, and a third airflow guide duct 203. (Reference) Figure 11Each of the first airflow channel 201, the second airflow channel 202, and the third airflow channel 203 has two first exhaust ports 4 within its corresponding gas collection groove 3. Each of the end portions 21 of the first airflow channel 201 and the second airflow channel 202 has two second exhaust ports 7, and each of the end portions 21 of the third airflow channel 203 has one second exhaust port 7. Specifically, the one first exhaust port 4 and two second exhaust ports 7 corresponding to the first airflow channel 201 are all connected to the second radial exhaust pipe 52; the two first exhaust ports 4 and two second exhaust ports 7 corresponding to the second airflow channel 202 are all connected to the second radial exhaust pipe 52; and the two first exhaust ports 4 and one second exhaust port 7 corresponding to the third airflow channel 203 are all connected to the first radial exhaust pipe 51.

[0071] In some embodiments, reference is made to Figure 1 and Figure 11 The airflow guide channel 2 is provided with at least two channels, and the at least two airflow guide channels 2 include a first airflow guide channel 201 and a second airflow guide channel 202; at least one exhaust port 4 and / or at least one second exhaust port 7 corresponding to the first airflow guide channel 201 and at least one first exhaust port 4 and / or at least one second exhaust port 7 corresponding to the second airflow guide channel 202 are all connected to the same radial exhaust pipe 5 through the exhaust pipe. This allows for exhaust control of multiple exhaust ports using the same radial exhaust channel 5, and also facilitates the processing of the radial exhaust pipe 5.

[0072] For example, in some specific embodiments, references Figure 11 The first exhaust port 4 and the two exhaust ports 7 corresponding to the first airflow channel 201 are all connected to the second radial exhaust pipe 52. The first exhaust port 4 corresponding to the first airflow channel 201 and the two exhaust ports 4 and the two exhaust ports 7 corresponding to the second airflow channel 202 are all connected to the first radial exhaust pipe 51.

[0073] In other specific embodiments, reference is made to Figure 1Each of the gas collecting grooves 3 corresponding to the first airflow channel 201, the second airflow channel 202, and the third airflow channel 203 is provided with two first exhaust ports 4. Specifically, the first exhaust port 4 corresponding to the first airflow channel 201 and the two first exhaust ports 4 corresponding to the second airflow channel 202 are all connected to the second radial exhaust pipe 52; the first exhaust port 4 corresponding to the first airflow channel 201 and the two first exhaust ports 4 corresponding to the third airflow channel 203 are all connected to the first radial exhaust pipe 51.

[0074] In some embodiments, reference is made to Figures 12 to 14 The airflow channel 2 further includes a guide section located between the proximal end portion 22 and the corresponding end portion 21, defining an airflow vortex line 23 extending from the proximal end portion 22 to the end portion 21 and spiraling along the airflow channel 2, a first tangent circle 24 centered on the end point 231 of the airflow vortex line 23 and tangent to the edge of the bottom surface 11 of the cavity, and a second tangent circle 25 centered on the end point 231 of the airflow vortex line 23 and tangent to the airflow section adjacent to the end portion 21 in the radial direction.

[0075] In this embodiment, the radially adjacent guide section to the end portion 21 is the guide section closest to the end portion 21 of the airflow channel 2. Since the airflow channels 2 are arranged spirally around the center of the bottom surface 11 of the cavity, the radially adjacent guide section to the end portion 21 can be a guide section of the airflow channel 2 itself, or a guide section of another airflow channel 2. Figure 4 As shown, when an airflow channel 2 is provided on the bottom surface 11 of the cavity of the receiving cavity 1, the airflow section adjacent to the end portion 21 in the radial direction is the airflow channel 2 itself that is closer to the end portion 21. Figure 1 As shown, when the bottom surface 11 of the cavity of the receiving cavity 1 is provided with three airflow channels 2, which are respectively the first airflow channel 201, the second airflow channel 202 and the third airflow channel 203, the guide section of the first airflow channel 201 that is adjacent to the end portion 21 in the radial direction is the guide section of the third airflow channel 203 that is closer to the end portion 21 of the first airflow channel 201.

