A device for measuring outgassing

Abstract

The utility model discloses a kind of gas release measuring devices, including material reaction kettle, carrier gas inlet device, gas outflow device, the first interface is provided on the material reaction kettle, second interface, the carrier gas inlet device is connected with the first interface and provides high-purity carrier gas for material reaction kettle, the gas outflow device is connected with the second interface and gathers the gas released in material reaction kettle.The utility model can simulate the release condition of material volatile organic compound under normal ventilation condition, release gas is collected using passive adsorption principle of adsorption tube, avoid the influence of high temperature and high pressure and other unconventional conditions on the structure and composition of detection material, make the error of measurement result smaller, more close to building engineering material conventional disposal environmental condition, more in line with engineering application, and high-purity inert carrier gas is inhaled, and there is no interference and pollution to the result detection of test material release gas.

Description

Technical Field

[0001] This utility model relates to the field of materials testing technology, and in particular to a small-scale gas release measuring device for solid or solidifiable liquid engineering materials. Background Technology

[0002] Currently, in fields such as construction engineering, electronic manufacturing, and automotive interiors, materials release trace amounts of volatile organic compounds in their natural state. The amount of gas released directly affects environmental safety and human health. However, traditional methods for measuring gas release have the following problems: (1) Interference from unconventional conditions: Traditional devices often use high-temperature or vacuum environments for detection (such as CN103983532), which changes the material structure and release characteristics, resulting in results that do not match the actual application scenario; (2) Insufficient detection accuracy: The carrier gas has low purity or unstable flow rate, which can easily introduce pollution or flow fluctuation errors; (3) Poor adaptability to small samples: Existing devices are mostly designed for large-volume materials, making it difficult to accurately test the amount of gas released from small or trace materials; (4) Single gas collection method, unable to monitor penetration, no blank control, and large background interference. Summary of the Invention

[0003] In view of the shortcomings of the existing technology, the purpose of this utility model is to provide a gas release measurement device.

[0004] To achieve the above objectives, the technical solution adopted by this utility model is as follows: a gas release measuring device includes a material reaction vessel, a carrier gas inlet device, and a gas outlet device. The material reaction vessel is provided with a first interface and a second interface. The carrier gas inlet device is connected to the first interface and provides high-purity carrier gas to the material reaction vessel. The gas outlet device is connected to the second interface and collects the gas released from the material reaction vessel.

[0005] As a preferred embodiment, the first interface is located at the lower end of the material reaction vessel, and the second interface is located at the upper end of the material reaction vessel.

[0006] As a preferred embodiment, the carrier inlet device includes a carrier gas cylinder and a mass flow controller. The carrier gas cylinder is used to provide high-purity carrier gas, and the carrier gas is introduced into the material reaction vessel through the mass flow controller. The mass flow controller is used to control the flow rate of the carrier gas introduced into the material reaction vessel.

[0007] As a preferred embodiment, the gas supply port of the carrier gas cylinder is equipped with a switch valve, and a pressure reducing valve is connected in series between the carrier gas cylinder and the mass flow controller.

[0008] As a preferred embodiment, a carrier gas background concentration acquisition adsorption tube is connected in series between the mass flow controller and the material reaction vessel. The carrier gas background concentration acquisition adsorption tube is used as a blank sample at the first interface where the carrier gas is introduced.

[0009] As a preferred embodiment, the gas outflow device includes a release gas collection and adsorption tube and a backup collection and adsorption tube connected in series. One end of the release gas collection and adsorption tube is connected to a second interface, and the other end of the release gas collection and adsorption tube is connected to the backup collection and adsorption tube through a two-way connector.

[0010] As a preferred embodiment, the end of the alternative collection adsorption tube away from the release gas collection adsorption tube is also connected to an electronic soap film flow meter, which is used to monitor the outlet gas flow rate in real time.

[0011] As a preferred embodiment, a blank control reactor is also included, the structure of which is the same as that of the material reactor.

[0012] Compared with the prior art, the beneficial effects of this utility model are as follows:

[0013] (1) Simulates a normal ventilation environment, avoids interference from unconventional conditions, is closer to the actual application scenario, and reduces detection errors;

[0014] (2) By using high-purity nitrogen and a mass flow controller, reactions with volatile substances are avoided, ensuring pollution-free detection, improving detection accuracy, and reducing background interference;

[0015] (3) The small glass reactor has a compact structure, is suitable for trace materials, fills the gap in small sample detection, and improves applicability;

[0016] (4) By connecting the gas collection adsorption tube, the backup collection adsorption tube, and the electronic soap film flow meter in series, the reliability of collection is improved and sampling errors are avoided; an independent blank reaction vessel is set up to deduct the background value, improve the detection accuracy, and reduce system errors. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of this utility model;

[0018] The attached diagram lists the following components: 1. Carrier gas cylinder; 2. Switch valve; 3. Pressure reducing valve; 4. Mass flow controller; 5. Carrier gas background concentration collection adsorption tube; 6. Material reaction vessel; 7. Released gas collection adsorption tube; 8. Two-way connector; 9. Backup collection adsorption tube; 10. Electronic soap film flow meter; 11. Small material test sample; 12. First interface a; 13. Second interface b. Detailed Implementation

[0019] The present invention will be further described below with reference to specific embodiments. The following embodiments are only used to more clearly illustrate the technical solution of the present invention, and should not be used to limit the protection scope of the present invention.

[0020] Example:

[0021] like Figure 1 As shown, a gas release measuring device includes a material reaction vessel 6, a carrier gas inlet device, and a gas outlet device. The material reaction vessel 6 is provided with a first interface a and a second interface b. The carrier gas inlet device is connected to the first interface a and provides high-purity carrier gas to the material reaction vessel 6. The gas outlet device is connected to the second interface b and collects the gas released from the material reaction vessel 6.

[0022] Preferably, the first interface a is located at the lower end of the material reaction vessel 6, and the second interface b is located at the upper end of the material reaction vessel 6.

[0023] Specifically, the material reaction vessel 6 is made of glass. The first port a is a carrier gas inlet for 99.9995% pure nitrogen, and the second port b is a release outlet for the carrier gas carrying the volatile organic compounds of the material. In actual use, the carrier gas enters from the bottom and the released gas exits from the top.

[0024] Preferably, the carrier inlet device includes a carrier gas cylinder 1 and a mass flow controller 4. The carrier gas cylinder 1 is used to provide high-purity carrier gas. The carrier gas is introduced into the material reaction vessel 6 through the mass flow controller 4. The mass flow controller 4 is used to control the flow rate of the carrier gas introduced into the material reaction vessel 6.

[0025] Specifically, by installing a mass flow controller 4 before the first port a of the material reactor 6, the flow rate of the carrier gas entering the material reactor 6 is controlled, and the flow rate of the gas released from the second port b can be more stable.

[0026] Preferably, the gas supply port of the carrier gas cylinder 1 is equipped with a switch valve 2, and a pressure reducing valve 3 is connected in series between the carrier gas cylinder 1 and the mass flow controller 4.

[0027] Specifically, the carrier gas cylinder 1 is a high-pressure nitrogen cylinder, which contains an inert carrier gas with a purity of 99.9995% nitrogen. A switch valve 2 is installed at the carrier gas cylinder 1 to control the opening and closing of the carrier gas cylinder 1. After the high-purity carrier gas, i.e. nitrogen, is introduced into the material reaction vessel 6, it serves as both a carrier gas and a circulating gas within the material reaction vessel 6, carrying the volatile organic compounds released from the materials in the material reaction vessel 6 and flowing upwards within the reaction vessel.

[0028] More specifically, the pressure reducing valve 3 can reduce the high pressure output from the carrier gas cylinder 1 to the required safe working pressure, effectively protecting components such as the mass flow controller 4 and the material reaction vessel 6 from high pressure impact, ensuring stable carrier gas flow rate, and avoiding pressure fluctuations affecting detection accuracy. Moreover, the pressure reducing valve 3 works in conjunction with the mass flow controller 4. After the pressure reducing valve 3 initially reduces the pressure, the mass flow controller 4 can more accurately adjust the carrier gas flow rate, avoiding the direct use of high-pressure carrier gas, where the mass flow controller 4 may be unable to accurately control the small flow rate due to excessively high inlet pressure.

[0029] Preferably, a carrier gas background concentration acquisition adsorption tube 5 is connected in series between the mass flow controller 4 and the material reaction vessel 6. The carrier gas background concentration acquisition adsorption tube 5 is used as a blank sample for the carrier gas to be introduced into the first interface a.

[0030] Specifically, the background pollutants (such as pipeline residues and volatile organic compounds from environmental seepage) of the high-purity carrier gas before it enters the material reaction vessel 6 are collected by the carrier gas background concentration collection adsorption tube 5 as a "blank baseline". In subsequent analysis, the blank value is subtracted from the detection results to eliminate background interference, ensure that the data reflects the true amount of gas released from the material, and improve accuracy.

[0031] Preferably, the gas outflow device includes a gas collection and adsorption tube 7 and a backup collection and adsorption tube 9 connected in series. One end of the gas collection and adsorption tube 7 is connected to the second interface b, and the other end of the gas collection and adsorption tube 7 is connected to the backup collection and adsorption tube 9 through a two-way connector 8.

[0032] Specifically, a gas release collection adsorption tube 7 is installed at the second interface b of the material reaction vessel 6, and a backup collection adsorption tube 9 is connected in series. The backup collection adsorption tube 9 is used to monitor whether the sample is penetrated, and at the same time to monitor whether the carrier gas flow control and collection time are reasonable during the gas release test.