[0076] In some embodiments, reference is made to Figures 12 to 14 The airflow vortex line 23 is the vortex line of the airflow guide channel 2. Specifically, the airflow vortex line 23 is the orthographic projection of the vortex line of the airflow guide channel 2 onto the bottom surface 11 of the cavity.

[0077] In this embodiment, the vortex line of the airflow channel 2 refers to the characteristic line extending from the near end 22 to the far end 21 of the airflow channel 2 along the extension direction of the airflow channel 2. In some specific embodiments, such as Figure 4 As shown, the airflow channel 2 is spiral-shaped, and its vortex line is its helix. In some specific embodiments, such as... Figure 7 As shown, the airflow channel 2 is straight, and its vortex line is also straight.

[0078] In this embodiment, the airflow channel 2 has several vortex lines, all extending along the extension direction of the airflow channel 2, and these vortex lines are arranged parallel to each other within the airflow channel 2. The airflow vortex line 23 can be... Figure 12 Any one of the several vortex lines of the airflow channels 2 shown, specifically selected according to the process requirements for the air cushion. In some embodiments, the airflow vortex line 23 is the orthogonal projection of the central axis of the airflow channel 2 from the proximal end 22 to the distal end 21 onto the bottom surface 11 of the cavity, such as... Figure 13 and Figure 14 As shown.

[0079] In some embodiments, the endpoint 231 of the airflow vortex 23 is the intersection of the airflow vortex 23 and the end face of the end portion 21.

[0080] In this embodiment, since there are several vortex lines in the airflow channel 2, there are also several intersection points between the airflow vortex line 23 and the end face of the end portion 21, i.e., several endpoints 231. There are also several first tangent circles 24 and second tangent circles 25 centered on the endpoint 231. Specifically, according to the process requirements for the air cushion, any one of the several vortex lines in the airflow channel 2 is selected as the airflow vortex line 23, thereby defining the specific positions of the first tangent circle 24 and the second tangent circle 25.

[0081] In some embodiments, reference is made to Figure 12 When the number of intersections between the radially adjacent guide section 21 and the first tangent circle 24 is 0, the first exhaust port 4 and / or the second exhaust port 7 are located within the area enclosed by the orthographic projection of the first tangent circle 24 onto the bottom surface 11 of the cavity. This helps to reduce or avoid the problem of process gas flow field disturbance and process gas dilution caused by the escape of driving gas above the substrate, and helps to improve the quality and uniformity of the film formed on the substrate.

[0082] In other embodiments, reference is made to Figure 13When the second tangent circle 25 is located within the first tangent circle 24, the first exhaust port 4 and / or the second exhaust port 7 are located within the area enclosed by the orthographic projection of the second tangent circle 25 onto the bottom surface 11 of the cavity. This reduces or prevents the driving gas from overflowing radially toward the guide section adjacent to the end portion 21, avoiding interference with the driving gas in the guide section adjacent to the end portion 21. Furthermore, it ensures that the gas flowing in each guide channel 2 is discharged from its corresponding first exhaust port 4 and / or second exhaust port 7, preventing the reduction of the air flotation rotation effect due to the corresponding first exhaust port 4 and / or second exhaust port 7 in other guide channels 2.

[0083] In some other embodiments, reference is made to Figure 14 The radius of the second tangent circle 25 is R. A positioning circle 26 with a radius of 0.5R is defined, centered at the end point 231 of the airflow vortex 23. The first exhaust port 4 and / or the second exhaust port 7 are located within the area enclosed by the orthographic projection of the positioning circle 26 onto the bottom surface 11 of the cavity. This ensures that the guide air channels 2 corresponding to the first exhaust port 4 and the second exhaust port 7 have as long a driving airflow channel as possible, thereby ensuring both the air flotation and rotation effect and the exhaust effect, while reducing the impact on the driving gas in the guide section adjacent to the end portion 21 in the radial direction.