[0033] Preferably, the end of the alternative collection adsorption tube 9 away from the release gas collection adsorption tube 7 is also connected to an electronic soap film flow meter 10, which is used to monitor the outlet gas flow rate in real time.

[0034] Specifically, the electronic soap film flow meter 10 records the outlet flow rate to verify the sealing performance.

[0035] Preferably, it also includes a blank control reactor, the structure of which is the same as that of the material reactor 6.

[0036] Specifically, a small material test sample 11 is placed in the material reaction vessel 6, while no small material test sample 11 is placed in the blank control reaction vessel. In the specific test, the blank control reaction vessel and the material reaction vessel 6 collect background gas under the same conditions. That is, the background concentration of the gas outflow device connected to the second interface b is used as the blank sample to subtract the system background interference.

[0037] In practice, the small material test sample 11 to be tested is placed in the material reaction vessel 6, while the blank control reaction vessel remains empty. The carrier gas cylinder 1 is turned on, and the carrier gas flow rate is adjusted to the set value through the mass flow controller 4. The carrier gas enters the material reaction vessel 6 through the first interface a, carries volatile organic compounds, and flows out from the second interface b. After being adsorbed by the release gas collection adsorption tube 7, the remaining gas enters the candidate collection adsorption tube 9. The electronic soap film flow meter 10 records the outlet flow rate to verify the sealing performance. The data collected by the release gas collection adsorption tube 7 and the candidate collection adsorption tube 9 of the material reaction vessel 6 and the blank control reaction vessel are compared. The background value is subtracted. If the candidate collection adsorption tube 9 detects the target substance, it is determined that the release gas collection adsorption tube 7 has penetrated, and the sampling time needs to be shortened or the flow rate reduced. Furthermore, this invention is applicable to the measurement of gas release from small, solid or condensable liquid engineering materials such as lubricants, epoxy adhesives, AB adhesives, fireproof coatings, silicone sealants for warehouse panels, sealing strips, and thermal insulation cotton. It can simulate the release of volatile organic compounds from materials under conventional ventilation conditions, and collect the released gas using the passive adsorption principle of an adsorption tube. This avoids the influence of unconventional conditions such as high temperature and high pressure on the structure and composition of the tested materials, resulting in smaller measurement errors and a result that is closer to the conventional handling environment of building materials, making it more suitable for engineering applications. Moreover, the high-purity inert carrier gas introduced will not interfere with or contaminate the detection results of the released gas from the test material.

[0038] The above description is only a preferred embodiment of the present utility model. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the technical principles of the present utility model, and these improvements and modifications should also be considered within the protection scope of the present utility model.

Claims

1. A gas release measuring device, characterized in that: The device includes a material reaction vessel, a carrier gas inlet device, and a gas outlet device. The material reaction vessel is provided with a first interface and a second interface. The carrier gas inlet device is connected to the first interface and provides high-purity carrier gas to the material reaction vessel. The gas outlet device is connected to the second interface and collects the gas released from the material reaction vessel.

2. The gas release measuring device according to claim 1, characterized in that: The first interface is located at the lower end of the material reaction vessel, and the second interface is located at the upper end of the material reaction vessel.

3. The gas release measuring device according to claim 1, characterized in that: The carrier gas inlet device includes a carrier gas cylinder and a mass flow controller. The carrier gas cylinder is used to provide high-purity carrier gas. The carrier gas is introduced into the material reaction vessel through the mass flow controller, which is used to control the flow rate of the carrier gas introduced into the material reaction vessel.

4. The gas release measuring device according to claim 3, characterized in that: The gas cylinder is equipped with a switch valve at its gas supply port, and a pressure reducing valve is connected in series between the gas cylinder and the mass flow controller.

5. The gas release measuring device according to claim 3, characterized in that: A carrier gas background concentration acquisition adsorption tube is connected in series between the mass flow controller and the material reaction vessel. The carrier gas background concentration acquisition adsorption tube is used as a blank sample at the first interface where the carrier gas is introduced.

6. The gas release measuring device according to claim 1, characterized in that: The gas outflow device includes a release gas collection and adsorption tube and a backup collection and adsorption tube connected in series. One end of the release gas collection and adsorption tube is connected to the second interface, and the other end of the release gas collection and adsorption tube is connected to the backup collection and adsorption tube through a two-way connector.

7. The gas release measuring device according to claim 6, characterized in that: The end of the alternative collection adsorption tube away from the release gas collection adsorption tube is also connected to an electronic soap film flow meter, which is used to monitor the outlet gas flow rate in real time.

8. The gas release measuring device according to claim 1, characterized in that: It also includes a blank control reactor, the structure of which is the same as that of the material reactor.

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