[0084] The arrangement of the first exhaust port 4 and / or the second exhaust port 7 in this application ensures that the corresponding airflow channel 2 has a driving airflow channel of as long as possible (ensuring the air flotation rotation effect). At the same time, because the first exhaust port 4 and the second exhaust port 7 are located far from other areas of the airflow channel 2, such as the central area of ​​the airflow channel 2, the airflow channel 2 can achieve a good air flotation effect to the maximum extent. Conversely, if the exhaust port is located close to the central area of ​​the airflow channel 2, this arrangement makes it easier for gas in other areas of the airflow channel 2 to be drawn out by the exhaust port, thus affecting the air flotation rotation effect.

[0085] In some specific embodiments, the airflow channel 2 includes a first airflow channel and a second airflow channel arranged adjacent to each other. The airflow vortex line 23 of the first airflow channel 2 includes a first airflow vortex line, a second airflow vortex line, and a third airflow vortex line. The endpoints 231 of the first airflow vortex line, the second airflow vortex line, and the third airflow vortex line located on the end face of the end portion 21 are respectively the first endpoint, the second endpoint, and the third endpoint. A second tangent circle A is formed with the first endpoint as the center and the distance between the first endpoint and the guide section of the second airflow channel as the radius; a second tangent circle B is formed with the second endpoint as the center and the distance between the second endpoint and the guide section of the second airflow channel as the radius; and a second tangent circle C is formed with the third endpoint as the center and the distance between the third endpoint and the guide section of the second airflow channel as the radius. The first exhaust port 4 and / or the second exhaust port 7 can be selected to be located within any one of the second tangent circles A, B, and C, according to the process requirements for the air cushion.

[0086] In some embodiments, reference is made to Figure 14 Define a vortex tangent 27 that passes through the endpoint 231 of the airflow vortex 23, is tangent to the airflow vortex 23, and is orthogonally projected onto the bottom surface 11 of the cavity, and a vortex perpendicular 28 that passes through the endpoint 231, is perpendicular to the vortex tangent 27, and is orthogonally projected onto the bottom surface 11 of the cavity. The vortex tangent 27 and the vortex perpendicular 28 divide the area enclosed by the orthogonal projection of the positioning circle 26 onto the bottom surface 11 of the cavity into a first quadrant region 261, a second quadrant region 262, a third quadrant region 263, and a fourth quadrant region 264. Furthermore, the first quadrant region 261 and the second quadrant region 262 are located on the side of the vortex tangent 27 near the edge of the bottom surface 11 of the cavity, while the third quadrant region 263 and the fourth quadrant region 264 are located on the side of the vortex tangent 27 away from the edge of the bottom surface 11 of the cavity. The first quadrant region 261 and the fourth quadrant region 264 are also located on the side of the vortex perpendicular 28 away from the end portion 21. The first exhaust port 4 is located within the first quadrant region 261 and / or the fourth quadrant region 264. This design ensures that the guide airflow channel 2 corresponding to the first exhaust port 4 has a sufficiently long driving airflow channel, thereby ensuring both the air flotation and rotation effect and the exhaust effect, while also reducing the impact on the driving airflow within the guide section adjacent to the end portion 21 radially.

[0087] In this embodiment, the positioning circle 26 is divided into four fan-shaped regions by the tangent 27 and the perpendicular 28 of the vortex line, namely the first quadrant region 261, the second quadrant region 262, the third quadrant region 263 and the fourth quadrant region 264, which have a fan-shaped structure.

[0088] In some embodiments, the gas collection groove 3 is located within the first quadrant region 261 and / or the fourth quadrant region 264.

[0089] In some embodiments, the vapor deposition apparatus includes a process chamber and a base disposed within the process chamber.

[0090] In some specific embodiments, reference is made to Figure 15 The vapor deposition apparatus includes a base 10, a top plate 40, a gas injection device 50, and a rotary drive device 30. The area between the top plate 40 and the base 10 is the process reaction zone. Process gas is delivered to the process reaction zone through the gas injection device 50 and flows over the surface of the substrate 20 for deposition. The actuator drives the rotary drive device 30 to rotate, thereby causing the base 10 to rotate around the rotation axis. The sleeve of the rotary drive device 30 is provided with a driving gas delivery line to deliver the driving gas to the gas guide channel 2 of the base 10.

[0091] In some embodiments, a sleeve is provided in the middle of the base for the rotary drive device 30 to pass through, and the radial exhaust channel 5 extends into the sleeve and communicates with the outside through the sleeve.

[0092] While the embodiments of this application have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of this application as set forth in the claims. Furthermore, the application described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A base, characterized in that, It includes a bearing surface and a receiving cavity, wherein the receiving cavity is disposed on the bearing surface and has an opening on the top surface for placing a substrate carrier or a substrate; Also includes: A driving gas delivery pipeline for transmitting driving gas is provided within the base; An airflow channel is provided, with at least one and disposed on the bottom surface of the cavity of the receiving cavity. The airflow channel includes a proximal end that communicates with the driving gas delivery pipeline, so that the driving gas flows along the airflow channel toward the end of the airflow channel. The gas collecting groove is provided with at least one and is arranged one-to-one with the air guiding channel. The gas collecting groove is arranged around the end of the air guiding channel, and at least one first exhaust port is provided in the gas collecting groove. An exhaust pipe is provided on the base and communicates with each of the first exhaust ports to discharge the driving gas entering the exhaust pipe toward the bottom of the base.

2. The base according to claim 1, characterized in that, The gas collection groove includes a plurality of sub-gas collection grooves, which are arranged circumferentially around the end portion, and each sub-gas collection groove is provided with at least one first exhaust port.

3. The base according to claim 1, characterized in that, The base further includes at least one second exhaust port, which is disposed within the end portion and / or in the area between the end portion and the gas collection groove.

4. The base according to claim 3, characterized in that, The base also includes a radial exhaust channel, which communicates with the first exhaust port and / or the second exhaust port through the exhaust pipe, and the radial exhaust channel extends toward the center of the base and / or the edge of the base.

5. The base according to claim 4, characterized in that, At least one first exhaust port and at least one second exhaust port corresponding to the same airflow channel are connected to the same radial exhaust pipe through the exhaust pipe.

6. The base according to claim 4, characterized in that, The airflow channel is provided with at least two channels, and the at least two airflow channels include a first airflow channel and a second airflow channel; At least one exhaust port and / or at least one second exhaust port corresponding to the first airflow channel and at least one first exhaust port and / or at least one second exhaust port corresponding to the second airflow channel are all connected to the same radial exhaust pipe through the exhaust pipe.

7. The base according to claim 3, characterized in that, The airflow channel further includes an airflow guide section located between the proximal end and the corresponding distal end, defining an airflow vortex extending from the proximal end to the distal end and spiraling along the airflow channel, a first tangent circle centered on the endpoint of the airflow vortex and tangent to the edge of the bottom surface of the cavity, and a second tangent circle centered on the endpoint of the airflow vortex and tangent to the airflow guide section adjacent to the distal end in the radial direction; the airflow vortex is the central axis of the airflow channel extending from the proximal end to the distal end, and the endpoint of the airflow vortex is the intersection of the airflow vortex and the end face of the distal end; When the number of intersections between the air guide section adjacent to the end portion in the radial direction and the first tangent circle is 0, the first exhaust port and / or the second exhaust port are located within the area enclosed by the orthographic projection of the first tangent circle onto the bottom surface of the cavity. When the second tangent circle is located within the first tangent circle, the first exhaust port and / or the second exhaust port are located within the area enclosed by the orthographic projection of the second tangent circle onto the bottom surface of the cavity.

8. The base according to claim 7, characterized in that, The radius of the second tangent circle is R. A positioning circle with a radius of 0.5R is defined with the end point of the airflow vortex as the center. The first exhaust port and / or the second exhaust port are located within the area enclosed by the orthographic projection of the positioning circle onto the bottom surface of the cavity.

9. The base according to claim 1, characterized in that, The gas collection groove includes at least one arc-shaped structure; When the gas collecting groove is composed of at least two arc-shaped gas collecting grooves, it has the following characteristics: the at least two arc-shaped gas collecting grooves are sequentially connected or spaced apart in a ring around the end portion along the circumference.

10. A vapor deposition apparatus, characterized in that, It includes a process chamber and a base disposed within the process chamber as described in any one of claims 1-9.

Images